CN109581555B - Depolarization beam splitter prism and preparation method thereof - Google Patents
Depolarization beam splitter prism and preparation method thereof Download PDFInfo
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- CN109581555B CN109581555B CN201811338527.XA CN201811338527A CN109581555B CN 109581555 B CN109581555 B CN 109581555B CN 201811338527 A CN201811338527 A CN 201811338527A CN 109581555 B CN109581555 B CN 109581555B
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- 230000028161 membrane depolarization Effects 0.000 title claims abstract description 47
- 238000002360 preparation method Methods 0.000 title claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 11
- 230000003014 reinforcing effect Effects 0.000 claims abstract description 10
- 239000010410 layer Substances 0.000 claims description 111
- 230000007704 transition Effects 0.000 claims description 19
- 238000007747 plating Methods 0.000 claims description 18
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 12
- 230000037452 priming Effects 0.000 claims description 12
- 239000011241 protective layer Substances 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 8
- 230000002708 enhancing effect Effects 0.000 claims description 4
- 230000002999 depolarising effect Effects 0.000 claims description 3
- 238000010884 ion-beam technique Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 238000010521 absorption reaction Methods 0.000 abstract description 4
- 239000000853 adhesive Substances 0.000 abstract description 4
- 230000001070 adhesive effect Effects 0.000 abstract description 4
- 239000011521 glass Substances 0.000 description 17
- 239000000463 material Substances 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 230000010287 polarization Effects 0.000 description 4
- 239000003292 glue Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000004026 adhesive bonding Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000006121 base glass Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/04—Prisms
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Optical Elements Other Than Lenses (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention provides a depolarization beam-splitting prism and a preparation method thereof, wherein the depolarization beam-splitting prism comprises at least two prism substrates, a depolarization beam-splitting film is plated between the two prism substrates, the depolarization beam-splitting film comprises a metal layer with absorption characteristics and a dielectric layer plated outside the metal layer, and an adhesion reinforcing layer is plated between the dielectric layer and the prism substrates. The invention solves the problem that the existing beam-splitting prism cannot be placed for a long time due to the poor adhesive force and hardness of the film layer, further improves the process preparation quality and reduces the production cost.
Description
Technical Field
The invention relates to the technical field of optical coating, in particular to a depolarization beam splitter prism and a preparation method thereof.
Background
The depolarization beam splitter prism refers to a cube prism which has nearly the same beam splitting characteristics for incident light with different polarization states, i.e., is insensitive to the polarization state of the incident light, in a specified use band range. Such elements find wide application in the fields of interferometers, medical instruments, theodolites and the like.
As shown in fig. 1 and 2, the depolarization beam splitter prism is composed of two half cubes, wherein a depolarization beam splitter film 9a is plated on the inclined surface of one half cube 1a, then the two half cubes 1a are glued together by transparent glue with the refractive index approximately equal to that of the glass substrate, and after curing by ultraviolet rays, a complete depolarization beam splitter prism is obtained.
On the basis of fig. 1 and 2, when broadband depolarization is concerned, materials with absorption characteristics such as metallic silver or silicon are required to be used as depolarization materials, and materials used for the depolarization beam-splitting film include materials such as ZnS and Al 2O3、Ag、Si、TiO2、SiO2. When the polarization eliminating requirement is high, namely when the light splitting characteristic difference requirement of different polarization states is small, metallic silver is selected as a film material, and ZnS and Al 2O3 are correspondingly selected as medium matching film materials. Further, in vacuum plating by electron beam evaporation, silver is easily oxidized at high temperature due to the participation of metallic silver in plating. In order to prevent silver oxidation, the half-cube prism is at normal temperature during film plating, and cannot be heated, and generally, the film plating process at the temperature of about 25 ℃ is also called cold plating. Therefore, the dielectric film ZnS and Al 2O3 can be plated only at normal temperature.
However, the film layer plated by the cold plating process has poor adhesive force and hardness, and the surface is easy to scratch in the wiping and cleaning process, so that the glue treatment is needed immediately after the depolarization beam splitting film is plated. If the film is left in the atmosphere for a long time, the film may become weaker after absorbing the water vapor in the air, and the metallic silver layer may be oxidized. These factors can degrade the spectroscopic properties of the beam splitting prism and even completely lose its performance.
In the prior art, as shown in fig. 3 and 4, the film system of the depolarization spectroscopic film includes "glass/ZnS/Ag/ZnS/glass" or "glass/ZnS/Ag/ZnS/Al 2O3/glass". Taking glass/ZnS/Ag/ZnS/Al 2O3/glass as an example, during cold plating, the binding force between the ZnS film layer 2a and the base glass 1a, the binding force between the Al 2O3 film layer 3a and the ZnS film layer 2a and the compactness and hardness of the Al 2O3 film layer 3a are not good, so that the depolarization beam splitter film needs to be rapidly sealed, the gluing process is completed manually, the workload of one day is limited, and if a large number of depolarization beam splitter films are produced once, and the depolarization beam splitter films cannot be glued in time, the depolarization beam splitter films are possibly scrapped, thereby greatly increasing the practical manufacturing cost. If the depolarization light splitting film can be stored in the air for a long time, the depolarization light splitting film can be produced in batches, so that the production cost is greatly reduced.
Disclosure of Invention
The invention aims to overcome the defects in the prior art, and provides a depolarization beam splitter prism and a preparation method thereof, so as to solve the problem that a beam splitter film cannot be placed for a long time due to the fact that the film layer adhesive force and the hardness of the existing beam splitter prism are poor.
In order to achieve the above object, the following technical scheme is adopted:
The invention firstly provides a depolarization beam-splitting prism which comprises at least two prism substrates, wherein a depolarization beam-splitting film is plated between the two prism substrates, the depolarization beam-splitting film comprises a metal layer with absorption characteristics and a dielectric layer plated on the surface of the metal layer, and an adhesion reinforcing layer is plated between the dielectric layer and the prism substrates.
Preferably, the adhesion enhancing layer comprises a primer layer and a transition layer, wherein the transition layer is plated on the surface of the medium layer, and the primer layer is plated on the surface of the transition layer for adhesion with the prism substrate.
Preferably, the priming layer is a SiO 2 film layer, and the transition layer is an Al 2O3 film layer.
Preferably, the surface with the adhesion reinforcing layer is also plated with a waterproof protective layer.
Preferably, the waterproof protective layer is a SiO 2 film layer.
Preferably, each prism substrate is a triangular prism or a right-angle prism, and the depolarization beam splitting film is plated between any two contact surfaces of the two prism substrates.
In order to better achieve the above purpose, the invention also provides a preparation method of the depolarization beam splitter prism, which comprises the following steps:
providing at least two prism substrates, wherein a depolarization beam splitting film comprising a metal layer and a dielectric layer is plated between any two contact surfaces of the two prism substrates;
And plating an adhesion reinforcing layer between the prism substrate and the dielectric layer.
Preferably, plating the adhesion enhancing layer comprises the steps of:
providing a priming layer and a transition layer, plating the transition layer on the surface of the medium layer, and plating the priming layer on the surface of the transition layer to be adhered with the prism substrate.
Preferably, the method further comprises the following steps:
Plating a waterproof protective layer on the surface with the bonding reinforcing layer.
Preferably, the method further comprises the following steps:
And (3) performing ion beam assisted coating by adopting an End-Hall ion source when the priming layer and the waterproof protective layer are coated by adopting an ion assisted coating technology.
The beneficial effects provided by the invention include:
1) The binding force/adhesive force between the film layers is obviously improved by additionally arranging a priming layer and a transition layer on the existing metal layer and medium layer;
2) The protective layer is additionally arranged on the outermost layer, so that water vapor is effectively prevented from entering the film layer;
3) By introducing an ion auxiliary coating technology, the binding force and the compactness between the film layer and the glass substrate are further improved.
Drawings
Fig. 1 is a schematic perspective view of a conventional depolarizing prism in a cut-out state;
FIG. 2 is a schematic view of the glued state corresponding to FIG. 1;
FIG. 3 is a schematic cross-sectional structure of a "glass/ZnS/Ag/ZnS/glass" film system corresponding to that of FIG. 2;
FIG. 4 is a schematic cross-sectional structure of a "glass/ZnS/Ag/ZnS/Al 2O3/glass" film system corresponding to that of FIG. 2;
FIG. 5 is a schematic diagram of a cross-sectional structure of the depolarizing beam splitter prism of the present invention prior to bonding;
fig. 6 is a schematic view corresponding to fig. 5 after being glued.
Detailed Description
The invention is described in detail below with reference to the attached drawing figures:
As shown in fig. 5 and 6, the present invention firstly discloses a depolarization beam splitter prism, which comprises at least two prism substrates 1, wherein a depolarization beam splitter film is plated between the two prism substrates 1, the depolarization beam splitter film comprises a metal layer 2 with absorption characteristics and a dielectric layer 3 plated on the outer surface of the metal layer 2, wherein an adhesion reinforcing layer is plated between the dielectric layer 3 and the prism substrates 1.
Specifically, the adhesion enhancing layer comprises a priming layer 4 and a transition layer 5, the transition layer 5 is plated on the outer surface of the dielectric layer 3, and the priming layer 4 is plated on the outer surface of the transition layer 5 for adhesion with the prism substrate 1. The outer surface with the bonding reinforcing layer is also plated with a waterproof protective layer 6.
More preferably, the bottom layer 4 is a SiO 2 film layer, and the transition layer 5 is an Al 2O3 film layer. The waterproof protective layer 6 is a SiO 2 film layer. The metal layer 2 is an Ag film layer, and the dielectric layer 3 is a ZnS film layer. Each prism substrate 1 is a triangular prism or a right-angle prism, and the depolarization beam splitting film is plated between any two contact surfaces to be bonded of the two prism substrates 1.
After the structural characteristics are provided, the invention also discloses a preparation process of the depolarization beam splitter prism, the depolarization beam splitter prism can be manufactured through the preparation process, and the preparation process of the depolarization beam splitter prism specifically comprises the following steps of:
a. as shown in fig. 5, at least two prism substrates 1 are provided, wherein a depolarization beam splitting film comprising a metal layer 2 (Ag film) and a dielectric layer 3 (ZnS film) is plated between any two contact surfaces of the two prism substrates 1, and the two layers are layers plated by the depolarization beam splitting film in the prior art;
b. In order to improve the binding force between the film and the glass substrate 1, siO 2 film material is introduced as a base layer 4, the specific method is that a SiO 2 film layer with the thickness of 20-80 nm is plated on the glass substrate 1 to form the base layer 4, and the base layer 4 is plated on the glass substrate 1 of the left half piece;
c. Because the bonding force between the SiO 2 film material 4 and the ZnS film layer 3 is poor, a transition layer 5 is plated between the SiO 2 film layer 4 and the ZnS film layer 3, and an Al 2O3 film layer is preferably used as the transition layer 5; b and c, forming an adhesion reinforcing layer on the outer surface of the depolarization beam splitting film;
d. A SiO 2 film layer with the thickness of 40-200 nm is plated on the surface of the outermost layer of the film system to prevent water vapor from entering the film layer, so that a protective layer 6 is formed;
e. Preferably, an ion auxiliary coating technology is introduced when the steps b to d are executed, and an End-Hall ion source is adopted to carry out ion beam auxiliary coating when the bottom layer 4 (SiO 2 film) and the protective layer 6 are coated so as to further improve the binding force and the compactness between the film layer and the glass substrate 1;
f. As shown in fig. 6, the right half glass substrate 1 was bonded to the SiO 2 waterproof protective layer 6 on the outermost surface through the adhesive layer 7.
And after the glue is solidified, all the preparation procedures are completed, and the depolarization beam splitter prism of the cube is formed.
After the above implementation, the following advantages of the present invention should be exhibited:
After the film coating process is adopted, the depolarization beam splitting film can be placed in the air for any time, and the film layer is hard in surface, so that the wiping paper can be resisted, and the surface scratch can not be caused. The production efficiency of the depolarization beam splitter prism is greatly improved. Through practical verification, only 200 depolarization beam splitting cubes with the size of 25.4X25.4X25.4 can be produced in the original week, 500 or more depolarization beam splitting cubes can be produced at present, the production plan is not limited by the gluing time, and the produced depolarization beam splitting film can be glued on the basis of the office. The technical scheme of the invention improves the process preparation quality and reduces the production cost.
The examples of the present invention are intended to be illustrative only and not to limit the scope of the claims, and other substantially equivalent substitutions will occur to those skilled in the art and are intended to be within the scope of the present invention.
Claims (2)
1. The preparation method of the depolarization beam splitter prism is characterized by comprising the following steps of:
Providing at least two prism substrates, wherein a depolarization beam splitting film comprising a metal layer and a dielectric layer is plated between any two contact surfaces of the two prism substrates;
Plating an adhesion reinforcing layer between the prism substrate and the dielectric layer,
Plating the adhesion enhancing layer comprises the steps of:
Providing a priming layer and a transition layer, plating the transition layer on the surface of the medium layer, plating the priming layer on the surface of the transition layer for bonding with the prism substrate, wherein the priming layer is a SiO 2 film layer, the transition layer is an Al 2O3 film layer,
Plating the priming layer on the surface of the transition layer for bonding with the prism substrate,
Plating a waterproof protection layer on the surface with the bonding reinforcing layer, wherein the waterproof protection layer is a SiO 2 film layer.
2. The method for preparing a depolarizing prism as recited in claim 1, further comprising the steps of:
And (3) performing ion beam assisted coating by adopting an End-Hall ion source when the priming layer and the waterproof protective layer are coated by adopting an ion assisted coating technology.
Priority Applications (1)
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CN201811338527.XA CN109581555B (en) | 2018-11-12 | 2018-11-12 | Depolarization beam splitter prism and preparation method thereof |
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CN201811338527.XA CN109581555B (en) | 2018-11-12 | 2018-11-12 | Depolarization beam splitter prism and preparation method thereof |
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CN109581555B true CN109581555B (en) | 2024-06-18 |
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CN103513429A (en) * | 2013-10-16 | 2014-01-15 | 中国科学院半导体研究所 | Collimation light splitter system |
CN205539549U (en) * | 2016-04-28 | 2016-08-31 | 成都科弘光学元件有限公司 | Anti -mildew's optical instrument graticule |
CN108697007A (en) * | 2018-06-21 | 2018-10-23 | 张家港康得新光电材料有限公司 | A kind of flexible copper-clad plate |
CN209387906U (en) * | 2018-11-12 | 2019-09-13 | 江西兆九光电技术有限公司 | Depolarized Amici prism |
Family Cites Families (4)
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JP2010243641A (en) * | 2009-04-02 | 2010-10-28 | Fujifilm Corp | Bonding optical element and bonding method |
CN105403942B (en) * | 2015-12-02 | 2019-03-08 | 利达光电股份有限公司 | A kind of smalt cutoff filter and its film plating process |
CN206400198U (en) * | 2017-01-18 | 2017-08-11 | 福州荣德光电科技有限公司 | A kind of non-polarization Beamsplitter structure |
CN108772567A (en) * | 2018-06-29 | 2018-11-09 | 米亚索乐装备集成(福建)有限公司 | A kind of alloy material for CIG target prime coats, CIG targets and preparation method thereof |
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2018
- 2018-11-12 CN CN201811338527.XA patent/CN109581555B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103513429A (en) * | 2013-10-16 | 2014-01-15 | 中国科学院半导体研究所 | Collimation light splitter system |
CN205539549U (en) * | 2016-04-28 | 2016-08-31 | 成都科弘光学元件有限公司 | Anti -mildew's optical instrument graticule |
CN108697007A (en) * | 2018-06-21 | 2018-10-23 | 张家港康得新光电材料有限公司 | A kind of flexible copper-clad plate |
CN209387906U (en) * | 2018-11-12 | 2019-09-13 | 江西兆九光电技术有限公司 | Depolarized Amici prism |
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