CN109954372A - A kind of Double-pillar gas purifier - Google Patents
A kind of Double-pillar gas purifier Download PDFInfo
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- CN109954372A CN109954372A CN201711439265.1A CN201711439265A CN109954372A CN 109954372 A CN109954372 A CN 109954372A CN 201711439265 A CN201711439265 A CN 201711439265A CN 109954372 A CN109954372 A CN 109954372A
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- purifier
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- column
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- 238000000746 purification Methods 0.000 claims abstract description 46
- 239000000956 alloy Substances 0.000 claims abstract description 14
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 14
- 230000007246 mechanism Effects 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000004886 process control Methods 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 3
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 239000007769 metal material Substances 0.000 claims description 2
- 238000003466 welding Methods 0.000 claims description 2
- 229910052727 yttrium Inorganic materials 0.000 claims description 2
- 238000004321 preservation Methods 0.000 claims 1
- 239000012535 impurity Substances 0.000 abstract description 11
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 230000008901 benefit Effects 0.000 abstract description 3
- 230000009977 dual effect Effects 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 39
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000001575 pathological effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
- B01D53/0407—Constructional details of adsorbing systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
- B01D53/0407—Constructional details of adsorbing systems
- B01D53/0438—Cooling or heating systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
- B01D53/0454—Controlling adsorption
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Of Gases By Adsorption (AREA)
- Gas Separation By Absorption (AREA)
Abstract
The invention discloses a kind of Double-pillar gas purifiers.The Double-pillar gas purifier includes purifier cabinet, two purification columns, heater, insulating layer, support fixed mechanism, control circuit, touch screen, wherein purification column, heater, insulating layer are fixed on purifier cabinet inside by support fixed mechanism；Filling purifying alloy inside the purification column, filter is installed at both ends, and welds gas-guide tube；Two purification column parallel connections；Each purification column outlet side is installed by fin structure radiator；The heaters set is sleeved on heater outer layer mounted in purifying outer surface of column, insulating layer；The control circuit and the operation of touch screen control purifier automatic or manual.Gas purifier complete function of the invention, it is more that single-column impurity removes type；Structure is simple, can effectively improve purifier stability.Have the advantages that flexible modulation while improving service life with purification performance using dual beam configuration in purifier, the manufacturing and use cost can be greatly reduced.
Description
Technical field
The present invention relates to a kind of Double-pillar gas purifiers, belong to gas purification technology field.
Background technique
Gas purifier is a kind of device for removing impurity in gas, is widely used in industrial production and scientific research activity,
Such as epitaxial wafer Organometallic Chemistry gas in plasma etching in the semiconductor manufacturing industry, light emitting diode process industry
Phase depositing operation etc. is required using gas purifier to provide, ensure high-pure gas, and the requirement for purity is more next
It is higher.Most current related process requires impurity content in gas to be no more than 1ppm, wants in the production technology of integrated circuit
Purity is asked to reach 7N~8N, individual requests impurity content is lower than 1ppb.
It is chemosorbent that the gas purifier of high-purity, which generallys use active metal, when unstripped gas is pure by active metal
When changing bed, impurity in gas, such as the O in inert gas2、H2O、CO、CO2、CH4Chemisorption occurs for equal gases and active metal
Reaction, to obtain 99.9999% or more ultra-pure gases.
Conventional alloy absorbent-type gas purifier on Vehicles Collected from Market, usually single alloy column, handles flow up to tens of
Per hour, but often function is not complete enough for cubic meter, and needing to increase additional subsidiary body can guarantee the normal use.For example,
Gas purge system (the patent document with hydrogen adsorption and filtering integrated form device of Saes Pure Gas Inc.'s invention
When CN1361709), in order to solve inert gas or nitrogen purification, rustless steel container, which is heated to 200 DEG C or more, can be released largely
The problem of hydrogen, increases hydrogen adsorption device in purification column outlet side again, i.e., same cylinder cannot remove customary impurities simultaneously
And hydrogen, which increase the complexity of gas purifier, volume and costs；And single-column purifier application risk is larger, and one
Denier break down then entire purifier be not available, will cause more great loss, it is common practice to prepare two or with
On purifier the using and the reserved, but this significantly increase expense investment.
Therefore, develop it is a kind of equip the integrated gas purifier that can remove whole customary impurities purification columns simultaneously, and
And structure is simple, easy to maintain, the efficient, long-life, flexible modulation Double-pillar purifier, for purifier it is safe and efficient,
Large-scale application is of great significance.
Summary of the invention
For the shortcoming of gas purification apparatus in the prior art, the purpose of the present invention is to provide a kind of Double-pillar gas
Body purifier, the device is strong with compatibility, structure is simple, easy to maintain, stability is high, purification effect is good, treating capacity is big, warp
The features such as durable, function point analysis is flexible long.
To achieve the above object, the invention adopts the following technical scheme:
A kind of Double-pillar gas purifier, including purifier cabinet, two purification columns, heater, insulating layer, support fixation
Mechanism, control circuit, touch screen, wherein purification column, heater, insulating layer are fixed on purifier cabinet by support fixed mechanism
It is internal；Filling purifying alloy inside the purification column, filter is installed at both ends, and welds gas-guide tube；Two purification column parallel connections；Often
A purification column outlet side is installed by fin structure radiator；Mounted in purifying outer surface of column, insulating layer is sleeved on to be added the heaters set
Hot device outer layer；The control circuit and touch screen can control the operation of purifier automatic or manual.
Wherein, the purification column is the linear type cylindrical body of metal material, and purifying alloy is in Zr, Fe, Y, Mn and Ni
One or more alloys made of two or more element melting.
Wherein, the cylinder outer diameter of the purification column is 50-200mm, internal diameter 40-190mm, is highly 200-1500mm.
Wherein, it is connected between the purification column and cabinet inside pipeline using modes such as welding or VCR.
Wherein, the purification column single-column purifying flow is in 1-50Nm3Between/h, twin columns maximum purifies flow up to 100Nm3/
H, operating pressure 0.5-25MPa.
Wherein, the heater can be heating rod, resistance heater, ceramic heater, electrical coil resistance heater etc., set
Mounted in purifying outer surface of column, single group heating power, can single group or multiple groups heating according to purifying column length between 400-2500W
Device is used in parallel, and every group of heater configures individual thermoelectric idol.
Wherein, the heating, cooling, pneumatic operated valve of the process controls purifier such as PLC or KingView can be used in the control circuit
The functions such as door opening and closing, while also having the function of working life timing and prompting, the protection of temperature/pressure pathological system and feedback etc.,
And by touch screen operation, touch screen can be PLC man-machine interface or industrial panel computer.
Compared with prior art, the present invention has the advantage that
(1) complete function, single-column impurity removal type are more.By exploitation novel alloy and different alloy combination, realize
Single purification column can remove the O in the gases such as inert gas, nitrogen, hydrogen simultaneously2、N2、H2、CO、CO2、H2O etc. is a variety of miscellaneous
Matter is improved work efficiency without other attachment devices.
(2) structure is simple, effectively improves purifier stability.Dual beam configuration is used in purifier, is being improved service life
While with purification performance, has the advantages that flexible modulation.Can the using and the reserved, then without configure another purifier in case
With；Can also twin columns work at the same time, increase purifier maximum throughput and service life；It can also two purification columns filling heterogeneities
Alloy to realize a variety of purifying functions simultaneously.
(3) manufacturing and use cost is greatly reduced.To guarantee that purifier continually and steadily supplies ultra-pure gases, usually
Way is configuration 2 or more purifier the using and the reserved, and using Double-pillar purifier of the invention, single purifier can be realized one
It is standby with one, reduce the investment of a purifier, and twin columns are integrated in same purifier, what compared to 2 purifiers used
Valve, control instrument lamp part less more simplify, and volume also greatly reduces, therefore easily facilitates manufacture and maintenance, cost
Almost drop by half.
Detailed description of the invention
Fig. 1 is the workflow schematic diagram of the gas purifier of embodiment 1.
Fig. 2 be embodiment 1 gas purifier to the He gaseous mixture containing plurality of impurities before purification (a), after purification (b)
Chromatogram spectrogram.
Specific embodiment
Below in conjunction with drawings and examples, the invention will be described in further detail, but embodiments of the present invention not only limit
In this.
Double-pillar gas purifier of the invention includes purifier cabinet, two purification columns, heater, insulating layer, controls
Circuit, support fixed mechanism, purification column, heater, insulating layer are fixed on purifier cabinet inside by support fixed mechanism；Purifying
Filling purifying alloy inside column, filter is installed at both ends, and welds gas-guide tube；Two purification column parallel connections；Each purification column outlet
End installation fin structure radiator；Heaters set is mounted in purifying outer surface of column, by control circuit process control, the insulating layer set
Mounted in heater outer layer.
As shown in Figure 1, being a kind of workflow schematic diagram of typical Double-pillar gas purifier of the invention.The twin columns
Type gas purifier includes purification column A, B that 2 diameters are 130mm, and twin columns can be used in parallel according to traffic needs or one with one
Standby, maximum processing flow is 60Nm when used in parallel3/h.Unstripped gas is passed through purifying by purification column lower end after particulate filter
Column flows out from upper end and is cooled to 80 DEG C hereinafter, exporting ultra-pure gases after then passing through check valve by air-cooling fin.It is pure
Change device by program controlled heater device and pneumatic diaphragm valve automatic running, pneumatic operated valve is moved by compressed air or other bottled gas drives,
When process control solenoid valves, compressed air-driven pneumatic operated valve is opened, and when the power-off of process control solenoid valve, pneumatic operated valve is in
Normally off.
Common purifier operating process is as follows:
(1) purifying appliance mains switch is opened, the hand-operated valve of control compressed air or other bottled gas is opened, for driving gas
Dynamic diaphragm valve.
(2) pneumatic operated valve V3 is opened, so that gas circuit is in bypass gas circuit state, persistently purges certain time, is then turned off pneumatic
Valve V3.
(3) start-up temperature controller opens pneumatic operated valve V1, and device to be purified opens pneumatic operated valve V2 after entering working condition, pure
Change device to start to export high-purity gas.
Embodiment 1
The specific test of the embodiment of the present invention 1 is as follows:
Helium purifier equipped with 2 TiZrMn alloy purification columns (wherein Ti=27%, Mn=40%, Zr=33%),
Column diameter 90mm, length 700mm are purified, the electrical coil resistance heater of power 1kw is selected, runs program by a tablet computer control
System.O will be contained in He2(18.6ppm)、CO(20.11ppm)、CO2(20.13ppm)、N2The unstripped gas of (18.7ppm) is passed through this
In purifier carry out impurity absorption aptitude tests, before purification (a), the chromatogram spectrogram of (b) is as shown in Figure 2 after purification.It produces after purification
Product gas x (O2) < 10ppb, x (CO) < 10ppb, x (CO2) < 5ppb, x (N2) < 10ppb, show that the purifier is had excellent performance,
Impurity absorption depth is big (dropping to 10ppb or less from~20ppm), especially to the N for being not easy to remove2There is good absorption to imitate
Fruit.
It is 10Nm that purifier test, which is in flow, in embodiment 13/ h using the using and the reserved, works alternatively 8 hours Working moulds
It is carried out under formula, working life is not less than 20000 hours under this condition.It will be readily apparent, which can root
According to the quantity for needing to increase purification column in parallel.
Claims (8)
1. a kind of Double-pillar gas purifier, which is characterized in that including purifier cabinet, two purification columns, heater, heat preservations
Layer, support fixed mechanism, control circuit, touch screen, wherein
Purification column, heater, insulating layer are fixed on purifier cabinet inside by support fixed mechanism；
Filling purifying alloy inside the purification column, filter is installed at both ends, and welds gas-guide tube；Two purification column parallel connections；Often
A purification column outlet side is installed by fin structure radiator；
The heaters set is sleeved on heater outer layer mounted in purifying outer surface of column, insulating layer；
The control circuit and the operation of touch screen control purifier automatic or manual.
2. Double-pillar gas purifier according to claim 1, which is characterized in that the purification column is the straight of metal material
Line style cylindrical body, purifying alloy are one kind or more made of two or more the element melting in Zr, Fe, Y, Mn and Ni
Kind alloy.
3. Double-pillar gas purifier according to claim 1, which is characterized in that the cylinder outer diameter of the purification column is
50-200mm, internal diameter 40-190mm are highly 200-1500mm.
4. Double-pillar gas purifier according to claim 1, which is characterized in that the purification column and cabinet inside pipeline
Between using welding or VCR by the way of connect.
5. Double-pillar gas purifier according to claim 1, which is characterized in that the purification column single-column purifying flow exists
1-50Nm3Between/h, it is 100Nm that twin columns maximum, which purifies flow,3/ h, operating pressure 0.5-25MPa.
6. Double-pillar gas purifier according to claim 1, which is characterized in that the heater is heating rod, resistance
Silk heater, ceramic heater or electrical coil resistance heater.
7. Double-pillar gas purifier according to claim 1, which is characterized in that the control circuit uses PLC or group
The heating of state king's process control purifier, cooling, operated pneumatic valve opening and closing, at the same also have working life timing and prompting, temperature/
The function of pressure anomaly system protection and feedback.
8. Double-pillar gas purifier according to claim 7, which is characterized in that the touch screen is PLC man-machine interface
Or industrial panel computer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711439265.1A CN109954372A (en) | 2017-12-26 | 2017-12-26 | A kind of Double-pillar gas purifier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711439265.1A CN109954372A (en) | 2017-12-26 | 2017-12-26 | A kind of Double-pillar gas purifier |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109954372A true CN109954372A (en) | 2019-07-02 |
Family
ID=67022833
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711439265.1A Pending CN109954372A (en) | 2017-12-26 | 2017-12-26 | A kind of Double-pillar gas purifier |
Country Status (1)
| Country | Link |
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| CN (1) | CN109954372A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112978692A (en) * | 2021-03-04 | 2021-06-18 | 北京高麦克仪器科技有限公司 | 780 helium purifier |
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|---|---|---|---|---|
| CN102380313A (en) * | 2010-08-31 | 2012-03-21 | 大阳日酸株式会社 | Gas purifying method and gas purifying apparatus |
| CN203610022U (en) * | 2013-11-21 | 2014-05-28 | 中国科学院大连化学物理研究所 | Metal palladium or palladium alloy composite membrane hydrogen purifier |
| DE102013223233A8 (en) * | 2013-11-14 | 2015-07-30 | Helmholtz-Zentrum Für Umweltforschung Gmbh - Ufz | Method and device for the selective removal of components from gas mixtures |
-
2017
- 2017-12-26 CN CN201711439265.1A patent/CN109954372A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102380313A (en) * | 2010-08-31 | 2012-03-21 | 大阳日酸株式会社 | Gas purifying method and gas purifying apparatus |
| DE102013223233A8 (en) * | 2013-11-14 | 2015-07-30 | Helmholtz-Zentrum Für Umweltforschung Gmbh - Ufz | Method and device for the selective removal of components from gas mixtures |
| CN203610022U (en) * | 2013-11-21 | 2014-05-28 | 中国科学院大连化学物理研究所 | Metal palladium or palladium alloy composite membrane hydrogen purifier |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112978692A (en) * | 2021-03-04 | 2021-06-18 | 北京高麦克仪器科技有限公司 | 780 helium purifier |
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| PB01 | Publication | ||
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| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20190628 Address after: 101407 No. 11 Xingke East Street, Yanqi Economic Development Zone, Huairou District, Beijing Applicant after: YOUYAN ENGINEERING TECHNOLOGY RESEARCH INSTITUTE Co.,Ltd. Address before: No. 2, Xinjie street, Xicheng District, Beijing, Beijing Applicant before: General Research Institute for Nonferrous Metals |
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Application publication date: 20190702 |