CN109807028A - A method of improving photoresist crystallization on slot coated head - Google Patents
A method of improving photoresist crystallization on slot coated head Download PDFInfo
- Publication number
- CN109807028A CN109807028A CN201910244483.2A CN201910244483A CN109807028A CN 109807028 A CN109807028 A CN 109807028A CN 201910244483 A CN201910244483 A CN 201910244483A CN 109807028 A CN109807028 A CN 109807028A
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- China
- Prior art keywords
- slot coated
- coated head
- photoresist
- coating
- head
- Prior art date
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- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 40
- 238000000034 method Methods 0.000 title claims abstract description 20
- 238000002425 crystallisation Methods 0.000 title claims abstract description 13
- 230000008025 crystallization Effects 0.000 title claims abstract description 13
- 238000000576 coating method Methods 0.000 claims abstract description 55
- 239000011248 coating agent Substances 0.000 claims abstract description 54
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 34
- VDGJOQCBCPGFFD-UHFFFAOYSA-N oxygen(2-) silicon(4+) titanium(4+) Chemical compound [Si+4].[O-2].[O-2].[Ti+4] VDGJOQCBCPGFFD-UHFFFAOYSA-N 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 3
- 229920006334 epoxy coating Polymers 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 239000003921 oil Substances 0.000 claims 1
- 238000004140 cleaning Methods 0.000 abstract description 6
- 239000013078 crystal Substances 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 3
- 238000009434 installation Methods 0.000 abstract description 3
- 230000006872 improvement Effects 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 10
- 239000004744 fabric Substances 0.000 description 6
- 238000005286 illumination Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000011161 development Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 241001365789 Oenanthe crocata Species 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- QNWMNMIVDYETIG-UHFFFAOYSA-N gallium(ii) selenide Chemical compound [Se]=[Ga] QNWMNMIVDYETIG-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000001782 photodegradation Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
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Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
The invention discloses a kind of methods of photoresist crystallization on improvement slot coated head, are that hydrophobic oleophobic coating is arranged on the outer surface of the slot coated head.By the way that hydrophobic oleophobic coating is arranged in the outer surface of slot coated head in the present invention, solve the problems, such as that photoresist crystallizes on slot coated head, efficiently reduce the residual of slot coated head surface photoresist crystal, to improve the cleaning effect of slot coated head, it does not need additionally to remove removing photoresistance crystal, investment is reduced, the scrappage of substrate is reduced while improving utilization rate of equipment and installations.
Description
Technical field
The present invention relates to slot coating technique fields, crystallize more particularly to photoresist on a kind of improvement slot coated head
Method.
Background technique
Slit coating is a kind of high-accuracy coating method, is applied not only to conventional industries: such as adhesive tape, motion picture negation, function
Can diaphragm, encapsulating film, wall paper manufacture, also be used in high value-added electronic industry: as printed circuit board, capactive film, optical film,
The processing procedures such as Surface hardened layer coating, aobvious optic placode light blockage coating.And more applied recently in the renewable sources of energy industry quickly grown: such as copper
In the preparation section of indium gallium selenium thin-film solar cells, high one's share of expenses for a joint undertaking solar battery, lithium battery etc..
The working principle of slit coating is: under pressure, coating fluid is squeezed out from the gap of coating head and is transferred to
On substrate.The technical research of slit coating at present focuses primarily upon in coating head design, because it is to determine that coating quality is good
One of bad key factor.Existing slot coated head is usually by upper die and lower die and the gasket between upper die and lower die
It constitutes, the setting of gasket can form the narrow-gap channel that side has discharge port between upper mold and lower die, and coating fluid passes through described
Narrow-gap channel is squeezed out to discharge port to be coated operation.
When the coating fluid is photoresist, due under the action of external force during slot coated and the volatilization of liquid, photoresist
On being very easy to crystallize on the front end face of lip of slot coated head and the inclined surface of the front end face two sides, cause to coating head
Pollution, be easy to pollute to being coated with photoresist on base material in coating operations next time, influence the operation of coating.
To solve the above-mentioned problems, slit painting is attached to remove it is generally necessary to which cleaning device is additionally arranged in the prior art
The photoresist crystallized on the leftover of bolt of cloth, but mechanical mechanism is complicated, higher cost, and easily causes to damage to slot coated head.
Summary of the invention
In order to make up the defect of prior art, the present invention provides a kind of method for improving photoresist crystallization on slot coated head.
The technical problems to be solved by the invention are achieved by the following technical programs:
A method of improve slot coated head on photoresist crystallization, be arranged on the outer surface of the slot coated head it is hydrophobic
Oleophobic coating.
Further, the slot coated head includes upper die and lower die and is located between the upper mold and the lower die
Gasket, between the upper mold and lower die formed for discharging slit, the hydrophobic oleophobic coating be set to the upper mold and
On the outer surface of lower die.
Further, the hydrophobic oleophobic coating is nanometer titanium dioxide silicon coating.
Further, the hydrophobic oleophobic coating is epoxy coating.
Further, the hydrophobic oleophobic coating is set to the outer surface of the slot coated head by spraying process.
The invention has the following beneficial effects:
By the way that hydrophobic oleophobic coating is arranged in the outer surface of slot coated head in the present invention, solves photoresist knot on slot coated head
Brilliant problem, efficiently reduces the residual of slot coated head surface photoresist crystal, to improve the cleaning of slot coated head
Effect does not need additionally to remove removing photoresistance crystal, reduces investment, and the scrappage of substrate is reduced while improving utilization rate of equipment and installations.
Specific embodiment
The present invention will now be described in detail with reference to examples, and the examples are only preferred embodiments of the present invention,
It is not limitation of the invention.
When slot coated, when the coating fluid is photoresist, due under the action of external force during slot coated and liquid
Volatilization, photoresist be very easy to crystallization slot coated head the front end face of lip and the inclined surface of the front end face two sides on,
The pollution to coating head is caused, is easy to pollute coating photoresist on base material in coating operations next time.It is existing
Additional setting cleaning device is usually required in technology to remove the photoresist for being attached to and having crystallized on slot coated head, but photoresist knot
It is difficult to clean, cleaning device mechanical mechanism complexity, higher cost after crystalline substance, and easily slot coated head is caused to damage.
Based on this, the present invention, which provides a kind of method for improving photoresist crystallization on slot coated head, to be applied in the slit
Hydrophobic oleophobic coating is set on the outer surface of the leftover of bolt of cloth.
Compared with prior art, the present invention is by improving existing slot coated head, in the appearance of slot coated head
Hydrophobic oleophobic coating is set on face, prevents photoresist crystallization to be attached on slot coated head, to improve the clear of slot coated head
Clean effect does not need additionally to remove removing photoresistance crystal, reduces investment, and scrapping for substrate is reduced while improving utilization rate of equipment and installations
Rate.
The definition of " hydrophobic " comes from the U.S., briefly refers to that fabric resists the ability being soaked in water, is specifically one
Part waterproof or water resistant product after smearing a kind of hydrophobic material characteristic obtained and it can resist how strong hydraulic pressure without quilt
It soaks.
Hydrophobic fabric resists water flow by the contact angle of offer and water.If a drop water drop falls on fabric and contact angle
Less than 90 degree, then it will be immersed in fabric, if instead contact angle is greater than 90 degree, it then tends to slide.
Hydrophobic oleophobic coating has biggish contact angle, when photoresist crystal contacts slot coated head surface, connects first
Contact hydrophobic oleophobic coating, form the dirty point with larger contact angle, dirty point is difficult to adhere in hydrophobic oleophobic coating, by compared with
Small dirty point sink is integrated into biggish dirty group, under gravity, slides from hydrophobic oleophobic coating surface, is conducive to promote
It is slid into dirty aggregation, keeps the cleaning on hydrophobic oleophobic coating surface.
In the present invention, the hydrophobic oleophobic coating is preferably nanometer titanium dioxide silicon coating.The nanometer titanium dioxide silicon coating
Nano silica i.e. after hydrophobic functional group modification, it is possible to understand that, there is hydrophobic function in the nano silica
Base, so that the antifouling hydrophobic oleophobic coating has preferable hydrophobicity.
In the present invention, the hydrophobic oleophobic coating is more preferably epoxy coating.Epoxy resin is organic compound, tool
There is very strong corrosion resistance, it is especially strong to metal and nonmetallic adhesive force, has good hydro-oleophobicity to photoresist.
It should be noted that hydrophobic oleophobic coating of the invention includes but is not limited to different materials enumerated supra,
Can be other it is unlisted in the present embodiment but by other materials well-known to those skilled in the art.
In the present invention, the method for forming hydrophobic oleophobic coating on slot coated head is also not especially limited, can be adopted
The conventional method of coating is formed with this field.Preferably, the hydrophobic oleophobic coating be set to by spraying process it is described narrow
Stitch the outer surface of coating head.
The slot coated head includes upper die and lower die and the gasket that is located between the upper mold and the lower die, institute
The slit formed between upper mold and lower die for discharging is stated, the hydrophobic oleophobic coating is set to the appearance of the upper die and lower die
On face.
It is appreciated that the slot coated head further includes other structures, for component as known to those skilled in the art, knot
Structure and principle are all that this technology personnel can be learnt by technical manual or be known by routine experiment method, no longer superfluous herein
It states.
The hydrophobic oleophobic coating can be set on whole outer surfaces of the upper die and lower die, also can be set in institute
The partial outer face of upper die and lower die is stated, for example, the hydrophobic oleophobic coating can be set in the lip of the slot coated head
Front end face and the front end face two sides inclined surface on.
In the present invention, the material of slot coated head is not especially limited, can be glass, metal material or polymer.
In the present invention, photoresist squeezes out from the slit of slot coated head and photoresist is transferred on substrate and forms photoresist layer.
It should be noted that photoresist is a kind of photosensitive material, and main constituents: resin, emulsion, solvent, solid content,
The photoresist can be eurymeric photoresist, or minus photoresist.Eurymeric photoresist is being exposed by the part (by UV photodegradation) of illumination
The part not by illumination is washed when washing, then demould when photodevelopment.Minus photoresist is by the part (UV of illumination
Light reaction, molecule are stronger), wash the part not by illumination when exposure development, demoulding when wash by
The part of UV illumination；Therefore, if it is eurymeric photoresist, then target pattern is translucent material；If it is minus photoresist, then target figure
Case is light-proof material.The film comprising target pattern or mask plate are covered on to the substrate surface for having filled photoresist, in this way,
During exposure development, wherein the corresponding region of target pattern will not be exposed, and other regions can expose, in this manner it is possible to
Target pattern will be formd by the region that developer solution washes photosensitive material after unexposed area development.
Embodiments of the present invention above described embodiment only expresses, the description thereof is more specific and detailed, but can not
Therefore limitations on the scope of the patent of the present invention are interpreted as, as long as skill obtained in the form of equivalent substitutions or equivalent transformations
Art scheme should all be fallen within the scope and spirit of the invention.
Claims (5)
1. a kind of method for improving photoresist crystallization on slot coated head, which is characterized in that it is in the outer of the slot coated head
Hydrophobic oleophobic coating is set on surface.
2. improving the method for photoresist crystallization on slot coated head as described in claim 1, which is characterized in that the slot coated
Head includes upper die and lower die and the gasket being located between the upper mold and the lower die, is formed between the upper mold and lower die
For the slit of discharging, the hydrophobic oleophobic coating is set on the outer surface of the upper die and lower die.
3. improving the method for photoresist crystallization on slot coated head as described in claim 1, which is characterized in that the hydrophobic oleophobic
Coating is nanometer titanium dioxide silicon coating.
4. improving the method for photoresist crystallization on slot coated head as described in claim 1, which is characterized in that, it is described hydrophobic thin
Oil coating is epoxy coating.
5. improving the method for photoresist crystallization on slot coated head as described in claim 1, which is characterized in that the hydrophobic oleophobic
Coating is set to the outer surface of the slot coated head by spraying process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910244483.2A CN109807028A (en) | 2019-03-28 | 2019-03-28 | A method of improving photoresist crystallization on slot coated head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910244483.2A CN109807028A (en) | 2019-03-28 | 2019-03-28 | A method of improving photoresist crystallization on slot coated head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109807028A true CN109807028A (en) | 2019-05-28 |
Family
ID=66610832
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910244483.2A Pending CN109807028A (en) | 2019-03-28 | 2019-03-28 | A method of improving photoresist crystallization on slot coated head |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109807028A (en) |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1970300A (en) * | 2005-11-25 | 2007-05-30 | 三星电子株式会社 | Method of forming hydrophobic coating layer on surface of nozzle plate of inkjet printhead |
| US20070120889A1 (en) * | 2005-11-25 | 2007-05-31 | Kang Sung-Gyu | Method of forming hydrophobic coating layer on surface of nozzle plate of inkjet printhead |
| KR20070084877A (en) * | 2006-02-22 | 2007-08-27 | (주)에스티아이 | Coating method of inkjet print head nozzle |
| CN205270029U (en) * | 2015-10-28 | 2016-06-01 | 深圳市盛波光电科技有限公司 | Slit coating machine and gasket thereof |
| CN107057101A (en) * | 2017-04-19 | 2017-08-18 | 苏州圣咏电子科技有限公司 | The preparation method and adhesive tape for wiper blade of a kind of adhesive tape for wiper blade |
| CN108296086A (en) * | 2016-09-13 | 2018-07-20 | 株式会社斯库林集团 | Nozzle cleans component, nozzle clearing apparatus, apparatus for coating |
| CN108686894A (en) * | 2018-08-17 | 2018-10-23 | 江西鸿格科技有限公司 | The precise extruding mold head of coating machine |
| CN108944051A (en) * | 2017-11-20 | 2018-12-07 | 广东聚华印刷显示技术有限公司 | The surface treatment method of nozzle |
| CN109604127A (en) * | 2018-12-17 | 2019-04-12 | 北京航空航天大学 | A spray preparation method for industrialized anti-stripping large-area superhydrophobic surface |
-
2019
- 2019-03-28 CN CN201910244483.2A patent/CN109807028A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1970300A (en) * | 2005-11-25 | 2007-05-30 | 三星电子株式会社 | Method of forming hydrophobic coating layer on surface of nozzle plate of inkjet printhead |
| US20070120889A1 (en) * | 2005-11-25 | 2007-05-31 | Kang Sung-Gyu | Method of forming hydrophobic coating layer on surface of nozzle plate of inkjet printhead |
| KR20070084877A (en) * | 2006-02-22 | 2007-08-27 | (주)에스티아이 | Coating method of inkjet print head nozzle |
| CN205270029U (en) * | 2015-10-28 | 2016-06-01 | 深圳市盛波光电科技有限公司 | Slit coating machine and gasket thereof |
| CN108296086A (en) * | 2016-09-13 | 2018-07-20 | 株式会社斯库林集团 | Nozzle cleans component, nozzle clearing apparatus, apparatus for coating |
| CN107057101A (en) * | 2017-04-19 | 2017-08-18 | 苏州圣咏电子科技有限公司 | The preparation method and adhesive tape for wiper blade of a kind of adhesive tape for wiper blade |
| CN108944051A (en) * | 2017-11-20 | 2018-12-07 | 广东聚华印刷显示技术有限公司 | The surface treatment method of nozzle |
| CN108686894A (en) * | 2018-08-17 | 2018-10-23 | 江西鸿格科技有限公司 | The precise extruding mold head of coating machine |
| CN109604127A (en) * | 2018-12-17 | 2019-04-12 | 北京航空航天大学 | A spray preparation method for industrialized anti-stripping large-area superhydrophobic surface |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
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| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190528 |