CN109585593B - A spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy and its preparation method - Google Patents
A spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy and its preparation method Download PDFInfo
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Abstract
本发明公开了一种基于BeZnOS四元合金的自发极化场增强型紫外光探测器及其制备方法。所述探测器从下至上依次包括m面蓝宝石衬底、有源层、一对平行金属电极,其中:所述有源层为m面BeZnOS四元合金薄膜,所述平行金属电极垂直于所述BeZnOS四元合金薄膜的c轴方向。本发明通过在单晶m面蓝宝石上生长外延的m面BeZnOS薄膜,蒸镀垂直于薄膜c轴的金属电极,充分利用自发极化电场和外加电场叠加增强促进光生载流子的分离,增强光探测能力。另外,本发明制得的MSM结构的紫外光探测器结构简单,制作工艺也简单,探测器对300nm波长的紫外光具有良好的探测能力,且响应速度快、暗电流小,性能稳定。
The invention discloses a spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy and a preparation method thereof. The detector sequentially includes an m-plane sapphire substrate, an active layer, and a pair of parallel metal electrodes from bottom to top, wherein: the active layer is an m-plane BeZnOS quaternary alloy thin film, and the parallel metal electrodes are perpendicular to the The c-axis direction of BeZnOS quaternary alloy thin films. The invention grows an epitaxial m-plane BeZnOS film on a single-crystal m-plane sapphire, vapor-deposits a metal electrode perpendicular to the c-axis of the film, fully utilizes the superposition of the spontaneous polarization electric field and the external electric field to enhance the separation of photogenerated carriers, and enhances the light detection capability. In addition, the MSM structure ultraviolet light detector prepared by the invention has a simple structure and a simple manufacturing process. The detector has good detection capability for ultraviolet light with a wavelength of 300 nm, and has fast response speed, small dark current and stable performance.
Description
技术领域technical field
本发明属于半导体探测器技术领域,具体涉及一种具有MSM结构的紫外光探测器,更具体地说,本发明涉及一种基于BeZnOS四元合金的自发极化场增强型紫外光探测器及其制备方法。The invention belongs to the technical field of semiconductor detectors, in particular to an ultraviolet light detector with an MSM structure, and more particularly, the invention relates to a spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy and the same Preparation.
背景技术Background technique
BeZnOS四元合金是一种宽禁带、高可见光透过性的半导体材料,其可用于紫外至日盲区发光器件或光探测器件。由于BeZnOS四元合金跟ZnO晶体一样具有六方纤锌矿结构,其内部由O(S)原子面和Zn(Be)原子面交替排列,而Zn(Be)-O(S)键具有极性,整齐排列的大量的Zn(Be)-O(S)键导致BeZnOS在c轴方向上存在自发极化场,这个存在于整个BeZnOS晶体内部的自发极化电场能有效促进光生载流子的分离和运输,因此,基于m面BeZnOS四元薄膜发展的自发极化场增强型探测器理论上具有比普通c面BeZnOS薄膜基探测器更优秀的探测能力。使用PLD法在m面蓝宝石上生长BeZnOS薄膜时,薄膜表面为m面,且薄膜c轴与蓝宝石c轴方向垂直,薄膜的c轴方向与表面平行,因此,整个薄膜内部在与表面(c轴)平行方向存在自发极化电场。BeZnOS quaternary alloy is a semiconductor material with wide band gap and high visible light transmittance, which can be used in ultraviolet to solar blind region light-emitting devices or photodetection devices. Since BeZnOS quaternary alloy has hexagonal wurtzite structure like ZnO crystal, its interior is alternately arranged by O(S) atomic plane and Zn(Be) atomic plane, and Zn(Be)-O(S) bond has polarity, A large number of neatly arranged Zn(Be)-O(S) bonds lead to the existence of a spontaneous polarization field in the c-axis direction of BeZnOS. This spontaneous polarization field existing in the entire BeZnOS crystal can effectively promote the separation and separation of photogenerated carriers. Therefore, the spontaneously polarized field-enhanced detector developed based on the m-plane BeZnOS quaternary film theoretically has better detection capability than the ordinary c-plane BeZnOS film-based detector. When using the PLD method to grow BeZnOS thin films on m-plane sapphire, the surface of the film is m-plane, and the c-axis of the film is perpendicular to the c-axis of the sapphire, and the c-axis of the film is parallel to the surface. ) and there is a spontaneously polarized electric field in the parallel direction.
金属-半导体-金属(MSM)结构探测器具有结构简单、探测效率高等优点,通过控制金属类型、沟道宽度等参数可以调控所得探测器的性能。当在m面BeZnOS薄膜表面设计制作垂直于薄膜c轴的平行电极时,可以利用薄膜的自发极化电场,得到增强型的MSM紫外探测器。The metal-semiconductor-metal (MSM) structure detector has the advantages of simple structure and high detection efficiency. The performance of the obtained detector can be regulated by controlling parameters such as metal type and channel width. When a parallel electrode perpendicular to the c-axis of the film is designed and fabricated on the surface of the m-plane BeZnOS film, an enhanced MSM ultraviolet detector can be obtained by utilizing the spontaneous polarization electric field of the film.
另外,公开号为CN 102412334 A的现有技术公开了一种基于BeZnO的MSM结构的紫外光探测器及制备方法,所述探测器包括衬底及生长于衬底上的外延层,所述外延层包括应力缓冲层与设在应力缓冲层上的BeZnO掺杂层,所述BeZnO掺杂层上镀有叉指结构或者间隙结构的电极。但是该技术是利用在有源层与衬底之间插入缓冲层来提高晶体质量,这样极大地增加了工艺的复杂程度。另外该技术仅是将薄膜直接制备成探测器,并未考虑薄膜的极性。若其采用c面蓝宝石作为衬底,所得的c面BeZnO为极性面外延层,对于量子阱发光器件会产生量子斯塔克效应,即面内的自发极化场会在空间上分离电子与空穴,降低载流子的复合几率,从而降低发光强度,同时自发极化场会使量子阱处的能带发生弯曲,带隙降低,从而使发光波长变长,即发生红移。In addition, the prior art with publication number CN 102412334 A discloses a BeZnO-based MSM structure ultraviolet light detector and a preparation method, the detector includes a substrate and an epitaxial layer grown on the substrate, the epitaxial The layer includes a stress buffer layer and a BeZnO doped layer disposed on the stress buffer layer, and electrodes with an interdigitated structure or a gap structure are plated on the BeZnO doped layer. However, this technology uses a buffer layer inserted between the active layer and the substrate to improve the crystal quality, which greatly increases the complexity of the process. In addition, this technology only directly prepares the film into a detector, and does not consider the polarity of the film. If it uses c-plane sapphire as the substrate, the obtained c-plane BeZnO is a polar plane epitaxial layer, which will produce the quantum Stark effect for quantum well light-emitting devices, that is, the spontaneous polarization field in the plane will spatially separate electrons and Holes reduce the recombination probability of carriers, thereby reducing the luminous intensity. At the same time, the spontaneous polarization field will bend the energy band at the quantum well and reduce the band gap, thereby making the emission wavelength longer, that is, a red shift occurs.
本申请发明人课题组在前期已申请公开了一项名称为“一种BeZnOS化合物半导体材料、其制备方法及应用(公开号为CN 105734491 A)”的专利申请,将BeO和ZnS按比例制得四元化合物半导体材料,通过Be和S复合取代的协同作用,实现对ZnO带隙的自由调控等效果,且该发明制得的BeZnOS四元化合物可用于紫外至日盲区发光器件或光探测器件。The research group of the inventor of the present application has applied for a patent application entitled "a BeZnOS compound semiconductor material, its preparation method and application (publication number CN 105734491 A)" in the early stage, and the BeO and ZnS are prepared in proportion The quaternary compound semiconductor material achieves effects such as free regulation of the ZnO band gap through the synergistic effect of Be and S compound substitution, and the BeZnOS quaternary compound prepared by the invention can be used for ultraviolet to solar blind area light-emitting devices or photodetection devices.
本申请是在发明人上述工作的基础上,进一步深入研究开发和创新后提出的。The present application is proposed after further in-depth research, development and innovation on the basis of the above work of the inventor.
发明内容SUMMARY OF THE INVENTION
本发明的目的在于提供一种基于BeZnOS四元合金的自发极化场增强型紫外光探测器及其制备方法。本发明通过利用BeZnOS合金薄膜内部沿c轴方向的自发电场来有效促进光生载流子的分离和运输,从而构建m面BeZnOS基紫外光探测器。The purpose of the present invention is to provide a spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy and a preparation method thereof. The invention effectively promotes the separation and transport of photogenerated carriers by utilizing the spontaneous electric field along the c-axis direction inside the BeZnOS alloy thin film, thereby constructing an m-plane BeZnOS-based ultraviolet light detector.
为了实现本发明的上述第一个目的,本发明采用如下技术方案:In order to realize the above-mentioned first purpose of the present invention, the present invention adopts following technical scheme:
一种基于BeZnOS四元合金的自发极化场增强型紫外光探测器,所述探测器从下至上依次包括m面蓝宝石衬底、有源层、一对平行金属电极,其中:所述有源层为m面BeZnOS四元合金薄膜,所述平行金属电极垂直于所述BeZnOS四元合金薄膜的c轴方向。A spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy, the detector includes an m-plane sapphire substrate, an active layer, and a pair of parallel metal electrodes in sequence from bottom to top, wherein: the active The layer is an m-plane BeZnOS quaternary alloy thin film, and the parallel metal electrodes are perpendicular to the c-axis direction of the BeZnOS quaternary alloy thin film.
进一步地,上述技术方案,所述m面蓝宝石衬底的厚度为0.35~0.45mm。Further, in the above technical solution, the thickness of the m-plane sapphire substrate is 0.35-0.45 mm.
进一步地,上述技术方案,所述有源层的厚度为80~160nm。Further, in the above technical solution, the thickness of the active layer is 80-160 nm.
进一步地,上述技术方案,所述平行金属电极的厚度为30~60nm。Further, in the above technical solution, the thickness of the parallel metal electrodes is 30-60 nm.
进一步地,上述技术方案,所述平行金属电极的间距为10~100μm。Further, in the above technical solution, the distance between the parallel metal electrodes is 10-100 μm.
进一步地,上述技术方案,所述平行金属电极材料可以为Au、Ag或Al中的任一种,优选为Al。Further, in the above technical solution, the parallel metal electrode material can be any one of Au, Ag or Al, preferably Al.
本发明的另一目的在于提供上述基于BeZnOS四元合金的自发极化场增强型紫外光探测器的制备方法,所述方法包括以下步骤:Another object of the present invention is to provide a method for preparing the above-mentioned spontaneously polarized field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy, the method comprising the following steps:
(1)以m面蓝宝石作为薄膜生长的衬底,利用清洗液对所述衬底进行超声清洗后用氮气吹干,立即置于脉冲激光沉积系统的真空腔内;(1) take m-plane sapphire as the substrate of thin film growth, utilize cleaning liquid to carry out ultrasonic cleaning to described substrate, dry with nitrogen gas, place in the vacuum chamber of pulsed laser deposition system immediately;
(2)采用脉冲激光烧蚀沉积、磁控溅射或电子束蒸发方法在步骤(1)预处理后的m面蓝宝石衬底表面沉积形成m面BeZnOS四元合金薄膜;(2) adopting the method of pulsed laser ablation deposition, magnetron sputtering or electron beam evaporation to deposit on the surface of the m-plane sapphire substrate pretreated in step (1) to form an m-plane BeZnOS quaternary alloy film;
(3)利用四圆单晶X射线衍射仪XRD确定步骤(2)制得的m面BeZnOS四元合金薄膜的c轴方向;(3) determining the c-axis direction of the m-plane BeZnOS quaternary alloy thin film obtained in step (2) by using a four-circle single crystal X-ray diffractometer XRD;
(4)利用蒸镀法或光刻法,在所述BeZnOS四元合金薄膜表面与c轴垂直方向制作一对平行金属电极,获得本发明所述的基于BeZnOS四元合金的自发极化场增强型紫外光探测器。(4) Using the evaporation method or the photolithography method, a pair of parallel metal electrodes are made on the surface of the BeZnOS quaternary alloy film in the direction perpendicular to the c-axis to obtain the spontaneous polarization field enhancement based on the BeZnOS quaternary alloy described in the present invention type UV detector.
进一步地,上述技术方案,步骤(1)中所述清洗液包括丙酮、乙醇、去离子水,所述超声清洗时间优选为15min。Further, in the above technical solution, the cleaning solution in step (1) includes acetone, ethanol and deionized water, and the ultrasonic cleaning time is preferably 15min.
进一步地,上述技术方案,步骤(2)中m面BeZnOS四元合金薄膜具体是采用脉冲激光烧蚀沉积方法制得,具体工艺如下:Further, in the above technical scheme, in step (2), the m-plane BeZnOS quaternary alloy film is specifically prepared by a pulsed laser ablation deposition method, and the specific process is as follows:
利用BeZnOS陶瓷作为靶材,控制衬底温度为100~800℃,脉冲激光能量为200~600mJ/Pulse,氧压为0~10Pa,在步骤(1)预处理后的m面蓝宝石衬底表面沉积形成BeZnOS四元合金薄膜。Using BeZnOS ceramics as the target, the substrate temperature is controlled to be 100-800°C, the pulse laser energy is 200-600mJ/Pulse, and the oxygen pressure is 0-10Pa, and the pre-treated m-plane sapphire substrate is deposited on the surface of the step (1). A BeZnOS quaternary alloy thin film is formed.
进一步地,上述技术方案,步骤(2)中所述BeZnOS陶瓷靶材是采用固相烧结法制得,具体方法如下:Further, in the above technical solution, the BeZnOS ceramic target material described in the step (2) is obtained by the solid-phase sintering method, and the specific method is as follows:
(a)按摩尔比为99:1~70:30的比例将ZnS、BeO粉体混合均匀,加入超纯水,再次混合均匀后置于球磨罐中球磨,得到混合粉末;(a) Mix the ZnS and BeO powders evenly in a molar ratio of 99:1 to 70:30, add ultrapure water, mix them evenly again, and then place them in a ball mill for ball milling to obtain a mixed powder;
(b)将所述混合粉末置于真空干燥箱中干燥后冷却至室温,然后碾碎,压成圆片;(b) drying the mixed powder in a vacuum drying oven and cooling to room temperature, then crushing and pressing into a disc;
(c)在氩气氛围中,以硫粉为除氧剂,将步骤(b)所得圆片置于真空管式炉中,于1100~1400℃条件下烧制2~5h,得到本发明所述的BeZnOS陶瓷。(c) in an argon atmosphere, using sulfur powder as an oxygen scavenger, the wafer obtained in step (b) is placed in a vacuum tube furnace, and fired at 1100-1400 ° C for 2-5 hours to obtain the invention described in the present invention. BeZnOS ceramics.
更进一步地,上述技术方案,步骤(b)所述真空干燥箱温度为110℃,干燥时间为10h。Further, in the above technical solution, the temperature of the vacuum drying oven in step (b) is 110°C, and the drying time is 10h.
本发明提供的MSM紫外光探测器,其平行电极与薄膜晶体c轴方向垂直,以获得自发极化场的增强效应。In the MSM ultraviolet light detector provided by the present invention, the parallel electrodes are perpendicular to the c-axis direction of the thin film crystal, so as to obtain the enhancement effect of the spontaneous polarization field.
本发明的原理如下:The principle of the present invention is as follows:
本发明利用Be离子半径小于Zn,而S离子半径大于O,Be、S共同取代ZnO后,两原子互补,能同时促进两原子的掺入,能更为简单有效地提高晶体质量以及合金的带隙调控范围。In the invention, the ion radius of Be is smaller than that of Zn, and the radius of S ion is larger than that of O. After Be and S jointly replace ZnO, the two atoms complement each other, which can promote the incorporation of the two atoms at the same time, and can more simply and effectively improve the crystal quality and the band of the alloy. Gap control range.
本发明首先利用脉冲激光沉积方法在m面蓝宝石衬底上沉积BeZnOS薄膜。此时所得薄膜为m面取向的BeZnOS,表面不存在极性,用作探测器的有源层。对于m面取向的BeZnOS,其c轴与薄膜表面平行,薄膜晶体沿c轴方向存在极性,当在薄膜表面与晶体c轴垂直的方向上蒸镀上平行金属电极,薄膜即有源层内部就存在与表面平行的自发极化电场。探测器在外加电场下工作时,当外加电场的方向与薄膜内自发极化场的方向一致时,两场叠加能加速光生载流子的分离和输运,从而提升光电探测器的响应速度和探测能力。In the present invention, the BeZnOS thin film is deposited on the m-plane sapphire substrate by using the pulsed laser deposition method. At this time, the obtained thin film is BeZnOS with m-plane orientation, and the surface has no polarity, and is used as the active layer of the detector. For BeZnOS with m-plane orientation, its c-axis is parallel to the surface of the film, and the film crystal has polarity along the c-axis. There is a spontaneously polarized electric field parallel to the surface. When the detector works under an applied electric field, when the direction of the applied electric field is consistent with the direction of the spontaneous polarization field in the film, the superposition of the two fields can accelerate the separation and transport of photogenerated carriers, thereby improving the response speed and speed of the photodetector. detection capability.
本发明的有益效果为:The beneficial effects of the present invention are:
1、通过将BeZnOS四元ZnO合金宽禁带半导体材料用于光电探测器,可以得到较好的薄膜结晶质量,还可以得到较低的探测截止波长。1. By using BeZnOS quaternary ZnO alloy wide-bandgap semiconductor materials for photodetectors, a better crystalline quality of the film can be obtained, and a lower detection cut-off wavelength can also be obtained.
2、通过在单晶m面蓝宝石上生长外延的m面BeZnOS薄膜,蒸镀垂直于薄膜c轴的金属电极,充分利用自发极化电场和外加电场叠加效应增强对光生载流子的分离和传输,增强光探测能力。2. By growing an epitaxial m-plane BeZnOS film on single-crystal m-plane sapphire, and evaporating a metal electrode perpendicular to the c-axis of the film, the superposition effect of the spontaneous polarization electric field and the applied electric field is fully utilized to enhance the separation and transmission of photogenerated carriers , to enhance the light detection capability.
3、本发明的BeZnOS四元ZnO合金半导体材料可采用常规脉冲激光烧蚀沉积、磁控溅射、电子束蒸发等多种方法进行生长,电极材料可以采用金属铝、金、银等,电极形状以及沟道宽度均可以自由调整和优化。本发明电极既可以采用蒸镀法蒸镀,也可以采用光刻法制作。蒸镀法工艺简单,方便大规模制备;光刻法十分有利于高精度、微尺寸器件的开发。3. The BeZnOS quaternary ZnO alloy semiconductor material of the present invention can be grown by conventional pulsed laser ablation deposition, magnetron sputtering, electron beam evaporation and other methods, and the electrode material can be made of metal aluminum, gold, silver, etc. And the channel width can be freely adjusted and optimized. The electrode of the present invention can be fabricated by either vapor deposition or photolithography. The evaporation method has a simple process and is convenient for large-scale preparation; the photolithography method is very beneficial to the development of high-precision and micro-sized devices.
4、本发明制得的MSM结构的紫外光探测器结构简单,制作工艺简单,原料成本低廉,另外本发明制得的探测器对300nm波长的紫外光具有良好的探测能力,且响应速度快、暗电流小,性能稳定。4. The ultraviolet light detector of the MSM structure prepared by the present invention has a simple structure, a simple manufacturing process, and low cost of raw materials. In addition, the detector prepared by the present invention has a good detection ability for ultraviolet light with a wavelength of 300 nm, and has a fast response speed, Small dark current and stable performance.
附图说明Description of drawings
图1是本发明的基于BeZnOS四元合金的自发极化场增强型紫外光探测器的结构示意图;Fig. 1 is the structural representation of the spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy of the present invention;
图2是本发明实施例1制得的自发极化增强型光电探测器的I-V曲线;Fig. 2 is the I-V curve of the spontaneous polarization enhanced photodetector prepared in Example 1 of the present invention;
图3是本发明实施例1制得的自发极化增强型光电探测器的响应速率图;3 is a response rate diagram of a spontaneous polarization enhanced photodetector prepared in Example 1 of the present invention;
图4是本发明实施例2制得的自发极化增强型光电探测器的I-V曲线;Fig. 4 is the I-V curve of the spontaneous polarization enhanced photodetector prepared in Example 2 of the present invention;
图5是本发明实施例2制得的自发极化增强型光电探测器的响应速率图;5 is a response rate diagram of a spontaneous polarization enhanced photodetector prepared in Example 2 of the present invention;
图6是本发明实施例3制得的无自发极化增强型光电探测器的I-V曲线;6 is the I-V curve of the self-polarization-free enhanced photodetector prepared in Example 3 of the present invention;
图7是本发明实施例3制得的无自发极化增强型光电探测器的响应速率图;7 is a response rate diagram of a self-polarization-free enhanced photodetector prepared in Example 3 of the present invention;
图8是本发明实施例2制得的自发极化增强型光电探测器的光谱响应度测试结果。FIG. 8 is the spectral responsivity test result of the spontaneous polarization enhanced photodetector prepared in Example 2 of the present invention.
具体实施方式Detailed ways
下面结合附图对本发明的实施案例作详细说明。本实施案例在本发明技术方案的前提下进行实施,给出了详细的实施方式和具体的操作过程,但本发明的保护范围不限于下述的实施案例。Embodiments of the present invention will be described in detail below with reference to the accompanying drawings. This embodiment case is implemented on the premise of the technical solution of the present invention, and provides a detailed implementation manner and a specific operation process, but the protection scope of the present invention is not limited to the following embodiment cases.
根据本申请包含的信息,对于本领域技术人员来说可以轻而易举地对本发明的精确描述进行各种改变,而不会偏离所附权利要求的精神和范围。应该理解,本发明的范围不局限于所限定的过程、性质或组分,因为这些实施方案以及其他的描述仅仅是为了示意性说明本发明的特定方面。实际上,本领域或相关领域的技术人员明显能够对本发明实施方式作出的各种改变都涵盖在所附权利要求的范围内。From the information contained in this application, various changes to the precise description of the present invention can be readily made by those skilled in the art without departing from the spirit and scope of the appended claims. It is to be understood that the scope of the invention is not limited to the processes, properties or components defined, as these embodiments and other descriptions are intended to be illustrative only of particular aspects of the invention. Indeed, various modifications of the embodiments of the invention that are obvious to those skilled in the art or related fields are intended to be within the scope of the appended claims.
为了更好地理解本发明而不是限制本发明的范围,在本申请中所用的表示用量、百分比的所有数字、以及其他数值,在所有情况下都应理解为以词语“大约”所修饰。因此,除非特别说明,否则在说明书和所附权利要求书中所列出的数字参数都是近似值,其可能会根据试图获得的理想性质的不同而加以改变。各个数字参数至少应被看作是根据所报告的有效数字和通过常规的四舍五入方法而获得的。For a better understanding of the invention and not to limit the scope of the invention, all numbers expressing amounts, percentages, and other numerical values used in this application should in all cases be understood as modified by the word "about". Accordingly, unless expressly stated otherwise, the numerical parameters set forth in the specification and attached claims are approximations that may vary depending upon the desired properties sought to be obtained. At a minimum, each numerical parameter shall be deemed to have been obtained from the reported significant digits and by conventional rounding methods.
本发明下述各实施例中采用的蓝宝石衬底,其主要成分是氧化铝(Al2O3),m-Al2O3表示m面蓝宝石。本发明中蓝宝石衬底的厚度优选为0.35~0.45mm。The main component of the sapphire substrate used in the following embodiments of the present invention is aluminum oxide (Al 2 O 3 ), and m-Al 2 O 3 represents m-plane sapphire. In the present invention, the thickness of the sapphire substrate is preferably 0.35 to 0.45 mm.
实施例1Example 1
如图1所示,本实施例的一种基于BeZnOS四元合金的自发极化场增强型紫外光探测器,所述探测器从下至上依次包括m面蓝宝石衬底、有源层、一对平行金属Al电极,其中:所述有源层为m面BeZnOS四元合金薄膜,所述平行金属电极垂直于所述BeZnOS四元合金薄膜的c轴方向。所述衬底的厚度为0.43mm,所述有源层的厚度为120nm,所述Al电极的厚度为50nm,所述平行电极的间距为10μm。As shown in FIG. 1 , a spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy in this embodiment, the detector includes an m-plane sapphire substrate, an active layer, a pair of A parallel metal Al electrode, wherein: the active layer is an m-plane BeZnOS quaternary alloy thin film, and the parallel metal electrode is perpendicular to the c-axis direction of the BeZnOS quaternary alloy thin film. The thickness of the substrate is 0.43 mm, the thickness of the active layer is 120 nm, the thickness of the Al electrode is 50 nm, and the distance between the parallel electrodes is 10 μm.
本实施例上述的基于BeZnOS四元合金的自发极化场增强型紫外光探测器采用如下方法制备而成,包括如下步骤:The above-mentioned spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy in this embodiment is prepared by the following method, including the following steps:
步骤1:采用固相烧结法制备BeZnOS四元陶瓷靶材Step 1: Preparation of BeZnOS quaternary ceramic target by solid-phase sintering
1.1按摩尔比ZnS:BeO=95:5,称取55.558g ZnS粉末和7.504g BeO粉末,混合后,加入39g去离子水,然后置于行星式球磨机中的球磨罐(球磨介质为氧化锆陶瓷球)中,球磨4h,得到混合粉末;1.1 Molar ratio ZnS:BeO=95:5, weigh 55.558g ZnS powder and 7.504g BeO powder, after mixing, add 39g deionized water, and then place it in the ball mill tank in the planetary ball mill (the ball milling medium is zirconia ceramics) ball), ball milled for 4h to obtain mixed powder;
1.2将所述混合粉末置于真空干燥箱中,在110℃条件下真空干燥10h,取出后自然冷却至室温,筛去氧化锆球,加入6g乙醇,用碾钵充分研磨均匀后使用压片机在10M Pa压强下压成直径27.5mm、厚度2mm的圆形坯片;1.2 Put the mixed powder in a vacuum drying box, dry it in a vacuum at 110°C for 10 hours, take it out and cool it to room temperature naturally, sieve off the zirconia balls, add 6g of ethanol, fully grind with a grinding bowl and use a tablet press Pressed into a circular blank with a diameter of 27.5mm and a thickness of 2mm under a pressure of 10M Pa;
1.3将所述坯片置于真空管式炉中的坩埚内,并在其周围放上成分相同的粉料(15.0000g)、高纯硫粉(3.3000g)。将真空管式炉抽真空至0.1Pa后通入高纯氩气,重复3次。在保护气氛下将管式炉升温至1300℃并保温2h,随后自然冷却至室温,得到本发明所述的BeZnOS四元陶瓷靶材。1.3 Put the green sheet in a crucible in a vacuum tube furnace, and put powder (15.0000g) and high-purity sulfur powder (3.3000g) with the same composition around it. The vacuum tube furnace was evacuated to 0.1Pa, and then high-purity argon was introduced, and the procedure was repeated 3 times. The tube furnace is heated to 1300° C. and kept for 2 hours under a protective atmosphere, and then naturally cooled to room temperature to obtain the BeZnOS quaternary ceramic target of the present invention.
步骤2:利用BeZnOS四元陶瓷靶材制备紫外光探测器Step 2: Fabrication of UV Light Detectors Using BeZnOS Quaternary Ceramic Targets
2.1以步骤1制得的BeZnOS四元陶瓷靶材作为激光烧蚀靶材,与经过丙酮、无水乙醇和去离子水等分别超声清洗15min的衬底一起装入真空室,并抽真空至10-4Pa;2.1 Use the BeZnOS quaternary ceramic target prepared in step 1 as the laser ablation target, and put it into the vacuum chamber together with the substrates that have been ultrasonically cleaned with acetone, anhydrous ethanol and deionized water for 15 min respectively, and evacuated to 10 -4 Pa;
2.2开启衬底加热并调节衬底温度为700℃,通入氧气,使得气压在整个薄膜沉积过程中维持在2Pa;然后开启衬底和靶台自转,设定激光器输出能量为400mJ/pulse,脉冲重复频率为5Hz,再开启激光沉积30min后关闭氧气与衬底加热,最后将样品在真空中自然冷却至室温后从真空室取出;2.2 Turn on the substrate heating and adjust the substrate temperature to 700°C, and inject oxygen to keep the air pressure at 2Pa during the entire film deposition process; then turn on the substrate and the target table to rotate, set the laser output energy to 400mJ/pulse, and the pulse The repetition frequency is 5 Hz, and the laser deposition is turned on for 30 min, then the oxygen and substrate heating are turned off, and finally the sample is naturally cooled to room temperature in vacuum and taken out from the vacuum chamber;
2.3通过XRD扫描定下薄膜的c轴方向,并在样品背面做标记。将薄膜和掩模板安装到真空蒸镀机的真空腔,使电极沟道与样品c轴垂直,安装钨舟后放入蒸发源——金属铝0.2g,关闭真空腔,开启机械泵、前级阀、分子泵,将真空度抽到10-4Pa。达到真空度后开启蒸发电源,在400℃温度下保持2min,缓慢地将电流提高,直到金属铝融化后保持电流恒定,打开挡板至金属蒸发完毕后缓慢降低电流,关闭蒸发源,关闭分子泵、前级阀、机械泵,并打开空气阀,得到目标MSM紫外探测器。2.3 Determine the c-axis direction of the film by XRD scanning, and mark the back of the sample. Install the film and mask into the vacuum chamber of the vacuum evaporation machine, so that the electrode channel is perpendicular to the c-axis of the sample, install the tungsten boat and put it into the evaporation source - metal aluminum 0.2g, close the vacuum chamber, turn on the mechanical pump, the front stage Valve and molecular pump to pump the vacuum to 10 -4 Pa. After reaching the vacuum degree, turn on the evaporation power supply, keep the temperature at 400 °C for 2 minutes, slowly increase the current until the metal aluminum melts and keep the current constant, open the baffle to slowly reduce the current after the metal evaporation is completed, close the evaporation source, and turn off the molecular pump. , backstage valve, mechanical pump, and open the air valve to get the target MSM UV detector.
在本实施例制得的器件电极之间施加10V的电压进行光电测试。结果表明该器件对紫外光具有明显的探测能力和较快的响应速度。器件快速响应时间τr1和τd1分别为0.28s和0.11s,测试结果分别见图2和图3。A voltage of 10V was applied between the electrodes of the device prepared in this example to conduct photoelectric tests. The results show that the device has obvious detection ability and fast response speed for ultraviolet light. The fast response times τ r1 and τ d1 of the device are 0.28s and 0.11s, respectively, and the test results are shown in Figure 2 and Figure 3, respectively.
实施例2Example 2
本实施例的一种基于BeZnOS四元合金的自发极化场增强型紫外光探测器,所述探测器从下至上依次包括m面蓝宝石衬底、有源层、一对平行金属Al电极,其中:所述有源层为m面BeZnOS四元合金薄膜,所述平行金属电极垂直于所述BeZnOS四元合金薄膜的c轴方向。所述衬底的厚度为0.43mm,所述有源层的厚度为90nm,所述电极的厚度为55nm,所述平行电极的间距为10μm。A spontaneous polarization field-enhanced ultraviolet light detector based on a BeZnOS quaternary alloy in this embodiment, the detector includes an m-plane sapphire substrate, an active layer, and a pair of parallel metal Al electrodes in sequence from bottom to top, wherein : the active layer is an m-plane BeZnOS quaternary alloy thin film, and the parallel metal electrodes are perpendicular to the c-axis direction of the BeZnOS quaternary alloy thin film. The thickness of the substrate is 0.43 mm, the thickness of the active layer is 90 nm, the thickness of the electrodes is 55 nm, and the distance between the parallel electrodes is 10 μm.
本实施例上述的基于BeZnOS四元合金的自发极化场增强型紫外光探测器采用如下方法制备而成,包括如下步骤:The above-mentioned spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy in this embodiment is prepared by the following method, including the following steps:
步骤1:采用固相烧结法制备BeZnOS四元陶瓷靶材Step 1: Preparation of BeZnOS quaternary ceramic target by solid-phase sintering
1.1按摩尔比ZnS:BeO=85:15,称取49.710g ZnS粉末和22.511g BeO粉末,混合后,加入36g去离子水,然后置于行星式球磨机中的球磨罐(球磨介质为氧化锆陶瓷球)中,球磨4h,得到混合粉末;1.1 Molar ratio ZnS:BeO=85:15, weigh 49.710g of ZnS powder and 22.511g of BeO powder, after mixing, add 36g of deionized water, and then place it in the ball milling tank of the planetary ball mill (the ball milling medium is zirconia ceramics) ball), ball milled for 4h to obtain mixed powder;
1.2将所述混合粉末置于真空干燥箱中,在110℃条件下真空干燥10h,取出后自然冷却至室温,筛去氧化锆球,加入6g乙醇,用碾钵充分研磨均匀后使用压片机在10M Pa压强下压成直径27.5mm、厚度2mm的圆形坯片;1.2 Put the mixed powder in a vacuum drying box, dry it in a vacuum at 110°C for 10 hours, take it out and cool it to room temperature naturally, sieve off the zirconia balls, add 6g of ethanol, fully grind with a grinding bowl and use a tablet press Pressed into a circular blank with a diameter of 27.5mm and a thickness of 2mm under a pressure of 10M Pa;
1.3将所述坯片置于真空管式炉中的坩埚内,并在其周围放上成分相同的粉料(15.0000g)、高纯硫粉(3.3000g)。将真空管式炉抽真空至0.1Pa后通入高纯氩气,重复3次。在保护气氛下将管式炉升温至1200℃并保温5h,随后自然冷却至室温,得到本发明所述的BeZnOS四元陶瓷靶材。1.3 Put the green sheet in a crucible in a vacuum tube furnace, and put powder (15.0000g) and high-purity sulfur powder (3.3000g) with the same composition around it. The vacuum tube furnace was evacuated to 0.1Pa, and then high-purity argon was introduced, and the procedure was repeated 3 times. The tube furnace is heated to 1200° C. and kept for 5 hours under a protective atmosphere, and then naturally cooled to room temperature to obtain the BeZnOS quaternary ceramic target of the present invention.
步骤2:利用BeZnOS四元陶瓷靶材制备紫外光探测器Step 2: Fabrication of UV Light Detectors Using BeZnOS Quaternary Ceramic Targets
2.1以步骤1制得的BeZnOS四元陶瓷靶材作为激光烧蚀靶材,与经过丙酮、无水乙醇和去离子水等分别超声清洗15min的衬底一起装入真空室,并抽真空至10-4Pa;2.1 Use the BeZnOS quaternary ceramic target prepared in step 1 as the laser ablation target, and put it into the vacuum chamber together with the substrates that have been ultrasonically cleaned with acetone, anhydrous ethanol and deionized water for 15 min respectively, and evacuated to 10 -4 Pa;
2.2开启衬底加热并调节衬底温度为400℃,通入氧气,使得气压在整个薄膜沉积过程中维持在4Pa;然后开启衬底和靶台自转,设定激光器输出能量为250mJ/pulse,脉冲重复频率为5Hz,再开启激光沉积60min后关闭氧气与衬底加热,最后将样品在真空中自然冷却至室温后从真空室取出;2.2 Turn on the substrate heating and adjust the substrate temperature to 400°C, and inject oxygen to keep the air pressure at 4Pa during the entire film deposition process; then turn on the substrate and the target table to rotate, set the laser output energy to 250mJ/pulse, and the pulse The repetition frequency was 5 Hz, and the laser deposition was turned on for 60 min, then the oxygen and the substrate heating were turned off, and finally the sample was naturally cooled to room temperature in vacuum and taken out from the vacuum chamber;
2.3将步骤2所得样品通过XRD扫描定下薄膜的c轴方向,并在样品背面做标记。将薄膜和叉指电极掩模板安装到真空蒸镀机的真空腔,使电极沟道与样品c轴垂直。安装钨舟,放入蒸发源—金属铝0.2g,关闭真空腔,开启机械泵、前级阀、分子泵,将真空度抽到10- 4Pa。达到真空度后开启蒸发电源,以100A/min的速度将电流提高到金属铝融化,打开挡板至金属蒸发完毕后缓慢降低电流,关闭蒸发源,关闭分子泵,前级阀,机械泵,并打开空气阀。关闭仪器后取出样品。2.3 The sample obtained in step 2 was scanned by XRD to determine the c-axis direction of the film, and marked on the back of the sample. Mount the thin film and interdigital electrode mask into the vacuum chamber of the vacuum evaporation machine so that the electrode channel is perpendicular to the c-axis of the sample. Install the tungsten boat, put in the evaporation source—metal aluminum 0.2g, close the vacuum chamber, open the mechanical pump, the front valve, and the molecular pump, and pump the vacuum to 10 - 4 Pa. After reaching the vacuum degree, turn on the evaporation power supply, increase the current at a speed of 100A/min until the metal aluminum melts, open the baffle to slowly reduce the current after the metal evaporation is completed, close the evaporation source, close the molecular pump, the front valve, and the mechanical pump. Open the air valve. Remove the sample after turning off the instrument.
在本实施例制得的器件电极之间施加10V的电压进行光电测试。结果表明该器件对紫外光具有明显的探测能力和较快的响应速度。器件快速响应时间τr1和τd1分别为0.19s和0.21s,且响应波段在紫外光区域,测试结果分别见图4,图5和图8。A voltage of 10V was applied between the electrodes of the device prepared in this example to conduct photoelectric tests. The results show that the device has obvious detection ability and fast response speed for ultraviolet light. The fast response time τ r1 and τ d1 of the device are 0.19s and 0.21s, respectively, and the response band is in the ultraviolet region. The test results are shown in Figure 4, Figure 5 and Figure 8, respectively.
实施例3(对比实施例)Example 3 (comparative example)
本实施例的一种基于BeZnOS四元合金的无自发极化场增强型紫外光探测器,所述探测器从下至上依次包括m面蓝宝石衬底、有源层、一对平行金属Al电极,其中:所述有源层为m面BeZnOS四元合金薄膜,所述平行金属电极平行于所述BeZnOS四元合金薄膜的c轴方向。所述衬底的厚度为0.43mm,所述有源层的厚度为90nm,所述电极的厚度为60nm,所述平行电极的间距为10μm。A non-spontaneous polarization field-enhanced ultraviolet light detector based on a BeZnOS quaternary alloy in this embodiment, the detector includes an m-plane sapphire substrate, an active layer, and a pair of parallel metal Al electrodes in sequence from bottom to top, Wherein: the active layer is an m-plane BeZnOS quaternary alloy thin film, and the parallel metal electrodes are parallel to the c-axis direction of the BeZnOS quaternary alloy thin film. The thickness of the substrate is 0.43 mm, the thickness of the active layer is 90 nm, the thickness of the electrodes is 60 nm, and the distance between the parallel electrodes is 10 μm.
本实施例上述的基于BeZnOS四元合金的无自发极化场增强型紫外光探测器采用如下方法制备而成,包括如下步骤:The above-mentioned BeZnOS quaternary alloy-based ultraviolet light detector without spontaneous polarization is prepared by the following method, including the following steps:
步骤1:采用固相烧结法制备BeZnOS四元陶瓷靶材Step 1: Preparation of BeZnOS quaternary ceramic target by solid-phase sintering
1.1按摩尔比ZnS:BeO=92:8,称取53.803g ZnS粉末和18.065g BeO粉末,混合后,加入39g去离子水,然后置于行星式球磨机中的球磨罐(球磨介质为氧化锆陶瓷球)中,球磨4h,得到混合粉末;1.1 Molar ratio ZnS:BeO=92:8, weigh 53.803g of ZnS powder and 18.065g of BeO powder, after mixing, add 39g of deionized water, and then place it in the ball milling tank of the planetary ball mill (the ball milling medium is zirconia ceramics) ball), ball milled for 4h to obtain mixed powder;
1.2将所述混合粉末置于真空干燥箱中,在110℃条件下真空干燥10h,取出后自然冷却至室温,筛去氧化锆球,加入6g乙醇,用碾钵充分研磨均匀后使用压片机在10M Pa压强下压成直径27.5mm、厚度2mm的圆形坯片;1.2 Put the mixed powder in a vacuum drying box, dry it in a vacuum at 110°C for 10 hours, take it out and cool it to room temperature naturally, sieve off the zirconia balls, add 6g of ethanol, fully grind with a grinding bowl and use a tablet press Pressed into a circular blank with a diameter of 27.5mm and a thickness of 2mm under a pressure of 10M Pa;
1.3将所述坯片置于真空管式炉中的坩埚内,并在其周围放上成分相同的粉料(15.0000g)、高纯硫粉(3.3000g)。将真空管式炉抽真空至0.1Pa后通入高纯氩气,重复3次。在保护气氛下将管式炉升温至1300℃并保温2h,随后自然冷却至室温,得到本发明所述的BeZnOS四元陶瓷靶材。1.3 Put the green sheet in a crucible in a vacuum tube furnace, and put powder (15.0000g) and high-purity sulfur powder (3.3000g) with the same composition around it. The vacuum tube furnace was evacuated to 0.1Pa, and then high-purity argon was introduced, and the procedure was repeated 3 times. The tube furnace is heated to 1300° C. and kept for 2 hours under a protective atmosphere, and then naturally cooled to room temperature to obtain the BeZnOS quaternary ceramic target of the present invention.
步骤2利用BeZnOS四元陶瓷靶材制备紫外光探测器Step 2 Preparation of UV light detector using BeZnOS quaternary ceramic target
2.1以步骤1制得的BeZnOS四元陶瓷靶材作为激光烧蚀靶材,与经过丙酮、无水乙醇和去离子水等分别超声清洗15min的衬底一起装入真空室,并抽真空至10-4Pa;2.1 Use the BeZnOS quaternary ceramic target prepared in step 1 as the laser ablation target, and put it into the vacuum chamber together with the substrates that have been ultrasonically cleaned with acetone, anhydrous ethanol and deionized water for 15 min respectively, and evacuated to 10 -4 Pa;
2.2开启衬底加热并调节衬底温度为400℃,通入氧气,使得气压在整个薄膜沉积过程中维持在4Pa;然后开启衬底和靶台自转,设定激光器输出能量为400mJ/pulse,脉冲重复频率为5Hz,脉冲个数9000个,再开启激光沉积30min后关闭氧气与衬底加热,最后将样品在真空中自然冷却至室温后从真空室取出;2.2 Turn on the substrate heating and adjust the substrate temperature to 400 °C, and inject oxygen to keep the air pressure at 4Pa during the entire film deposition process; then turn on the substrate and the target table to rotate, set the laser output energy to 400mJ/pulse, pulse The repetition frequency is 5Hz, the number of pulses is 9000, and the laser deposition is turned on for 30 minutes, then the oxygen and substrate heating are turned off, and finally the sample is naturally cooled to room temperature in vacuum and taken out from the vacuum chamber;
2.3将步骤2所得样品使用四圆单晶XRD进行(103)面扫描,确定样品的c方向,并做标记。安装样品和掩模板使电极与c轴平行,安装钨舟后放入蒸发源——金属铝0.3g,关闭真空腔,开启机械泵、前级阀、分子泵,将真空度抽到10-4Pa。达到真空度后开启蒸发电源,以100A/min的速度将电流提高,直到到金属铝融化,打开挡板至金属蒸发完毕后缓慢降低电流,关闭蒸发源,关闭分子泵,前级阀,机械泵,并打开空气阀。当空气充满真空腔体后关闭仪器,取出样品,得到目标光探测器。2.3 Scan the (103) plane of the sample obtained in step 2 using four-circle single crystal XRD to determine the c-direction of the sample and mark it. Install the sample and mask so that the electrode is parallel to the c-axis, install the tungsten boat and put in the evaporation source - metal aluminum 0.3g, close the vacuum chamber, open the mechanical pump, front valve, and molecular pump, and pump the vacuum to 10 -4 Pa. After reaching the vacuum degree, turn on the evaporation power supply, increase the current at a speed of 100A/min until the metal aluminum melts, open the baffle to slowly reduce the current after the metal evaporation is completed, close the evaporation source, close the molecular pump, the front valve, and the mechanical pump. , and open the air valve. When the vacuum chamber is filled with air, the instrument is turned off, the sample is taken out, and the target photodetector is obtained.
在本实施例制得的器件电极之间施加10V的电压进行光电测试。结果表明该器件对紫外光具有相对于自发极化场增强型探测器较慢的响应速度。器件快速响应时间τr1和τd1分别为0.30s和0.46s,测试结果分别见图6和图7。A voltage of 10V was applied between the electrodes of the device prepared in this example to conduct photoelectric tests. The results show that the device has a slower response speed to ultraviolet light than the spontaneous polarization field-enhanced detector. The device's fast response times τ r1 and τ d1 are 0.30s and 0.46s, respectively, and the test results are shown in Figure 6 and Figure 7, respectively.
实施例4Example 4
本实施例的一种基于BeZnOS四元合金的自发极化场增强型紫外光探测器,所述探测器从下至上依次包括m面蓝宝石衬底、有源层、一对平行金属Au电极,其中:所述有源层为m面BeZnOS四元合金薄膜,所述平行金属电极垂直于所述BeZnOS四元合金薄膜的c轴方向。所述衬底的厚度为0.43mm,所述有源层的厚度为80nm,所述电极的厚度为30nm,所述平行电极的间距为30μm。A spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy in this embodiment, the detector includes an m-plane sapphire substrate, an active layer, and a pair of parallel metal Au electrodes in sequence from bottom to top, wherein : the active layer is an m-plane BeZnOS quaternary alloy thin film, and the parallel metal electrodes are perpendicular to the c-axis direction of the BeZnOS quaternary alloy thin film. The thickness of the substrate is 0.43 mm, the thickness of the active layer is 80 nm, the thickness of the electrodes is 30 nm, and the distance between the parallel electrodes is 30 μm.
本实施例上述的基于BeZnOS四元合金的自发极化场增强型紫外光探测器采用如下方法制备而成,包括如下步骤:The above-mentioned spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy in this embodiment is prepared by the following method, including the following steps:
步骤1:采用实施例1相同的固相烧结法制备BeZnOS四元陶瓷靶材。Step 1: The BeZnOS quaternary ceramic target was prepared by the same solid-phase sintering method as in Example 1.
步骤2利用BeZnOS四元陶瓷靶材制备紫外光探测器Step 2 Preparation of UV light detector using BeZnOS quaternary ceramic target
2.1以步骤1制得的BeZnOS四元陶瓷靶材作为激光烧蚀靶材,与经过丙酮、无水乙醇和去离子水等分别超声清洗15min的衬底一起装入真空室,并抽真空至10-4Pa;2.1 Use the BeZnOS quaternary ceramic target prepared in step 1 as the laser ablation target, and put it into the vacuum chamber together with the substrates that have been ultrasonically cleaned with acetone, anhydrous ethanol and deionized water for 15 min respectively, and evacuated to 10 -4 Pa;
2.2开启衬底加热并调节衬底温度为100℃,通入氧气,使得气压在整个薄膜沉积过程中维持在8Pa;然后开启衬底和靶台自转,设定激光器输出能量为200mJ/pulse,脉冲重复频率为5Hz,再开启激光沉积10min后关闭氧气与衬底加热,最后将样品在真空中自然冷却至室温后从真空室取出;2.2 Turn on the substrate heating and adjust the substrate temperature to 100°C, inject oxygen, so that the air pressure is maintained at 8Pa during the entire film deposition process; then turn on the substrate and the target table to rotate, set the laser output energy to 200mJ/pulse, pulse The repetition frequency was 5 Hz, and then the laser deposition was turned on for 10 min, then the oxygen and the substrate heating were turned off, and finally the sample was naturally cooled to room temperature in vacuum and taken out from the vacuum chamber;
2.3通过XRD扫描定下薄膜的c轴方向,并在样品背面做标记。将薄膜和掩模板安装到真空蒸镀机的真空腔,使电极沟道与样品c轴垂直,安装钨舟后放入蒸发源——金属Au0.2g,关闭真空腔,开启机械泵、前级阀、分子泵,将真空度抽到10-4Pa。达到真空度后开启蒸发电源,在400℃温度下保持2min,缓慢地将电流提高,直到金属Au融化后保持电流恒定,打开挡板至金属蒸发完毕后缓慢降低电流,关闭蒸发源,关闭分子泵,前级阀,机械泵,并打开空气阀,得到目标MSM紫外探测器。2.3 Determine the c-axis direction of the film by XRD scanning, and mark the back of the sample. Install the film and mask into the vacuum chamber of the vacuum evaporation machine, make the electrode channel perpendicular to the c-axis of the sample, install the tungsten boat and put it into the evaporation source - metal Au0.2g, close the vacuum chamber, turn on the mechanical pump, the front stage Valve and molecular pump to pump the vacuum to 10 -4 Pa. After reaching the vacuum degree, turn on the evaporation power supply, keep it at 400 °C for 2 minutes, slowly increase the current until the metal Au melts and keep the current constant, open the baffle to slowly reduce the current after the metal evaporation is completed, turn off the evaporation source, and turn off the molecular pump. , the foreline valve, the mechanical pump, and the open air valve to get the target MSM UV detector.
实施例5Example 5
本实施例的一种基于BeZnOS四元合金的自发极化场增强型紫外光探测器,所述探测器从下至上依次包括m面蓝宝石衬底、有源层、一对平行金属Pt电极,其中:所述有源层为m面BeZnOS四元合金薄膜,所述平行金属电极垂直于所述BeZnOS四元合金薄膜的c轴方向。所述衬底的厚度为0.43mm,所述有源层的厚度为160nm,所述电极的厚度为30nm,所述平行电极的间距为60μm。A spontaneous polarization field-enhanced ultraviolet light detector based on BeZnOS quaternary alloy in this embodiment, the detector includes an m-plane sapphire substrate, an active layer, and a pair of parallel metal Pt electrodes in sequence from bottom to top, wherein : the active layer is an m-plane BeZnOS quaternary alloy thin film, and the parallel metal electrodes are perpendicular to the c-axis direction of the BeZnOS quaternary alloy thin film. The thickness of the substrate is 0.43 mm, the thickness of the active layer is 160 nm, the thickness of the electrodes is 30 nm, and the distance between the parallel electrodes is 60 μm.
本实施例上述所述的基于BeZnOS四元合金的自发极化场增强型紫外光探测器采用如下方法制备而成,包括如下步骤:The spontaneous polarization field-enhanced ultraviolet light detector based on the BeZnOS quaternary alloy described above in this embodiment is prepared by the following method, including the following steps:
步骤1:采用实施例1相同的固相烧结法制备BeZnOS四元陶瓷靶材。Step 1: The BeZnOS quaternary ceramic target was prepared by the same solid-phase sintering method as in Example 1.
步骤2利用BeZnOS四元陶瓷靶材制备紫外光探测器Step 2 Preparation of UV light detector using BeZnOS quaternary ceramic target
2.1以步骤1制得的BeZnOS四元陶瓷靶材作为激光烧蚀靶材,与经过丙酮、无水乙醇和去离子水等分别超声清洗15min的衬底一起装入真空室,并抽真空至10-4Pa;2.1 Use the BeZnOS quaternary ceramic target prepared in step 1 as the laser ablation target, and put it into the vacuum chamber together with the substrates that have been ultrasonically cleaned with acetone, anhydrous ethanol and deionized water for 15 min respectively, and evacuated to 10 -4 Pa;
2.2开启衬底加热并调节衬底温度为800℃,通入氧气,使得气压在整个薄膜沉积过程中维持在10Pa;然后开启衬底和靶台自转,设定激光器输出能量为600mJ/pulse,脉冲重复频率为5Hz,再开启激光沉积40min后关闭氧气与衬底加热,最后将样品在真空中自然冷却至室温后从真空室取出;2.2 Turn on the substrate heating and adjust the substrate temperature to 800°C, and inject oxygen to keep the air pressure at 10Pa during the entire film deposition process; then turn on the substrate and the target table to rotate, set the laser output energy to 600mJ/pulse, pulse The repetition frequency is 5 Hz, and the laser deposition is turned on for 40 minutes, then the oxygen and substrate heating are turned off, and finally the sample is naturally cooled to room temperature in vacuum and taken out from the vacuum chamber;
2.3通过XRD扫描定下薄膜的c轴方向,并在样品背面做标记。将薄膜和掩模板安装到真空蒸镀机的真空腔,使电极沟道与样品c轴垂直,安装钨舟后放入蒸发源——金属Ag0.2g,关闭真空腔,开启机械泵、前级阀、分子泵,将真空度抽到10-4Pa。达到真空度后开启蒸发电源,在400℃温度下保持2min,缓慢地将电流提高,直到金属Ag融化后保持电流恒定,打开挡板至金属蒸发完毕后缓慢降低电流,关闭蒸发源,关闭分子泵,前级阀,机械泵,并打开空气阀,得到目标MSM紫外探测器。2.3 Determine the c-axis direction of the film by XRD scanning, and mark the back of the sample. Install the film and mask into the vacuum chamber of the vacuum evaporation machine, so that the electrode channel is perpendicular to the c-axis of the sample, install the tungsten boat and put it into the evaporation source - metal Ag0.2g, close the vacuum chamber, turn on the mechanical pump, the front stage Valve and molecular pump to pump the vacuum to 10 -4 Pa. After reaching the vacuum degree, turn on the evaporation power supply, keep it at 400 °C for 2 minutes, slowly increase the current until the metal Ag is melted and keep the current constant, open the baffle to slowly reduce the current after the metal is evaporated, turn off the evaporation source, and turn off the molecular pump. , the foreline valve, the mechanical pump, and the open air valve to get the target MSM UV detector.
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