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CN109991699B - 2 mu m wave band phase shift sampling optical fiber grating and manufacturing system and method - Google Patents

2 mu m wave band phase shift sampling optical fiber grating and manufacturing system and method Download PDF

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Publication number
CN109991699B
CN109991699B CN201711483341.9A CN201711483341A CN109991699B CN 109991699 B CN109991699 B CN 109991699B CN 201711483341 A CN201711483341 A CN 201711483341A CN 109991699 B CN109991699 B CN 109991699B
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sampling
grating
fiber
phase shift
band
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CN109991699A (en
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张鲁娜
延凤平
冯亭
谭思宇
白燕
韩文国
王伟
白卓娅
程丹
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Beijing Jiaotong University
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02Optical fibres with cladding with or without a coating
    • G02B6/02052Optical fibres with cladding with or without a coating comprising optical elements other than gratings, e.g. filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02Optical fibres with cladding with or without a coating
    • G02B6/02057Optical fibres with cladding with or without a coating comprising gratings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02Optical fibres with cladding with or without a coating
    • G02B6/02057Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02142Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating based on illuminating or irradiating an amplitude mask, i.e. a mask having a repetitive intensity modulating pattern
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02Optical fibres with cladding with or without a coating
    • G02B6/02057Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B2006/02166Methods of designing the gratings, i.e. calculating the structure, e.g. algorithms, numerical methods

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Light Guides In General And Applications Therefor (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

The invention provides a 2 mu m wave band phase shift sampling fiber grating, which is manufactured by taking a photosensitive fiber 101 as a matrix and comprises a fiber core 102 and a cladding 103; the fiber core 102 includes n sampling segments, the sampling period is p, each sampling segment includes an exposure gate region and a non-exposure section, the length of the exposure gate region is a, the grating period is Λ, the length of the non-exposure region is b, and at the same time, a pi phase shift point 104 is disposed at the center of the 2 μm band phase shift sampling fiber grating. The invention also provides a system and a method for manufacturing the 2 mu m-band phase shift sampling fiber grating. The phase shift sampling fiber bragg grating has potential application prospect in the aspect of manufacturing a 2 mu m-band single longitudinal mode narrow linewidth fiber laser, and has beneficial technical effects.

Description

2 mu m wave band phase shift sampling optical fiber grating and manufacturing system and method
Technical Field
The invention relates to the field of fiber grating passive devices, in particular to a 2 mu m wave band phase shift sampling fiber grating and a manufacturing system and method thereof.
Background
The 2 mu m wave band multi-wavelength optical fiber laser has the characteristics of human eye safety, low loss atmospheric window and strong absorption peak for various gases, and has wide application in the fields of communication, military, medical treatment, sensing and measurement. In order to realize multi-wavelength output, fiber gratings are used as efficient filtering devices for fiber laser systems in the 1.55 μm and 2 μm bands. K.Hill et al, the Canada wortmann communication research center, discovered the photosensitive properties of the fiber in 1978, and used 488nm and 514nm argon ion lasers to form standing waves in the germanium-doped quartz-based fiber to successfully produce gratings, but the research on fiber gratings in the next ten years did not get rapid development because the method had low writing efficiency and the period of the fiber gratings was completely dependent on the wavelength of the incident laser.
The sampling fiber Bragg grating (sampling fiber Bragg grating for short) is a non-uniform fiber Bragg grating, refractive index modulation of the non-uniform fiber Bragg grating is periodically distributed in a segmented mode, the uniform fiber Bragg grating is obtained by spatially sampling the uniform fiber Bragg grating according to a certain rule, and a reflection spectrum of the uniform fiber Bragg grating is comb-shaped and can be used for realizing a multi-wavelength fiber laser. However, the bandwidth of each reflection peak of the sampling fiber bragg grating is large, and single longitudinal mode laser output is not easy to form. The phase shift fiber Bragg grating (called as phase shift fiber Bragg grating for short) is characterized in that phase shift occurs at a certain position or a certain positions on the uniform fiber Bragg grating, one or more narrow gaps are formed in the reflection spectrum of the phase shift fiber Bragg grating, a transmission peak is formed, the bandwidth of the transmission peak is narrow, and single longitudinal mode laser can be easily selected.
Disclosure of Invention
The invention aims to provide a 2 mu m-band phase-shift sampling fiber grating, and a system and a method for manufacturing the 2 mu m-band phase-shift sampling fiber grating. Compared with the traditional phase shift grating and sampling grating structure, the laser filter can realize more narrow-band filtering, and is more beneficial to the selection of a laser mode.
In order to achieve the above object, the present invention adopts the following technical scheme.
The 2 mu m band phase shift sampling fiber grating is manufactured by taking photosensitive fiber 101 as a matrix, and is characterized in that: the photosensitive optical fiber 101 comprises a fiber core 102 and a cladding 103; the fiber core 102 includes n sampling segments, the sampling period is p, each sampling segment includes an exposure gate region and a non-exposure section, the length of the exposure gate region is a, the grating period is Λ, the length of the non-exposure region is b, and at the same time, a pi phase shift point 104 is disposed at the center of the 2 μm band phase shift sampling fiber grating.
The 2 mu m wave band phase shift sampling fiber grating manufacturing system comprises a laser 201, a light attenuation mirror 202, a total reflection mirror 203, a cylindrical lens 204, a control computer 205, a displacement platform 206, a fiber holder 207, a sampling grating mask plate 208, a circulator 209, a broadband light source 210 and a spectrometer 211, and is characterized in that: the total reflection mirror 203 and the cylindrical lens 204 are fixed on the displacement platform 206, and the movement of the displacement platform 206 can be controlled by the control computer 205; the sampled grating mask 208 belongs to a 2 μm band sampled grating mask, and has n sampling segments, a sampling period is p, each sampling segment includes an exposure gate region and a non-exposure region, the length of the exposure gate region is a, the period is T, and t=2Λ is satisfied, and the length of the non-exposure region is b.
Preferably, a photosensitive optical fiber 101 is also included.
Preferably, the photosensitive optical fiber 101 is a high-voltage hydrogen-loaded or high-germanium-doped single-mode fiber.
Preferably, the photosensitive fiber 101 is connected to port 2 of the optical circulator 209, the broadband light source 210 is connected to port 1 of the optical circulator 209, and the spectrometer 211 is connected to port 3 of the optical circulator 209.
Preferably, the reflection spectrum and the transmission spectrum of the 2 μm band phase shift sampling fiber grating are read by the spectrometer 211.
The manufacturing method of the 2 mu m-band phase shift sampling fiber grating is characterized by comprising the following steps:
step one, manufacturing a 2 mu m-band sampling fiber grating: presetting parameters of the 2 mu m-band sampling fiber grating, and inscribing the 2 mu m-band sampling fiber grating by controlling the motion characteristics of a laser spot on the sampling grating mask plate 208 and combining the output laser characteristics of the controlled laser 201; in the inscription process, the spectrometer 211 is used for measuring the reflection spectrum and the transmission spectrum, and real-time feedback is carried out to adjust the manufacturing parameters until the ideal 2 mu m-band sampling fiber grating is obtained;
step two, manufacturing a 2 mu m-band phase shift sampling fiber grating: and taking down the sampling grating mask plate 208, controlling a displacement platform 206 through a control computer 205 to enable a laser spot to stay at the center position of the 2 mu m-band sampling fiber grating, manufacturing a pi phase shift point 104 through laser exposure, measuring a reflection spectrum and a transmission spectrum by using the spectrometer 211, and feeding back and adjusting manufacturing parameters in real time until the ideal 2 mu m-band phase shift sampling fiber grating is obtained.
The beneficial effects of the invention are as follows:
1. the design structure is simple and flexible, the external influence factors are few, and the insertion loss is low;
2. different dual-wavelength laser outputs are realized by adjusting parameters of the designed phase shift sampling grating;
3. the filter device with ultra-narrow filter bandwidth can be manufactured, and has potential application prospect in the aspect of manufacturing a 2 mu m-band single longitudinal mode narrow linewidth fiber laser.
Drawings
FIG. 1 is a schematic diagram of a 2 μm band phase shift sampling fiber grating structure according to the present invention;
FIG. 2 is a schematic diagram of a 2 μm band phase shift sampling fiber grating fabrication system according to the present invention.
In the figure: 101. photosensitive optical fiber, 102, fiber core, 103, cladding, 104, pi phase shift point, p, sampling period, a, exposure gate length, b, non-exposure region length, Λ, exposure gate grating period, 201, laser, 202, light attenuation mirror, 203, total reflection mirror, 204, cylindrical lens, 205, control computer, 206, displacement platform, 207, optical fiber holder, 208, sampling grating mask plate, 209, circulator, 210, broadband light source, 211, spectrometer, 211, photosensitive optical fiber.
Detailed Description
Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the drawings are exemplary only for explaining the present invention and are not to be construed as limiting the present invention.
It will be understood by those skilled in the art that, unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the prior art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
For the purpose of promoting an understanding of the principles of the invention, reference will now be made to the embodiments illustrated in the drawings and specific examples, which are not intended to limit the scope of the invention.
The invention aims to provide a 2 mu m-band phase shift sampling fiber grating, which can obtain a fiber filter device with a plurality of narrow-band transmission peaks, and also provides a manufacturing method of the fiber grating, and the invention is described below through fig. 1-2.
Example 1:
as shown in fig. 1, a 2 μm band phase shift sampled fiber grating, the preparation uses photosensitive optical fiber 101 as a matrix, and is characterized in that: the photosensitive optical fiber 101 comprises a fiber core 102 and a cladding 103; the fiber core 102 includes n sampling segments Z1', Z2', … …, zkZk ', zk+1zk+1', … …, zn-1', znZn', and a sampling period p, each sampling segment includes an exposure gate region and a non-exposure region, the length of the exposure gate region is a, the grating period Λ, the length of the non-exposure region is b, and at the same time, a pi phase shift point 104 is disposed at the center of the 2 μm band phase shift sampling fiber grating.
The photosensitive optical fiber 101 can be a single-mode optical fiber with high-pressure hydrogen load or fiber core highly doped with germanium element, is sensitive to ultraviolet light, and changes refractive index through ultraviolet laser irradiation; the photosensitive fiber 101 may also be selected from other types of photosensitive fibers according to actual needs.
Example 2:
referring to fig. 2, a schematic diagram of a 2 μm band phase shift sampling fiber grating manufacturing system according to the present invention includes a laser 201, an optical attenuator 202, a total reflection mirror 203, a cylindrical lens 204, a control computer 205, a displacement platform 206, a fiber holder 207, a sampling grating mask 208, a circulator 209, a broadband light source 210, a spectrometer 211, and a photosensitive fiber 101.
The laser 201 is an ultraviolet laser, has a wavelength of 248nm, and can output pulse light with adjustable unit energy; the laser 201 may be changed from other wavelengths or types according to actual needs.
The total reflection mirror 203 and the cylindrical lens 204 are fixed on the displacement platform 206, and the movement of the displacement platform 206 can be controlled by the control computer 205.
The portion of the photosensitive fiber 101 behind the sampled grating mask 208 is stripped of coating.
The photosensitive fiber 101 is connected to port 2 of the circulator 209, the broadband light source 210 is connected to port 1 of the circulator 209, and the spectrometer 211 is connected to port 3 of the circulator 209.
The sampled grating mask 208 belongs to a 2 μm band sampled grating mask, and has n sampling segments, a sampling period is p, each sampling segment includes an exposure gate region and a non-exposure region, the length of the exposure gate region is a, the period is T, and t=2Λ is satisfied, and the length of the non-exposure region is b.
The working principle of the 2 mu m-band phase shift sampling fiber grating manufacturing system is as follows: the laser 201 outputs laser light, which is attenuated by the light attenuation mirror 202 and then enters the total reflection mirror 203 and the cylindrical lens 204; the cylindrical lens 204 irradiates laser onto the sampling grating mask plate 208, and irradiates the photosensitive optical fiber 101 with the stripped coating layer on the optical fiber clamping frame 207 with the light passing through the sampling grating mask plate 208, so that 2 μm band sampling optical fiber grating can be inscribed; in combination with the broadband light source 210, the reflection spectrum and the transmission spectrum of the 2 μm band sampled fiber grating can be read by the spectrometer 211.
The invention also comprises a manufacturing method of the 2 mu m-band phase shift sampling fiber grating, which comprises the following steps:
step one, manufacturing the 2 mu m-band sampling fiber bragg grating: according to the parameters of the pre-designed 2 μm band sampling fiber grating, controlling the motion characteristic of the laser spot on the sampling grating mask plate 208 by a control computer 205, and writing the 2 μm band sampling fiber grating by combining the output laser characteristic of the controlled laser 201; in the writing process, the spectrometer 211 is used for measuring the reflection spectrum and the transmission spectrum, and real-time feedback is carried out to adjust the manufacturing parameters until the ideal 2 μm wave band sampling fiber grating is obtained.
Step two, manufacturing a 2 mu m-band phase shift sampling fiber grating: and taking down the sampling grating mask plate 208, controlling a displacement platform 206 through a control computer 205 to enable a laser spot to stay at the center position of the 2 mu m-band sampling fiber grating, manufacturing a pi phase shift point 104 through laser exposure, measuring a reflection spectrum and a transmission spectrum by using the spectrometer 211, and feeding back and adjusting manufacturing parameters in real time until the ideal 2 mu m-band phase shift sampling fiber grating is obtained.
Example 3:
the laser 201 can selectively output 248nm pulse light, passes through the attenuation mirror 202, is reflected by the total reflection mirror 203 fixed on the high-precision displacement platform 206, and scans and exposes the sampling grating mask plate 208 and the photosensitive optical fiber 101 without the coating after converging through the UV-level cylindrical lens 204 with proper focal length; the optical fiber clamp 207 can ensure that the bare fiber is kept straight in the grating writing process, and because the sampling grating mask 208 has the functions of enhancing the first-order diffraction and inhibiting the zero-order diffraction, the ultraviolet light is modulated by the sampling grating mask 208 and then is subjected to the first-order diffraction to form interference fringes in the photosensitive optical fiber 101, and the period of forming the interference fringes in the photosensitive optical fiber 101 is 1/2 of the period of the phase mask; when ultraviolet light starts scanning, the bare fiber is exposed through the sampling grating mask plate 208, and a 2 μm-band sampling fiber grating is inscribed, and at this time, the transmission spectrum of the 2 μm-band sampling fiber grating can be expressed as:
wherein the Fourier coefficient of the sampling function is +.> Is refractive indexThe average change amount, delta (omega-m.2pi/d-2pi/lambda) is a Dicarat function, p is a sampling period, a is the length of the exposure gate, and lambda is the grating period of the exposure gate.
After the 2 μm band sampling fiber grating is finished, the sampling grating mask plate 208 is taken down, and the displacement platform 206 is controlled by the control computer 205 to move to the midpoint position of the 2 μm band sampling fiber grating; starting the laser 201 again, performing fixed-point exposure on the midpoint position of the 2 μm-band sampling fiber grating, and continuously modulating the refractive index of the fiber at the exposure position, thereby introducing pi phase shift points 104; the spectrometer 211 is used for measuring reflection spectrum and transmission spectrum in the manufacturing process of the pi phase shift point 104, and real-time feedback is used for adjusting manufacturing parameters until the ideal 2 mu m-band phase shift sampling fiber grating is obtained. According to the transmission matrix method, the transmission matrix method of the phase-shift sampling fiber bragg grating can be expressed as:
wherein,δ=β -pi/Λ, p is the sampling period, a is the exposure gate length, κ is the coupling coefficient, β is the transmission constant, Λ is the exposure gate grating period.
The reflection spectrum of the 2 μm band sampling fiber grating is obtained through calculation and simulation, when the wavelength range is 1938nm to 1942nm, the grating has three reflection peaks, and the 3dB bandwidths of the reflection peaks are respectively 0.0840nm,0.0880nm and 0.0840nm.
The transmission spectrum of the 2 mu m-band phase-shift sampling fiber grating is obtained through calculation and simulation, a phase-shift transmission window appears in the middle of each transmission peak of the 2 mu m-band phase-shift sampling fiber grating under the same grating parameter setting and in the same wavelength range, 3dB bandwidths of the three windows are 0.0440,0.0432 and 0.0440 nm respectively, and the 2 mu m-band phase-shift sampling fiber grating has multi-wavelength narrow-band filtering characteristics.
The present invention is not limited to the above-mentioned embodiments, and any changes or substitutions that can be easily understood by those skilled in the art within the technical scope of the present invention are intended to be included in the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the protection scope of the claims.

Claims (2)

1. A method for manufacturing a 2 mu m-band phase shift sampling fiber grating, the method is characterized by comprising the following steps of: step one, manufacturing a 2 mu m-band sampling fiber grating: presetting parameters of the 2 mu m-band sampling fiber grating, and inscribing the 2 mu m-band sampling fiber grating by controlling the motion characteristic of a laser spot on a sampling grating mask plate (208) and combining the output laser characteristic of a controlled laser (201); in the inscription process, a spectrometer (211) is used for measuring the reflection spectrum and the transmission spectrum, and real-time feedback is carried out to adjust manufacturing parameters until the 2 mu m-band sampling fiber grating is obtained; step two, manufacturing a 2 mu m-band phase shift sampling fiber grating: the sampling grating mask plate (208) is taken down, a displacement platform (206) is controlled through a control computer (205) to enable a laser spot to stay at the center position of the 2 mu m-band sampling fiber grating, pi phase shift points (104) are manufactured through laser exposure, a spectrometer (211) is used for measuring reflection spectrum and transmission spectrum, manufacturing parameters are fed back and adjusted in real time until the 2 mu m-band phase shift sampling fiber grating is obtained, when the wavelength range of the reflection spectrum of the 2 mu m-band sampling fiber grating is 1938nm to 1942nm, the grating has three reflection peaks, and the 3dB bandwidths of the reflection peaks are 0.0840nm,0.0880nm and 0.0840nm respectively.
2. A fiber grating fabricated by the fabrication method of claim 1, wherein the fabrication is based on a photosensitive fiber (101), and wherein: the photosensitive optical fiber (101) comprises a fiber core (102) and a cladding (103); the fiber core (102) comprises n sampling sections, the sampling period is p, each sampling section comprises an exposure gate region and a non-exposure section, the length of the exposure gate region is a, the grating period is Λ, the length of the non-exposure region is b, and meanwhile, a pi phase shift point (104) is arranged at the center of the 2 mu m-band phase shift sampling fiber grating; the reflection spectrum of the 2 mu m wave band sampling fiber grating ranges from 1938nm to 1938nm
At 1942nm, the grating has three reflection peaks, the 3dB bandwidths of the reflection peaks are 0.0840nm respectively,
0.0880nm and 0.0840nm.
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CN110673258A (en) * 2019-09-29 2020-01-10 北京工业大学 System for writing various fiber gratings by ultraviolet laser mask plate method
CN113671621B (en) * 2021-08-24 2023-12-12 南京邮电大学 Linear movable fiber bragg grating continuous inscription system and method
CN114280722B (en) * 2022-03-07 2022-06-07 湖北工业大学 Transmission type optical filter
CN117148491B (en) * 2023-11-01 2023-12-29 上海频准激光科技有限公司 Refractive index modulated multi-level phase-shift grating structure, preparation method and optical coupler

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CN1641390A (en) * 2004-01-09 2005-07-20 清华大学 Tunable dispersion compensator designing and making method
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