CN109705984A - A kind of Sapphire Substrate uses the recovery method of liquid wax - Google Patents
A kind of Sapphire Substrate uses the recovery method of liquid wax Download PDFInfo
- Publication number
- CN109705984A CN109705984A CN201910063915.XA CN201910063915A CN109705984A CN 109705984 A CN109705984 A CN 109705984A CN 201910063915 A CN201910063915 A CN 201910063915A CN 109705984 A CN109705984 A CN 109705984A
- Authority
- CN
- China
- Prior art keywords
- wax
- sapphire substrate
- recovery method
- residual
- substrate according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 51
- 238000000034 method Methods 0.000 title claims abstract description 37
- 238000011084 recovery Methods 0.000 title claims abstract description 20
- 239000000758 substrate Substances 0.000 title claims abstract description 19
- 229910052594 sapphire Inorganic materials 0.000 title claims abstract description 18
- 239000010980 sapphire Substances 0.000 title claims abstract description 18
- 238000001914 filtration Methods 0.000 claims abstract description 24
- 238000004140 cleaning Methods 0.000 claims abstract description 7
- 238000000746 purification Methods 0.000 claims abstract description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 27
- 229960000935 dehydrated alcohol Drugs 0.000 claims description 27
- -1 polytetrafluoroethylene Polymers 0.000 claims description 6
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 6
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 6
- 238000001291 vacuum drying Methods 0.000 claims description 4
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 claims description 3
- 230000001070 adhesive effect Effects 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 238000004807 desolvation Methods 0.000 claims description 3
- 239000010959 steel Substances 0.000 claims description 3
- 238000007599 discharging Methods 0.000 claims description 2
- 239000012528 membrane Substances 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 9
- 238000004064 recycling Methods 0.000 abstract description 7
- 238000012545 processing Methods 0.000 abstract description 6
- 238000007873 sieving Methods 0.000 abstract description 6
- 238000005516 engineering process Methods 0.000 abstract description 5
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000009835 boiling Methods 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical group FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004018 waxing Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/74—Recovery of fats, fatty oils, fatty acids or other fatty substances, e.g. lanolin or waxes
Landscapes
- Filtering Materials (AREA)
Abstract
The invention discloses the recovery methods that a kind of Sapphire Substrate uses liquid wax, are related to high-grade numerical control equipment and Computerized Numerical Control processing technology equipment field.The present invention is the following steps are included: S1: cleaning wax pan；S2: residual wax is collected；S3: filtration residue wax；S4: purification process is carried out to the residual wax collected in step S3.Maimed wax quality by recycling, sieving, filtering has reached the requirement that can be reused, and after being collected maimed wax, reuses, and reduces the consumptive material dosage of patch wax technology, reduces processing cost.It is calculated by actual operation, after being recycled using this method to liquid wax, cost of material reduces by 40% or more；It has reached and efficiently recycles used secondary wax, greatly reduce the purpose of patch wax cost.
Description
Technical field
The present invention relates to high-grade numerical control equipments and Computerized Numerical Control processing technology equipment field, are a kind of recovery methods of liquid wax,
It specifically, is a kind of recovery method of surplus liquid wax after sapphire substrate surface pastes wax.
Background technique
LED is thrown in copper with Sapphire Substrate and patch wax method is widely used in processing procedure, i.e., uses wax as viscous on ceramic disk
Paste medium, liquid wax uniform fold back surface of the wafer, the substrate slice flatness requirement put up is higher, usual TTV (general thickness is poor)
It will be within 3um.Liquid wax is consumed as consumptive material.
Tradition patch wax method liquid wax is the primary raw material cost pasted in ceroplastic as medical disposable material, if patch wax
Liquid wax in technique cannot recycle well, then can allow patch ceroplastic in cost substantial increase.
Summary of the invention
The purpose of the present invention is to provide the recovery methods that a kind of Sapphire Substrate uses liquid wax, have reached efficient return
Used secondary wax is received, the purpose of patch wax cost is greatly reduced.
In order to achieve the above object, the present invention uses following technological means:
A kind of Sapphire Substrate uses the recovery method of liquid wax, it is characterised in that: the following steps are included:
S1: cleaning wax pan；
S2: residual wax is collected；
S3: filtration residue wax；
S4: purification process is carried out to the residual wax collected in step S3.
Preferably, the cleanup step in the step S1 is the following steps are included: be added dehydrated alcohol, inclined useless
Constantly slop wax slot is washed away with dehydrated alcohol in wax pan, until the residual wax in slop wax slot is completely dissolved in dehydrated alcohol
In.
Further, using quantitative dehydrated alcohol, the wax mouth of letting out in the slop wax slot is blocked, constantly uses steel
The dehydrated alcohol is scooped the highest point of the slop wax slot by spoon, is allowed under the dehydrated alcohol free flow.
Further, the process of residual wax is collected in the step S2 by the way that hose to be connected to the de-waxing in slop wax slot
Mouthful, it then will be in the other end insertion residual wax collecting tank of hose.
Further, the inner wall of the hose is covered with one layer of film non-stick with low-surface-energy.
Further, the film non-stick includes polytetrafluoroethylene film.
Further, the filter process in the step S3 includes that the residual wax collected in step S2 progress is more
Grade filtering, the multistage filtering include that multistage vibration is sieved through filter, are stood and are filtered by strainer after carrying out multistage vibration and being sieved through filter, finally
Obtain clean residual wax.
Further, the multistage vibration sieve is at least using three-level vibration sieve, and level-one shakes strainer mesh number in 50 ~ 80 mesh, and two
For grade vibration strainer mesh number in 100 ~ 140 mesh, three-level shakes strainer mesh number in 170-230 mesh.
Further, the strainer mesh number that the process for standing filtering uses is in 270 ~ 400 mesh.
Further, the purification process in the step S4 includes that the residual wax filtered in step S3 is rested on vacuum
Vacuum desolvation agent is carried out in baking oven, the temperature setting of the vacuum drying oven is at 40 ~ 60 DEG C.
Compared with common recovery method, the present invention at least have it is following the utility model has the advantages that after recycling, sieving, filtering,
It after maimed wax being collected, reuses, reduces the consumptive material dosage of patch wax technology, reduce processing cost.Through
It crosses actual operation to calculate, after recycling liquid wax using this method, cost of material reduces by 40% or more.
Specific embodiment
In order to make the objectives, technical solutions, and advantages of the present invention clearer, with reference to embodiments, to the present invention
It is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, it is not used to
Limit the present invention.
In one embodiment of the invention, a kind of Sapphire Substrate uses the recovery method of liquid wax, it is characterised in that:
The following steps are included:
S1: cleaning wax pan；Cleanup step above-mentioned includes the following steps following steps, and dehydrated alcohol is added, solidifying to reduce part
The dehydrated alcohol of the viscosity of the liquid wax of knot, addition should be quantitatively adding, i.e., be only added a certain amount of dehydrated alcohol, it is subsequent no longer
Dehydrated alcohol is added to block the wax mouth of letting out in slop wax slot to achieve the purpose that maximumlly to reduce former material cost, constantly make
The highest point that dehydrated alcohol in slop wax slot is scooped to slop wax slot with steel spoon with spoon allows under the dehydrated alcohol free flow, from
And the movement of dehydrated alcohol under the effect of gravity is utilized, allow dehydrated alcohol constantly to rush to slop wax slot in inclined slop wax slot
Brush, so that solidifying the liquid wax being fitted in slop wax slot can be dissolved in dehydrated alcohol, to reduce during washing away
The viscosity of liquid wax；The process for entirely allowing dehydrated alcohol to wash away slop wax slot is until the residual wax in slop wax slot is completely dissolved in
In dehydrated alcohol, that is to say, that when the liquid wax solidified in slop wax slot is all detached from slop wax slot inner wall；Allow slop wax slot in this way
Middle to be cleaned cleaner, the first step of maimed liquid wax is collected more perfect；
S2: residual wax is collected；The entire process for collecting maimed wax needs to use a hose, and one end of hose is connected in slop wax
On the wax discharging port of slot, the other end is inserted into residual wax collecting tank, and the liquid wax in this way after the cleaning that have passed through step S1 can
It is left in residual wax collecting tank by hose；But found in actual use, a large amount of liquid wax can be attached to hose
Inner wall, hose inner wall are exposed to the outer more difficult cleaning in position compared to other, will result in a large amount of liquid wax waste in this way,
To reduce the efficiency and effect of liquid wax recycling, and in order to avoid there is this case, one layer is equipped with not in hose inner wall
The polytetrafluoroethylene film of viscosity, certainly, any oleophobic property film with low-surface-energy can use, and above-mentioned poly-
Tetrafluoroethene film is bonded with hose by double-sided adhesive, is firmly pulled in this way and can be pulled polytetrafluoroethylene film, thus
The liquid wax for cleaning PolytetrafluoroethylFilm Film, and in daily use process, the bonding of double-sided adhesive can also allow poly- four
Certain external force is born in connection between fluoroethylene film and hose, to guarantee returning maimed liquid wax using hose
During receipts, polytetrafluoroethylene film is able to maintain with hose inner wall and connect；
S3: filtration residue wax；Certainly by step S2 to the recycling of maimed liquid wax after, if it is desired to allow collect recycle
Liquid wax can reach the standard reused, then firstly the need of to liquid wax internal residual crystallization and impurity carried out
Filter, and filtration step above-mentioned is filtered using multistage filtering by the way of, multistage filtering above-mentioned can be sieved through for vibration filter with
Filter screen stands filtering, and carrying out shaking first is sieved through filter, and the mode that vibration is sieved through filter, which stands filtering compared to filter screen, can play more
Fast filtering, and stand filtering is in order to which the liquid wax of recycling can be filtered under the environment of opposite standing peace and quiet；
Vibration above-mentioned is sieved through filter by the way of at least three-stage filtration, wherein most upper level i.e. the strainer mesh of the sieved filter of level-one vibration
Number is filtered in 50 ~ 80 mesh, the present embodiment using the strainer of 60 mesh, and intermediate level-one i.e. second level vibration are sieved through the strainer mesh filtered
Number is filtered in 100 ~ 140 mesh, the present embodiment using the strainer of 100 mesh, and bottom level-one i.e. three-level vibration are sieved through filter
Strainer mesh number be filtered in 170 ~ 230 mesh, the present embodiment using the strainers of 230 mesh, while liquid wax exists in order to prevent
During vibration sieve, it is adhered on vibrating sieving machine, the inner wall of vibrating sieving machine is carrying out by being adhesively fixed with polytetrafluoroethylene film
After vibration is sieved through filter, filtered liquid wax is subjected to standing filtering, i.e., liquid wax is picked out from vibrating sieving machine and, with 320 mesh
Testing sieve carries out standing filtering, and filtering purpose is that crystallization remaining in wax and impurity are filtered out comprehensively as clean liquid wax；
S4: purification process is carried out to the residual wax collected in step S3, including resting on very the residual wax filtered in step S3
Vacuum desolvation agent is carried out in empty baking oven, in vacuum environment, dehydrated alcohol boiling point is reduced, thus accelerate the evaporation of dehydrated alcohol,
The temperature setting of aforementioned vacuum baking oven carries out vacuum drying using 55 DEG C of temperature in the present embodiment, if warm at 40 ~ 60 DEG C
Spend low, the viscosity that will result in liquid wax reduces, thus in solvent, that is, dehydrated alcohol during boiling, bubble cannot and
When discharge, so that the liquid level that will cause liquid wax quickly goes up, thus the case where causing liquid wax to overflow waste, and if temperature
Height is spent, then dehydrated alcohol boiling can be allowed excessively violent, the liquid level of liquid wax is equally be easy to cause to go up, cause the case where overflowing
Occur.
In the present embodiment, by using liquid wax recovery method disclosed by the invention, by recycling, sieving, filtering it is residual
Slop wax quality has reached the requirement that can be reused, and after being collected maimed wax, reuses, reduces patch wax
The consumptive material dosage of technology, reduces processing cost.It calculates by actual operation, liquid wax is recycled using this method
Afterwards, cost of material reduces by 40% or more.
Although reference be made herein to invention has been described for multiple explanatory embodiments of the invention, however, it is to be understood that
Those skilled in the art can be designed that a lot of other modification and implementations, these modifications and implementations will fall in this Shen
It please be within disclosed scope and spirit.It more specifically, within the scope of the present disclosure and claims, can be to master
The building block and/or layout for inscribing composite configuration carry out a variety of variations and modifications.In addition to what is carried out to building block and/or layout
Outside modification and improvement, to those skilled in the art, other purposes also be will be apparent.
Claims (10)
1. the recovery method that a kind of Sapphire Substrate uses liquid wax, it is characterised in that: the following steps are included:
S1: cleaning wax pan；
S2: residual wax is collected；
S3: filtration residue wax；
S4: purification process is carried out to the residual wax collected in step S3.
2. the recovery method that a kind of Sapphire Substrate according to claim 1 uses liquid wax, it is characterised in that: the step
Cleanup step in rapid S1 is the following steps are included: be added dehydrated alcohol, constantly with dehydrated alcohol pair in inclined slop wax slot
Slop wax slot is washed away, until the residual wax in slop wax slot is completely dissolved in dehydrated alcohol.
3. the recovery method that a kind of Sapphire Substrate according to claim 2 uses liquid wax, it is characterised in that: using fixed
The dehydrated alcohol of amount blocks the wax mouth of letting out in the slop wax slot, and the dehydrated alcohol is constantly scooped institute using steel spoon
The highest point for stating slop wax slot allows under the dehydrated alcohol free flow.
4. the recovery method that a kind of Sapphire Substrate according to claim 1 uses liquid wax, it is characterised in that: the step
The process of residual wax is collected in rapid S2 by the way that the other end of hose in the wax discharging port of slop wax slot, to be then inserted into residual by hose connection
It stays in wax collecting tank.
5. the recovery method that a kind of Sapphire Substrate according to claim 4 uses liquid wax, it is characterised in that: described soft
The inner wall of pipe is covered with one layer of film non-stick with low-surface-energy.
6. a kind of Sapphire Substrate according to claim 5 use liquid wax recovery method, it is characterised in that: it is described not
Adhesive membrane includes polytetrafluoroethylene film.
7. the recovery method that a kind of Sapphire Substrate according to claim 1 uses liquid wax, it is characterised in that: the step
Filter process in rapid S3 includes that the residual wax collected in the step S2 is carried out to multistage filtering, and the multistage filtering includes more
Grade vibration is sieved through filter, is stood and is filtered by strainer after carrying out multistage vibration and being sieved through filter, finally obtains clean residual wax.
8. the recovery method that a kind of Sapphire Substrate according to claim 7 uses liquid wax, it is characterised in that: described more
For grade vibration sieve at least using three-level vibration sieve, level-one shakes strainer mesh number in 50 ~ 80 mesh, and second level shakes strainer mesh number in 100 ~ 140 mesh,
Three-level shakes strainer mesh number in 170-230 mesh.
9. the recovery method that a kind of Sapphire Substrate according to claim 7 or 8 uses liquid wax, it is characterised in that: institute
The strainer mesh number for the process use for standing filtering is stated in 270 ~ 400 mesh.
10. the recovery method that a kind of Sapphire Substrate according to claim 1 uses liquid wax, it is characterised in that: described
Purification process in step S4 includes that the residual wax filtered in step S3 is rested on to progress vacuum desolvation agent, institute in vacuum drying oven
The temperature setting of vacuum drying oven is stated at 40 ~ 60 DEG C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910063915.XA CN109705984A (en) | 2019-01-23 | 2019-01-23 | A kind of Sapphire Substrate uses the recovery method of liquid wax |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910063915.XA CN109705984A (en) | 2019-01-23 | 2019-01-23 | A kind of Sapphire Substrate uses the recovery method of liquid wax |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109705984A true CN109705984A (en) | 2019-05-03 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910063915.XA Pending CN109705984A (en) | 2019-01-23 | 2019-01-23 | A kind of Sapphire Substrate uses the recovery method of liquid wax |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110607204A (en) * | 2019-10-29 | 2019-12-24 | 江苏京晶光电科技有限公司 | Method for recovering liquid wax from sapphire chip waste |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6066250A (en) * | 1997-11-07 | 2000-05-23 | Kawasaki Steel Techno-Research Corporation | Method for reclaiming investment casting wax compositions and the compositions obtainable thereby |
| US20020038695A1 (en) * | 1999-09-14 | 2002-04-04 | Kawsaki Steel Techno-Research Corporation | Method of recovering and refining filler from a lost wax composition |
| CN1769410A (en) * | 2004-11-05 | 2006-05-10 | 鑫润（临清）印染有限公司 | Method and apparatus for recovering wax using organic solution |
-
2019
- 2019-01-23 CN CN201910063915.XA patent/CN109705984A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6066250A (en) * | 1997-11-07 | 2000-05-23 | Kawasaki Steel Techno-Research Corporation | Method for reclaiming investment casting wax compositions and the compositions obtainable thereby |
| US20020038695A1 (en) * | 1999-09-14 | 2002-04-04 | Kawsaki Steel Techno-Research Corporation | Method of recovering and refining filler from a lost wax composition |
| CN1769410A (en) * | 2004-11-05 | 2006-05-10 | 鑫润（临清）印染有限公司 | Method and apparatus for recovering wax using organic solution |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110607204A (en) * | 2019-10-29 | 2019-12-24 | 江苏京晶光电科技有限公司 | Method for recovering liquid wax from sapphire chip waste |
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Application publication date: 20190503 |