CN109775671B - An ultrapure gas purification system and process based on normal temperature adsorption process - Google Patents

Abstract

The present invention relates to purification of bulk gases used in the field of semiconductor chip manufacturing. An ultrapure gas purification system based on a normal temperature adsorption process comprises a single device with two adsorption reactors, corresponding switching valves, corresponding pipelines, a regenerated gas heater, a regenerated gas cooler and a control system; the adsorption reactor is respectively filled with two kinds of fillers, and deoxidizer and nickel catalyst are sequentially filled from the inflow side to the outflow side of the raw material gas. The process is simple, the impurity is removed by a one-step method, the cost of the nickel catalyst is far higher than that of the deoxidizer, the adsorption capacity of the deoxidizer to oxygen, water and carbon dioxide is higher than that of the nickel catalyst, the raw material gas is firstly purified by the deoxidizer, the ppm-level impurities in the raw material are firstly removed to 10ppb, and then the raw material gas is subjected to the nickel catalyst, and the nickel catalyst only needs to be filled with the adsorption capacity required for removing the 10ppb impurities, so that the filling capacity of the nickel catalyst with high cost can be reduced, and the purification cost is reduced.

Description

An ultrapure gas purification system and process based on normal temperature adsorption process

technical field

The invention relates to the purification of bulk gases used in the field of conductor chip manufacturing, in particular to a purification system for purifying nitrogen and argon into ultrapure gases based on a normal temperature adsorption process.

technical background

The demand for bulk gases such as nitrogen and argon in the semiconductor chip manufacturing process mainly comes from cryogenic air separation, in which the content of oxygen, water, carbon dioxide, carbon monoxide, hydrogen and non-methane hydrocarbons as impurities is at the ppm level, while the chip manufacturing process The content requirements of various impurities in the gas are generally below 1ppb, so it is necessary to further purify the bulk gas to meet the process requirements.

In the current adsorption process purification, only oxygen, water, and carbon dioxide can be removed. If carbon monoxide, hydrogen, and non-methane hydrocarbons need to be further removed, a catalytic oxidation process needs to be added at the front end of the adsorption process. The catalytic oxidation process needs to heat the gas to At about 300 degrees Celsius, it passes through the precious metal catalyst bed. The purpose is to oxidize carbon monoxide, hydrogen and non-methane hydrocarbons in the gas into water and carbon dioxide and then remove them in the back-end adsorption process. This will not only increase the cost of the purifier, but also cause the heating The reason that the gas reaches the reaction temperature causes the operation cost to increase, the complexity of the purifier to increase, and the operation reliability to decrease.

In the current adsorption process purification, a regenerated gas heater and a regenerated gas cooler are used to regenerate the two adsorption reactors through the switching of high-temperature resistant valves. In this way, the system needs to introduce high-temperature bellows valves, which can currently meet the requirements of Only one supplier in the United States has the conditions, and the cost is high, and the delivery time will take about 20 weeks.

Contents of the invention

The purpose of the present invention is to solve the above problems, provide an ultra-pure gas purification system based on the normal temperature adsorption process, greatly reduce the investment cost of the purifier and the purification operation cost, and can also make the purifier miniaturized and reduce the occupied area of the power room. On the other hand, avoiding the use of high-temperature bellows valves by adopting two regenerative gas heaters and two regenerative gas coolers can greatly reduce the cost of valves and shorten the procurement cycle and delivery cycle. In addition, the present invention also provides an ultra-pure gas purification based on the normal temperature adsorption process, which can remove oxygen, water, carbon dioxide, carbon monoxide, hydrogen and non-methane hydrocarbons in the bulk gas to below 1ppb in one step, without introducing a catalytic oxidation process, so Avoid the use of expensive noble metal catalysts.

In order to solve the above problems, the technical solution adopted in the present invention is: an ultra-pure gas purification system based on the normal temperature adsorption process, including two adsorption reactors, one for standby and one for use, corresponding switching valves, corresponding pipelines, regeneration gas Heater, regenerated gas cooler and control system; the adsorption reactor is filled with two kinds of fillers respectively, and the deoxidizer and nickel catalyst are filled sequentially from the inflow side of the raw material gas to the outflow side.

The inlet of the adsorption reactor is connected to the inlet of the raw material gas through the raw gas input pipeline and switching valve, and the gas outlet of the adsorption reactor is connected to the product gas outlet through the product gas output pipeline and switching valve; the bypass on the raw gas input pipeline is connected to regeneration Gas output pipeline, regeneration gas cooler and switching valve are installed on the regeneration gas output pipeline, the regeneration gas output pipeline is connected to the air release port; the product gas output pipeline is bypassed to connect the regeneration gas input pipeline, and the regeneration gas input pipeline is installed with Regeneration gas heater and switching valve.

The regeneration gas input pipeline is connected to the hydrogen inlet through a pipeline, and a hydrogen inlet valve is installed on the pipeline.

The switching valve adopts an electronic grade diaphragm valve or a bellows valve.

The filling volume ratio of the nickel catalyst and the deoxidizer is Va/Vb=0.1-0.6; more preferably Va/Vb=0.2-0.4.

The nickel catalyst is a nickel catalyst capable of removing trace oxygen, water, carbon dioxide, carbon monoxide, hydrogen and non-methane hydrocarbons in the gas; ~80wt% nickel metal; more preferably loaded with 30~50wt% nickel catalyst.

The bed of the adsorption reactor is provided with a temperature measuring point, and the control system includes a CPU central control unit, which is respectively connected with a flow switch, a pressure sensor, a temperature sensor, a relay, a contactor, and a display panel.

In the ultra-pure gas purification process based on the normal temperature adsorption process described in the present invention, one standby and one active adsorption reactor are respectively in the purification stage and the regeneration stage;

Purification stage: After the raw material gas enters the adsorption reactor, it is firstly purified by a deoxidizer to absorb oxygen, water, and carbon dioxide, and the ppm-level impurities in the raw material are first removed to 10ppb, and then purified by a nickel catalyst to continue to remove oxygen, water, and carbon dioxide. Water, carbon dioxide, carbon monoxide, hydrogen and non-methane hydrocarbons are further removed to below 1ppb;

Regeneration stage: the regeneration gas enters the adsorption reactor through the inductive gas heater, and the high-temperature regeneration gas takes the water vapor adsorbed by the adsorption reactor during the purification stage out of the bed, and after being cooled by the regeneration gas cooler, it is vented at a high level through the vent port; and then Hydrogenation regeneration, the hydrogen is used as the reducing gas of the nickel catalyst bed and the deoxidizer bed to regenerate the adsorption reactor, and after being cooled by the regeneration gas cooler, it is vented at a high level through the vent port.

Said that when the adsorption reactor is in the regeneration stage, the gas heater will heat the regeneration gas to 280 degrees Celsius, and then input it into the adsorption reactor.

When the adsorption reactor is processing the purification stage, the temperature measuring point set on the bed of the adsorption reactor detects that there is an abnormal temperature rise and reaches the interlock value, and the system starts the interlock shutdown program.

Compared with similar products in the field, the present invention has outstanding substantive features:

1. The system structure is simple. Two adsorption reactors, one for standby and one for use, need to be automatically regenerated online after the adsorption is saturated to restore the adsorption activity. The two adsorption reactors are respectively in the normal temperature adsorption purification and regeneration standby stages to achieve purification The purpose of continuous online work of the device;

2. The regenerative gas heater is separated from the adsorption reactor, so as to avoid the uneven flow rate of the gas in the container caused by the built-in heater in the reactor, and it is difficult to form a stable turbulent flow and excessive wall effect;

3. The regenerative gas cooler cools the regenerative gas of the adsorption reactor, and then discharges it from the vent after passing through the valve. The temperature of the gas has been reduced, and it can be controlled by a general valve in the electronics industry, which greatly reduces the system cost;

4. The process is simple, one-step method for impurity removal, and the cost of the nickel catalyst is much higher than that of the deoxidizer. The adsorption capacity of the deoxidizer to oxygen, water, and carbon dioxide is greater than that of the nickel catalyst. The raw gas is first purified by the deoxidizer, and the The ppm-level impurities in the raw material are first removed to 10ppb, and then passed through the nickel catalyst. The nickel catalyst only needs to be loaded with the amount of adsorption required to remove 10ppb impurities, so the loading of high-cost nickel catalysts can be reduced. Reduce purification costs.

Description of drawings

Fig. 1 is a schematic diagram of the patent structure of the present invention.

In the figure: 1. Raw gas inlet, 2. Product gas outlet, 3. Vent port, 4. Nickel catalyst layer, 5. Deoxidizer layer, 6. Hydrogen inlet, 7. Hydrogen inlet valve, 8. Raw gas input pipeline , 9. Regenerated gas output pipeline, 10. Product gas output pipeline, 11. Regenerated gas input pipeline;

A, adsorption reactor A, B, adsorption reactor B, A1, switching valve A1, A2, switching valve A2, A3, switching valve A3, A4, switching valve A4, B1, switching valve B1, B2, switching valve B2, B3, switching valve B3, B4, switching valve B4;

HA, regenerative gas heater HA, HB, regenerative gas heater HB;

TA1, regeneration gas heater HA temperature control point, TB1, regeneration gas heater HB temperature control point, TA2, adsorption reactor A bed temperature measurement point, TB2, adsorption reactor B bed temperature measurement point;

EA, regenerative gas cooler EA, EB, regenerative gas cooler EB.

Detailed ways

Below in conjunction with Fig. 1, the present invention will be further described:

The purification system of the present invention is composed of two automatically switched adsorption reactors A and B, corresponding switching valves A1~A4, B1~B4, corresponding pipelines, corresponding regeneration gas heaters HA and HB and corresponding control systems ; The adsorption reactors A and B are filled with two kinds of fillers respectively, and are filled with deoxidizer and nickel catalyst successively from the inflow side to the outflow side of raw gas; the filling quantity of nickel catalyst in the adsorption reactor is Va, the filling quantity of deoxidizer When it is Vb, the filling ratio Va/Vb of the nickel catalyst and the deoxidizer is 0.1 to 0.6, more preferably 0.2 to 0.4.

The inlet of the adsorption reactor is connected to the feed gas inlet 1 through the feed gas input pipeline 8 and the switch valve, and the gas outlet of the adsorption reactor is connected to the product gas outlet 2 through the product gas output pipeline 10 and the switch valve; The bypass is connected to the regeneration gas output pipeline 9, and a regeneration gas cooler and a switching valve are installed on the regeneration gas output pipeline, and the regeneration gas output pipeline is connected to the air release port; A regenerative gas heater and switching valve are installed on the gas input pipeline.

Taking adsorption reactor A in the purification stage as an example, raw gas enters the purifier from raw gas inlet 1, switching valve A1 and switching valve A4 are in the open state, and switching valve A2 and switching valve A3 are in the closed state. After the feed gas enters the adsorption reactor A, it first contacts the deoxidizer bed 5, and the oxygen, water and carbon dioxide in the gas are absorbed by the deoxidizer bed 5 to below 10ppb, wherein water and carbon dioxide are physical adsorption, and oxygen is chemical adsorption. The adsorption principle is: AO+O ₂ --→ AO ₂ , where AO refers to the metal oxide that is the effective deoxidation component in the deoxidizer;

After the gas oxygen, water and carbon dioxide passing through the deoxidizer bed are removed below 10ppb, they continue to flow into the nickel catalyst bed 4, and the nickel catalyst bed 4 can convert oxygen, water, carbon dioxide, carbon monoxide, hydrogen and non-methane hydrocarbons in the gas Species are further removed to below 1ppb.

The nickel catalyst bed 4 is filled with a regenerated nickel catalyst capable of removing trace amounts of oxygen, water, carbon dioxide, carbon monoxide, hydrogen and non-methane hydrocarbons in the gas. Specifically, the nickel catalyst can be prepared by loading 20-80 wt% of metallic nickel on a carrier such as activated alumina, zeolite molecular sieve, activated carbon or silica gel. It is more preferable to use a nickel catalyst supported by 30 to 50 wt%.

The regeneration process is carried out by the central control unit in a time-sequential control manner. Referring to Figure 1, the adsorption reactor B is taken as an example to illustrate the regeneration process of the adsorption reactor.

1) Pressure relief:

Initial state: valves B1 to B4 are closed, and the pressure in adsorption reactor B is the pressure used in the last purification stage, generally 0.6 to 0.8Mpa; 5 seconds after the pressure relief operation starts, the central control unit sends a signal to valve B2 to open the valve , the B2 valve is opened; the gas in the adsorption reactor B flows through the B2 valve and the vent 3 to the high-level vent installed outdoors until the pressure in the adsorption reactor B drops to atmospheric pressure, and the process lasts for 5 to 8 minutes.

2) Heating purge 1:

The initial state is the state of pressure relief, the B3 valve is opened, and a part of the product gas from the front end of the product gas outlet 2 passes through the B3 valve as regeneration gas, flows into the adsorption reactor B through the regeneration gas heater HB, and then passes through the regeneration gas cooler EB and valve B2 And the vent port 3 finally flows to the high-level venting place installed outdoors. At the same time, the regeneration gas heater HB starts heating to heat the regeneration gas to 300 degrees Celsius required for the regeneration process; the process lasts for 6 to 8 hours.

Further, during the process, the high-temperature regeneration gas takes the water vapor adsorbed by the adsorption reactor B in the purification stage out of the bed and vents at a high level through the vent port 3;

Furthermore, the function of the regenerated gas cooler EB is to cool the high-temperature regenerated gas to close to normal temperature by means of air cooling before venting. In this way, the valve B2 used at normal temperature can be protected and the risk of high temperature scalding of the pipeline between the vent pipeline and the outdoor high-level vent can be reduced.

Further, the flow rate of regeneration gas is 5% of the gas volume treated by the purifier; the process pressure is normal pressure.

3) Hydrogenation regeneration:

The initial state is the heating and purge 1 state. The hydrogen inlet valve 7 is opened, and a certain amount of high-purity hydrogen is added to the regeneration gas, and the hydrogen is used as the reducing gas of the nickel catalyst bed and the deoxidizer bed to regenerate the adsorption reactor B. The duration of the process is 2-4 hours.

Further, the amount of hydrogen added is 3% of the amount of regeneration gas, and the process pressure is normal pressure.

4) Heating and purging 2:

The initial state is hydrogenation regeneration state. The hydrogen inlet valve 7 is closed, and the high-temperature regeneration gas takes the water generated in the hydrogenation regeneration stage of the adsorption reactor B out of the bed in gaseous form and is vented through the vent 3 at a high position.

The duration of the process is 2-4 hours.

Further, taking oxygen as an example, the principle of hydrogenation reduction is: AO ₂ +H ₂ --→ AO+H ₂ O.

5) Cooling:

The initial state is the heating and purge 2 state. The regeneration gas heater HB stops heating, and the regeneration gas at normal temperature takes the heat out of the adsorption reactor until the reactor cools down to normal temperature. The duration of the process is 8-10 hours.

6) Pressurized and ready for use:

The initial state is the cooling state, the B2 valve is closed, and the regeneration gas starts to pressurize the adsorption reactor B through the B3 valve. When the pressure of the adsorption reactor B reaches the normal working pressure of the purifier, the B3 valve is closed, and the adsorption reactor B enters the standby stage. After the purification cycle of adsorption reactor A is over, it will automatically enter the purification state, while adsorption reactor A will enter the automatic regeneration process at the same time.

Example 1

Select Φ159 stainless steel seamless pipe, the height of the filling section is 1000mm, the filling height of the upper nickel catalyst is 200mm, and the filling height of the lower deoxidizer is 800mm, as the adsorption reactor A.

The adsorption reactor A was regenerated under the following conditions.

The flow rate of regeneration nitrogen gas is 2.5Nm ³ /h, the heating temperature of regeneration gas heater HA is 300 degrees Celsius, the amount of hydrogen added is 1.25SLPM, heating and purge 1 lasts for 6 hours, hydrogenation regeneration lasts for 2 hours, heating and purge 2 lasts for 2 hours, and cooling continues 8 hours.

Further, the raw material gas was purified by adsorption at room temperature under the following conditions.

Nitrogen containing 3ppm oxygen, 3ppm water, 1ppm carbon dioxide, 1ppm carbon monoxide, and 1ppm hydrogen is used as the raw material gas, which flows in from the raw material gas inlet 1, passes through the A1 valve, the adsorption reactor A, and the A4 valve, and finally passes through the product gas Exit 2 discharges. The above impurity indicators are detected at the product gas outlet 2. During the process, the pressure of the feed gas is 0.7Mpa, the flow rate is 40Nm ³ /h, and the temperature is 25 degrees Celsius at room temperature.

The time from the start of feeding the raw material gas to the detection of oxygen as the first breakthrough component was 145 hours.

Comparative example 1

Choose Φ159 stainless steel seamless pipe, the height of the filling section is 1000mm, and all of it is filled with deoxidizer, as the adsorption reactor A.

The adsorption reactor A was regenerated under the following conditions.

The flow rate of regeneration nitrogen gas is 2.5Nm ³ /h, the heating temperature of regeneration gas heater HA is 300 degrees Celsius, the amount of hydrogen added is 1.25SLPM, heating and purge 1 lasts for 6 hours, hydrogenation regeneration lasts for 2 hours, heating and purge 2 lasts for 2 hours, and cooling continues 8 hours.

Further, the raw material gas was purified by adsorption at room temperature under the following conditions.

Nitrogen containing 3ppm oxygen, 3ppm water, 1ppm carbon dioxide, 1ppm carbon monoxide, and 1ppm hydrogen is used as the raw material gas, which flows in from the raw material gas inlet 1, passes through the A1 valve, the adsorption reactor A, and the A4 valve, and finally passes through the product gas Exit 2 discharges. The above impurity indicators are detected at the product gas outlet 2. During the process, the pressure of the feed gas is 0.7Mpa, the flow rate is 40Nm ³ /h, and the temperature is 25 degrees Celsius at room temperature.

In the purification process, affected by the adsorption characteristics of the deoxidizer, only three impurities, oxygen, water and carbon dioxide, can be adsorbed.

The time from the start of feeding the raw material gas to the detection of water as the first breakthrough component was 166 hours.

Comparative example 2

Choose Φ159 stainless steel seamless pipe, the height of the filling section is 1000mm, and all of them are filled with nickel catalyst as the adsorption reactor A.

The adsorption reactor A was regenerated under the following conditions.

The flow rate of regeneration nitrogen gas is 2.5Nm ³ /h, the heating temperature of regeneration gas heater HA is 300 degrees Celsius, the amount of hydrogen added is 1.25SLPM, heating and purge 1 lasts for 6 hours, hydrogenation regeneration lasts for 2 hours, heating and purge 2 lasts for 2 hours, and cooling continues 8 hours.

Further, the raw material gas was purified by adsorption at room temperature under the following conditions.

Nitrogen containing 3ppm oxygen, 3ppm water, 1ppm carbon dioxide, 1ppm carbon monoxide, and 1ppm hydrogen is used as the raw material gas, which flows in from the raw material gas inlet 1, passes through the A1 valve, the adsorption reactor A, and the A4 valve, and finally passes through the product gas Exit 2 discharges. The above impurity indicators are detected at the product gas outlet 2. During the process, the pressure of the feed gas is 0.7Mpa, the flow rate is 40Nm ³ /h, and the temperature is 25 degrees Celsius at room temperature.

The time from the start of feeding the raw material gas to the detection of oxygen as the first breakthrough component was 55 hours.

With embodiment 1, the concrete situation of three kinds of filling modes of comparative example 1 and comparative example 2 are collected in table 1

Table 1

It can be known from Example 1 and Comparative Example 1 that the breakthrough time of the former is shorter than that of the latter when compared with the bed of the adsorption reactor packed with 200mm nickel catalyst and 800mm and the bed completely filled with deoxidizer. However, the latter cannot remove carbon monoxide and hydrogen, and the purification process requires a high-temperature oxidation process that introduces an expensive palladium-containing oxidation catalyst at the front end. Therefore, the composite bed filled according to a certain ratio can greatly reduce the manufacturing cost of the purifier and the operating cost of the purifier.

It can be seen from Example 1 and Comparative Example 2 that the breakthrough time of the former is much longer than that of the latter when the bed of the adsorption reactor packed with 200 mm of nickel catalyst and 800 mm of catalyst is compared with the bed of all nickel catalyst. Because the main impurities of the cryogenic air separation unit are oxygen, water and carbon dioxide, and the adsorption capacity of the deoxidizer to oxygen, water and carbon dioxide is greater than that of the nickel catalyst, therefore, the composite bed filled in a certain proportion can not only fully absorb oxygen, water, Carbon dioxide, carbon monoxide and hydrogen can also greatly reduce the loading of nickel catalysts with high cost, greatly increase the breakthrough time, reduce the operating cost of the purifier, and further reduce the size of the purifier and reduce the occupied area of the power plant.

Claims (10)

1. An ultra-pure gas purification system based on an adsorption process at normal temperature, characterized in that it includes two adsorption reactors, one for standby and one for use, corresponding switching valves, corresponding pipelines, regeneration gas heaters, regeneration gas coolers and Control system; the adsorption reactors are respectively filled with two kinds of fillers, and the deoxidizer and the nickel catalyst are sequentially filled from the inflow side of the feed gas to the outflow side, and the filling volume ratio of the nickel catalyst to the deoxidizer is Va/Vb=0.1～0.6 , the nickel catalyst adopts the nickel catalyst capable of removing trace oxygen, water, carbon dioxide, carbon monoxide, hydrogen and non-methane hydrocarbons in the gas, and the nickel catalyst is carried on activated alumina, zeolite molecular sieve, activated carbon or silica gel carrier for 20 ~80wt% nickel metal is prepared. 2. A kind of ultra-pure gas purification system based on normal temperature adsorption process according to claim 1, characterized in that: the inlet of the adsorption reactor is connected with the inlet of the feed gas through the feed gas input pipeline and switching valve, and the adsorption reactor The gas outlet is connected to the product gas outlet through the product gas output pipeline and switching valve; the raw gas input pipeline is connected to the regenerative gas output pipeline by a bypass, and the regenerative gas output pipeline is equipped with a regenerative gas cooler and a switching valve, and the regenerative gas output pipe The product gas output pipeline is connected to the regenerative gas input pipeline by bypass, and the regenerative gas heater and switching valve are installed on the regenerative gas input pipeline. 3. The ultra-pure gas purification system based on the normal temperature adsorption process according to claim 1, characterized in that: the regeneration gas input pipeline is connected to the hydrogen inlet through a pipeline, and a hydrogen inlet valve is installed on the pipeline. 4. The ultrapure gas purification system based on the normal temperature adsorption process according to claim 1, characterized in that: the switching valve adopts an electronic grade diaphragm valve or a bellows valve. 5 . The ultra-pure gas purification system based on normal temperature adsorption process according to claim 1 , characterized in that: the filling volume ratio Va/Vb of the nickel catalyst and deoxidizer is 0.2-0.4. 6. The ultra-pure gas purification system based on normal temperature adsorption process according to claim 1, characterized in that: the nickel catalyst is carried by 30-50wt% on activated alumina, zeolite molecular sieve, activated carbon or silica gel carrier Nickel catalyst prepared by way of metallic nickel. 7. A kind of ultrapure gas purification system based on normal temperature adsorption process according to claim 1, it is characterized in that: said adsorption reactor bed is provided with temperature measuring point, and control system comprises CPU central control unit, CUP central The control unit is respectively connected with the flow switch, the pressure sensor, the temperature sensor, the relay, the contactor and the display panel. 8. An ultra-pure gas purification process based on a normal temperature adsorption process, adopting the ultra-pure gas purification system based on a normal temperature adsorption process according to claim 1, characterized in that: one standby and one active adsorption reactor are respectively in the purification stage and regeneration stage; Purification stage: After the raw material gas enters the adsorption reactor, it is firstly purified by a deoxidizer to absorb oxygen, water, and carbon dioxide, and the ppm-level impurities in the raw material are first removed to 10ppb, and then purified by a nickel catalyst to continue to remove oxygen, water, and carbon dioxide. Water, carbon dioxide, carbon monoxide, hydrogen and non-methane hydrocarbons are further removed to below 1ppb; Regeneration stage: the regeneration gas enters the adsorption reactor through the inductive gas heater, and the high-temperature regeneration gas takes the water vapor adsorbed by the adsorption reactor during the purification stage out of the bed, and after being cooled by the regeneration gas cooler, it is vented at a high level through the vent port; and then Hydrogenation regeneration, the hydrogen is used as the reducing gas of the nickel catalyst bed and the deoxidizer bed to regenerate the adsorption reactor, and after being cooled by the regeneration gas cooler, it is vented at a high level through the vent port. 9. A kind of ultra-pure gas purification process based on normal temperature adsorption process according to claim 8, characterized in that: when the adsorption reactor is in the regeneration stage, the gas heater will heat the regeneration gas to 280 degrees Celsius, and then input the over-adsorption reactor. 10. A kind of ultra-pure gas purification process based on normal temperature adsorption process according to claim 8, characterized in that: when the adsorption reactor is processing the purification stage, the temperature measuring point set on the bed of the adsorption reactor detects an abnormality When the temperature rises and reaches the interlock value, the system starts the interlock shutdown procedure.