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CN110034311B - Preparation method of bipolar plate and bipolar plate - Google Patents

Preparation method of bipolar plate and bipolar plate Download PDF

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Publication number
CN110034311B
CN110034311B CN201910272310.1A CN201910272310A CN110034311B CN 110034311 B CN110034311 B CN 110034311B CN 201910272310 A CN201910272310 A CN 201910272310A CN 110034311 B CN110034311 B CN 110034311B
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substrate
bipolar plate
colloid
thin film
groove
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CN110034311A (en
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李致朋
区定容
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Beijing zhuzineng Technology Co.,Ltd.
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Shenzhen Zhiyuan Power Technology Co ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B1/00—Devices without movable or flexible elements, e.g. microcapillary devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00523—Etching material
    • B81C1/00531—Dry etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00555—Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00—Fuel cells; Manufacture thereof
    • H01M8/02—Details
    • H01M8/0202—Collectors; Separators, e.g. bipolar separators; Interconnectors
    • H01M8/0258—Collectors; Separators, e.g. bipolar separators; Interconnectors characterised by the configuration of channels, e.g. by the flow field of the reactant or coolant
    • H01M8/026—Collectors; Separators, e.g. bipolar separators; Interconnectors characterised by the configuration of channels, e.g. by the flow field of the reactant or coolant characterised by grooves, e.g. their pitch or depth
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0323—Grooves
    • B81B2203/0338—Channels
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/50—Fuel cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Geometry (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Fuel Cell (AREA)

Abstract

The invention discloses a preparation method of a bipolar plate, which comprises the following steps: placing the baffle with the designed hollow pattern on the surface of the substrate in a fitting manner; bombarding the substrate by using reactive ion beams, and etching a groove on the substrate in a micron or nanometer level; withdrawing the baffle plate, and uniformly coating colloid on the surface of the substrate, wherein the colloid fills the groove; polishing and grinding the surface of the substrate to be flat, and removing the colloid residual layer higher than the surface of the substrate; depositing an electrode film on the surface of the substrate to form a sample; and sintering the sample, and removing the colloid in the groove to obtain the bipolar plate organically combined with the electrode. The invention adopts the method of baffle and reactive ion etching to etch the groove on the substrate, can realize the groove design of micron or nanometer level, increase the space energy density and volume density of the fuel cell, improve the space utilization rate and the like, and lead the all-solid-state thin film fuel cell with the groove structure to be more miniaturized; the bipolar plate and the electrode of the fuel cell can be organically combined, and the production process is integrated.

Description

Preparation method of bipolar plate and bipolar plate
Technical Field
The invention relates to a bipolar plate preparation technology of a fuel cell, in particular to a bipolar plate preparation method and a bipolar plate.
Background
The fuel cell is a power generation device which generates electricity by utilizing the chemical reaction of hydrogen and oxygen, is different from energy storage cells such as lithium batteries or other secondary batteries which are commonly used in the market, does not store energy, has high efficiency, is clean and complete in electrochemical reaction, does not generate harmful substances, is high-efficiency and clean energy power generation equipment, and is widely applied. Fuel cells are generally composed of an anode, a cathode and an electrolyte, and according to the difference of the electrolyte, the fuel cells can be classified into proton exchange membrane fuel cells, solid oxide fuel cells, molten carbonate fuel cells and the like, and currently, the fuel cells are widely distributed and most approach to the commercial market, namely, the proton exchange membrane fuel cells and the solid oxide fuel cells.
For two fuel cells, namely a proton exchange membrane fuel cell and a solid oxide fuel cell, the current generated by a fuel cell stack needs to be collected, so that a very important current collecting component, namely a bipolar plate, is involved. The bipolar plate not only needs to have the function of collecting current, but also needs to provide channels for the flow of fuel gas and reaction gas, so the bipolar plate is generally designed with grooves for the flow of gas. The bipolar plate on the market is generally directly used for the proton exchange membrane fuel cell, but because the proton exchange membrane fuel cell and the solid oxide fuel cell have different structures, especially the proton exchange membrane fuel cell adopts liquid electrolyte, and the solid oxide fuel cell adopts solid electrolyte, the requirements of the two on the structure and the manufacturing process of the bipolar plate are not consistent, so that the bipolar plate suitable for the proton exchange membrane fuel cell on the market may not be suitable for the solid oxide fuel cell. With the development of the solid oxide fuel cell, in order to improve the space utilization rate, increase the volume energy density and promote the miniaturization development of the solid oxide fuel cell, a part of the solid oxide fuel cell is developed into the all-solid-state thin film fuel cell, and in order to adapt to the miniaturization or miniaturization of the all-solid-state thin film fuel cell, the bipolar plate needs a more accurate and more tiny groove design, while the traditional groove etching method of the mask plate and chemical corrosion is only in a millimeter or even a centimeter level, and cannot reach a micrometer level or even a nanometer level, which is difficult to realize in the prior art. And the current all-solid-state thin film fuel cell also has the problem that the bipolar plate and the electrode can not be tightly combined.
Accordingly, the prior art is yet to be improved and developed.
Disclosure of Invention
The invention aims to provide a bipolar plate and a preparation method thereof, and aims to solve the problems that the bipolar plate with a micron-level groove structure and a nanometer-level groove structure cannot be accurately manufactured in the prior art, and the bipolar plate cannot be effectively combined with an electrode of a fuel cell.
In order to solve the problems, the technical scheme of the invention is as follows:
a method for preparing a bipolar plate comprises the following steps:
placing the baffle with the designed hollow pattern on the surface of the substrate in a fitting manner;
bombarding the substrate by using reactive ion beams, and etching a groove on the substrate in a micron or nanometer level;
withdrawing the baffle plate, and uniformly coating colloid on the surface of the substrate, wherein the colloid fills the groove;
polishing and grinding the surface of the substrate to be flat, and removing the colloid residual layer higher than the surface of the substrate; depositing an electrode film on the surface of the substrate to form a sample;
and sintering the sample, and removing the colloid in the groove to obtain the bipolar plate organically combined with the electrode.
The preparation method of the bipolar plate comprises the following steps of bombarding a substrate by using reactive ion beams, and etching a groove on the substrate in a micron or nanometer level:
the substrate is placed with a baffle plate in a reactive ion apparatus for providing a reactive ion beam.
The preparation method of the bipolar plate comprises the steps of polishing and grinding the surface of the substrate, and removing the colloid residual layer higher than the surface of the substrate by adopting a chemical mechanical polishing method.
The preparation method of the bipolar plate comprises the step of depositing an electrode film on the surface of a substrate to form a sample, wherein the electrode film is deposited by adopting one of a sputtering film deposition method, an evaporation film deposition method, a laser pulse film deposition method, a molecular beam epitaxy film deposition method or a plasma film deposition method.
The preparation method of the bipolar plate comprises the step of controlling the sintering temperature to be 800-1000 ℃.
The preparation method of the bipolar plate comprises the following steps that the hollow pattern of the baffle is in the scale range of micron or nanometer level; the colloid is one of high temperature resistant colloids such as SOC colloid, high temperature sealant, vulcanized high temperature silica gel, silicone colloid and the like.
The preparation method of the bipolar plate comprises the step of preparing a bipolar plate, wherein the substrate is one of a metal material substrate, a graphite material substrate or a composite material substrate.
The bipolar plate is prepared by the preparation method of the bipolar plate.
The cross section of the groove is one of a rectangle, a triangle, a trapezoid or an arc.
The bipolar plate is applied to an all-solid-state thin film fuel cell.
The beneficial effects of the invention include: according to the bipolar plate and the preparation method thereof, the substrate is subjected to groove etching by adopting a method of adding the baffle and reactive ion etching, so that the groove design of a micron or nanometer level can be realized, the space energy density and the volume density of the fuel cell are increased, the space utilization rate is improved, and the like, and the all-solid-state thin film fuel cell with the groove structure is more miniaturized; and the separated bipolar plate with the micro-nano groove structure and the electrode of the fuel cell can be organically combined, and the production process is integrated.
Drawings
FIG. 1 is a flow chart of a method of fabricating a bipolar plate according to the present invention.
FIG. 2 is a schematic cross-sectional view of a substrate in a step of etching the substrate by a reactive ion method according to a method of manufacturing a bipolar plate of the present invention.
FIG. 3 is a schematic cross-sectional view of a substrate after a step of sintering a sample to remove colloids in grooves to obtain a bipolar plate organically combined with an electrode according to a method of manufacturing a bipolar plate of the present invention.
Fig. 4 is a schematic cross-sectional view of a bipolar plate of example 1 of the present invention.
Fig. 5 is a plan view of a bipolar plate of example 1 of the present invention.
Fig. 6 is a schematic cross-sectional view of a bipolar plate of example 2 of the present invention.
Figure 7 is a schematic cross-sectional view of a bipolar plate of example 3 of the present invention.
Figure 8 is a schematic cross-sectional view of a bipolar plate of example 4 of this invention.
Description of reference numerals: 1. a substrate; 2. a baffle plate; 3. a trench; 4. and (3) an electrode film.
Detailed Description
The present invention provides a method for manufacturing a bipolar plate and a bipolar plate, and the present invention will be further described in detail below in order to make the objects, technical solutions, and effects of the present invention clearer and clearer. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
As shown in fig. 1, the present invention provides a method for preparing a bipolar plate, which specifically comprises the following steps:
step 100: placing the baffle with the designed hollow pattern on the surface of the substrate in a fitting manner;
step 200: bombarding the substrate by using reactive ion beams, and etching a groove on the substrate in a micron or nanometer level;
step 300: withdrawing the baffle plate, and uniformly coating colloid on the surface of the substrate, wherein the colloid fills the groove;
step 400: polishing and grinding the surface of the substrate to be flat, and removing the colloid residual layer higher than the surface of the substrate;
step 500: depositing an electrode film on the surface of the substrate to form a sample;
step 600: and sintering the sample, and removing the colloid in the groove to obtain the bipolar plate organically combined with the electrode.
As shown in fig. 2, the present invention uses Reactive Ion Etching (RIE) to etch the substrate 1, where the RIE uses chemically Reactive gases to generate chemically active radicals and ions, and the high-energy Reactive Ion beam accelerated by the electric field bombards the substrate 1, so that the surface of the substrate 1 is damaged, and a very small feature size can be obtained, thereby achieving the design of the trench 3 at micron or even nanometer level. Specifically, after a baffle 2 (mask, also referred to as a mask plate in industry) with a designed hollow pattern is attached to the surface of a substrate 1 and placed, the substrate 1 and the baffle 2 are placed in a reactive ion device, the reactive ion device provides reactive ion beams for bombarding the substrate 1, the reactive ion beams cut off chemical bonds of the surface material of the substrate 1 to form a groove 3 structure, then the baffle 2 is removed, and the substrate 1 is taken out to obtain the substrate 1 with the etched groove 3.
Further, as shown in fig. 3, after the grooves 3 are etched on the substrate 1, the method for manufacturing a bipolar plate of the present invention further needs to deposit the electrode thin film 4 on the surface of the substrate 1, so that the colloid that can be removed by a high temperature sintering method is uniformly coated on the surface of the substrate 1 in step 300, and in practical applications, the colloid may be one of high temperature resistant colloids such as SOC (Spin on Carbon, SOC for short, without chinese translation), high temperature sealant, high temperature vulcanized silica gel, silicone colloid, and the like, and the SOC colloid is preferred in practical applications. When the trenches 3 are uniformly filled with the glue, in addition to filling the trenches 3, also forms a residual layer on the surface of the substrate 1 that is higher than the surface of the substrate 1, therefore, it is necessary to polish and polish the surface of the substrate 1 by using a Chemical Mechanical Polishing (CMP), remove the colloid residual layer higher than the surface of the substrate 1, expose the substrate, the deposition of the electrode thin film 4 in the subsequent step 500 can be effectively performed, and there are various methods for depositing the electrode thin film 4, in practical applications, any one of a Sputtering film Deposition method (Sputtering), an evaporation film Deposition method, a Laser pulse film Deposition method (PLD), a Molecular Beam Epitaxy film Deposition Method (MBE), or a Plasma film Deposition method (Plasma Deposition) may be selected according to the electrode material. As shown in fig. 3, the electrode thin film 4 is uniformly deposited on the substrate 1, and is organically combined with the substrate 1, so as to lay the foundation for the subsequent preparation of the fuel cell.
After the substrate 1 and the electrode thin film 4 are organically integrated in step 500, the formed sample is placed into a high temperature furnace for sintering, wherein the sintering temperature is controlled at 800-1000 ℃, and is used for removing the colloid filled in the grooves 3, leaving the complete grooves 3 for the circulation of fuel gas and reaction gas, and thus obtaining the bipolar plate organically combined with the electrode thin film 4.
According to the bipolar plate manufactured by the preparation method of the bipolar plate, in the preparation process, the baffle 2 is made of an anti-reactive ion corrosion material, and the reactive ion beam at the part, which is not hollowed out, of the baffle 2 cannot penetrate through the baffle 2 to bombard the substrate 1, so that the grooves 3 with set patterns on the baffle 2 can be etched, the grooves 3 of different types can be designed by means of the shape of the hollowed-out patterns on the baffle 2, wherein the hollowed-out patterns of the baffle 2 are also in the scale range of micron or nanometer level; or the bombardment angle of the reactive ion beam is changed to obtain the groove 3 with different cross-sectional shapes. The grooves 3 are channels through which fuel gas and reaction gas of the fuel cell flow, and in practical application, the fuel gas and the reaction gas of the fuel cell enter from one end of the grooves 3, and are led out from the other end of the grooves to distribute the gas to corresponding electrodes for electrode reaction, and the grooves 3 of different types or different cross-sectional shapes influence the flow velocity and the resistance of the gas flow, so that the grooves 2 can be designed for the bipolar plate according to specific conditions.
[ example 1 ]
As shown in fig. 4, the cross-sectional shape of the grooves 3 of the bipolar plate in this embodiment is rectangular, and the top view thereof is shown in fig. 5, the bipolar plate in this embodiment is obtained by providing a plurality of parallel strip-shaped through holes on the baffle 2 during the preparation process and etching by reactive ion beam etching.
[ example 2 ]
The difference from embodiment 1 is that the bipolar plate in the present embodiment, in which the grooves 3 have a triangular cross-sectional shape as shown in fig. 6, is obtained by changing the bombardment angle of the reactive ion beam.
[ example 3 ]
The difference from embodiment 1 is that the bipolar plate in the present embodiment, in which the grooves 3 have a trapezoidal cross-sectional shape as shown in fig. 7, is obtained by changing the bombardment angle of the reactive ion beam.
[ example 4 ]
The difference from embodiment 1 is that the bipolar plate in this embodiment is obtained by changing the bombardment angle of the reactive ion beam, and as shown in fig. 8, the cross-sectional shape of the grooves 3 of the bipolar plate in this embodiment is a circular arc.
In practical application, the substrate 1 of the bipolar plate manufactured by the method for manufacturing the bipolar plate is one of a metal material substrate, a graphite material substrate or a composite material substrate, the metal material substrate has good electric and thermal conductivity and certain strength, and is preferably the metal material substrate. In practical application, the bipolar plate of the invention is applied to all-solid-state thin film fuel cells.
According to the bipolar plate and the preparation method thereof, the substrate is subjected to groove etching by adopting a method of adding the baffle and reactive ion etching, so that the groove design with higher resolution at a micron or nanometer level can be realized, the space energy density and the volume density of the fuel cell are increased, the space utilization rate is improved, and the like, and the all-solid-state thin film fuel cell with the bipolar plate with the groove structure is more miniaturized; the discrete fuel cell electrode and the bipolar plate with the micro-nano groove structure can be organically combined, the production process is integrated, and the high-efficiency production is realized.
It is to be understood that the invention is not limited to the examples described above, but that modifications and variations may be effected thereto by those of ordinary skill in the art in light of the foregoing description, and that all such modifications and variations are intended to be within the scope of the invention as defined by the appended claims.

Claims (7)

1. A preparation method of a bipolar plate is characterized in that the bipolar plate is applied to an all-solid-state thin film fuel cell and comprises the following steps:
placing the baffle with the designed hollow pattern on the surface of the substrate in a fitting manner;
bombarding the substrate by using reactive ion beams, and etching a groove on the substrate in a micron or nanometer level;
withdrawing the baffle plate, and uniformly coating colloid on the surface of the substrate, wherein the colloid fills the groove;
polishing and grinding the surface of the substrate to be flat, and removing the colloid residual layer higher than the surface of the substrate;
depositing an electrode film on the surface of the substrate to form a sample;
sintering the sample, and removing the colloid in the groove to obtain the bipolar plate organically combined with the electrode; the hollow pattern of the baffle is in the scale range of micron or nanometer level; the colloid is one of Spin On Carbon colloid and silicone colloid; the substrate is one of a metal material substrate and a graphite material substrate.
2. The method for preparing a bipolar plate as claimed in claim 1, wherein the step of bombarding the substrate with the reactive ion beam to etch the trench on a micro or nano scale on the substrate comprises the steps of:
the substrate is placed with a baffle plate in a reactive ion apparatus for providing a reactive ion beam.
3. The method of claim 1, wherein the step of polishing and grinding the surface of the substrate to remove the colloid residue layer higher than the surface of the substrate is a chemical mechanical polishing method.
4. The method of manufacturing a bipolar plate as claimed in claim 1, wherein the step of depositing an electrode thin film on the surface of the substrate to form the sample deposits the electrode thin film by one of a sputtering thin film deposition method, an evaporation thin film deposition method, a laser pulse thin film deposition method, a molecular beam epitaxy thin film deposition method, or a plasma thin film deposition method.
5. The method of claim 1, wherein the sintering temperature is controlled to be 800-1000 ℃.
6. A bipolar plate, which is applied to an all-solid-state thin film fuel cell, and which is manufactured by the method of manufacturing a bipolar plate according to any one of claims 1 to 5.
7. The bipolar plate of claim 6, wherein the grooves have a cross-sectional shape of one of a rectangle, a triangle, a trapezoid, or a circular arc.
CN201910272310.1A 2019-04-04 2019-04-04 Preparation method of bipolar plate and bipolar plate Active CN110034311B (en)

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CN111230315B (en) * 2020-01-18 2021-11-19 温州大学 Processing device and processing method for special-shaped section complex flow field bipolar plate

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1636296A (en) * 2000-11-28 2005-07-06 日产自动车株式会社 Solid oxide fuel cell stack and method of manufacturing the same
CN1822422A (en) * 2000-11-27 2006-08-23 日产自动车株式会社 Single cell for fuel cell and solid oxide fuel cell, cell plate and solid fuel cell
CN105551939A (en) * 2015-12-29 2016-05-04 北京大学 Self-assembly preparation method for III-V-nitride composite substrate with hollow cavity
CN107836060A (en) * 2015-05-22 2018-03-23 南洋理工大学 Energy conversion device and the method for forming it
CN207426020U (en) * 2017-11-29 2018-05-29 吕伟 A kind of ultra-thin metal bipolar plate and the fuel cell for including it

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9808524D0 (en) * 1998-04-23 1998-06-17 British Gas Plc Fuel cell flow-field structure formed by layer deposition
EP1258937A1 (en) * 2001-05-17 2002-11-20 STMicroelectronics S.r.l. Micro silicon fuel cell, method of fabrication and self-powered semiconductor device integrating a micro fuel cell
US8557480B2 (en) * 2009-08-26 2013-10-15 Lawrence Livermore National Security, Llc High power density fuel cell comprising an array of microchannels

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1822422A (en) * 2000-11-27 2006-08-23 日产自动车株式会社 Single cell for fuel cell and solid oxide fuel cell, cell plate and solid fuel cell
CN1636296A (en) * 2000-11-28 2005-07-06 日产自动车株式会社 Solid oxide fuel cell stack and method of manufacturing the same
CN107836060A (en) * 2015-05-22 2018-03-23 南洋理工大学 Energy conversion device and the method for forming it
CN105551939A (en) * 2015-12-29 2016-05-04 北京大学 Self-assembly preparation method for III-V-nitride composite substrate with hollow cavity
CN207426020U (en) * 2017-11-29 2018-05-29 吕伟 A kind of ultra-thin metal bipolar plate and the fuel cell for including it

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