CN110089205A - Printed circuit board and manufacturing methods - Google Patents
Printed circuit board and manufacturing methods Download PDFInfo
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- CN110089205A CN110089205A CN201780079214.4A CN201780079214A CN110089205A CN 110089205 A CN110089205 A CN 110089205A CN 201780079214 A CN201780079214 A CN 201780079214A CN 110089205 A CN110089205 A CN 110089205A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4602—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
- H05K3/202—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using self-supporting metal foil pattern
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/429—Plated through-holes specially for multilayer circuits, e.g. having connections to inner circuit layers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4623—Manufacturing multilayer circuits by laminating two or more circuit boards the circuit boards having internal via connections between two or more circuit layers before lamination, e.g. double-sided circuit boards
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/0228—Cutting, sawing, milling or shearing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
Abstract
Description
技术领域technical field
本发明涉及一种能够确保生产性和经济性的印刷电路板及其制造方法。The present invention relates to a printed circuit board capable of ensuring productivity and economy and a method for manufacturing the same.
背景技术Background technique
印刷电路板(Printed Circuit Board,PCB)是被构成为集成配线而贴装多样的元件或使元件之间能够电连接的部件。随着技术的发展,人们正在制造具有多样的形态和功能的印刷电路板。A printed circuit board (PCB) is a component that is configured to integrate wiring and mount various components or enable electrical connection between components. With the development of technology, people are manufacturing printed circuit boards with various forms and functions.
以往,作为制造印刷电路板的方法,有利用发泡性胶带膜的方法。作为一例,如图1所图示,准备2个依次层叠有第一铜箔层11、绝缘部件12及第二铜箔层13的铜箔层叠板10后,将这些分别粘附于发泡性胶带膜20的上面及下面来形成多层结构体后,在所述第二铜箔层的一区域形成通孔14,之后,从所述多层结构体中去除发泡性胶带膜而分离为2个层叠体30。通过这种方法,可以容易地制造薄型的多层印刷电路板。然而,在将铜箔层叠板层叠于发泡性胶带膜时,药品可能会从所述层叠板与发泡性胶带膜的界面渗透至层叠板内,或者,被分离的层叠体的表面可能会存在膜残渣20a(参照图1的(d))。由于这样的膜残渣或渗透的药品,发生短路(short)等,导致印刷电路板的生产开工率下降,不合格率上升。Conventionally, as a method of manufacturing a printed wiring board, there is a method using a foamable tape film. As an example, as shown in FIG. 1, after preparing two copper foil laminates 10 sequentially laminated with a first copper foil layer 11, an insulating member 12 and a second copper foil layer 13, these are respectively adhered to a foamable After forming a multilayer structure on the upper and lower surfaces of the tape film 20, a through hole 14 is formed in a region of the second copper foil layer, and thereafter, the foamable tape film is removed from the multilayer structure and separated into 2 stacks 30 . By this method, thin multilayer printed circuit boards can be easily manufactured. However, when the copper foil laminate is laminated on the foam tape film, the drug may permeate into the laminate from the interface between the laminate and the foam tape film, or the surface of the separated laminate may be damaged. Film residue 20a exists (see (d) of FIG. 1 ). Short circuit (short) or the like occurs due to such film residues or infiltrated chemicals, which leads to a decrease in the production utilization rate of printed wiring boards and an increase in the defective rate.
发明内容SUMMARY OF THE INVENTION
技术问题technical problem
本发明的目的在于,提供一种能够提高基板的生产开工率的同时,减少基板的不合格率的印刷电路板及其制造方法。An object of the present invention is to provide a printed circuit board and a manufacturing method thereof capable of increasing the production utilization rate of the substrate and reducing the defective rate of the substrate.
技术方案Technical solutions
为实现上述目的,本发明提供一种印刷电路板的制造方法,根据一例,所述方法包括:准备依次包括第一金属层、金属离型层、以及厚度比所述第一金属层薄的第二金属层的金属部件的步骤(S100);将所述金属部件以使第二金属层与绝缘部件接触的方式分别层叠于绝缘部件的上面及下面来准备分离用芯部件的步骤(S200);将包括绝缘层和图案形成用金属层的单位部件层叠于所述分离用芯部件的各第一金属层来形成多层结构体的步骤(S300);在所述绝缘层及图案形成用金属层的一区域形成通孔的步骤(S400);对所述通孔及图案形成用金属层实施镀金来形成镀金层的步骤(S500);以及从在所述步骤(S500)中获得的多层结构体中分离所述分离用芯部件的金属离型层和第一金属层,并与第二金属层及绝缘部件一同去除金属离型层,从而分别分离而获得粘附有第一金属层的2个层叠体的步骤(S600)。In order to achieve the above object, the present invention provides a method for manufacturing a printed circuit board. According to one example, the method includes: preparing a first metal layer, a metal release layer, and a second metal layer that is thinner than the first metal layer. The step (S100) of the metal part of the two metal layers; the step of preparing the core part for separation by stacking the metal part on the top and bottom of the insulating part so that the second metal layer is in contact with the insulating part (S200); A step of forming a multilayer structure by laminating a unit member including an insulating layer and a pattern-forming metal layer on each of the first metal layers of the separation core member (S300); after the insulating layer and the pattern-forming metal layer A step (S400) of forming a via hole in a region of the via hole; a step (S500) of applying gold plating to the via hole and the metal layer for pattern formation to form a gold plated layer; and from the multilayer structure obtained in the step (S500) The metal release layer and the first metal layer of the core member for separation are separated in the body, and the metal release layer is removed together with the second metal layer and the insulating member, thereby separately separating to obtain 2 metal layers adhered to the first metal layer. The step of forming a stack (S600).
可选地,可以在所述步骤(S600)之前还包括:切断在所述步骤(S500)中获得的多层结构体的边缘区域的步骤。Optionally, before the step (S600), it may further include: a step of cutting off the edge region of the multilayer structure obtained in the step (S500).
此外,可以在所述步骤(S300)之前还包括:在所述步骤(S200)中获得的分离用芯部件向所述分离用芯部件的垂直方向贯通而形成用于印刷电路板内的层间相互配准(registration)的第一导向孔(guide hole)的步骤;以及在所述步骤(S400)之前还包括:用X光识别在所述步骤(S300)中获得的多层结构体内部的第一导向孔,并在所述多层结构体的边缘形成垂直贯通的第二导向孔的步骤。In addition, before the step (S300), it may further include: the separation core member obtained in the step (S200) penetrates in the vertical direction of the separation core member to form an interlayer used in the printed circuit board. A step of first guide holes of mutual registration (registration); and before said step (S400), further comprising: using X-rays to identify the inside of the multilayer structure obtained in said step (S300) a first guide hole, and forming a vertically penetrating second guide hole at the edge of the multilayer structure.
这里,所述金属离型层可以是由选自由铬(Cr)、镍(Ni)、锌(Zn)、钼(Mo)、钨(W)、钴(Co)、铅(Pb)、银(Ag)、钽(Ta)、铜(Cu)、铝(Al)、锰(Mn)、铁(Fe)、钛(Ti)、锡(Sn)、钢(Steel)以及钒(V)组成的组中的至少一个形成的。Here, the metal release layer can be selected from chromium (Cr), nickel (Ni), zinc (Zn), molybdenum (Mo), tungsten (W), cobalt (Co), lead (Pb), silver ( Ag), tantalum (Ta), copper (Cu), aluminum (Al), manganese (Mn), iron (Fe), titanium (Ti), tin (Sn), steel (Steel) and vanadium (V) At least one of them is formed.
就这样的金属离型层而言,金属蒸镀量可以是0.5至20mg/㎡。For such a metal release layer, the amount of metal vapor deposition may be 0.5 to 20 mg/㎡.
此外,所述第一金属层的厚度可以在6至35μm的范围内,所述第二金属层的厚度可以在0.5至5μm的范围内。In addition, the thickness of the first metal layer may be in the range of 6 to 35 μm, and the thickness of the second metal layer may be in the range of 0.5 to 5 μm.
此外,可以在与所述单位部件的绝缘层接触的第一金属层的表面形成有凹凸部。此时,所述凹凸部的平均粗糙度(Ra)可以在3.0至6.5μm的范围内。在这种情况下,所述绝缘层与第一金属层之间的粘接强度在0.8至3.0N/㎜的范围内。In addition, unevenness may be formed on the surface of the first metal layer that is in contact with the insulating layer of the unit component. At this time, the average roughness (Ra) of the concavo-convex portion may be in a range of 3.0 to 6.5 μm. In this case, the bonding strength between the insulating layer and the first metal layer is in the range of 0.8 to 3.0 N/mm.
在所述步骤(S600)中,当分离所述金属离型层与第一金属层时,金属离型层与第一金属层之间的离型力可以在10至90N/m的范围内。In the step (S600), when separating the metal release layer from the first metal layer, the release force between the metal release layer and the first metal layer may be in the range of 10 to 90 N/m.
此外,在所述步骤(S600)中以分离用芯部件为中心分别分离的层叠体的结构可以彼此相同。In addition, the structures of the laminated bodies which are respectively separated centering on the core member for separation in the step (S600) may be the same as each other.
另一方面,本发明提供一种通过前述方法制造的印刷电路板。作为一例,所述印刷电路板依次包括第一金属层、绝缘层、以及图案形成用金属层,且具备:形成于所述绝缘层及金属层的通孔;以及形成于未形成有所述通孔的金属层及所述通孔内的镀金层。In another aspect, the present invention provides a printed circuit board manufactured by the aforementioned method. As an example, the printed circuit board sequentially includes a first metal layer, an insulating layer, and a metal layer for pattern formation, and includes: through holes formed in the insulating layer and the metal layer; The metal layer of the hole and the gold plating layer in the through hole.
另一方面,作为用于制造前述印刷电路板的中间体,本发明提供一种用于形成印刷电路板的多层结构体。所述用于形成印刷电路板的多层结构体包括:分离用芯部件,其包括绝缘部件和分别层叠于所述绝缘部件的上面及下面的金属部件;以及单位部件,其分别层叠于所述分离用芯部件的上面及下面,且依次包括绝缘层及图案形成用金属层,所述金属部件依次包括:第一金属层;金属离型层;以及厚度比所述第一金属层薄,且与所述绝缘部件接触的第二金属层。On the other hand, the present invention provides a multilayer structure for forming a printed circuit board as an intermediate for manufacturing the aforementioned printed circuit board. The multilayer structure for forming a printed circuit board includes: a separation core member including an insulating member and metal members respectively laminated on the upper and lower surfaces of the insulating member; and unit members respectively laminated on the insulating member. The upper and lower sides of the core member for separation, and sequentially include an insulating layer and a metal layer for pattern formation, the metal member sequentially includes: a first metal layer; a metal release layer; and a thickness thinner than the first metal layer, and A second metal layer in contact with the insulating member.
这里,可以是,在所述分离用芯部件,垂直贯通而形成有用于印刷电路板内的层间相互配准的第一导向孔,在所述多层结构体的边缘形成有垂直贯通的第二导向孔。Here, a first guide hole for mutual registration between layers in a printed circuit board may be formed vertically penetrating through the separation core member, and a first guide hole vertically penetrating may be formed at the edge of the multilayer structure. Two guide holes.
所述金属离型层与第一金属层可以通过10至90N/m的力分离。The metal release layer and the first metal layer can be separated by a force of 10 to 90 N/m.
此外,可以在与所述单位部件的绝缘层接触的第一金属层的表面形成有凹凸部。In addition, unevenness may be formed on the surface of the first metal layer that is in contact with the insulating layer of the unit component.
同时,本发明提供一种包括前述用于形成印刷电路板的多层结构体的印刷电路板。Meanwhile, the present invention provides a printed circuit board including the aforementioned multilayer structure for forming a printed circuit board.
发明的效果effect of invention
本发明的印刷电路板的制造方法利用能够与第一金属层离型的金属离型层介于所述第一金属层与第二金属层的分离用芯部件,从而,相比利用发泡性胶带膜的以往的制造方法,可以在提高印刷电路板的生产开工率的同时,减少不合格率。The manufacturing method of the printed circuit board of the present invention utilizes the metal release layer that can be released from the first metal layer and is interposed between the first metal layer and the second metal layer. The conventional manufacturing method of the tape film can reduce the defective rate while increasing the production operating rate of the printed circuit board.
此外,由于代替发泡性胶带膜而使用分离用芯部件,能够同时制作多个印刷电路板,从而能够提高制造工程的生产性。In addition, by using the core member for separation instead of the foamable tape film, a plurality of printed wiring boards can be produced at the same time, and the productivity of the manufacturing process can be improved.
同时,使印刷电路板的非对称结构导致的制造工程中的弯曲和作为最终物的结构性弯曲特性最小化,从而能够确保制造的容易性。At the same time, it is possible to ensure ease of manufacture by minimizing warping in the manufacturing process due to the asymmetric structure of the printed circuit board and structural warping characteristics of the final product.
附图说明Description of drawings
图1是示出以往印刷电路板的制造工程的流程图。FIG. 1 is a flow chart showing a manufacturing process of a conventional printed wiring board.
图2至图6是示出本发明的一实施例的印刷电路板的制造工程的剖视图。2 to 6 are cross-sectional views showing a manufacturing process of a printed circuit board according to an embodiment of the present invention.
图7是示出本发明的另一实施例的印刷电路板的制造工程的剖视图。FIG. 7 is a cross-sectional view showing a manufacturing process of a printed circuit board according to another embodiment of the present invention.
图8至图9是示出本发明的又一实施例的印刷电路板的制造工程的剖视图。8 to 9 are sectional views showing the manufacturing process of the printed circuit board according to still another embodiment of the present invention.
图10是示出在本发明中使用的分离用芯部件的另一实施方式的剖视图。Fig. 10 is a cross-sectional view showing another embodiment of the separation core member used in the present invention.
符号说明Symbol Description
10:铜箔层叠板,11、13:铜箔,12:绝缘部件,20:发泡性胶带膜,20a:膜残渣,30:层叠体,100:分离用芯部件,111a、111b:第一金属层,112a、112b:金属离型层,113a、113b:第二金属层,120:绝缘部件,111a-1、111b-1:凹凸部,131:第一导向孔,132:第二导向孔,200:多层结构体,210a、210b:单位部件,211a、211b:绝缘层,212a、212b:图案形成用金属层,213a、213b:通孔,214a、214b:镀金层,220a、220b:层叠体,300、400:多层结构体,310a、310b、410a、420b:层叠体,X、Y:切断部位。10: Copper foil laminate, 11, 13: Copper foil, 12: Insulation member, 20: Foam tape film, 20a: Film residue, 30: Laminate, 100: Separation core member, 111a, 111b: First Metal layer, 112a, 112b: metal release layer, 113a, 113b: second metal layer, 120: insulating member, 111a-1, 111b-1: concavo-convex part, 131: first guide hole, 132: second guide hole , 200: multilayer structure, 210a, 210b: unit parts, 211a, 211b: insulating layer, 212a, 212b: metal layer for pattern formation, 213a, 213b: through hole, 214a, 214b: gold plating layer, 220a, 220b: Laminated body, 300, 400: multilayer structure, 310a, 310b, 410a, 420b: laminated body, X, Y: cutting site.
具体实施方式Detailed ways
下面对本发明进行说明。The present invention will be described below.
本发明的特征在于,在制造印刷电路板时,利用使能够与第一金属层分离的金属离型层介于所述第一金属层与第二金属层的分离用芯部件,从而,之后通过使所述金属离型层与第一金属层分离,与第二金属层一同去除所述金属离型层的方式来同时制造粘附有第一金属层的2个层叠体。当通过这样的本发明制造印刷电路板时,可以在提高制造工程的生产性的同时,减少不合格率。The present invention is characterized in that, when manufacturing a printed circuit board, a metal release layer capable of being separated from the first metal layer is interposed between the first metal layer and the second metal layer. The metal release layer was separated from the first metal layer, and the metal release layer was removed together with the second metal layer to simultaneously manufacture two laminates to which the first metal layer was adhered. When manufacturing printed wiring boards according to the present invention, it is possible to reduce the defective rate while improving the productivity of the manufacturing process.
本发明人得知,当利用将在金属箔的一面蒸镀能够与所述金属箔离型的金属层(下称“金属离型层”)而形成的2个金属部件粘附于绝缘部件的上下面的形态的分离部件来制造印刷电路板时,可以在分离工程中使所述金属箔与金属离型层容易分离。具体地,由于所述金属离型层通过蒸镀法(例如,电解蒸镀法(electro-deposition)等)直接蒸镀于金属箔的一面,因而在通常的状态下可以稳定地与所述金属箔粘附。此外,由于所述金属离型层由能够与金属箔离型的金属而成,因而可以通过规定的外力与金属箔分离。The inventors have learned that when two metal parts formed by vapor-depositing a metal layer (hereinafter referred to as "metal release layer") that can be released from the metal foil on one side of the metal foil are adhered to the insulating part When a printed circuit board is manufactured by separating parts in the upper and lower forms, the metal foil and the metal release layer can be easily separated in the separation process. Specifically, since the metal release layer is directly evaporated on one side of the metal foil by an evaporation method (for example, electrolytic evaporation (electro-deposition), etc.), it can be stably bonded to the metal foil in a normal state. Foil adheres. In addition, since the metal release layer is made of a metal that can be released from the metal foil, it can be separated from the metal foil by a predetermined external force.
需要说明的是,由于所述金属离型层通过蒸镀法形成,因而轮廓(profile)具有近乎0(zero)的平坦性。因此,所述金属离型层与绝缘部件的粘接力(接合力)较低,因此,在层叠工程时,所述金属离型层与绝缘部件可能会分离。此外,由于所述金属离型层与绝缘部件的较低的接合力,在分离工程时,由于绝缘部件无法支撑(把持)金属离型层,比起与金属箔分离,金属离型层更可能与绝缘部件分离。It should be noted that since the metal release layer is formed by vapor deposition, the profile has almost zero (zero) flatness. Therefore, since the adhesive force (bonding force) of the metal release layer and the insulating member is low, the metal release layer and the insulating member may be separated during the lamination process. In addition, due to the lower bonding force of the metal release layer and the insulating part, the metal release layer is more likely to be separated from the metal foil than the metal foil during the separation process because the insulating part cannot support (hold) the metal release layer. separate from insulating parts.
何况,在分离工程,金属箔应与金属离型层分离而粘附于层叠体,但若所述金属箔的厚度过薄,分离时可能会使金属箔变形或受损,此外还存在后续在所述金属箔形成电路图案时无法直接进行图形化,而需要形成种层的麻烦。What's more, in the separation process, the metal foil should be separated from the metal release layer and adhered to the laminate, but if the thickness of the metal foil is too thin, the metal foil may be deformed or damaged during separation. When the metal foil is formed into a circuit pattern, it cannot be directly patterned, but requires the trouble of forming a seed layer.
因此,在本发明中,在印刷电路板的制造中利用将在第一金属层111a、111b的一面依次层叠有能够与所述第一金属层分离的金属离型层112a、112b及厚度比所述第一金属层薄的第二金属层113a、113b的2个金属部件分别粘附于绝缘部件120的上下面而获得的分离用芯部件100(参照图2)。这样的本发明可以在提高印刷电路板的生产开工率的同时,减少不合格率,进而可以同时制作多个印刷电路板,因而能够提高制造工程的生产性。Therefore, in the present invention, the metal release layers 112a, 112b that can be separated from the first metal layer are sequentially stacked on one side of the first metal layer 111a, 111b in the manufacture of the printed circuit board, and the thickness ratio is determined. The separation core member 100 (see FIG. 2 ) obtained by adhering the two metal members of the second metal layer 113 a and 113 b with a thinner first metal layer to the upper and lower surfaces of the insulating member 120 , respectively. Such an invention can increase the operating rate of printed circuit boards while reducing the defective rate, and can manufacture multiple printed circuit boards at the same time, thereby improving the productivity of the manufacturing process.
<印刷电路板的制造方法><Manufacturing method of printed circuit board>
本发明的一实施例的印刷电路板的制造方法包括:准备依次包括第一金属层、金属离型层、以及厚度比所述第一金属层薄的第二金属层的金属部件的步骤(S100);将所述金属部件以使第二金属层与绝缘部件接触的方式分别层叠于绝缘部件的上面及下面来准备分离用芯部件的步骤(S200);将包括绝缘层和图案形成用金属层的单位部件层叠于所述分离用芯部件的各第一金属层来形成多层结构体的步骤(S300);在所述绝缘层及图案形成用金属层的一区域形成通孔的步骤(S400);对所述通孔及图案形成用金属层实施镀金来形成镀金层的步骤(S500);以及从在所述步骤(S500)中获得的多层结构体中分离所述分离用芯部件的金属离型层和第一金属层,并与第二金属层及绝缘部件一同去除金属离型层,从而分别分离而获得粘附有第一金属层的2个层叠体的步骤(S600)。需要说明的是,并不只限于所述制造方法,根据需要,各工程的步骤可以被变形或选择性地混用而执行。The manufacturing method of the printed circuit board of an embodiment of the present invention comprises: prepare the step (S100 ); the step of preparing the core member for separation by laminating the metal member on the upper and lower surfaces of the insulating member so that the second metal layer is in contact with the insulating member (S200); will include the insulating layer and the metal layer for pattern formation The step of forming a multilayer structure by stacking the unit parts on each first metal layer of the separation core part (S300); the step of forming a via hole in a region of the insulating layer and the pattern forming metal layer (S400 ); the step of forming a gold-plated layer by applying gold plating to the through hole and the metal layer for pattern formation (S500); and separating the separation core member from the multilayer structure obtained in the step (S500) The step of removing the metal release layer and the first metal layer, and removing the metal release layer together with the second metal layer and the insulating member, thereby separately obtaining two laminates with the first metal layer adhered (S600). It should be noted that it is not limited to the manufacturing method described above, and the steps of each process can be modified or selectively mixed and executed as needed.
此时,优选所述制造方法以分离用芯部件为中心对分离用芯部件的上部和下部均分别相同地进行步骤(S300)至步骤(S500)。In this case, it is preferable that the manufacturing method performs the steps ( S300 ) to ( S500 ) in the same manner for both the upper part and the lower part of the separation core member, centering on the separation core member.
下面参照所附图2至图9对在根据本发明制造印刷电路板时所执行的各个步骤进行说明。The various steps performed when manufacturing a printed circuit board according to the present invention will be described below with reference to the accompanying FIGS. 2 to 9 .
(1)步骤(S100):金属部件的准备(1) Step (S100): Preparation of Metal Parts
参照图2,金属部件110a、110b包括第一金属层111a、111b、金属离型层112a、112b以及第二金属层113a、113b。Referring to FIG. 2, the metal parts 110a, 110b include first metal layers 111a, 111b, metal release layers 112a, 112b, and second metal layers 113a, 113b.
在本发明中,将金属离型层蒸镀而层叠于第一金属层后,将第二金属层粘接或蒸镀于所述金属离型层来另行准备金属部件后,在步骤(S200)中将金属部件粘合于绝缘部件来获得分离用芯部件。因为,当将第二金属层层叠于绝缘部件后通过蒸镀来形成金属离型层时,由于所述绝缘部件为不通电的材质,为了通过蒸镀法形成金属离型层,需要等离子体形态的另外的设备。因此,在本发明中,另行准备金属部件后,将其与绝缘部件粘合来获得分离用芯部件。In the present invention, after the metal release layer is vapor-deposited and stacked on the first metal layer, the second metal layer is bonded or vapor-deposited on the metal release layer to prepare a metal part separately, and in step (S200) In this method, a metal part is bonded to an insulating part to obtain a core part for separation. Because, when the metal release layer is formed by vapor deposition after the second metal layer is laminated on the insulating member, since the insulating member is a non-conductive material, in order to form the metal release layer by vapor deposition, a plasma state is required. additional equipment. Therefore, in the present invention, a metal member is separately prepared, and then bonded to an insulating member to obtain a core member for separation.
所述第一金属层111a、111b是在作为分离步骤的步骤(S600)中通过金属离型层从分离用芯部件100分离(脱粘)被粘附于各层叠体的一面的部分,之后,可以在起到印刷电路板地支撑体的作用的同时,无需种层即可通过图形化而起到配线层的作用。The first metal layers 111a, 111b are the parts that are adhered to one side of each laminated body after being separated (debonded) from the separation core member 100 through the metal release layer in the step (S600) as the separation step, While functioning as a support for a printed circuit board, it can function as a wiring layer by patterning without requiring a seed layer.
就这样的第一金属层111a、111b而言,只要是由本行业内为了形成电路图案而使用的导电性物质构成的金属薄膜形态,则不做特殊限定。作为所述导电性物质的非限制性的例子,有铬(Cr)、镍(Ni)、锌(Zn)、钼(Mo)、钨(W)、钴(Co)、铅(Pb)、银(Ag)、钽(Ta)、铜(Cu)、铝(Al)、锰(Mn)、铁(Fe)、钛(Ti)、锡(Sn)、钢(Steel)、锌(Zn)及钒(V)、钯(Pd)等,这些物质可以单独使用,或2种以上被混合或以合金形态使用。其中,考虑经济性,优选使用铜薄膜。Such first metal layers 111a and 111b are not particularly limited as long as they are in the form of metal thin films made of conductive substances used in the industry to form circuit patterns. Non-limiting examples of the conductive substance include chromium (Cr), nickel (Ni), zinc (Zn), molybdenum (Mo), tungsten (W), cobalt (Co), lead (Pb), silver (Ag), tantalum (Ta), copper (Cu), aluminum (Al), manganese (Mn), iron (Fe), titanium (Ti), tin (Sn), steel (Steel), zinc (Zn) and vanadium (V), palladium (Pd), and the like may be used alone, or two or more of them may be mixed or used in the form of an alloy. Among them, it is preferable to use a copper thin film in consideration of economical efficiency.
此外,虽然对所述第一金属层的厚度不做特殊限定,当在约6至35μm的范围内时,可以防止在分离工程中分离的层叠体内的电路图案层或绝缘层变形或受损的同时,后续无需种层即可在短时间内通过图形化形成电路图案而起到配线层的作用。In addition, although the thickness of the first metal layer is not particularly limited, when it is in the range of about 6 to 35 μm, it is possible to prevent deformation or damage of the circuit pattern layer or the insulating layer in the separated laminated body in the separation process. At the same time, a circuit pattern can be formed by patterning in a short period of time without the need for a seed layer to function as a wiring layer.
所述第一金属层111a、111b包括形成于与单位部件的绝缘层211a、211b接触的表面的凹凸部111a-1、111b-1(参照图10)。通过所述凹凸部111a-1、111b-1,可以进一步提高第一金属层111a、111b与绝缘层211a、211b之间的粘接力(结合力)。因此,在后续分离工程中使第一金属层与金属离型层分离时,可以使第一金属层与绝缘层之间的玻璃强度下降所导致的图案剥离(Pattern Peel Off)缺陷的发生最少化。The first metal layers 111a, 111b include concavo-convex portions 111a-1, 111b-1 formed on surfaces in contact with the insulating layers 211a, 211b of the unit parts (see FIG. 10 ). The concavo-convex portions 111a-1, 111b-1 can further increase the adhesion (bonding force) between the first metal layers 111a, 111b and the insulating layers 211a, 211b. Therefore, when the first metal layer is separated from the metal release layer in the subsequent separation process, the occurrence of pattern peeling (Pattern Peel Off) defects caused by the decrease in the strength of the glass between the first metal layer and the insulating layer can be minimized .
虽然对所述凹凸部的平均粗糙度(Ra)不做特殊限定,当在约3.0至6.5μm的范围内时,可以使第一金属层与绝缘层之间的粘接强度进一步提高至0.8至3.0N/mm左右。Although the average roughness (Ra) of the concave-convex portion is not particularly limited, when it is in the range of about 3.0 to 6.5 μm, the bonding strength between the first metal layer and the insulating layer can be further increased to 0.8 to 0.8 μm. About 3.0N/mm.
所述金属离型层112a、112b形成于所述第一金属层111a、111b的一面。由于所述金属离型层被直接蒸镀而形成于第一金属层,因而在层叠工程、通孔形成工程及镀金工程(以下步骤(S300)至步骤(S500))中可以稳定地维持与第一金属层的粘附状态。另一方面,第二金属层被直接蒸镀而形成于所述金属离型层,这样的第二金属层与绝缘部件粘附。即,所述金属离型层112a、112b被与绝缘部件接触而接合的第二金属层113a、113b支撑。因此,在分离工程(以下步骤(S600))中分离所述金属离型层112a、112b与第一金属层111a、111b时,可以通过规定的外力使金属离型层112a、112b与第一金属层相互分离,所述金属离型层112a、112b是能够与第一金属层111a、111b分离的(releasable)金属层,不同于高分子离型膜,在层叠工程时不会发生层间剥离,并且,不同于发泡性胶带膜,在分离工程时即使金属离型层的一部分被转录至第一金属层,也不会引发短路(short)。The metal release layers 112a, 112b are formed on one side of the first metal layer 111a, 111b. Since the metal release layer is directly evaporated and formed on the first metal layer, it can be stably maintained in the lamination process, through-hole formation process and gold-plating process (following steps (S300) to steps (S500)). Adhesion state of a metal layer. On the other hand, the second metal layer is directly evaporated and formed on the metal release layer, and such a second metal layer is adhered to the insulating member. That is, the metal release layers 112a, 112b are supported by the second metal layers 113a, 113b that are bonded in contact with the insulating member. Therefore, when separating the metal release layer 112a, 112b from the first metal layer 111a, 111b in the separation process (following steps (S600)), the metal release layer 112a, 112b and the first metal layer can be separated by a prescribed external force. Layers are separated from each other, and the metal release layers 112a, 112b are releasable metal layers that can be separated from the first metal layers 111a, 111b. Unlike polymer release films, interlayer peeling does not occur during the lamination process. Furthermore, unlike a foamable tape film, even if a part of the metal release layer is transcribed to the first metal layer during the separation process, no short circuit (short) occurs.
这样的金属离型层由选自由铬(Cr)、镍(Ni)、锌(Zn)、钼(Mo)、钨(W)、钴(Co)、铅(Pb)、银(Ag)、钽(Ta)、铜(Cu)、铝(Al)、锰(Mn)、铁(Fe)、钛(Ti)、锡(Sn)、钢(Steel)以及钒(V)组成的组中的至少一个形成。此时,当所述金属离型层与第一金属层为彼此反应性较低的异种金属时,在分离工程中可以避免层叠体的避免或损伤,仅凭较少的力即可与第一金属层容易分离。例如,当所述第一金属层为铜层时,所述第一金属离型层可以是与铜层不同的其他成分,例如,铬、镍等。Such a metal release layer is selected from chromium (Cr), nickel (Ni), zinc (Zn), molybdenum (Mo), tungsten (W), cobalt (Co), lead (Pb), silver (Ag), tantalum At least one of the group consisting of (Ta), copper (Cu), aluminum (Al), manganese (Mn), iron (Fe), titanium (Ti), tin (Sn), steel (Steel), and vanadium (V) form. At this time, when the metal release layer and the first metal layer are dissimilar metals with low reactivity to each other, the laminated body can be avoided or damaged in the separation process, and the first metal layer can be separated from the first metal layer with less force. The metal layer is easy to separate. For example, when the first metal layer is a copper layer, the first metal release layer may be other components different from the copper layer, such as chromium, nickel, and the like.
虽然对所述金属离型层的厚度不做特殊限定,以纳米单位而言,将根据金属蒸镀量而不同。此外,根据所述金属蒸镀量,在分离工程时,金属离型层的离型力(releaseforce)也会不同。即,金属蒸镀量越增加,在分离工程时,金属离型层的离型力也会上升。由于这样的原因,当所述金属蒸镀量过多时,在分离工程中,金属离型层与第一金属层之间的分离可能不容易;另一方面,当金属蒸镀量过少时,在层叠工程时,还可能会发生金属离型层与第一金属层之间的层间剥离。因此,为了使所述金属离型层避免在层叠工程中发生层间剥离且具有在分离工程时与第一金属层容易分离的程度的离型力,可以将所述金属蒸镀量调节至约0.5至20mg/㎡的范围,优选调节至约3.5至8mg/㎡的范围。根据这样的金属蒸镀量,所述金属离型层可以具有约20nm以下,优选约5至20nm的范围的厚度,此外,在分离工程中,可以通过约10至90N/m,优选约15至60N/m,更优选约20至55N/m的范围内的离型力与第一金属层分离。Although there is no particular limitation on the thickness of the metal release layer, it will vary according to the amount of metal vapor deposition in nanometer units. In addition, the release force of the metal release layer also differs during the separation process depending on the amount of vapor deposition of the metal. That is, as the amount of metal vapor deposition increases, the release force of the metal release layer also increases during the separation process. For such reasons, when the metal vapor deposition amount is too much, in the separation process, the separation between the metal release layer and the first metal layer may not be easy; on the other hand, when the metal vapor deposition amount is too little, the During the lamination process, delamination between the metal release layer and the first metal layer may also occur. Therefore, in order to make the metal release layer avoid interlayer peeling in the lamination process and have a release force to the extent that it is easy to separate from the first metal layer in the separation process, the metal vapor deposition amount can be adjusted to about The range of 0.5 to 20 mg/㎡, preferably adjusted to the range of about 3.5 to 8 mg/㎡. According to such a metal vapor deposition amount, the metal release layer can have a thickness of about 20 nm or less, preferably about 5 to 20 nm, and in addition, in the separation process, it can pass about 10 to 90 N/m, preferably about 15 to 20 nm. A release force of 60 N/m, more preferably in the range of about 20 to 55 N/m separates the first metal layer.
这样的金属离型层可以通过非现有涂布法的蒸镀法形成。例如,在22℃的温度下,通过利用包括铬酸约150~300g/l(优选地,约240~260g/l)及硫酸约1.5~3g/l(优选地,约2.2~2.5g/l)的电解液的电解蒸镀(electro-deposition),将所述金属离型层直接蒸镀而形成于第一金属层的一面。此时,所述金属离型层的金属蒸镀量可以在约0.5至20mg/㎡的范围内。Such a metal release layer can be formed by a vapor deposition method other than the conventional coating method. For example, at a temperature of 22°C, by using about 150-300 g/l (preferably, about 240-260 g/l) of chromic acid and about 1.5-3 g/l (preferably, about 2.2-2.5 g/l) of sulfuric acid ) electrolytic evaporation (electro-deposition), the metal release layer is directly evaporated and formed on one side of the first metal layer. At this time, the metal vapor deposition amount of the metal release layer may be in the range of about 0.5 to 20 mg/㎡.
如图2所图示,所述金属部件110a、110b包括形成于前述金属离型层112a、112b的另一面的第二金属层113a、113b。所述第二金属层113a、113b是在分离步骤中与金属离型层112a、112b一同被分离而去除的部分,通过提高所述金属离型层与绝缘部件之间的粘接力来支撑金属离型层,使金属离型层在分离步骤中从与第一金属层的界面分离。As shown in FIG. 2 , the metal components 110a, 110b include second metal layers 113a, 113b formed on the other side of the aforementioned metal release layers 112a, 112b. The second metal layer 113a, 113b is the part that is separated and removed together with the metal release layer 112a, 112b in the separation step, and supports the metal by improving the adhesion between the metal release layer and the insulating part. A release layer that separates the metal release layer from the interface with the first metal layer in the separation step.
就所述第二金属层113a、113b的厚度而言,只要比所述第一金属层111a、111b的厚度薄,则不对其做特殊限定。根据一例,当所述第一金属层的厚度为约6至35μm时,所述第二金属层的厚度可以在约0.5至5μm的范围内。The thickness of the second metal layer 113a, 113b is not particularly limited as long as it is thinner than the thickness of the first metal layer 111a, 111b. According to an example, when the thickness of the first metal layer is about 6 to 35 μm, the thickness of the second metal layer may be in a range of about 0.5 to 5 μm.
这样的第二金属层为由导电性物质构成的金属薄膜形态,作为所述导电性物质的例子,如同在所述第一金属层中上述。此时,所述第二金属层的成分可以与所述第一金属层的成分相同或不同。Such a second metal layer is in the form of a thin metal film made of a conductive substance, and examples of the conductive substance are the same as those described above for the first metal layer. At this time, the composition of the second metal layer may be the same as or different from that of the first metal layer.
(2)步骤(S200):分离用芯部件的准备(2) Step (S200): Preparation of core member for separation
参照图2,分离用芯部件100为将在所述步骤(S100)中获得的金属部件110a、110b分别层叠于绝缘部件120的上面及下面而获得的形态,所述金属部件的第二金属层113a、113b与绝缘部件120接触而接合。这样的分离用芯部件100为与本行业的金属箔层叠板相同的形态,在层叠工程时,不容易因物理或热冲击而发生层间剥离。Referring to FIG. 2 , the separation core member 100 is in the form obtained by laminating the metal members 110a and 110b obtained in the step (S100) on the upper and lower surfaces of the insulating member 120 respectively, and the second metal layer of the metal member 113a and 113b are in contact with and joined to the insulating member 120 . Such a separation core member 100 has the same form as the metal foil laminates in this industry, and delamination is less likely to occur due to physical or thermal shock during the lamination process.
所述绝缘部件120起到分离用芯部件的支撑体的作用,在分离步骤中与第二金属层113a、113b及金属离型层112a、112b一同被去除。就本发明中可使用的绝缘部件120而言,只要是在本行业内公知的,则可以不受特殊限定地使用,例如,可以是聚酰亚胺(PI)等软性材料;利用玻璃纤维(glass fiber)、BT、环氧树脂、酚醛树脂等的混合材料的刚性材料等。其中,若使用包括环氧树脂树脂及玻璃纤维的半固化状态的预浸材料(prepreg),则在与所述金属部件粘合时无缝地贴紧于金属部件,因而不但可以使层叠工程中的层间剥离最小化,而且,从批量生产方面而言,相比别的材料更易于制造。The insulating member 120 functions as a support for the core member for separation, and is removed together with the second metal layers 113a, 113b and the metal release layers 112a, 112b in the separation step. As for the insulating member 120 that can be used in the present invention, as long as it is well known in the industry, it can be used without special limitations, for example, it can be soft materials such as polyimide (PI); (glass fiber), BT, epoxy resin, phenolic resin and other mixed materials of rigid materials. Among them, if a prepreg material (prepreg) in a semi-cured state including epoxy resin resin and glass fiber is used, it will be seamlessly attached to the metal part when it is bonded to the metal part, so that not only can the lamination process The delamination between the layers is minimized, and, in terms of mass production, it is easier to manufacture than other materials.
(3)步骤(S300):多层结构体的形成(3) Step (S300): Formation of a multilayer structure
如图3所图示,在所述步骤(S200)中准备的分离用芯部件100的各个第一金属层111a、111b上层叠包括绝缘层211a、211b及层叠于其一面的图案形成用金属层212a、212b的单位部件210a、210b并压紧来形成多层结构体200。此时,所述绝缘层211a、211b与第一金属层111a、111b接触。As shown in FIG. 3 , on each of the first metal layers 111 a and 111 b of the separation core member 100 prepared in the step ( S200 ), a pattern-forming metal layer including insulating layers 211 a and 211 b and one side thereof is laminated. The unit parts 210 a , 210 b of 212 a , 212 b are pressed together to form the multilayer structure 200 . At this time, the insulating layers 211a, 211b are in contact with the first metal layers 111a, 111b.
所述多层结构体200以所述分离用芯部件100为中心而包括依次层叠于其上面(即,第一金属层111a)上的绝缘层211a及图案形成用金属层212a;以及依次层叠于所述分离用芯部件110的下面(即,第一金属层111b)上的绝缘层211b及图案形成用金属层212b。The multilayer structure 200 includes an insulating layer 211a and a pattern-forming metal layer 212a sequentially stacked on top of the separation core member 100 (that is, the first metal layer 111a ); The insulating layer 211b and the pattern-forming metal layer 212b on the lower surface of the separation core member 110 (that is, the first metal layer 111b).
此时,所述绝缘层与图案形成用金属层以分离用芯部件为中心分别独立地配置于上部及下部。因此,所述绝缘层可以被分别区分为上部绝缘层211a和下部绝缘层211b,图案形成用金属层也可以被分别区分为图案形成用上部金属层212a和图案形成用下部金属层212b。下面,以分离用芯部件为中心分别使用于上部及下部的本发明的又一构成也可以被相同地区分。At this time, the insulating layer and the metal layer for pattern formation are respectively independently arranged on the upper part and the lower part centering on the isolation core member. Therefore, the insulating layer can be divided into an upper insulating layer 211a and a lower insulating layer 211b, respectively, and the pattern-forming metal layer can also be divided into a pattern-forming upper metal layer 212a and a pattern-forming lower metal layer 212b. Next, still another configuration of the present invention that is used for the upper part and the lower part centering on the separation core member can also be similarly distinguished.
如下参照图3进行详细说明。多层结构体200以下部绝缘层211b、分离用芯部件100、上部绝缘层211a及图案形成用上部金属层212a的顺序层叠于图案形成用下部金属层212b上。The details will be described below with reference to FIG. 3 . The multilayer structure 200 is stacked on the pattern forming lower metal layer 212b in this order of the lower insulating layer 211b, the isolation core member 100, the upper insulating layer 211a, and the pattern forming upper metal layer 212a.
所述上部绝缘层211a及下部绝缘层211b是分别在最终印刷电路板使相互连接的各个层电连接而形成印刷电路板的外观,并提供耐久力的部分。如同前述分离用芯部件100的绝缘部件120,这样的绝缘层的材料可以是具有黏着特性的热固性树脂、可以是聚酰亚胺(PI)等软性材料、利用玻璃纤维、BT、环氧树脂、酚醛树脂等混合材料的刚性材料等。可以使无机填充剂或玻璃纤维等整体上均匀地分别于所述绝缘层来调节热膨胀系数,也可以分别调节高分子物质与玻璃纤维的热膨胀系数而使用。The upper insulating layer 211a and the lower insulating layer 211b are parts that electrically connect the interconnected layers in the final printed circuit board to form the appearance of the printed circuit board and provide durability. Like the insulating member 120 of the aforementioned separation core member 100, the material of such an insulating layer can be a thermosetting resin with adhesive properties, can be a soft material such as polyimide (PI), utilize glass fiber, BT, epoxy resin, etc. , Rigid materials of mixed materials such as phenolic resin, etc. The thermal expansion coefficient may be adjusted by uniformly distributing an inorganic filler, glass fiber, etc. on the entirety of the insulating layer, or the thermal expansion coefficient of a polymer substance and glass fiber may be separately adjusted and used.
根据一例,所述上部绝缘层211a及下部绝缘层211b可以具有与所述分离用芯部件100的绝缘部件120相同的结构,这些120、211a、211b均可以由半固化状态的预浸材料(prepreg)构成。According to one example, the upper insulating layer 211a and the lower insulating layer 211b may have the same structure as the insulating member 120 of the separation core member 100, and these 120, 211a, and 211b may be made of semi-cured prepreg material (prepreg )constitute.
所述图案形成用上部金属层212a及图案形成用下部金属层212b不但可以发挥内层中的电导通功能,还可以发挥热通道(Heat path)的功能。对所述金属层的厚度不做特殊限定,例如,可以在9至12μm(1/4至1/3盎司(oz))的范围内。The upper metal layer 212a for pattern formation and the lower metal layer 212b for pattern formation can not only perform the function of electrical conduction in the inner layer, but also can function as a heat path. The thickness of the metal layer is not particularly limited, for example, it may be in the range of 9 to 12 μm (1/4 to 1/3 ounce (oz)).
本发明中虽然对依次层叠图案形成用下部金属层212b、下部绝缘层211b、分离用芯部件100、上部绝缘层211a及图案形成用上部金属层212a进行例示说明,但根据需要使这些的层叠顺序部分地变形或被选择性地混用的情况也落入本发明的范畴内。In the present invention, although the lower metal layer 212b for pattern formation, the lower insulating layer 211b, the core member 100 for separation, the upper insulating layer 211a, and the upper metal layer 212a for pattern formation are sequentially stacked in an example, the stacking order of these can be changed as necessary. Cases where they are partially deformed or selectively mixed also fall within the scope of the present invention.
(4)步骤(S400):通孔的形成(4) Step (S400): Formation of through-holes
在所述步骤(S300)中获得的多层结构体的图案形成用金属层及绝缘层的一区域形成通孔。The patterning of the multilayer structure obtained in the step ( S300 ) forms via holes in a region of the metal layer and the insulating layer.
如图4所图示,以分离用芯部件100为中心分别在上部及下部对称地或非对称地形成1个以上的通孔213a、213b。此时,通孔可以被区分为上部通孔213a和下部通孔213b。As shown in FIG. 4 , one or more through-holes 213 a , 213 b are formed symmetrically or asymmetrically on the upper and lower portions of the separation core member 100 . At this time, the through holes may be divided into upper through holes 213a and lower through holes 213b.
所述通孔可以通过在本行业内公知的方法形成。例如,可以用激光照射待形成通孔的部位而形成通孔。此时,对通孔的位置或形状、个数不做特殊限制,可以根据需要来自由调节。The through holes can be formed by methods known in the industry. For example, the through hole may be formed by irradiating the portion where the through hole is to be formed with laser light. At this time, there is no special limitation on the position, shape, and number of the through holes, which can be freely adjusted as required.
形成所述通孔后,可以进行去除在根据需要来加工所述通孔的过程中形成于内壁的不纯物的后处理工程。After forming the through hole, a post-processing process for removing impurities formed on the inner wall during processing the through hole as necessary may be performed.
(5)步骤(S500):形成通孔及图案形成用金属层的镀金层(5) Step (S500): forming a through hole and a gold-plated layer of the metal layer for pattern formation
之后,对所述通孔213a、213b及图案形成用金属层212a、212b进行镀金来形成镀金层214a、214b(参照图5)。此时,可以将所述镀金层214a、214b形成于所述通孔213a、213b的内壁,或填充所述通孔213a、213b内部而形成所述镀金层214a、214b。此外,形成所述镀金层214a、214b的图案形成用金属层212a、212b是未形成有通孔的图案形成用金属层212a、212b部分。After that, gold plating is performed on the through holes 213a, 213b and the metal layers 212a, 212b for pattern formation to form gold plating layers 214a, 214b (see FIG. 5 ). At this time, the gold-plated layers 214a, 214b may be formed on the inner walls of the through-holes 213a, 213b, or filled inside the through-holes 213a, 213b to form the gold-plated layers 214a, 214b. In addition, the metal layer 212a, 212b for pattern formation which forms the said gold-plated layer 214a, 214b is the part of the metal layer 212a, 212b for pattern formation in which the via-hole was not formed.
对所述镀金层形成方法不做特殊限制,可以按照在本行业内公知的通常的方法来执行。The method for forming the gold-plated layer is not particularly limited, and it can be performed according to a common method known in the industry.
(6)步骤S600:从多层结构体分离2个层叠体(6) Step S600: separating two laminated bodies from the multilayered structure
从在所述步骤(S500)中获得的多层结构体中分离而去除除了第一金属层以外的分离用芯部件,便获得在一面粘附有第一金属层的2个层叠体。The separation core member except the first metal layer is removed from the multilayer structure obtained in the step (S500) to obtain two laminates with the first metal layer adhered on one side.
如图6所图示,若使所述分离用芯部件100的金属离型层112a、112b与第一金属层111a、111b分离(脱粘),从所述多层结构体200中与2个第二金属层113a、113b及绝缘部件120一同去除2个金属离型层112a、112b,则可以从所述多层结构体200分别分离而获得在一面层叠有第一金属层111a、111b的2个层叠体220a、220b。As shown in FIG. 6, if the metal release layers 112a, 112b of the separation core member 100 are separated (debonded) from the first metal layers 111a, 111b, the two The second metal layer 113a, 113b and the insulating member 120 remove the two metal release layers 112a, 112b together, and then they can be separated from the multilayer structure 200 to obtain the two metal layers 111a, 111b laminated on one side. stacks 220a, 220b.
根据一例,当对所述分离用芯部件100的上部及下部分别执行了相同的制造步骤时,以分离用芯部件100为中心分离的各层叠体220a、220b的结构彼此相同。此时,各个层叠体220a、220b在第一金属层111a、111b上包括绝缘层211a、211b及图案形成用金属层212a、212b,且包括:形成于所述绝缘层211a、211b和图案形成用金属层212a、212b的通孔213a、213b;以及形成于所述通孔213a、213b及图案形成用金属层212a、212b的镀金层214a、214b。According to one example, when the same manufacturing steps are performed on the upper part and the lower part of the separation core member 100, the structures of the respective laminates 220a and 220b separated around the separation core member 100 are identical to each other. At this time, each laminated body 220a, 220b includes insulating layers 211a, 211b and metal layers 212a, 212b for pattern formation on the first metal layers 111a, 111b, and includes: The through holes 213a, 213b of the metal layers 212a, 212b; and the gold plating layers 214a, 214b formed on the through holes 213a, 213b and the metal layers 212a, 212b for pattern formation.
此时,在被分离的层叠体220a、220b,即使通孔213a、213b在上下方向上形成为非对称结构(unbalanced structure),由于在前述制造工程中以分离用芯部件100为中心维持了上部层叠体与下部层叠体之间的上下对称结构,因而能够使在制造工程中发生的弯曲(warpage)特性最小化。此外,能够同时制作具有多样的结构的印刷电路板。At this time, in the separated laminated bodies 220a, 220b, even if the through holes 213a, 213b are formed in an asymmetrical structure (unbalanced structure) in the vertical direction, since the upper part is maintained centered on the separation core member 100 in the aforementioned manufacturing process, The vertically symmetrical structure between the laminated body and the lower laminated body can thus minimize warpage characteristics that occur during the manufacturing process. In addition, printed circuit boards having various structures can be produced at the same time.
(7)可以在在所述步骤(S600)步骤中分离的层叠体的上面和/或下面形成电路图(7) A circuit pattern may be formed on and/or under the laminate separated in the step (S600) 案。case.
根据一例,在所述步骤(S600)中获得的一层叠体220a包括第一金属层111a及镀金层214a,可以在所述第一金属层111a和/或镀金层214a的一区域形成具有规定的形状的电路图案(未图示)。此时,当所述镀金层214a为薄膜形态时,可以将其用作种层(seedlayer),并在其上方进一步形成期望的厚度的第二镀金层(未图示)来形成电路图案(未图示)。According to one example, the laminated body 220a obtained in the step (S600) includes the first metal layer 111a and the gold-plated layer 214a, and a specified Shaped circuit pattern (not shown). At this time, when the gold-plated layer 214a is in the form of a thin film, it can be used as a seed layer (seedlayer), and a second gold-plated layer (not shown) with a desired thickness is further formed on it to form a circuit pattern (not shown). icon).
对形成所述电路图案的方法不做特殊限制,可以按照在本行业内公知的通常的方法来执行。There is no special limitation on the method of forming the circuit pattern, and it can be performed according to a common method known in the industry.
如此,在将具有规定的形状的电路图案形成于层叠体后,通过在所述层叠体上进一步执行在本行业内公知的通常的印刷电路板的制造工程,例如,阻焊形成工程、刻蚀及配线工程、电子元件贴装工程等来完成印刷电路板的制作。In this way, after the circuit pattern having a predetermined shape is formed on the laminated body, by further performing the usual printed circuit board manufacturing processes known in the industry on the laminated body, for example, solder resist forming process, etching, etc. And wiring engineering, electronic component placement engineering, etc. to complete the production of printed circuit boards.
前述印刷电路板的制造方法并非要依次执行以上说明的各个步骤来进行制造,根据设计规格,各工程的步骤可以被变形或被选择性定地混用而执行。The manufacturing method of the above-mentioned printed circuit board does not need to perform the above-described steps in order to manufacture, and according to the design specifications, the steps of each process can be modified or selectively mixed for execution.
另一方面,印刷电路板的弯曲(warpage)现象在进行印刷电路板的贴装时对工程率及生产性造成较多的影响,进一步地,该现象是在封装组装工程中还可能引起移送错误换或使印刷电路板无法电导通的缺陷的极为重要的因子。印刷电路板是层叠多种材料而形成的结构物,弯曲现象的主要原因是各层叠材料的热膨胀系数(CTE)的不同,作为其他造成影响的原因,众所周知的有各材料的弹性系数(Young's modulus),工程中所施加的温度变化、吸湿、机械载荷等。On the other hand, the warpage phenomenon of the printed circuit board has a great influence on the process rate and productivity during the mounting of the printed circuit board. Furthermore, this phenomenon may cause transfer errors in the packaging and assembly process. An extremely important factor in defects that replace or render a printed circuit board electrically non-conductive. A printed circuit board is a structure formed by laminating multiple materials. The main cause of the warping phenomenon is the difference in the coefficient of thermal expansion (CTE) of each laminated material. As another cause of the influence, there is a well-known factor of elasticity of each material (Young's modulus ), temperature changes, moisture absorption, mechanical loads, etc. applied in the project.
如上述,由于印刷电路板的弯曲特性主要是因层叠材料间的热膨胀及收缩的不同和载荷所发生的,为了减少该不同,本发明的又一特征在于,通过改变层叠为多层的层叠材料的组成和厚度(dielectric thickness control)、热膨胀系数(CTE)等物性来使弯曲特性最小化。As mentioned above, since the bending characteristics of the printed circuit board are mainly caused by the difference in thermal expansion and contraction between the laminated materials and the load, in order to reduce the difference, another feature of the present invention is that by changing the laminated material laminated into multiple layers Composition and thickness (dielectric thickness control), thermal expansion coefficient (CTE) and other physical properties to minimize bending characteristics.
为此,在本发明中,作为在前述步骤(S300)中使用的1个以上的绝缘层,可以使用被构成为使构成所述绝缘层的树脂的含量(Resin contents)、构成树脂的材质或组成、构成绝缘层的成分的热膨胀系数(CTE)、绝缘层的厚度不同,或构成为使这些所有均不同的绝缘层。For this reason, in the present invention, as one or more insulating layers used in the aforementioned step (S300), those configured to make the resin contents (Resin contents) constituting the insulating layer, the material of the constituting resin, or The composition, the coefficient of thermal expansion (CTE) of the components constituting the insulating layer, and the thickness of the insulating layer are different, or the insulating layers are configured so that all of these are different.
用于控制所述印刷电路板的弯曲程度的本发明的一实施例如下所示。An embodiment of the present invention for controlling the degree of curvature of the printed circuit board is as follows.
首先预先预测或实测在每个制造步骤中获得的用于形成印刷电路板的多层结构体或最终制造的印刷电路板的弯曲程度。The degree of warping of the multilayer structure used to form the printed circuit board or the finally manufactured printed circuit board obtained in each manufacturing step is firstly predicted or measured in advance.
之后,若所预测的或实测的弯曲数值为(+)值,则之后在层叠工程中使用的绝缘层使用具有能够校正(+)值的结构的绝缘部件。例如,可以使用:i)树脂的含量被调节得更少,或ii)厚度被调节得更小,或iii)热膨胀系数(CTE)被调节得更低的绝缘部件等。Afterwards, if the predicted or measured bending value is a (+) value, an insulating member having a structure capable of correcting the (+) value is used for the insulating layer used in the subsequent lamination process. For example, an insulating member in which i) the content of resin is adjusted to be less, or ii) the thickness is adjusted to be smaller, or iii) the coefficient of thermal expansion (CTE) is adjusted to be lower, etc. may be used.
反之,若所预测或实测的弯曲数值为(-)值,则之后在层叠工程中可以使用:i)树脂含量被调节得更高,或ⅱ)热膨胀系数更高,和/或ⅲ)厚度被调节得更高的缘部件来校正弯曲程度。Conversely, if the predicted or measured bending value is a (-) value, it can be used later in the lamination engineering: i) the resin content is adjusted higher, or ii) the thermal expansion coefficient is higher, and/or iii) the thickness is adjusted Adjust the higher edge piece to correct for the curvature.
本发明中虽然例示了通过层叠为多层的2个以上的绝缘层的CTE匹配,或树脂含量、树脂厚度等之类的电介质厚度调节(dielectric thickness control)来进行弯曲控制,但除此之外的在不使用CCL(copper clad laminate,覆铜箔层压)芯的无芯(coreless)形态的印刷电路板中构成为使层叠为多层的金属层和/或电路图案的厚度彼此不同来改善弯曲特性的情况也落入本发明的范畴内。Although the present invention exemplifies bending control by CTE matching of two or more insulating layers stacked in multiple layers, or dielectric thickness control (dielectric thickness control) such as resin content, resin thickness, etc., but other In a coreless printed circuit board that does not use a CCL (copper clad laminate, copper clad laminate) core, the thickness of the metal layer and/or circuit pattern stacked in multiple layers is different from each other to improve The case of bending properties also falls within the scope of the present invention.
从结果而言,在本发明中,不但可以使在前述制造工程中导致的弯曲现象最小化,还可以显著改善在分离工程中获得的印刷电路板形成用中间体或最终制造的印刷电路板的弯曲特性。As a result, in the present invention, not only the bending phenomenon caused in the aforementioned manufacturing process can be minimized, but also the quality of the printed circuit board forming intermediate obtained in the separation process or the final printed circuit board manufactured can be significantly improved. bending properties.
(8)可选地,本发明还可以包括:切断在所述步骤(S500)中获得的多层结构体的边(8) Optionally, the present invention may further include: cutting the edge of the multilayer structure obtained in the step (S500) 缘的步骤。Edge steps.
根据本发明的另一例,除了前述步骤(S100)至步骤(S600)外,印刷电路板的制造方法在所述步骤(S600)之前还可以包括:切断在所述步骤(S500)中获得的多层结构体的边缘的步骤。According to another example of the present invention, in addition to the aforementioned steps (S100) to (S600), the method for manufacturing a printed circuit board may further include: before the step (S600), cutting off the multiple Steps on the edges of the layer structure.
具体地,在所述步骤(S300)中使用的单位部件的大小(即,长度方向及宽度方向的长度)可以大于或等于分离用芯部件。需要说明的是,如图7所图示,当所述单位部件210a、210b的大小大于分离用芯部件100时,若将所述单位部件层叠于分离用芯部件的双面并压紧,则所述单位部件的绝缘层材料将包围分离用芯部件的边缘。在这种情况下,在分离步骤之前,需要切断而去除所述多层结构体300的边缘X。Specifically, the unit member used in the step (S300) may have a size (ie, length in the longitudinal direction and in the width direction) larger than or equal to the separation core member. It should be noted that, as shown in FIG. 7, when the size of the unit parts 210a, 210b is larger than the separation core part 100, if the unit parts are stacked on both sides of the separation core part and pressed tightly, then The insulating layer material of the unit part will surround the edge of the separating core part. In this case, the edge X of the multilayer structure 300 needs to be removed by cutting before the separation step.
之后,如在所述步骤(S600)中上述,通过在多层结构体200中分离而去除分离用芯部件100(第一金属层111a、111b除外),可以获得在一面层叠有第一金属层111a、111b的2个层叠体310a、310b。Thereafter, as described above in the step (S600), by separating in the multilayer structure 200 and removing the separation core member 100 (except for the first metal layers 111a, 111b), the first metal layer laminated on one side can be obtained. Two laminated bodies 310a, 310b of 111a, 111b.
(9)可选地,本发明还可以包括:在多层结构体形成导向孔的步骤。(9) Optionally, the present invention may further include: a step of forming guide holes in the multilayer structure.
根据本发明的又一例,除了前述步骤(S100)至步骤(S600)外,印刷电路板的制造方法在所述步骤(S300)之前还可以包括:在所述步骤(S200)中获得的分离用芯部件向所述分离用芯部件的垂直方向贯通而形成用于印刷电路板内的层间相互配准(registration)的第一导向孔(guide hole)的步骤;在所述步骤(S400)之前还可以包括:用X光识别在所述步骤(S300)中获得的多层结构体内部的第一导向孔,在所述多层结构体的边缘形成垂直贯通的第二导向孔的步骤;以及在所述步骤(S600)之前还可以包括:切断在所述步骤(S500)中获得的多层结构体的边缘的步骤。在本发明中,通过形成所述第一导向孔及第二导向孔,改善印刷电路板内的层间配准,因而可以使层间不连接或配线之间的短路的发生率最小化,且还能够提高可靠性。According to another example of the present invention, in addition to the aforementioned steps (S100) to (S600), the method for manufacturing a printed circuit board may further include before the step (S300): A step of forming a first guide hole for layer-to-layer mutual registration (registration) in a printed circuit board by penetrating the core member in the vertical direction of the core member for separation; before the step (S400) It may also include: using X-rays to identify the first guide hole inside the multilayer structure obtained in the step (S300), and forming a second guide hole vertically penetrating at the edge of the multilayer structure; and Before the step (S600), it may further include: a step of cutting the edge of the multilayer structure obtained in the step (S500). In the present invention, by forming the first guide hole and the second guide hole, the registration between layers in the printed circuit board is improved, so that the occurrence rate of disconnection between layers or short circuit between wirings can be minimized, Furthermore, reliability can be improved.
如图8和图9所图示,形成垂直贯通于在所述步骤(S200)中获得的分离用芯部件100的边缘的第一导向孔131(参照图8的(b))。之后,将单位部件210a、210b分别层叠于形成有第一导向孔131的分离用芯部件的上面及下面并压紧而形成多层结构体400(参照图8的(c))。此时,所述第一导向孔131的内部被单位部件的绝缘层211a、211b的材料(例如,热固性树脂、预浸材料)填充。此外,可选地,当所述单位部件210a、210b的大小大于分离用芯部件100的大小时,如图8所图示,所述单位部件的绝缘层材料将包围分离用芯部件的边缘。之后,用X光识别所述多层结构体400的第一导向孔131,形成垂直贯通于所述多层结构体400的第二导向孔132(参照图8的(d))。此时,所述第二导向孔132可以形成于对应于所述第一导向孔131的位置的区域,或者,也可以与所述第一导向孔131隔开而形成于多层结构体的边缘区域。之后,如在所述步骤(S400)中上述,在多层结构体的绝缘层及图案形成用金属层的一区域形成通孔213a、213b,并进行所述通孔及所述图案形成用金属层的镀金来形成镀金层214a、214b。此时,也对所述第二导向孔132的内壁进行镀金(参照图8的(d))。接着,沿所述第一导向孔131的内侧切断而去除多层结构体400的边缘区域(Y)(参照图9的(f))。之后,如在所述步骤(S600)中上述,通过从多层结构体400中分离而去除分离用芯部件100(第一金属层111a、111b除外),可以获得在一面层叠有第一金属层111a、111b的2个层叠体410a、410b(参照图9的(g))。As shown in FIGS. 8 and 9 , the first guide hole 131 is formed vertically penetrating through the edge of the separation core member 100 obtained in the step ( S200 ) (see (b) of FIG. 8 ). Thereafter, the unit members 210a and 210b are stacked on the upper and lower surfaces of the separation core member formed with the first guide hole 131, respectively, and compressed to form a multilayer structure 400 (see FIG. 8(c)). At this time, the inside of the first guide hole 131 is filled with the material (for example, thermosetting resin, prepreg material) of the insulating layers 211a, 211b of the unit component. In addition, optionally, when the size of the unit parts 210a, 210b is larger than the size of the separation core part 100, as shown in FIG. 8, the insulating layer material of the unit parts will surround the edge of the separation core part. Afterwards, the first guide hole 131 of the multilayer structure 400 is identified by X-rays, and the second guide hole 132 vertically penetrating the multilayer structure 400 is formed (see (d) of FIG. 8 ). At this time, the second guide hole 132 may be formed in a region corresponding to the position of the first guide hole 131, or may be separated from the first guide hole 131 and formed on the edge of the multilayer structure. area. After that, as described above in the step (S400), via holes 213a, 213b are formed in a region of the insulating layer and the metal layer for pattern formation of the multilayer structure, and the via holes and the metal layer for pattern formation are formed. Layers of gold are plated to form gold plated layers 214a, 214b. At this time, the inner wall of the second guide hole 132 is also plated with gold (see FIG. 8( d )). Next, the edge region (Y) of the multilayer structure 400 is removed by cutting along the inner side of the first guide hole 131 (see (f) of FIG. 9 ). Thereafter, as described above in the step (S600), by separating from the multilayer structure 400 and removing the separation core member 100 (except for the first metal layers 111a, 111b), the first metal layer laminated on one side can be obtained. Two laminated bodies 410a and 410b of 111a and 111b (see (g) of FIG. 9 ).
形成所述第一导向孔及第二导向孔后,可以选择性地执行去钻污及去毛刺处理来去除孔内壁及基板的污染物。After the first guide hole and the second guide hole are formed, desmearing and deburring can be selectively performed to remove pollutants on the inner wall of the hole and the substrate.
<印刷电路板><Printed circuit board>
另一方面,本发明提供一种按照前述印刷电路板的制造方法制造的印刷电路板。In another aspect, the present invention provides a printed circuit board manufactured according to the aforementioned method for manufacturing a printed circuit board.
作为一例,所述印刷电路板依次包括第一金属层111a、绝缘层211a、以及图案形成用金属层212a,且具备形成于所述绝缘层211a及图案形成用金属层212a的通孔213a;以及形成于未形成有所述通孔的金属层212a及所述通孔213a的镀金层214a。就这样的印刷电路板而言,可以按照在本行业内公知的双面印刷电路板的制造方法来制造双面印刷电路板。As an example, the printed circuit board includes a first metal layer 111a, an insulating layer 211a, and a metal layer 212a for pattern formation in sequence, and has a through hole 213a formed in the insulating layer 211a and the metal layer 212a for pattern formation; and Formed on the metal layer 212a where the through hole is not formed and the gold plating layer 214a of the through hole 213a. Such a printed circuit board can be manufactured in accordance with a method of manufacturing a double-sided printed circuit board known in the industry.
尽管上面以实施例为中心进行了说明,但这仅仅是例示,并不用以限定本发明,本发明所属领域中的一般的技术人员可以在不脱离本实施例的本质性的特性的范围内实施以上未例示的多种变形和应用。例如,在实施例中具体出现的各构成要素可以被变形而实施。另外,与这样的变形和应用相关的不同点应解释为落入所附权利要求书中规定的本发明的范围内。Although the above has been described centering on the embodiment, this is only an example, and is not intended to limit the present invention. Those skilled in the art of the present invention can implement it without departing from the essential characteristics of the present embodiment. Various modifications and applications not illustrated above. For example, each constituent element specifically presented in the embodiment may be implemented with modifications. Also, points of difference related to such modifications and applications should be construed as falling within the scope of the present invention defined in the appended claims.
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