[go: up one dir, main page]

CN110128581B - Encapsulation process of microstrip patch antenna - Google Patents

Encapsulation process of microstrip patch antenna Download PDF

Info

Publication number
CN110128581B
CN110128581B CN201910436184.9A CN201910436184A CN110128581B CN 110128581 B CN110128581 B CN 110128581B CN 201910436184 A CN201910436184 A CN 201910436184A CN 110128581 B CN110128581 B CN 110128581B
Authority
CN
China
Prior art keywords
fluorine
foaming
containing polystyrene
polystyrene microspheres
potting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201910436184.9A
Other languages
Chinese (zh)
Other versions
CN110128581A (en
Inventor
吴金剑
汤嘉陵
梁德平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chengdu Xingshui Technology Co ltd
Original Assignee
Chengdu Xingshui Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chengdu Xingshui Technology Co ltd filed Critical Chengdu Xingshui Technology Co ltd
Priority to CN201910436184.9A priority Critical patent/CN110128581B/en
Publication of CN110128581A publication Critical patent/CN110128581A/en
Application granted granted Critical
Publication of CN110128581B publication Critical patent/CN110128581B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06Hydrocarbons
    • C08F212/08Styrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/16Making expandable particles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00Details of, or arrangements associated with, antennas
    • H01Q1/005Damping of vibrations; Means for reducing wind-induced forces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00Details of, or arrangements associated with, antennas
    • H01Q1/36Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
    • H01Q1/38Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith formed by a conductive layer on an insulating support
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2325/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
    • C08J2325/02Homopolymers or copolymers of hydrocarbons
    • C08J2325/04Homopolymers or copolymers of styrene
    • C08J2325/08Copolymers of styrene
    • C08J2325/14Copolymers of styrene with unsaturated esters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

The invention discloses a potting process of a microstrip patch of a millimeter wave response antenna, and belongs to the field of response antenna packaging. The method comprises the following steps: a, preparing fluorine-containing polystyrene microspheres by taking styrene and fluorine-containing monomers as raw materials and adopting a dispersion polymerization method; b, continuously foaming the fluorine-containing polystyrene microspheres obtained in the step A to obtain primary foaming fluorine-containing polystyrene microspheres; and C, placing the micro-strip patch into a mold, placing the primary foaming fluorine-containing polystyrene microspheres into a gap between the micro-strip patch and the mold, and locking the mold for encapsulation. The invention adopts fluorine-containing polystyrene as the encapsulating material, thereby not only solving the problem of adhesion of the foaming material to the microstrip patch, but also solving the problems of high insertion loss, low transmittance and other electrical properties of the encapsulating medium of the microstrip patch of the millimeter wave antenna due to the advantages of low dielectric constant, low dielectric loss, good foaming uniformity and the like.

Description

Encapsulation process of microstrip patch antenna
Technical Field
The invention belongs to the field of antenna packaging, and particularly relates to a filling and sealing process of a microstrip patch antenna.
Background
The microstrip patch antenna has the advantages of small volume, light weight, thin section, easy conformal and the like, and is widely applied in the fields of wireless communication, remote sensing, aerospace and the like.
In order to improve the anti-vibration capability and the waterproof performance of products, most antennas adopt a structural mode of filling potting materials in the gap spaces of a base plate (or a bracket or a cavity), an outer cover and a printed board, and due to the requirement of antenna signal transmission, the selection of the outer cover materials and the potting materials has special requirements.
At present, a commonly used potting material is a rigid polyurethane foaming material which has the characteristics of small dielectric constant, small density, insolubility in water and the like, but is easy to expand through secondary reaction when meeting high temperature, so that the antenna bulges and deforms.
The polystyrene foam is prepared by taking polystyrene resin as a main body and adding additives such as a foaming agent and the like. It has closed pore structure, small water absorption and excellent water resistance; the density is low; the mechanical strength is good, and the buffering performance is excellent; the processability is good, and the molding forming is easy; high temperature adaptability and uniform structure. But the adhesive force to the microstrip patch is not good, and the adhesive is not suitable for being used as the encapsulating material of the microstrip patch antenna.
Disclosure of Invention
In order to solve the technical problem, the invention provides an encapsulation process of a microstrip patch antenna, which comprises the following steps:
a, preparing fluorine-containing polystyrene microspheres by taking styrene and fluorine-containing monomers as raw materials and adopting a dispersion polymerization method;
b, foaming the fluorine-containing polystyrene microspheres obtained in the step A to obtain primary foaming fluorine-containing polystyrene microspheres;
and C, placing the micro-strip patch into a mold, placing the primary foaming fluorine-containing polystyrene microspheres into a gap between the micro-strip patch and the mold, and locking the mold for encapsulation.
In the potting process, the step A meets at least one of the following conditions:
the mass ratio of the styrene to the fluorine-containing monomer is 18: 2-6;
the fluorine-containing monomer is dodecafluoroheptyl methacrylate;
the preparation temperature is 60-100 ℃;
the preparation time is 10-20 h;
the step A also comprises a catalyst, a dispersant and a solvent.
In the potting process, in the step a, the catalyst is azobisisobutyronitrile; the dispersing agent is polyvinylpyrrolidone; the solvent is a mixed solution of ethanol and water, wherein the volume ratio of the ethanol to the water is 1.5: 1.
In the potting process, in the step A, the amount of the catalyst is 0.5-2.5 wt% of the amount of the raw materials; the dosage of the dispersing agent is 2-5.5 wt% of the dosage of the raw materials; the volume weight ratio of the solvent to the raw material is 8-10 mL: 1g of the total weight of the composition.
In the encapsulating process, in the step B, the foaming temperature is 80 +/-5 ℃; the foaming time is 3-5 min.
In the filling and sealing process, the particle size of the primary foaming fluorine-containing polystyrene microsphere is 2000 +/-100 microns.
In the potting process, in the step C, the potting temperature is 100-125 ℃.
In the potting process, in the step C, the potting time is 40-60 min.
In the encapsulating process, in the step C, the encapsulating pressure is 35-90 KPa.
The invention has the beneficial effects that:
the invention adopts fluorine-containing polystyrene as the encapsulating material, thereby not only solving the problem of adhesion of the foaming material to the microstrip patch, but also solving the problems of high insertion loss, low transmittance and other electrical properties of the encapsulating medium of the microstrip patch of the millimeter wave antenna due to the advantages of low dielectric constant, low dielectric loss, good foaming uniformity and the like.
Obviously, many modifications, substitutions, and variations are possible in light of the above teachings of the invention, without departing from the basic technical spirit of the invention, as defined by the following claims.
The present invention will be described in further detail with reference to the following examples. It should not be understood that the scope of the above-described subject matter of the present invention is limited to the following examples. All the technologies realized based on the above contents of the present invention belong to the scope of the present invention.
Drawings
FIG. 1 is a schematic view of an encapsulation mold and encapsulated microstrip sheets
FIG. 2 shows the fluorine-containing polystyrene microspheres once expanded prepared in example 1.
Fig. 3 is a potting mold.
FIG. 4 shows the micro-strip patch obtained after the fluorine-containing polystyrene is encapsulated.
Detailed Description
A schematic diagram of the encapsulation mold and the resulting micro-tape chip encapsulated is shown in fig. 1.
Example 1
Preparation of fluorine-containing polystyrene: in a condenser equipped with a mechanical stirrer, a condenser tube and N2And (3) adding 0.8g of polyvinylpyrrolidone, 108mL of absolute ethyl alcohol and 72mL of deionized water into a 250mL three-necked bottle of an inlet and outlet device, uniformly stirring, placing in a water bath at the temperature of 100 ℃, then adding a mixed solution of 18g of styrene monomer, 2g of dodecafluoroheptyl methacrylate and 0.1g of azobisisobutyronitrile, stirring (200r/min), reacting for 12 hours, cooling, terminating the reaction, and removing unreacted monomers and dispersing agents to finally obtain white powdery fluorine-containing polystyrene microspheres.
Primary foaming: and (3) foaming the fluorine-containing polystyrene microspheres prepared in the step (1) at 80 ℃ for 3min to obtain the once-foamed fluorine-containing polystyrene microspheres with the particle size of 2000 +/-100 microns, which is shown in figure 2.
Encapsulating: placing the micro-strip patch into a mold, placing the primary foamed fluorine-containing polystyrene microspheres into a gap between the micro-strip patch and the mold (see fig. 3), locking the mold, placing the mold under a pressure of 80KPa, and encapsulating at 110 ℃ for 60min to obtain the micro-strip patch, which is shown in fig. 4.
Example 2
Preparation of fluorine-containing polystyrene: in a condenser equipped with a mechanical stirrer, a condenser tube and N2And (3) adding 0.4g of polyvinylpyrrolidone, 108mL of absolute ethyl alcohol and 72mL of deionized water into a 250mL three-necked bottle of an inlet and outlet device, uniformly stirring, placing in a water bath at the temperature of 80 ℃, then adding a mixed solution of 18g of styrene monomer, 2g of dodecafluoroheptyl methacrylate and 0.2g of azobisisobutyronitrile, stirring (200r/min), reacting for 10 hours, cooling, terminating the reaction, and removing unreacted monomers and a dispersing agent to finally obtain white powdery fluorine-containing polystyrene microspheres.
Primary foaming: and (2) foaming the fluorine-containing polystyrene microspheres prepared in the step (1) at 80 ℃ for 5min to obtain the once-foamed fluorine-containing polystyrene microspheres with the particle size of 2000 +/-100 microns.
Encapsulating: placing the micro-strip patch into a mold, placing the primary foamed fluorine-containing polystyrene microspheres into a gap between the micro-strip patch and the mold (see figure 2), locking the mold, placing the mold under a pressure of 50KPa, and encapsulating at 100 deg.C for 40 min.

Claims (9)

1. The encapsulation process of the microstrip patch antenna is characterized by comprising the following steps of:
preparing fluorine-containing polystyrene microspheres by using styrene and dodecyl methyl acrylate as raw materials and adopting a dispersion polymerization method;
b, foaming the fluorine-containing polystyrene microspheres obtained in the step A to obtain primary foaming fluorine-containing polystyrene microspheres;
placing the micro-strip patch into a mold, placing the primary foaming fluorine-containing polystyrene microspheres into a gap between the micro-strip patch and the mold, and locking the mold for encapsulation;
in the step A, the mass ratio of the styrene to the fluorine-containing monomer is 18: 2-6.
2. The potting process of claim 1, wherein step a satisfies at least one of:
the preparation temperature is 60-100 ℃;
the preparation time is 10-20 h;
the step A also comprises a catalyst, a dispersant and a solvent.
3. The potting process of claim 2, wherein in step a, the catalyst is azobisisobutyronitrile; the dispersing agent is polyvinylpyrrolidone; the solvent is a mixed solution of ethanol and water, wherein the volume ratio of the ethanol to the water is 1.5: 1.
4. The potting process according to claim 3, wherein in step A, the amount of the catalyst is 0.5-2.5 wt% of the amount of the raw materials; the dosage of the dispersing agent is 2-5.5 wt% of the dosage of the raw materials; the volume weight ratio of the solvent to the raw material is 8-10 mL: 1g of the total weight of the composition.
5. The encapsulation process according to any one of claims 1 to 4, wherein in the step B, the foaming temperature is 80 ± 5 ℃; the foaming time is 3-5 min.
6. The potting process of claim 5, wherein the primary expanded fluorine-containing polystyrene microspheres have a particle size of 2000 ± 100 μm.
7. The potting process of any of claims 1 to 4 or 6, wherein in step C the temperature of the potting is 100 to 125 ℃.
8. The potting process of claim 7, wherein in step C, the potting time is 40-60 min.
9. The potting process of claim 8, wherein in step C, the potting pressure is 35-90 KPa.
CN201910436184.9A 2019-05-23 2019-05-23 Encapsulation process of microstrip patch antenna Active CN110128581B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910436184.9A CN110128581B (en) 2019-05-23 2019-05-23 Encapsulation process of microstrip patch antenna

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910436184.9A CN110128581B (en) 2019-05-23 2019-05-23 Encapsulation process of microstrip patch antenna

Publications (2)

Publication Number Publication Date
CN110128581A CN110128581A (en) 2019-08-16
CN110128581B true CN110128581B (en) 2021-12-31

Family

ID=67573028

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910436184.9A Active CN110128581B (en) 2019-05-23 2019-05-23 Encapsulation process of microstrip patch antenna

Country Status (1)

Country Link
CN (1) CN110128581B (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW495528B (en) * 1997-01-20 2002-07-21 Sekisui Plastics Expandable thermoplastic resin beads and expanded molded articles manufactured therefrom
CN1478120A (en) * 2000-12-04 2004-02-25 ���Ŵ�ѧ Foamed cellular particles of expandable polymer composition
CN103855458A (en) * 2012-11-30 2014-06-11 台湾积体电路制造股份有限公司 Embedding low-K materials in antennas
CN105683270A (en) * 2013-11-11 2016-06-15 陶氏环球技术有限责任公司 Styrene-carboxylic acid copolymer foam

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8912242B2 (en) * 2011-02-10 2014-12-16 Fina Technology, Inc. Polar polystyrene copolymers for enhanced foaming

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW495528B (en) * 1997-01-20 2002-07-21 Sekisui Plastics Expandable thermoplastic resin beads and expanded molded articles manufactured therefrom
CN1478120A (en) * 2000-12-04 2004-02-25 ���Ŵ�ѧ Foamed cellular particles of expandable polymer composition
CN103855458A (en) * 2012-11-30 2014-06-11 台湾积体电路制造股份有限公司 Embedding low-K materials in antennas
CN105683270A (en) * 2013-11-11 2016-06-15 陶氏环球技术有限责任公司 Styrene-carboxylic acid copolymer foam

Also Published As

Publication number Publication date
CN110128581A (en) 2019-08-16

Similar Documents

Publication Publication Date Title
CN108570202B (en) Preparation method of polytetrafluoroethylene composite substrate material
CN108997525B (en) Polymethacrylimide foam with uniform pores and preparation method thereof
CN110128581B (en) Encapsulation process of microstrip patch antenna
CN107627678A (en) Electromagnetic shielding material of the low reflection of high-selenium corn and preparation method thereof
CN102924691A (en) Method for preparing low-dielectric epoxy resin composite material
CN113512138A (en) Preparation method of bis (benzocyclobutene) vinyl resin
CN115873406A (en) Modified BT resin and preparation method thereof
CN102351467A (en) Preparation method of wave-absorbing composite material used for isolator loading
CN110256848A (en) A kind of magnetoelectric composites and preparation method thereof
CN101456952A (en) Cyanate ester/bimaleimide modified resin and preparation method
CN118201337B (en) Wave-absorbing radiator, manufacturing method thereof and electronic equipment
CN102683853A (en) Stagger standing wave synthesis dual dipole vibrator antenna
CN113990596A (en) Soft magnetic alloy material, preparation method and molded inductor
CN111269537B (en) Preparation method of epoxy resin-based composite wave-transmitting material
US20060211800A1 (en) Composite deelectric material and substrate
CN113527754A (en) Preparation method of double-crosslinked aerogel material
CN116082845A (en) Conductive silica gel and preparation method thereof
CN114031719A (en) Bismaleimide-triazine resin and preparation method and application thereof
CN115246994B (en) A thermal conductive and wave absorbing integrated flexible material and its preparation method and application
CN112812236B (en) SMC antenna housing for 5G communication and preparation method thereof
JP3772327B2 (en) High frequency components
CN107286627B (en) Composite material and preparation method thereof
CN112643984A (en) Special-shaped pipe fitting forming method used in communication field
CN119930892A (en) Self-toughening hydrocarbon copolymer for high-frequency high-speed copper-clad plate and preparation method thereof
CN115044172B (en) Single-component epoxy resin composition for prepreg and preparation method thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
PE01 Entry into force of the registration of the contract for pledge of patent right

Denomination of invention: A Sealing Process for Microstrip Patch Antennas

Granted publication date: 20211231

Pledgee: Chengdu financial holding Financing Guarantee Co.,Ltd.

Pledgor: CHENGDU XINGSHUI TECHNOLOGY Co.,Ltd.

Registration number: Y2024510000032

PE01 Entry into force of the registration of the contract for pledge of patent right