CN110133761A - A metamaterial reflective film and its manufacturing method - Google Patents
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Abstract
本发明公开了一种超材料反射膜及其制作方法。通过包括周期性分布的“圆对称结构和/或球对称结构”的共振单元的超材料层，使入射电磁波垂直入射到超材料时，能够对不同偏振态电磁波有一致的反射效果，从而解决了现有技术中反射膜偏振敏感的技术问题。
The invention discloses a metamaterial reflective film and a manufacturing method thereof. By including the metamaterial layer of resonant units of "circular symmetry structure and/or spherical symmetry structure" periodically distributed, when the incident electromagnetic wave is vertically incident on the metamaterial, it can have a consistent reflection effect on electromagnetic waves of different polarization states, thereby solving the problem The technical problem of the polarization sensitivity of the reflective film in the prior art.
Description
技术领域technical field
本发明涉及光学技术领域，尤其涉及一种超材料反射膜及其制作方法。The invention relates to the field of optical technology, in particular to a metamaterial reflective film and a manufacturing method thereof.
背景技术Background technique
随着社会的发展以及人们生活水平的提高，光电子器件正逐渐向小型化、多功能、集成化的方向发展。目前，紫外反射镜在紫外光刻、天文观测、等离子体诊断等领域得到了广泛的应用。目前，传统的反射膜存在偏振敏感的问题，极大地制约了其的应用With the development of society and the improvement of people's living standards, optoelectronic devices are gradually developing in the direction of miniaturization, multi-function and integration. At present, UV mirrors have been widely used in UV lithography, astronomical observation, plasma diagnosis and other fields. At present, the traditional reflective film has the problem of polarization sensitivity, which greatly restricts its application.
发明内容Contents of the invention
本发明通过提供一种超材料反射膜及其制作方法，解决了现有技术中反射膜偏振敏感的技术问题。The invention solves the technical problem of the polarization sensitivity of the reflective film in the prior art by providing a metamaterial reflective film and a manufacturing method thereof.
本发明提供了一种超材料反射膜，包括：衬底及超材料层；所述超材料层包括多个共振单元，所述多个共振单元周期性分布在所述衬底上；每个所述共振单元均为圆对称结构和/或球对称结构。The present invention provides a metamaterial reflective film, comprising: a substrate and a metamaterial layer; the metamaterial layer includes a plurality of resonance units, and the plurality of resonance units are periodically distributed on the substrate; each of the metamaterial layers The resonant units are all circularly symmetrical and/or spherically symmetrical.
进一步地，相邻的所述共振单元在所述衬底上的间距是相等的。Further, the distances between adjacent resonant units on the substrate are equal.
进一步地，所述每个共振单元的形状为圆环形和/或圆柱形。Further, the shape of each resonance unit is circular and/or cylindrical.
进一步地，所述超材料层的构成成分是等离子物质。Further, the composition of the metamaterial layer is a plasma substance.
进一步地，所述超材料层的构成成分是金属和/或具有等离子性质的半导体。Further, the constituent components of the metamaterial layer are metals and/or semiconductors with plasmonic properties.
进一步地，所述衬底的材料是本征半导体材料或介质材料。Further, the material of the substrate is an intrinsic semiconductor material or a dielectric material.
本发明还提供了一种超材料反射膜的制作方法，所述方法包括：The present invention also provides a method for manufacturing a metamaterial reflective film, the method comprising:
在所述衬底上涂覆光刻胶；coating photoresist on the substrate;
将预先设置的掩模板放置在所述光刻胶上；placing a preset mask on the photoresist;
对放置有掩模板的光刻胶进行曝光以及显影，得到图形化的光刻胶层；Exposing and developing the photoresist on which the mask is placed to obtain a patterned photoresist layer;
将所述掩模板移除；removing the mask;
在所述衬底的设置有所述图形化的光刻胶层的表面制备等离子体膜；preparing a plasma film on the surface of the substrate provided with the patterned photoresist layer;
将所述光刻胶层剥离，制备出所述超材料反射膜的超材料层，其中，所述超材料层包括多个共振单元，所述多个共振单元周期性分布在所述衬底上；每个所述共振单元均为圆对称结构和/或球对称结构。The photoresist layer is peeled off to prepare the metamaterial layer of the metamaterial reflective film, wherein the metamaterial layer includes a plurality of resonance units, and the plurality of resonance units are periodically distributed on the substrate ; Each of the resonant units is a circular symmetric structure and/or a spherical symmetric structure.
进一步地，所述等离子体膜为金属膜。Further, the plasma film is a metal film.
进一步地，在所述衬底的设置有所述图形化的光刻胶层的表面制备等离子体膜之前，还包括：Further, before preparing the plasma film on the surface of the substrate provided with the patterned photoresist layer, it also includes:
对所述衬底和所述等离子体膜材料进行预处理。Pretreating the substrate and the plasma film material.
进一步地，所述对所述衬底和所述等离子体膜材料进行预处理，包括：Further, the pretreatment of the substrate and the plasma film material includes:
对所述衬底进行加热；heating the substrate;
对所述等离子体膜材料进行预热。Preheating the plasma film material.
本发明中提供的一个或多个技术方案，至少具有如下技术效果或优点：One or more technical solutions provided in the present invention have at least the following technical effects or advantages:
通过包括周期性分布的“圆对称结构和/或球对称结构”的共振单元的超材料层，使入射电磁波垂直入射到超材料时，能够对不同偏振态电磁波有一致的反射效果，从而解决了现有技术中反射膜偏振敏感的技术问题。By including the metamaterial layer of the resonant unit of "circular symmetry structure and/or spherical symmetry structure" periodically distributed, when the incident electromagnetic wave is vertically incident on the metamaterial, it can have a consistent reflection effect on electromagnetic waves of different polarization states, thereby solving the problem The technical problem of the polarization sensitivity of the reflective film in the prior art.
附图说明Description of drawings
图1为本发明实施例提供的超材料反射膜的正面示意图；Fig. 1 is a schematic front view of a metamaterial reflective film provided by an embodiment of the present invention;
图2为本发明实施例提供的超材料反射膜的侧面示意图；2 is a schematic side view of a metamaterial reflective film provided by an embodiment of the present invention;
图3为本发明实施例提供的超材料反射膜的制作方法的流程图；FIG. 3 is a flow chart of a method for manufacturing a metamaterial reflective film provided by an embodiment of the present invention;
图4为实施本发明实施例提供的超材料反射膜的制作方法的效果图；Fig. 4 is an effect diagram for implementing the method of manufacturing a metamaterial reflective film provided by an embodiment of the present invention;
图5为本发明实施例提供的超材料反射膜的反射谱和透射谱。Fig. 5 is the reflection spectrum and transmission spectrum of the metamaterial reflection film provided by the embodiment of the present invention.
其中，1-衬底，2-共振单元。Among them, 1-substrate, 2-resonant unit.
具体实施方式Detailed ways
本发明实施例通过提供一种超材料反射膜及其制作方法，解决了现有技术中反射膜偏振敏感的技术问题。The embodiment of the present invention solves the technical problem of the polarization sensitivity of the reflective film in the prior art by providing a metamaterial reflective film and a manufacturing method thereof.
本发明实施例中的技术方案为解决上述问题，总体思路如下：The technical solution in the embodiment of the present invention is to solve the above-mentioned problems, and the general idea is as follows:
通过包括周期性分布的“圆对称结构和/或球对称结构”的共振单元的超材料层，使入射电磁波垂直入射到超材料时，能够对不同偏振态电磁波有一致的反射效果，从而解决了现有技术中反射膜偏振敏感的技术问题。By including the metamaterial layer of the resonant unit of "circular symmetry structure and/or spherical symmetry structure" periodically distributed, when the incident electromagnetic wave is vertically incident on the metamaterial, it can have a consistent reflection effect on electromagnetic waves of different polarization states, thereby solving the problem The technical problem of the polarization sensitivity of the reflective film in the prior art.
为了更好地理解上述技术方案，下面将结合说明书附图以及具体的实施方式对上述技术方案进行详细的说明。In order to better understand the above technical solution, the above technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.
参见图1和图2，本发明实施例提供的超材料反射膜，包括：衬底1及超材料层；超材料层包括多个共振单元2，多个共振单元2周期性分布在衬底1上。Referring to Fig. 1 and Fig. 2, the metamaterial reflective film provided by the embodiment of the present invention includes: a substrate 1 and a metamaterial layer; the metamaterial layer includes a plurality of resonant units 2, and a plurality of resonant units 2 are periodically distributed on the substrate 1 superior.
具体地，相邻的共振单元2在衬底1上的间距是相等的。Specifically, the distances between adjacent resonant units 2 on the substrate 1 are equal.
为了使入射电磁波垂直入射到超材料时，能够对不同偏振态电磁波有一致的反射效果，每个共振单元2均为圆对称结构和/或球对称结构。也就是说，可以全部共振单元2均为圆对称结构或球对称结构，或一部分共振单元2为圆对称结构，另一部分的共振单元2为球对称结构。In order to have a consistent reflection effect on electromagnetic waves of different polarization states when the incident electromagnetic wave is perpendicularly incident on the metamaterial, each resonance unit 2 has a circular symmetric structure and/or a spherical symmetric structure. That is to say, all the resonant units 2 may have a circular symmetric structure or a spherical symmetric structure, or a part of the resonant units 2 may have a circular symmetric structure, and the other part of the resonant units 2 may have a spherical symmetric structure.
具体地，每个共振单元2的形状为圆环形和/或圆柱形。也就是说，可以全部共振单元2的形状均为圆环形或圆柱形，或一部分共振单元2的形状为圆环形，另一部分的共振单元2的形状为圆柱形。Specifically, the shape of each resonance unit 2 is circular and/or cylindrical. That is to say, all the resonant units 2 may be circular or cylindrical in shape, or a part of the resonant units 2 may be circular in shape and the other part of the resonant units 2 may be cylindrical in shape.
为了能够激发并增强电磁波的反射效果，超材料层的构成成分是等离子物质。In order to be able to stimulate and enhance the reflection effect of electromagnetic waves, the composition of the metamaterial layer is a plasma substance.
具体地，超材料层的构成成分是金属和/或具有等离子性质的半导体。也就是说，可以全部超材料层的构成成分均是金属或具有等离子性质的半导体，或一部分超材料层的构成成分是金属，另一部分超材料层的构成成分是具有等离子性质的半导体。其中，若利用金属(如铅、锡等)制作超材料层，则可以制备出紫外偏振不敏感的超材料。Specifically, the constituent components of the metamaterial layer are metals and/or semiconductors with plasmonic properties. That is to say, all metamaterial layers may be composed of metals or semiconductors with plasmonic properties, or some metamaterial layers may be composed of metals and the other part of metamaterial layers may be composed of plasmonic semiconductors. Among them, if metal (such as lead, tin, etc.) is used to make the metamaterial layer, a metamaterial that is not sensitive to ultraviolet polarization can be prepared.
在本实施例中，衬底1的材料是本征半导体材料或介质材料。In this embodiment, the material of the substrate 1 is an intrinsic semiconductor material or a dielectric material.
参见图3和图4，本发明实施例提供的超材料反射膜的制作方法，所述方法包括：Referring to Fig. 3 and Fig. 4, the method for manufacturing a metamaterial reflective film provided by an embodiment of the present invention, the method includes:
步骤S310：在衬底1上涂覆光刻胶；Step S310: coating photoresist on the substrate 1;
具体地，在衬底1上，均匀旋转涂覆光刻胶(正胶)。Specifically, on the substrate 1, a photoresist (positive resist) is uniformly spin-coated.
为了去除衬底1表面的灰尘、油迹和离子颗粒等物质，使后续光刻胶能够均匀铺展到衬底1表面，先把衬底1放入装有去离子水的容器中，在超声波震荡下清洗3分钟，取出来后用氮气枪吹干；然后浸泡入装有甲醇的容器中，同样利用超声波震荡清洗3分钟，氮气枪吹干；之后放入装有丙酮的容器中，超声波清洗3分钟，氮气枪吹干；再在甲醇溶液中超声波清洗，最后用去离子水清洗，吹干。In order to remove dust, oil stains, ion particles and other substances on the surface of the substrate 1, so that the subsequent photoresist can be evenly spread on the surface of the substrate 1, the substrate 1 is first placed in a container containing deionized water, and the ultrasonic vibration Clean it under water for 3 minutes, take it out and blow it dry with a nitrogen gun; then soak it in a container with methanol, clean it with ultrasonic vibration for 3 minutes, and blow it dry with a nitrogen gun; then put it in a container with acetone, and ultrasonically clean it for 3 minutes Minutes, blow dry with a nitrogen gun; then ultrasonically clean in methanol solution, and finally clean with deionized water and dry.
步骤S320：将预先设置的掩模板放置在光刻胶上；Step S320: placing the preset mask on the photoresist;
对本步骤进行具体说明：Describe this step in detail:
利用电子束光刻超材料反射膜互补图案，结合图案制备掩模版，并将掩模板平置在光刻胶上。Electron beam lithography is used to lithography the complementary pattern of the metamaterial reflective film, and the pattern is combined to prepare a mask plate, and the mask plate is placed on the photoresist.
步骤S330：对放置有掩模板的光刻胶进行曝光以及显影，得到图形化的光刻胶层；Step S330: Exposing and developing the photoresist placed with the mask to obtain a patterned photoresist layer;
对本步骤进行具体说明：Describe this step in detail:
正向曝光，将曝光后的带有光刻胶的衬底1放入显影液中显影，获得与掩膜板相似的圆孔。For forward exposure, the exposed substrate 1 with photoresist is put into a developing solution for development to obtain a circular hole similar to a mask plate.
步骤S340：将掩模板移除，并清洁衬底1的表面；Step S340: removing the mask and cleaning the surface of the substrate 1;
步骤S350：在衬底1的设置有图形化的光刻胶层的表面制备等离子体膜；Step S350: preparing a plasma film on the surface of the substrate 1 provided with a patterned photoresist layer;
在本实施例中，等离子体膜为金属膜。In this embodiment, the plasma film is a metal film.
对本步骤进行具体说明：Describe this step in detail:
将显影后的衬底1蒸镀沉积金属膜，使金属膜涂覆在衬底1上。The developed substrate 1 is evaporated to deposit a metal film, so that the metal film is coated on the substrate 1 .
其中，将显影后的衬底1蒸镀沉积金属膜，包括：Wherein, the developed substrate 1 is vapor-deposited to deposit a metal film, including:
将显影后的衬底1在高真空中蒸镀沉积金属膜。The developed substrate 1 is evaporated and deposited a metal film in a high vacuum.
对本发明实施例提供的超材料反射膜的制作方法进行进一步说明，在衬底1的设置有图形化的光刻胶层的表面制备等离子体膜之前，还包括：The method for manufacturing the metamaterial reflective film provided by the embodiment of the present invention is further described, and before the plasma film is prepared on the surface of the substrate 1 provided with a patterned photoresist layer, it also includes:
对衬底1和等离子体膜材料进行预处理。The substrate 1 and the plasma film material are pretreated.
具体地，对显影后的衬底1进行加热，以去除水分和增强膜基结合力，并使表面吸附的气体脱附。对等离子体膜材料进行预热，使当在后续高温加热时，镀膜材料能够更加均匀地蒸镀到基底表面。Specifically, the developed substrate 1 is heated to remove moisture and enhance the bonding force of the film substrate, and to desorb the gas adsorbed on the surface. The plasma film material is preheated, so that the coating material can be evaporated more uniformly on the surface of the substrate when heated at a subsequent high temperature.
步骤S360：将光刻胶层剥离，制备出超材料反射膜的超材料层，其中，超材料层包括多个共振单元2，多个共振单元2周期性分布在衬底1上，每个共振单元2均为圆对称结构和/或球对称结构。Step S360: peel off the photoresist layer to prepare a metamaterial layer of a metamaterial reflective film, wherein the metamaterial layer includes a plurality of resonant units 2, and the plurality of resonant units 2 are periodically distributed on the substrate 1, each resonant Units 2 are all circularly symmetrical and/or spherically symmetrical.
具体地，将蒸镀后的衬底1表面残留的光刻胶清洗干净，并吹干。Specifically, the residual photoresist on the surface of the evaporated substrate 1 is cleaned and dried.
对本步骤进行具体说明：Describe this step in detail:
用负胶清洗液把衬底1表面残留的光刻胶清洗干净，再用氮气枪吹干，即可获得所需的超材料反射膜。其中，衬底1的材料是硅。The remaining photoresist on the surface of the substrate 1 is cleaned with a negative resist cleaning solution, and then dried with a nitrogen gun to obtain the required metamaterial reflective film. Wherein, the material of the substrate 1 is silicon.
下面通过一个具体的实施例对本发明进一步详细说明：The present invention is described in further detail below by a specific embodiment:
参见图1和图2，本发明实施例提供的超材料反射膜由金属超材料物质和衬底1两部分组成。其中，金属超材料物质是由周期分布的圆柱体(圆柱体即为超材料的共振单元2)构成。具体地，圆柱体是由金(Au)元素构成，圆柱体的直径d＝60nm，厚度为tm＝80nm。X/Y轴方向单元周期长度分别为px和py，设定为px＝py＝160nm。衬底1采用Si半导体材料构建，衬底1的厚度为ts＝100nm。Referring to FIG. 1 and FIG. 2 , the metamaterial reflective film provided by the embodiment of the present invention is composed of a metal metamaterial substance and a substrate 1 . Wherein, the metal metamaterial substance is composed of periodically distributed cylinders (the cylinders are the resonant units 2 of the metamaterial). Specifically, the cylinder is made of gold (Au) element, the diameter of the cylinder is d=60nm, and the thickness of the cylinder is t m =80nm. The unit period lengths in the X/Y axis direction are respectively p x and p y , which are set as p x = py =160nm. The substrate 1 is constructed of Si semiconductor material, and the thickness of the substrate 1 is t s =100 nm.
工作原理：电磁波沿着垂直于XOY面入射到超材料反射膜，在超材料强烈电磁共振的作用下产生高反射。入射电磁波正向入射反射膜，即入射电场在XOY平面内。由于超材料共振单元2的对称性，对任意方向入射电场(偏振态电磁波)的感知是一样的，因此，从而实现了一种偏振不相关(不敏感)的超材料反射膜。Working principle: Electromagnetic waves are incident on the metamaterial reflective film along the perpendicular to the XOY plane, and high reflection is generated under the action of the strong electromagnetic resonance of the metamaterial. The incident electromagnetic wave is incident on the reflective film in the forward direction, that is, the incident electric field is in the XOY plane. Due to the symmetry of the metamaterial resonant unit 2, the perception of the incident electric field (electromagnetic wave in polarization state) in any direction is the same, thus realizing a polarization-independent (insensitive) metamaterial reflective film.
通过软件仿真获取了上述超材料反射膜的反射谱和透射谱，如图5所示。由于超材料的电磁共振，所述超材料反射膜对275nm-300nm波长范围内电磁反射尤为明显，反射率接近70％。The reflection spectrum and transmission spectrum of the above-mentioned metamaterial reflective film were obtained through software simulation, as shown in FIG. 5 . Due to the electromagnetic resonance of the metamaterial, the metamaterial reflective film has particularly obvious electromagnetic reflection in the wavelength range of 275nm-300nm, and the reflectivity is close to 70%.
【技术效果】【Technical effect】
1、通过包括周期性分布的“圆对称结构和/或球对称结构”的共振单元2的超材料层，使入射电磁波垂直入射到超材料时，能够对不同偏振态电磁波有一致的反射效果，从而解决了现有技术中反射膜偏振敏感的技术问题。1. Through the metamaterial layer of the resonant unit 2 including the periodically distributed "circular symmetric structure and/or spherical symmetric structure", when the incident electromagnetic wave is vertically incident on the metamaterial, it can have a consistent reflection effect on electromagnetic waves of different polarization states, Therefore, the technical problem of the polarization sensitivity of the reflective film in the prior art is solved.
2、本发明实施例利用超材料的电磁共振特性，可解决光谱级次叠加干扰的问题，尤其是紫外波段的光谱级次叠加问题，同时还可避免光栅中高级次衍射峰在解谱过程中对低级衍射峰干扰等问题的出现。本发明实施例充分利用超材料的电磁共振特性，合理地设计超材料结构单元的形状，从而可有效缓解电磁波的共振吸收蓄热导致温度上升引起的工作不稳定现象。此外，结合超材料共振特性的灵活调节机制，可综合应用多种调控方式(如调整超材料单元的结构和形状等)可自由调控超材料反射膜的反射特性，从而降低工艺过程中材料的苛刻要求及制作的难度。2. The embodiment of the present invention utilizes the electromagnetic resonance characteristics of metamaterials to solve the problem of spectral order superposition interference, especially the problem of spectral order superposition in the ultraviolet band, and at the same time, it can also avoid the high-order diffraction peaks in the grating in the process of decomposing the spectrum The emergence of problems such as interference with low-order diffraction peaks. The embodiments of the present invention make full use of the electromagnetic resonance characteristics of the metamaterial, and rationally design the shape of the structural unit of the metamaterial, thereby effectively alleviating the phenomenon of unstable operation caused by temperature rise caused by resonance absorption and heat storage of electromagnetic waves. In addition, combined with the flexible adjustment mechanism of metamaterial resonance characteristics, multiple control methods (such as adjusting the structure and shape of metamaterial units, etc.) can be used to freely adjust the reflection characteristics of metamaterial reflective films, thereby reducing the harshness of materials in the process. Requirements and difficulty of production.
3、超材料的构成成分是等离子物质，从而能够激发并增强电磁波的反射效果。3. The composition of metamaterials is plasma matter, which can stimulate and enhance the reflection effect of electromagnetic waves.
4、在本发明实施例提供的制作方法中，对显影后的衬底1和等离子体膜材料进行预处理，不仅可提高后续工艺的可靠性，而且还能增强光器件工作时的稳定性。4. In the manufacturing method provided by the embodiment of the present invention, the pretreatment of the substrate 1 and the plasma film material after development can not only improve the reliability of the subsequent process, but also enhance the stability of the optical device during operation.
本发明实施例的目的是为了解决现有传统反射镜存在的衍射叠加干扰、制作要求高、工作稳定性差、性能差和偏振敏感等问题而提出一种紫外波段的电磁偏振不敏感超材料反射膜及其制作方法。本发明实施例提供的紫外金属超材料反射膜能够应用于入射电磁波波长为紫外波段的情况。本发明实施例在相应的光学系统领域具有重要的应用价值。The purpose of the embodiment of the present invention is to propose an electromagnetic polarization-insensitive metamaterial reflective film in the ultraviolet band to solve the problems of existing traditional reflectors such as diffraction superposition interference, high manufacturing requirements, poor work stability, poor performance, and polarization sensitivity. and its production method. The ultraviolet metal metamaterial reflective film provided by the embodiment of the present invention can be applied to the case where the wavelength of the incident electromagnetic wave is in the ultraviolet band. The embodiments of the present invention have important application value in the field of corresponding optical systems.
尽管已描述了本发明的优选实施例，但本领域内的技术人员一旦得知了基本创造性概念，则可对这些实施例作出另外的变更和修改。所以，所附权利要求意欲解释为包括优选实施例以及落入本发明范围的所有变更和修改。While preferred embodiments of the invention have been described, additional changes and modifications to these embodiments can be made by those skilled in the art once the basic inventive concept is appreciated. Therefore, it is intended that the appended claims be construed to cover the preferred embodiment as well as all changes and modifications which fall within the scope of the invention.
显然，本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样，倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内，则本发明也意图包含这些改动和变型在内。Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalent technologies, the present invention also intends to include these modifications and variations.
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