CN109877012A - A method of preparing high-densit yttria coating - Google Patents
A method of preparing high-densit yttria coating Download PDFInfo
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- CN109877012A CN109877012A CN201910109348.7A CN201910109348A CN109877012A CN 109877012 A CN109877012 A CN 109877012A CN 201910109348 A CN201910109348 A CN 201910109348A CN 109877012 A CN109877012 A CN 109877012A
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- Prior art keywords
- coating
- spraying
- densit
- yttria
- preparing high
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- 238000000576 coating method Methods 0.000 title claims abstract description 87
- 239000011248 coating agent Substances 0.000 title claims abstract description 85
- 238000000034 method Methods 0.000 title claims abstract description 40
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 239000000725 suspension Substances 0.000 claims abstract description 40
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract description 25
- 238000005507 spraying Methods 0.000 claims abstract description 25
- 238000005516 engineering process Methods 0.000 claims abstract description 22
- 238000007750 plasma spraying Methods 0.000 claims abstract description 18
- 239000007921 spray Substances 0.000 claims abstract description 14
- 239000004065 semiconductor Substances 0.000 claims abstract description 10
- 239000010410 layer Substances 0.000 claims description 20
- 238000005260 corrosion Methods 0.000 claims description 14
- 230000007797 corrosion Effects 0.000 claims description 14
- 230000000873 masking effect Effects 0.000 claims description 14
- 239000011247 coating layer Substances 0.000 claims description 12
- 238000010285 flame spraying Methods 0.000 claims description 7
- 239000002893 slag Substances 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 4
- 238000007654 immersion Methods 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 abstract description 5
- 238000011017 operating method Methods 0.000 abstract 1
- 239000000843 powder Substances 0.000 description 20
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Coating By Spraying Or Casting (AREA)
Abstract
The present invention relates to a kind of method for preparing high-densit yttria coating, the coating of technology preparation is applied to semiconductor field.This method mainly includes following operating procedure: (1) handling the part that part sprays；(2) one layer of very thin yttria coating is sprayed using atmospheric plasma spraying technology；(3) Suspension Technique is combined using spraying again, sprays one layer of yttrium oxide suspension coating；(4) part is cleaned.The coating obtained using which, coating is very fine and close, and the porosity of coating is lower than 1.5%, and the binding force of coating is more preferable, and the hardness of coating is also done, final to obtain the good coating of comprehensive performance.
Description
Technical field
The invention belongs to prepare yttrium coatings art with thermal spraying mode, especially the coating is applied to partly lead
Body apparatus field.
Background technique
With the fast development of semiconductor equipment, foreign countries have carried out the semiconductor equipment for setting about studying 10nm processing procedure, and
The domestic 14nm processing procedure semiconductor equipment below that also conducted a research.With keeping updating for equipment, in equipment zero
The performance of part and the requirement in service life are also higher and higher.By taking the inner cavity of etching apparatus as an example, etching gas when carrying out wafer etching,
Also other components in etch chamber can be eroded to, this requires the parts in etch chamber to have certain corrosion resistance, these
Part is aluminum products mostly, and traditional method is to carry out anodic oxidation to aluminum hardware, but the corrosion resistance of anodic oxidation is
It is not able to satisfy the requirement of equipment, causes the replacement frequency of part excessively high.Recently, domestic development is to spray oxygen on aluminum hardware surface
Change aluminized coating, although improving the corrosion resistance of aluminum components, the replacement frequency of part is still very high.Therefore, in order to improve
The service life of aluminum components reduces the replacement frequency of part, and a kind of stronger coating of corrosion resistance is needed to be coated in part
Surface.And corrosion resistance is usually related with the compactness of coating, coating is finer and close, and etching gas is less susceptible to invade coating
Interior, corrosion resistance is stronger.
Summary of the invention
It is an object of the invention to prepare a kind of high-densit yttria coating, it is equivalent to " dual " coating, using main
Technological core is first to spray one layer of relatively thin yttria coating using atmospheric plasma spraying technology, then again using atmosphere etc.
Plasma spray combination Suspension Technique or supersonic flame spraying combination Suspension Technique spray one layer of relatively thick yttrium oxide
Suspension coating.On the one hand the yttria coating being prepared out in conjunction with matrix is normal yttria coating, binding force
By force；On the other hand, spray one layer of yttrium oxide suspension coating again on the yttria coating, suspension coating have high compactness,
High uniformity, and be all yttria coating for this two layers, the size of powder particles and preparation method for only preparing yttria coating are not
Together, but this two layers is identical material, and physical property is similar, so the binding force between two layers is very high.Height prepared by the present invention
Dense oxide yttrium coating also has good corrosion resistance and binding force while high-densit, is applied to semiconductor equipment and leads
Domain can be improved the corrosion resistance of key components and parts, reduce the replacement frequency of part, improve the service life of part.
To achieve the goals above, the technical scheme is that
A method of high-densit yttria coating is prepared,
(1) before spraying, part is cleaned, does not allow the bits slag and greasy dirt of residual mechanical part；Non-spraying area is blocked
Protection；
(2) one layer of very thin yttria coating is sprayed with atmospheric plasma spraying technology；
(3) Suspension Technique is combined with spraying again, sprays one layer of yttrium oxide suspension coating；
(4) after spraying, coating layer thickness is measured, masking protection is removed, part is cleaned, guarantees part high-cleanness, high.
Spray can be used for the cleaning of the step (1) or the mode of immersion is cleaned, and can be removed with ultrasonic water method
Greasy dirt and bits slag guarantee that part is clean, dry；The method for blocking protection can be using soft method, such as masking tape, or hard side
Method, such as masking tooling.
In the step (2), it is less than total coating layer thickness with yttria coating thickness prepared by atmospheric plasma spraying technology
Half, the range of surface roughness of the coating is in 250-300 μ-in or so.
Spraying combination Suspension Technique in the step (3), can be air plasma spraying combination Suspension Technique；
It is also possible to supersonic flame spraying combination Suspension Technique.
In the step (4), after spraying, thicknesses of layers is measured, guarantees that the thicknesses of layers at each position of components is uniform,
If thicknesses of layers meets the requirements, masking protection can be removed, part is cleaned.
The properties of coating is good.The coating can be used for the pass required on semiconductor equipment to the corrosion resistance of part
Key components.
The invention has the advantages that
1. the present invention is to be combined together yttrium oxide powder coating and yttrium oxide suspension coating, although seeming " bilayer "
Coating, but be substantially yttria coating.
2. on the one hand coating of the present invention has the binding force of yttrium oxide powder coating high, the high performance of microhardness is another
Aspect has the superperformance that the porosity of yttrium oxide suspension coating is low, corrosion resistance is high.The coating can be by both coatings
Excellent performance combine, simultaneously as be inherently yttrium oxide, the difference of the physical property without worrying two painting interlayers
Different, two apply interlayer can harmonious combination.
3. the spraying technology that the present invention uses has atmospheric plasma spraying technology and atmospheric plasma spraying technology to combine
Suspension Technique, supersonic flame spraying technology combination Suspension Technique；By the utilization of three kinds of technologies, obtain to the maximum extent
High-bond, high-densit yttria coating.
4. coating structure of the present invention is novel, with this novel high-tech of suspension, can obtain has good synthesis
The oxidation solution coating of performance, improves the service life of the part of semiconductor equipment.
Detailed description of the invention
Fig. 1 is overall structure figure of the present invention.
In Fig. 1, A1 is the yttria coating of atmospheric plasma spraying technology spraying；A2 is that air plasma spraying combination is outstanding
Supernatant liquid technology or the yttrium oxide suspension coating of supersonic flame spraying combination Suspension Technique preparation.
Specific embodiment
The present invention program is described in detail in conjunction with attached drawing 1 and example.
(1) before spraying, part is cleaned, the bits slag and greasy dirt of part are all got rid of, it is ensured that the clean degree of part, then
The place not sprayed is subjected to masking protection；
(2) one layer of relatively thin yttria coating is sprayed using atmospheric plasma spraying technology, the thickness of the coating is less than
The half of total coating layer thickness.The yttrium oxide powder of air plasma spraying preparation is using conventional yttrium oxide powder.
(3) spraying technology combination Suspension Technique is used again, sprays one layer of yttrium oxide suspension in yttria coating surface
Coating.Can be using atmospheric plasma spraying technology combination Suspension Technique one layer of yttrium oxide suspension coating of spraying, it can also be with
One layer of yttrium oxide suspension coating is sprayed using supersonic flame spraying technology combination Suspension Technique.The thickness of the coating is greater than
The half of total coating layer thickness.
5 μm of yttrium oxide powder particle diameter < for preparing suspension, the liquid for preparing suspension can be using water, ethyl alcohol etc.
Liquid.
(4) after spraying, the coating layer thickness at the thickness of coating, the especially angle R is measured, if coating layer thickness is met the requirements,
Then remove masking protection.Cleaning of Parts is carried out in clean room, guarantees that part has high cleanliness.
(5) there is good comprehensive performance, the hole of coating using the high-densit yttria coating of the method for the present invention preparation
Rate < 1.5%, binding force > 14MPa, corrosion efficiency > 0.45h/mil, microhardness > 4GPa.The coating is applied to partly lead
Part in body equipment, plays the role of corrosion resistance, can reduce the replacement efficiency of part, improve the service life of part.
Embodiment one
Firstly, the bits slag and greasy dirt of piece surface is cleaned up with ultrasonic wave water washing part, guarantee that piece surface is clear
It is clean.The place for not needing spraying is subjected to masking protection with masking tape again.
Secondly, spraying yttria coating (i.e. A1 in Fig. 1) using atmospheric plasma spraying technology, the business of selection is high
Pure yttrium oxide powder, powder purity are >=99.95%, powder D50Partial size is 30 μm or so.The yttria coating of spraying with a thickness of
60-80 μm or so, the average surface roughness of coating is 280 μ-in.
Again, using atmospheric plasma spraying technology combination Suspension Technique spraying yttrium oxide suspension coating (i.e. in Fig. 1
A2).The business of selection high-purity yttrium oxide powder, powder purity are >=99.95%, powder D50Partial size is 2.5 μm or so, is matched
The liquid of suspension is set using water, powder concn sprays yttrium oxide suspension coating, coating layer thickness 120- 25% or so
140 μm or so, the average surface roughness of coating is 160 μ-in.
Finally, the coating layer thickness of measurement part each section, meets drawing requirement, remove masking protection, then in clean room
It is cleaned, obtains the part of high-cleanness, high.
Embodiment two
Firstly, cleaning by degreasing, removes the impurity such as the greasy dirt of piece surface, then part is dried up with compressed air, then uses
The place for not needing spraying is carried out masking protection by tooling combination masking tape.
Then, yttria coating (i.e. A1 in Fig. 1) is sprayed using atmospheric plasma spraying technology, the business of selection is high
Pure yttrium oxide powder, powder purity are >=99.9%, powder D50Partial size is 40 μm or so.The yttria coating of spraying with a thickness of
80-100 μm or so, the average surface roughness of coating is 300 μ-in.
Subsequently, yttrium oxide suspension coating (i.e. Fig. 1 is sprayed using supersonic flame spraying technology combination Suspension Technique
In A2).The business of selection high-purity yttrium oxide powder, powder purity are >=99.9%, powder D50Partial size is 1 μm or so, is matched
The liquid of suspension is set using ethyl alcohol, powder concn sprays yttrium oxide suspension coating, coating layer thickness 150- 35% or so
180 μm or so, the average surface roughness of coating is 200 μ-in.
Finally, the coating layer thickness of measurement part each section, meets drawing requirement, remove masking protection, then in clean room
It is cleaned, obtains the part of high-cleanness, high.
The foregoing is only a preferred embodiment of the present invention, is not limited to well-behaved invention, for this field skill
For art personnel, the present invention may have various change and combination.The present invention can be used for the various to corrosion resistance of semiconductor equipment
There is the part of demand, but is also not limited to semiconductor equipment.All within the spirits and principles of the present invention, made any to repair
Change, equivalent replacement, improvement etc., should all be included in the protection scope of the present invention.
Claims (6)
1. a kind of method for preparing high-densit yttria coating, feature include:
(1) before spraying, part is cleaned, does not allow the bits slag and greasy dirt of residual mechanical part；Non-spraying area is carried out to block protection；
(2) one layer of very thin yttria coating is sprayed with atmospheric plasma spraying technology；
(3) Suspension Technique is combined with spraying again, sprays one layer of yttrium oxide suspension coating；
(4) after spraying, coating layer thickness is measured, masking protection is removed, part is cleaned, guarantees part high-cleanness, high.
2. a kind of method for preparing high-densit yttria coating as described in claim 1, which is characterized in that the step (1)
Cleaning spray can be used or the mode of immersion is cleaned, can degrease and consider to be worth doing slag with ultrasonic water method, guarantee part
Completely, dry.
3. a kind of method for preparing high-densit yttria coating as described in claim 1, which is characterized in that the step (2)
In, the half of total coating layer thickness, the surface of the coating are less than with yttria coating thickness prepared by atmospheric plasma spraying technology
Roughness range is in 250-300 μ-in.
4. a kind of method for preparing high-densit yttria coating as described in claim 1, which is characterized in that the step (3)
In spraying combination Suspension Technique, air plasma spraying combination Suspension Technique can be used；Or using supersonic speed fire
Flame spraying combines Suspension Technique.
5. a kind of method for preparing high-densit yttria coating as described in claim 1, which is characterized in that the step (4)
In, after spraying, thicknesses of layers is measured, guarantees that the thicknesses of layers at each position of components is uniform, if thicknesses of layers meets the requirements,
Masking protection can be then removed, part is cleaned.
6. a kind of method for preparing high-densit yttria coating as described in claim 1, which is characterized in that the coating is comprehensive
It can be good.The coating can be used for the key components and parts required on semiconductor equipment to the corrosion resistance of part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910109348.7A CN109877012A (en) | 2019-02-09 | 2019-02-09 | A method of preparing high-densit yttria coating |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910109348.7A CN109877012A (en) | 2019-02-09 | 2019-02-09 | A method of preparing high-densit yttria coating |
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| Publication Number | Publication Date |
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| CN109877012A true CN109877012A (en) | 2019-06-14 |
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| CN201910109348.7A Pending CN109877012A (en) | 2019-02-09 | 2019-02-09 | A method of preparing high-densit yttria coating |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112063956A (en) * | 2020-08-10 | 2020-12-11 | 暨南大学 | Suspension plasma spraying high-purity Y2O3Erosion-resistant coating and preparation method and application thereof |
| CN114507837A (en) * | 2022-01-17 | 2022-05-17 | 北京富创精密半导体有限公司 | Preparation method of high-compactness voltage-resistant plasma spraying yttrium oxide coating |
| CN116356319A (en) * | 2022-12-13 | 2023-06-30 | 沈阳富创精密设备股份有限公司 | Preparation method of high-compactness corrosion-resistant high-cleanness composite coating |
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Address after: No.18a-1, Feiyun Road, Hunnan District, Shenyang City, Liaoning Province Applicant after: Shenyang fuchuang precision equipment Co.,Ltd. Address before: No.18a-1, Feiyun Road, Dongling District, Shenyang, Liaoning Province, 110000 Applicant before: Shenyang Fortune Precision Equipment Co.,Ltd. |
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Application publication date: 20190614 |