CN110066516A - A kind of preparation method of the composite package matrix for LED encapsulation - Google Patents
A kind of preparation method of the composite package matrix for LED encapsulation Download PDFInfo
- Publication number
- CN110066516A CN110066516A CN201910349709.5A CN201910349709A CN110066516A CN 110066516 A CN110066516 A CN 110066516A CN 201910349709 A CN201910349709 A CN 201910349709A CN 110066516 A CN110066516 A CN 110066516A
- Authority
- CN
- China
- Prior art keywords
- water bath
- graphene oxide
- temperature
- solution
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011159 matrix material Substances 0.000 title claims abstract description 82
- 239000002131 composite material Substances 0.000 title claims abstract description 75
- 238000005538 encapsulation Methods 0.000 title claims abstract description 54
- 238000002360 preparation method Methods 0.000 title claims abstract description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 172
- 229910021389 graphene Inorganic materials 0.000 claims abstract description 108
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 47
- 239000002096 quantum dot Substances 0.000 claims abstract description 39
- 239000000084 colloidal system Substances 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims abstract description 10
- 239000002253 acid Substances 0.000 claims abstract description 9
- 238000001035 drying Methods 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims abstract description 9
- 239000007800 oxidant agent Substances 0.000 claims abstract description 5
- 238000003776 cleavage reaction Methods 0.000 claims abstract 4
- 230000007017 scission Effects 0.000 claims abstract 4
- 238000002604 ultrasonography Methods 0.000 claims abstract 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 349
- 239000000243 solution Substances 0.000 claims description 133
- 238000000502 dialysis Methods 0.000 claims description 112
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 112
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 86
- 239000008367 deionised water Substances 0.000 claims description 82
- 229910021641 deionized water Inorganic materials 0.000 claims description 82
- 239000012286 potassium permanganate Substances 0.000 claims description 68
- 238000006243 chemical reaction Methods 0.000 claims description 65
- 239000000203 mixture Substances 0.000 claims description 63
- 238000000034 method Methods 0.000 claims description 58
- 230000035484 reaction time Effects 0.000 claims description 56
- 230000009467 reduction Effects 0.000 claims description 36
- 238000010438 heat treatment Methods 0.000 claims description 32
- 239000000843 powder Substances 0.000 claims description 30
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 29
- 239000000741 silica gel Substances 0.000 claims description 29
- 229910002027 silica gel Inorganic materials 0.000 claims description 29
- 239000012528 membrane Substances 0.000 claims description 28
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 claims description 20
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 11
- 239000004317 sodium nitrate Substances 0.000 claims description 10
- 235000010344 sodium nitrate Nutrition 0.000 claims description 10
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 9
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 8
- 229910017604 nitric acid Inorganic materials 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 8
- 238000005406 washing Methods 0.000 claims description 8
- 230000003647 oxidation Effects 0.000 claims description 7
- 238000007254 oxidation reaction Methods 0.000 claims description 7
- 238000000746 purification Methods 0.000 claims description 7
- 239000000853 adhesive Substances 0.000 claims description 6
- 239000003292 glue Substances 0.000 claims description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 6
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 6
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 5
- 230000001070 adhesive effect Effects 0.000 claims description 5
- 238000001723 curing Methods 0.000 claims description 5
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 239000000839 emulsion Substances 0.000 claims description 4
- 239000003822 epoxy resin Substances 0.000 claims description 4
- 238000002474 experimental method Methods 0.000 claims description 4
- 229920000647 polyepoxide Polymers 0.000 claims description 4
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 claims description 4
- 238000000703 high-speed centrifugation Methods 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 229920000084 Gum arabic Polymers 0.000 claims description 2
- 239000004642 Polyimide Substances 0.000 claims description 2
- 241000978776 Senegalia senegal Species 0.000 claims description 2
- 239000000205 acacia gum Substances 0.000 claims description 2
- 235000010489 acacia gum Nutrition 0.000 claims description 2
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 claims description 2
- 230000000694 effects Effects 0.000 claims description 2
- 229910002804 graphite Inorganic materials 0.000 claims description 2
- 239000010439 graphite Substances 0.000 claims description 2
- 238000000016 photochemical curing Methods 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 229920002689 polyvinyl acetate Polymers 0.000 claims description 2
- 239000011118 polyvinyl acetate Substances 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 3
- 230000014759 maintenance of location Effects 0.000 claims 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 1
- 125000000852 azido group Chemical group *N=[N+]=[N-] 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 239000012295 chemical reaction liquid Substances 0.000 claims 1
- 150000001989 diazonium salts Chemical class 0.000 claims 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 claims 1
- 238000010790 dilution Methods 0.000 claims 1
- 239000012895 dilution Substances 0.000 claims 1
- 238000007710 freezing Methods 0.000 claims 1
- 230000008014 freezing Effects 0.000 claims 1
- 238000001802 infusion Methods 0.000 claims 1
- 238000006396 nitration reaction Methods 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 239000011591 potassium Substances 0.000 claims 1
- 238000005086 pumping Methods 0.000 claims 1
- 230000008439 repair process Effects 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 238000000605 extraction Methods 0.000 abstract description 7
- 230000004907 flux Effects 0.000 abstract description 3
- 230000007774 longterm Effects 0.000 abstract description 2
- 238000003756 stirring Methods 0.000 description 156
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 138
- 239000005457 ice water Substances 0.000 description 104
- 239000000725 suspension Substances 0.000 description 77
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 description 52
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 52
- 239000011259 mixed solution Substances 0.000 description 46
- 238000006722 reduction reaction Methods 0.000 description 33
- 230000008859 change Effects 0.000 description 31
- 230000003287 optical effect Effects 0.000 description 25
- 229920001296 polysiloxane Polymers 0.000 description 23
- 238000004806 packaging method and process Methods 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- JOSWYUNQBRPBDN-UHFFFAOYSA-P ammonium dichromate Chemical group [NH4+].[NH4+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O JOSWYUNQBRPBDN-UHFFFAOYSA-P 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000000967 suction filtration Methods 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003044 adaptive effect Effects 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 230000036760 body temperature Effects 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/04—Carbon
- C08K3/042—Graphene or derivatives, e.g. graphene oxides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/02—Ingredients treated with inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/20—Applications use in electrical or conductive gadgets
- C08L2203/206—Applications use in electrical or conductive gadgets use in coating or encapsulating of electronic parts
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
技术领域technical field
本发明涉及到光电技术领域,具体涉及到一种LED封装的复合封装基质的制备方法。The invention relates to the field of optoelectronic technology, in particular to a preparation method of a composite packaging matrix for LED packaging.
背景技术Background technique
LED是light emitting diode的简称。自1993年,在蓝色GaN-LED上取得重大技术突破,并于1996年成功的实现了白光LED。近年来,LED凭借着其低功耗、无污染、寿命长、低压驱动等优点成为了继白炽灯、荧光灯之后的第三代照明光源。LED is short for light emitting diode. Since 1993, major technological breakthroughs have been made in blue GaN-LEDs, and white LEDs have been successfully realized in 1996. In recent years, LED has become the third-generation lighting source after incandescent lamps and fluorescent lamps by virtue of its advantages of low power consumption, no pollution, long life, and low-voltage driving.
到目前为止,白光LED大致有三种方式,荧光粉转化白光LED(即pc-LEDs) 是市场上使用最广泛的白光LED,通过在芯片上涂覆单色或者多色的荧光粉来实现白光。目前市场上运用最广泛的是蓝色LED芯片+黄色荧光粉的方案,这一方案不仅成本低、实现工艺相对简单、综合性能适中,还可以通过改变YAG荧光粉的化学组成(光谱成份调节)以及调整荧光粉层的厚度,获得色温在3000K 至10000K区间的各色白光。So far, there are roughly three types of white LEDs. Phosphor-converted white LEDs (ie pc-LEDs) are the most widely used white LEDs on the market. White light is achieved by coating monochromatic or multi-color phosphors on the chip. At present, the most widely used solution on the market is the blue LED chip + yellow phosphor solution. This solution not only has low cost, relatively simple implementation process, and moderate comprehensive performance, but also can be adjusted by changing the chemical composition of the YAG phosphor (spectral composition adjustment). and adjusting the thickness of the phosphor layer to obtain white light of various colors with a color temperature ranging from 3000K to 10000K.
LED芯片产生的辐射光和荧光粉的激发光需要经过芯片、荧光粉胶、封装胶和透镜等光学元件才能辐射到环境中,考虑到材料对光线的吸收,减小光线在封装材料中的传播光程,减少不必要的散射、折射和全反射,提高光的抽取效率,是提高LED光效的关键。现有的白光pc-LEDs封装结构中,芯片大约有 13%的蓝光未能够被抽取到荧光粉层,而荧光粉涂层中又有大约13%的光子由于混色/散射/吸收损失而无法提取出来。The radiant light generated by the LED chip and the excitation light of the phosphor need to pass through optical components such as chips, phosphor glue, encapsulation glue and lenses to be radiated into the environment. Considering the absorption of light by the material, the propagation of light in the packaging material is reduced. Optical path, reducing unnecessary scattering, refraction and total reflection, and improving light extraction efficiency are the keys to improving LED light efficiency. In the existing white light pc-LEDs package structure, about 13% of the blue light of the chip cannot be extracted to the phosphor layer, and about 13% of the photons in the phosphor coating cannot be extracted due to color mixing/scattering/absorption loss. come out.
另外通过实验发现在大功率输入下,荧光粉的温度会远高于芯片结温并造成荧光层碳化现象,这是由于荧光粉的颗粒弥散在导热系数很低(大约 0.2W·m-1·K-1)的树脂和硅胶等聚合物中,其产生的热量很难传递出去而不断积累,导致芯片和荧光粉的量子效率下降。芯片结温以及荧光粉体温度的高低直接影响相关物理过程的发光效率。对于目前光效33%的1W功率型白光 pc-LEDs(相应于>0.66W的热功率)而言,如果其导热系数可以从目前 ks=0.2W/mK提升到ks=1.0W/mK以上时,其工作时芯片结温与环境温度之差可以降低近5倍,即从85度降低到35度左右,相对光通量可以提升10%以上。In addition, it is found through experiments that under high power input, the temperature of the phosphor will be much higher than the junction temperature of the chip and cause the carbonization of the phosphor layer. In polymers such as K -1 ) resin and silica gel, the heat generated by it is difficult to transfer out and accumulates continuously, resulting in a decrease in the quantum efficiency of chips and phosphors. The junction temperature of the chip and the temperature of the phosphor directly affect the luminous efficiency of the relevant physical process. For the current 1W power white light pc-LEDs with a luminous efficiency of 33% (corresponding to a thermal power of > 0.66W), if the thermal conductivity can be improved from the current ks=0.2W/mK to ks=1.0W/mK or more , the difference between the chip junction temperature and the ambient temperature can be reduced by nearly 5 times during operation, that is, from 85 degrees to about 35 degrees, and the relative luminous flux can be increased by more than 10%.
发明内容SUMMARY OF THE INVENTION
石墨烯具有高折射率、高导热系数的优异性能,在可见光波段,石墨烯量子点(GQDs)折射率在3.0左右,4nm的GQDs对400nm以上的光线吸收很少。针对目前封装基质材料,在增加封装基质折射率的方法中,添加高折射率的纳米填料是一个有潜力的方向。Graphene has excellent properties of high refractive index and high thermal conductivity. In the visible light band, the refractive index of graphene quantum dots (GQDs) is around 3.0, and GQDs of 4 nm absorb little light above 400 nm. For the current packaging matrix materials, adding high refractive index nanofillers is a potential direction in the method of increasing the refractive index of the packaging matrix.
本发明所要解决的问题是实现一种高折射率、高导热系数稳定的石墨烯量子点(GQDs)复合封装基质材料。The problem to be solved by the present invention is to realize a composite encapsulation matrix material of graphene quantum dots (GQDs) with high refractive index and high thermal conductivity.
本发明的技术方案为:一种用于LED封装的复合封装基质的制备方法,其特征在于,包括以下步骤:The technical scheme of the present invention is: a preparation method of a composite encapsulation matrix for LED encapsulation, characterized in that it comprises the following steps:
(1)、利用强酸和氧化剂处理鳞片石墨粉制备氧化石墨烯溶液并进行提纯、超声,最后干燥;(1), utilize strong acid and oxidant to process flake graphite powder to prepare graphene oxide solution and purify, ultrasonic, finally dry;
(2)、将干燥好的氧化石墨烯通过化学切割法制备氧化石墨烯量子点 (GOQDs)溶液,并经过还原、提纯后得到石墨烯量子点(GQDs);(2), preparing graphene oxide quantum dots (GOQDs) solution by chemical cutting method from the dried graphene oxide, and obtaining graphene quantum dots (GQDs) after reduction and purification;
(3)、将步骤(2)获得的GQDs,然后均匀分散到胶体中,得到稳定的GQDs 复合封装基质材料;(3), dispersing the GQDs obtained in step (2) into the colloid uniformly to obtain a stable GQDs composite encapsulation matrix material;
(4)、将步骤(3)获得的封装基质材料涂覆在LED的出光方向表面上。(4), coating the encapsulation matrix material obtained in step (3) on the surface of the LED in the light-emitting direction.
在步骤(1)中,制备氧化石墨烯采用的是改进的Hummers法,也可以是Staudenmaier法、Hummers法、超声辅助Hummers法和Brodie法等。In step (1), an improved Hummers method is used for preparing graphene oxide, and it can also be a Staudenmaier method, a Hummers method, an ultrasonic-assisted Hummers method, a Brodie method, or the like.
在步骤(1)中,所述强酸指的是指浓硫酸(H2SO4),或者是浓硫酸、浓硝酸、浓磷酸中的一种或者几种组合,且石墨粉与强酸的比例为1g对应20~40ml强酸溶液。In step (1), the strong acid refers to concentrated sulfuric acid (H 2 SO 4 ), or one or more combinations of concentrated sulfuric acid, concentrated nitric acid, and concentrated phosphoric acid, and the ratio of graphite powder to strong acid is 1g corresponds to 20-40ml of strong acid solution.
在步骤(1)中,所述氧化剂是高锰酸钾,或者是发烟硝酸环境下的氯酸钾,氯酸钾与石墨粉的质量比为300%~500%;或者是硝酸钠和高锰酸钾;其中硝酸钠与石墨粉的质量比为30%~60%,高锰酸钾与石墨粉的质量比为300%~500%。In step (1), the oxidant is potassium permanganate, or potassium chlorate under fuming nitric acid environment, and the mass ratio of potassium chlorate to graphite powder is 300% to 500%; or sodium nitrate and potassium permanganate; The mass ratio of sodium nitrate to graphite powder is 30% to 60%, and the mass ratio of potassium permanganate to graphite powder is 300% to 500%.
在步骤(1)中,采用的改进的Hummers法总共有低温、中温、高温三个阶段,其中低温阶段是将石墨粉加入到浓硫酸中搅拌1小时,然后将高锰酸钾分批次加入到反应液中充分搅拌3小时,整个低温阶段控制反应液温度低于10 度;中温阶段,将反应液加热至35~40度,时间为0.5~2小时,中温阶段是实验的主要氧化过程,通过控制反应的时间和高锰酸钾的用量可以制备不同氧化程度的氧化石墨烯;高温阶段将反应液加热至80度,并缓慢滴加40ml的去离子水并不断搅拌,持续时间为10~20分钟,将反应液温度上升至90度并持续搅拌,持续时间为10~20分钟,停止加热并加入60ml的去离子水终止反应,滴加30%过氧化氢溶液并搅拌直至溶液颜色不再发生变化。In step (1), the improved Hummers method adopted has three stages of low temperature, medium temperature and high temperature in total, wherein the low temperature stage is to add graphite powder in the concentrated sulfuric acid and stir for 1 hour, then potassium permanganate is added in batches Fully stirred in the reaction solution for 3 hours, and the temperature of the reaction solution was controlled to be lower than 10 degrees in the whole low temperature stage; in the middle temperature stage, the reaction solution was heated to 35 to 40 degrees for 0.5 to 2 hours, and the middle temperature stage was the main oxidation process of the experiment. Graphene oxide with different degrees of oxidation can be prepared by controlling the reaction time and the amount of potassium permanganate; in the high temperature stage, the reaction solution is heated to 80 degrees, and 40 ml of deionized water is slowly added dropwise and stirred continuously for a duration of 10~ 20 minutes, raise the temperature of the reaction solution to 90 degrees and continue stirring for 10 to 20 minutes, stop heating and add 60 ml of deionized water to terminate the reaction, add 30% hydrogen peroxide solution dropwise and stir until the color of the solution is no longer change.
在所述的Hunmmers法中,可以通过控制高锰酸钾的用量以及中温阶段的反应时长来制备不同氧化程度的氧化石墨烯,高锰酸钾用量越多,反应时间越长最后制备的氧化石墨烯氧化程度越高。In the described Hummers method, the graphene oxide of different oxidation degrees can be prepared by controlling the consumption of potassium permanganate and the reaction time in the middle temperature stage, the more potassium permanganate consumption is, the longer the reaction time is. The graphite oxide finally prepared The higher the degree of alkylene oxidation.
在步骤(1)中,提纯的步骤包括有离心洗涤、透析,在前三次洗涤需要使用稀盐酸洗涤,稀盐酸由37%浓盐酸按照1:9的比例稀释得到,用去离子水多次离心洗涤后直至溶液PH值接近7,然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次,或者使用抽滤、高速离心等其它形式一种或者几种提纯方式。In step (1), the purification steps include centrifugal washing and dialysis. In the first three washings, dilute hydrochloric acid needs to be used for washing. Dilute hydrochloric acid is obtained by diluting 37% concentrated hydrochloric acid in a ratio of 1:9, and centrifuging with deionized water for many times. After washing, until the pH value of the solution is close to 7, then use a dialysis bag with a molecular weight cut-off of 8,000 to 14,000 to dialyze for a week, change the water twice a day, or use one or several other purification methods such as suction filtration and high-speed centrifugation.
在步骤(1)中,超声过程指的是用超声仪超声30~60分钟。In step (1), the sonication process refers to sonicating for 30-60 minutes with a sonicator.
在步骤(1)中,干燥方式为冷冻烘干,或者是自然阴干、风干、红外加热、干燥箱烘干中的一种。In step (1), the drying method is freeze drying, or one of natural shade drying, air drying, infrared heating, and drying in a drying oven.
在步骤(2)中,所述的化学切割法(chemical cutting)法指的是利用H2SO4/ KMnO4对GO的开链(Unzipping)效果,将已经制备氧化石墨烯切割成更小尺寸的GOQDs。In step (2), the chemical cutting method refers to using the unzipping effect of H 2 SO 4 / KMnO 4 on GO to cut the prepared graphene oxide into smaller sizes GOQDs.
在步骤(2)中,化学切割法存在有四个阶段,其中低温阶段将(1)中已经制备的氧化石墨烯固体加入到浓硫酸中并搅拌,控制反应液温度低于10度,持续时间为1小时;常温阶段是指在室温25度左右,将高锰酸钾加入到反应液中持续搅拌,每1g的氧化石墨烯需要加入0.5~1g的高锰酸钾,持续时间为2小时左右;中温阶段是指将反应液温度上升至45~50度,持续时间为1~2小时;高温阶段是指将反应液温度上升到90度,并缓慢滴加40ml的去离子,持续时间为30分钟;待溶液冷却至室温后滴加30%的过氧化氢溶液直至溶液颜色不再发生变化。In step (2), the chemical cutting method has four stages, wherein the graphene oxide solid prepared in (1) is added to the concentrated sulfuric acid and stirred in the low temperature stage, and the temperature of the control reaction solution is lower than 10 degrees, and the duration The normal temperature stage refers to adding potassium permanganate to the reaction solution at about 25 degrees at room temperature and stirring continuously. Every 1 g of graphene oxide needs to add 0.5 to 1 g of potassium permanganate, and the duration is about 2 hours. The medium temperature stage means that the temperature of the reaction solution is raised to 45-50 degrees, and the duration is 1-2 hours; the high-temperature stage is that the temperature of the reaction solution is raised to 90 degrees, and 40ml of deionization is slowly added dropwise, and the duration is 30 minutes; after the solution was cooled to room temperature, 30% hydrogen peroxide solution was added dropwise until the color of the solution no longer changed.
在步骤(2)中,通过控制化学切割的实验时长和高锰酸钾的量以及步骤(2) 所制备氧化石墨烯的氧化程度可以制备不同纳米尺寸的氧化石墨烯量子点。In step (2), graphene oxide quantum dots with different nanometer sizes can be prepared by controlling the experimental duration of chemical cutting and the amount of potassium permanganate and the degree of oxidation of graphene oxide prepared in step (2).
在步骤(2)中,还原指的是采用化学还原、高温还原、电化学还原、溶剂热还原等方法进行脱氧处理,将GOQDs还原成GQDs。In step (2), reduction refers to the use of chemical reduction, high temperature reduction, electrochemical reduction, solvothermal reduction and other methods for deoxidation treatment to reduce GOQDs to GQDs.
在步骤(2)中,提纯的步骤包括有抽滤和透析,使用0.22um的过滤膜将步骤(2)中的反应液进行抽滤,取过滤的后的溶液置于分子量为3000~8000的透析袋中透析一周,或者采用高速离心等其它形式一种或者几种提纯方式。In step (2), the purification step includes suction filtration and dialysis, the reaction solution in step (2) is subjected to suction filtration using a 0.22um filter membrane, and the filtered solution is placed in a 3000-8000 molecular weight solution. Dialysis in a dialysis bag for one week, or one or several purification methods in other forms such as high-speed centrifugation.
在步骤(3)中,所述胶体为热固胶或者感光胶,其中热固胶为环氧树脂、硅胶、聚甲基丙烯酸甲酯(PMMA)、聚碳酸酯(PC);感光胶体为感光剂和成膜剂,其中感光剂为重铬酸铵(ADC)、铬酸盐、重氮化合物或者是叠氮基化合物中的一种或者多种的组合;成膜剂为聚乙烯醇(PVA)、阿拉伯树胶、聚酰亚胺或聚乙酸乙烯酯乳剂中的一种或者多种的组合。In step (3), the colloid is thermosetting adhesive or photosensitive adhesive, wherein the thermosetting adhesive is epoxy resin, silica gel, polymethyl methacrylate (PMMA), polycarbonate (PC); the photosensitive colloid is photosensitive adhesive Agent and film-forming agent, wherein the sensitizer is ammonium dichromate (ADC), chromate, diazo compound or a combination of one or more of azide-based compounds; the film-forming agent is polyvinyl alcohol (PVA) ), gum arabic, polyimide, or a combination of one or more of polyvinyl acetate emulsions.
在步骤(4)中,所述涂覆为将步骤(3)所得的GQDs复合封装基质材料封装基质直接涂覆在LED芯片表面上作为抽光层,或者是作为荧光粉涂层的 remote层,提高芯片的光抽取效率和热稳定性;或者是将所述封装基质材料与荧光粉混合作为荧光粉层涂覆在LED芯片的发光表面上,或者涂覆在LED出光方向上一段距离的任一输出面上,提高荧光粉层的光抽取效率和热稳定性;涂覆(coating)方式为旋涂法、喷涂法、点胶法、印刷法和浸渍法中的一种或者几种;所述的LED为有机LED、无机LED或者两者的组合;所述LED为单颗 LED芯片,或者是同一基板的多颗LED芯片组,或者是整个晶圆。In step (4), the coating is to directly coat the GQDs composite encapsulation matrix material encapsulation matrix obtained in step (3) on the surface of the LED chip as a light extraction layer, or as a remote layer of a phosphor coating, Improve the light extraction efficiency and thermal stability of the chip; or mix the encapsulation matrix material with the phosphor powder as a phosphor powder layer and coat it on the light-emitting surface of the LED chip, or coat it on any distance in the LED light-emitting direction. On the output surface, the light extraction efficiency and thermal stability of the phosphor layer are improved; the coating method is one or more of spin coating, spray coating, glue dispensing, printing and dipping; the The LED is an organic LED, an inorganic LED or a combination of the two; the LED is a single LED chip, or a plurality of LED chip groups on the same substrate, or a whole wafer.
在步骤(4)中,所述的固化方式为烤箱加热、电加热板或红外加热的一种或多种组合,固化的温度与时间根据胶体(例如硅胶)的性质要求而定;或者采用光固化,例如使用光致固化胶体、感光胶等。In step (4), the curing method is one or more combinations of oven heating, electric heating plate or infrared heating, and the curing temperature and time are determined according to the property requirements of the colloid (such as silica gel); For curing, for example, photocurable colloids, photoresist, etc. are used.
运用本技术可以对封装胶进行复合改性,实现封装基质折射率和导热系数的双提升LED,从而提高封装结构的光抽取效率并提高大电流环境下效率稳定性。Using this technology, the encapsulant can be compounded and modified to realize the double-enhancing LED of the refractive index and thermal conductivity of the encapsulation matrix, thereby improving the light extraction efficiency of the encapsulation structure and improving the efficiency stability in a high-current environment.
本发明技术不仅适合于蓝光LED芯片+黄光荧光粉的白光LED器件封装,也适用于蓝光LED芯片+多色荧光粉、紫外LED芯片+多色荧光粉(例如RGB 三基色荧光粉)的封装,也适用于量子点荧光粉(QDs)pc-LEDs(QD-pc-LEDs)器件的封装。The technology of the present invention is not only suitable for the packaging of white light LED devices with blue LED chips + yellow phosphors, but also for the packaging of blue LED chips + multi-color phosphors, ultraviolet LED chips + multi-color phosphors (such as RGB three-color phosphors) , is also suitable for the encapsulation of quantum dot phosphors (QDs) pc-LEDs (QD-pc-LEDs) devices.
运用本发明制备的复合封装基质可以有效提升封装材料的光抽取效率并改善芯片和荧光粉发光的热稳定性(大电流工作条件下芯片结温和QDs荧光粉体温度的有效减低),从而实现更高的器件效率,保证LED器件在大工作状态下长期稳定的高光通量输出。Using the composite encapsulation matrix prepared by the invention can effectively improve the light extraction efficiency of the encapsulation material and improve the thermal stability of the chip and the phosphor luminescence (effective reduction of the chip junction temperature and the QDs phosphor body temperature under high current working conditions), so as to achieve a higher efficiency. High device efficiency ensures long-term stable high luminous flux output of LED devices under large working conditions.
附图说明Description of drawings
图1为实施例1将制备复合封装基质作为荧光粉层涂覆在LED芯片表面的示意图。其中1为LED芯片,2为衬底,3为反射杯碗,4为石墨烯量子点,5 为荧光粉颗粒,6为填充硅胶。FIG. 1 is a schematic diagram of preparing a composite encapsulation matrix as a phosphor layer coated on the surface of an LED chip in Example 1. FIG. 1 is an LED chip, 2 is a substrate, 3 is a reflector cup, 4 is a graphene quantum dot, 5 is a phosphor particle, and 6 is a filled silica gel.
图2为实施例2将制备复合封装基质作为荧光粉层涂覆在LED芯片表面的示意图。其中1为LED芯片,2为衬底,3为反射杯碗,4为石墨烯量子点,5 为荧光粉颗粒,6为光固化胶体。FIG. 2 is a schematic diagram of preparing a composite encapsulation matrix as a phosphor layer coated on the surface of an LED chip in Example 2. FIG. 1 is an LED chip, 2 is a substrate, 3 is a reflector cup, 4 is a graphene quantum dot, 5 is a phosphor particle, and 6 is a light-curing colloid.
图3为实施例3将制备复合封装基质作为抽光(remote)层涂覆在LED芯片表面的示意图。其中1为LED芯片,2衬底,3为反射杯碗,4为石墨烯量子点, 5为填充硅胶。FIG. 3 is a schematic diagram of preparing a composite encapsulation matrix as a remote layer coated on the surface of an LED chip in Example 3. FIG. 1 is an LED chip, 2 is a substrate, 3 is a reflector cup, 4 is a graphene quantum dot, and 5 is a filled silica gel.
具体实施方式Detailed ways
下面结合附图以及实施例对本发明作进一步描述:Below in conjunction with accompanying drawing and embodiment, the present invention is further described:
实施例1Example 1
称量1g的石墨粉,量取23ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为30min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 23ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 3g of Potassium permanganate was slowly added to the mixed solution in batches, and stirring was continued for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 30 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右的石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. left and right graphene quantum dots;
将质量分数0.1wt%~1wt%石墨烯量子点加入到光学硅胶,即可形成稳定的GQDs/Silicone复合封装基质材料;A stable GQDs/Silicone composite encapsulation matrix material can be formed by adding the graphene quantum dots with a mass fraction of 0.1wt% to 1wt% to the optical silica gel;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化,所得结构如附图1所示。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir well. After the defoaming machine is evacuated to remove air bubbles, it is coated on the surface of the LED chip by the free dispensing method, and cured by heating at 150 °C for 1 hour in a photoelectric oven. The obtained structure is as attached. Figure 1.
实施例2Example 2
称量1g的石墨粉,量取23ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为30min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 23ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 3g of Potassium permanganate was slowly added to the mixed solution in batches, and stirring was continued for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 30 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右的石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. left and right graphene quantum dots;
取0.72ml浓度为PVA水溶液和0.68ml浓度为0.26%的ADC溶液中混合,加入0.01g~0.1g的石墨烯量子点和0.4g荧光粉充分搅拌后,采用自适应涂覆法进行光固化,所得结构如附图2所示。Mix 0.72ml of PVA aqueous solution and 0.68ml of ADC solution with 0.26% concentration, add 0.01g-0.1g of graphene quantum dots and 0.4g of phosphor powder, and fully stir, and use adaptive coating method for photocuring. The resulting structure is shown in FIG. 2 .
实施例3Example 3
称量1g的石墨粉和0.5g的硝酸钠,量取20ml质量分数为98%的浓硫酸和 5ml质量分数为69%的浓硝酸,将石墨粉、硝酸钠、浓硫酸、浓硝酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为60min;将水浴温度升高至80度,滴加40ml 的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder and 0.5g of sodium nitrate, measure 20ml of concentrated sulfuric acid with a mass fraction of 98% and 5ml of concentrated nitric acid with a mass fraction of 69%, put graphite powder, sodium nitrate, concentrated sulfuric acid and concentrated nitric acid in a beaker Mix, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300 rpm; weigh 3 g of potassium permanganate and slowly add it to the mixture in batches, and continue to stir for 3 hours; remove the ice-water bath and replace it with a water bath, The temperature of the water bath was set to 35 degrees, and the reaction time was 60 minutes; the temperature of the water bath was raised to 80 degrees, and 40 ml of pure water or deionized water was added dropwise for 30 minutes.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
将复合基质加入正己烷稀释,然后采用喷涂法,将LED置于加热板上,直接在LED芯片表面上喷涂一层remote层,之后用光电烤箱于150℃加热1h固化,所得结构如附图3所示。The composite matrix was diluted with n-hexane, and then the LED was placed on a heating plate by spraying method, and a layer of remote layer was directly sprayed on the surface of the LED chip, and then cured by heating at 150 °C for 1 h in a photoelectric oven. The obtained structure is shown in Figure 3. shown.
实施例4Example 4
称量1g的石墨粉,量取23ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为30min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 23ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 3g of Potassium permanganate was slowly added to the mixed solution in batches, and stirring was continued for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 30 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右的石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. left and right graphene quantum dots;
将质量分数0.1wt%~1wt%石墨烯量子点加入到光学硅胶,即可形成稳定的GQDs/Silicone复合封装基质材料;A stable GQDs/Silicone composite encapsulation matrix material can be formed by adding the graphene quantum dots with a mass fraction of 0.1wt% to 1wt% to the optical silica gel;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例5Example 5
称量1g的石墨粉和0.5g的硝酸钠,量取20ml质量分数为98%的浓硫酸和 5ml质量分数为69%的浓硝酸,将石墨粉、硝酸钠、浓硫酸、浓硝酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为30min;将水浴温度升高至80度,滴加40ml 的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder and 0.5g of sodium nitrate, measure 20ml of concentrated sulfuric acid with a mass fraction of 98% and 5ml of concentrated nitric acid with a mass fraction of 69%, put graphite powder, sodium nitrate, concentrated sulfuric acid and concentrated nitric acid in a beaker Mix, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300 rpm; weigh 3 g of potassium permanganate and slowly add it to the mixture in batches, and continue to stir for 3 hours; remove the ice-water bath and replace it with a water bath, The temperature of the water bath was set to 35 degrees, and the reaction time was 30 minutes; the temperature of the water bath was raised to 80 degrees, and 40 ml of pure water or deionized water was added dropwise for 30 minutes.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例6Example 6
称量1g的石墨粉和0.5g的硝酸钠,量取20ml质量分数为98%的浓硫酸和 5ml质量分数为69%的浓硝酸,将石墨粉、硝酸钠、浓硫酸、浓硝酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为30min;将水浴温度升高至80度,滴加40ml 的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder and 0.5g of sodium nitrate, measure 20ml of concentrated sulfuric acid with a mass fraction of 98% and 5ml of concentrated nitric acid with a mass fraction of 69%, put graphite powder, sodium nitrate, concentrated sulfuric acid and concentrated nitric acid in a beaker Mix, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300 rpm; weigh 3 g of potassium permanganate and slowly add it to the mixture in batches, and continue to stir for 3 hours; remove the ice-water bath and replace it with a water bath, The temperature of the water bath was set to 35 degrees, and the reaction time was 30 minutes; the temperature of the water bath was raised to 80 degrees, and 40 ml of pure water or deionized water was added dropwise for 30 minutes.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为90min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 90 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例7Example 7
称量1g的石墨粉和,量取21ml质量分数为98%的浓硫酸和3ml质量分数为85%的浓磷酸,将石墨粉、浓硫酸、浓磷酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为30min;将水浴温度升高至80度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder and 21ml of concentrated sulfuric acid with a mass fraction of 98% and 3ml of concentrated phosphoric acid with a mass fraction of 85%. Mix the graphite powder, concentrated sulfuric acid and concentrated phosphoric acid in a beaker, and place the beaker in an ice-water bath. , while stirring at a speed of 300rpm for 1 hour; take 3g of potassium permanganate slowly and add it to the mixture in batches, and continue to stir for 3 hours; remove the ice-water bath, replace it with a water bath, and set the water bath temperature to 35 degrees, The reaction time was 30 minutes; the temperature of the water bath was raised to 80 degrees, and 40 ml of pure water or deionized water was added dropwise for 30 minutes.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到7nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the suspension after dialysis was dried in a freeze dryer, and finally 7nm was obtained. Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例8Example 8
称量1g的石墨粉和,量取21ml质量分数为98%的浓硫酸和3ml质量分数为85%的浓磷酸,将石墨粉、浓硫酸、浓磷酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为60min;将水浴温度升高至80度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder and 21ml of concentrated sulfuric acid with a mass fraction of 98% and 3ml of concentrated phosphoric acid with a mass fraction of 85%. Mix the graphite powder, concentrated sulfuric acid and concentrated phosphoric acid in a beaker, and place the beaker in an ice-water bath. , while stirring at a speed of 300rpm for 1 hour; take 3g of potassium permanganate slowly and add it to the mixture in batches, and continue to stir for 3 hours; remove the ice-water bath, replace it with a water bath, and set the water bath temperature to 35 degrees, The reaction time was 60 minutes; the temperature of the water bath was raised to 80 degrees, and 40 ml of pure water or deionized water was added dropwise for 30 minutes.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例9Example 9
称量1g的石墨粉和,量取21ml质量分数为98%的浓硫酸和3ml质量分数为85%的浓磷酸,将石墨粉、浓硫酸、浓磷酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为90min;将水浴温度升高至80度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder and 21ml of concentrated sulfuric acid with a mass fraction of 98% and 3ml of concentrated phosphoric acid with a mass fraction of 85%. Mix the graphite powder, concentrated sulfuric acid and concentrated phosphoric acid in a beaker, and place the beaker in an ice-water bath. , while stirring at a speed of 300rpm for 1 hour; take 3g of potassium permanganate slowly and add it to the mixture in batches, and continue to stir for 3 hours; remove the ice-water bath, replace it with a water bath, and set the water bath temperature to 35 degrees, The reaction time was 90 minutes; the temperature of the water bath was raised to 80 degrees, and 40 ml of pure water or deionized water was added dropwise for 30 minutes.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例10Example 10
称量1g的石墨粉,量取23ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为60min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 23ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 3g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the water bath temperature was set to 35 degrees, and the reaction time was 60 min; the water bath temperature was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例11Example 11
称量1g的石墨粉,量取23ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为90min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 23ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 3g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 90 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取1g的高锰酸钾加入到混合液中,室温下继续搅拌2小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, weigh 1 g of potassium permanganate and add it to the mixed solution, and continue stirring at room temperature for 2 hours; change to a water bath, set the water bath temperature to 45 degrees, and the reaction time to 60 minutes; increase the water bath temperature to 90 degrees, Add 40ml of pure or deionized water dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到5nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the suspension after dialysis was dried in a freeze dryer to obtain 5nm Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例12Example 12
称量1g的石墨粉,量取26ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为30min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 26ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 3g of Potassium permanganate was slowly added to the mixed solution in batches, and stirring was continued for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 30 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.8g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为90min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.8 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced by a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 90 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到5nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the suspension after dialysis was dried in a freeze dryer to obtain 5nm Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例13Example 13
称量1g的石墨粉,量取26ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为30min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 26ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 3g of Potassium permanganate was slowly added to the mixed solution in batches, and stirring was continued for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 30 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.8g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为120min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.8 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 120 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到5nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the suspension after dialysis was dried in a freeze dryer to obtain 5nm Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例14Example 14
称量1g的石墨粉,量取26ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为120min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 26ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 3g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 120 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取1g的高锰酸钾加入到混合液中,室温下继续搅拌2小时;换成水浴,将水浴温度设置为45度,反应时间为120min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, weigh 1 g of potassium permanganate and add it to the mixed solution, and continue stirring at room temperature for 2 hours; change to a water bath, set the temperature of the water bath to 45 degrees, and the reaction time to be 120 minutes; increase the temperature of the water bath to 90 degrees, Add 40ml of pure or deionized water dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到5nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the suspension after dialysis was dried in a freeze dryer to obtain 5nm Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例15Example 15
称量1g的石墨粉,量取26ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 4g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为60min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 26ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 4g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the water bath temperature was set to 35 degrees, and the reaction time was 60 min; the water bath temperature was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到5nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the suspension after dialysis was dried in a freeze dryer to obtain 5nm Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例16Example 16
称量1g的石墨粉,量取26ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 4g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为90min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 26ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 4g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 90 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到5nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the suspension after dialysis was dried in a freeze dryer to obtain 5nm Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例17Example 17
称量1g的石墨粉,量取26ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 4g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为120min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 26ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 4g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 120 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到5nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the suspension after dialysis was dried in a freeze dryer to obtain 5nm Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例18Example 18
称量1g的石墨粉,量取30ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 4g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为60min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 30ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 4g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the water bath temperature was set to 35 degrees, and the reaction time was 60 min; the water bath temperature was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.8g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为90min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.8 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced by a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 90 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. Left and right graphene quantum dots;
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例19Example 19
称量1g的石墨粉,量取30ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 4g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为60min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 30ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 4g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the water bath temperature was set to 35 degrees, and the reaction time was 60 min; the water bath temperature was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.8g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为120min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.8 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 120 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到4nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer to obtain a final 4nm Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例20Example 20
称量1g的石墨粉,量取30ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 5g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为60min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 30ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 5g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the water bath temperature was set to 35 degrees, and the reaction time was 60 min; the water bath temperature was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到4nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer to obtain a final 4nm Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例21Example 21
称量1g的石墨粉,量取30ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取5g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为120min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 30ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 5g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 120 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到4nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer to obtain a final 4nm Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例22Example 22
称量1g的石墨粉,量取30ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 5g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为90min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 30ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 5g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 90 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.8g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为90min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.8 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced by a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 90 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到3nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for one week, and the water was changed twice a day; the suspension after dialysis was dried in a freeze dryer, and finally 3nm was obtained. Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例23Example 23
称量1g的石墨粉,量取26ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 4g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为120min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 26ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 4g of Potassium permanganate was slowly added to the mixed solution in batches, and continued stirring for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 120 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为120min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove Ice water bath, take 0.6g of potassium permanganate and add it to the mixed solution, continue stirring for 2 hours at room temperature; change to a water bath, set the water bath temperature to 45 degrees, and the reaction time is 120min; the water bath temperature is raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到5nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the suspension after dialysis was dried in a freeze dryer to obtain 5nm Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到光学硅胶充分中搅拌,即可形成稳定的GQDs/Silicone复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into the optical silica gel and stir well to form a stable GQDs/Silicone composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例24Example 24
称量1g的石墨粉,量取23ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为30min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 23ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 3g of Potassium permanganate was slowly added to the mixed solution in batches, and stirring was continued for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 30 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到环氧树脂中充分搅拌,即可形成稳定的石墨烯/环氧树脂复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into epoxy resin and fully stir to form a stable graphene/epoxy resin composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例25Example 25
称量1g的石墨粉,量取23ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为30min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 23ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 3g of Potassium permanganate was slowly added to the mixed solution in batches, and stirring was continued for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 30 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终得到6nm左右石墨烯量子点;The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day; the dialysis suspension was dried in a freeze dryer, and finally 6nm was obtained. Left and right graphene quantum dots;
将0.1wt%~1wt%石墨烯量子点加入到聚甲基丙烯酸甲酯中充分搅拌,即可形成稳定的GQDs/PMMA复合封装基质材料;Add 0.1wt% to 1wt% graphene quantum dots into polymethyl methacrylate and stir well to form a stable GQDs/PMMA composite encapsulation matrix material;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
实施例26Example 26
称量1g的石墨粉,量取23ml质量分数为98%的浓硫酸,将石墨粉和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1小时;称取 3g的高锰酸钾缓慢分批次加入到混合液中,继续搅拌3小时;移去冰水浴,换成水浴,将水浴温度设置为35度,反应时间为30min;将水浴温度升高至80 度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphite powder, take 23ml of concentrated sulfuric acid with a mass fraction of 98%, mix the graphite powder and concentrated sulfuric acid in a beaker, put the beaker in an ice-water bath, and stir at a speed of 300rpm for 1 hour; weigh 3g of Potassium permanganate was slowly added to the mixed solution in batches, and stirring was continued for 3 hours; the ice-water bath was removed, replaced with a water bath, the temperature of the water bath was set to 35 degrees, and the reaction time was 30 min; the temperature of the water bath was raised to 80 degrees, Add 40ml of pure or deionized water dropwise for 30min.
取10ml的浓盐酸按照1:9的比例进行稀释,将反应液用稀释后的稀盐酸进行洗涤、离心,使用去离子水洗涤离心直至溶液PH值接近7,超声处理半小时;然后用截留分子量为8000~14000的透析袋透析一周,每天换水2次;将透析后的悬浮液在冷冻干燥机中干燥,最终的到氧化石墨烯粉末。Take 10ml of concentrated hydrochloric acid and dilute it at a ratio of 1:9, wash and centrifuge the reaction solution with diluted hydrochloric acid, use deionized water to wash and centrifuge until the pH value of the solution is close to 7, and ultrasonically treat for half an hour; then use molecular weight cut-off Dialyze the dialysis bag of 8000-14000 for one week, and change the water twice a day; dry the dialysis suspension in a freeze dryer, and finally get the graphene oxide powder.
称量1g氧化石墨烯粉末,量取25ml质量分数为98%的浓硫酸,将氧化石墨烯和浓硫酸在烧杯中混合,烧杯放在冰水浴中,同时以300rpm的速度搅拌1 小时;移去冰水浴,称取0.6g的高锰酸钾加入到混合液中,室温下继续搅拌2 小时;换成水浴,将水浴温度设置为45度,反应时间为60min;将水浴温度升高至90度,滴加40ml的纯水或者去离子水,持续时间为30min。Weigh 1g of graphene oxide powder, measure 25ml of concentrated sulfuric acid with a mass fraction of 98%, mix graphene oxide and concentrated sulfuric acid in a beaker, place the beaker in an ice-water bath, and stir for 1 hour at a speed of 300rpm; remove In an ice-water bath, 0.6 g of potassium permanganate was weighed and added to the mixed solution, and stirring was continued for 2 hours at room temperature; replaced with a water bath, the temperature of the water bath was set to 45 degrees, and the reaction time was 60 min; the temperature of the water bath was raised to 90 degrees , 40ml of pure water or deionized water was added dropwise for 30min.
将反应后的氧化石墨烯量子点溶液配成1mg/ml溶液,氧化石墨烯与水合肼质量配比为10:7,加入水合肼后将其放在90~95度水浴中还原,1h后取出。The reacted graphene oxide quantum dot solution was prepared into a 1 mg/ml solution, and the mass ratio of graphene oxide to hydrazine hydrate was 10:7. After adding hydrazine hydrate, it was placed in a 90-95 degree water bath for reduction, and taken out after 1 hour. .
将反应后悬浮液用0.22um的滤膜进行过滤,然后用截留分子量为 3000~8000的透析袋透析一周,每天换水2次,最后制得尺寸为6nm左右,浓度10mg/mL石墨烯量子点溶液。The suspension after the reaction was filtered with a 0.22um filter membrane, and then dialyzed with a dialysis bag with a molecular weight cut-off of 3000-8000 for a week, and the water was changed twice a day. Finally, graphene quantum dots with a size of about 6 nm and a concentration of 10 mg/mL were obtained. solution.
用四氢呋喃溶解光学硅胶B胶后,加入10wt%~100wt%石墨烯量子点溶液充分搅拌,加热烘干多余水分和四氢呋喃后,即可形成的GQDs/Silicone复合封装基质;After dissolving the optical silica gel B glue with tetrahydrofuran, adding 10wt% to 100wt% graphene quantum dot solution and fully stirring, heating and drying excess water and tetrahydrofuran, the GQDs/Silicone composite encapsulation matrix can be formed;
取0.8g的复合基质并加入0.1g荧光粉充分搅拌,脱泡机抽真空除去气泡后,采用自由点胶法涂覆在LED芯片表面,用光电烤箱于150℃加热1h固化。Take 0.8g of the composite matrix and add 0.1g of phosphor powder and stir it thoroughly. After the bubbles are removed by vacuuming with a defoaming machine, it is coated on the surface of the LED chip by a free dispensing method, and cured by heating at 150 °C for 1 h in a photoelectric oven.
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910349709.5A CN110066516A (en) | 2019-04-28 | 2019-04-28 | A kind of preparation method of the composite package matrix for LED encapsulation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910349709.5A CN110066516A (en) | 2019-04-28 | 2019-04-28 | A kind of preparation method of the composite package matrix for LED encapsulation |
Publications (1)
Publication Number | Publication Date |
---|---|
CN110066516A true CN110066516A (en) | 2019-07-30 |
Family
ID=67369257
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910349709.5A Pending CN110066516A (en) | 2019-04-28 | 2019-04-28 | A kind of preparation method of the composite package matrix for LED encapsulation |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110066516A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114132921A (en) * | 2021-04-28 | 2022-03-04 | 宁波中乌新材料产业技术研究院有限公司 | An electrochemical method for preparing graphene nanoparticles |
CN117430373A (en) * | 2023-12-21 | 2024-01-23 | 朗峰新材料启东有限公司 | Anti-interference nanocrystalline composite magnetic core material and preparation method thereof |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102807209A (en) * | 2012-08-02 | 2012-12-05 | 清华大学 | Method for preparing graphene quantum dots |
CN103738941A (en) * | 2013-11-14 | 2014-04-23 | 盐城增材科技有限公司 | Graphene quantum dot preparation method |
WO2016025051A2 (en) * | 2014-05-26 | 2016-02-18 | William Marsh Rice University | Graphene quantum dot-polymer composites and methods of making the same |
CN106633887A (en) * | 2016-06-21 | 2017-05-10 | 深圳市大族元亨光电股份有限公司 | Graphene heat conduction silicone grease for high-power LED and method for preparing graphene heat conduction silicone grease |
CN109082264A (en) * | 2018-07-04 | 2018-12-25 | 南京理工大学 | Applications of MoS2/RGO Composite Materials |
-
2019
- 2019-04-28 CN CN201910349709.5A patent/CN110066516A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102807209A (en) * | 2012-08-02 | 2012-12-05 | 清华大学 | Method for preparing graphene quantum dots |
CN103738941A (en) * | 2013-11-14 | 2014-04-23 | 盐城增材科技有限公司 | Graphene quantum dot preparation method |
WO2016025051A2 (en) * | 2014-05-26 | 2016-02-18 | William Marsh Rice University | Graphene quantum dot-polymer composites and methods of making the same |
CN106633887A (en) * | 2016-06-21 | 2017-05-10 | 深圳市大族元亨光电股份有限公司 | Graphene heat conduction silicone grease for high-power LED and method for preparing graphene heat conduction silicone grease |
CN109082264A (en) * | 2018-07-04 | 2018-12-25 | 南京理工大学 | Applications of MoS2/RGO Composite Materials |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114132921A (en) * | 2021-04-28 | 2022-03-04 | 宁波中乌新材料产业技术研究院有限公司 | An electrochemical method for preparing graphene nanoparticles |
CN114132921B (en) * | 2021-04-28 | 2023-04-18 | 宁波中乌新材料产业技术研究院有限公司 | Electrochemical method for preparing graphene nanoparticles |
CN117430373A (en) * | 2023-12-21 | 2024-01-23 | 朗峰新材料启东有限公司 | Anti-interference nanocrystalline composite magnetic core material and preparation method thereof |
CN117430373B (en) * | 2023-12-21 | 2024-02-23 | 朗峰新材料启东有限公司 | Anti-interference nanocrystalline composite magnetic core material and preparation method thereof |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Kim et al. | Photo-patternable quantum dots/siloxane composite with long-term stability for quantum dot color filters | |
CN106098952B (en) | Organosilicon functionalized red-light carbon quantum dot and preparation method and application thereof | |
CN104774470B (en) | A kind of sealant and great power LED for great power LED | |
CN103421513A (en) | White-light quantum-dot composite particle and method for manufacturing same | |
CN110272208B (en) | A kind of green fluorescent glass ceramic and its preparation method and application | |
KR102141645B1 (en) | Wavelength conversion polymer film | |
CN113045978B (en) | Preparation method of carbon quantum dot-water-soluble polyurethane solution | |
CN110066516A (en) | A kind of preparation method of the composite package matrix for LED encapsulation | |
CN111205851B (en) | Liquid-phase packaged quantum dot microsphere, preparation method and application | |
CN107342348B (en) | A kind of preparation method of LED device | |
CN101887941A (en) | A kind of preparation method of LED phosphor layer | |
CN106684231B (en) | A kind of CSP chip scale packages and packaging method | |
CN104371732A (en) | Method for preparing fluorescent gel glass by adopting hydrophobic semiconductor quantum dots | |
CN108681206A (en) | Has the function of the composite film material and preparation method thereof of up-conversion luminescence and ultraviolet light sensitive characteristic simultaneously | |
CN110016334B (en) | Method for improving light emitting efficiency of pc-LEDs by using forward scattering enhanced quantum dot fluorescent powder | |
CN105957945B (en) | A kind of light emitting diode and preparation method thereof with photonic crystal | |
CN110467913B (en) | Coating method of large-particle-size LED fluorescent powder | |
WO2011143792A1 (en) | Releasable light-converting luminescent film | |
CN103500786A (en) | Full-angle luminous LED (light-emitting diode) light source and preparation method thereof | |
CN103367613A (en) | Method for preparing white light source with dual-band-gap photonic crystals | |
CN114574197B (en) | Carbon dot-organic silicon composite fluorescent material and preparation method and application thereof | |
CN114989817B (en) | Transition metal doped narrow-band luminescent gel material and preparation method and application thereof | |
CN101916812A (en) | A kind of light-emitting diode and its preparation method | |
CN104279514B (en) | Wavelength converter and preparation method thereof, related lighting fixtures and optical projection system | |
Yu et al. | Enhanced photoluminescence intensity of quantum dot films with the sandwich column array structure by uniform electrical induction |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190730 |
|
RJ01 | Rejection of invention patent application after publication |