CN110004425B - Winding type ion enhanced magnetic control optical silicon oxide coating device and method - Google Patents
Winding type ion enhanced magnetic control optical silicon oxide coating device and method Download PDFInfo
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- CN110004425B CN110004425B CN201910292302.3A CN201910292302A CN110004425B CN 110004425 B CN110004425 B CN 110004425B CN 201910292302 A CN201910292302 A CN 201910292302A CN 110004425 B CN110004425 B CN 110004425B
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- 238000000576 coating method Methods 0.000 title claims abstract description 94
- 239000011248 coating agent Substances 0.000 title claims abstract description 88
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 68
- 229910052814 silicon oxide Inorganic materials 0.000 title claims abstract description 60
- 238000004804 winding Methods 0.000 title claims abstract description 32
- 230000003287 optical effect Effects 0.000 title claims abstract description 25
- 150000002500 ions Chemical class 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims abstract description 18
- 230000003647 oxidation Effects 0.000 claims abstract description 64
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 64
- 239000001301 oxygen Substances 0.000 claims abstract description 50
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 50
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 30
- -1 oxygen ions Chemical class 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 23
- 239000010703 silicon Substances 0.000 claims abstract description 23
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 22
- 230000009471 action Effects 0.000 claims abstract description 21
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 21
- 230000005684 electric field Effects 0.000 claims abstract description 19
- 229910052786 argon Inorganic materials 0.000 claims abstract description 15
- 230000007246 mechanism Effects 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 18
- 238000005192 partition Methods 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 239000007888 film coating Substances 0.000 claims description 2
- 238000009501 film coating Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 33
- 230000008569 process Effects 0.000 description 8
- 238000009434 installation Methods 0.000 description 5
- 210000002381 plasma Anatomy 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 229910000484 niobium oxide Inorganic materials 0.000 description 3
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/351—Sputtering by application of a magnetic field, e.g. magnetron sputtering using a magnetic field in close vicinity to the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
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- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a winding type ion enhanced magnetic control optical coating device and a method, wherein the device comprises a rotating roller and at least one coating chamber, an oxidation chamber and a magnet assembly are arranged behind the coating chamber along the conveying direction of a substrate, and the oxidation chamber and the magnet assembly are oppositely arranged on two sides of the rotating roller; an air inlet pipe is arranged in the oxidation chamber, and a battery is connected between the air inlet pipe and the rotating roller. The method comprises the steps that a substrate passes through a coating chamber, and a silicon oxide film layer is coated under the action of a pure silicon target; then the oxygen molecules and the argon molecules in the oxidation chamber generate a large amount of oxygen ions under the action of an electric field and a magnetic field, and the oxygen ions are ejected into the silicon oxide film layer at a high speed under the action of the electric field to oxidize pure silicon mixed in the silicon oxide film layer. According to the invention, after the substrate is plated with the silicon oxide, the oxidation effect of the film layer is enhanced by increasing the density of oxygen ions, so that the purity and transparency of the silicon oxide in the film layer are improved, and further the optical performance of the film layer is improved.
Description
Technical Field
The invention relates to the technical field of vacuum coating, in particular to a winding type ion-enhanced magnetic control optical silicon oxide coating device and method.
Background
In the field of vacuum coating, a winding type magnetic control optical coating machine is generally used for coating films such as silicon oxide, niobium oxide and the like. When silicon oxide is plated, a pure silicon target is mostly adopted, and niobium oxide is mostly plated by a niobium oxide target. Therefore, when silicon oxide is plated, argon and oxygen are filled into the vacuum chamber, wherein the oxygen is used for oxidizing sputtered silicon ions to form silicon oxide and then plating the silicon oxide.
In order to overcome the above problems, in the current coating process, there are methods of increasing the oxidation rate of silicon by adding an anode ion source on a target material and methods of increasing the oxidation rate of silicon by using a radio frequency ion source, but the improvement effects are very limited, the equipment structure is complicated, the equipment cost is high, and the control of the substrate coating cost is not facilitated.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a winding type ion-enhanced magnetic control optical silicon oxide coating device, which enhances the oxidation effect of a film layer by increasing the density of oxygen ions after a substrate is coated with silicon oxide, so that the purity and transparency of the silicon oxide in the film layer are improved, and the optical performance of the film layer is further improved.
The invention also aims to provide a winding type ion-enhanced magnetic control optical silicon oxide coating method realized by the device.
The technical scheme of the invention is as follows: a winding type ion enhanced magnetic control optical silicon oxide coating device comprises a rotating roller and at least one coating chamber arranged on the outer side of the rotating roller, wherein an oxidation chamber and a magnet assembly are arranged behind the coating chamber along the conveying direction of a base material, the oxidation chamber and the magnet assembly are oppositely arranged on two sides of the rotating roller, the oxidation chamber and the coating chamber are connected and arranged on the outer side of the rotating roller in parallel, and the magnet assembly is arranged on the inner side of the rotating roller; an air inlet pipe is arranged in the oxidation chamber, and a battery is connected between the air inlet pipe and the rotating roller. Wherein, the specific structure in the coating chamber can adopt the same structure as that of the traditional coating equipment, a group of intermediate frequency magnetic control rotating targets are arranged in the coating chamber, the intermediate frequency magnetic control rotating targets are pure silicon targets, the coating chamber utilizes the pure silicon targets to coat the substrate to primarily form a silicon oxide film layer, but pure silicon is mixed in the silicon oxide film layer at the moment, therefore, the substrate with the silicon oxide film layer is sent into the oxidation chamber, oxygen and argon are introduced into a gas inlet pipe in the oxidation chamber (the specific proportion can be actually set according to the process requirements, the content of general oxygen is more than that of argon), the magnetic field generated by a magnet assembly and the electric field generated by a battery are utilized, oxygen molecules and argon molecules generate oxygen ions under the magnetic collision of electrons, the oxygen ions and the electrons form higher-density oxygen plasmas in the range of the annular magnetic field under the constraint of the magnetic field, and simultaneously, under the action of the electric field, the oxygen ions are emitted into the silicon oxide film layer at a certain quantity and high speed, and the oxidation of silicon molecules in the film layer is accelerated. The rotary roller is a water-cooling coating roller, the middle part of the rotary roller is provided with a water-cooling sleeve, and the specific structure of the rotary roller is the same as that of a coating roller in the traditional coating equipment.
When a plurality of coating chambers are arranged outside the rotating roller, an oxidation chamber is arranged behind each coating chamber along the conveying direction of the base material. The number of the coating chambers is set according to the actual process requirement of the substrate, but the substrate is required to be further oxidized by at least one oxidation chamber after being coated once by the coating chambers, so as to ensure the oxidation effect of the silicon oxide film layer.
The magnet assembly comprises a magnet fixing ring and a plurality of magnets, the magnet fixing ring is arranged in the rotary roller and is of a fixed structure, the magnet fixing ring does not rotate along with the rotary roller, and the magnets are fixedly arranged on the magnet fixing ring. When the oxidation chambers are multiple, each oxidation chamber corresponds to one group of magnets, but only one magnet fixing ring is arranged, and multiple groups of magnets are distributed on the periphery of the magnet fixing ring.
In order to better install and fix the magnets, in the magnet assembly, at the installation position of the magnets, the periphery of the magnet fixing ring extends outwards to form an installation bracket, and each magnet is fixedly installed on the installation bracket.
In the magnet assembly, the polarities of the end parts facing the oxidation chamber between any two adjacent magnets are opposite.
Among the magnet subassembly, the magnet retainer plate is the cylindric structure that the diameter is less than rotatory roller internal diameter, and the installing support is for lieing in the long structure of magnet retainer plate periphery or by a plurality of block structures of discontinuous constitution.
During installation, the two ends of the magnet fixing ring can be directly installed on the frame of the coating device or the inner wall of the vacuum chamber, and the operation of the base material and the rotating roller is not affected. According to the actual situation of the coating device, the magnet can be fixed on the mounting bracket by adopting the modes of welding fixation, bolt locking fixation, clamping fixation and the like.
The positive pole of battery is connected with rotatory roller, and the negative pole of battery is connected with the intake pipe. An electric field is formed between the air inlet pipe and the periphery of the rotating roller, and under the action of a magnetic field generated by the magnet assembly, oxygen molecules and argon molecules generate oxygen ions under the magnetic collision of electrons, and the oxygen ions and the electrons form high-density oxygen plasma in the range of the annular magnetic field under the constraint of the magnetic field; meanwhile, under the action of the electric field, oxygen ions can be ejected to the interior of the silicon oxide film layer on the surface of the base material at a high speed.
Preferably, the voltage of the battery is 200-400V.
The coating device is a winding type integrated machine, the interior of the coating device is an integral vacuum chamber, the middle part of the vacuum chamber is provided with a rotating roller, one side of the rotating roller is provided with an unwinding mechanism and a winding mechanism, the space on the other side of the rotating roller is divided into a coating chamber and an oxidation chamber through a plurality of partition plates, and a substrate channel is reserved between each partition plate and the outer surface of the rotating roller; after being discharged by the unwinding mechanism, the base material rotates around the rotating roller and is wound by the winding mechanism after passing through the coating chamber and the oxidation chamber. The unwinding mechanism mainly comprises an unwinding roller, a guide roller and a tension roller, the winding mechanism mainly comprises a winding roller, a guide roller and a tension roller, the unwinding roller emits a base material, the base material enters the rotating roller under the guide of the guide roller and the tension roller, the rotating roller drives the base material to be coated and oxidized, and after the processing is finished, the winding roller winds the base material under the guide of the guide roller and the tension roller.
In the coating device, each coating chamber and each oxidation chamber are respectively and independently provided with a molecular pump, and the vacuum degree of the corresponding coating chamber or oxidation chamber can be independently adjusted according to the actual process requirements.
The invention realizes a winding type ion enhanced magnetic control optical silicon oxide coating method according to the device, which comprises the following steps: the base material is conveyed along with the rotation of the rotating roller, passes through the coating chamber, and is coated with a silicon oxide film layer under the action of a pure silicon target; then the oxygen molecules and the argon molecules in the oxidation chamber generate a large amount of oxygen ions under the action of an electric field and a magnetic field, and the oxygen ions are ejected into the silicon oxide film layer at a high speed under the action of the electric field to oxidize pure silicon mixed in the silicon oxide film layer, so that the content of the silicon oxide in the silicon oxide film layer is improved.
When the winding type ion enhanced magnetic control optical silicon oxide coating device and the method are used, the principle is as follows: in the coating device, a substrate and a water-cooled coating roller (namely the rotating roller) rotate together, firstly pass through a coating chamber, a silicon oxide film layer is coated on the substrate by a magnetic control coating pure silicon target, and then pass through a high oxygen ion enhancement area of the oxidation chamber to further oxidize pure silicon mixed with silicon oxide in the film layer, so that the silicon oxide film layer of the coating layer is purer; in the oxidation chamber, oxygen and argon are sprayed out through an air inlet pipe, oxygen ions are generated by oxygen molecules and argon molecules under the magnetic collision of electrons under the combined action of an electric field and a magnetic field, the oxygen ions and the electrons form high-density oxygen plasmas in the range of a circular magnetic field under the constraint of the magnetic field, and meanwhile, the oxygen ions are sprayed into the silicon oxide film layer at a high speed in a certain quantity under the action of the electric field to accelerate the oxidation of silicon molecules in the film layer.
Compared with the prior art, the invention has the following beneficial effects:
the winding type ion enhanced magnetic control optical silicon oxide coating device and the method enhance the oxidation effect of the film layer by adding an oxidation process in the coating process and increasing the oxygen ion density by utilizing the combined action of an electric field and a magnetic field, thereby improving the purity and transparency of the silicon oxide in the film layer and further improving the optical performance of the film layer.
In the winding type ion enhanced magnetic control optical silicon oxide coating device, the excitation and emission of oxygen ions are realized by arranging the oxidation chamber and the matched magnet assembly, the structure is simple, the equipment cost of the coating device is low, and the cost control of the coating process is facilitated.
In the winding type ion enhanced magnetic control optical silicon oxide coating device, the number of the coating chambers, the number of the oxidation chambers and the number of the magnet assemblies can be adjusted according to the actual process requirements of the base material, and the device is flexible and convenient to use.
Drawings
FIG. 1 is a schematic view of the overall structure of the winding-type ion-enhanced magnetron optical silica coating apparatus.
FIG. 2 is a schematic view of a portion of the coating chamber and oxidation chamber of FIG. 1.
FIG. 3 is a schematic diagram of the higher density oxygen ion formation in the oxidation chamber.
Detailed Description
The present invention will be described in further detail with reference to examples, but the embodiments of the present invention are not limited thereto.
Example 1
In the embodiment, as shown in fig. 1, the coating device is a winding-type integrated machine, the interior of the coating device is an integrated vacuum chamber, a rotating roller 1 is arranged in the middle of the vacuum chamber, an unwinding mechanism and a winding mechanism are arranged above the rotating roller, a space below the rotating roller is divided into a coating chamber 2 and an oxidation chamber 3 by a plurality of partition plates 5, and a substrate channel 6 is reserved between each partition plate and the outer surface of the rotating roller; along the conveying direction (as shown by arrows in the figure) of the substrate 8, an oxidation chamber 3 and a magnet assembly 4 are further arranged behind each coating chamber, the oxidation chamber and the magnet assembly are oppositely arranged on two sides of the rotating roller, the oxidation chamber and the coating chambers are connected and arranged on the outer side of the rotating roller in parallel, and the magnet assembly is arranged on the inner side of the rotating roller; an air inlet pipe 7 is arranged in the oxidation chamber, and a battery is connected between the air inlet pipe and the rotating roller.
As shown in fig. 2 or fig. 3, the magnet assembly includes a magnet fixing ring 4-1 and a plurality of magnets 4-2, the magnet fixing ring has a mounting bracket 4-3 extending outward from the outer periphery thereof, the magnet fixing ring is disposed in the rotary roller, the magnet fixing ring is of a fixed structure and does not rotate along with the rotary roller, and the plurality of magnets are fixedly mounted on the magnet fixing ring through the mounting bracket. When the oxidation chambers are multiple, each oxidation chamber corresponds to one group of magnets, but only one magnet fixing ring is arranged, and multiple groups of magnets are distributed on the periphery of the magnet fixing ring. In the magnet assembly, the polarities of the end parts facing the oxidation chamber are opposite between any two adjacent magnets. The magnet fixing ring is of a cylindrical structure with the diameter smaller than the inner diameter of the rotating roller, and the mounting bracket is of a long strip structure positioned on the periphery of the magnet fixing ring or consists of a plurality of discontinuous block structures (selected according to the actual requirement of the film coating device). During installation, the two ends of the magnet fixing ring can be directly installed on the frame of the coating device or the inner wall of the vacuum chamber, and the operation of the base material and the rotating roller is not affected. According to the actual situation of the coating device, the magnet can be fixed on the mounting bracket by adopting the modes of welding fixation, bolt locking fixation, clamping fixation and the like.
As shown in FIG. 3, the voltage of the battery is 200-400V. The anode of the battery is connected with the rotating roller, and the cathode of the battery is connected with the air inlet pipe. An electric field is formed between the air inlet pipe and the periphery of the rotating roller, and under the action of a magnetic field generated by the magnet assembly, oxygen molecules and argon molecules generate oxygen ions under the magnetic collision of electrons, and the oxygen ions and the electrons form high-density oxygen plasma in the range of the annular magnetic field under the constraint of the magnetic field; meanwhile, under the action of the electric field, oxygen ions can be ejected to the interior of the silicon oxide film layer on the surface of the base material at a high speed.
In the coating device, each coating chamber and each oxidation chamber are respectively and independently provided with the molecular pump 9, and the vacuum degree of the corresponding coating chamber or oxidation chamber can be independently adjusted according to the actual process requirement. The unwinding mechanism mainly comprises an unwinding roller 10, a guide roller 11 and a tension roller 12, the winding mechanism mainly comprises a winding roller 13, a guide roller and a tension roller, after the unwinding roller discharges a base material, the base material enters the rotating roller under the guide of the guide roller and the tension roller, the rotating roller drives the base material to be coated and oxidized, and after the processing is completed, the winding mechanism is wound by the winding roller under the guide of the guide roller and the tension roller. The specific structure in the coating chamber can adopt the same structure as that of the traditional coating equipment, a group of medium-frequency magnetic control rotating targets 14 are arranged in the coating chamber, the medium-frequency magnetic control rotating targets are pure silicon targets, the coating chamber utilizes the pure silicon targets to coat the substrate to primarily form a silicon oxide film layer, but pure silicon is mixed in the silicon oxide film layer at the moment, therefore, the substrate with the silicon oxide film layer is sent into the oxidation chamber, oxygen and argon are introduced into a gas inlet pipe in the oxidation chamber (the specific proportion can be actually set according to the process requirements, the content of general oxygen is more than that of argon), the magnetic field generated by a magnet assembly and the electric field generated by a battery are utilized, oxygen molecules and argon molecules generate oxygen ions under the magnetic collision of electrons, the oxygen ions and the electrons form higher-density oxygen plasmas in the range of the annular magnetic field under the constraint of the magnetic field, and simultaneously under the action of the electric field, the oxygen ions are emitted into the silicon oxide film layer at a certain quantity and high speed, and the oxidation of silicon molecules in the film layer is accelerated. The rotary roller is a water-cooling coating roller, the middle part of the rotary roller is provided with a water-cooling sleeve 1-1, and the specific structure of the rotary roller is the same as that of a coating roller in the traditional coating equipment. The number of the coating chambers is set according to the actual process requirement of the substrate, but the substrate is required to be further oxidized by at least one oxidation chamber after being coated once by the coating chambers, so as to ensure the oxidation effect of the silicon oxide film layer.
In this embodiment, the above device is used to implement a winding type ion-enhanced magnetic control optical silicon oxide coating method, which specifically includes: after the substrate is discharged from the unwinding mechanism, the substrate is conveyed along with the rotation of the rotating roller, and passes through a coating chamber to be coated with a silicon oxide film layer under the action of a pure silicon target; then the oxygen molecules and the argon molecules in the oxidation chamber generate a large amount of oxygen ions under the action of an electric field and a magnetic field, and the oxygen ions are ejected into the silicon oxide film layer at a high speed under the action of the electric field to oxidize pure silicon mixed in the silicon oxide film layer, so that the content of the silicon oxide in the silicon oxide film layer is improved. And the substrate after further oxidation is rolled by a rolling mechanism.
Example 2
This example is different from example 1 in that only one coating chamber and one oxidation chamber are provided in the coating apparatus, and the oxidation chamber is located behind the coating chamber in the substrate transport direction.
Example 3
Compared with the embodiment 1, the winding type ion enhanced magnetic control optical silicon oxide coating device is different in that the unwinding mechanism and the winding mechanism are arranged on the left side of the rotating roller, and the space on the right side of the rotating roller is divided into a coating chamber and an oxidation chamber through a plurality of partition plates.
As mentioned above, the present invention can be better realized, and the above embodiments are only preferred embodiments of the present invention, and are not intended to limit the scope of the present invention; all equivalent changes and modifications made according to the present disclosure are intended to be covered by the scope of the claims of the present invention.
Claims (9)
1. A winding type ion-enhanced magnetic control optical silicon oxide coating device comprises a rotating roller and at least one coating chamber arranged on the outer side of the rotating roller, and is characterized in that an oxidation chamber and a magnet assembly are further arranged behind the coating chamber along the conveying direction of a base material, the oxidation chamber and the magnet assembly are oppositely arranged on two sides of the rotating roller, the oxidation chamber and the coating chamber are connected and arranged on the outer side of the rotating roller in parallel, and the magnet assembly is arranged on the inner side of the rotating roller; an air inlet pipe is arranged in the oxidation chamber, and a battery is connected between the air inlet pipe and the rotating roller;
the magnet assembly comprises a magnet fixing ring and a plurality of magnets, the magnet fixing ring is arranged in the rotary roller and is of a fixed structure, the magnet fixing ring does not rotate along with the rotary roller, and the magnets are fixedly arranged on the magnet fixing ring.
2. The apparatus of claim 1, wherein the plurality of coating chambers are disposed outside the rotating roll, and an oxidation chamber is disposed behind each coating chamber in a direction of substrate transport.
3. A coiled ion-enhanced magnetron optical silica coating apparatus as claimed in claim 1, wherein the magnet assembly has a magnet fixing ring with a mounting bracket extending outward from the outer periphery thereof at the location where the magnets are mounted, and each magnet is fixedly mounted on the mounting bracket.
4. The apparatus of claim 1, wherein the polarity of the end of the magnet assembly facing the oxidation chamber is opposite between any two adjacent magnets.
5. A coiled ion-enhanced magnetron optical silica coating apparatus as claimed in claim 1, wherein the magnet assembly comprises a magnet fixing ring having a cylindrical shape with a diameter smaller than the inner diameter of the rotating roller, and a mounting bracket having a strip shape or consisting of a plurality of discontinuous block-shaped structures is disposed on the outer periphery of the magnet fixing ring.
6. A coiled ion-enhanced magnetron optical silica coating apparatus as claimed in claim 1, wherein the anode of the battery is connected to the rotating roller and the cathode of the battery is connected to the air inlet pipe.
7. The apparatus of claim 1, wherein the voltage of the battery is 200-400V.
8. The winding type ion-enhanced magnetic control optical silicon oxide coating device according to claim 1, wherein the coating device is a winding type all-in-one machine, the interior of the coating device is an integral vacuum chamber, a rotating roller is arranged in the middle of the vacuum chamber, an unwinding mechanism and a winding mechanism are arranged on one side of the rotating roller, the space on the other side of the rotating roller is divided into a coating chamber and an oxidation chamber through a plurality of partition plates, and a substrate channel is reserved between each partition plate and the outer surface of the rotating roller; after being discharged by the unwinding mechanism, the base material rotates around the rotating roller and is wound by the winding mechanism after passing through the coating chamber and the oxidation chamber.
9. A method for coating a coiled ion-enhanced magnetic control optical silicon oxide film is realized according to any one of claims 1 to 8, and is characterized in that a substrate is conveyed along with the rotation of a rotating roller, passes through a film coating chamber and is coated with a silicon oxide film layer under the action of a pure silicon target; then the oxygen molecules and the argon molecules in the oxidation chamber generate a large amount of oxygen ions under the action of an electric field and a magnetic field, and the oxygen ions are ejected into the silicon oxide film layer at a high speed under the action of the electric field to oxidize pure silicon mixed in the silicon oxide film layer, so that the content of the silicon oxide in the silicon oxide film layer is improved.
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