CN109507827B - Display panel manufacturing method, display panel manufacturing device and display panel - Google Patents
Display panel manufacturing method, display panel manufacturing device and display panel Download PDFInfo
- Publication number
- CN109507827B CN109507827B CN201811616625.5A CN201811616625A CN109507827B CN 109507827 B CN109507827 B CN 109507827B CN 201811616625 A CN201811616625 A CN 201811616625A CN 109507827 B CN109507827 B CN 109507827B
- Authority
- CN
- China
- Prior art keywords
- light
- spacer
- substrate
- layer
- color
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a display panel manufacturing method, a display panel manufacturing device and a display panel, wherein the display panel manufacturing method comprises the following steps: providing a substrate; sequentially coating a plurality of layers of color photoresist on the substrate in a patterning mode, wherein the color photoresist covers a light-transmitting area and a non-light-transmitting area of the substrate; coating a photosensitive material on the substrate coated with the color photoresist layer; and forming a spacer layer in the non-light-transmitting area after patterning the photosensitive material, wherein the spacer layer comprises a spacer area and a light-shielding area, and the height of the spacer area is greater than that of the light-shielding area. The invention reduces one process, reduces the number of required light shades by one type, improves the process of manufacturing the display panel, saves time, improves efficiency and saves cost.
Description
Technical Field
The invention relates to the technical field of display, in particular to a display panel manufacturing method, a display panel manufacturing device and a display panel.
Background
At present, a liquid crystal display device generally adopts a display panel of a VA (vertically aligned liquid crystal) type wide viewing angle technology, where the VA includes two types, namely, a PVA (Patterned Vertical Alignment) and an MVA (Multi-domain Vertical Alignment). Since the liquid crystal panel of the PVA technology has a much higher quality than that of MVA, the PVA technology has become the mainstream of the VA panel technology.
In the conventional PVA technology, five processes are generally required to complete the fabrication of the color filter substrate, i.e., BM (Black Matrix), R (red), G (green), B (blue), and PS (Photo Spacer). Since the above five processes all require steps of photoresist coating, baking, exposing, developing, cleaning, and drying, the process of the display panel is complex, time consuming, and costly.
Disclosure of Invention
The invention mainly aims to provide a display panel manufacturing method, a display panel manufacturing device and a display panel, and aims to achieve the purposes of reducing display panel manufacturing processes, improving efficiency and saving cost.
In order to achieve the above object, an aspect of the present invention provides a method for manufacturing a display panel, where the method for manufacturing a display panel includes the following steps:
providing a substrate;
sequentially coating a plurality of layers of color photoresist on the substrate in a patterning mode, wherein the color photoresist covers a light-transmitting area and a non-light-transmitting area of the substrate;
coating a photosensitive material on the substrate coated with the color photoresist layer;
and forming a spacer layer in the non-light-transmitting area after patterning the photosensitive material, wherein the spacer layer comprises a spacer area and a light-shielding area, and the height of the spacer area is greater than that of the light-shielding area.
Optionally, the step of sequentially coating a plurality of layers of color photoresists on the substrate in a patterning manner, where the color photoresists cover a light-transmitting region and a non-light-transmitting region of the substrate includes:
and sequentially coating a plurality of layers of color photoresist on the substrate in a patterning mode, wherein the color photoresist covers the light-transmitting area and part of the non-light-transmitting area of the substrate.
Optionally, at least one color photoresist layer is formed in the partially opaque region.
Optionally, the spacer region includes a main spacer region and an auxiliary spacer region, at least two color photoresist layers cover a part of the partial non-light-transmitting region corresponding to the main spacer region, at least one color photoresist layer covers a part of the partial non-light-transmitting region corresponding to the auxiliary spacer region, and the number of layers of the photoresist layer of the non-light-transmitting region corresponding to the main spacer region is greater than the number of layers of the photoresist layer of the non-light-transmitting region corresponding to the auxiliary spacer region.
Optionally, the spacer region is formed on the color photoresist of the partial non-light-transmission region.
Optionally, before the step of coating the photosensitive material on the substrate coated with the color photoresist layer, sequentially coating multiple layers of color photoresist on the substrate in a patterning manner, where the color photoresist covers a transparent region and a non-transparent region of the substrate, and the method further includes:
and forming a pixel electrode on the substrate.
Optionally, the multi-layer color resist includes a red resist, a green resist, and a blue resist.
In order to achieve the above object, another aspect of the present invention provides a display panel manufacturing apparatus, including: a memory, a processor and a computer program stored on the memory and executable on the processor, which computer program, when executed by the processor, carries out the steps of the method as described above.
In addition, to achieve the above object, a further aspect of the present invention provides a display panel including:
an array substrate;
the color film substrate is arranged opposite to the array substrate;
and the liquid crystal layer is filled between the array substrate and the color film substrate, wherein the color film substrate is manufactured by the manufacturing method of the display panel.
Optionally, a color photoresist layer and a spacer layer are formed on a non-light-transmitting area of the color film substrate, wherein the spacer layer comprises a spacer area and a light-shielding area, and the height of the spacer area is greater than that of the light-shielding area; the spacer layer comprises a main spacer layer and an auxiliary spacer layer, and the height of the light resistance layer corresponding to the main spacer layer is larger than that of the light resistance layer corresponding to the auxiliary spacer layer.
According to the invention, the color photoresist layer required by the display panel is formed on the substrate, and the photosensitive material layer is manufactured on the substrate with the photoresist layer formed to form the light shielding layer and the spacer layer, so that the display panel is manufactured without five processes, one process is reduced, the number of required light masks can be reduced by one type, the process for manufacturing the display panel is improved, the time is saved, the efficiency is improved, and the cost is saved.
Drawings
Fig. 1 is a schematic structural diagram of a display device of a hardware operating environment according to an embodiment of the present invention;
FIG. 2 is a schematic flow chart illustrating a method for fabricating a display panel according to an embodiment of the present invention;
FIG. 3 is a schematic flow chart of sequentially coating multiple color resists on the substrate in a patterned manner according to an embodiment of the present invention;
FIG. 4 is a schematic view of a display panel according to an embodiment of the present invention;
FIG. 5 is a schematic view of a display panel according to another embodiment of the present invention;
FIG. 6 is a flowchart illustrating a method for fabricating a display panel according to another embodiment of the present invention;
FIG. 7 is a schematic diagram of an embodiment of a display panel.
The implementation, functional features and advantages of the present invention will be further described with reference to the accompanying drawings.
Detailed Description
It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
The main solution of the embodiment of the invention is as follows: providing a substrate; sequentially coating a plurality of layers of color photoresist on the substrate in a patterning mode, wherein the color photoresist covers a light-transmitting area and a non-light-transmitting area of the substrate; coating a photosensitive material on the substrate coated with the color photoresist layer; and forming a spacer layer in the non-light-transmitting area after patterning the photosensitive material, wherein the spacer layer comprises a spacer area and a light-shielding area, and the height of the spacer area is greater than that of the light-shielding area.
The current five processes for manufacturing the display panel all need to carry out the steps of photoresist coating, baking, exposure, development, cleaning, drying and the like, so that the display panel has the problems of complex process, long time consumption and higher cost. The invention provides a solution, which is characterized in that a color photoresist layer required by a display panel is firstly formed on a substrate, and then a photosensitive material layer is manufactured on the substrate on which the photoresist layer is formed to form a light shielding layer and a spacer layer, five processes are not needed to finish the manufacture of the display panel, one process is reduced, the number of required light shields can be reduced by one type, the process of manufacturing the display panel is improved, the time is saved, the efficiency is improved, and the cost is saved.
As shown in fig. 1, fig. 1 is a schematic structural diagram of a display device of a hardware operating environment according to an embodiment of the present invention.
As shown in fig. 1, the display device may include: a processor 1001, such as a CPU, a network interface 1004, a user interface 1003, a memory 1005, a communication bus 1002. Wherein a communication bus 1002 is used to enable connective communication between these components. The user interface 1003 may include a Display screen (Display), an input unit such as a Keyboard (Keyboard), and optionally, the user interface 1003 may also include a standard wired interface or a wireless interface. The network interface 1004 may optionally include a standard wired interface, a wireless interface (e.g., WI-FI interface). The memory 1005 may be a high-speed RAM memory or a non-volatile memory (e.g., a magnetic disk memory). Alternatively, the memory 1005 may be a storage device independent of the processor 1001.
Optionally, the display device may further include a camera, a Radio Frequency (RF) circuit, a sensor, an audio circuit, a WiFi module, or the like.
It will be appreciated by those skilled in the art that the terminal structure shown in fig. 1 does not constitute a limitation of the detection arrangement, and may include more or fewer components than those shown, or some components may be combined, or a different arrangement of components. The display device may be a liquid crystal display device, or may be a device having a display function and/or a processing function, such as a mobile phone, a pad (flat panel), or a television.
As shown in fig. 1, the memory 1005, which is a kind of computer-readable storage medium, may include therein an operating system, a network communication module, a user interface module, and a display panel making application program.
In the terminal shown in fig. 1, the network interface 1004 is mainly used for connecting to a backend server and performing data communication with the backend server; the user interface 1003 is mainly used for connecting a client (user side) and performing data communication with the client; and the processor 1001 may be configured to call the display panel production application stored in the memory 1005 and perform the following operations:
providing a substrate;
sequentially coating a plurality of layers of color photoresist on the substrate in a patterning mode, wherein the color photoresist covers a light-transmitting area and a non-light-transmitting area of the substrate;
coating a photosensitive material on the substrate coated with the color photoresist layer;
and forming a spacer layer in the non-light-transmitting area after patterning the photosensitive material, wherein the spacer layer comprises a spacer area and a light-shielding area, and the height of the spacer area is greater than that of the light-shielding area.
Alternatively, the processor 1001 may be configured to call a display panel making application stored in the memory 1005, and perform the following operations:
and sequentially coating a plurality of layers of color photoresist on the substrate in a patterning mode, wherein the color photoresist covers the light-transmitting area and part of the non-light-transmitting area of the substrate.
Optionally, at least one color photoresist layer is formed in the partially opaque region.
Optionally, the spacer region includes a main spacer region and an auxiliary spacer region, at least two color photoresist layers cover a part of the partial non-light-transmitting region corresponding to the main spacer region, at least one color photoresist layer covers a part of the partial non-light-transmitting region corresponding to the auxiliary spacer region, and the number of layers of the photoresist layer of the non-light-transmitting region corresponding to the main spacer region is greater than the number of layers of the photoresist layer of the non-light-transmitting region corresponding to the auxiliary spacer region.
Optionally, the spacer region is formed on the color photoresist of the partial non-light-transmission region.
Optionally, before the step of coating the photosensitive material on the substrate coated with the color photoresist layer, sequentially coating multiple layers of color photoresist on the substrate in a patterning manner, and after the color photoresist covers the transparent region and the non-transparent region of the substrate, the processor 1001 may be configured to invoke a display panel manufacturing application program stored in the memory 1005 and perform the following operations:
and forming a pixel electrode on the substrate.
Optionally, the multi-layer color resist includes a red resist, a green resist, and a blue resist.
Referring to fig. 2, an embodiment of the present invention provides a method for manufacturing a display panel, where the method for manufacturing a display panel includes:
step S10, providing a substrate;
in the present embodiment, the TFT-LCD (Thin Film Transistor-Liquid Crystal Display) is capable of displaying different colors and pictures because there is a plurality of pixel matrixes formed by R red pixels, G green pixels and B blue pixels in the Display panel, and the combination of the 3 pixels can Display different colors under different brightness. The backlight source is provided according to the requirement of pixel display, the backlight source gives out light rays, and then the light rays penetrate through the liquid crystal and the pixel to generate required colors, or the backlight source is not required for self-luminous. The display panel of the present application is not limited to the liquid crystal display panel, but may be other display panels, for example: a display panel which emits light autonomously.
Alternatively, the substrate is a glass substrate, the substrate is provided as a cleaned substrate, and the substrate can be cleaned by a cleaning method commonly used in the art, for example, acid cleaning or water cleaning, etc. to keep the substrate in a dust-free state.
Step S20, sequentially coating a plurality of layers of color light resistances on the substrate in a patterning mode, wherein the color light resistances cover a light-transmitting area and a non-light-transmitting area of the substrate;
after the substrate is cleaned, sequentially coating a plurality of color photoresist layers on the substrate in a patterning mode, and forming a color photoresist layer with the thickness required by display in a display area of a display panel after patterning, wherein the photoresist layer is formed by baking, exposing, developing, cleaning and drying; the patterning mode is that different penetration rates, namely different light transmittance, are set at different positions through a photomask, the formed photoresist area is irradiated with different illumination intensities, after the exposure of the photomask, a photoresist layer required for display is formed in a display area, the multiple layers of color photoresist layers form different colors of photoresist layers at different display area positions, and only one layer of photoresist layer is arranged at the position where the photoresist layer is formed in the display area. It is of course also possible to leave at least 2 color resist layers in the display area where the last applied color resist layer (which is required to be left) is located. The multi-layer color photoresist layer includes at least two color photoresists of a red photoresist, a green photoresist and a blue photoresist. In the manufacturing process, a layer of light resistance layer is coated firstly, and pixels are formed in a display area where the color of the layer needs to be left through patterning; and finishing the coating of other colors after finishing the manufacture of the first color, wherein the independent coating manufacture is finished.
The light resistance layer of the display area can be two layers or 3 layers, and the light resistance layer is arranged according to the requirement.
With the above-described embodiments, the distribution of color resist layers that can be formed may be: 1. color photoresist layers are formed in the non-light-transmitting area and the light-transmitting area, multiple layers of photoresist layers are arranged in some positions of the non-light-transmitting area, and only one layer of photoresist layer is arranged in some positions of the non-light-transmitting area; 2. only the transparent region is formed with a photoresist layer, some with multiple photoresist layers, and some with a single photoresist layer.
Step S30, coating a photosensitive material on the substrate coated with the color photoresist layer;
the photosensitive material is a material that can shield light, and for example, BM or metal can be used. After the color resist layer is coated, i.e., the color resist layer is coated in the display region (light-transmitting region) and the non-display region (non-light-transmitting region), a photosensitive material is coated on the color resist layer-coated substrate, and the coated photosensitive material is opaque to form a light-shielding layer and a spacer layer.
Step S40, forming a spacer layer in the non-light-transmitting area after patterning the photosensitive material, wherein the spacer layer comprises a spacer area and a light-shielding area, and the height of the spacer area is greater than that of the light-shielding area.
After the photosensitive material is coated, the photosensitive material is patterned, and a spacer layer is formed in the non-light-transmitting area, that is, a spacer layer is formed in an area where the spacer layer needs to be formed, and a light-shielding layer is formed in an area where the light-shielding layer needs to be formed. The formed spacer layer comprises a spacer area and a shading area, and the height of the photosensitive material in the spacer area is greater than that of the shading area. The light shielding layer and the spacer layer of the spacer region are completed by one process, only the required BM black matrix layer and the required spacer layer are formed in different regions, and the BM and the spacer layer PS are completed by separate processes before, thereby reducing the processes.
In the embodiment, the color photoresist layer required by the display panel is formed on the substrate, and the photosensitive material layer is manufactured on the substrate on which the photoresist layer is formed to form the light shielding layer and the spacer layer, so that the display panel is manufactured without five processes, one process is reduced, the number of required light masks can be reduced by one type, the process for manufacturing the display panel is improved, the time is saved, the efficiency is improved, and the cost is saved.
In one embodiment, referring to fig. 3, the step of sequentially coating a plurality of color resists on the substrate in a patterned manner, wherein the step of coating the color resists on the transparent region and the non-transparent region of the substrate includes:
and S21, sequentially coating a plurality of layers of color photoresist on the substrate in a patterning mode, wherein the color photoresist covers the light-transmitting area and part of the non-light-transmitting area of the substrate.
A photoresist layer is formed in the non-display region, i.e., the non-transparent region, at the same time as the photoresist layer is formed in the display region. That is, the color photoresist layer covers the transparent region and the non-transparent region of the substrate, wherein the color photoresist layer formed in the non-transparent region is at least one color photoresist layer.
The thickness of the photoresist layer covered in the non-light-transmitting area is different, the covered non-light-transmitting area is a part of the non-light-transmitting area, and the color photoresist layer is not left after the area coated with the light shielding layer is developed; and leaving a color photoresist layer and at least one color photoresist layer in the non-light-transmitting area of the spacer region, i.e., the spacer region is formed on the color photoresist layer in the non-light-transmitting area. The shock insulator zone comprises a main shock insulator zone and an auxiliary shock insulator zone, at least two color photoresist layers are covered on the part, corresponding to the main shock insulator zone, of the partial non-light-transmitting zone, at least one color photoresist layer is covered on the part, corresponding to the auxiliary shock insulator zone, of the partial non-light-transmitting zone, and the number of layers of the photoresist layer of the non-light-transmitting zone, corresponding to the main shock insulator zone, is larger than the number of layers of the photoresist layer of the non-light-transmitting zone, corresponding to the auxiliary shock insulator zone. Alternatively, referring to fig. 4, the black matrix and the spacer layer are formed in the same process, the spacer layer has the same height, and the liquid crystal layer of the display panel has a thickness formed by the thickness or the number of the color photomechanical layers formed under the spacer layer.
Alternatively, one or more photoresist layers (the same number of photoresist layers) may be left in portions of both the main and auxiliary spacer regions, but the total thickness of the color photoresist layers left is different, and the height is the same in the main and auxiliary spacer regions when the spacer layer is formed. Alternatively, referring to fig. 5, a schematic diagram of a display panel in which a spacer layer is formed in a light-transmitting area, the spacer layer is formed on a photoresist layer by stacking a plurality of color photoresist layers in the light-transmitting area, the spacer layer has a uniform height, and a height difference between a main spacer and an auxiliary spacer layer is formed by a difference in thickness or a difference in the number of layers of the color photoresist layers.
Of course, it is understood that the color resist layer is not formed in the opaque region, i.e., the color resist layer does not cover the opaque region, but leaves the color resist layer only in the desired region of the display region.
Forming a plurality of color photoresist layers in a region covered by a color photoresist layer of one color in a display region, wherein a main spacer layer is formed on part of the plurality of color photoresist layers, a photoresist layer is formed in a region where an auxiliary spacer layer is required to be formed, the heights of supported substrates are different after the spacer layer is added through the plurality of color photoresist layers, namely, the thicknesses of formed liquid crystal fillings are different, different spacer heights are formed through the different thicknesses of the color photoresist layers, and the heights of the spacer layers formed by coating are consistent; a light shielding layer is formed in the non-light-transmitting region to prevent light leakage.
In the embodiment, the thickness of the display panel is supported by combining the thickness of the color photoresist layer and the height of the spacer layer, and the same height of the spacer layer is manufactured, so that the manufacturing cost of the photomask is reduced, and the manufacturing cost of the display panel is saved.
In one embodiment, referring to fig. 6, before the step of coating the photosensitive material on the substrate coated with the color photoresist layer, a plurality of color photoresists are sequentially coated on the substrate in a patterning manner, and after the color photoresists are coated on the transparent region and the non-transparent region of the substrate, the method further includes:
step S50, forming a pixel electrode on the substrate.
After the color photoresist layer is formed, a conductive material is coated, and after patterning, a pixel electrode is formed on the color photoresist layer, wherein the pixel electrode is an ITO layer, i.e., an ITO layer. And the photosensitive material of the spacer is completed after the pixel electrode is manufactured. The deflection of the liquid crystal is controlled by the inclined electric field generated by the pixel electrode, so that different colors are displayed, and the display effect is ensured.
This application still provides a display panel making devices, display panel making devices includes: memory, a processor and a computer program stored on the memory and executable on the processor, which computer program, when executed by the processor, carries out the steps of the method according to the above embodiments.
The present application also proposes a display panel, referring to fig. 7, the display panel including:
an array substrate 10;
the color film substrate 20 is arranged opposite to the array substrate 10;
and the liquid crystal layer 30 is filled between the array substrate 10 and the color film substrate 20, and the color film substrate is manufactured by the display panel manufacturing method. A color photoresist layer and a spacer layer are formed on the non-light-transmitting area of the color film substrate 20, the spacer layer includes a spacer area and a shading area, and the height of the spacer area is greater than that of the shading area. The spacer layer comprises a main spacer layer and an auxiliary spacer layer, the height of the light resistance layer corresponding to the main spacer layer is larger than that of the light resistance layer corresponding to the auxiliary spacer layer, and the BM black matrix and the spacer layer are completed by one process. According to the display panel, the color photoresist layer required by the display panel is formed on the substrate firstly, and then the photosensitive material layer is manufactured on the substrate with the photoresist layer formed, so that the light shielding layer and the spacer layer are formed, the display panel is manufactured without five processes, one process is reduced, the number of required light shades can be reduced by one type, the process of manufacturing the display panel is improved, the time is saved, the efficiency is improved, and the cost is saved.
Furthermore, an embodiment of the present invention further provides a computer-readable storage medium, and a computer-readable storage medium, where a display panel manufacturing program is stored on the computer-readable storage medium, and when executed by a processor, the display panel manufacturing program implements the display panel manufacturing method according to the above embodiment.
It should be noted that, in this document, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or system that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or system. Without further limitation, an element defined by the phrases "comprising a," "8230," "8230," or "comprising" does not exclude the presence of other like elements in a process, method, article, or system comprising the element.
The above-mentioned serial numbers of the embodiments of the present invention are merely for description and do not represent the merits of the embodiments.
Through the above description of the embodiments, those skilled in the art will clearly understand that the method of the above embodiments can be implemented by software plus a necessary general hardware platform, and certainly can also be implemented by hardware, but in many cases, the former is a better implementation manner. Based on such understanding, the technical solutions of the present invention or portions thereof contributing to the prior art may be embodied in the form of a software product, which is stored in a computer readable storage medium (such as ROM/RAM, magnetic disk, optical disk) as described above and includes several instructions for enabling a terminal device (which may be a mobile phone, a computer, a server, an air conditioner, or a network device) to execute the method according to the embodiments of the present invention.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, and all equivalent structures or equivalent processes performed by the present invention or directly or indirectly applied to other related technical fields are also included in the scope of the present invention.
Claims (10)
1. A manufacturing method of a display panel is characterized by comprising the following steps:
providing a substrate;
sequentially coating a plurality of layers of color photoresists on the substrate in a patterning mode, wherein the color photoresists cover a light-transmitting area and a non-light-transmitting area of the substrate, and the color photoresist layers are formed at positions for manufacturing a main spacer and an auxiliary spacer;
coating a photosensitive material on the substrate of which the light-transmitting area and the non-light-transmitting area are both coated with the color photoresist layer;
forming a spacer layer in the non-light-transmitting area after patterning the photosensitive material, wherein the spacer layer comprises a spacer area and a light-shielding area, the height of the spacer area is greater than that of the light-shielding area, spacer layers of the light-shielding area and the spacer area are formed by one process, and the spacer layer is formed on the color photoresist layer of the non-light-transmitting area; the height of the formed spacer layer is the same, the thickness of the liquid crystal layer of the display panel is formed by the thickness or the number of the color photoresist layers formed under the spacer layer, and the thickness of the main spacer layer and the auxiliary spacer layer is constructed by the difference of the thickness or the number of the formed color photoresist layers.
2. The method as claimed in claim 1, wherein the step of sequentially coating a plurality of color resists on the substrate in a patterned manner, and the step of covering the color resists on the transparent region and the non-transparent region of the substrate comprises:
and sequentially coating a plurality of layers of color photoresist on the substrate in a patterning mode, wherein the color photoresist covers the light-transmitting area and part of the non-light-transmitting area of the substrate.
3. The method as claimed in claim 2, wherein at least one color photoresist layer is formed in the partially opaque region.
4. The method of claim 3, wherein the spacer region comprises a main spacer region and an auxiliary spacer region, a portion of the partially opaque region corresponding to the main spacer region covers at least two color photoresist layers, and a portion of the partially opaque region corresponding to the auxiliary spacer region covers at least one color photoresist layer, wherein the number of photoresist layers of the opaque region corresponding to the main spacer region is greater than the number of photoresist layers of the opaque region corresponding to the auxiliary spacer region.
5. The method according to any of claims 2 to 4, wherein the spacer region is formed on the color photoresist of the partially opaque region.
6. The method of any of claims 1 to 4, wherein before the step of coating the substrate coated with the color resist layer with the photosensitive material, a plurality of color resists are sequentially coated on the substrate in a patterned manner, and the color resists are coated on the transparent region and the non-transparent region of the substrate, and the method further comprises:
and forming a pixel electrode on the substrate.
7. The method of manufacturing a display panel according to any one of claims 1 to 4, wherein the multi-layer color resist includes a red resist, a green resist, and a blue resist.
8. A display panel manufacturing apparatus, comprising: memory, processor and computer program stored on the memory and executable on the processor, which computer program, when executed by the processor, carries out the steps of the method according to any one of claims 1 to 7.
9. A display panel, comprising:
an array substrate;
the color film substrate is arranged opposite to the array substrate;
the liquid crystal layer is filled between the array substrate and the color film substrate;
the color film substrate is manufactured by the method of any one of claims 1 to 7.
10. The display panel of claim 9, wherein a color photoresist layer and a spacer layer are formed on the non-light-transmitting region of the color filter substrate, the spacer layer comprises a spacer region and a light-shielding region, and the height of the spacer region is greater than that of the light-shielding region;
the spacer layer comprises a main spacer layer and an auxiliary spacer layer, and the height of the light resistance layer corresponding to the main spacer layer is larger than that of the light resistance layer corresponding to the auxiliary spacer layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811616625.5A CN109507827B (en) | 2018-12-27 | 2018-12-27 | Display panel manufacturing method, display panel manufacturing device and display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811616625.5A CN109507827B (en) | 2018-12-27 | 2018-12-27 | Display panel manufacturing method, display panel manufacturing device and display panel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109507827A CN109507827A (en) | 2019-03-22 |
| CN109507827B true CN109507827B (en) | 2022-10-18 |
Family
ID=65756013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811616625.5A Active CN109507827B (en) | 2018-12-27 | 2018-12-27 | Display panel manufacturing method, display panel manufacturing device and display panel |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109507827B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110196519B (en) * | 2019-04-23 | 2022-02-01 | Tcl华星光电技术有限公司 | Method and device for preparing spacer in display panel |
| CN111258128B (en) | 2020-03-18 | 2021-11-23 | Tcl华星光电技术有限公司 | Display panel and manufacturing method thereof |
| CN112859454A (en) * | 2021-02-26 | 2021-05-28 | Tcl华星光电技术有限公司 | Display panel, manufacturing method thereof and display device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104749812A (en) * | 2013-12-31 | 2015-07-01 | 上海仪电显示材料有限公司 | Color filter substrate, manufacturing method of color filter substrate and liquid crystal display device comprising color filter substrate |
| CN105700225A (en) * | 2016-04-22 | 2016-06-22 | 深圳市华星光电技术有限公司 | Display panel based on BOA technique and manufacturing method |
| CN107505780A (en) * | 2017-09-26 | 2017-12-22 | 深圳市华星光电半导体显示技术有限公司 | BPS type array base paltes and preparation method thereof |
| CN108535909A (en) * | 2018-04-17 | 2018-09-14 | 深圳市华星光电技术有限公司 | The production method and BPS type array substrates of BPS type array substrates |
| CN108897163A (en) * | 2018-09-12 | 2018-11-27 | 惠科股份有限公司 | Display panel and manufacturing method thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105116601B (en) * | 2015-09-16 | 2018-12-11 | 武汉华星光电技术有限公司 | Color membrane substrates and preparation method thereof |
| CN106125412A (en) * | 2016-08-31 | 2016-11-16 | 武汉华星光电技术有限公司 | Display panels |
-
2018
- 2018-12-27 CN CN201811616625.5A patent/CN109507827B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104749812A (en) * | 2013-12-31 | 2015-07-01 | 上海仪电显示材料有限公司 | Color filter substrate, manufacturing method of color filter substrate and liquid crystal display device comprising color filter substrate |
| CN105700225A (en) * | 2016-04-22 | 2016-06-22 | 深圳市华星光电技术有限公司 | Display panel based on BOA technique and manufacturing method |
| CN107505780A (en) * | 2017-09-26 | 2017-12-22 | 深圳市华星光电半导体显示技术有限公司 | BPS type array base paltes and preparation method thereof |
| CN108535909A (en) * | 2018-04-17 | 2018-09-14 | 深圳市华星光电技术有限公司 | The production method and BPS type array substrates of BPS type array substrates |
| CN108897163A (en) * | 2018-09-12 | 2018-11-27 | 惠科股份有限公司 | Display panel and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109507827A (en) | 2019-03-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4473253B2 (en) | Color filter substrate and manufacturing method thereof | |
| US7742131B2 (en) | Touch panel, color filter substrate and fabricating method thereof | |
| US10012905B2 (en) | Device substrate and fabricating method thereof | |
| CN109507827B (en) | Display panel manufacturing method, display panel manufacturing device and display panel | |
| US10365523B2 (en) | Display panel and manufacturing method based on BOA technology | |
| US20190265544A1 (en) | Mask plate, display substrate and method for manufacturing the same, display panel and display device | |
| CN106681101A (en) | Gray-scale mask, as well as display substrate and exposure device formed by utilizing same | |
| US20150153614A1 (en) | Fabricating method of color filter substrate, color filter substrate and display device | |
| US20140078452A1 (en) | Transreflective color filter and method for manufacturing the same and method for manufacturing the same and liquid crystal display device | |
| US9116297B2 (en) | Color filter substrate, manufacturing method thereof and liquid crystal panel | |
| US20190049804A1 (en) | Active switch array substrate, manufacturing method therfor, and display panel | |
| US20160363865A1 (en) | Method of patterning thin films | |
| CN107861288B (en) | Display panel and display device | |
| US20180188597A1 (en) | Color filter substrate, method for manufacturing the same and display device | |
| CN106019756A (en) | Display panel and manufacturing method thereof, as well as curved-surface display panel and curved-surface display device | |
| WO2019218923A1 (en) | Display substrate and manufacturing method therefor, and display panel, and display apparatus | |
| JP2012234180A (en) | Color filter substrate, and manufacturing method and apparatus for the same | |
| CN100447628C (en) | Method for manufacturing color filter layer | |
| US20070148565A1 (en) | Method for manufacturing a color filter | |
| US20190049803A1 (en) | Active switch array substrate, manufacturing method therefor same, and display device using same | |
| CN109839782B (en) | Display device, array substrate manufacturing method thereof and computer readable storage medium | |
| CN107015399B (en) | Color film substrate and manufacturing method thereof, display device and manufacturing method thereof | |
| JP2017040678A (en) | Color filter | |
| CN116648659A (en) | Display substrate and manufacturing method thereof, display panel, display device | |
| CN109581727A (en) | Display panel manufacturing method, display panel manufacturing device and display panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |