[go: up one dir, main page]

CN110289240A - Bulk transfer head and transfer method for electronic components - Google Patents

Bulk transfer head and transfer method for electronic components Download PDF

Info

Publication number
CN110289240A
CN110289240A CN201910567736.XA CN201910567736A CN110289240A CN 110289240 A CN110289240 A CN 110289240A CN 201910567736 A CN201910567736 A CN 201910567736A CN 110289240 A CN110289240 A CN 110289240A
Authority
CN
China
Prior art keywords
electronic component
memory alloy
temperature
mass transfer
alloy substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910567736.XA
Other languages
Chinese (zh)
Inventor
符鞠建
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Tianma Microelectronics Co Ltd
Original Assignee
Shanghai Tianma Microelectronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Tianma Microelectronics Co Ltd filed Critical Shanghai Tianma Microelectronics Co Ltd
Priority to CN201910567736.XA priority Critical patent/CN110289240A/en
Publication of CN110289240A publication Critical patent/CN110289240A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Device Packages (AREA)

Abstract

本发明公开了一种电子元件巨量转移头及转移方法,涉及电子元件生产技术领域,转移头包括:记忆合金基底以及固定在记忆合金基底第一表面的多个电子元件拾取头;在相同温度下,任意相邻两个电子元件拾取头之间的中心距相等;记忆合金基底随温度的变化而发生形变,当温度升高时,记忆合金基底拉伸,任意相邻两个电子元件拾取头之间的中心距变大;当温度降低时,记忆合金基底收缩,任意相邻两个电子元件拾取头之间的中心距变小。通过调节温度,即可调节记忆合金基底上固定的电子元件拾取头之间的间距,灵活适用于不同的Micro‑LED pitch和pixel pitch,有效避免出现Micro‑LED资源浪费的情形。

The invention discloses a mass transfer head and a transfer method for electronic components, and relates to the technical field of production of electronic components. In this case, the center-to-center distance between any two adjacent electronic component pick-up heads is equal; the memory alloy substrate deforms with the change of temperature. When the temperature rises, the memory alloy substrate stretches, and any two adjacent electronic component pick-up heads The center-to-center distance becomes larger; when the temperature decreases, the memory alloy substrate shrinks, and the center-to-center distance between any two adjacent electronic component pick-up heads becomes smaller. By adjusting the temperature, the distance between the fixed electronic component pick-up heads on the memory alloy substrate can be adjusted, which is flexibly applicable to different Micro-LED pitches and pixel pitches, effectively avoiding the waste of Micro-LED resources.

Description

电子元件巨量转移头及转移方法Electronic component mass transfer head and transfer method

技术领域technical field

本发明涉及电子元件生产技术领域,更具体地,涉及一种电子元件巨量转移头及转移方法。The invention relates to the technical field of electronic component production, and more specifically, to a mass transfer head and a transfer method for electronic components.

背景技术Background technique

Micro-LED是一种将LED结构微小化和矩阵化,对每一个像素点单独驱动和定址控制的显示技术。由于Micro-LED技术的亮度、寿命、对比度、反应时间、能耗、可视角度和分辨率等各种指标均优于LCD和OLED技术,被视为能超越OLED及传统Micro-LED的新一代显示技术。但是,由于封装过程中极高效率,99.9999%良品率和正负0.5μm以内转移精度的需要,而Micro-LED元器件尺寸基本小于50μm且数目是几万到几百万个,因此载Micro-LED产业化过程中仍需克服的一个核心技术难题就是Micro-LED元器件的巨量转移技术。Micro-LED is a display technology that miniaturizes and matrixes the LED structure, and individually drives and addresses each pixel. Since the brightness, life, contrast, response time, energy consumption, viewing angle and resolution of Micro-LED technology are superior to LCD and OLED technology, it is regarded as a new generation that can surpass OLED and traditional Micro-LED. display technology. However, due to the extremely high efficiency in the packaging process, the 99.9999% yield rate and the need for transfer accuracy within plus or minus 0.5 μm, the size of Micro-LED components is basically less than 50 μm and the number is tens of thousands to several million. A core technical problem that still needs to be overcome in the process of LED industrialization is the mass transfer technology of Micro-LED components.

现有技术中,Micro-LED在生长基底上生长完成后,将切割成周期性排布的多个Micro-LED元件,Micro-LED之前的间距(即Micro-LED pitch)是固定的,然后将整面Micro-LED元件批量转移到转运基板上,最后利用拾取头将转运基板上的Micro-LED元件转移到阵列基板上,从而实现了向阵列基板转移Micro-LED的过程。通常,一个拾取头对应拾取一个Micro-LED,拾取头的pitch(即相邻两个拾取头之间的间距)是固定的,且拾取头的pitch与显示面板上显示像素的pixel pitch保持一致,但是生长基底和转运基板上的Micro-LEDpitch与显示像素的pixel pitch是不同的,通常Micro-LED pitch=pixel pitch/n(n为大于1的整数),因此拾取头在拾取转运基板上的Micro-LED时,只能拾取到转运基板上的部分Micro-LED,剩余部分的Micro-LED将被浪费,因而会造成LED资源的浪费。In the prior art, after the growth of the Micro-LED on the growth substrate is completed, it will be cut into a plurality of Micro-LED elements arranged periodically. The entire surface of Micro-LED components is transferred to the transfer substrate in batches, and finally the Micro-LED components on the transfer substrate are transferred to the array substrate by using the pick-up head, thus realizing the process of transferring Micro-LEDs to the array substrate. Usually, one pick-up head corresponds to pick up a Micro-LED, the pitch of the pick-up head (that is, the distance between two adjacent pick-up heads) is fixed, and the pitch of the pick-up head is consistent with the pixel pitch of the display pixel on the display panel. However, the Micro-LED pitch on the growth substrate and the transfer substrate is different from the pixel pitch of the display pixel. Usually, the Micro-LED pitch=pixel pitch/n (n is an integer greater than 1), so the pickup head can pick up the Micro-LED pitch on the transfer substrate. -LEDs, only part of the Micro-LEDs on the transfer substrate can be picked up, and the rest of the Micro-LEDs will be wasted, resulting in a waste of LED resources.

发明内容Contents of the invention

有鉴于此,本发明提供了一种电子元件巨量转移头及转移方法,通过调节温度,即可调节记忆合金基底上固定的电子元件拾取头之间的间距,灵活适用于不同的Micro-LEDpitch和pixel pitch,有效避免出现Micro-LED资源浪费的情形。In view of this, the present invention provides a mass transfer head and transfer method for electronic components. By adjusting the temperature, the distance between the pick-up heads of electronic components fixed on the memory alloy substrate can be adjusted, which is flexibly applicable to different Micro-LED pitches. and pixel pitch, effectively avoiding the waste of Micro-LED resources.

第一方面,本申请提供一种电子元件巨量转移头,包括:记忆合金基底以及固定在所述记忆合金基底第一表面的多个电子元件拾取头;在相同温度下,任意相邻两个所述电子元件拾取头之间的中心距相等;In the first aspect, the present application provides a mass transfer head for electronic components, including: a memory alloy substrate and a plurality of electronic component pick-up heads fixed on the first surface of the memory alloy substrate; at the same temperature, any two adjacent The center-to-center distances between the electronic component pickup heads are equal;

所述记忆合金基底随温度的变化而发生形变,当温度升高时,所述记忆合金基底拉伸,任意相邻两个所述电子元件拾取头之间的中心距变大;当温度降低时,所述记忆合金基底收缩,任意相邻两个所述电子元件拾取头之间的中心距变小。The memory alloy substrate deforms as the temperature changes, and when the temperature rises, the memory alloy substrate stretches, and the center-to-center distance between any two adjacent electronic component pick-up heads becomes larger; when the temperature decreases , the memory alloy substrate shrinks, and the center-to-center distance between any two adjacent electronic component pick-up heads becomes smaller.

第二方面,本申请提供一种基于上述电子元件巨量转移头的电子元件巨量转移方法,包括:In the second aspect, the present application provides a mass transfer method of electronic components based on the mass transfer head of electronic components, including:

在常温的初始状态下缓慢升高温度,使得电子元件巨量转移头中的记忆合金基底拉伸,并将温度控制在T1,使得任意相邻两个电子元件拾取头之间的中心距D1与位于转运基板上的任意相邻两个电子元件的之间的中心距D0相等;Slowly increase the temperature in the initial state of normal temperature, so that the memory alloy substrate in the electronic component mass transfer head is stretched, and the temperature is controlled at T1, so that the center distance D1 between any two adjacent electronic component pick-up heads is equal to The center-to-center distance D0 between any two adjacent electronic components on the transfer substrate is equal;

保持温度T1,将所述电子元件巨量转移头移动至所述转运基板朝向所述电子元件的一侧,使得所述电子元件拾取头和所述电子元件位于所述记忆合金基底与所述转运基板之间,并使得所述电子元件转移头位于所述电子元件的正上方;Maintaining the temperature T1, moving the electronic component mass transfer head to the side of the transfer substrate facing the electronic component, so that the electronic component pick-up head and the electronic component are located between the memory alloy substrate and the transfer substrate. between the substrates, so that the electronic component transfer head is located directly above the electronic component;

保持温度T1,将所述电子元件巨量转移头朝向所述电子元件移动,利用所述电子元件拾取头拾取所述电子元件,使所述电子元件从所述转运基板脱离;Maintaining the temperature T1, moving the electronic component mass transfer head towards the electronic component, using the electronic component pickup head to pick up the electronic component, and detaching the electronic component from the transfer substrate;

缓慢升高温度,使得记忆合金基底再次拉伸,并将温度控制在T2,使得携带有所述电子元件的任意相邻两个电子元件拾取头之间的中心距增大为D2;Slowly increase the temperature so that the memory alloy substrate is stretched again, and control the temperature at T2, so that the center-to-center distance between any two adjacent electronic component pick-up heads carrying the electronic component increases to D2;

将携带有所述电子元件的所述电子元件巨量转移头移动至阵列基板的正上方,朝向所述阵列基板移动所述电子元件巨量转移头,将各所述电子元件绑定于所述阵列基板上,使所述电子元件与所述电子元件巨量转移头分离;moving the electronic component mass transfer head carrying the electronic components directly above the array substrate, moving the electronic component mass transfer head toward the array substrate, and binding each of the electronic components to the On the array substrate, the electronic component is separated from the mass transfer head of the electronic component;

降低温度,使得电子元件巨量转移头中的记忆合金基底收缩。Lowering the temperature causes the memory alloy substrate in the mass transfer head of electronic components to shrink.

与现有技术相比,本发明提供的电子元件巨量转移头及转移方法,至少实现了如下的有益效果:Compared with the prior art, the electronic component mass transfer head and transfer method provided by the present invention at least achieve the following beneficial effects:

本申请所提供的电子元件巨量转移头及转移方法中,在转移头中引入了记忆合金基底以及固定在记忆合金基底第一表面的多个电子元件拾取头,该记忆合金基底能够随温度的变化而发生形变,温度升高时,记忆合金基底将会拉伸,使得电子元件拾取头之间的中心距变大;当降低温度时,记忆合金基底将会收缩,使电子元件拾取头之间的中心距变小。如此,通过调节温度,即可调节记忆合金基底上固定的电子元件拾取头之间的间距,灵活适用于不同的Micro-LED pitch和pixel pitch,有效避免出现Micro-LED资源浪费的情形。In the electronic component mass transfer head and transfer method provided by the present application, a memory alloy substrate and a plurality of electronic component pick-up heads fixed on the first surface of the memory alloy substrate are introduced into the transfer head, and the memory alloy substrate can change with temperature. Change and deformation, when the temperature rises, the memory alloy substrate will stretch, making the center distance between the electronic component pick-up heads larger; when the temperature is lowered, the memory alloy substrate will shrink, making the electronic component pick-up heads The center distance becomes smaller. In this way, by adjusting the temperature, the distance between the fixed electronic component pick-up heads on the memory alloy substrate can be adjusted, which is flexibly applicable to different Micro-LED pitches and pixel pitches, effectively avoiding the waste of Micro-LED resources.

当然,实施本发明的任一产品必不特定需要同时达到以上所述的所有技术效果。Of course, any product implementing the present invention does not necessarily need to achieve all the above-mentioned technical effects at the same time.

通过以下参照附图对本发明的示例性实施例的详细描述,本发明的其它特征及其优点将会变得清楚。Other features of the present invention and advantages thereof will become apparent from the following detailed description of exemplary embodiments of the present invention with reference to the accompanying drawings.

附图说明Description of drawings

被结合在说明书中并构成说明书的一部分的附图示出了本发明的实施例,并且连同其说明一起用于解释本发明的原理。The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention.

图1所述为本申请实施例所提供的电子元件巨量转移头的一种俯视图;FIG. 1 is a top view of a mass transfer head for electronic components provided by an embodiment of the present application;

图2所示为图1所提供的电子元件巨量转移头的一种AA’截面图;Fig. 2 shows a kind of AA' sectional view of the mass transfer head of electronic components provided in Fig. 1;

图3所示为TiNi合金作为记忆合金基底时温度与形变量的一种对应关系图;Fig. 3 shows a kind of correspondence diagram of temperature and deformation when TiNi alloy is used as memory alloy substrate;

图4所示为图1所提供的电子元件巨量转移头的另一种AA’截面图;Fig. 4 shows another kind of AA' sectional view of the mass transfer head of electronic components provided in Fig. 1;

图5所示为图1所提供的电子元件巨量转移头的另一种AA’截面图;Fig. 5 shows another kind of AA' sectional view of the mass transfer head of electronic components provided in Fig. 1;

图6所示为本申请实施例所提供的电子元件巨量转移方法的一种流程图;FIG. 6 is a flow chart of a mass transfer method for electronic components provided by an embodiment of the present application;

图7所示为记忆合金基底拉伸后的一种示意图;Figure 7 shows a schematic diagram of the memory alloy substrate after stretching;

图8所示为位于转运基板上的电子元件的一种结构示意图;FIG. 8 is a schematic structural view of an electronic component located on a transfer substrate;

图9所示为电子元件巨量转移头与转运基板上的电子元件的一种相对位置关系图;Fig. 9 is a diagram showing a relative positional relationship between the mass transfer head of electronic components and the electronic components on the transfer substrate;

图10所示为电子元件拾取头拾取电子元件的一种结构示意图;Fig. 10 shows a schematic structural view of picking up electronic components by an electronic component pick-up head;

图11所示为将携带有电子元件的记忆合金基底拉伸后的一种结构示意图;Fig. 11 shows a schematic diagram of the structure after stretching the memory alloy substrate carrying the electronic components;

图12所示为将电子元件转移至阵列基板上的一种结构示意图。FIG. 12 is a schematic diagram of the structure of transferring electronic components to an array substrate.

具体实施方式Detailed ways

现在将参照附图来详细描述本发明的各种示例性实施例。应注意到:除非另外具体说明,否则在这些实施例中阐述的部件和步骤的相对布置、数字表达式和数值不限制本发明的范围。Various exemplary embodiments of the present invention will now be described in detail with reference to the accompanying drawings. It should be noted that the relative arrangements of components and steps, numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present invention unless specifically stated otherwise.

以下对至少一个示例性实施例的描述实际上仅仅是说明性的,决不作为对本发明及其应用或使用的任何限制。The following description of at least one exemplary embodiment is merely illustrative in nature and in no way taken as limiting the invention, its application or uses.

对于相关领域普通技术人员已知的技术、方法和设备可能不作详细讨论,但在适当情况下,所述技术、方法和设备应当被视为说明书的一部分。Techniques, methods and devices known to those of ordinary skill in the relevant art may not be discussed in detail, but where appropriate, such techniques, methods and devices should be considered part of the description.

在这里示出和讨论的所有例子中,任何具体值应被解释为仅仅是示例性的,而不是作为限制。因此,示例性实施例的其它例子可以具有不同的值。In all examples shown and discussed herein, any specific values should be construed as exemplary only, and not as limitations. Therefore, other instances of the exemplary embodiment may have different values.

应注意到:相似的标号和字母在下面的附图中表示类似项,因此,一旦某一项在一个附图中被定义,则在随后的附图中不需要对其进行进一步讨论。It should be noted that like numerals and letters denote like items in the following figures, therefore, once an item is defined in one figure, it does not require further discussion in subsequent figures.

现有技术中,Micro-LED在生长基底上生长完成后,将切割成周期性排布的多个Micro-LED元件,Micro-LED之前的间距(即Micro-LED pitch)是固定的,然后将整面Micro-LED元件批量转移到转运基板上,最后利用拾取头将转运基板上的Micro-LED元件转移到阵列基板上,从而实现了向阵列基板转移Micro-LED的过程。通常,一个拾取头对应拾取一个Micro-LED,拾取头的pitch(即相邻两个拾取头之间的间距)是固定的,且拾取头的pitch与显示面板上显示像素的pixel pitch保持一致,但是生长基底和转运基板上的Micro-LEDpitch与显示像素的pixel pitch是不同的,通常Micro-LED pitch=pixel pitch/n(n为大于1的整数),因此拾取头在拾取转运基板上的Micro-LED时,只能拾取到转运基板上的部分Micro-LED,剩余部分的Micro-LED将被浪费,因而会造成LED资源的浪费。In the prior art, after the growth of the Micro-LED on the growth substrate is completed, it will be cut into a plurality of Micro-LED elements arranged periodically. The entire surface of Micro-LED components is transferred to the transfer substrate in batches, and finally the Micro-LED components on the transfer substrate are transferred to the array substrate by using the pick-up head, thus realizing the process of transferring Micro-LEDs to the array substrate. Usually, one pick-up head corresponds to pick up a Micro-LED, the pitch of the pick-up head (that is, the distance between two adjacent pick-up heads) is fixed, and the pitch of the pick-up head is consistent with the pixel pitch of the display pixel on the display panel. However, the Micro-LED pitch on the growth substrate and the transfer substrate is different from the pixel pitch of the display pixel. Usually, the Micro-LED pitch=pixel pitch/n (n is an integer greater than 1), so the pickup head can pick up the Micro-LED pitch on the transfer substrate. -LEDs, only part of the Micro-LEDs on the transfer substrate can be picked up, and the rest of the Micro-LEDs will be wasted, resulting in a waste of LED resources.

有鉴于此,本发明提供了一种电子元件巨量转移头及转移方法,通过调节温度,即可调节记忆合金基底上固定的电子元件拾取头之间的间距,灵活适用于不同的Micro-LEDpitch和pixel pitch,有效避免出现Micro-LED资源浪费的情形。In view of this, the present invention provides a mass transfer head and transfer method for electronic components. By adjusting the temperature, the distance between the pick-up heads of electronic components fixed on the memory alloy substrate can be adjusted, which is flexibly applicable to different Micro-LED pitches. and pixel pitch, effectively avoiding the waste of Micro-LED resources.

以下将结合附图和具体实施例进行详细说明。The following will describe in detail with reference to the drawings and specific embodiments.

图1所述为本申请实施例所提供的电子元件巨量转移头的一种俯视图,图2所示为图1所提供的电子元件巨量转移头的一种AA’截面图,请结合图1和图2,本申请提供一种电子元件巨量转移头100,包括:记忆合金基底10以及固定在记忆合金基底10第一表面的多个电子元件拾取头20;在相同温度下,任意相邻两个电子元件拾取头20之间的中心距相等;Figure 1 is a top view of the electronic component mass transfer head provided by the embodiment of the present application, and Figure 2 is a AA' cross-sectional view of the electronic component mass transfer head provided in Figure 1, please refer to the figure 1 and FIG. 2, the present application provides a mass transfer head 100 for electronic components, including: a memory alloy substrate 10 and a plurality of electronic component pick-up heads 20 fixed on the first surface of the memory alloy substrate 10; The center-to-center distance between two adjacent electronic component pick-up heads 20 is equal;

记忆合金基底10随温度的变化而发生形变,当温度升高时,记忆合金基底10拉伸,任意相邻两个电子元件拾取头20之间的中心距变大;当温度降低时,记忆合金基底10收缩,任意相邻两个电子元件拾取头20之间的中心距变小。The memory alloy substrate 10 deforms with the change of temperature. When the temperature rises, the memory alloy substrate 10 stretches, and the center distance between any two adjacent electronic component pick-up heads 20 becomes larger; when the temperature decreases, the memory alloy substrate 10 stretches. The substrate 10 shrinks, and the center-to-center distance between any two adjacent electronic component pick-up heads 20 becomes smaller.

需要说明的是,图1仅示意性地给出了电子元件巨量转移头100上包括多个电子元件拾取头20的情形,图2也仅示意性给出了电子元件拾取头20与记忆合金基底10的一种相对位置关系,均并不代表实际的尺寸和数量。另外,电子元件拾取头20的也可根据实际情况灵活设定,图1和图2仅为示意性说明。It should be noted that FIG. 1 only schematically shows the situation that a plurality of electronic component pick-up heads 20 are included on the electronic component mass transfer head 100, and FIG. A relative positional relationship of the base 10 does not represent the actual size and quantity. In addition, the electronic component pick-up head 20 can also be flexibly set according to the actual situation, and FIG. 1 and FIG. 2 are only schematic illustrations.

具体地,请继续参见图1和图2,本申请实施例所提供的电子元件巨量转移头100中,引入了记忆合金基底10以及固定在记忆合金基底10第一表面的多个电子元件拾取头20,在某一固定温度下,任意相邻两个电子元件拾取头20之间的中心距相等且保持不变。特别是,上述记忆合金基底10能够随温度的变化而发生形变,温度升高时,记忆合金基底10将会拉伸,使得电子元件拾取头20之间的中心距变大;当降低温度时,记忆合金基底10将会收缩,使电子元件拾取头20之间的中心距变小。比如,在利用上述电子元件巨量转移头100转移Micro-LED时,可保持温度至某一特定温度,记忆合金基底10发生拉伸或收缩,使得电子元件拾取头20之间的中心距与位于转运基板50上的Micro-LED之间的中心距保持相等,如此,电子元件拾取头20即可一一对应地对Micro-LED进行拾取,不会造成转运基板50上Micro-LED资源的浪费。当利用电子元件巨量转移头100将Micro-LED转移至阵列基板上时,可根据阵列基板上的显示像素间距pixel pitch,通过调节温度的方式来灵活调节转移头100上相邻电子元件拾取头20之间的中心距,使二者保持相等,如此即可将Micro-LED精确地批量转移至阵列基板上。因此,本申请采用记忆合金基底10的转移头100,可适用于不同间距要求的Micro-LED的巨量转移,通过调节温度即可灵活调节记忆合金基底10上固定的电子元件拾取头20之间的间距,既能够适用于不同的Micro-LED pitch和pixel pitch,又能够有效避免出现Micro-LED资源浪费的情形。Specifically, please continue to refer to FIG. 1 and FIG. 2. In the electronic component mass transfer head 100 provided by the embodiment of the present application, a memory alloy substrate 10 and a plurality of electronic components fixed on the first surface of the memory alloy substrate 10 are introduced to pick up For the heads 20, at a certain fixed temperature, the center-to-center distance between any two adjacent electronic component pick-up heads 20 is equal and remains unchanged. In particular, the above-mentioned memory alloy substrate 10 can be deformed with the change of temperature. When the temperature rises, the memory alloy substrate 10 will be stretched, so that the center distance between the electronic component pick-up heads 20 becomes larger; when the temperature is lowered, The memory alloy substrate 10 will shrink, so that the center-to-center distance between the pick-up heads 20 for electronic components becomes smaller. For example, when using the electronic component mass transfer head 100 to transfer Micro-LEDs, the temperature can be kept at a certain temperature, and the memory alloy substrate 10 is stretched or shrunk, so that the center distance between the electronic component pick-up heads 20 and the The center-to-center distances between the Micro-LEDs on the transfer substrate 50 are kept equal, so that the electronic component pick-up head 20 can pick up the Micro-LEDs one by one without causing waste of Micro-LED resources on the transfer substrate 50 . When using the mass transfer head 100 for electronic components to transfer Micro-LEDs to the array substrate, the pick-up heads for adjacent electronic components on the transfer head 100 can be flexibly adjusted by adjusting the temperature according to the display pixel pitch on the array substrate The center-to-center distance of 20 keeps the two equal, so that the Micro-LEDs can be accurately transferred to the array substrate in batches. Therefore, this application adopts the transfer head 100 of the memory alloy substrate 10, which can be applied to the mass transfer of Micro-LEDs with different spacing requirements, and can be flexibly adjusted between the electronic component pick-up heads 20 fixed on the memory alloy substrate 10 by adjusting the temperature. The spacing can not only be applicable to different Micro-LED pitches and pixel pitches, but also can effectively avoid the waste of Micro-LED resources.

本申请实施例所提供的电子元件巨量转移头100中,电子元气拾取头20拾取Micro-LED的方法包括静电力吸附法、范德华力吸附法、电磁力吸附法等等,这些方法能够将巨量的Micro-LED精确吸附,再转移到目标阵列基板,并精确释放。In the mass transfer head 100 for electronic components provided in the embodiment of the present application, the methods for picking up Micro-LEDs by the electronic energy pick-up head 20 include electrostatic force adsorption, van der Waals force adsorption, electromagnetic force adsorption, etc. A certain amount of Micro-LED is precisely adsorbed, then transferred to the target array substrate, and released precisely.

可选地,本申请实施例所提供的电子元件巨量转移头100中,记忆合金基底10包括Au-Cd、Ag-Cd、Cu-Zn、Cu-Zn-Al、Cu-Zn-Sn、Cu-Zn-Si、Cu-Sn、Cu-Zn-Ga、In-Ti、Au-Cu-Zn、NiAl、Fe-Pt、Ti-Ni、Ti-Ni-Pd、Ti-Nb、U-Nb和Fe-Mn-Si中的至少一种。Optionally, in the electronic component mass transfer head 100 provided in the embodiment of the present application, the memory alloy substrate 10 includes Au-Cd, Ag-Cd, Cu-Zn, Cu-Zn-Al, Cu-Zn-Sn, Cu -Zn-Si, Cu-Sn, Cu-Zn-Ga, In-Ti, Au-Cu-Zn, NiAl, Fe-Pt, Ti-Ni, Ti-Ni-Pd, Ti-Nb, U-Nb and Fe - at least one of Mn-Si.

具体地,当采用采用上述材料中的一种或者几种的组合形成记忆合金基底10时,使得记忆合金基底10具备了双程记忆效应,在加热时回复高温相形状,冷却时又能恢复低温相形状,因此通过控制温度升高或降低,即可控制记忆合金基底10的拉伸或收缩,进而控制相邻电子元件拾取头20之间的中心距的增大或缩小,实现了拾取头20之间中心距灵活调整的功能。Specifically, when the memory alloy substrate 10 is formed by using one or a combination of several of the above materials, the memory alloy substrate 10 has a two-way memory effect, which restores the high-temperature phase shape when heated, and restores the low-temperature phase when cooled. Therefore, by controlling the temperature increase or decrease, the stretching or shrinkage of the memory alloy substrate 10 can be controlled, and then the increase or decrease of the center-to-center distance between the adjacent electronic component pickup heads 20 can be controlled, realizing the pickup head 20 The function of flexible adjustment of the center distance between them.

以Ti-Ni合金为例,在不同温度下,其形变量有所不同,图3所示为TiNi合金作为记忆合金基底10时温度与形变量的一种对应关系图,当温度为50℃时,其形变量为20%,当温度升高到200℃时,其形变量为80%。需要说明的是,本申请中的形变量指的是尺寸变化量,假如记忆合金基底的初始长度为1米,形变20%代表其长度变成了1.2米。Taking Ti-Ni alloy as an example, its deformation is different at different temperatures. Figure 3 shows a corresponding relationship between temperature and deformation when TiNi alloy is used as the memory alloy substrate 10. When the temperature is 50°C , its deformation is 20%, and when the temperature rises to 200°C, its deformation is 80%. It should be noted that the amount of deformation in this application refers to the amount of dimensional change. If the initial length of the memory alloy substrate is 1 meter, the deformation of 20% means that its length has become 1.2 meters.

可选地,本申请实施例所提供的电子元件巨量转移头100中,记忆合金基底10的厚度为H,其中,m*10nm≤H≤n*103nm,其中,1≤m≤10,1≤n≤10。Optionally, in the mass transfer head 100 for electronic components provided in the embodiment of the present application, the thickness of the memory alloy substrate 10 is H, where m*10nm≤H≤n*10 3 nm, where 1≤m≤10 , 1≤n≤10.

本申请中,电子元件拾取头20固定在记忆合金基底10的第一表面,该记忆合金基底10还包括与第一表面相对的第二表面,本申请实施例所提及的记忆合金基底10的厚度H指的是第一表面和第二表面之间的垂直距离。当m*10nm≤H≤n*103nm,1≤m≤10,1≤n≤10时,相当于本申请将记忆合金基底10的厚度设置在几十nm到几微米之间,处于此种厚度范围之内的记忆合金基底10,能够灵敏的感知到环境温度的变化,从而能够精确地带动电子元件拾取头20发生拉伸或收缩,进而调整相邻电子元件拾取头20之间的中心距,使其满足被抓取Micro-LED的间距要求以及阵列基板上显示像素之间的间距要求。In the present application, the electronic component pick-up head 20 is fixed on the first surface of the memory alloy substrate 10, and the memory alloy substrate 10 also includes a second surface opposite to the first surface. The memory alloy substrate 10 mentioned in the embodiment of the present application Thickness H refers to the vertical distance between the first surface and the second surface. When m*10nm≤H≤n*10 3 nm, 1≤m≤10, 1≤n≤10, it is equivalent to setting the thickness of the memory alloy substrate 10 in the present application to be between tens of nm and several microns. The memory alloy substrate 10 within a thickness range can sensitively perceive the change of the ambient temperature, thereby accurately driving the electronic component pick-up head 20 to stretch or shrink, and then adjust the center between the adjacent electronic component pick-up heads 20 pitch, so that it meets the pitch requirements of the captured Micro-LED and the pitch requirements between display pixels on the array substrate.

可选地,本申请实施例所提供的电子元件巨量转移头100中,电子元件拾取头20与记忆合金基底10采用相同的材料一体成型。Optionally, in the electronic component mass transfer head 100 provided in the embodiment of the present application, the electronic component pick-up head 20 and the memory alloy substrate 10 are integrally formed using the same material.

具体地,将本申请中的电子元件拾取头20与记忆合金基底10采用相同的材料一体成型时,在同一制作工序中即可完成记忆合金基底10和电子元件拾取头20的制作,无需为电子元件拾取头20单独设置专门的生产工序,因而有利于简化电子元件巨量转移头100的生产工序,提高生产效率。Specifically, when the electronic component pick-up head 20 and the memory alloy base 10 in the present application are integrally molded using the same material, the memory alloy base 10 and the electronic component pick-up head 20 can be completed in the same manufacturing process, and there is no need for electronic components. The component pick-up head 20 is independently provided with a special production process, which is beneficial to simplify the production process of the electronic component mass transfer head 100 and improve production efficiency.

需要说明的是,当采用静电力吸附法、范德华力吸附法、电磁力吸附法等方法转移巨量Micro-LED时,即使将电子元件拾取头20与记忆合金基底10采用相同的材料制成,在温度发生变化的过程中,虽然拾取头20的体积也会发生变化,但其体积变化幅度较小,并不会影响电子元件拾取头20和吸附在其上的Micro-LED之间的吸附作用力,因此Micro-LED并不会由于电子元件拾取头20体积的变化而从电子元件拾取头20上发生脱落的现象,仍能够实现Micro-LED的可靠转移。It should be noted that when a large amount of Micro-LEDs are transferred by electrostatic force adsorption, van der Waals force adsorption, electromagnetic force adsorption, etc., even if the electronic component pick-up head 20 and the memory alloy substrate 10 are made of the same material, During the process of temperature change, although the volume of the pick-up head 20 will also change, the magnitude of the volume change is small, and will not affect the adsorption between the pick-up head 20 of the electronic component and the Micro-LED adsorbed thereon Therefore, the Micro-LED will not fall off from the electronic component pick-up head 20 due to the volume change of the electronic component pick-up head 20, and the reliable transfer of the Micro-LED can still be achieved.

当然,本申请将记忆合金基底10和电子元件拾取头20采用相同的材料一体成型的方式仅是一种优选的实施例,在本申请的一些其他实施例中,电子元件拾取头20也可与记忆合金基底10分开制作,然后再将二者固定。拾取头20的材质也可与记忆合金基底10不同,可以使用弹性的材料,具备一定的伸缩性,也可以采用其他的材料做成,例如金属材料等,本申请对此不进行具体限定。Of course, it is only a preferred embodiment that the memory alloy substrate 10 and the electronic component pick-up head 20 are integrally molded with the same material in this application. In some other embodiments of the application, the electronic component pick-up head 20 can also be combined with The memory alloy substrate 10 is made separately, and then the two are fixed. The material of the pick-up head 20 can also be different from that of the memory alloy substrate 10. It can be made of an elastic material with a certain degree of stretchability, or it can be made of other materials, such as metal materials, which are not specifically limited in this application.

可选地,图4所示为图1所提供的电子元件巨量转移头100的另一种AA’截面图,本申请实施例所提供的电子元件巨量转移头100还包括弹性基底30,弹性基底30位于记忆合金基底10的第二表面;Optionally, FIG. 4 is another AA' cross-sectional view of the mass transfer head 100 for electronic components provided in FIG. The elastic base 30 is located on the second surface of the memory alloy base 10;

弹性基底30的最大形变量大于或者等于记忆合金基底10的形变量。The maximum deformation of the elastic substrate 30 is greater than or equal to the deformation of the memory alloy substrate 10 .

具体地,作为本申请的另一种实施例,电子元件巨量转移头100中,在记忆合金基底10远离电子元件拾取头20的一侧还设置有弹性基底30,该弹性基底30的存在能够对记忆合金基底10启动一定的保护作用,在实际制作过程中,记忆合金基底10可通过正常的蒸镀方式蒸镀到弹性基底30上,或者通过PVD成面膜的方式覆盖到弹性基底30上,以使二者之间形成较强的粘附力。本在记忆合金基底10发生形变的过程中,弹性基底30也能一同发生形变,申请将弹性基底30的最大形变量设置的大于或等于记忆合金基底10的形变量时,能够确保弹性基底30不会对记忆合金基底10的形变过程造成阻碍。Specifically, as another embodiment of the present application, in the mass transfer head 100 for electronic components, an elastic substrate 30 is also provided on the side of the memory alloy substrate 10 away from the pick-up head 20 for electronic components. The existence of the elastic substrate 30 can Start a certain protective effect on the memory alloy substrate 10. In the actual production process, the memory alloy substrate 10 can be evaporated on the elastic substrate 30 by normal evaporation, or covered on the elastic substrate 30 by PVD forming a film. In order to form a stronger adhesion between the two. In the process of deformation of the memory alloy substrate 10, the elastic substrate 30 can also deform together. When the application sets the maximum deformation of the elastic substrate 30 to be greater than or equal to the deformation of the memory alloy substrate 10, it can ensure that the elastic substrate 30 does not It will hinder the deformation process of the memory alloy substrate 10 .

可选地,图5所示为图1所提供的电子元件巨量转移头的另一种AA’截面图,本申请实施例所提供的电子元件巨量转移头中,在记忆合金基底10远离电子元件拾取头20的一侧还设置有加热电极80,该加热电极80与记忆合金基底10直接接触,且均匀覆盖于记忆合金基底远离电子元件拾取头20的一侧,当需要对记忆合金基底10加热时,可通过上述加热电极80控制记忆合金基底10进行加热。需要说明的是,将加热电极采用整面覆盖的方式设置在记忆合金基底10的一侧时,能够实现对记忆合金基底的均匀加热功能,避免记忆合金基底出现受热不均而发生不规则膨胀的现象。Optionally, FIG. 5 shows another AA' sectional view of the electronic component mass transfer head provided in FIG. 1. In the electronic component mass transfer head provided in the embodiment of the present application, the memory alloy substrate 10 One side of the electronic component pick-up head 20 is also provided with a heating electrode 80, which is in direct contact with the memory alloy substrate 10 and uniformly covers the side of the memory alloy substrate away from the electronic component pick-up head 20. 10 is heated, the memory alloy substrate 10 can be controlled by the heating electrode 80 to be heated. It should be noted that when the heating electrode is arranged on one side of the memory alloy substrate 10 in a manner covering the entire surface, the uniform heating function of the memory alloy substrate can be realized, and the phenomenon of irregular expansion due to uneven heating of the memory alloy substrate can be avoided. Phenomenon.

可选地,在常温条件下,加热电极80的面积可设置得大于记忆合金基底10的面积,以确保即使记忆合金基底10在受热发生膨胀后,加热电极80仍能够将记忆合金基底10覆盖,避免出现记忆合金基底10的部分区域未被加热电极80覆盖而出现受热不均的现象。此外,为使得记忆合金基底10受热均匀,还可在加热电极80和记忆合金基底10之间加入均热材料,例如石墨等,以使得记忆合金基底更为均匀地感知温度的变化。Optionally, under normal temperature conditions, the area of the heating electrode 80 can be set larger than the area of the memory alloy substrate 10, to ensure that even after the memory alloy substrate 10 expands when heated, the heating electrode 80 can still cover the memory alloy substrate 10, This avoids the phenomenon that part of the memory alloy substrate 10 is not covered by the heating electrode 80 and thus unevenly heated. In addition, in order to make the memory alloy substrate 10 evenly heated, a heat equalizing material, such as graphite, can also be added between the heating electrode 80 and the memory alloy substrate 10, so that the memory alloy substrate can sense temperature changes more uniformly.

进一步地,请继续参考图5,在加热电极80上设置有开口,记忆合金基底10通过加热电极80的开口与机械轴11连接,机械轴11用于控制记忆合金10的移动。由于加热电极80和记忆合金10的热膨胀系数不同,在不同的温度下,两者的体积膨胀量也不同,因此加热电极80和记忆合金10不能机械结合,以避免机体膨胀量不同造成相互之间的错位。因此,可以将加热电极80和记忆合金10进行非机械连接,例如仅表面接触,即使两者膨胀量不同,也能够保证表面接触。加热电极80可以电连接至外部控制电路。Further, please continue to refer to FIG. 5 , an opening is provided on the heating electrode 80 , the memory alloy substrate 10 is connected to the mechanical shaft 11 through the opening of the heating electrode 80 , and the mechanical shaft 11 is used to control the movement of the memory alloy 10 . Since the heating electrode 80 and the memory alloy 10 have different coefficients of thermal expansion, at different temperatures, the volume expansion of the two is also different, so the heating electrode 80 and the memory alloy 10 cannot be mechanically combined, so as to avoid the difference in body expansion and cause mutual dislocation. Therefore, the heating electrode 80 and the memory alloy 10 can be connected non-mechanically, such as only in surface contact, and even if the two expansions are different, the surface contact can be guaranteed. The heater electrode 80 may be electrically connected to an external control circuit.

需要说明的是,图5仅给出了对记忆合金基底进行加热的一种实现方式,在本申请的一些其他实施例中,还可采用其他的方式对记忆合金基底进行加热。例如,可将电子元件巨量转移头整体置于一密封空间中,可通过控制该密封空间的温度的方式来实现对记忆合金基底的加热。It should be noted that FIG. 5 only shows an implementation manner of heating the memory alloy substrate, and in some other embodiments of the present application, other manners may also be used to heat the memory alloy substrate. For example, the mass transfer head for electronic components can be placed in a sealed space as a whole, and the temperature of the sealed space can be controlled to heat the memory alloy substrate.

当然,在本申请的一些其他实施例中,电子元件巨量转移头还可包括与记忆合金基底连接的温度感应元件,以用来探测记忆合金基底的实时温度,从而使得记忆合金基底的拉伸或者收缩的程度更为可控,从而使得电子元件拾取头能够更为精确地实现对电子元件的拾取与绑定。Of course, in some other embodiments of the present application, the mass transfer head of electronic components may also include a temperature sensing element connected to the memory alloy substrate to detect the real-time temperature of the memory alloy substrate, so that the stretching of the memory alloy substrate Or the degree of shrinkage is more controllable, so that the electronic component pick-up head can more accurately pick up and bind the electronic components.

基于同一发明构思,本申请还提供一种基于上述电子元件巨量转移头100的电子元件巨量转移方法,请参见图6,图6所示为本申请实施例所提供的电子元件巨量转移方法的一种流程图,该转移方法包括:Based on the same inventive concept, the present application also provides a mass transfer method of electronic components based on the electronic component mass transfer head 100, please refer to FIG. 6, which shows the mass transfer of electronic components provided by the embodiment of the present application A flow chart of a method, the transfer method comprising:

步骤101、在常温的初始状态下缓慢升高温度,使得电子元件巨量转移头100中的记忆合金基底10拉伸,并将温度控制在T1,使得任意相邻两个电子元件拾取头20之间的中心距D1与位于转运基板50上的任意相邻两个电子元件的之间的中心距D0相等,请参见图7和图8,图7所示为记忆合金基底10拉伸后的一种示意图,图8所示为位于转运基板50上的电子元件60的一种结构示意图,此处的电子元件60例如可以是Micro-LED;Step 101. Slowly increase the temperature in the initial state of normal temperature, so that the memory alloy substrate 10 in the electronic component mass transfer head 100 is stretched, and the temperature is controlled at T1, so that any two adjacent electronic component pick-up heads 20 The center-to-center distance D1 between them is equal to the center-to-center distance D0 between any two adjacent electronic components located on the transfer substrate 50. Please refer to FIGS. 7 and 8. FIG. A schematic diagram, FIG. 8 is a schematic structural diagram of an electronic component 60 located on a transfer substrate 50, where the electronic component 60 may be, for example, a Micro-LED;

步骤102、请参见图9,保持温度T1,将电子元件巨量转移头100移动至转运基板50朝向电子元件的一侧,使得电子元件拾取头20和电子元件60位于记忆合金基底10与转运基板50之间,并使得电子元件转移头100位于电子元件60的正上方,图9所示为电子元件巨量转移头100与转运基板50上的电子元件的一种相对位置关系图;Step 102, please refer to FIG. 9 , keep the temperature T1, and move the mass transfer head 100 of the electronic component to the side of the transfer substrate 50 facing the electronic component, so that the electronic component pick-up head 20 and the electronic component 60 are located between the memory alloy substrate 10 and the transfer substrate 50, so that the electronic component transfer head 100 is located directly above the electronic component 60, FIG. 9 shows a relative positional relationship between the electronic component mass transfer head 100 and the electronic components on the transfer substrate 50;

步骤103、请参见图10,保持温度T1,将电子元件巨量转移头100朝向电子元件60移动,利用电子元件拾取头20拾取电子元件60,使电子元件60从转运基板50脱离,图10所示为电子元件拾取头20拾取电子元件的一种结构示意图;Step 103, please refer to FIG. 10 , keep the temperature T1, move the electronic component bulk transfer head 100 towards the electronic component 60, and use the electronic component pick-up head 20 to pick up the electronic component 60, so that the electronic component 60 is separated from the transfer substrate 50, as shown in FIG. 10 Shown as a structural schematic diagram of electronic component pickup head 20 picking up electronic components;

步骤104、请参见图11,缓慢升高温度,使得记忆合金基底10再次拉伸,并将温度控制在T2,使得携带有电子元件的任意相邻两个电子元件拾取头20之间的中心距增大为D2,图11所示为将携带有电子元件的记忆合金基底10拉伸后的一种结构示意图;Step 104, please refer to FIG. 11, slowly increase the temperature, so that the memory alloy substrate 10 is stretched again, and control the temperature at T2, so that the center-to-center distance between any two adjacent electronic component pick-up heads 20 carrying electronic components Increased to D2, Figure 11 shows a schematic structural view of the memory alloy substrate 10 carrying the electronic components after being stretched;

步骤105、请参见图12,将携带有电子元件的电子元件巨量转移头100移动至阵列基板90的正上方,朝向阵列基板90移动电子元件巨量转移头100,将各电子元件60绑定于阵列基板90上,使电子元件60与电子元件巨量转移头100分离,图12所示为将电子元件转移至阵列基板90上的一种结构示意图;Step 105, please refer to FIG. 12 , move the electronic component mass transfer head 100 carrying the electronic components directly above the array substrate 90, move the electronic component mass transfer head 100 toward the array substrate 90, and bind the electronic components 60 On the array substrate 90, the electronic component 60 is separated from the mass transfer head 100 of the electronic component. FIG. 12 is a schematic structural diagram of transferring the electronic component to the array substrate 90;

步骤106、降低温度,使得电子元件巨量转移头100中的记忆合金基底10收缩。Step 106 , lowering the temperature so that the memory alloy substrate 10 in the electronic component mass transfer head 100 shrinks.

具体地,请结合图6至图12,本申请在利用电子元件巨量转移头100转移电子元件之前,首先通过调节温度,使得记忆合金基底10拉伸,并使相邻电子元件拾取头20之间的中心距D1与转运基板50上的相邻电子元件之间的中心距D0相等,如此,在拾取电子元件60的过程中,例如请参见8,拾取头20与转运基板50上的电子元件上下一一对应,整片的电子元件将能够一次性通过电子元件巨量转移头100进行转移,因此避免造成LED资源浪费的现象。在将电子元件吸附到拾取头20上后,再次通过调节温度的方式来调节电子元件拾取头20之间的中心距,使其电子元件拾取头20之间的中心距变为D2,与阵列基板90上显示像素之间的中心距保持一致,然后即可将各电子元件精确转移到阵列基板90上。如此,通过调节温度,即可调节记忆合金基底10上固定的电子元件拾取头20之间的间距,灵活适用于不同的Micro-LED pitch和pixel pitch,有效避免出现Micro-LED资源浪费的情形。Specifically, please refer to FIG. 6 to FIG. 12 , before the electronic component mass transfer head 100 is used to transfer electronic components, the application first adjusts the temperature so that the memory alloy substrate 10 is stretched, and the pick-up heads 20 of adjacent electronic components are stretched. The center-to-center distance D1 between them is equal to the center-to-center distance D0 between adjacent electronic components on the transfer substrate 50. In this way, in the process of picking up the electronic components 60, for example, refer to 8, the pickup head 20 and the electronic components on the transfer substrate 50 With a one-to-one correspondence, the entire electronic component can be transferred through the electronic component mass transfer head 100 at one time, thus avoiding the waste of LED resources. After the electronic components are adsorbed onto the pick-up heads 20, the center-to-center distance between the pick-up heads 20 of the electronic components is adjusted again by adjusting the temperature so that the center-to-center distance between the pick-up heads 20 of the electronic components becomes D2. The center-to-center distance between display pixels on the array substrate 90 is kept consistent, and then each electronic component can be precisely transferred to the array substrate 90 . In this way, by adjusting the temperature, the distance between the fixed electronic component pick-up heads 20 on the memory alloy substrate 10 can be adjusted, flexibly applicable to different Micro-LED pitches and pixel pitches, and effectively avoiding the waste of Micro-LED resources.

需要说明的是,考虑到急剧的温度变化可能导致记忆合金材料出现裂缝等问题,因此在通过改变温度来使记忆合金基底发生形变时,温度的变化都是缓慢进行的。It should be noted that, considering that a sharp temperature change may cause problems such as cracks in the memory alloy material, when the memory alloy substrate is deformed by changing the temperature, the temperature change is performed slowly.

可选地,缓慢升高温度时,温度升高的速率为V1,其中,5℃/min≤V1≤10℃/min。Optionally, when the temperature is increased slowly, the rate of temperature increase is V1, wherein, 5°C/min≤V1≤10°C/min.

具体地,在升高温度使得记忆合金基底10发生形变时时,本申请将将温度升高的速率控制在5℃/min至10℃/min,既能保证记忆合金基底10缓慢可靠发生形变,又能够有效避免温度升高速度过快而导致记忆合金材料出现裂纹的现象。Specifically, when the temperature is increased to deform the memory alloy substrate 10, the present application will control the rate of temperature increase at 5°C/min to 10°C/min, which can ensure that the memory alloy substrate 10 is deformed slowly and reliably, and It can effectively avoid the phenomenon that the temperature rises too fast and causes cracks in the memory alloy material.

可选地,缓慢升高温度时,温度为匀速升高;从T1升高至T2所需的时间为t,其中,t=(T2-T1)/V1。Optionally, when the temperature is increased slowly, the temperature is increased at a uniform speed; the time required to increase from T1 to T2 is t, where t=(T2-T1)/V1.

具体地,本申请在通过调节温度来调节记忆合金基底10的形变量时,优选采用匀速缓慢的方式升高温度,如此有利于记忆合金基底10充分且准确地感受到环境温度的变化,使得形变的过程是在对环境温度进行充分感知的情况下进行了,避免温度突变而导致形变突变的情况发生,因此有利于提升记忆合金基底10随温度变化而发生形变的可靠性。Specifically, when the present application adjusts the deformation amount of the memory alloy substrate 10 by adjusting the temperature, it is preferable to increase the temperature in a uniform and slow manner, which is conducive to the memory alloy substrate 10 fully and accurately feeling the change of the ambient temperature, so that the deformation The process is carried out under the condition of fully sensing the ambient temperature, avoiding sudden changes in deformation due to sudden changes in temperature, and thus helping to improve the reliability of deformation of the memory alloy substrate 10 as the temperature changes.

可选地,将温度升高至T1时,相比于常温初始状态,电子元件巨量转移头100中的记忆合金基底10的形变量为S1;将温度升高至T2时,相比于常温初始状态,电子元件巨量转移头100中的记忆合金基底10的形变量为S2;Optionally, when the temperature is raised to T1, compared to the initial state at normal temperature, the deformation of the memory alloy substrate 10 in the electronic component mass transfer head 100 is S1; when the temperature is raised to T2, compared to the normal temperature In the initial state, the deformation amount of the memory alloy substrate 10 in the electronic component mass transfer head 100 is S2;

其中,D2-D0=S2*T2-S1*T1。Wherein, D2-D0=S2*T2-S1*T1.

具体地,通常,阵列基板上相邻两个显示像素之间的中心距D2是大于生长基底上相邻两个Micro LED之间的中心距D0的,电子元件拾取头20再将中心距为D0的Micro LED拾取起来之后,通过缓慢升高温度的方式来增加相邻两个电子元件拾取头20之间的中心距,使其达到D2,即与阵列基板上相邻两个显示像素之间的中心距相等。对于不同的记忆合金基底10,在不同的温度下对应不同的形变量,本申请通过不同温度下形变量与温度的对应关系,可精确计算出阵列基板上相邻两个显示像素之间的中心距D2余生长基底上相邻两个Micro LED之间的中心距D0之间的对应关系,从而精确对记忆合金的形变量进行把控,因而有利于提升采用不同材料形成的记忆合金基底10的形变精度。Specifically, usually, the center-to-center distance D2 between two adjacent display pixels on the array substrate is greater than the center-to-center distance D0 between two adjacent Micro LEDs on the growth substrate, and the electronic component pick-up head 20 sets the center-to-center distance as D0 After the Micro LED is picked up, the center-to-center distance between two adjacent electronic component pick-up heads 20 is increased by slowly increasing the temperature, so that it reaches D2, which is the distance between two adjacent display pixels on the array substrate. Center distances are equal. For different memory alloy substrates 10, corresponding to different deformation at different temperatures, this application can accurately calculate the center between two adjacent display pixels on the array substrate through the corresponding relationship between deformation and temperature at different temperatures. The corresponding relationship between the center distance D0 between two adjacent Micro LEDs on the growth substrate, so as to accurately control the deformation of the memory alloy, and thus help to improve the performance of the memory alloy substrate 10 formed by using different materials. Deformation accuracy.

可选地,上述步骤106中,降低温度,使得电子元件巨量转移头100中的记忆合金基底10收缩,具体为:Optionally, in the above step 106, the temperature is lowered so that the memory alloy substrate 10 in the electronic component mass transfer head 100 shrinks, specifically:

降低温度至T1,使得电子元件巨量转移头100中的记忆合金基底10收缩,并使得任意相邻两个电子元件拾取头20之间的中心距由D2减小为D1,利用电子元件拾取头20重复进行电子元件转移操作;Lower the temperature to T1, so that the memory alloy substrate 10 in the mass transfer head 100 of electronic components shrinks, and the center-to-center distance between any two adjacent electronic component pick-up heads 20 is reduced from D2 to D1, using the electronic component pick-up head 20 Repeat the electronic component transfer operation;

或者,降低温度至常温,使得电子元件巨量转移头100中的记忆合金基底10收缩至初始状态。Alternatively, the temperature is lowered to normal temperature, so that the memory alloy substrate 10 in the electronic component mass transfer head 100 shrinks to the initial state.

具体地,在完成一组电子元件的批量转运后,可通过降低温度,控制记忆合金基底10收缩,减小相邻电子元件拾取头20之间的间距,当将其间距缩小至D1时,可重新进行新的一组电子元件的批量转运;当完成了电子元件的批量转运后,可将温度恢复至常温,使记忆合金基底10收缩至初始状态;从而达到通过升高温度或降低温度合理控制记忆合金基底10形变量的效果。Specifically, after the batch transfer of a group of electronic components is completed, the shrinkage of the memory alloy substrate 10 can be controlled by lowering the temperature, and the distance between the pick-up heads 20 of adjacent electronic components can be reduced. When the distance is reduced to D1, it can Carry out the batch transfer of a new group of electronic components again; when the batch transfer of electronic components is completed, the temperature can be returned to normal temperature, so that the memory alloy substrate 10 shrinks to the initial state; thereby achieving reasonable control by raising or lowering the temperature The effect of the deformation amount of the memory alloy substrate 10 .

通过上述实施例可知,本发明提供的电子元件巨量转移头及转移方法,至少实现了如下的有益效果:It can be seen from the above embodiments that the electronic component mass transfer head and transfer method provided by the present invention at least achieve the following beneficial effects:

本申请实施例所提供的电子元件巨量转移头及转移方法中,在转移头中引入了记忆合金基底以及固定在记忆合金基底第一表面的多个电子元件拾取头,该记忆合金基底能够随温度的变化而发生形变,温度升高时,记忆合金基底将会拉伸,使得电子元件拾取头之间的中心距变大;当降低温度时,记忆合金基底将会收缩,使电子元件拾取头之间的中心距变小。如此,通过调节温度,即可调节记忆合金基底上固定的电子元件拾取头之间的间距,灵活适用于不同的Micro-LED pitch和pixel pitch,有效避免出现Micro-LED资源浪费的情形。In the electronic component mass transfer head and transfer method provided in the embodiments of the present application, a memory alloy substrate and a plurality of electronic component pick-up heads fixed on the first surface of the memory alloy substrate are introduced into the transfer head, and the memory alloy substrate can be Deformation occurs due to changes in temperature. When the temperature rises, the memory alloy substrate will stretch, making the center distance between the electronic component pick-up heads larger; when the temperature is lowered, the memory alloy substrate will shrink, making the electronic component pick-up head The center distance between them becomes smaller. In this way, by adjusting the temperature, the distance between the fixed electronic component pick-up heads on the memory alloy substrate can be adjusted, which is flexibly applicable to different Micro-LED pitches and pixel pitches, effectively avoiding the waste of Micro-LED resources.

虽然已经通过例子对本发明的一些特定实施例进行了详细说明,但是本领域的技术人员应该理解,以上例子仅是为了进行说明,而不是为了限制本发明的范围。本领域的技术人员应该理解,可在不脱离本发明的范围和精神的情况下,对以上实施例进行修改。本发明的范围由所附权利要求来限定。Although some specific embodiments of the present invention have been described in detail through examples, those skilled in the art should understand that the above examples are for illustration only and not intended to limit the scope of the present invention. Those skilled in the art will appreciate that modifications can be made to the above embodiments without departing from the scope and spirit of the invention. The scope of the invention is defined by the appended claims.

Claims (10)

1.一种电子元件巨量转移头,其特征在于,包括:记忆合金基底以及固定在所述记忆合金基底第一表面的多个电子元件拾取头;在相同温度下,任意相邻两个所述电子元件拾取头之间的中心距相等;1. A mass transfer head for electronic components, characterized in that it comprises: a memory alloy substrate and a plurality of electronic component pick-up heads fixed on the first surface of the memory alloy substrate; at the same temperature, any two adjacent The center-to-center distance between the electronic component pickup heads is equal; 所述记忆合金基底随温度的变化而发生形变,当温度升高时,所述记忆合金基底拉伸,任意相邻两个所述电子元件拾取头之间的中心距变大;当温度降低时,所述记忆合金基底收缩,任意相邻两个所述电子元件拾取头之间的中心距变小。The memory alloy substrate deforms as the temperature changes, and when the temperature rises, the memory alloy substrate stretches, and the center-to-center distance between any two adjacent electronic component pick-up heads becomes larger; when the temperature decreases , the memory alloy substrate shrinks, and the center-to-center distance between any two adjacent electronic component pick-up heads becomes smaller. 2.根据权利要求1所述的电子元件巨量转移头,其特征在于,所述记忆合金基底包括Au-Cd、Ag-Cd、Cu-Zn、Cu-Zn-Al、Cu-Zn-Sn、Cu-Zn-Si、Cu-Sn、Cu-Zn-Ga、In-Ti、Au-Cu-Zn、NiAl、Fe-Pt、Ti-Ni、Ti-Ni-Pd、Ti-Nb、U-Nb和Fe-Mn-Si中的至少一种。2. The electronic component mass transfer head according to claim 1, wherein the memory alloy substrate comprises Au-Cd, Ag-Cd, Cu-Zn, Cu-Zn-Al, Cu-Zn-Sn, Cu-Zn-Si, Cu-Sn, Cu-Zn-Ga, In-Ti, Au-Cu-Zn, NiAl, Fe-Pt, Ti-Ni, Ti-Ni-Pd, Ti-Nb, U-Nb and At least one of Fe-Mn-Si. 3.根据权利要求1所述的电子元件巨量转移头,其特征在于,所述记忆合金基底的厚度为H,其中,m*10nm≤H≤n*103nm,其中,1≤m≤10,1≤n≤10。3. The mass transfer head for electronic components according to claim 1, wherein the thickness of the memory alloy substrate is H, where m*10nm≤H≤n*10 3 nm, where 1≤m≤ 10, 1≤n≤10. 4.根据权利要求1所述的电子元件巨量转移头,其特征在于,所述电子元件拾取头与所述记忆合金基底采用相同的材料一体成型。4 . The mass transfer head for electronic components according to claim 1 , wherein the pick-up head for electronic components and the memory alloy substrate are integrally formed of the same material. 5.根据权利要求1所述的电子元件巨量转移头,其特征在于,还包括弹性基底,所述弹性基底位于所述记忆合金基底的第二表面;5. The mass transfer head for electronic components according to claim 1, further comprising an elastic base, the elastic base is located on the second surface of the memory alloy base; 所述弹性基底的最大形变量大于或者等于所述记忆合金基底的形变量。The maximum deformation of the elastic base is greater than or equal to the deformation of the memory alloy base. 6.一种基于权利要求1-5之任一所述的电子元件巨量转移头的电子元件巨量转移方法,其特征在于,包括:6. A mass transfer method for electronic components based on the mass transfer head for electronic components according to any one of claims 1-5, characterized in that it comprises: 在常温的初始状态下缓慢升高温度,使得电子元件巨量转移头中的记忆合金基底拉伸,并将温度控制在T1,使得任意相邻两个电子元件拾取头之间的中心距D1与位于转运基板上的任意相邻两个电子元件的之间的中心距D0相等;Slowly increase the temperature in the initial state of normal temperature, so that the memory alloy substrate in the electronic component mass transfer head is stretched, and the temperature is controlled at T1, so that the center distance D1 between any two adjacent electronic component pick-up heads is equal to The center-to-center distance D0 between any two adjacent electronic components on the transfer substrate is equal; 保持温度T1,将所述电子元件巨量转移头移动至所述转运基板朝向所述电子元件的一侧,使得所述电子元件拾取头和所述电子元件位于所述记忆合金基底与所述转运基板之间,并使得所述电子元件转移头位于所述电子元件的正上方;Maintaining the temperature T1, moving the electronic component mass transfer head to the side of the transfer substrate facing the electronic component, so that the electronic component pick-up head and the electronic component are located between the memory alloy substrate and the transfer substrate. between the substrates, so that the electronic component transfer head is located directly above the electronic component; 保持温度T1,将所述电子元件巨量转移头朝向所述电子元件移动,利用所述电子元件拾取头拾取所述电子元件,使所述电子元件从所述转运基板脱离;Maintaining the temperature T1, moving the electronic component mass transfer head towards the electronic component, using the electronic component pickup head to pick up the electronic component, and detaching the electronic component from the transfer substrate; 缓慢升高温度,使得记忆合金基底再次拉伸,并将温度控制在T2,使得携带有所述电子元件的任意相邻两个电子元件拾取头之间的中心距增大为D2;Slowly increase the temperature so that the memory alloy substrate is stretched again, and control the temperature at T2, so that the center-to-center distance between any two adjacent electronic component pick-up heads carrying the electronic component increases to D2; 将携带有所述电子元件的所述电子元件巨量转移头移动至阵列基板的正上方,朝向所述阵列基板移动所述电子元件巨量转移头,将各所述电子元件绑定于所述阵列基板上,使所述电子元件与所述电子元件巨量转移头分离;moving the electronic component mass transfer head carrying the electronic components directly above the array substrate, moving the electronic component mass transfer head toward the array substrate, and binding each of the electronic components to the On the array substrate, the electronic component is separated from the mass transfer head of the electronic component; 降低温度,使得电子元件巨量转移头中的记忆合金基底收缩。Lowering the temperature causes the memory alloy substrate in the mass transfer head of electronic components to shrink. 7.根据权利要求6所述的电子元件巨量转移方法,其特征在于,缓慢升高温度时,温度升高的速率为V1,其中,5℃/min≤V1≤10℃/min。7 . The mass transfer method of electronic components according to claim 6 , wherein when the temperature is raised slowly, the rate of temperature rise is V1, wherein 5° C./min≦V1≦10° C./min. 8.根据权利要求7所述的电子元件巨量转移方法,其特征在于,缓慢升高温度时,温度为匀速升高;从T1升高至T2所需的时间为t,其中,t=(T2-T1)/V1。8. The mass transfer method of electronic components according to claim 7, characterized in that, when the temperature is slowly raised, the temperature is raised at a uniform speed; the time required to increase from T1 to T2 is t, where t=( T2-T1)/V1. 9.根据权利要求6所述的电子元件巨量转移方法,其特征在于,将温度升高至T1时,相比于常温初始状态,所述电子元件巨量转移头中的记忆合金基底的形变量为S1;将温度升高至T2时,相比于常温初始状态,所述电子元件巨量转移头中的记忆合金基底的形变量为S2;9. The method for mass transfer of electronic components according to claim 6, characterized in that, when the temperature is raised to T1, compared with the initial state at normal temperature, the shape of the memory alloy substrate in the mass transfer head of the electronic components The variable is S1; when the temperature is raised to T2, compared with the initial state at normal temperature, the deformation of the memory alloy substrate in the mass transfer head of the electronic component is S2; 其中,D2-D0=S2*T2-S1*T1。Wherein, D2-D0=S2*T2-S1*T1. 10.根据权利要求6所述的电子元件巨量转移方法,其特征在于,降低温度,使得电子元件巨量转移头中的记忆合金基底收缩,具体为:10. The method for mass transfer of electronic components according to claim 6, characterized in that the temperature is lowered so that the memory alloy substrate in the mass transfer head of electronic components shrinks, specifically: 降低温度至T1,使得电子元件巨量转移头中的记忆合金基底收缩,并使得任意相邻两个电子元件拾取头之间的中心距由D2减小为D1,利用所述电子元件拾取头重复进行电子元件转移操作;Lower the temperature to T1, so that the memory alloy substrate in the electronic component mass transfer head shrinks, and the center distance between any two adjacent electronic component pick-up heads is reduced from D2 to D1, and the electronic component pick-up head is used to repeat Carry out electronic component transfer operations; 或者,降低温度至常温,使得电子元件巨量转移头中的记忆合金基底收缩至初始状态。Alternatively, the temperature is lowered to normal temperature, so that the memory alloy substrate in the electronic component mass transfer head shrinks to the initial state.
CN201910567736.XA 2019-06-27 2019-06-27 Bulk transfer head and transfer method for electronic components Pending CN110289240A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910567736.XA CN110289240A (en) 2019-06-27 2019-06-27 Bulk transfer head and transfer method for electronic components

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910567736.XA CN110289240A (en) 2019-06-27 2019-06-27 Bulk transfer head and transfer method for electronic components

Publications (1)

Publication Number Publication Date
CN110289240A true CN110289240A (en) 2019-09-27

Family

ID=68019276

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910567736.XA Pending CN110289240A (en) 2019-06-27 2019-06-27 Bulk transfer head and transfer method for electronic components

Country Status (1)

Country Link
CN (1) CN110289240A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111052342A (en) * 2019-11-29 2020-04-21 重庆康佳光电技术研究院有限公司 Mass transfer carrier plate, mass transfer device and mass transfer method
CN111415899A (en) * 2020-03-30 2020-07-14 京东方科技集团股份有限公司 Transfer substrate, preparation method, transfer device and transfer method
CN112188658A (en) * 2020-09-30 2021-01-05 合肥维信诺科技有限公司 Display panel and display device
CN112735972A (en) * 2019-10-28 2021-04-30 成都辰显光电有限公司 Transfer substrate of micro-element and manufacturing method thereof
WO2021102659A1 (en) * 2019-11-26 2021-06-03 重庆康佳光电技术研究院有限公司 Micro device transfer apparatus and method
CN112967988A (en) * 2020-11-04 2021-06-15 重庆康佳光电技术研究院有限公司 Transfer device and method for micro-element
CN112992753A (en) * 2020-05-22 2021-06-18 重庆康佳光电技术研究院有限公司 Mass transfer method and apparatus

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110004830U (en) * 2009-11-09 2011-05-17 (주)티에스이 Multi-picker device to transfer LED chips
CN102088052A (en) * 2009-12-04 2011-06-08 塔工程有限公司 LED chip jointing device
US20150028362A1 (en) * 2013-07-26 2015-01-29 LuxVue Technology Corporation Adhesive wafer bonding with controlled thickness variation
CN108389825A (en) * 2018-02-06 2018-08-10 中华映管股份有限公司 transposition device
CN108962789A (en) * 2018-06-25 2018-12-07 开发晶照明(厦门)有限公司 Micro element transfer method and micro element transfer equipment
CN109411392A (en) * 2018-10-16 2019-03-01 广东工业大学 A kind of the flood tide transfer device and transfer method of Micro-LED
CN109449100A (en) * 2018-10-16 2019-03-08 广东工业大学 A kind of the flood tide transfer method and device of electronic component

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110004830U (en) * 2009-11-09 2011-05-17 (주)티에스이 Multi-picker device to transfer LED chips
CN102088052A (en) * 2009-12-04 2011-06-08 塔工程有限公司 LED chip jointing device
US20150028362A1 (en) * 2013-07-26 2015-01-29 LuxVue Technology Corporation Adhesive wafer bonding with controlled thickness variation
CN108389825A (en) * 2018-02-06 2018-08-10 中华映管股份有限公司 transposition device
CN108962789A (en) * 2018-06-25 2018-12-07 开发晶照明(厦门)有限公司 Micro element transfer method and micro element transfer equipment
CN109411392A (en) * 2018-10-16 2019-03-01 广东工业大学 A kind of the flood tide transfer device and transfer method of Micro-LED
CN109449100A (en) * 2018-10-16 2019-03-08 广东工业大学 A kind of the flood tide transfer method and device of electronic component

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112735972A (en) * 2019-10-28 2021-04-30 成都辰显光电有限公司 Transfer substrate of micro-element and manufacturing method thereof
CN112735972B (en) * 2019-10-28 2022-08-30 成都辰显光电有限公司 Transfer substrate of micro-element and manufacturing method thereof
WO2021102659A1 (en) * 2019-11-26 2021-06-03 重庆康佳光电技术研究院有限公司 Micro device transfer apparatus and method
CN110998822B (en) * 2019-11-26 2021-07-20 重庆康佳光电技术研究院有限公司 Device and method for transferring micro-devices
CN111052342A (en) * 2019-11-29 2020-04-21 重庆康佳光电技术研究院有限公司 Mass transfer carrier plate, mass transfer device and mass transfer method
WO2021102877A1 (en) * 2019-11-29 2021-06-03 重庆康佳光电技术研究院有限公司 Mass transfer carrier plate, mass transfer device, and method for same
CN111415899A (en) * 2020-03-30 2020-07-14 京东方科技集团股份有限公司 Transfer substrate, preparation method, transfer device and transfer method
CN112992753A (en) * 2020-05-22 2021-06-18 重庆康佳光电技术研究院有限公司 Mass transfer method and apparatus
CN112188658A (en) * 2020-09-30 2021-01-05 合肥维信诺科技有限公司 Display panel and display device
CN112967988A (en) * 2020-11-04 2021-06-15 重庆康佳光电技术研究院有限公司 Transfer device and method for micro-element
CN112967988B (en) * 2020-11-04 2022-07-29 重庆康佳光电技术研究院有限公司 A micro-component transfer device and method thereof

Similar Documents

Publication Publication Date Title
CN110289240A (en) Bulk transfer head and transfer method for electronic components
CN108198773B (en) Transfer head and transfer method for transferring micro-LEDs
US20190244846A1 (en) Transfer device
US10784400B2 (en) Mass transfer method for micro-LEDs with a temperature-controlled adhesive layer
TW202135279A (en) Method and system for assembly of micro-leds onto a substrate
CN108597376A (en) It is pre-stretched substrate and preparation method thereof, electronic device and preparation method thereof
CN112133660A (en) Transfer substrate with optional surface adhesion transfer element
JP7519267B2 (en) Transfer elements that selectively retain and release objects based on changes in stiffness - Patents.com
US20160172519A1 (en) Electrode soldering method for a back contact solar module
JP2019521530A (en) MULTILAYER CARRIER FILM, METHOD OF TRANSFERRING DEVICE USING THE SAME, AND METHOD OF MANUFACTURING ELECTRONIC PRODUCT MANUFACTURING ELECTRONIC PRODUCT USING THE METHOD
CN110349902A (en) A kind of MicroLED flood tide transfer device and method based on addressable electromagnetic array
CN110444547A (en) A kind of micro-led array shows backboard and its manufacturing method
CN111052342B (en) Mass transfer carrier plate, mass transfer device and mass transfer method
CN100542952C (en) Carbon nanotube structure and its forming method
KR102093340B1 (en) Stamp structure for transfer printing and method of manufacturing the same, and transfer printing method using the stamp structure
CN108735919B (en) Method for patterning thin film, display device and manufacturing method thereof
CN114914189A (en) Transfer substrate, transfer method, display substrate and display device
US11315814B2 (en) Carrying apparatus and carrying method
CN110033704B (en) Transfer device and transfer method
CN116344569A (en) LED chip transfer method, display panel and display device
CN112599466A (en) Transfer substrate, manufacturing method thereof and transfer method
CN109192754B (en) Rigid bearing substrate and preparation method of flexible OLED display panel
CN112735972B (en) Transfer substrate of micro-element and manufacturing method thereof
KR102027115B1 (en) Organic photoelectric device and manufacturing method thereof
WO2022061512A1 (en) Imprint and transferring method for transferring light emitting diode

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20190927

RJ01 Rejection of invention patent application after publication