CN109996431A - High-performance shield glass and preparation method thereof - Google Patents
High-performance shield glass and preparation method thereof Download PDFInfo
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- CN109996431A CN109996431A CN201910368836.XA CN201910368836A CN109996431A CN 109996431 A CN109996431 A CN 109996431A CN 201910368836 A CN201910368836 A CN 201910368836A CN 109996431 A CN109996431 A CN 109996431A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/40—Layered products comprising a layer of synthetic resin comprising polyurethanes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/02—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
- H05K9/0088—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a plurality of shielding layers; combining different shielding material structure
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2262/00—Composition or structural features of fibres which form a fibrous or filamentary layer or are present as additives
- B32B2262/10—Inorganic fibres
- B32B2262/103—Metal fibres
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/212—Electromagnetic interference shielding
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- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Abstract
The present invention relates to a kind of high-performance shield glass and preparation method thereof, and it is multi-layer compound structure which, which includes: glass body,；Magnetic layer is set in glass body, and in wherein one or more layers structure being located in multi-layer compound structure；Nanoscale electro-magnetic screen layer, is set in glass body, and in wherein one or more layers structure being located in multi-layer compound structure, and nanoscale electro-magnetic screen layer is the unordered irregular silver-colored grid of nanoscale；Conductive layer is set in glass body, and in wherein one or more layers structure being located in multi-layer compound structure；And flexible metal net, one end are connect with magnetic layer, nanoscale electro-magnetic screen layer and conductive layer, the other end of flexible metal net is for the external connection with glass body.High-performance shield glass of the invention is strong to the shielding protection ability of electromagnetic field, and shielding frequency range is extensive；Meanwhile nanoscale electro-magnetic screen layer additionally uses unordered irregular grid figure, will not generate moire fringes under strong light.
Description
Technical field
The present invention relates to a kind of shield glass, more particularly to a kind of high-performance shield glass and preparation method thereof.
Background technique
Electromagnetic wave is the major way that electromagnetic energy is propagated, when high-frequency circuit works, the outside radiated electromagnetic wave of meeting, to neighbouring
Other equipment generate interference.On the other hand, the various electromagnetic waves in space can also sense in circuit, interfere to circuit.
Electromagnetic shielding is that electromagnetic wave is confined to a kind of some region of method by metal shield, and electromagnetic shielding is in electronics, communication etc.
The application demand in field is extensive.
The manufacture of high-strength electromagnetic shielding glass usually requires the shield effectiveness of electromagnetic wave frequency range according to demand to be set
Meter, but it is 0.3-18GHz that the electromagnetic shielding glass of the prior art, which protects stronger frequency range, shield effectiveness is >=40dB.
In the implementation of the present invention, the inventor finds that the existing technology has at least the following problems:
1, the electromagnetic shielding glass of the prior art is insufficient to the protective benefits of 0.01-300MHz frequency range, 18-40GHz frequency range；
2, the electromagnetic shielding glass of the prior art is usually that micro-nano grid is made for etching, and line width is 0.5-15 μm, line width
Range is larger, and grid is regular figure, is also easy to produce moire fringes under strong light, influences the visual experience of observer, generates to observer
Dizziness, the serious negative impression such as dimness of vision；
3, simultaneously, the substrate of micro-nano grid is flexible material, and the exposed use of the flexible material, and environment resistance can be compared with
Difference, visual deformation after bending are serious；
4, in addition, the electromagnetic shielding glass of the prior art it is usual by one layer of electro-magnetic screen layer as electromagnetic protection, electromagnetism
The metal material of shielded layer is more single, poor to the protective performance in magnetic field.
Summary of the invention
To solve above-mentioned the technical problems existing in the prior art, the embodiment of the invention provides a kind of high-performance to shield glass
Glass and preparation method thereof.Specific technical solution is as follows:
In a first aspect, providing a kind of high-performance shield glass, wherein high-performance shield glass includes:
Glass body is multi-layer compound structure；
Magnetic layer is set in glass body, and in wherein one or more layers structure being located in multi-layer compound structure；
Nanoscale electro-magnetic screen layer, is set in glass body, and wherein one layer or more be located in multi-layer compound structure
In layer structure, nanoscale electro-magnetic screen layer is the unordered irregular silver-colored grid of nanoscale；
Conductive layer is set in glass body, and in wherein one or more layers structure being located in multi-layer compound structure；With
And
Flexible metal net, one end are connect with magnetic layer, nanoscale electro-magnetic screen layer and conductive layer, flexible metal net it is another
End is for the external connection with glass body.
Wherein, magnetic layer, nanoscale electro-magnetic screen layer and conductive layer are located in the different layers structure in multi-layer compound structure,
Shield is formed, shield is used for the electromagnetic shielding of glass body.
In the first mode in the cards of first aspect, multi-layer compound structure further include: inner layer glass is set to
The inside of multi-layer compound structure, magnetic layer are set to the outer surface of inner layer glass；Intermediate organic layer is set on inner layer glass,
Nanoscale electro-magnetic screen layer is set to the centre of intermediate organic layer；And glass outer, it is set on intermediate organic layer, conductive layer
It is set to the inner surface of glass outer.
With reference to first aspect the first mode in the cards, in second of mode in the cards of first aspect
In, inner layer glass is alumina silicate glass；Intermediate organic layer is multi-layer transparent polyurethane class high molecular layer or multilaminar polyethylene alcohol
Class macromolecule layer, multi-layer transparent polyurethane class high molecular layer or multilaminar polyethylene alcohols macromolecule layer are stacked, nanometer
Grade electro-magnetic screen layer is set between multi-layer transparent polyurethane class high molecular layer or multilaminar polyethylene alcohols macromolecule layer；And it is outer
Layer glass is alumina silicate glass.
The mode in the cards of second with reference to first aspect, in the third mode in the cards of first aspect
In, the quantity of multi-layer transparent polyurethane class high molecular layer or multilaminar polyethylene alcohols macromolecule layer is two layers, nanoscale electromagnetic screen
Layer is covered to be set among two layers of transparent polyurethane class macromolecule layer or two layers of polyethylene alcohols macromolecule layer.
In the 4th kind of mode in the cards of first aspect, magnetic layer is the magnetic being made of multi-layer transparent permeability magnetic material
Property composite film, the sheet resistance of magnetic coupling film layer is less than 20 Ω/sq.
In the 5th kind of mode in the cards of first aspect, the sheet resistance of nanoscale electro-magnetic screen layer is less than 0.8
Ω/sq, silver-colored grid with a thickness of 1-5 μm, line width 300-500nm.
In the 6th kind of mode in the cards of first aspect, conductive layer is low-resistivity tin indium oxide (Indium
Tin Oxides, ITO) film layer, the sheet resistance of low-resistivity tin indium oxide (Indium Tin Oxides, ITO) film layer is less than
3Ω/sq。
In the 7th kind of mode in the cards of first aspect, the light transmittance of glass body is greater than 92%, shield
Light transmittance is greater than 80%.
Second aspect provides a kind of preparation method of high-performance shield glass, wherein the preparation side of high-performance shield glass
Method the following steps are included:
One glass body is provided, is multi-layer compound structure；
It is multiple in multilayer by magnetron sputtering plating tin indium oxide (Indium Tin Oxides, ITO) and metallic nickel method
The surface coating multi-layer transparent permeability magnetic material of wherein one or more layers structure in structure is closed, magnetic layer is formed；
By 3D printing (3DP) technology, the printout surface of wherein one or more layers structure in multi-layer compound structure goes out
The unordered irregular silver-colored grid of nanoscale, forms nanoscale electro-magnetic screen layer；
Through magnetron sputtering plating tin indium oxide (Indium Tin Oxides, ITO) method, in multi-layer compound structure
Wherein one or more layers structure surface coating tin indium oxide (Indium Tin Oxides, ITO) film layer, formed conductive layer；
And
Magnetic layer, nanoscale electro-magnetic screen layer and conductive layer are connected by one end of flexible metal net, flexible metal net
The external connection of the other end and glass body；
Wherein, magnetic layer, nanoscale electro-magnetic screen layer and conductive layer are formed in the different layers structure in multi-layer compound structure
On, form shield.
In the first possible implementation of second aspect, magnetic layer is formed in the innermost layer knot in multi-layer compound structure
The outer surface of structure；Nanoscale electro-magnetic screen layer is formed in the surface of the interlayer structure in multi-layer compound structure；And conductive layer
It is formed in the inner surface of the outermost layer structure in multi-layer compound structure.
The present invention has had the advantage that compared with prior art:
1, the conductive layer in high-performance shield glass of the invention is low-resistivity tin indium oxide (Indium Tin
Oxides, ITO) film layer is strong to frequency electromagnetic waves protective capacities；Nanoscale electro-magnetic screen layer is the netted silverskin of super-low resistivity
Layer, centering low-frequency electromagnetic wave protective capacities are strong；Magnetic layer is magnetic coupling film layer, magnetic layer, nanometer strong to low frequency protective capacities
Grade electro-magnetic screen layer and conductive layer are located in the different layers structure in multi-layer compound structure, shield are formed, to the screen of electromagnetic field
It is strong to cover protective capacities, shielding frequency range is extensive.
2, the glass outer in multi-layer compound structure of the invention and inner layer glass use alumina silicate glass, environment resistant
It can be good；Conductive layer, magnetic layer, nanoscale electro-magnetic screen layer carried out that interlayer is compound using organic middle layer, no exposed to use
Risk.
3, the light transmittance of glass body of the invention is greater than 92%, and the light transmittance of shield is greater than 80%, is compounded to form
High-performance shield glass light transmittance is greater than 75%, has preferable optical property.
4, nanoscale electro-magnetic screen layer of the invention uses unordered irregular grid figure, will not generate under strong light mole
Line.
Detailed description of the invention
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for
For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings other
Attached drawing.
Fig. 1 is the structural schematic diagram of the high-performance shield glass of one embodiment of the invention.
Fig. 2 is the step flow diagram of the preparation method of the high-performance shield glass of two embodiments of the invention.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with attached drawing to embodiment party of the present invention
Formula is described in further detail.
In one embodiment of the invention, referring to FIG. 1, it illustrates the high-performance shield glass 1 of one embodiment of the invention
Structural schematic diagram.High-performance shield glass 1 includes glass body 2, magnetic layer 3, nanoscale electro-magnetic screen layer 4,5 and of conductive layer
Flexible metal net 6, in which:
Glass body 2 is multi-layer compound structure 24, and multi-layer compound structure 24 is mainly used for as magnetic layer 3, nanoscale electricity
Magnetic masking layer 4 and conductive layer 5 provide rigid support, and magnetic layer 3, nanoscale electro-magnetic screen layer 4 and conductive layer 5 is made to be located at difference
In layer structure, so that magnetic layer 3, nanoscale electro-magnetic screen layer 4, conductive layer 5 form shield 7, glass body 2 is improved to electromagnetism
The shielding protection ability and shielding frequency range of field.
In a preferred embodiment, referring again to Fig. 1, multi-layer compound structure 24 is organic including inner layer glass 21, centre
Layer 22 and glass outer 23, inner layer glass 21 are set to the inside of multi-layer compound structure 24, and intermediate organic layer 22 is set to internal layer
On glass 21, glass outer 23 is set on intermediate organic layer 22,23 shape of inner layer glass 21, intermediate organic layer 22 and glass outer
At three-layer composite structure, it is multiple that interlayer is carried out to magnetic layer 3, nanoscale electro-magnetic screen layer 4 and conductive layer 5 by intermediate organic layer 22
It closes, is compound in magnetic layer 3, nanoscale electro-magnetic screen layer 4 and conductive layer 5 in the different layers structure of the three-layer composite structure, nothing
The structure of the exposed risk used, right multi-layer compound structure 24 is not limited thereto, and those skilled in the art can also be according to this
The introduction of embodiment selects the multi-layer compound structure 24 of other suitable structures.
In another preferred embodiment, since alumina silicate glass has preferable chemical stability, electrical insulating property, machinery
The advantages of intensity, lower thermal expansion coefficient, therefore, inner layer glass 21 and glass outer 23, are all made of alumina silicate glass, have
There is preferable environmental resistance, but is not limited thereto.Intermediate organic layer 22 be multi-layer transparent polyurethane class high molecular layer 221 or
Multilaminar polyethylene alcohols macromolecule layer, multi-layer transparent polyurethane class high molecular layer 221 or multilaminar polyethylene alcohols macromolecule layer are
It is stacked, but is not limited thereto.
In another preferred embodiment, referring again to Fig. 1, the quantity of multi-layer transparent polyurethane class high molecular layer 221 is
Two layers, it is compound in 4 interlayer of nanoscale electro-magnetic screen layer among two layers of transparent polyurethane class macromolecule layer 221, but not with this
It is limited, those skilled in the art can also select the transparent polyurethane class macromolecule layer of other suitable quantity according to the actual situation
221, such as can be four layers, magnetic layer 3, nanoscale electro-magnetic screen layer 4 and 5 interlayer of conductive layer are compound in four layers of transparent poly- ammonia
Between esters macromolecule layer 221.
Magnetic layer 3 is set in glass body 2, and wherein one or more layers structure being located in multi-layer compound structure 24
On, when the quantity of magnetic layer 3 is one layer, which is set in wherein one layer of structure in multi-layer compound structure 24；When
When the quantity of magnetic layer 3 is multilayer, multilayer magnetic layer 3 is correspondingly arranged on the wherein multilayered structure in multi-layer compound structure 24.
Referring again to Fig. 1, the quantity of magnetic layer 3 disclosed in the present embodiment is one layer, which is set to inner layer glass 21
Outer surface, but be not limited thereto, those skilled in the art can also select to be positioned in it according to the introduction of the present embodiment
His suitable position, such as the inner surface of glass outer 23 can also be set to.
In a preferred embodiment, magnetic layer 3 is the magnetic coupling film layer being made of multi-layer transparent permeability magnetic material, and magnetism is multiple
The sheet resistance of film layer is closed less than 20 Ω/sq, protection of the magnetic coupling film layer to low-frequency range (10K-30MHz) electromagnetic wave, screen
Efficiency is covered greater than 50dB, and protective capacities is strong.
Nanoscale electro-magnetic screen layer 4 is set in glass body 2, and be located at multi-layer compound structure 24 in wherein one layer or
On multilayered structure, when the quantity of nanoscale electro-magnetic screen layer 4 is one layer, it is multiple which is set to multilayer
It closes in wherein one layer of structure in structure 24；When the quantity of nanoscale electro-magnetic screen layer 4 is multilayer, multilayer nanoscale electromagnetic screen
It covers on the wherein multilayered structure that layer 4 is correspondingly arranged in multi-layer compound structure 24.Referring again to Fig. 1, disclosed in the present embodiment
The quantity of nanoscale electro-magnetic screen layer 4 is one layer, which is the centre for being set to intermediate organic layer 22,
But it is not limited thereto, those skilled in the art can also select to be positioned according to the introduction of the present embodiment other suitably
Position.
Nanoscale electro-magnetic screen layer 4 is the unordered irregular silver-colored grid of nanoscale, and moire fringes will not be generated under strong light, from
Visual experience without will affect observer will not generate dizziness, the serious negative impression such as dimness of vision to observer.
In a preferred embodiment, the sheet resistance of nanoscale electro-magnetic screen layer 4 is less than 0.8 Ω/sq, the thickness of silver-colored grid
For 1-5 μm, line width 300-500nm, the protection of this layer of centering low-frequency range (30-1000MHz) electromagnetic wave, shield effectiveness is greater than
50dB, protective capacities are strong.
Conductive layer 5 is set in glass body 2, and wherein one or more layers structure being located in multi-layer compound structure 24
On, when the quantity of conductive layer 5 is one layer, which is set in wherein one layer of structure in multi-layer compound structure 24；When
When the quantity of conductive layer 5 is multilayer, plurality of conductive layers 5 is correspondingly arranged on the wherein multilayered structure in multi-layer compound structure 24.
Referring again to Fig. 1, the quantity of conductive layer 5 disclosed in the present embodiment is one layer, which is set to glass outer 23
Inner surface, but be not limited thereto, those skilled in the art can also select to be positioned in it according to the introduction of the present embodiment
His suitable position, such as the outer surface of inner layer glass 21 can also be set to.
In a preferred embodiment, conductive layer 5 is low-resistivity tin indium oxide (Indium Tin Oxides, ITO) film
Layer, the sheet resistance of low-resistivity tin indium oxide (Indium Tin Oxides, ITO) film layer is less than 3 Ω/sq, the low-resistivity
Protection of tin indium oxide (Indium Tin Oxides, the ITO) film layer to high band (1-40GHz) electromagnetic wave, shield effectiveness are greater than
40dB, protective capacities are strong.
Magnetic layer 3, nanoscale electro-magnetic screen layer 4 and conductive layer 5 are located in the different layers structure in multi-layer compound structure 24,
Form shield 7, since conductive layer 5 is strong to frequency electromagnetic waves protective capacities, 4 centering low-frequency electromagnetic wave of nanoscale electro-magnetic screen layer
Protective capacities is strong, and magnetic layer 3 is strong to low frequency protective capacities, and then the shielding of shield 7 frequency range formed is extensive, to the screen of electromagnetic field
It is strong to cover protective capacities, glass body 2 can be preferably electromagnetically shielded, take into account it efficiently in complex electromagnetic environment
Electromagnetic shielding performance.
One end of flexible metal net 6 is connect with magnetic layer 3, nanoscale electro-magnetic screen layer 4 and conductive layer 5, flexible metal net 6
The other end for external connection with glass body 2.Referring again to Fig. 1, flexible metal net 6 is another disclosed in the present embodiment
One end is to be connected to ground, and realizes the electrical connection ground connection of magnetic layer 3, nanoscale electro-magnetic screen layer 4 and conductive layer 5, but not with this
It is limited.
Flexible metal net 6 is mainly used for the electrical connection ground connection of magnetic layer 3, nanoscale electro-magnetic screen layer 4 and conductive layer 5,
Can there is no particular/special requirement for the selection of the material of flexible metal net 6 in the present embodiment, referring to those skilled in the art's
Conventional selection, such as can be Calmalloy metal mesh.
In a preferred embodiment, the light transmittance of glass body 2 is greater than 92%, and the light transmittance of shield 7 is greater than 80%, from
And the light transmittance for the high-performance shield glass 1 being compounded to form be greater than 75%, have preferable optical property, but not as
Limit.
In two embodiments of the invention, referring to FIG. 2, it illustrates the high-performance shield glass 1 of two embodiments of the invention
Preparation method 8 step flow diagram.The preparation method 8 of high-performance shield glass 1 includes the following steps 801-805.
Step 801, a glass body 2 is provided.One glass body 2 is provided, is multi-layer compound structure 24.
In a preferred embodiment, multi-layer compound structure 24 further includes inner layer glass 21, intermediate organic layer 22 and outer layer glass
Glass 23, inner layer glass 21 are set to the inside of multi-layer compound structure 24, and intermediate organic layer 22 is set on inner layer glass 21, outer layer
Glass 23 is set on intermediate organic layer 22, and inner layer glass 21, intermediate organic layer 22 and glass outer 23 form three layers of composite junction
The structure of structure, right multi-layer compound structure 24 is not limited thereto, and those skilled in the art can also be according to the introduction of the present embodiment
Select the multi-layer compound structure 24 of other suitable structures.
In another preferred embodiment, inner layer glass 21 and glass outer 23 are all made of alumina silicate glass, have preferable
Environmental resistance, but be not limited thereto.Intermediate organic layer 22 is multi-layer transparent polyurethane class high molecular layer 221, and multilayer is saturating
Bright polyurethane class high molecular layer 221 is stacked, but is not limited thereto.
In another preferred embodiment, the quantity of multi-layer transparent polyurethane class high molecular layer 221 is two layers, but not with this
It is limited.
Step 802, magnetic layer 3 is formed.By magnetron sputtering plating tin indium oxide (Indium Tin Oxides, ITO) with
Metallic nickel method, the surface coating multi-layer transparent permeability magnetic material of wherein one or more layers structure in multi-layer compound structure 24,
Form magnetic layer 3.
In a preferred embodiment, magnetic layer 3 is formed in the outer surface of the innermost layer structure in multi-layer compound structure 24, but
It is not limited thereto.
In another preferred embodiment, by magnetron sputtering plating tin indium oxide (Indium Tin Oxides, ITO) with
Metallic nickel method forms magnetic layer 3 in the outer surface plated film multi-layer transparent permeability magnetic material of inner layer glass 21, but not as
Limit.
It is this field skill as magnetron sputtering plating tin indium oxide (Indium Tin Oxides, ITO) and metallic nickel method
Conventional technical means known to art personnel, therefore herein without repeating.
Step 803, nanoscale electro-magnetic screen layer 4 is formed.Through 3D printing (3DP) technology, in multi-layer compound structure 24
The printout surface of wherein one or more layers structure go out the unordered irregular silver-colored grid of nanoscale, form nanoscale electro-magnetic screen layer
4。
In a preferred embodiment, nanoscale electro-magnetic screen layer 4 is formed in the interlayer structure in multi-layer compound structure 24
Surface, but be not limited thereto.
In another preferred embodiment, when interlayer structure is two layers of transparent polyurethane class macromolecule layer 221, pass through 3D
(3DP) technology of printing prints the unordered irregular silver-colored net of nanoscale between two layers of transparent polyurethane class macromolecule layer 221
Lattice at nanoscale electro-magnetic screen layer 4, but are not limited thereto.
As for the conventional technical means that 3D printing (3DP) technology is well known to those skilled in the art, thus herein not into
Row repeats.
Step 804, conductive layer 5 is formed.Pass through magnetron sputtering plating tin indium oxide (Indium Tin Oxides, ITO) side
Method, surface coating tin indium oxide (the Indium Tin of wherein one or more layers structure in multi-layer compound structure 24
Oxides, ITO) film layer, form conductive layer 5.
In a preferred embodiment, conductive layer 5 is formed in the inner surface of the outermost layer structure in multi-layer compound structure 24, but
It is not limited thereto.
In another preferred embodiment, pass through magnetron sputtering plating tin indium oxide (Indium Tin Oxides, ITO) side
Method forms conductive layer 5 in inner surface plated film tin indium oxide (Indium Tin Oxides, ITO) film layer of glass outer 23, but
It is not limited thereto.
It is those skilled in the art institute as magnetron sputtering plating tin indium oxide (Indium Tin Oxides, ITO) method
Well known conventional technical means, therefore herein without repeating.
Step 805, flexible metal net 6 is set.Magnetic layer 3, nanoscale electromagnetic screen are connected by one end of flexible metal net 6
Cover layer 4 and conductive layer 5, the other end of flexible metal net 6 and the external connection of glass body 2.
In a preferred embodiment, flexible metal net 6 selects Calmalloy metal mesh, by Calmalloy metal mesh
One end is connect with magnetic layer 3, nanoscale electro-magnetic screen layer 4 and conductive layer 5, and the other end and ground of Calmalloy metal mesh are even
It connects, realizes the electrical connection ground connection of magnetic layer 3, nanoscale electro-magnetic screen layer 4 and conductive layer 5, but be not limited thereto.
Magnetic layer 3, nanoscale electro-magnetic screen layer 4 and conductive layer 5 in above-mentioned steps are located in multi-layer compound structure 24
In different layers structure, shield 7, since conductive layer 5 is strong to frequency electromagnetic waves protective capacities, nanoscale electro-magnetic screen layer 4 are formed
Centering low-frequency electromagnetic wave protective capacities is strong, and magnetic layer 3 is strong to low frequency protective capacities, and then the shielding of shield 7 frequency range formed is wide
It is general, it is strong to the shielding protection ability of electromagnetic field, glass body 2 can be preferably electromagnetically shielded, make it in complicated electromagnetism
Environment can take into account high-efficiency electromagnetic shielding properties.
Several preferred embodiments of the invention have shown and described in above description, but as previously described, it should be understood that this hair
It is bright to be not limited to forms disclosed herein, it is not to be taken as the exclusion to other embodiments, and can be used for various other
Combination, modification and environment, and can within that scope of the inventive concept describe herein, by the technology of above-mentioned introduction or related fields or
Knowledge is modified.And changes and modifications made by those skilled in the art do not depart from the spirit and scope of the present invention, then it all should be
In the protection scope of appended claims of the present invention.
Claims (10)
1. a kind of high-performance shield glass, which is characterized in that the high-performance shield glass includes:
Glass body is multi-layer compound structure；
Magnetic layer is set in the glass body, and wherein one or more layers structure being located in the multi-layer compound structure
On；
Nanoscale electro-magnetic screen layer is set in the glass body, and wherein one layer be located in the multi-layer compound structure
Or on multilayered structure, the nanoscale electro-magnetic screen layer is the unordered irregular silver-colored grid of nanoscale；
Conductive layer is set in the glass body, and wherein one or more layers structure being located in the multi-layer compound structure
On；
Flexible metal net, one end are connect with the magnetic layer, the nanoscale electro-magnetic screen layer and the conductive layer, the flexibility
The other end of metal mesh is for the external connection with the glass body.
Wherein, the magnetic layer, the nanoscale electro-magnetic screen layer and the conductive layer are located in the multi-layer compound structure
In different layers structure, shield is formed, the shield is used for the electromagnetic shielding of the glass body.
2. high-performance shield glass according to claim 1, which is characterized in that the multi-layer compound structure further include:
Inner layer glass, is set to the inside of the multi-layer compound structure, and the magnetic layer is set to the appearance of the inner layer glass
Face；
Intermediate organic layer is set on the inner layer glass, and the nanoscale electro-magnetic screen layer is set to the intermediate organic layer
Centre；
Glass outer is set on the intermediate organic layer, and the conductive layer is set to the inner surface of the glass outer.
3. high-performance shield glass according to claim 2, which is characterized in that
The inner layer glass is alumina silicate glass；
The intermediate organic layer is multi-layer transparent polyurethane class high molecular layer or multilaminar polyethylene alcohols macromolecule layer, the multilayer
Transparent polyurethane class macromolecule layer or multilaminar polyethylene alcohols macromolecule layer are stacked, the nanoscale electro-magnetic screen layer
It is set between the multi-layer transparent polyurethane class high molecular layer or multilaminar polyethylene alcohols macromolecule layer；And
The glass outer is alumina silicate glass.
4. high-performance shield glass according to claim 3, which is characterized in that the multi-layer transparent polyurethane class high molecular
Layer or multilaminar polyethylene alcohols macromolecule layer quantity be two layers, the nanoscale electro-magnetic screen layer be set to described two layers it is transparent
Among polyurethane class high molecular layer or two layers of polyethylene alcohols macromolecule layer.
5. high-performance shield glass according to claim 1, which is characterized in that the magnetic layer is by multi-layer transparent magnetic conduction
The magnetic coupling film layer of material composition, the sheet resistance of the magnetic coupling film layer is less than 20 Ω/sq.
6. high-performance shield glass according to claim 1, which is characterized in that the surface of the nanoscale electro-magnetic screen layer
Resistance less than 0.8 Ω/sq, the silver grid with a thickness of 1-5 μm, line width 300-500nm.
7. high-performance shield glass according to claim 1, which is characterized in that the conductive layer is low-resistivity indium oxide
Tin (Indium Tin Oxides, ITO) film layer, low-resistivity tin indium oxide (Indium Tin Oxides, the ITO) film layer
Sheet resistance less than 3 Ω/sq.
8. high-performance shield glass according to claim 1, which is characterized in that the light transmittance of the glass body is greater than
92%, the light transmittance of the shield is greater than 80%.
9. a kind of preparation method of high-performance shield glass, which is characterized in that the preparation method packet of the high-performance shield glass
Include following steps:
One glass body is provided, is multi-layer compound structure；
By magnetron sputtering plating tin indium oxide (Indium Tin Oxides, ITO) and metallic nickel method, Yu Suoshu multilayer is multiple
The surface coating multi-layer transparent permeability magnetic material of wherein one or more layers structure in structure is closed, magnetic layer is formed；
By 3D printing (3DP) technology, the printout surface of wherein one or more layers structure in Yu Suoshu multi-layer compound structure goes out
The unordered irregular silver-colored grid of nanoscale, forms nanoscale electro-magnetic screen layer；
By magnetron sputtering plating tin indium oxide (Indium Tin Oxides, ITO) method, in Yu Suoshu multi-layer compound structure
Wherein one or more layers structure surface coating tin indium oxide (Indium Tin Oxides, ITO) film layer, formed conductive layer；
And
The magnetic layer, the nanoscale electro-magnetic screen layer and the conductive layer are connected by one end of flexible metal net, it is described
The external connection of the other end of flexible metal net and the glass body；
Wherein, the magnetic layer, the nanoscale electro-magnetic screen layer and the conductive layer are formed in the multi-layer compound structure
Different layers structure on, formed shield.
10. a kind of preparation method of high-performance shield glass according to claim 9, which is characterized in that
The magnetic layer is formed in the outer surface of the innermost layer structure in the multi-layer compound structure；
The nanoscale electro-magnetic screen layer is formed in the surface of the interlayer structure in the multi-layer compound structure；And
The conductive layer is formed in the inner surface of the outermost layer structure in the multi-layer compound structure.
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