[go: up one dir, main page]

CN110036070A - The manufacturing method of resin composition for encapsulating, solidfied material, electronic part apparatus and electronic part apparatus - Google Patents

The manufacturing method of resin composition for encapsulating, solidfied material, electronic part apparatus and electronic part apparatus Download PDF

Info

Publication number
CN110036070A
CN110036070A CN201680091380.1A CN201680091380A CN110036070A CN 110036070 A CN110036070 A CN 110036070A CN 201680091380 A CN201680091380 A CN 201680091380A CN 110036070 A CN110036070 A CN 110036070A
Authority
CN
China
Prior art keywords
encapsulating
resin
resin composition
mass
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201680091380.1A
Other languages
Chinese (zh)
Inventor
竹内勇磨
高桥寿登
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of CN110036070A publication Critical patent/CN110036070A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/50Amines
    • C08G59/56Amines together with other curing agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/08Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08L71/10Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C08L71/12Polyphenylene oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/295Organic, e.g. plastic containing a filler
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

A kind of resin composition for encapsulating, curing agent, (C) it includes (A) epoxy resin, (B) at least one amino have the resin and (D) inorganic filling material of phenoxy group structure.

Description

Resin composition for encapsulating, solidfied material, electronic part apparatus and electronic part apparatus Manufacturing method
Technical field
The present invention relates to the manufacturers of resin composition for encapsulating, solidfied material, electronic part apparatus and electronic part apparatus Method.
Background technique
In recent years, highly integrated to the requirement of the electronic components such as semiconductor chip, for example, in most cases in semiconductor module Flip-Chip Using body made of middle use engages semiconductor chip with substrate by solder projection.
Such semiconductor module is equipped on the small type mobile devices such as mobile phone, smart phone, and the market demand is Increase year by year.In Flip-Chip Using body, use underfill as sealing material in order to ensure its insulating properties.Bottom Portion's packing material shows mobility at room temperature, therefore is filled between chip and substrate and using capillarity, so Afterwards by making cured method of underfill etc. obtain the leakproofness of Flip-Chip Using body.
In the manufacturing process of such semiconductor module, when solidifying uncured underfill, there is production The problem of bleeding that the high ingredient of mobility contained in raw underfill is oozed out from underfill.If produced Then there are the following problems for raw bleeding: from the high cloth on branch's pollution substrate of the mobility oozed out in underfill Line, reliability and the zygosity decline of semiconductor module.
As the method for solving bleeding, such as disclose using the epoxy for being 600~1000 comprising number-average molecular weight Resin (A), curing agent (B), organic solvent (C), coupling agent (D) and inorganic filler (E) insulation paste method (such as patent Document 1).
Existing technical literature
Patent document
Patent document 1: Japanese Unexamined Patent Publication 2000-178342 bulletin
Summary of the invention
Subject to be solved by the invention
But in recent years the electronic components such as semiconductor chip are increasingly required to minimize, it is all to electronic component is configured at Distance until the wiring on side shortens.In the semiconductor module for having this kind of electronic component minimized, above-mentioned patent text The method for offering 1 record is insufficient for inhibiting the generation of bleeding, it is desired to be able to tighter inhibit bleeding The composition of generation.
Herein, bleeding be as the high ingredient of mobility solder resist substrate applied by semiconductor module (Japanese: ソ ル ダ ー レ ジ ス ト substrate) surface exudation come and generate, in bleeding, the high ingredient of mobility exudation come Degree also relies on the type of substrate.In addition, being particularly easy to occur in the case where substrate surface has carried out corona treatment Bleeding.Therefore, from the viewpoint of inhibit bleeding generation, preferably without the plasma of substrate surface at Reason.But corona treatment is used for the washing of substrate surface, therefore most feelings before the sealing of semiconductor module in process It is unavoidable in manufacture under condition, it is expected that can press down in the case where substrate surface has carried out corona treatment The generation of bleeding processed.
The purpose of a mode of the invention is, provides a kind of sealing resin group of generation for being able to suppress bleeding Close object, the resin composition for encapsulating is solidified made of solidfied material and have the electronic part apparatus of the solidfied material and make With the manufacturing method of the electronic part apparatus of the resin composition for encapsulating.
Means for solving the problems
In order to achieve the above object, the present inventors has made intensive studies, as a result, it has been found that, by that will include phenoxy group knot The resin of structure is used for resin composition for encapsulating, so that the sealing resin combination for being able to suppress the generation of bleeding can be obtained Object.
It is as described below for realizing the specific means of the above subject.
A kind of resin composition for encapsulating of 1 > of <, it includes the solidifications that (A) epoxy resin, (B) have at least one amino Agent, (C) have the resin and (D) inorganic filling material of phenoxy group structure.
2 > of < resin composition for encapsulating according to 1 > of <, wherein (C) has the resin of phenoxy group structure Weight average molecular weight MwIt is 500 or more and 100,000 or less.
3 > of < resin composition for encapsulating according to 1 > of <, wherein (C) has the resin of phenoxy group structure Weight average molecular weight MwIt is 2,000 or more and 100,000 or less.
4 > of < resin composition for encapsulating according to any one of 1 > of <~<, 3 >, wherein (C) has The resin of phenoxy group structure includes the following general formula (1) compound represented.
[changing 1]
(in general formula (1), A indicates structure shown in general formula (2), and end group B indicates base shown in hydroxyl or general formula (3) Group;In general formula (2), R1And R2Separately indicate hydrogen atom or methyl;N indicates 1~1000 integer;N be 2 or more it is whole When number, 2 or more A can be identical or different;2 end group B can be identical or different.)
5 > of < resin composition for encapsulating according to any one of 1 > of <~<, 4 >, wherein (C) has The containing ratio of the resin of phenoxy group structure is 0.05 mass of mass %~2.0 % relative to resin composition for encapsulating.
6 > of < resin composition for encapsulating according to any one of 1 > of <~<, 5 > is used for electronic component dress The sealing set.
A kind of solidfied material of 7 > of < is to solidify resin composition for encapsulating described in any one of 1 > of <~<, 6 > Made of.
A kind of electronic part apparatus of 8 > of <, has:
Substrate with circuit layer;
The electronic component that configuration is electrically connected on the substrate and with the circuit layer;With
Configure the solidfied material described in 7 > of < in the substrate Yu the gap of the electronic component.
A kind of manufacturing method of electronic part apparatus of 9 > of < is included the substrate with circuit layer and is configured in institute State on substrate and any one of 1 > of electronic component-use <~6 > of < for being electrically connected with the circuit layer described in sealing resin The process of composition sealing.
Invention effect
A mode according to the present invention, can provide the generation for being able to suppress bleeding resin composition for encapsulating, Solidfied material made of the resin composition for encapsulating is solidified and have the solidfied material electronic part apparatus and using should The manufacturing method of the electronic part apparatus of resin composition for encapsulating.
Specific embodiment
Mode for carrying out the present invention is described in detail below.But the present invention is not by the following embodiments and the accompanying drawings It limits.In the following embodiments, constituent element (also include element step etc.) unless specifically stated, be not must It needs.It is also the same about numerical value and its range, it is not intended to limit the present invention.
In the disclosure, " process " this term is in addition to comprising other than the independent process of other process, though with it is other It also include the process as long as the purpose for reaching the process in the case that process can not be distinguished clearly.
In the disclosure, the numberical range for using "~" to show includes to be recorded in the numerical value of the front and back of "~" and distinguished As minimum value and maximum value.
In the disclosure stage by stage and in the numberical range of record, documented upper limit value or lower limit in 1 numberical range Value also could alternatively be the upper limit or lower limit of other numberical ranges recorded stage by stage.In addition, recorded in the disclosure Numberical range in, the upper limit or lower limit of the numberical range also could alternatively be value shown in embodiment.
In the disclosure, in the case where there are the two or more substances for being equivalent to each ingredient in the composition, as long as not having There is special declaration, then the containing ratio of each ingredient in composition or content refer to the two or more substances being present in composition Total containing ratio or content.
In the disclosure, in the case where there are the how two or more particles for being equivalent to each ingredient in the composition, as long as There is no special declaration, then the partial size of each ingredient in composition refers to mixed with the two or more particles in the presence of composition Close the relevant value of object.
In the disclosure, for " layer " this term, in addition to including when observing region present in this layer, being formed in Except in the case of the region entirety, include the case where a part for being only formed in the region.
[resin composition for encapsulating]
The resin composition for encapsulating of the disclosure include (A) epoxy resin, (B) have at least one amino curing agent, (C) with the resin and (D) inorganic filling material of phenoxy group structure.Resin composition for encapsulating for example can be used for electronic component Sealing.Resin composition for encapsulating is able to suppress the generation of bleeding.As its reason, thus it is speculated that as follows.
Phenoxy resin contained in resin composition for encapsulating and mobility the reason of being likely to become bleeding are high Ingredient between compatibility it is high.It is considered that: it is therefore, close in the case where assigning resin composition for encapsulating on substrate There is a situation where separating to be inhibited on substrate, the generation of bleeding is inhibited a part of envelope resin combination. In addition, we are believed that: in resin composition for encapsulating comprising the ingredient high as mobility, at 25 DEG C be liquid In the case where the liquid-like constituents such as epoxy resin, the compatibility of phenoxy resin and liquid-like constituents is high, therefore suitably inhibits infiltration There is the generation of elephant.
In addition, bleeding becomes easy generation in the case where substrate surface has carried out corona treatment.But It, can in the case where substrate surface has carried out corona treatment by using above-mentioned resin composition for encapsulating Inhibit the generation of bleeding.
Each ingredient contained in resin composition for encapsulating is illustrated below.
< (A) epoxy resin >
The resin composition for encapsulating of the disclosure includes (A) epoxy resin.(A) epoxy resin is to resin composition for encapsulating Curability and cementability are assigned, assigns durability and heat resistance to the solidfied material of resin composition for encapsulating.
From the viewpoint of mobility, (A) epoxy resin preferably is contained in the epoxy resin at 25 DEG C for liquid.In addition, Can also be combined in is solid epoxy resin at 25 DEG C, is not preferably influencing the mobility of resin composition for encapsulating Being combined in range is solid epoxy resin at 25 DEG C.
It should be noted that each ingredient contained in resin composition for encapsulating will be at 25 DEG C in the disclosure Viscosity is that 50Pas ingredient below is known as " being liquid at 25 DEG C ".
It include the epoxy resin at 25 DEG C for liquid, to there is resin composition for encapsulating as (A) epoxy resin The tendency that mobility improves.
As the viscosity at 25 DEG C of (A) epoxy resin, preferably 50Pas hereinafter, more preferably 0.01Pas~ 40Pas, further preferably 0.5Pas~30Pas.
In the disclosure, the viscosity at 25 DEG C of each ingredient contained in the resin composition for encapsulating such as (A) epoxy resin is Refer to: being worth obtained by being measured under conditions of 25 DEG C and 10 revs/min of revolving speed using E type viscosimeter (3 ° of cone angle).
(A) type of epoxy resin is not particularly limited.As epoxy resin, can enumerate: naphthalene type epoxy resin;Bisphenol-A, The diglycidyl ether-type epoxy resins such as Bisphenol F, bisphenol-A D, bisphenol S, hydrogenated bisphenol A;It is with o-cresol phenol aldehyde type epoxy resin What is represented carries out epoxy resin obtained by epoxidation for the phenolic resin of phenols and aldehydes;Pass through phthalic acid, dimeric dibasic acid etc. Glycidyl ester type epoxy resin obtained from the reacting of polyacid and epoxychloropropane;By diaminodiphenyl-methane, different Glycidyl amine type epoxy resin obtained by the reacting of the amine compounds such as cyanurate and epoxychloropropane etc..
For the epoxide equivalent of (A) epoxy resin, from the viewpoint of viscosity adjustment, preferably 80g/eq~250g/ Eq, more preferably 85g/eq~240g/eq, further preferably 90g/eq~230g/eq.
The measuring method of the epoxide equivalent in the disclosure is recorded below.
Epoxy resin is dissolved in methyl ethyl ketone.Glacial acetic acid, cetyltrimethylammonium bromide and masking are added into lysate Indicator (Japanese: ス ク リ ー Application indicates medicine) (will make patent blue 0.3g be dissolved in solution obtained by glacial acetic acid 100mL and make hundred In phenol indigo plant 1.5g be dissolved in solution obtained by methanol 500mL mixing and prepare solution), with the perchloric acid solution for being adjusted to 0.1N The color of solution is become pink and at the time of pink continues 1 minute as terminal by titration.In addition, blank test is carried out, It is calculate by the following formula epoxide equivalent.
Epoxide equivalent (g/eq)=(1000 × W)/{ (S-B) × N }
W: sample mass
B: the amount of 0.1N perchloric acid solution used in blank test
S: the amount of 0.1N perchloric acid solution used in the titration of sample
N: the equivalent concentration (0.1N) of perchloric acid solution
(A) weight average molecular weight of epoxy resin is not particularly limited.As the weight average molecular weight of (A) epoxy resin, preferably It is 100~1,000, more preferably 150~800, further preferably 200~500.
The measuring method of the weight average molecular weight (Mw) and number-average molecular weight (Mn) in the disclosure is recorded below.
Weight average molecular weight and number-average molecular weight are measured by gel permeation chromatography (GPC), use standard polystyren Standard curve converted and exported.The condition of GPC is as shown below.
- GPC condition-
Pump: Hitachi's L-6000 type (Hitachi Co., Ltd's system)
Chromatographic column: below to amount to 3
Gelpack GL-R420
Gelpack GL-R430
Gelpack GL-R440
(the above are Hitachi Chemical Co., Ltd.'s systems, trade name)
Eluent: tetrahydrofuran
Measuring temperature: 25 DEG C
Flow: 2.05mL/ minutes
Detector: Hitachi L-3300 type RI (Hitachi Co., Ltd's system)
As (A) epoxy resin, commercially available product can be used.As (A) epoxy resin of commercially available product, can enumerate: Nippon Steel Firmly aurification Co. Ltd. system bisphenol f type epoxy resin (name of an article: YDF-8170C), Nippon Steel & Sumitomo Metal Corporation's system are double Phenol A type epoxy resin (name of an article: YD-128), Mitsui Chemicals, Inc's bisphenol A type epoxy resin (name of an article: R-140P), Mitsubishi chemical Co., Ltd's amine type epoxy resin (name of an article: jER-630), Dainippon Ink Chemicals's naphthalene type epoxy resin (name of an article: HP-4032) etc..(A) epoxy resin is not limited to these specific examples.(A) epoxy resin can be used alone, and can also incite somebody to action Two or more is applied in combination.
It is preferably 10 matter of mass %~50 relative to resin composition for encapsulating for the containing ratio of (A) epoxy resin Measure %, the more preferably 15 mass % of mass %~40, further preferably 20 mass of mass %~35 %.
< (B) has curing agent (specific curing agent) > of at least one amino
The resin composition for encapsulating of the disclosure includes the curing agent (hereinafter also referred to " (B) that (B) has at least one amino Specific curing agent ").(B) specific curing agent is compared with aftermentioned other curing agent, and mobility can be prepared and working life is excellent by having Resin composition for encapsulating tendency.
(B) as long as specific curing agent can make the curing agent of (A) epoxy resin cure be not particularly limited.As (B) specific curing agent, as long as by polymerizeing cured curing agent together with epoxy resin, as long as sealing is made with tree Resin composition for encapsulating has mobility when oil/fat composition, then is the specific curing agent of liquid at 25 DEG C and at 25 DEG C is The specific curing agent of solid-like can be used.It include the curing agent at 25 DEG C for liquid as (B) specific curing agent, thus Have the tendency that the mobility of resin composition for encapsulating improves.
It as (B) specific curing agent, can enumerate: chain fatty race amine, annular aliphatic amine, aliphatic-aromatic amine, fragrance The amine systems curing agent such as race's amine.As amine system curing agent, from the viewpoint of heat resistance and electrical characteristics, optimization aromatic amine.
It is specific enumerable as amine system curing agent: m-phenylene diamine (MPD), 1,3- diaminotoluene, Isosorbide-5-Nitrae-diaminotoluene, 2, 4- diaminotoluene, 3,5- diethyl -2,4 di amino toluene, 3,5- diethyl -2,6- diaminotoluene, 2,4- The aromatic amine curing agent that the aromatic rings such as diamino anisole are 1;2,4 '-diaminodiphenyl-methanes, 4,4 '-diamino Diphenyl sulfone, 4,4 '-diamino diphenyl sulfones, 4,4 '-di-2-ethylhexylphosphine oxides (2- ethyl aniline), 3,3 '-diethyl -4, 4 '-diaminodiphenyl-methanes, 3,3 ', 5,5 '-tetramethyls -4,4 '-diaminodiphenyl-methane, 3,3 ', 5,5 '-four The aromatic amine curing agent that the aromatic rings such as ethyl -4,4 '-diaminodiphenyl-methane are 2;The water of aromatic amine curing agent Solve condensation product;Polytetrahydrofuran pair-P aminobenzoates (Japanese: Port リ テ ト ラ メ チ レ Application オ キ シ De ジ-p- ア ミ ノ benzoic acid エ ス テ Le), polytetrahydrofuran it is double-P aminobenzoates (Japanese: Port リ テ ト ラ メ チ レ Application オ キ シ De ジ-p- ア ミ ノ ベ Application ゾ エ ー ト) etc. with polyether structure aromatic amine;The contracting of aromatic diamine and epoxychloropropane Close object;Aromatic diamine and the reaction product of styrene etc..
As (B) specific curing agent, commercially available product can be used.As (B) specific curing agent of commercially available product, can enumerate: day This chemical drug Co. Ltd. system amine hardener (name of an article: Kayahard-AA), Mitsubishi chemical Co., Ltd's amine hardener (name of an article: JER cure (registered trademark) W, jER cure (registered trademark) 113 etc.), ALBEMARLE JAPAN CORPORATION amine Curing agent (name of an article: ETHACURE 300) etc..(B) specific curing agent is not limited to these specific examples.(B) specific curing agent can be with It is used alone a kind, two or more can also be applied in combination.
(A) epoxy resin and the containing ratio of (B) specific curing agent in resin composition for encapsulating are not particularly limited, (A) the ratio between the equivalents of epoxy group contained in epoxy resin and the equivalents of amino contained in (B) specific curing agent do not have yet It is particularly limited to.In order to inhibit less respective unreacted, the equivalents of amino contained in (B) specific curing agent is opposite The ratio (equivalents/epoxy group equivalents of amino) of the equivalents of the epoxy group contained in (A) epoxy resin preferably exists 0.6~1.4 range, more preferably 0.7~1.3 range, further preferably 0.8~1.2 range.
The content of (B) specific curing agent in resin composition for encapsulating is not particularly limited.With regard to (B) specific curing agent It is preferably 5 mass relative to 100 mass parts of (A) epoxy resin from viewpoints such as mobility, insulating reliabilities for content Part~60 mass parts, more preferably 10 mass parts~50 mass parts.
Resin composition for encapsulating may include other curing agent in addition to (B) specific curing agent.As other solidifications Agent can be enumerated: phenol system curing agent, acid anhydrides system curing agent, imidazoles system curing agent, carboxylic acid dihydrazide system curing agent etc..
When other curing agent in addition to (B) specific curing agent are applied in combination, with regard to its in resin composition for encapsulating It is excellent relative to 100 mass parts of (A) epoxy resin from viewpoints such as mobility, insulating reliabilities for the content of its curing agent It is selected as 0.5 mass parts~5.0 mass parts, more preferably 1.0 mass parts~3.0 mass parts.
When other curing agent in addition to (B) specific curing agent are applied in combination, with regard to its in resin composition for encapsulating For the containing ratio of its curing agent, from viewpoints such as mobility, insulating reliabilities, it is preferably relative to curing agent component total amount The 1 mass % of mass %~50, the more preferably 5 mass % of mass %~35, further preferably 8 mass of mass %~20 %.
< (C) has resin (phenoxy resin) > of phenoxy group structure
The resin composition for encapsulating of the disclosure includes resin (hereinafter also referred to " (C) benzene that (C) has phenoxy group structure Oxygroup resin ").Resin composition for encapsulating comprising (C) phenoxy resin has the effect of the generation of inhibition bleeding, and And there is excellent heat resistance and excellent moisture-proof, there is the tendency of the reliability after helping to improve packaging body sealing.
It should be noted that, as " phenoxy group structure ", referring to the knot for being bonded with oxygen atom on phenyl ring in the disclosure Structure not only includes phenoxy group (C6H 5- O-), it further include a part of substituted structure, a part of phenoxy group of phenoxy group The structure etc. reacted by hydrogenation etc..
For (C) phenoxy resin, at 25 DEG C be the phenoxy resin of liquid, be solid-like phenoxy resin it is equal It can be used.In the case where (C) phenoxy resin is liquid, having can be easy to be dissolved in inclining in resin composition for encapsulating To.On the other hand, in the case where (C) phenoxy resin is solid-like, by making (C) phenoxy resin be dissolved in (A) epoxy At least one of resin and (B) specific curing agent, thus resin composition for encapsulating is easy to become uniformly, to obtain stable The tendency of characteristic.As (C) phenoxy resin, it preferably is contained in the phenoxy resin at 25 DEG C for liquid, thus has sealing to use The tendency that the mobility of resin combination improves.
(C) phenoxy resin in resin composition for encapsulating can with gel permeation chromatography, pyrolysis gas chromatography, The methods of infrared spectrum analysis detects.
As (C) phenoxy resin, as long as the phenoxy resin with phenoxy group structure does not have then in the molecular structure Especially limitation.(C) phenoxy resin has at least one of epoxy group and hydroxyl preferably in skeleton.As (C) phenoxy group Resin can be enumerated: the phenoxy resin with bisphenol backbone, the phenoxy resin with phenolic aldehyde skeleton, the benzene with naphthalene skeleton Oxygroup resin, phenoxy resin with biphenyl backbone etc..As the bis-phenol structure in the phenoxy resin with bisphenol backbone, Bisphenol A-type structure, bisphenol-f type structure, bisphenol S type structure, bmminated bisphenol-A type structure and hydrogenated bisphenol A type structure can be enumerated Deng.Phenoxy resin can have epoxy group, in this case, as long as the epoxide equivalent of phenoxy resin is more than 250g/eq Can, it in addition can be 1000g/eq or more, or 3,000g/eq or more.
It should be noted that being 250eq or less in epoxide equivalent about the resin with phenoxy group structure and epoxy group When, it is set as being included in (A) epoxy resin, when epoxide equivalent is more than 250eq, is set as being included in (C) phenoxy resin.
For (C) phenoxy resin, from the viewpoint of cost, mobility and heat resistance, preferably comprise selected from Bisphenol F It is at least one kind of in the copolymerization epoxy resin of type epoxy resin, bisphenol A type epoxy resin and bisphenol-f type and bisphenol A-type, more preferably Include the following general formula (1) compound represented.
[changing 2]
In general formula (1), A indicates structure shown in general formula (2), and end group B indicates base shown in hydroxyl or general formula (3) Group.In general formula (2), R1And R2Separately indicate hydrogen atom or methyl.N indicates 1~1000 integer.It is 2 or more in n Integer when, 2 or more A can be identical or different.2 end group B can be identical or different.
Just weight average molecular weight (the M of (C) phenoxy resinw) for, it is excellent from the viewpoint of more appropriately inhibiting exudation It is selected as 500 or more, more preferably 2,000 or more.In addition, MwFrom the viewpoint of heat resistance and preferably 5,000 or more, from From the perspective of further suitably inhibiting exudation, more preferably 20,000 or more.MwFrom the viewpoint of mobility and it is preferred that It is 100,000 or less.
As (C) phenoxy resin, commercially available product can be used.As (C) phenoxy resin of commercially available product, can enumerate: three JER1256, jER4250 of water chestnut Chemical Co., Ltd., jER4275, Nippon Steel & Sumitomo Metal Corporation YP-50, YP-50S, YP-70, ZX-1356-2, FX-316, YPB-43C, YPB-43M etc..(C) phenoxy resin is not limited to this A little specific examples.(C) phenoxy resin can be used alone, two or more can also be applied in combination.
The content of (C) phenoxy resin in resin composition for encapsulating is not particularly limited.With regard to (C) phenoxy resin For content, go out from the viewpoint for the generation for suitably inhibiting bleeding in the state of maintaining high fluidity and high-fire resistance Hair, is preferably 0.1 mass parts~15 mass parts, more preferably 0.5 mass parts~10 relative to 100 mass parts of (A) epoxy resin Mass parts, further preferably 1.5 mass parts~6 mass parts.
(C) in resin composition for encapsulating as long as the containing ratio of phenoxy resin can obtain inhibiting the production of bleeding The range of raw effect is then not particularly limited.For example, for the containing ratio of (C) phenoxy resin, from the viewpoint of heat resistance It sets out, is preferably 3.0 mass % hereinafter, more preferably 2.0 mass % or less relative to resin composition for encapsulating.In addition, just It (C) is preferably 2.0 relative to resin composition for encapsulating from the viewpoint of mobility for the containing ratio of phenoxy resin Quality % hereinafter, more preferably 1.5 mass % hereinafter, further preferably 0.05 mass of mass %~1.0 %.In addition, just (C) For the containing ratio of phenoxy resin, suitably inhibit bleeding from the state of maintaining high fluidity and high-fire resistance It is preferably 0.05 mass %~2.0 mass % relative to resin composition for encapsulating from the perspective of generation, more preferably 0.1 The mass % of quality %~1.5, further preferably 0.3 mass of mass %~1.2 %.
There are the content and containing ratio of (C) phenoxy resin more high, inhibits the effect of the generation of bleeding is bigger to incline To, have the content of (C) phenoxy resin and containing ratio more low, more can inhibit the mobility as caused by Efficient Adhesive Promotion decline Tendency.
< (D) inorganic filling material >
The resin composition for encapsulating of the disclosure includes (D) inorganic filling material.
The solidfied material of resin composition for encapsulating comprising (D) inorganic filling material has heat-resisting cyclicity, moisture-proof and answers Power reduces excellent tendency.
As (D) inorganic filling material, it is not particularly limited.As the specific example of (D) inorganic filling material, can enumerate The silica such as colloidal silicon dioxide, hydrophobic silica, spherical silicon dioxide, talcum etc., from mobility when coating Viewpoint is set out, preferably spherical silicon dioxide.
In the disclosure, silica is that " spherical " refers to following situation.
Firstly, existing not completely being heated when spheroidizing to native silicon dioxide or synthetic silica The shape of the particle of melting does not become just spherical situation.Made of being fused to each other additionally, there are the particle of two or more melting The case where particle is mingled in wherein.Other particle surfaces are attached to additionally, there are the silica steam of evaporation and are solidified, result Obtain the case where adhering to fine-grained spherical silicon dioxide particle.Although so-called silica be essentially it is spherical, allow this The particle of sample shape mixes wherein, but for example when with the sphericity of Wadell [(circle equal with the projected area of particle Diameter)/(the external minimum diameter of a circle with the perspective view of particle)] and when indicating the sphericity of particle, when the value is 0.9 or more When particle is the 90 mass % or more of inorganic filling material silica entirety, then silica is referred to as " spherical ".
As (D) inorganic filling material, from the viewpoint of mobility, preferably average grain diameter is 0.01 μm~20 μm of ball Shape silica, the spherical silicon dioxide that more preferable average grain diameter is 0.02 μm~10 μm.
The measuring method of the average grain diameter in the disclosure is recorded below.
Average grain diameter refers to: using laser diffraction/(Co., Ltd.'s hole field scattering formula particle size distribution device LA-920 Make made), it utilizes and is worth obtained by the size distribution measurement based on population and its frequency.As dispersion solvent, in order to Dispersed particle and use of water is preferred, any one of acetone or alcohol.As determination condition, by particle concentration in terms of quality criteria Tens of ppm~hundreds of ppm are set as, ultrasonic treatment time is set as 30 minutes, measuring temperature is set as room temperature (25 DEG C).
In addition, the specific surface area of (D) inorganic filling material is not particularly limited.Wherein, from the sight of mobility and reliability Point sets out, and the specific surface area of (D) inorganic filling material is preferably 0.3mm2/ g~300mm2/ g, more preferably 1.0mm2/ g~ 100mm2/g.It should be noted that the specific surface area of (D) inorganic filling material is based on JIS Z 8830 by the N2 adsorption under 77K Ability measures.
As (D) inorganic filling material, commercially available product can be used.As (D) inorganic filling material of commercially available product, can enumerate Co., Ltd.'s Admatechs spherical silicon dioxide (name of an article: SO-E2, SE2300, SE2200-SEJ etc.).(D) inorganic fill Material is not limited to these specific examples.(D) inorganic filling material can be used alone, two or more combination can also be made With.
(D) inorganic filling material can be implements surface treatment using at least one kind of in following (F) coupling agents in advance Inorganic filling material can also will utilize (F) coupling agent to implement (D) inorganic filling material of surface treatment and table is not carried out (D) inorganic filling material of surface treatment is applied in combination.(D) for implementing surface treatment by using utilization (F) coupling agent is inorganic The compatibility of packing material, (D) inorganic filling material and resin component improves, and has the behaviour that resin composition for encapsulating can be improved The tendency of the property made and mobility and the toughness of solidfied material, elasticity modulus and bonding force.
(D) inorganic filling material and (F) are even when with regard to being surface-treated using (F) coupling agent to (D) inorganic filling material For the ratio for joining agent, relative to (D) inorganic filling material, (F) coupling agent is preferably 0.2 mass of mass %~5.0 %, more excellent It is selected as the 0.3 mass % of mass %~3.0, further preferably 0.4 mass of mass %~2.0 %.
For the content of (D) inorganic filling material, from viewpoints such as mobility, insulating reliabilities, relative to (A) ring 100 mass parts of oxygen resin are preferably 5 mass parts~80 mass parts, more preferably 20 mass parts~70 mass parts.
For the containing ratio of (D) inorganic filling material, from viewpoints such as mobility, insulating reliabilities, relative to close Envelope is preferably the 40 mass % of mass %~85 with resin combination, more preferably the 50 mass % of mass %~75, further preferably For 55 mass of mass %~70 %.
It include that (D) for utilizing (F) coupling agent to implement surface treatment in advance inorganic is filled out in above-mentioned resin composition for encapsulating In the case where filling material, from viewpoints such as mobility, cementabilities, (F) coupling agent is utilized to implement (D) of surface treatment in advance The content of inorganic filling material is preferably 5 mass parts~80 mass parts relative to 100 mass parts of (A) epoxy resin, more preferably 20 mass parts~70 mass parts.
It include that (D) for utilizing (F) coupling agent to implement surface treatment in advance inorganic is filled out in above-mentioned resin composition for encapsulating In the case where filling material, from viewpoints such as mobility, cementabilities, containing ratio is preferably relative to resin composition for encapsulating The 40 mass % of mass %~85, the more preferably 50 mass % of mass %~75, further preferably 55 mass of mass %~70 %.
< (E) rubber additive >
The resin composition for encapsulating of the disclosure can according to need comprising (E) rubber additive.
It is excellent that the solidfied material of resin composition for encapsulating comprising (E) rubber additive has the tendency that stress mitigates.
(E) type of rubber additive is not particularly limited, and can suitably select from known rubber additive. As the specific example of (E) rubber additive, acrylic rubber, urethane rubber, organic silicon rubber, fourth two can be enumerated Alkene rubber etc..For (E) rubber additive, at 25 DEG C be the rubber additive of liquid and at 25 DEG C be solid-like rubber Glue additive can be used.
(E) in the case that rubber additive is solid-like at 25 DEG C, as the form of (E) rubber additive, without spy It does not limit, can enumerate that particle shape, powdered, material is granular etc..From the viewpoint of heat resistance, (E) rubber additive is preferably grain Sub- shape.(E) in the case that rubber additive is particle shape, the average grain diameter of (E) rubber additive is preferably 0.01 μm~20 μm, More preferably 0.02 μm~10 μm, further preferably 0.03 μm~5 μm.
(E) in the case that rubber additive is liquid at 25 DEG C, as (E) rubber additive, can enumerate polybutadiene, Hycar, polyisoprene, polypropylene oxide, polydiorganosiloxanepolyurea (Japanese: Port リ ジ オ Le ガ ノ シ ロ キ サ Application) etc. low molecular weight compositions.The weight average molecular weight of above-mentioned low molecular weight compositions is preferably 5,000~80,000, more Preferably 8,000~50,000.
(E) it in the case that rubber additive is solid-like at 25 DEG C, is preferably heated and dissolves it in (A) epoxy It is used after in resin or (B) specific curing agent.In addition, (E) rubber additive can be used to be had and epoxy reaction in end Group rubber additive.For in (E) rubber additive that end has with the group of epoxy reaction, at 25 DEG C Be for the rubber additive of liquid and at 25 DEG C solid-like rubber additive can be used.As the base with epoxy reaction Group, can enumerate carboxyl, hydroxyl, amino etc..
As (E) rubber additive, commercially available product can be used.As (E) rubber additive of commercially available product, can enumerate: space Emerging production Co. Ltd. system CTBN1300, ATBN1300-16, CTBN1008-SP in portion etc.;TORAY DOWCORNING Co., Ltd. Silicone rubber powder (name of an article: AY42-119) processed;JSR Corp.'s rubber powder (name of an article: XER81) etc..(E) rubber Additive is not limited to these specific examples.(E) rubber additive can be used alone, two or more combination can also be made With.
In the case that resin composition for encapsulating includes (E) rubber additive, as the content of (E) rubber additive, from The viewpoints such as mobility, adaptation are set out, and are preferably 0.2 mass parts~5.0 mass parts relative to 100 mass parts of (A) epoxy resin, More preferably 0.5 mass parts~3.0 mass parts.
Resin composition for encapsulating include (E) rubber additive in the case where, just (E) rubber additive containing ratio and Speech, is preferably 0.05 matter of mass %~5.0 relative to resin composition for encapsulating from viewpoints such as mobility, adaptations Measure %, the more preferably 0.1 mass % of mass %~4.0, further preferably 0.4 mass of mass %~3.0 %.
< (F) coupling agent >
Resin composition for encapsulating can according to need comprising (F) coupling agent.
Resin composition for encapsulating comprising (F) coupling agent has the tendency that excellent adhesion.
(F) type of coupling agent is not particularly limited, and can suitably select from known coupling agent.As (F) The specific example of coupling agent can be enumerated: have at least one kind of silane compound in primary amino group, secondary amino group and tertiary amino, Silane compound with epoxy group, the silane compound with sulfydryl, the silane compound with alkyl, the silicon with phenyl Hydride compounds, the silane compound with urea groups, the silane compound with methylacryloyl, the silane with acryloyl group The silane based compounds such as compound, silane compound with vinyl;Titanate esters based compound etc..In these, used from sealing From the perspective of the adaptation of resin combination, preferably with the silane compound of epoxy group.
As (F) coupling agent, commercially available product can be used.It as (F) coupling agent of commercially available product, can enumerate: SHIN-ETSU HANTOTAI's chemistry work Industry Co. Ltd. system KBM-303, KBM-402, KBM-403, KBE-403, KBE-903, KBE-9103, KBM-573, KBM-502, KBM-503, KBE-502, KBE-503, KBM-5103, KBM-1003, KBE-585, KBM-9659, KBM-803, KBE-846, KBE-9007, X-12-967C, KBM-103, KBM-202SS etc..(F) coupling agent is not limited to These specific examples.(F) coupling agent can be used alone, two or more can also be applied in combination.
(F) coupling agent can also be used as the surface treating agent of (D) inorganic filling material and to be attached to (D) inorganic fill material The state on the surface of material is included in resin composition for encapsulating.
In the case that resin composition for encapsulating includes (F) coupling agent, from viewpoints such as mobility, heat resistances, (F) is even The content of connection agent is preferably 0.2 mass parts~5.0 mass parts, more preferably 0.5 matter relative to 100 mass parts of (A) epoxy resin Measure part~3.0 mass parts.
In the case that resin composition for encapsulating includes (F) coupling agent, from viewpoints such as mobility, heat resistances, (F) is even The containing ratio of connection agent is preferably the 0.05 mass % of mass %~5, more preferably 0.1 mass % relative to resin composition for encapsulating ~4.0 mass %, further preferably 0.4 mass of mass %~3.0 %.
The other ingredient > of <
In the range of the effect of the generation for the bleeding that is inhibited, resin composition for encapsulating can further basis It needs and includes to become the agent, pigment such as carbon black, dyestuff, ion trap agent, defoaming agent, levelling agent, anti-for improving shaking for operability Oxidant, curing accelerator, reactive diluent, organic solvent etc..
The preparation method > of < resin composition for encapsulating
The resin composition for encapsulating of the disclosure can obtain as follows: by (A) epoxy resin, (B) specific curing agent, (C) Other additives such as phenoxy resin and (D) inorganic filling material and (E) rubber additive, (F) coupling agent disposably or Rand is implemented to heat as needed respectively, while being stirred, melting, mix, dispersing, thus obtains.Especially at (A) Epoxy resin, (B) specific curing agent, (C) phenoxy resin etc. are to glue if with solid states cooperation sometimes in solid situation Degree rises, operability declines, therefore preferably mixed etc. after liquid and heating in advance.As they mixing, stir The device mixing, disperse etc., is not particularly limited, can enumerate: having the mixing and kneading machine, triple-roller mill, ball of agitating device, heating device etc. Grinding machine, planetary-type mixer, ball mill etc..Using these devices by mentioned component mixing, mixing and deaeration as needed, thus Available resin composition for encapsulating.
The physical property > of < resin composition for encapsulating
The viscosity of resin composition for encapsulating is not particularly limited.Wherein, from the viewpoint of mobility, sealing resin The viscosity of composition preferably at 25 DEG C be 0.1Pas~100.0Pas, more preferably at 25 DEG C for 0.1Pas~ 50.0Pa·s.It should be noted that E type viscosimeter (cone angle can be used in the viscosity of the resin composition for encapsulating at 25 DEG C 3 °, 10 revs/min of revolving speed) it measures.
When resin composition for encapsulating is used for flip-chip underfill etc., as at 100 DEG C~120 DEG C It is nearby filled in index when tens of μm~hundreds of μm of close gap, the viscosity of resin composition for encapsulating is preferably at 110 DEG C It is down 0.40Pas hereinafter, being more preferably 0.25Pas at 110 DEG C hereinafter, being further preferably at 110 DEG C 0.15Pas hereinafter, be particularly preferably 0.12Pas at 110 DEG C hereinafter, be in turn preferably 0.10Pas at 110 DEG C with Under.It should be noted that rheometer AR2000 (TA can be used in the viscosity of the resin composition for encapsulating at 110 DEG C Instrument Japan Co. Ltd. system, aluminium cone 40mm, shear velocity 32.5/ second) it is measured.
For resin composition for encapsulating, at measured at 25 DEG C using E type viscosimeter 2.5 revs/min of revolving speed The ratio between viscosity when viscosity is with 10 revs/min of revolving speed [(viscosity at 2.5 revs/min of revolving speed)/it is (viscous at 10 revs/min of revolving speed Degree)], i.e. thixotropic index be preferably 0.5~1.5, more preferably 0.8~1.2.When thixotropic index within the above range when, have Leg (Japanese: Off ィ レ ッ ト) formative when resin composition for encapsulating is used as underfill further increases Tendency.It should be noted that the viscosity and thixotropic index of resin composition for encapsulating can be by being suitable for each ingredient of selection Ratio of components is set as desired range.
It is 25 DEG C, 24 hours as the working life of index relevant to the storage stability of resin composition for encapsulating The rate of change in viscosity before and after storage under environment, is calculated by following formula.
Working life (%)=100 × [viscosity before (viscosity before viscosity-storage after storage)/storage]
The smaller expression storage stability of the numerical value of working life is higher, preferably 150% hereinafter, more preferably 130% hereinafter, Further preferably 100% or less.
[solidfied material]
The solidfied material of the disclosure is made of the resin composition for encapsulating solidification for the generation that will inhibit bleeding. Such as at 80 DEG C~165 DEG C heat treatment in 1 minute~150 minutes is carried out to resin composition for encapsulating and makes its solidification, by This can make solidfied material, as described later, solidfied material as the sealing material of encapsulated electronic components come using.
[electronic part apparatus]
The electronic part apparatus of the disclosure has: the substrate with circuit layer;Configuration on aforesaid substrate and with above-mentioned electricity The electronic component of road floor electrical connection;With the solidfied material for the disclosure configured in aforesaid substrate Yu the gap of above-mentioned electronic component.This Disclosed electronic part apparatus can use the resin composition for encapsulating encapsulated electronic components of the disclosure and obtain.Pass through utilization The resin composition for encapsulating of the disclosure carrys out encapsulated electronic components, the electronic part apparatus of the disclosure it is resistance to temperature cycling excellent It is different.
It as electronic part apparatus, can enumerate: in lead frame, the band carrier that wiring is completed, rigid wiring plate, flexible cloth Line plate, glass, silicon wafer etc., which have, carries semiconductor chip, transistor, diode, thyristor etc. on the substrate of circuit layer The electronic components such as the passive elements such as active component, capacitor, resistor, electric resistance array, coil, switch, and by necessary part Electronic part apparatus obtained by resin composition for encapsulating sealing with the disclosure etc..
As one of the object that can apply the disclosure, can especially enumerate in rigid wiring plate, flexible wiring board or glass On be formed by wiring on using convex block connection to semiconductor element progress flip-chip bond obtained by semiconductor device.As Specific example can enumerate flip-chip BGA (Ball Grid Array, ball grid array), LGA (Land Grid Array, plane Grid array), the electronic part apparatus such as COF (Chip On Film, pasting chip).
The resin composition for encapsulating of the disclosure is suitable as the underfill of flip-chip excellent in reliability. As the flip-chip field of the particularly suitable resin composition for encapsulating using the disclosure, just like lower component: connecting wiring base The convex block material of plate and semiconductor element is without using previous solder containing pb but uses the lead-free solders such as Sn-Ag-Cu system Flip-chip semiconductor component.For carrying out convex block company using lead-free solder more crisp compared with previous kupper solder in terms of physical property The resin composition for encapsulating of flip-chip obtained by connecing, the disclosure can also maintain good reliability.In addition, by chip When the wafer-level packages body such as level CSP is installed on substrate, by the resin composition for encapsulating of the application disclosure, may be implemented can By the raising of property.
[manufacturing method of electronic part apparatus]
The manufacturing method of the electronic part apparatus of the disclosure is included the substrate with circuit layer and is configured in above-mentioned base The process that the resin composition for encapsulating for the electronic component-use disclosure being electrically connected on plate and with foregoing circuit layer is sealed.
Using the resin composition for encapsulating of the disclosure to substrate and the work that is sealed of electronic component with circuit layer Sequence is not particularly limited.It can be mentioned, for example: rear injection mode, after connection electronic component and with the substrate of circuit layer, Resin composition for encapsulating is assigned using gap of the capillarity to electronic component and substrate, is then sealed with resin group Close the curing reaction of object;And first coating method, first to substrate and at least one of electronic component with circuit layer Surface assigns the resin composition for encapsulating of the disclosure, be thermally compressed and when electronic component being made to be connected to substrate, disposably Ground carries out the connection of electronic component and substrate and the curing reaction of resin composition for encapsulating.
As the adding method of resin composition for encapsulating, casting mode, the method for salary distribution, mode of printing etc. can be enumerated.
Condition of cure when resin composition for encapsulating as the gap for making to be imparted to electronic component and substrate solidifies, does not have It is particularly limited to, such as carries out heat treatment in 1 minute~150 minutes preferably at 80 DEG C~165 DEG C.
By using the resin composition for encapsulating of the disclosure, the generation that bleeding can be easily manufactured is inhibited The electronic part apparatus such as flip-chip fixing body.
Embodiment
Illustrate the present invention below based on embodiment, but the present invention is not limited by following embodiments.It should be noted that In embodiment below, part and % indicate mass parts and quality % in no special declaration.
(embodiment 1~14, comparative example 1)
Cooperate each ingredient in the way of becoming composition shown in table 1 and table 2, is carried out with triple-roller mill and vacuum mixing and kneading machine It is kneaded dispersion, thus makes the resin composition for encapsulating of embodiment 1~14 and comparative example 1.It should be noted that matching in table Conjunction unit is mass parts, and in addition "-" indicates " mismatching ".In addition, inorganic filling material in resin composition for encapsulating contains There is rate (quality %) by the use level of each ingredient to calculate.
As (A) epoxy resin, materials described below is prepared.
Epoxy resin 1: amine type epoxy resin (the Mitsubishi chemical Co., Ltd's system, trade name of the epoxy group with 3 functions " jER-630 ", epoxide equivalent 96g/eq, weight average molecular weight 290)
Epoxy resin 2: bisphenol f type epoxy resin (Nippon Steel & Sumitomo Metal Corporation's system, trade name " YDF- 8170C ", epoxide equivalent 160g/eq, weight average molecular weight 350)
As (B) specific curing agent, materials described below is prepared.
Amine hardener 1: diaminotoluene type amine hardener (Mitsubishi chemical Co., Ltd's system, trade name " jER Cure W”)
Amine hardener 2: tetramethyl triaminotriphenyl methane NH2 type amine hardener (Nippon Kayaku K. K's system, trade name " Kayahard-AA ")
As (C) phenoxy resin, materials described below is prepared.
Phenoxy resin 1: phenoxy resin (Mitsubishi chemical Co., Ltd's system, trade name with bisphenol A-type structure " 1001 ", weight average molecular weight 900)
Phenoxy resin 2: phenoxy resin (Mitsubishi chemical Co., Ltd's system, trade name with bisphenol A-type structure " 1007 ", weight average molecular weight 2900)
Phenoxy resin 3: phenoxy resin (Mitsubishi chemical Co., Ltd's system, trade name with bisphenol A-type structure " 1010 ", weight average molecular weight 5500)
Phenoxy resin 4: phenoxy resin (Mitsubishi chemical Co., Ltd's system, trade name with bisphenol A-type structure " 1256 ", weight average molecular weight 50,000)
Phenoxy resin 5: phenoxy resin (Nippon Steel & Sumitomo Metal Corporation's system, quotient with bisphenol-f type structure The name of an article " ZX-1356-2 ", weight average molecular weight 50,000)
As (D) inorganic filling material, materials described below is prepared.
Inorganic filling material 1: 0.5 μm of average grain diameter of the ball that processing is implemented with the silane compound with epoxy group Shape silica (Co., Ltd.'s Admatechs system, trade name " SE2200-SEJ ")
As colorant, carbon black (Mitsubishi chemical Co., Ltd's system, trade name " MA-100 ") is prepared.
For the resin composition for encapsulating for using above-mentioned material to obtain, the evaluation of each characteristic has been carried out as described below. In addition, showing each numerical value in table 1 below and table 2.
(1) mobility: viscosity and thixotropic index
For the viscosity (room temperature viscosity, Pas) at 25 DEG C of resin composition for encapsulating, with E type viscosimeter (cone angle 3 °, 10 revs/min of revolving speed) it is determined with sample size 2.5mL.In addition, the thixotropic index at 25 DEG C be set as 2.5 turns of revolving speed/ Minute when viscosity with 10 revs/min of revolving speed when the ratio between viscosity [(viscosity at 2.5 revs/min of revolving speed)/(10 revs/min of revolving speed Viscosity when clock)].
For the viscosity (Pas) at 110 DEG C, use rheometer AR2000 (aluminium cone 40mm, shear velocity 32.5/ second) It is determined with sample size 0.7mL.
(2) heat resistance: glass transition temperature (Tg) and thermal expansion coefficient (CTE)
By resin composition for encapsulating according at 150 DEG C 120 minutes condition solidify, thus make test film (φ 4mm × 20mm).For made test film, thermo-mechanical analysis device (TA Instrument Japan Co. Ltd. system, quotient are used Name of an article TMAQ400) according to load 15g, -50 DEG C of measuring temperature~220 DEG C and 5 DEG C/min of heating rate of condition measurement glass Change transition temperature (Tg) and thermal expansion coefficient (CTE).
The thermal expansion coefficient of Tg temperature range below is set as CTE1, by the thermal expansion coefficient of the temperature range of Tg or more It is set as CTE2.Tg and CTE indicates thermal stability, and Tg is preferably 100 DEG C~130 DEG C or so, and the CTE1 and CTE2 the low the more preferred.
(3) measurement of length is oozed out
Ar is carried out to solder resist substrate2Corona treatment (400W, 2 minutes) uses the sealing being filled in syringe Resin combination is with the needle of 25G to progress Ar2Spue 30mg on the solder resist substrate of corona treatment, is potted, Solidify 120 minutes at 150 DEG C.After solidification, with the length of optics measurement microscope exudation.Substrate was used respectively in FR-4 (day Vertical chemical conversion Co. Ltd. system, MRC-E-679) on be formed with (the Taiyo Ink Manufacturing Co., Ltd PSR- of solder resist 1 4000-AUS308) and the substrate of solder resist 2 (Taiyo Ink Manufacturing Co., Ltd PSR-4000-AUS703).With regard to two bases For plate, the exudation length the short the more preferred.
[table 1]
[table 2]
By the result of table 1 and table 2 it is found that the heat resistance and mobility of the resin composition for encapsulating of embodiment 1~14 are excellent It is different, and compared with the resin composition for encapsulating of comparative example 1, it oozes out short.It follows that the sealing resin group of the present embodiment The generation of bleeding can be inhibited in the state of maintaining high-fire resistance and high fluidity by closing object.
Whole documents, patent application and the technical standard recorded in this specification, with it is specific and respectively record each document, The case where patent application and technical standard, is introduced in this specification with degree as reference.

Claims (9)

1. a kind of resin composition for encapsulating, it includes (A) epoxy resin, (B) to have the curing agent of at least one amino, (C) tool There are the resin and (D) inorganic filling material of phenoxy group structure.
2. resin composition for encapsulating according to claim 1, wherein (C) has the resin of phenoxy group structure Weight average molecular weight MwIt is 500 or more and 100,000 or less.
3. resin composition for encapsulating according to claim 1, wherein (C) has the resin of phenoxy group structure Weight average molecular weight MwIt is 2,000 or more and 100,000 or less.
4. resin composition for encapsulating described in any one of according to claim 1~claim 3, wherein (C) has The resin of phenoxy group structure includes the following general formula (1) compound represented,
In general formula (1), A indicates structure shown in general formula (2), and end group B indicates group shown in hydroxyl or general formula (3);It is logical In formula (2), R1And R2Separately indicate hydrogen atom or methyl;N indicates 1~1000 integer;When the integer that n is 2 or more, 2 A above A is identical or different;2 end group B are identical or different.
5. resin composition for encapsulating described in any one of according to claim 1~claim 4, (C) has benzene oxygen The containing ratio of the resin of based structures is 0.05 mass of mass %~2.0 % relative to resin composition for encapsulating.
6. resin composition for encapsulating described in any one of according to claim 1~claim 5 is used for electronic component dress The sealing set.
7. a kind of solidfied material is to solidify resin composition for encapsulating described in any one of 1~claim 6 of claim Made of.
8. a kind of electronic part apparatus, has:
Substrate with circuit layer;
The electronic component that configuration is electrically connected on the substrate and with the circuit layer;With
Configure the solidfied material as claimed in claim 7 in the substrate and the gap of the electronic component.
9. a kind of manufacturing method of electronic part apparatus is included the substrate with circuit layer and is configured on the substrate And sealing resin described in any one of electronic component-use 1~claim 6 of claim being electrically connected with the circuit layer The process of composition sealing.
CN201680091380.1A 2016-12-07 2016-12-07 The manufacturing method of resin composition for encapsulating, solidfied material, electronic part apparatus and electronic part apparatus Pending CN110036070A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2016/086387 WO2018105057A1 (en) 2016-12-07 2016-12-07 Resin composition for sealing, cured product, electronic component device, and method for producing electronic component device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN202510074713.0A Division CN119823535A (en) 2016-12-07 Sealing resin composition, cured product, electronic component device, and method for manufacturing electronic component device

Publications (1)

Publication Number Publication Date
CN110036070A true CN110036070A (en) 2019-07-19

Family

ID=62491809

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680091380.1A Pending CN110036070A (en) 2016-12-07 2016-12-07 The manufacturing method of resin composition for encapsulating, solidfied material, electronic part apparatus and electronic part apparatus

Country Status (3)

Country Link
JP (2) JP6935803B2 (en)
CN (1) CN110036070A (en)
WO (1) WO2018105057A1 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5682814A (en) * 1979-12-10 1981-07-06 Hitachi Ltd Epoxy resin composition
JP2010010669A (en) * 2008-05-28 2010-01-14 Hitachi Chem Co Ltd Method of manufacturing semiconductor device, adhesive for sealing semiconductor, and semiconductor device
CN101903437A (en) * 2007-12-20 2010-12-01 日立化成工业株式会社 Film-like resin composition for encapsulation filling, method for manufacturing semiconductor package or semiconductor device using the same, and semiconductor device
CN102453340A (en) * 2010-10-21 2012-05-16 日立化成工业株式会社 Thermosetting resin composition for sealing packing of semiconductor, and semiconductor device

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0819723B1 (en) * 1996-02-02 2004-06-02 Toray Industries, Inc. Resin compositions for fiber-reinforced composite materials and processes for producing the same, prepregs, fiber-reinforced composite materials, and honeycomb structures
JP2000178342A (en) * 1998-12-17 2000-06-27 Sumitomo Bakelite Co Ltd Insulation paste
JP2000281747A (en) 1999-03-30 2000-10-10 Nippon Mitsubishi Oil Corp Epoxy resin composition for composite material
JP4206631B2 (en) * 2000-10-12 2009-01-14 住友ベークライト株式会社 Thermosetting liquid sealing resin composition, method for assembling semiconductor element, and semiconductor device
JP2006002138A (en) * 2004-05-18 2006-01-05 Shin Etsu Chem Co Ltd Liquid epoxy resin composition and semiconductor device
JP2008214548A (en) 2007-03-06 2008-09-18 Sumitomo Bakelite Co Ltd Liquid epoxy resin composition and semiconductor device using it
WO2010084939A1 (en) 2009-01-23 2010-07-29 味の素株式会社 Resin composition
JP5747763B2 (en) 2010-09-28 2015-07-15 東レ株式会社 Epoxy resin composition, prepreg and fiber reinforced composite material
JP2013222889A (en) * 2012-04-18 2013-10-28 Mitsubishi Chemicals Corp Interlayer filler composition for three-dimensional lamination type semiconductor device and coating liquid thereof
JP2014098055A (en) * 2012-11-13 2014-05-29 Sumitomo Bakelite Co Ltd Composition for forming insulating layer, film for forming insulating layer, and substrate
JP6656792B2 (en) 2014-03-28 2020-03-04 日立化成株式会社 Liquid resin composition for electronic component and electronic component device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5682814A (en) * 1979-12-10 1981-07-06 Hitachi Ltd Epoxy resin composition
CN101903437A (en) * 2007-12-20 2010-12-01 日立化成工业株式会社 Film-like resin composition for encapsulation filling, method for manufacturing semiconductor package or semiconductor device using the same, and semiconductor device
JP2010010669A (en) * 2008-05-28 2010-01-14 Hitachi Chem Co Ltd Method of manufacturing semiconductor device, adhesive for sealing semiconductor, and semiconductor device
CN102453340A (en) * 2010-10-21 2012-05-16 日立化成工业株式会社 Thermosetting resin composition for sealing packing of semiconductor, and semiconductor device

Also Published As

Publication number Publication date
JP7251583B2 (en) 2023-04-04
KR20190085016A (en) 2019-07-17
JPWO2018105057A1 (en) 2019-10-24
WO2018105057A1 (en) 2018-06-14
JP6935803B2 (en) 2021-09-15
JP2021185242A (en) 2021-12-09

Similar Documents

Publication Publication Date Title
TWI776809B (en) Liquid resin composition for sealing and electronic component device
CN109844020A (en) The manufacturing method of resin composition for encapsulating, electronic part apparatus and electronic part apparatus
KR20110095172A (en) Epoxy resin composition
JP6032593B2 (en) Liquid epoxy resin composition, composite member, and electronic component device
JP7521550B2 (en) Liquid resin composition for sealing and electronic component device
JP5593259B2 (en) Liquid epoxy resin composition
JP2008081686A (en) Liquid epoxy resin composition and semiconductor device using the same
KR102676681B1 (en) Resin composition for sealing, cured product, electronic component device, and manufacturing method of electronic component device
CN110036070A (en) The manufacturing method of resin composition for encapsulating, solidfied material, electronic part apparatus and electronic part apparatus
KR102794869B1 (en) Sealing resin composition, cured product, electronic component device and method for producing electronic component device
TWI873998B (en) Liquid resin composition for sealing and electronic component device
TWI811215B (en) Sealing resin composition, electronic component apparatus and manufacturing method for electronic component apparatus
JP5963131B2 (en) Liquid epoxy resin composition and semiconductor device
CN119823535A (en) Sealing resin composition, cured product, electronic component device, and method for manufacturing electronic component device
JP5723665B2 (en) Pre-feed type liquid semiconductor encapsulating resin composition
WO2024116693A1 (en) Resin composition, adhesive, sealing material, die attachment material, cured product and electronic device
JP2007254543A (en) One-pack type epoxy resin composition

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB02 Change of applicant information

Address after: Tokyo, Japan

Applicant after: Lishennoco Co.,Ltd.

Address before: Tokyo, Japan

Applicant before: Showa electrical materials Co.,Ltd.

Address after: Tokyo, Japan

Applicant after: Showa electrical materials Co.,Ltd.

Address before: Tokyo, Japan

Applicant before: HITACHI CHEMICAL Co.,Ltd.

CB02 Change of applicant information