[go: up one dir, main page]

CN110376808A - Array substrate, manufacturing method thereof and display panel - Google Patents

Array substrate, manufacturing method thereof and display panel Download PDF

Info

Publication number
CN110376808A
CN110376808A CN201910491206.1A CN201910491206A CN110376808A CN 110376808 A CN110376808 A CN 110376808A CN 201910491206 A CN201910491206 A CN 201910491206A CN 110376808 A CN110376808 A CN 110376808A
Authority
CN
China
Prior art keywords
insulating layer
layer
color
array substrate
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910491206.1A
Other languages
Chinese (zh)
Inventor
宋振莉
冯程静
顾毓波
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HKC Co Ltd
Chongqing HKC Optoelectronics Technology Co Ltd
Original Assignee
HKC Co Ltd
Chongqing HKC Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HKC Co Ltd, Chongqing HKC Optoelectronics Technology Co Ltd filed Critical HKC Co Ltd
Priority to CN201910491206.1A priority Critical patent/CN110376808A/en
Publication of CN110376808A publication Critical patent/CN110376808A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01Manufacture or treatment
    • H10D86/021Manufacture or treatment of multiple TFTs
    • H10D86/0212Manufacture or treatment of multiple TFTs comprising manufacture, treatment or coating of substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/411Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs characterised by materials, geometry or structure of the substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136222Colour filters incorporated in the active matrix substrate

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本申请公开了一种阵列基板及其制作方法和显示面板。阵列基板包括衬底;设置在所述衬底上的色阻层,所述色阻层包括多个色阻,相邻所述色阻边缘重叠设置形成重叠区;设置在所述重叠区下方的凹槽。本申请中在色阻重叠区下方设置凹槽,使得重叠区的色阻有部分能够容纳在重叠区中,不会过于凸出,这样整个色阻层表面就比较平整,液晶的分布就很均匀,不会产生漏光等显示问题。

The application discloses an array substrate, a manufacturing method thereof, and a display panel. The array substrate includes a substrate; a color-resist layer arranged on the substrate, and the color-resist layer includes a plurality of color-resistors, adjacent edges of the color-resist are overlapped to form an overlapping area; groove. In this application, a groove is set under the overlapping area of the color resistance, so that part of the color resistance in the overlapping area can be accommodated in the overlapping area without being too protruding, so that the surface of the entire color resistance layer is relatively flat, and the distribution of liquid crystals is very uniform , There will be no display problems such as light leakage.

Description

一种阵列基板及其制作方法和显示面板A kind of array substrate and its manufacturing method and display panel

技术领域technical field

本申请涉及显示技术领域,尤其涉及一种阵列基板及其制作方法和显示面板。The present application relates to the field of display technology, in particular to an array substrate, a manufacturing method thereof, and a display panel.

背景技术Background technique

液晶显示器(Liquid Crystal Display,LCD)具有机身薄、省电、无辐射等众多优点,得到了广泛的应用,如:液晶电视、移动电话、个人数字助理(PDA)、数字相机、计算机屏幕或笔记本电脑屏幕等,在平板显示领域中占主导地位。液晶显示面板通常是由一彩膜基板(Color Filter Substrate,CF Substrate)、一薄膜晶体管阵列基板(Thin FilmTransistor Array Substrate,TFT Array Substrate)以及一配置于两基板间的液晶层(Liquid Crystal Layer)所构成,其工作原理是通过在两片玻璃基板上施加驱动电压来控制液晶层的液晶分子的旋转,将背光模组的光线折射出来产生画面。Liquid Crystal Display (LCD) has many advantages such as thin body, power saving, and no radiation, and has been widely used, such as: LCD TV, mobile phone, personal digital assistant (PDA), digital camera, computer screen or Laptop screens, etc., dominate the field of flat panel displays. A liquid crystal display panel is usually composed of a color filter substrate (Color Filter Substrate, CF Substrate), a thin film transistor array substrate (Thin FilmTransistor Array Substrate, TFT Array Substrate), and a liquid crystal layer (Liquid Crystal Layer) arranged between the two substrates. Composition, its working principle is to control the rotation of the liquid crystal molecules in the liquid crystal layer by applying a driving voltage on the two glass substrates, and refract the light from the backlight module to produce a picture.

彩膜基板或阵列基板中的色阻在沉积的过程中,容易产生堆叠并突出的情况,致使液晶分布不均匀,从而导致漏光,影响显示效果。During the deposition process of the color filter substrate or array substrate, the color resists tend to stack and protrude, resulting in uneven liquid crystal distribution, resulting in light leakage and affecting the display effect.

发明内容Contents of the invention

本申请的目的是提供一种阵列基板及其制作方法和显示面板,以解决因色阻堆叠而导致的漏光等问题。The purpose of the present application is to provide an array substrate, its manufacturing method and a display panel, so as to solve problems such as light leakage caused by color resist stacking.

本申请公开了一种阵列基板,包括衬底;设置在所述衬底上的色阻层,所述色阻层包括多个色阻,相邻所述色阻边缘重叠设置形成重叠区;设置在所述重叠区下方的凹槽。The present application discloses an array substrate, which includes a substrate; a color-resist layer disposed on the substrate, the color-resist layer includes a plurality of color-resistors, and adjacent edges of the color-resistors are overlapped to form overlapping regions; A groove under the overlap area.

可选的,所述阵列基板包括绝缘层,所述绝缘层设置在所述色阻层与所述衬底之间,所述凹槽设置在所述绝缘层上,所述凹槽开口朝向所述重叠区。Optionally, the array substrate includes an insulating layer, the insulating layer is arranged between the color resist layer and the substrate, the groove is arranged on the insulating layer, and the opening of the groove faces the the overlapping area.

可选的,所述绝缘层包括第一绝缘层和第二绝缘层,所述第一绝缘层设置在所述第二绝缘层和所述色阻层之间,所述凹槽设置在所述第一绝缘层上。Optionally, the insulating layer includes a first insulating layer and a second insulating layer, the first insulating layer is arranged between the second insulating layer and the color resistance layer, and the groove is arranged in the on the first insulating layer.

可选的,所述第一绝缘层与所述第二绝缘层的材质不同。Optionally, the materials of the first insulating layer and the second insulating layer are different.

可选的,所述绝缘层包括第一绝缘层和第二绝缘层,所述第一绝缘层设置在所述第二绝缘层和所述色阻层之间,所述凹槽设置在所述第二绝缘层上。Optionally, the insulating layer includes a first insulating layer and a second insulating layer, the first insulating layer is arranged between the second insulating layer and the color resistance layer, and the groove is arranged in the on the second insulating layer.

可选的,所述阵列基板包括第一金属层,所述第一金属层设置在所述第一绝缘层和所述第二绝缘层之间,且与所述重叠区的位置对应,所述凹槽设置在所述第一金属层上方的第二绝缘层中。Optionally, the array substrate includes a first metal layer, the first metal layer is disposed between the first insulating layer and the second insulating layer, and corresponds to the position of the overlapping region, the A groove is disposed in the second insulating layer above the first metal layer.

可选的,所述阵列基板包括第二金属层,所述第二金属层设置在所述衬底与所述第二绝缘层之间,且与所述色阻层中的色阻对应;所述凹槽与相邻所述第二金属层之间含有一个缺口;所述凹槽与所述缺口之间被凸块隔开。Optionally, the array substrate includes a second metal layer, the second metal layer is disposed between the substrate and the second insulating layer, and corresponds to the color resistance in the color resistance layer; There is a notch between the groove and the adjacent second metal layer; the groove and the notch are separated by bumps.

可选的,所述重叠区的顶部与所述色阻层的顶部平齐。Optionally, the top of the overlapping region is flush with the top of the color resist layer.

本申请还公开了一种阵列基板的制作方法,包括步骤:This application also discloses a method for manufacturing an array substrate, including steps:

形成衬底;form the substrate;

在所述衬底上形成凹槽;以及forming grooves on the substrate; and

在所述凹槽上形成含有多个色阻,且所述色阻边缘重叠的色阻层;forming a color-resist layer containing a plurality of color-resistors on the groove and overlapping edges of the color-resistors;

其中,相邻所述色阻的边缘重叠形成重叠区,所述凹槽设置在所述重叠区下方。Wherein, edges of adjacent color resists overlap to form an overlapping area, and the groove is disposed below the overlapping area.

本申请还公开了一种显示面板,包括上述阵列基板,与所述阵列基板对向设置的彩膜基板,以及设置在所述阵列基板和所述彩膜基板之间的液晶层。The present application also discloses a display panel, comprising the above-mentioned array substrate, a color filter substrate arranged opposite to the array substrate, and a liquid crystal layer arranged between the array substrate and the color filter substrate.

本申请中在色阻重叠区下方设置凹槽,使得重叠区的色阻有部分能够容纳在重叠区中,不会过于凸出,这样整个色阻层表面就比较平整,液晶的分布就很均匀,不会产生漏光等显示问题。In this application, a groove is set under the overlapping area of the color resistance, so that part of the color resistance in the overlapping area can be accommodated in the overlapping area without being too protruding, so that the surface of the entire color resistance layer is relatively flat, and the distribution of liquid crystals is very uniform , There will be no display problems such as light leakage.

附图说明Description of drawings

所包括的附图用来提供对本申请实施例的进一步的理解,其构成了说明书的一部分,用于例示本申请的实施方式,并与文字描述一起来阐释本申请的原理。显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。在附图中:The included drawings are used to provide a further understanding of the embodiments of the present application, which constitute a part of the specification, are used to illustrate the implementation of the present application, and explain the principle of the present application together with the text description. Apparently, the drawings in the following description are only some embodiments of the present application, and those skilled in the art can obtain other drawings according to these drawings without any creative effort. In the attached picture:

图1是本申请的一实施例的一种显示面板的示意图;FIG. 1 is a schematic diagram of a display panel according to an embodiment of the present application;

图2是本申请的一实施例的一种阵列基板的示意图;FIG. 2 is a schematic diagram of an array substrate according to an embodiment of the present application;

图3是本申请的另一实施例的一种阵列基板的示意图;FIG. 3 is a schematic diagram of an array substrate according to another embodiment of the present application;

图4是本申请的另一实施例的一种阵列基板的示意图;FIG. 4 is a schematic diagram of an array substrate according to another embodiment of the present application;

图5是本申请的另一实施例的一种阵列基板的示意图;FIG. 5 is a schematic diagram of an array substrate according to another embodiment of the present application;

图6是本申请的另一实施例的一种阵列基板制作方法的流程图。FIG. 6 is a flow chart of a manufacturing method of an array substrate according to another embodiment of the present application.

其中,100、显示面板;200、阵列基板;210、衬底;220、色阻层;230、重叠区;240、凹槽;250、绝缘层;251、第一绝缘层;252、第二绝缘层;260、第一金属层;270、第二金属层;280、缺口;290、凸块;300、彩膜基板;400、液晶层。Among them, 100, display panel; 200, array substrate; 210, substrate; 220, color resist layer; 230, overlapping area; 240, groove; 250, insulating layer; 251, first insulating layer; 252, second insulating layer layer; 260, first metal layer; 270, second metal layer; 280, notch; 290, bump; 300, color filter substrate; 400, liquid crystal layer.

具体实施方式Detailed ways

需要理解的是,这里所使用的术语、公开的具体结构和功能细节,仅仅是为了描述具体实施例,是代表性的,但是本申请可以通过许多替换形式来具体实现,不应被解释成仅受限于这里所阐述的实施例。It should be understood that the terminology and specific structural and functional details disclosed herein are representative only for describing specific embodiments, but the application can be embodied in many alternative forms and should not be construed as merely Be limited by the examples set forth herein.

在本申请的描述中,术语“第一”、“第二”仅用于描述目的,而不能理解为指示相对重要性,或者隐含指明所指示的技术特征的数量。由此,除非另有说明,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征;“多个”的含义是两个或两个以上。术语“包括”及其任何变形,意为不排他的包含,可能存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。In the description of the present application, the terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating relative importance, or implicitly indicating the quantity of indicated technical features. Therefore, unless otherwise specified, the features defined as "first" and "second" may explicitly or implicitly include one or more of these features; "plurality" means two or more. The term "comprising" and any variations thereof mean non-exclusive inclusion, possible presence or addition of one or more other features, integers, steps, operations, units, components and/or combinations thereof.

另外,“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系的术语,是基于附图所示的方位或相对位置关系描述的,仅是为了便于描述本申请的简化描述,而不是指示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。Also, Center, Horizontal, Top, Bottom, Left, Right, Vertical, Horizontal, Top, Bottom, Inner, Outer The terms indicating the orientation or positional relationship are described based on the orientation or relative positional relationship shown in the drawings, and are only for the convenience of describing the simplified description of the application, rather than indicating that the referred device or element must have a specific orientation. , are constructed and operate in a particular orientation and therefore are not to be construed as limiting the application.

此外,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,或是两个元件内部的连通。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本申请中的具体含义。In addition, unless otherwise clearly specified and limited, the terms "mounted", "connected" and "connected" should be interpreted in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection , can also be an electrical connection; it can be a direct connection, an indirect connection through an intermediary, or an internal communication between two components. Those of ordinary skill in the art can understand the specific meanings of the above terms in this application according to specific situations.

下面参考附图和可选的实施例对本申请作进一步说明。The application will be further described below with reference to the accompanying drawings and optional embodiments.

如图1所示,本申请实施例公布了一种显示面板100,包括对向设置的阵列基板200和彩膜基板300,以及设置在所述阵列基板200和彩膜基板300之间的液晶层400。如图2所示,本申请实施例中的阵列基板200包括包括衬底210;设置在所述衬底210上的色阻层220,所述色阻层220包括多个色阻,相邻所述色阻边缘重叠设置形成重叠区230;设置在所述重叠区230下方的凹槽240。在阵列基板200的制作过程中,色阻层220中每个色阻的间隙都比较小,在沉积色阻的过程中很难控制好每个色阻之间的间距,容易使得色阻产生重叠;另外色阻刚沉积后,形状还不稳定,需要进行加热以及其它步骤来凝固,在这些步骤前色阻由于状态不稳定会向四周流动,这样相邻色阻的边缘也会重叠,当然还可能有其它导致色阻重叠的因素,在这里就不一一列举。色阻重叠后会突出于色阻层220中其它位置,这样色阻层220的表面就不平整,导致彩膜基板300和阵列基板200之间的液晶厚度不均匀,使得液晶分子偏转时出现漏光等问题。基于此,本申请在色阻重叠区230的下方设置对应的凹槽240,以容纳部分重叠区230的色阻,使得色阻层220的表面变动平整,这样液晶层400的厚度就会变得均匀。此外,所述重叠区230的顶部与所述色阻层220的顶部平齐,这样液晶整体的厚度将会保持一致,达到理想的状态,不会出现显示问题。As shown in FIG. 1 , the embodiment of the present application discloses a display panel 100 , including an array substrate 200 and a color filter substrate 300 arranged opposite to each other, and a liquid crystal layer arranged between the array substrate 200 and the color filter substrate 300 400. As shown in FIG. 2, the array substrate 200 in the embodiment of the present application includes a substrate 210; The edges of the color resist are overlapped to form an overlapping region 230 ; the groove 240 is disposed below the overlapping region 230 . During the manufacturing process of the array substrate 200, the gap between each color resist in the color resist layer 220 is relatively small, and it is difficult to control the distance between each color resist in the process of depositing the color resist, which easily causes overlapping of the color resists. ; In addition, the shape of the color resistance is not stable just after deposition, and heating and other steps are required to solidify. Before these steps, the color resistance will flow around due to the unstable state, so that the edges of adjacent color resistances will also overlap. There may be other factors that lead to color resistance overlap, which will not be listed here. After overlapping, the color resists will protrude from other positions in the color resist layer 220, so that the surface of the color resist layer 220 is uneven, resulting in uneven thickness of the liquid crystal between the color filter substrate 300 and the array substrate 200, resulting in light leakage when the liquid crystal molecules are deflected. And other issues. Based on this, the present application sets corresponding grooves 240 below the overlapping area 230 of the color resistance to accommodate the color resistance of the partial overlapping area 230, so that the surface of the color resistance layer 220 changes evenly, so that the thickness of the liquid crystal layer 400 will become uniform. In addition, the top of the overlapping region 230 is flush with the top of the color-resist layer 220 , so that the overall thickness of the liquid crystal will remain consistent, achieving an ideal state without display problems.

具体的,显示面板100采用将彩色滤光片与阵列基板200集成在一起的集成技术(Color Filter on Array,COA)。所述色阻层220最少包括三种颜色的色阻,色阻层220可以包括红绿蓝三种颜色的色阻,也可以包括红绿蓝白四种颜色的色阻,还可以包括红绿蓝黄四种颜色的色阻,在此不做限定,因为不管选用什么种类的色阻,色阻重叠的情况都不受影响;至于衬底210,可以选用玻璃材质或塑料材质。Specifically, the display panel 100 adopts an integrated technology (Color Filter on Array, COA) that integrates the color filter and the array substrate 200 together. The color resistance layer 220 includes color resistances of at least three colors, and the color resistance layer 220 may include color resistances of three colors of red, green and blue, or four colors of red, green, blue and white, or may include red, green and blue color resistances. The color resistance of the four colors of blue and yellow is not limited here, because no matter what kind of color resistance is used, the overlap of the color resistance will not be affected; as for the substrate 210 , glass or plastic can be used.

另外,本申请中的显示面板100可以是平面显示面板100,也可以是曲面显示面板100(curved display),而且曲面显示面板100中色阻堆叠的情况会更严重,因为当曲面显示面板100不使用时,也就是不弯折的时候,色阻已经会出现堆叠的情况,而当显示面板100弯折后,色阻受到挤压堆叠会更严重。现如今,曲面显示面板100以及曲面显示器越来越受欢迎,因为在观看曲面显示器时,观赏者的眼睛与曲面显示器的各个位置的距离大概是相等的,且不论是中央区或左右边缘区所显示的画面,观赏者都可以接近直角的视角观看,因此相较于平面显示面板100以及平面显示器,曲面显示器不会产生大视角观看时的亮度偏差与颜色偏差等问题;此外,曲面显示器还具有类似立体的视觉效果。因此,曲面显示器已成为受到高度瞩目的显示产品。然而,由于曲面显示器将平面显示面板100以外力弯曲后所形成,因此两片基板之间会而产生相对位置偏差,包括前面提到的色阻挤压问题,这些会导致漏光问题,从而影响曲面显示器的显示品质。In addition, the display panel 100 in the present application may be a flat display panel 100 or a curved display panel 100 (curved display), and the color resistance stacking in the curved display panel 100 will be more serious, because when the curved display panel 100 is not When in use, that is, when the display panel 100 is not bent, the color resists are already stacked, and when the display panel 100 is bent, the color resists are squeezed and stacked more seriously. Nowadays, the curved display panel 100 and the curved display are becoming more and more popular, because when watching the curved display, the distance between the viewer's eyes and each position of the curved display is about the same, regardless of whether it is the central area or the left and right edge areas. The displayed picture can be watched by the viewer at a viewing angle close to a right angle, so compared with the flat display panel 100 and the flat display, the curved display will not have problems such as brightness deviation and color deviation when viewed at a large viewing angle; in addition, the curved display also has Similar to three-dimensional visual effects. Therefore, the curved display has become a display product that attracts high attention. However, since the curved display is formed by bending the flat display panel 100 with an external force, there will be a relative positional deviation between the two substrates, including the aforementioned color-resist extrusion problem, which will cause light leakage and affect the curved surface The display quality of the monitor.

上述显示面板100中,所述阵列基板200还包括绝缘层250,所述绝缘层250设置在所述色阻层220与所述衬底210之间,所述凹槽240设置在所述绝缘层250上,所述凹槽240开口朝向所述重叠区230。在色阻层220和衬底210之间设置绝缘层250可以将色阻层220与其它结构隔开,防止其它结构对色阻产生影响;另外绝缘层250结构很稳定,色阻沉积到绝缘层250上不会发生反应。在绝缘层250上设置凹槽240一来是以为绝缘层250的面积大,几乎在沉积完后不需要经过蚀刻或曝光显影步骤,而凹槽240与色阻的重叠区230对应,相邻色阻之间都有重叠区230,也就是说相邻色阻之间都有一个凹槽240,从而看出凹槽240的数量比较多,而满足设置凹槽240且不额外添加的结构却很少,因此选择在绝缘层250上设置凹槽240。In the above display panel 100, the array substrate 200 further includes an insulating layer 250, the insulating layer 250 is arranged between the color resistance layer 220 and the substrate 210, and the groove 240 is arranged in the insulating layer 250 , the opening of the groove 240 faces the overlapping region 230 . An insulating layer 250 is provided between the color-resistive layer 220 and the substrate 210 to separate the color-resistive layer 220 from other structures, preventing other structures from affecting the color-resistive effect; in addition, the structure of the insulating layer 250 is very stable, and the color-resistive layer is deposited on the insulating layer There is no reaction on the 250. The groove 240 is provided on the insulating layer 250 because the area of the insulating layer 250 is large, and almost no etching or exposure and development steps are required after deposition, and the groove 240 corresponds to the overlapping area 230 of the color resist, and the adjacent color There is an overlapping area 230 between the color resistors, that is to say, there is a groove 240 between adjacent color resistors, so it can be seen that the number of grooves 240 is relatively large, but the structure that meets the requirements of setting grooves 240 without additional addition is very small. Therefore, the groove 240 is chosen to be provided on the insulating layer 250 .

如图3所示,绝缘层250包括第一绝缘层251和第二绝缘层252,所述第一绝缘层251设置在所述第二绝缘层252和所述色阻层220之间,所述凹槽240设置在所述第一绝缘层251上。之所以设置两个绝缘层250将凹槽240设置在第一绝缘层251上,是因为当蚀刻凹槽240时,如果第一绝缘层251被蚀刻穿,还有第二绝缘层252能够起到阻挡蚀刻作用,防止蚀刻液或蚀刻气体蚀刻到绝缘层250下方的结构,对面板造成破坏,影响面板的显示。而且,第一绝缘层251和第二绝缘层252的材料还可以不相同,这样当用于蚀刻第一绝缘层251的蚀刻液或蚀刻气体蚀刻穿第一绝缘层251后,却不容易蚀刻第二绝缘层252,这样能防止第二绝缘层252的蚀刻速度过快。其中,第一绝缘层251为钝化层(PV,Passivation layer),采用氮化硅或氧化硅材料,之所以将第一绝缘层251设置为钝化层,是因为钝化层表面平坦,色阻层220沉积到钝化层后不会凹凸不平,液晶层400的厚度也会比较均匀。As shown in FIG. 3 , the insulating layer 250 includes a first insulating layer 251 and a second insulating layer 252, the first insulating layer 251 is arranged between the second insulating layer 252 and the color resistance layer 220, and the The groove 240 is disposed on the first insulating layer 251 . The reason why two insulating layers 250 are set and the groove 240 is arranged on the first insulating layer 251 is because when the groove 240 is etched, if the first insulating layer 251 is etched through, there is also the second insulating layer 252 that can play a role. The etching function is blocked to prevent the etching liquid or etching gas from etching the structure under the insulating layer 250 , causing damage to the panel and affecting the display of the panel. Moreover, the materials of the first insulating layer 251 and the second insulating layer 252 can also be different, so that when the etching liquid or etching gas used to etch the first insulating layer 251 etches through the first insulating layer 251, it is not easy to etch the second insulating layer 251. The second insulating layer 252 can prevent the etching speed of the second insulating layer 252 from being too fast. Wherein, the first insulating layer 251 is a passivation layer (PV, Passivation layer), which is made of silicon nitride or silicon oxide. The reason why the first insulating layer 251 is set as a passivation layer is that the surface of the passivation layer is flat and the color After the resist layer 220 is deposited on the passivation layer, it will not be uneven, and the thickness of the liquid crystal layer 400 will be relatively uniform.

另外,如图4所示,还可以将凹槽240做到第二绝缘层252上,而第一绝缘层251上不做凹槽240,且第一绝缘层251还是设置在所述第二绝缘层252和所述色阻层220之间,所述凹槽240的开口朝向所述第一绝缘层251。采用在第二绝缘层252上设置凹槽240的结构后,当凹槽240的深度不够时,色阻重叠区230的顶部任然会比色阻层220的其它位置突出;当凹槽240的深度较大时,色阻重叠区230的顶部会比色阻层220的其它位置凹陷,这两种情况都会使得液晶层400的厚度不均匀,会造成显示漏光等问题。而采用先在第二绝缘层252上设置凹槽240结构后,当发现凹槽240的深度较大时,可以在后面沉积第一绝缘层251时,将与凹槽240对应的第一绝缘层251部分做厚一点,这样能够弥补凹槽240较深的缺陷,使得色阻层220的顶部与重叠区230的顶部平齐;而当凹槽240的深度不够时,可以在后面沉积第一绝缘层251的时候,将与凹槽240对应的第一绝缘层251的部分做个缺口280,或者将不与凹槽240对应的第一绝缘层251的部分做厚一点,这样第二绝缘层252的凹槽240与对应的第一绝缘层251的部分堆叠后的深度就变大,使得色阻层220的顶部与重叠区230的顶部平齐。采用图4所述的实施例使得当前面步骤中形成的凹槽240有问题的话,可以在后面步骤中对第一绝缘层251进行调整,使得本申请有较大的容错率,减少生产成本,提高生产良率。In addition, as shown in FIG. 4, the groove 240 can also be made on the second insulating layer 252, and the groove 240 is not formed on the first insulating layer 251, and the first insulating layer 251 is still arranged on the second insulating layer 252. Between the layer 252 and the color resist layer 220 , the opening of the groove 240 faces the first insulating layer 251 . After adopting the structure in which the groove 240 is arranged on the second insulating layer 252, when the depth of the groove 240 is not enough, the top of the color-resist overlapping region 230 will still protrude from other positions of the color-resist layer 220; When the depth is large, the top of the color-resist overlapping region 230 will be recessed compared to other positions of the color-resist layer 220 , both of which will make the thickness of the liquid crystal layer 400 uneven, causing problems such as display light leakage. However, after the structure of the groove 240 is first arranged on the second insulating layer 252, when the depth of the groove 240 is found to be large, the first insulating layer 251 can be deposited later, and the first insulating layer corresponding to the groove 240 The part 251 is made thicker, which can make up for the deep defect of the groove 240, so that the top of the color resist layer 220 is flush with the top of the overlapping region 230; and when the depth of the groove 240 is not enough, the first insulating layer can be deposited behind layer 251, make a gap 280 in the part of the first insulating layer 251 corresponding to the groove 240, or make a thicker part of the first insulating layer 251 not corresponding to the groove 240, so that the second insulating layer 252 After the groove 240 is stacked with the corresponding part of the first insulating layer 251 , the depth becomes larger, so that the top of the color resist layer 220 is flush with the top of the overlapping region 230 . Using the embodiment shown in FIG. 4, if there is a problem with the groove 240 formed in the previous step, the first insulating layer 251 can be adjusted in the next step, so that the present application has a greater fault tolerance rate and reduces production costs. Improve production yield.

当凹槽240做在第一绝缘层251上后,凹槽240可以贯穿第一绝缘层251,这样可以增加凹槽240的深度,使得重叠区230突出色阻层220表面的部分能够容纳在凹槽240内;当贯穿第一绝缘层251的凹槽240仍然不够容纳重叠区230突出部分的话,可以继续朝下蚀刻第二绝缘层252,使得凹槽240的深度增加,直至重叠区230的顶部与色阻层220的顶部平齐。After the groove 240 is made on the first insulating layer 251, the groove 240 can penetrate the first insulating layer 251, so that the depth of the groove 240 can be increased, so that the part of the overlapping region 230 protruding from the surface of the color resist layer 220 can be accommodated in the groove. In the groove 240; if the groove 240 that runs through the first insulating layer 251 is still not enough to accommodate the protruding part of the overlapping region 230, the second insulating layer 252 can be etched downwards, so that the depth of the groove 240 increases until the top of the overlapping region 230 It is flush with the top of the color resist layer 220 .

如图5所示,所述阵列基板200包括第一金属层260,所述第一金属层260设置在所述第一绝缘层251和所述第二绝缘层252之间,且与所述重叠区230的位置对应,所述凹槽240设置在所述第一金属层260上方的第二绝缘层252中。所述重叠区230由于是由两种颜色的色阻构成,能够起到遮光作用,但是由于重叠区230的色阻分布不均匀,仍然存在着漏光的风险,所以在重叠区230的下方设置第一金属线来加强遮光效果,当然第一金属层260还可以被替换为其它遮光材料,在此不做限定。所述第一金属层260设置在所述第一绝缘层251和所述第二绝缘层252之间,防止第一金属层260被氧化。同时,为了防止第一金属层260设置在所述第一绝缘层251和所述第二绝缘层252之间导致凹槽240的底部变厚,从而使得凹槽240深度变浅,可以将第一金属层260上方的第一绝缘层251厚度减小,这样凹槽240的深度就不会变浅,当然还可以在第二绝缘层252上设置开口,并将第一金属层260置于此开口中,这样第一金属层260也不会对凹槽240造成影响。As shown in FIG. 5, the array substrate 200 includes a first metal layer 260, the first metal layer 260 is disposed between the first insulating layer 251 and the second insulating layer 252, and overlaps with the The location of the region 230 corresponds to that the groove 240 is disposed in the second insulating layer 252 above the first metal layer 260 . Since the overlapping area 230 is composed of color resists of two colors, it can play a light-shielding function. However, due to the uneven distribution of the color resists in the overlapping area 230, there is still a risk of light leakage. A metal wire is used to enhance the light-shielding effect. Of course, the first metal layer 260 can also be replaced with other light-shielding materials, which is not limited here. The first metal layer 260 is disposed between the first insulating layer 251 and the second insulating layer 252 to prevent the first metal layer 260 from being oxidized. At the same time, in order to prevent the first metal layer 260 from being disposed between the first insulating layer 251 and the second insulating layer 252 from causing the bottom of the groove 240 to become thicker, thereby making the depth of the groove 240 shallower, the first The thickness of the first insulating layer 251 above the metal layer 260 is reduced, so that the depth of the groove 240 will not become shallower. Of course, an opening can also be provided on the second insulating layer 252, and the first metal layer 260 is placed in this opening. In this way, the first metal layer 260 will not affect the groove 240 either.

阵列基板200还包括第二金属层270,所述第二金属层270设置在所述衬底210与所述第二绝缘层252之间,所述第二金属线与所述色阻层220中每个色阻对应;所述凹槽240与相邻所述第二金属层270之间含有一个缺口280。这样第二金属层270上方的绝缘层250高度最大,而其它部分的绝缘层250高低交底,具体的,两个相邻第二金属层270之间含有两个缺口280和一个凹槽240,可以容纳的重叠区230部分较多;之所以增加缺口280设置,是因为绝缘层250的厚度都比较薄,设置在绝缘层250中的凹槽240的深度和面积可能不足以容纳重叠区230突出的部分,因此通过设置缺口280来分担凹槽240的压力,这样即使相邻色阻重叠的部分较多,重叠区230也不会突出与色阻层220的表面。The array substrate 200 further includes a second metal layer 270, the second metal layer 270 is arranged between the substrate 210 and the second insulating layer 252, and the second metal wire and the color resistance layer 220 Each color resistance corresponds; there is a gap 280 between the groove 240 and the adjacent second metal layer 270 . In this way, the height of the insulating layer 250 above the second metal layer 270 is the largest, while the height of the insulating layer 250 in other parts is intersecting. Specifically, there are two gaps 280 and a groove 240 between two adjacent second metal layers 270, which can There are many overlapping areas 230 to be accommodated; the reason why the gap 280 is added is that the thickness of the insulating layer 250 is relatively thin, and the depth and area of the groove 240 arranged in the insulating layer 250 may not be enough to accommodate the protrusion of the overlapping area 230. Therefore, the gap 280 is provided to share the pressure of the groove 240 , so that even if adjacent color resists overlap more, the overlapping region 230 will not protrude from the surface of the color resist layer 220 .

图5中凹槽240两端有两个凸块290,是在第一绝缘层251上做出凹槽240后形成的,两个凸起将凹槽240和左右两个缺口280隔开,能防止色阻沉积后流动的范围过大,从凹槽240流到旁边的缺口280中,导致色阻重叠的横截面部分较大,因为一种颜色的色阻只能透过一种颜色的光,当两种颜色的色阻重叠后就不会使光透过,起到遮光的作用,因此为了防止重叠区230的很截面积较大,特意保留凹槽240两端的凸块290,限制色阻流动的面积过大,使得重叠区230的横截面积变大,导致显示面板100的开口率减小。具体的,第二金属层270为栅极线,第二绝缘层252为栅极绝缘层250。There are two protrusions 290 at both ends of the groove 240 in Fig. 5, which are formed after the groove 240 is made on the first insulating layer 251. The two protrusions separate the groove 240 from the left and right two gaps 280, which can Prevent the flow range of the color resist from being too large after deposition, and flow from the groove 240 to the gap 280 next to it, resulting in a larger cross-section of the color resist overlap, because a color resist of one color can only transmit light of one color , when the color resists of the two colors overlap, the light will not pass through and play the role of shading. Therefore, in order to prevent the overlapping area 230 from having a large cross-sectional area, the bumps 290 at both ends of the groove 240 are deliberately reserved to limit the color. If the area of flow resistance is too large, the cross-sectional area of the overlapping region 230 becomes larger, resulting in a decrease in the aperture ratio of the display panel 100 . Specifically, the second metal layer 270 is the gate line, and the second insulating layer 252 is the gate insulating layer 250 .

如图6所示,作为本申请的另一实施例,公开了一种阵列基板200的制作方法,包括步骤:As shown in FIG. 6, as another embodiment of the present application, a method for manufacturing an array substrate 200 is disclosed, including steps:

S1:形成衬底;S1: forming a substrate;

S2:在所述衬底上形成凹槽;S2: forming grooves on the substrate;

S3:在所述凹槽上形成含有多个色阻,且所述色阻边缘重叠的色阻层;S3: forming a color-resist layer containing a plurality of color-resistors on the groove and overlapping edges of the color-resistors;

其中,相邻所述色阻的边缘重叠形成重叠区,所述凹槽设置在所述重叠区下方。Wherein, edges of adjacent color resists overlap to form an overlapping area, and the groove is disposed below the overlapping area.

需要说明的是,本方案中涉及到的各步骤的限定,在不影响具体方案实施的前提下,并不认定为对步骤先后顺序做出限定,写在前面的步骤可以是在先执行的,也可以是在后执行的,甚至也可以是同时执行的,只要能实施本方案,都应当视为属于本申请的保护范围。It should be noted that the limitations of the steps involved in this plan are not considered as limiting the order of the steps without affecting the implementation of the specific plan. The steps written in the front can be executed first. It can also be performed later, or even at the same time, as long as the solution can be implemented, it should be considered as belonging to the protection scope of the present application.

本申请的技术方案可以广泛用于各种显示面板,如扭曲向列型(TwistedNematic,TN)显示面板、平面转换型(In-Plane Switching,IPS)显示面板、垂直配向型(Vertical Alignment,VA)显示面板、多象限垂直配向型(Multi-Domain VerticalAlignment,MVA)显示面板,当然,也可以是其他类型的显示面板,如有机发光二极管(Organic Light-Emitting Diode,OLED)显示面板,均可适用上述方案。The technical solution of the present application can be widely used in various display panels, such as twisted nematic (TwistedNematic, TN) display panels, in-plane switching (In-Plane Switching, IPS) display panels, vertical alignment (Vertical Alignment, VA) Display panels, multi-quadrant vertical alignment (Multi-Domain Vertical Alignment, MVA) display panels, of course, can also be other types of display panels, such as organic light-emitting diode (Organic Light-Emitting Diode, OLED) display panels, all of which can be applied to the above Program.

以上内容是结合具体的可选的实施方式对本申请所作的进一步详细说明,不能认定本申请的具体实施只局限于这些说明。对于本申请所属技术领域的普通技术人员来说,在不脱离本申请构思的前提下,还可以做出若干简单推演或替换,都应当视为属于本申请的保护范围。The above content is a further detailed description of the present application in conjunction with specific optional implementation modes, and it cannot be deemed that the specific implementation of the present application is limited to these descriptions. For those of ordinary skill in the technical field to which this application belongs, some simple deduction or substitutions can be made without departing from the concept of this application, which should be deemed to belong to the protection scope of this application.

Claims (10)

1. a kind of array substrate characterized by comprising
Substrate;
Color blocking layer, over the substrate, the color blocking layer includes multiple color blockings for setting, and shape is arranged in the adjacent color blocking imbricate At overlay region;And
Groove is arranged below the overlay region.
2. a kind of array substrate as described in claim 1, which is characterized in that the array substrate includes insulating layer, described exhausted Edge layer is arranged between the color blocking layer and the substrate, and the groove is arranged on the insulating layer, the slot opening court To the overlay region.
3. a kind of array substrate as claimed in claim 2, which is characterized in that the insulating layer includes the first insulating layer and second Insulating layer, first insulating layer are arranged between the second insulating layer and the color blocking layer, and the groove is arranged described On first insulating layer.
4. a kind of array substrate as claimed in claim 3, which is characterized in that first insulating layer and the second insulating layer Material it is different.
5. a kind of array substrate as claimed in claim 2, which is characterized in that the insulating layer includes the first insulating layer and second Insulating layer, first insulating layer are arranged between the second insulating layer and the color blocking layer, and the groove is arranged described In second insulating layer.
6. a kind of array substrate as claimed in claim 5, which is characterized in that the array substrate includes the first metal layer, institute It states the first metal layer to be arranged between first insulating layer and the second insulating layer, and the position pair with the overlay region It answers, the groove is arranged in the second insulating layer above the first metal layer.
7. a kind of array substrate as claimed in claim 6, which is characterized in that the array substrate includes second metal layer, institute It states second metal layer to be arranged between the substrate and the second insulating layer, and corresponding with the color blocking in the color blocking layer;
Contain a notch between the groove and the adjacent second metal layer;
It is separated between the groove and the notch by convex block.
8. a kind of array substrate as described in claim 1, which is characterized in that the top of the overlay region and the color blocking layer Top is concordant.
9. a kind of production method of array substrate, which is characterized in that comprising steps of
Form substrate;
Groove is formed over the substrate;And
It is formed on the groove and contains multiple color blockings, and the color blocking layer of the color blocking imbricate;
Wherein, the imbricate of the adjacent color blocking forms overlay region, and the groove is arranged below the overlay region.
10. a kind of display panel, which is characterized in that including the array substrate as described in claim 1 to 8 any one, with institute State the color membrane substrates that array substrate is arranged oppositely, and the liquid crystal being arranged between the array substrate and the color membrane substrates Layer.
CN201910491206.1A 2019-06-06 2019-06-06 Array substrate, manufacturing method thereof and display panel Pending CN110376808A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910491206.1A CN110376808A (en) 2019-06-06 2019-06-06 Array substrate, manufacturing method thereof and display panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910491206.1A CN110376808A (en) 2019-06-06 2019-06-06 Array substrate, manufacturing method thereof and display panel

Publications (1)

Publication Number Publication Date
CN110376808A true CN110376808A (en) 2019-10-25

Family

ID=68249863

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910491206.1A Pending CN110376808A (en) 2019-06-06 2019-06-06 Array substrate, manufacturing method thereof and display panel

Country Status (1)

Country Link
CN (1) CN110376808A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110764169A (en) * 2019-11-06 2020-02-07 京东方科技集团股份有限公司 Lens structure, preparation method and display device
CN111091763A (en) * 2020-03-22 2020-05-01 深圳市华星光电半导体显示技术有限公司 a display panel
CN113589577A (en) * 2021-07-21 2021-11-02 Tcl华星光电技术有限公司 Display panel and mobile terminal
CN114265229A (en) * 2021-12-16 2022-04-01 深圳市华星光电半导体显示技术有限公司 Display panel, preparation method thereof and display device
CN114706245A (en) * 2022-04-26 2022-07-05 北海惠科光电技术有限公司 Color film substrate, display panel and preparation method of color film substrate
CN116088237A (en) * 2023-02-21 2023-05-09 惠科股份有限公司 Display panel and display device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI274906B (en) * 2006-06-06 2007-03-01 Allied Material Technology Cor A color filter
KR20070079490A (en) * 2006-02-02 2007-08-07 삼성전자주식회사 Color filter display panel and its manufacturing method
CN102681246A (en) * 2012-04-12 2012-09-19 京东方科技集团股份有限公司 Color film substrate, method for manufacturing same and liquid crystal display
CN203259747U (en) * 2013-05-30 2013-10-30 京东方科技集团股份有限公司 Array substrate and displaying device
CN104267531A (en) * 2014-10-11 2015-01-07 京东方科技集团股份有限公司 Color film substrate and display device
CN107065280A (en) * 2017-03-29 2017-08-18 肇庆端州湖水机电科技有限公司 Liquid crystal display panel

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070079490A (en) * 2006-02-02 2007-08-07 삼성전자주식회사 Color filter display panel and its manufacturing method
TWI274906B (en) * 2006-06-06 2007-03-01 Allied Material Technology Cor A color filter
CN102681246A (en) * 2012-04-12 2012-09-19 京东方科技集团股份有限公司 Color film substrate, method for manufacturing same and liquid crystal display
CN203259747U (en) * 2013-05-30 2013-10-30 京东方科技集团股份有限公司 Array substrate and displaying device
CN104267531A (en) * 2014-10-11 2015-01-07 京东方科技集团股份有限公司 Color film substrate and display device
CN107065280A (en) * 2017-03-29 2017-08-18 肇庆端州湖水机电科技有限公司 Liquid crystal display panel

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110764169A (en) * 2019-11-06 2020-02-07 京东方科技集团股份有限公司 Lens structure, preparation method and display device
CN111091763A (en) * 2020-03-22 2020-05-01 深圳市华星光电半导体显示技术有限公司 a display panel
CN111091763B (en) * 2020-03-22 2020-06-19 深圳市华星光电半导体显示技术有限公司 a display panel
CN113589577A (en) * 2021-07-21 2021-11-02 Tcl华星光电技术有限公司 Display panel and mobile terminal
CN114265229A (en) * 2021-12-16 2022-04-01 深圳市华星光电半导体显示技术有限公司 Display panel, preparation method thereof and display device
CN114706245A (en) * 2022-04-26 2022-07-05 北海惠科光电技术有限公司 Color film substrate, display panel and preparation method of color film substrate
CN116088237A (en) * 2023-02-21 2023-05-09 惠科股份有限公司 Display panel and display device
CN116088237B (en) * 2023-02-21 2025-06-17 惠科股份有限公司 Display panel and display device

Similar Documents

Publication Publication Date Title
CN110376808A (en) Array substrate, manufacturing method thereof and display panel
US9158148B2 (en) Liquid crystal display panel and display device
TWI363911B (en) Liquid crystal display
CN103885260B (en) Display panel
CN213987120U (en) Display module and display device
WO2016176961A1 (en) Display panel and display device
US20070139598A1 (en) Vertical alignment mode liquid crystal display device
US20140168585A1 (en) Color filter substrate, manfacturing method for the same, and display device
US20220091449A1 (en) Array substrate and method for manufacturing the same and display device
CN103293775A (en) Optical device, display device, electronic apparatus, manufacturing device and manufacturing method
WO2015085690A1 (en) Display device, array substrate and manufacturing method therefor
CN204331229U (en) Liquid crystal display
CN102129141A (en) Liquid crystal display manufacturing method, liquid crystal display and electronic equipment
JP6187928B2 (en) Horizontal electric field type liquid crystal display device
WO2021196787A1 (en) Display substrate, display panel and display device
CN106444170A (en) Liquid crystal display device with a light guide plate
JP2015152876A (en) liquid crystal display device
WO2021056729A1 (en) Array substrate, display panel, and manufacturing method for array substrate
WO2019010996A1 (en) Array substrate and display device
US10317738B2 (en) Array substrate and a display panel
CN103576358B (en) The liquid crystal panel of low colour cast and display
WO2020124896A1 (en) Liquid crystal display panel
US10082696B2 (en) Liquid crystal panel and liquid crystal display device
US9588393B2 (en) Liquid crystal panel and method of manufacturing the same, display device
US9041886B2 (en) Liquid crystal display device and manufacturing method of liquid crystal display device

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20191025

RJ01 Rejection of invention patent application after publication