CN110053253B - Optimization method and device for galvanometer scanning path - Google Patents
Optimization method and device for galvanometer scanning path Download PDFInfo
- Publication number
- CN110053253B CN110053253B CN201910233624.0A CN201910233624A CN110053253B CN 110053253 B CN110053253 B CN 110053253B CN 201910233624 A CN201910233624 A CN 201910233624A CN 110053253 B CN110053253 B CN 110053253B
- Authority
- CN
- China
- Prior art keywords
- scanning path
- scanning
- path
- optimized
- initial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 40
- 238000005457 optimization Methods 0.000 title claims description 16
- 238000010146 3D printing Methods 0.000 abstract description 10
- 230000009191 jumping Effects 0.000 abstract description 8
- 238000010586 diagram Methods 0.000 description 14
- 230000003287 optical effect Effects 0.000 description 4
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/30—Auxiliary operations or equipment
- B29C64/386—Data acquisition or data processing for additive manufacturing
- B29C64/393—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y50/00—Data acquisition or data processing for additive manufacturing
- B33Y50/02—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Abstract
The invention discloses a method and a device for optimizing a scanning path of a galvanometer, wherein the method comprises the following steps: acquiring an initial scanning path set S and a scanning filling space m of a galvanometer; determining an optimized scanning path of the galvanometer according to the scanning sequence of each scanning path in the initial scanning path set S and the scanning filling interval m; and controlling the galvanometer to scan according to the optimized scanning path. Compared with the prior art, the galvanometer in the invention does not strictly scan according to the scanning sequence of each scanning path in the initial scanning path set S, but determines a new optimized scanning path according to the scanning sequence and the scanning filling interval of each scanning path, and the optimized scanning path can effectively reduce the total length of the galvanometer jumping during scanning in the model hollow area, thereby reducing the scanning time of the galvanometer and improving the 3D printing efficiency.
Description
Technical Field
The invention relates to the technical field of rapid prototyping, in particular to a method and a device for optimizing a scanning path of a galvanometer.
Background
Galvanometers, also known as laser scanners, typically consist of an X-Y optical scanning head, an electronic drive amplifier, and optical mirrors. The signal provided by the computer controller drives the optical scanning by driving the amplifying circuit, thereby controlling the deflection of the laser beam in the X-Y plane.
At present, when a path of a scanning path of a galvanometer is planned, the galvanometer is generally scanned strictly one by one according to an actual filling sequence, specifically, refer to fig. 1, where fig. 1 is a schematic diagram of a scanning path of the galvanometer commonly found in the prior art, in fig. 1, a solid line part represents a scanning path of the galvanometer corresponding to a solid part of a model, and a dotted line part represents a jumping path of the galvanometer corresponding to a hollow part of the model, that is, a path that the galvanometer runs empty.
In fig. 1, the galvanometer scans strictly from a1 to An one by one according to the scanning path, which results in that the total length of the galvanometer jumping in scanning the hollow area of the model is too large, and too much time is consumed, thus seriously affecting the 3D printing efficiency.
Disclosure of Invention
The application provides an optimization method of a galvanometer scanning path, which can solve the technical problem of low 3D printing efficiency in the prior art.
Specifically, a first aspect of the present invention provides a method for optimizing a scanning path of a galvanometer, where the method includes:
acquiring an initial scanning path set S and a scanning filling space m of a galvanometer, wherein the initial scanning path set S comprises a plurality of scanning paths;
determining an optimized scanning path of the galvanometer according to the scanning sequence of each scanning path in the initial scanning path set S and the scanning filling interval m;
and controlling the galvanometer to scan according to the optimized scanning path.
Further, the second aspect of the present invention provides an apparatus for optimizing a scanning path of a galvanometer, the apparatus comprising:
the acquisition module is used for acquiring an initial scanning path set S and a scanning filling space m of the galvanometer, wherein the initial scanning path set S comprises a plurality of scanning paths;
a path optimization module, configured to determine an optimized scanning path of the galvanometer according to a scanning order of each scanning path in the initial scanning path set S and the scanning filling interval m;
and the control module is used for controlling the galvanometer to scan according to the optimized scanning path.
The optimization method of the galvanometer scanning path provided by the invention comprises the following steps: acquiring an initial scanning path set S and a scanning filling space m of a galvanometer; determining an optimized scanning path of the galvanometer according to the scanning sequence of each scanning path in the initial scanning path set S and the scanning filling interval m; and controlling the galvanometer to scan according to the optimized scanning path. Compared with the prior art, the galvanometer in the invention does not strictly scan according to the scanning sequence of each scanning path in the initial scanning path set S, but determines a new optimized scanning path according to the scanning sequence and the scanning filling interval of each scanning path, and the optimized scanning path can effectively reduce the total length of the galvanometer jumping during scanning in the model hollow area, thereby reducing the scanning time of the galvanometer and improving the 3D printing efficiency.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a diagram illustrating a scanning path of a galvanometer in the prior art;
FIG. 2 is a schematic flow chart illustrating steps of a method for optimizing a scanning path of a galvanometer according to an embodiment of the present disclosure;
FIG. 3 is a diagram illustrating a first optimized scan path of a galvanometer in an embodiment of the present disclosure;
FIG. 4 is a diagram illustrating a second optimized scan path of the galvanometer in an embodiment of the present invention;
FIG. 5 is a diagram illustrating a third optimized scanning path of the galvanometer according to an embodiment of the present disclosure;
FIG. 6 is a schematic diagram of a prior art galvanometer path during actual scanning;
FIG. 7 is a schematic diagram of an optimized scanning path of a galvanometer in an actual scanning process according to an embodiment of the present invention;
FIG. 8 is a block diagram of a program of an apparatus for optimizing a scanning path of a galvanometer according to an embodiment of the present invention.
Detailed Description
In order to make the objects, features and advantages of the present invention more obvious and understandable, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 2, fig. 2 is a schematic flow chart illustrating a step flow of a method for optimizing a galvanometer scanning path according to an embodiment of the present invention, where in the embodiment of the present invention, the method includes:
It can be understood that, before 3D printing, the galvanometer determines a scanning path according to the shape of the object to be printed, as shown in fig. 1, a solid line a1, a solid line a2, a solid line A3, a solid line a4, … …, and a solid line An are scanning paths of the galvanometer, and An initial scanning path set S of the galvanometer is { a1, a2, A3, a4, … …, An }; while the dashed line in fig. 1 indicates that the dashed line represents the mirror jump path corresponding to the model hollow portion.
Wherein, the scanning filling space m represents the space between two scanning paths.
The scanning order of each scanning path in the initial scanning path set S is the arrangement order of each element in the initial scanning path set S.
In the embodiment of the present invention, the method for determining the optimal scanning path of the galvanometer again according to the scanning order and the scanning filling interval m of each scanning path in the initial scanning path set S may specifically include the following steps:
and 11, selecting one scanning path from the initial scanning path set S as a first initial scanning path, and transferring to the optimized scanning path set H.
And step 12, according to the scanning sequence, searching a scanning path which is closest to the first initial scanning path and has a distance of 2m with the first initial scanning path, and transferring the previous scanning path of the searched scanning path from the initial scanning path set S to the optimized scanning path set H.
And step 13, taking the searched scanning path as a new first initial scanning path, and returning to execute the step 12 until the searched scanning path is the last scanning path in the initial scanning path set S.
And 14, determining a first optimized scanning path of the galvanometer based on the storage sequence of each scanning path in the optimized scanning path set H.
Specifically, one scanning path may be arbitrarily selected from the initial scanning path set S as the first initial scanning path, and is transferred to the optimized scanning path set H. For convenience of understanding in this embodiment, taking fig. 1 as an example for explanation, selecting the scan path a1 as a first initial scan path, and moving to the optimized scan path set H, then according to the scan order, searching a scan path closest to the scan path a1 and having a distance of 2m from the scan path a1 in the initial scan path set S, that is, the scan path A3, and then moving the previous scan path a2 of the scan path A3 from the initial scan path set S to the optimized scan path set H; then, the scan path A3 is taken as a new first initial scan path, the scan path A3 is moved to the optimized scan path set H, the scan path closest to the scan path A3 and spaced from the scan path A3 by 2m is found, i.e., the scan path a7, then the previous scan path a6 of the scan path a7 is moved from the initial scan path set S to the optimized scan path set H, and so on … …, until the found scan path is the last scan path in the initial scan path set S and the scan path An. At this time, the optimized scan path set H ═ { a1, a2, A3, a6, … …, a (n-1) }; new initial scan path set S1A { a4, … …, a (n-2), An }, and S }1∪H＝S。
And finally, determining the first optimized scanning path of the galvanometer based on the storage sequence of each scanning path in the optimized scanning path set H. Specifically, referring to fig. 3, fig. 3 is a schematic diagram of a first optimized scanning path of the galvanometer according to an embodiment of the present invention, and in fig. 3, the first optimized scanning path of the galvanometer is a1 → a2 → A3 → a6 → … … → a (n-1).
And 203, controlling the galvanometer to scan according to the optimized scanning path.
It should be understood that fig. 1 and 3 are only used for explaining the embodiment of the present invention, that is, the embodiment of the present invention can be applied to any shape of model, and the optimized scan path can be determined by using the above method regardless of the distribution of the scan paths in the initial scan path set S.
In the embodiment of the present invention, when the elements in the optimized scanning path set H are the same as the elements in the initial scanning path set S, it indicates that the first optimized scanning path covers all the scanning paths, for example, when the scanning path shown in fig. 1 only includes each scanning path in the optimized scanning path set H, the determined first optimized scanning path may be used as the optimized scanning path of the galvanometer, and at this time, the galvanometer may be controlled to scan according to the first optimized scanning path.
The optimization method of the galvanometer scanning path provided by the embodiment of the invention comprises the following steps: acquiring an initial scanning path set S and a scanning filling space m of a galvanometer; determining an optimized scanning path of the galvanometer according to the scanning sequence of each scanning path in the initial scanning path set S and the scanning filling interval m; and controlling the galvanometer to scan according to the optimized scanning path. Compared with the prior art, the galvanometer in the invention does not strictly scan according to the scanning sequence of each scanning path in the initial scanning path set S, but determines a new optimized scanning path according to the scanning sequence and the scanning filling interval of each scanning path, and the optimized scanning path can effectively reduce the total length of the galvanometer jumping during scanning in the model hollow area, thereby reducing the scanning time of the galvanometer and improving the 3D printing efficiency.
Further, based on the embodiment, in the embodiment of the present invention, when the elements in the optimized scan path set H are different from the elements in the initial scan path set S, that is, it indicates that there are scan paths in the initial scan path set S that are not included in the first optimized scan path, at this time, it is further required to continue to optimize the remaining scan paths in the initial scan path set S, which specifically includes the following steps:
step 21, selecting the last scanning path in the initial scanning path set S as a second initial scanning path, and moving to the optimized scanning path set H;
step 22, according to the sequence reverse to the scanning sequence, searching for a scanning path which is closest to the second starting scanning path and has a distance of 2m from the second starting scanning path, and transferring the next scanning path of the searched scanning path from the initial scanning path set S to the optimized scanning path set H;
step 23, taking the found scanning path as a new second initial scanning path, and returning to execute the step 22 until the found scanning path is the first scanning path in the rest scanning paths in the initial scanning path set S;
and 24, determining a second optimized scanning path of the galvanometer based on the storage sequence of each scanning path in the optimized scanning path set H, wherein the second optimized scanning path comprises the first optimized scanning path.
Specifically, for convenience of understanding, fig. 4 is taken as an example for explaining the present embodiment, and fig. 4 is a schematic diagram of a second optimized scanning path of the galvanometer in the embodiment of the present invention.
In fig. 4, a scanning path An is selected as a second initial scanning path and is transferred to An optimized scanning path set H, then according to An order reverse to the scanning order, a scanning path which is closest to the scanning path An and has a distance of 2m from the scanning path An is searched in An initial scanning path set S, that is, a scanning path a (n-3), and then a previous scanning path a (n-2) of the scanning path a (n-3) is transferred from the initial scanning path set S to the optimized scanning path set H; then, the scan path a (n-3) is used as a new first initial scan path, and the scan path A3 is moved to the optimized scan path set H, and so on … …, until the found scan path is the first scan path of the remaining scan paths in the initial scan path set S, and the scan path a 4. At this time, the optimized scan path set H is { a1, a2, A3, a6, … …, a (n-1), An, a (n-2), a (n-3), … …, a4 }.
And finally, determining a second optimized scanning path of the galvanometer based on the storage sequence of each scanning path in the optimized scanning path set H. Referring to fig. 4 in particular, in fig. 4, the second optimized scanning path of the galvanometer is a1 → a2 → A3 → a6 → … … → a (n-1) → An → a (n-2) → a (n-3) →, … …, → a 4.
It should be understood that fig. 4 is only used for explaining the embodiment of the present invention, that the embodiment of the present invention can be applied to any shape of model, and the optimized scan path can be determined by using the above method regardless of the distribution of the scan paths in the initial scan path set S.
In the embodiment of the present invention, when the elements in the optimized scanning path set H are the same as the elements in the initial scanning path set S, it indicates that the second optimized scanning path covers all the scanning paths, for example, when the scanning path shown in fig. 1 only includes each scanning path in the optimized scanning path set H, the determined second optimized scanning path may be used as the optimized scanning path of the galvanometer, and at this time, the galvanometer may be controlled to scan according to the second optimized scanning path.
Further, according to an embodiment, in the embodiment of the present invention, after determining the second optimized scanning path of the galvanometer, the method further includes the following steps:
and step 31, determining whether the initial scanning path set S is an empty set.
Step 32, if the initial scan path set S is a non-empty set, returning to perform the steps 11 to 13, and/or the steps 21 to 23 until the initial scan path set S is an empty set.
That is, in the embodiment of the present invention, after determining the second optimized scanning path of the galvanometer, it may further determine whether the initial scanning path set S is an empty set, if the initial scanning path set S is a non-empty set, it indicates that there are scanning paths in the initial scanning path set S that are not included in the first optimized scanning path, at this time, it is further necessary to continue optimizing the remaining scanning paths in the initial scanning path set S, at this time, the above steps 11 to 13 and/or the above steps 21 to 23 may be executed again until the initial scanning path set S is an empty set.
Further, after the step of setting the initial scan path set S as an empty set, the method further includes the steps of:
and determining a third optimized scanning path of the galvanometer based on the storage sequence of all the scanning paths in the optimized scanning path set H, wherein the third optimized scanning path comprises the first optimized scanning path and the second optimized scanning path.
Specifically, for convenience of understanding, fig. 5 is taken as an example for the present embodiment to describe, and fig. 5 is a schematic diagram of a third optimized scanning path of the galvanometer in the embodiment of the present invention.
In fig. 5, the remaining scan paths in the initial scan path set S further include a (b1), a (b2), a (c1), a (c2), and a (c3), and the same principle as that in steps 11 to 13 is used to obtain An optimized scan path set H ═ { a1, a2, A3, A6, … …, a (n-1), An, a (n-2), a (n-3), … …, a4, a (b1), a (c1), and a (c1) }, i.e., the third optimized scan path of the galvanometer is a1 → 1 → a (n-1) → An → a (n-2) → a (n-3), 1, a → b → a (1) → a → b → 1 → a (1) → b → a → 1 → b → a (1).
It should be understood that fig. 5 is only used for explaining the embodiment of the present invention, that is, the embodiment of the present invention can be applied to any shape of model, and the optimized scan path can be determined by using the above method regardless of the distribution of the scan paths in the initial scan path set S.
According to the optimization method of the galvanometer scanning path provided by the embodiment of the invention, the galvanometer does not strictly scan according to the scanning sequence of each scanning path in the initial scanning path set S, but a new optimized scanning path is determined according to the scanning sequence and the scanning filling interval of each scanning path, and the optimized scanning path can effectively reduce the total length of the galvanometer jumping during scanning in the hollow area of the model, so that the scanning time of the galvanometer can be reduced, and the 3D printing efficiency is improved.
To better explain the beneficial effects of the method provided by this embodiment, refer to fig. 6 and 7, fig. 6 is a schematic diagram of a path of a galvanometer in the prior art in an actual scanning process, and fig. 7 is a schematic diagram of an optimized scanning path of the galvanometer in the embodiment of the present invention in the actual scanning process. In fig. 6 and 7, the gray area represents the jump path of the galvanometer when the galvanometer scans in the model hollow area, and the black area represents the scanning path of the galvanometer in the model solid area. It can be clearly seen that, for the same model of scanning, the total length of the jump-off path of the galvanometer in the prior art in the actual scanning process is very large, while the jump-off path of the galvanometer in the embodiment of the invention in the actual scanning process is very few, and only a few jump-off paths are provided at sporadic turning points. Therefore, the method for optimizing the scanning path of the galvanometer can obviously reduce the total length of the scanning jump path of the galvanometer, further greatly save the total scanning time and greatly improve the 3D printing efficiency.
Further, an embodiment of the present invention further provides an optimization apparatus for a galvanometer scanning path, specifically referring to fig. 8, where fig. 8 is a schematic diagram of program modules of the optimization apparatus for a galvanometer scanning path in an embodiment of the present invention, where the apparatus includes:
the acquiring module 801 is configured to acquire an initial scanning path set S of the galvanometer and a scanning filling interval m, where the initial scanning path set S includes a plurality of scanning paths.
A path optimization module 802, configured to determine an optimized scanning path of the galvanometer according to the scanning order of each scanning path in the initial scanning path set S and the scanning filling interval m.
And the control module 803 is configured to control the galvanometer to scan according to the optimized scanning path.
The optimization device for the scanning path of the galvanometer, provided by the embodiment of the invention, can realize that: acquiring an initial scanning path set S and a scanning filling space m of a galvanometer; determining an optimized scanning path of the galvanometer according to the scanning sequence of each scanning path in the initial scanning path set S and the scanning filling interval m; and controlling the galvanometer to scan according to the optimized scanning path. Compared with the prior art, the galvanometer in the invention does not strictly scan according to the scanning sequence of each scanning path in the initial scanning path set S, but determines a new optimized scanning path according to the scanning sequence and the scanning filling interval of each scanning path, and the optimized scanning path can effectively reduce the total length of the galvanometer jumping during scanning in the model hollow area, thereby reducing the scanning time of the galvanometer and improving the 3D printing efficiency.
Further, the path optimization module 802 specifically includes:
the first selection module is used for selecting one scanning path from the initial scanning path set S as a first initial scanning path and transferring the scanning path to the optimized scanning path set H;
the first searching module is used for searching a scanning path which is closest to the first initial scanning path and has a distance of 2m with the first initial scanning path according to the scanning sequence, and transferring the previous scanning path of the searched scanning path from the initial scanning path set S to the optimized scanning path set H;
the first circulation module is used for taking the searched scanning path as a new first initial scanning path and returning to execute the first searching module until the searched scanning path is the last scanning path in the initial scanning path set S;
and the first determining module is used for determining a first optimized scanning path of the galvanometer based on the storage sequence of each scanning path in the optimized scanning path set H.
Further, the above apparatus further comprises:
the second selection module is used for selecting the last scanning path in the initial scanning path set S as a second initial scanning path and transferring the second initial scanning path to the optimized scanning path set H;
the second searching module is used for searching a scanning path which is closest to the second starting scanning path and has a distance of 2m with the second starting scanning path according to a sequence which is the reverse of the scanning sequence, and transferring the next scanning path of the searched scanning path from the initial scanning path set S to the optimized scanning path set H;
the second circulation module is used for taking the searched scanning path as a new second initial scanning path, and returning to execute the second searching module until the searched scanning path is the first scanning path in the rest scanning paths in the initial scanning path set S;
a second determining module, configured to determine a second optimized scanning path of the galvanometer based on a storage order of each scanning path in the optimized scanning path set H, where the second optimized scanning path includes the first optimized scanning path.
Further, the above apparatus further comprises:
the empty set confirming module is used for determining whether the initial scanning path set S is an empty set or not after determining the second optimized scanning path of the galvanometer;
and the third circulation module is used for returning to execute the first selection module to the first circulation module and/or the second selection module to the second circulation module if the initial scanning path set S is a non-empty set until the initial scanning path set S is an empty set.
Further, the above apparatus further comprises:
a third determining module, configured to determine a third optimized scanning path of the galvanometer based on a storage order of each scanning path in the optimized scanning path set H until the initial scanning path set S is an empty set, where the third optimized scanning path includes the first optimized scanning path and the second optimized scanning path.
That is, in the optimization device for the scanning path of the galvanometer provided in the embodiment of the present invention, the galvanometer does not strictly scan according to the scanning sequence of each scanning path in the initial scanning path set S, but determines a new optimized scanning path according to the scanning sequence and the scanning filling interval of each scanning path, and the optimized scanning path can effectively reduce the total length of the galvanometer jumping during scanning in the model hollow area, so that the scanning time of the galvanometer can be reduced, and the 3D printing efficiency can be improved.
In the several embodiments provided in the present application, it should be understood that the disclosed apparatus and method may be implemented in other ways. For example, the above-described apparatus embodiments are merely illustrative, and for example, the division of the modules is merely a logical division, and in actual implementation, there may be other divisions, for example, multiple modules or components may be combined or integrated into another system, or some features may be omitted, or not implemented. In addition, the shown or discussed mutual coupling or direct coupling or communication connection may be an indirect coupling or communication connection through some interfaces, devices or modules, and may be in an electrical, mechanical or other form.
The modules described as separate parts may or may not be physically separate, and parts displayed as modules may or may not be physical modules, may be located in one place, or may be distributed on a plurality of network modules. Some or all of the modules may be selected according to actual needs to achieve the purpose of the solution of the present embodiment.
In addition, functional modules in the embodiments of the present invention may be integrated into one processing module, or each of the modules may exist alone physically, or two or more modules are integrated into one module. The integrated module can be realized in a hardware mode, and can also be realized in a software functional module mode.
The integrated module, if implemented in the form of a software functional module and sold or used as a stand-alone product, may be stored in a computer readable storage medium. Based on such understanding, the technical solution of the present invention may be embodied in the form of a software product, which is stored in a storage medium and includes instructions for causing a computer device (which may be a personal computer, a server, or a network device) to execute all or part of the steps of the method according to the embodiments of the present invention. And the aforementioned storage medium includes: a U-disk, a removable hard disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a magnetic disk or an optical disk, and other various media capable of storing program codes.
It should be noted that, for the sake of simplicity, the above-mentioned method embodiments are described as a series of acts or combinations, but those skilled in the art should understand that the present invention is not limited by the described order of acts, as some steps may be performed in other orders or simultaneously according to the present invention. Further, those skilled in the art will appreciate that the embodiments described in the specification are presently preferred and that no acts or modules are necessarily required of the invention.
In the above embodiments, the descriptions of the respective embodiments have respective emphasis, and for parts that are not described in detail in a certain embodiment, reference may be made to related descriptions of other embodiments.
In view of the above description of the method and apparatus for optimizing a scanning path of a galvanometer provided by the present invention, those skilled in the art will appreciate that there are variations in the embodiments and applications of the method and apparatus according to the concepts of the present invention.
Claims (8)
1. A method for optimizing a scan path of a galvanometer, the method comprising:
acquiring an initial scanning path set S and a scanning filling space m of a galvanometer, wherein the initial scanning path set S comprises a plurality of scanning paths;
determining an optimized scanning path of the galvanometer according to the scanning sequence of each scanning path in the initial scanning path set S and the scanning filling interval m;
controlling the galvanometer to scan according to the optimized scanning path;
wherein, the determining the optimized scanning path of the galvanometer according to the scanning order of each scanning path in the initial scanning path set S and the scanning filling interval m specifically includes:
step 11, selecting one scanning path from the initial scanning path set S as a first initial scanning path, and transferring to an optimized scanning path set H;
step 12, according to the scanning sequence, searching a scanning path which is closest to the first initial scanning path and has a distance of 2m with the first initial scanning path, and transferring a previous scanning path of the searched scanning path from the initial scanning path set S to an optimized scanning path set H;
step 13, taking the searched scanning path as a new first initial scanning path, and returning to execute the step 12 until the searched scanning path is the last scanning path in the initial scanning path set S;
and 14, determining a first optimized scanning path of the galvanometer based on the storage sequence of each scanning path in the optimized scanning path set H.
2. The galvanometer scan path optimization method of claim 1, wherein after the step of determining a first optimized scan path of the galvanometer, the method further comprises:
step 21, selecting the last scanning path in the initial scanning path set S as a second initial scanning path, and moving to the optimized scanning path set H;
step 22, according to the sequence reverse to the scanning sequence, searching for a scanning path which is closest to the second starting scanning path and has a distance of 2m from the second starting scanning path, and transferring the next scanning path of the searched scanning path from the initial scanning path set S to the optimized scanning path set H;
step 23, taking the found scanning path as a new second initial scanning path, and returning to execute the step 22 until the found scanning path is the first scanning path in the rest scanning paths in the initial scanning path set S;
and 24, determining a second optimized scanning path of the galvanometer based on the storage sequence of each scanning path in the optimized scanning path set H, wherein the second optimized scanning path comprises the first optimized scanning path.
3. The method for optimizing a scan path of a galvanometer of claim 2, wherein after determining a second optimized scan path of the galvanometer, the method further comprises:
step 31, determining whether the initial scanning path set S is an empty set;
step 32, if the initial scan path set S is a non-empty set, returning to perform the steps 11 to 13, and/or the steps 21 to 23 until the initial scan path set S is an empty set.
4. The method for optimizing a galvanometer scan path of claim 3, wherein until after the step of the initial set of scan paths S being an empty set, the method further comprises:
and determining a third optimized scanning path of the galvanometer based on the storage sequence of all the scanning paths in the optimized scanning path set H, wherein the third optimized scanning path comprises the first optimized scanning path and the second optimized scanning path.
5. An apparatus for optimizing a scan path of a galvanometer, the apparatus comprising:
the acquisition module is used for acquiring an initial scanning path set S and a scanning filling space m of the galvanometer, wherein the initial scanning path set S comprises a plurality of scanning paths;
a path optimization module, configured to determine an optimized scanning path of the galvanometer according to a scanning order of each scanning path in the initial scanning path set S and the scanning filling interval m;
the control module is used for controlling the galvanometer to scan according to the optimized scanning path;
wherein, the path optimization module specifically comprises:
the first selection module is used for selecting one scanning path from the initial scanning path set S as a first initial scanning path and transferring the scanning path to the optimized scanning path set H;
the first searching module is used for searching a scanning path which is closest to the first initial scanning path and has a distance of 2m with the first initial scanning path according to the scanning sequence, and transferring the previous scanning path of the searched scanning path from the initial scanning path set S to the optimized scanning path set H;
the first circulation module is used for taking the searched scanning path as a new first initial scanning path and returning to execute the first searching module until the searched scanning path is the last scanning path in the initial scanning path set S;
and the first determining module is used for determining a first optimized scanning path of the galvanometer based on the storage sequence of each scanning path in the optimized scanning path set H.
6. The galvanometer scan path optimizing apparatus of claim 5, wherein the apparatus further comprises:
the second selection module is used for selecting the last scanning path in the initial scanning path set S as a second initial scanning path and transferring the second initial scanning path to the optimized scanning path set H;
the second searching module is used for searching a scanning path which is closest to the second starting scanning path and has a distance of 2m with the second starting scanning path according to a sequence which is the reverse of the scanning sequence, and transferring the next scanning path of the searched scanning path from the initial scanning path set S to the optimized scanning path set H;
the second circulation module is used for taking the searched scanning path as a new second initial scanning path, and returning to execute the second searching module until the searched scanning path is the first scanning path in the rest scanning paths in the initial scanning path set S;
a second determining module, configured to determine a second optimized scanning path of the galvanometer based on a storage order of each scanning path in the optimized scanning path set H, where the second optimized scanning path includes the first optimized scanning path.
7. The galvanometer scan path optimizing apparatus of claim 6, wherein the apparatus further comprises:
the empty set confirming module is used for determining whether the initial scanning path set S is an empty set or not after determining the second optimized scanning path of the galvanometer;
and the third circulation module is used for returning to execute the first selection module to the first circulation module and/or the second selection module to the second circulation module if the initial scanning path set S is a non-empty set until the initial scanning path set S is an empty set.
8. The galvanometer scan path optimizing apparatus of claim 7, wherein the apparatus further comprises:
a third determining module, configured to determine a third optimized scanning path of the galvanometer based on a storage order of each scanning path in the optimized scanning path set H until the initial scanning path set S is an empty set, where the third optimized scanning path includes the first optimized scanning path and the second optimized scanning path.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910233624.0A CN110053253B (en) | 2019-03-26 | 2019-03-26 | Optimization method and device for galvanometer scanning path |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910233624.0A CN110053253B (en) | 2019-03-26 | 2019-03-26 | Optimization method and device for galvanometer scanning path |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110053253A CN110053253A (en) | 2019-07-26 |
| CN110053253B true CN110053253B (en) | 2021-06-01 |
Family
ID=67316348
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910233624.0A Active CN110053253B (en) | 2019-03-26 | 2019-03-26 | Optimization method and device for galvanometer scanning path |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110053253B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112721175A (en) * | 2020-12-18 | 2021-04-30 | 湖南华曙高科技有限责任公司 | Scanning path planning method and device for rapid prototyping device and readable storage medium |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19853979A1 (en) * | 1998-11-23 | 2000-05-31 | Fraunhofer Ges Forschung | Device and method for scanning an object surface with a laser beam, in particular for selective laser melting |
| CN105773967B (en) * | 2016-03-03 | 2018-04-20 | 西安铂力特增材技术股份有限公司 | A kind of strip-type laser beam scan path planing method |
| CN106056672B (en) * | 2016-05-24 | 2018-06-19 | 东南大学 | A kind of 3 D-printing model detail regional compartmentalization fill method based on shape feature |
| CN106273496B (en) * | 2016-08-30 | 2018-08-07 | 大连理工大学 | A kind of complicated break area automatic division method in increasing material manufacturing |
-
2019
- 2019-03-26 CN CN201910233624.0A patent/CN110053253B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN110053253A (en) | 2019-07-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11020985B2 (en) | Image processing apparatus, image processing method and storage medium | |
| CN110187496B (en) | Laser scanning device and method | |
| CN110053253B (en) | Optimization method and device for galvanometer scanning path | |
| CN109175716A (en) | Laser marking control method, device, computer equipment and storage medium | |
| JPS6238733B2 (en) | ||
| CN110738067A (en) | Method and device for improving code scanning efficiency | |
| US20050018918A1 (en) | Image enhancement employing partial template matching | |
| WO2007037519A1 (en) | Image recording apparatus, image recording method, data structure, recording medium, data processing apparatus and method | |
| JP4773639B2 (en) | Image recording apparatus, computer program, and image recording control method | |
| CN114415477B (en) | Method for exposing image by laser imaging equipment and related equipment | |
| EP3813189A1 (en) | Filter coupling structure and processing method | |
| JP2002077612A (en) | Image processing method and image processing apparatus | |
| US7136200B2 (en) | Method for determining restored scanning position | |
| CN113446938B (en) | Numerical control engraving scanning method, system, storage medium and equipment | |
| JP3029595B2 (en) | Printer and method for printing raster image with high image quality | |
| US11170481B2 (en) | Digital filter for filtering signals | |
| US8537406B2 (en) | Data processing apparatus, data processing method, and storage medium capable of suppressing an increase in processing load in determination of a color range | |
| WO2014171452A1 (en) | Color-processing device, image-forming device and color-processing method | |
| JP2005202667A (en) | Hardware function variable printing apparatus, hardware function change program, and hardware function change method | |
| CN113681894B (en) | Scanning line quality optimization method, scanning line quality optimization device and printer | |
| CN112464801B (en) | Robot data processing method and device | |
| CN113515241B (en) | Printing method, device, equipment and storage medium for printing multiple images | |
| JP2012194688A (en) | Print control program | |
| JP3512462B2 (en) | Black isolated point removal device | |
| CN119368764A (en) | Delay parameter setting method for 3D printing equipment and related equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |