CN109492622A - For shielding the recognizer component and electronic equipment of lower optical finger print - Google Patents
For shielding the recognizer component and electronic equipment of lower optical finger print Download PDFInfo
- Publication number
- CN109492622A CN109492622A CN201811589493.1A CN201811589493A CN109492622A CN 109492622 A CN109492622 A CN 109492622A CN 201811589493 A CN201811589493 A CN 201811589493A CN 109492622 A CN109492622 A CN 109492622A
- Authority
- CN
- China
- Prior art keywords
- conductive
- layer
- light
- optical fingerprint
- sensing chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
- G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
- G06V40/12—Fingerprints or palmprints
- G06V40/13—Sensors therefor
- G06V40/1324—Sensors therefor by using geometrical optics, e.g. using prisms
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V10/00—Arrangements for image or video recognition or understanding
- G06V10/10—Image acquisition
- G06V10/12—Details of acquisition arrangements; Constructional details thereof
- G06V10/14—Optical characteristics of the device performing the acquisition or on the illumination arrangements
- G06V10/145—Illumination specially adapted for pattern recognition, e.g. using gratings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/13—Mountings, e.g. non-detachable insulating substrates characterised by the shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3114—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the device being a chip scale package, e.g. CSP
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/528—Layout of the interconnection structure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
- H10F77/413—Optical elements or arrangements directly associated or integrated with the devices, e.g. back reflectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
- H10F77/42—Optical elements or arrangements directly associated or integrated with photovoltaic cells, e.g. light-reflecting means or light-concentrating means
- H10F77/484—Refractive light-concentrating means, e.g. lenses
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/50—Encapsulations or containers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/40—OLEDs integrated with touch screens
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Multimedia (AREA)
- Theoretical Computer Science (AREA)
- Geometry (AREA)
- Artificial Intelligence (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Human Computer Interaction (AREA)
- Optics & Photonics (AREA)
- Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
本发明提供了一种用于屏下光学指纹的识别组件及电子设备,该识别组件用于设置在显示屏的下方,其包括:光感芯片,其在识别组件设置在显示屏的下方时用于接收自显示屏上方的目标生物体反射回来的目标信号光;光感芯片至少包括金属层;位于光感芯片上方的防护组件,其具有透光区域,目标信号光经透光区域达到光感芯片;防护组件下方形成有用于保护金属层的保护腔;金属层收容在保护腔内;或者,光感芯片构成保护腔的部分内壁;导电通路,其一端与金属层导电连接,另一端用于与外部电路连接。本发明实施例的识别组件的生产效率较高。
The present invention provides an identification component and an electronic device for an optical fingerprint under the screen. The identification component is used to be arranged below the display screen, and includes: a photosensitive chip, which is used when the identification component is arranged under the display screen. The target signal light reflected from the target organism above the display screen is received; the light-sensing chip at least includes a metal layer; the protective component located above the light-sensing chip has a light-transmitting area, and the target signal light reaches the light-sensing area through the light-transmitting area chip; a protective cavity for protecting the metal layer is formed under the protective component; the metal layer is accommodated in the protective cavity; Connect with external circuits. The identification component of the embodiment of the present invention has higher production efficiency.
Description
技术领域technical field
本发明涉及屏下光学技术领域,尤其涉及一种用于屏下光学指纹的识别组件,以及运用或配置有该识别组件的电子设备。The present invention relates to the field of under-screen optics, and in particular, to an identification component for under-screen optical fingerprints, and an electronic device using or equipped with the identification component.
背景技术Background technique
本部分的描述仅提供与本发明公开相关的背景信息,而不构成现有技术。The descriptions in this section merely provide background information related to the present disclosure and do not constitute prior art.
屏下光学指纹识别技术由于不占用电子设备(例如智能手机)的表面空间而得到快速发展和应用。The under-screen optical fingerprint recognition technology has been rapidly developed and applied because it does not occupy the surface space of electronic devices (such as smartphones).
目前,运用于屏下光学的指纹识别装置,其所包含的识别组件大部分工序是在模组厂完成的。具体的,首先可采用回流焊将电容、电阻等电子元器件焊接到FPC(FlexiblePrinted Circuit,软性电路板)上,随后将FPC转移至洁净的车间进行清洗,再利用COB(Chips on Board,板上芯片封装)工艺对指纹芯片进行封装。即先将指纹芯片固定于FPC上,随后采用金线连接指纹芯片和FPC,再将FPC固定在钢板上。At present, most of the processes of the identification components included in the fingerprint identification device used in the under-screen optics are completed in the module factory. Specifically, firstly, reflow soldering can be used to solder electronic components such as capacitors and resistors to FPC (Flexible Printed Circuit, flexible circuit board), then transfer the FPC to a clean workshop for cleaning, and then use COB (Chips on Board, board) The chip-on-chip packaging) process encapsulates the fingerprint chip. That is, the fingerprint chip is first fixed on the FPC, and then gold wires are used to connect the fingerprint chip and the FPC, and then the FPC is fixed on the steel plate.
也就是说,现有已知的指纹识别装置中的识别组件,至少需要在模组厂执行回流焊和COB这两个工序。而习知的,执行同样的工序,模组厂的效率大大低于封装厂的效率。由此,导致现有的运用于屏下光学的识别组件的生产效率十分低下。That is to say, the identification components in the known fingerprint identification devices at least need to perform two processes of reflow soldering and COB in the module factory. Conventionally, when performing the same process, the efficiency of the module factory is much lower than that of the packaging factory. As a result, the production efficiency of the existing identification components applied to the under-screen optics is very low.
应该注意,上面对技术背景的介绍只是为了方便对本发明的技术方案进行清楚、完整的说明,并方便本领域技术人员的理解而阐述的。不能仅仅因为这些方案在本发明的背景技术部分进行了阐述而认为上述技术方案为本领域技术人员所公知。It should be noted that the above description of the technical background is only for the convenience of clearly and completely describing the technical solutions of the present invention and facilitating the understanding of those skilled in the art. It should not be assumed that the above-mentioned technical solutions are well known to those skilled in the art simply because these solutions are described in the background section of the present invention.
发明内容SUMMARY OF THE INVENTION
基于前述的现有技术缺陷,本发明实施例提供了一种用于屏下光学指纹的识别组件,以及运用或配置有该识别组件的电子设备,该识别组件的生产效率较高。Based on the aforementioned defects of the prior art, embodiments of the present invention provide an identification component for an under-screen optical fingerprint, and an electronic device using or equipped with the identification component, and the identification component has high production efficiency.
为了实现上述目的,本发明提供了如下的技术方案。In order to achieve the above objects, the present invention provides the following technical solutions.
一种用于屏下光学指纹的识别组件,所述识别组件用于设置在显示屏的下方;所述识别组件包括:An identification component for an optical fingerprint under the screen, the identification component is used to be arranged below the display screen; the identification component includes:
光感芯片,其在所述识别组件设置在显示屏的下方时用于接收自所述显示屏上方的目标生物体反射回来的目标信号光;所述光感芯片至少包括金属层;a light-sensing chip, which is used for receiving target signal light reflected from a target organism above the display screen when the identification component is arranged below the display screen; the light-sensing chip at least includes a metal layer;
位于所述光感芯片上方的防护组件,所述防护组件具有透光区域,所述目标信号光经所述透光区域达到所述光感芯片;所述防护组件的下方形成有用于保护所述金属层的保护腔;所述金属层收容在所述保护腔内;或者,所述光感芯片构成所述保护腔的部分内壁;A protective component located above the light-sensitive chip, the protective component has a light-transmitting area, and the target signal light reaches the light-sensitive chip through the light-transmitting area; a protective cavity of the metal layer; the metal layer is accommodated in the protective cavity; or, the photosensitive chip constitutes a part of the inner wall of the protective cavity;
导电通路,其一端与所述金属层导电连接,另一端用于与外部电路连接。One end of the conductive path is conductively connected with the metal layer, and the other end is used for connecting with an external circuit.
一种电子设备,包括:An electronic device comprising:
显示屏;display screen;
如上述实施例所述的用于屏下光学指纹的识别组件,所述识别组件设置于所述显示屏的下方。According to the identification component for under-screen optical fingerprints in the above-mentioned embodiments, the identification component is disposed below the display screen.
由于光感芯片的金属层被保护腔所保护,这就为本发明实施例的识别组件先封装,后采用回流焊实现与外部电路的导电连接提供了条件。Since the metal layer of the photosensitive chip is protected by the protective cavity, this provides conditions for the identification component of the embodiment of the present invention to be packaged first, and then to be electrically connected to the external circuit by reflow soldering.
也就是说,本发明实施例的识别组件,可以在封装厂完成光感芯片的封装,再在模组厂实现与外部电路的连接。这样,相较于现有技术而言,本发明实施例的识别组件仅需在模组厂执行一道回流焊工艺即可,从而生产效率大大提高。That is to say, the identification component of the embodiment of the present invention can complete the packaging of the photosensitive chip in the packaging factory, and then realize the connection with the external circuit in the module factory. In this way, compared with the prior art, the identification component of the embodiment of the present invention only needs to perform a reflow soldering process in the module factory, so that the production efficiency is greatly improved.
参照后文的说明和附图,详细公开了本发明的特定实施例,指明了本发明的原理可以被采用的方式。应该理解,本发明的实施例在范围上并不因而受到限制。在所附权利要求的精神和条款的范围内,本发明的实施例包括许多改变、修改和等同。With reference to the following description and drawings, specific embodiments of the invention are disclosed in detail, indicating the manner in which the principles of the invention may be employed. It should be understood that embodiments of the present invention are not thereby limited in scope. Embodiments of the invention include many changes, modifications and equivalents within the spirit and scope of the appended claims.
针对一种实施例描述和/或示出的特征可以以相同或类似的方式在一个或更多个其他实施例中使用,与其他实施例中的特征相组合,或替代其他实施例中的特征。Features described and/or illustrated for one embodiment may be used in the same or similar manner in one or more other embodiments, in combination with, or in place of features of other embodiments .
应该强调,术语“包括/包含”在本文使用时指特征、整件、步骤或组件的存在,但并不排除一个或更多个其他特征、整件、步骤或组件的存在或附加。It should be emphasized that the term "comprising/comprising" as used herein refers to the presence of a feature, integer, step or component, but does not exclude the presence or addition of one or more other features, integers, steps or components.
附图说明Description of drawings
在此描述的附图仅用于解释目的,而不意图以任何方式来限制本发明公开的范围。另外,图中的各部件的形状和比例尺寸等仅为示意性的,用于帮助对本发明的理解,并不是具体限定本发明各部件的形状和比例尺寸。本领域的技术人员在本发明的教导下,可以根据具体情况选择各种可能的形状和比例尺寸来实施本发明。在附图中:The drawings described herein are for explanatory purposes only and are not intended to limit the scope of the present disclosure in any way. In addition, the shapes and proportions of the components in the figures are only schematic and are used to help the understanding of the present invention, and do not specifically limit the shapes and proportions of the components of the present invention. Under the teachings of the present invention, those skilled in the art can select various possible shapes and proportions according to specific conditions to implement the present invention. In the attached image:
图1为本发明第一实施例的用于屏下光学指纹的识别组件的结构示意图;FIG. 1 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a first embodiment of the present invention;
图2为本发明第二实施例的用于屏下光学指纹的识别组件的结构示意图;2 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a second embodiment of the present invention;
图3为本发明第三实施例的用于屏下光学指纹的识别组件的结构示意图;3 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a third embodiment of the present invention;
图4为本发明第四实施例的用于屏下光学指纹的识别组件的结构示意图;4 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a fourth embodiment of the present invention;
图5为本发明第五实施例的用于屏下光学指纹的识别组件的结构示意图;5 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a fifth embodiment of the present invention;
图6为本发明第六实施例的用于屏下光学指纹的识别组件的结构示意图;6 is a schematic structural diagram of a recognition component for an under-screen optical fingerprint according to a sixth embodiment of the present invention;
图7为本发明第七实施例的用于屏下光学指纹的识别组件的结构示意图;7 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a seventh embodiment of the present invention;
图8为本发明第八实施例的用于屏下光学指纹的识别组件的结构示意图;8 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to an eighth embodiment of the present invention;
图9为本发明第九实施例的用于屏下光学指纹的识别组件的结构示意图;9 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a ninth embodiment of the present invention;
图10为本发明第十实施例的用于屏下光学指纹的识别组件的结构示意图;10 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a tenth embodiment of the present invention;
图11为本发明第十一实施例的用于屏下光学指纹的识别组件的结构示意图;11 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to an eleventh embodiment of the present invention;
图12为本发明第十二实施例的用于屏下光学指纹的识别组件的结构示意图;12 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a twelfth embodiment of the present invention;
图13为本发明第十三实施例的用于屏下光学指纹的识别组件的结构示意图;13 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a thirteenth embodiment of the present invention;
图14为本发明第十四实施例的用于屏下光学指纹的识别组件的结构示意图;14 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a fourteenth embodiment of the present invention;
图15为本发明第十五实施例的用于屏下光学指纹的识别组件的结构示意图;15 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a fifteenth embodiment of the present invention;
图16为本发明第十六实施例的用于屏下光学指纹的识别组件的结构示意图;16 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a sixteenth embodiment of the present invention;
图17为本发明第十七实施例的用于屏下光学指纹的识别组件的结构示意图;17 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a seventeenth embodiment of the present invention;
图18为本发明第十八实施例的用于屏下光学指纹的识别组件的结构示意图;18 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to an eighteenth embodiment of the present invention;
图19为本发明第十九实施例的用于屏下光学指纹的识别组件的结构示意图;19 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a nineteenth embodiment of the present invention;
图20为本发明第二十实施例的用于屏下光学指纹的识别组件的结构示意图;20 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a twentieth embodiment of the present invention;
图21为本发明第二十一实施例的用于屏下光学指纹的识别组件的结构示意图;21 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a twenty-first embodiment of the present invention;
图22为本发明第二十二实施例的用于屏下光学指纹的识别组件的结构示意图;22 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a twenty-second embodiment of the present invention;
图23为本发明第二十三实施例的用于屏下光学指纹的识别组件的结构示意图;23 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a twenty-third embodiment of the present invention;
图24为本发明第二十四实施例的用于屏下光学指纹的识别组件的结构示意图;24 is a schematic structural diagram of an identification component for an under-screen optical fingerprint according to a twenty-fourth embodiment of the present invention;
图25为配置有本发明上述任一个实施例的识别组件的电子设备的简略结构示意图;25 is a schematic structural diagram of an electronic device configured with the identification component of any one of the above-mentioned embodiments of the present invention;
图26为现有技术中一种已知实施例的屏下生物特征识别装置的结构示意图。FIG. 26 is a schematic structural diagram of an under-screen biometric identification device according to a known embodiment in the prior art.
具体实施方式Detailed ways
为了使本技术领域的人员更好地理解本发明中的技术方案,下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动的前提下所获得的所有其他实施例,都应当属于本发明保护的范围。In order to make those skilled in the art better understand the technical solutions of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described The embodiments are only some of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.
需要说明的是,当元件被称为“设置于”另一个元件,它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是“连接”另一个元件,它可以是直接连接到另一个元件或者可能同时存在居中元件。本文所使用的术语“垂直的”、“水平的”、“左”、“右”以及类似的表述只是为了说明的目的,并不表示是唯一的实施例。It should be noted that when an element is referred to as being "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for the purpose of illustration only and do not represent the only embodiment.
除非另有定义,本文所使用的所有的技术和科学术语与属于本发明的技术领域的技术人员通常理解的含义相同。本文中在本发明的说明书中所使用的术语只是为了描述具体的实施例的目的,不是旨在于限制本发明。本文所使用的术语“和/或”包括一个或多个相关的所列项目的任意的和所有的组合。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terms used herein in the description of the present invention are for the purpose of describing specific embodiments only, and are not intended to limit the present invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
由上文描述可知,现有已知的用于组装形成指纹识别装置的识别组件,需要先执行回流焊工序,后执行COB工序。且这两道工序均需要在模组厂完成。As can be seen from the above description, the conventionally known identification components used to assemble and form a fingerprint identification device need to perform a reflow soldering process first, and then perform a COB process. And these two processes need to be completed in the module factory.
而限于COB封装后的结构,难以将上述两道工序的执行顺序反置。主要原因如下:However, limited to the structure after COB packaging, it is difficult to reverse the execution order of the above two processes. The main reasons are as follows:
由上文对COB工艺的说明可知,采用COB工艺封装后,指纹芯片处于暴露状态。而执行回流焊过程中,热风在加热FPC和待焊接电子元器件的同时,还起到吹扫杂质或灰尘的作用。如果在完成COB封装后,再采用回流焊在FPC上焊接电子元器件。那么,在回流焊过程中,处于暴露状态的指纹芯片上会附着经热风吹扫来的杂质或灰尘。而杂质或灰尘对指纹芯片的正常运行会产生严重甚至是致命的影响。It can be seen from the above description of the COB process that after the COB process is used for packaging, the fingerprint chip is in an exposed state. During the reflow soldering process, the hot air also plays the role of purging impurities or dust while heating the FPC and the electronic components to be soldered. If the COB package is completed, reflow soldering is used to solder electronic components on the FPC. Then, in the process of reflow soldering, impurities or dust blown by hot air will adhere to the exposed fingerprint chip. Impurities or dust will have a serious or even fatal impact on the normal operation of the fingerprint chip.
由此,现有已知的用于组装形成指纹识别装置的识别组件,由于其制备工艺中的回流焊工序和COB工序的执行顺序的相对固定,导致该两个工序只能在模组厂来执行,而无法将COB工序转移至封装厂来完成。从而导致识别组件的生产效率大大降低。Therefore, the known identification components used for assembling and forming fingerprint identification devices, due to the relatively fixed execution sequence of the reflow soldering process and the COB process in the manufacturing process, the two processes can only be performed in the module factory. It is not possible to transfer the COB process to the packaging factory for completion. As a result, the production efficiency of the identification components is greatly reduced.
有鉴于此,本发明实施例提供了一种用于屏下光学指纹的识别组件,其可以在封装厂完成整个识别组件的制备,从而生产效率大大提高。In view of this, embodiments of the present invention provide an identification component for an under-screen optical fingerprint, which can complete the preparation of the entire identification component in a packaging factory, thereby greatly improving production efficiency.
在本说明书中,将本发明实施例的识别组件在正常使用状态下,指向或面对使用者的方向定义为“上”,将与之相反,或者背对使用者的方向定义为“下”。In this specification, in the normal use state of the identification component of the embodiment of the present invention, the direction pointing to or facing the user is defined as "up", and the direction opposite to or facing away from the user is defined as "down" .
更具体的,将图1至图25中所示意的向上的方向定义为“上”,将图1至图25中所示意的向下的方向定义为“下”。More specifically, the upward direction illustrated in FIGS. 1 to 25 is defined as “up”, and the downward direction illustrated in FIGS. 1 to 25 is defined as “down”.
值得注意的是,本说明书中的对各方向定义,只是为了说明本发明技术方案的方便,并不限定本发明实施例的识别组件在包括但不限定于使用、测试、运输和制造等等其他可能导致识别组件方位发生颠倒或者位置发生变换的场景中的方向。It is worth noting that the definition of each direction in this specification is only for the convenience of explaining the technical solution of the present invention, and does not limit the identification components of the embodiments of the present invention, including but not limited to use, testing, transportation, manufacturing, etc. Orientation in a scene that can cause the recognition component to be oriented upside down or shifted in position.
本发明实施例提供的识别组件,其可运用于包括但不限于屏下指纹解锁、用户身份验证、权限获取等场景中。The identification component provided by the embodiment of the present invention can be applied to scenarios including but not limited to under-screen fingerprint unlocking, user identity verification, and permission acquisition.
具体的,当本发明实施例的识别组件被配置于电子设备中时,电子设备可以基于该识别组件获取用户的指纹特征信息,用以与存储的指纹信息进行匹配,以实现对当前用户的身份验证,从而确认其是否有相应的权限来对电子设备执行相关的操作。Specifically, when the identification component of the embodiment of the present invention is configured in the electronic device, the electronic device can obtain the fingerprint feature information of the user based on the identification component, so as to match the stored fingerprint information, so as to realize the identification of the current user. Verification to confirm whether it has the corresponding authority to perform related operations on the electronic device.
需要说明的是,上述获取的指纹信息,仅是用户生物特征中一种常见的实施例。在可预想的范畴内,本领域技术人员可将本发明实施例的技术方案扩展运用于任意合适的生物特征的验证场景中。例如通过获取用户的虹膜这一生物特征信息进行验证的场景,本发明实施例对此不作限定。It should be noted that the fingerprint information obtained above is only a common example of user biometrics. Within the conceivable scope, those skilled in the art can extend the technical solutions of the embodiments of the present invention to any suitable biometric verification scenarios. For example, in a scenario where the user's iris, which is the biometric information, is obtained for verification, the embodiment of the present invention does not limit this.
下文是以获取用户指纹信息作为主述场景来阐述的。但基于上文描述可知,本发明实施例的保护范围并不因此而受到限定。The following description takes the acquisition of user fingerprint information as the main scenario. However, based on the above description, it can be seen that the protection scope of the embodiments of the present invention is not limited thereby.
本发明实施例的用于屏下光学指纹的识别组件可以被应用在包括但不限于移动智能手机、平板电子设备、计算机、GPS导航仪、个人数字助理、智能可穿戴设备等电子设备中。The identification component for off-screen optical fingerprints according to the embodiments of the present invention can be applied to electronic devices including but not limited to mobile smart phones, tablet electronic devices, computers, GPS navigators, personal digital assistants, and smart wearable devices.
为了实现电子设备的基本功能,本发明实施例中的电子设备还可以包括其他必需的模块或部件。以移动智能手机为例,其还可以包括通信模块、电池等。In order to implement the basic functions of the electronic device, the electronic device in this embodiment of the present invention may further include other necessary modules or components. Taking a mobile smart phone as an example, it may also include a communication module, a battery, and the like.
需要说明的是,电子设备所包括的其他必需的模块或部件,可以选用任意合适的现有构造。为清楚简要地说明本发明所提供的技术方案,在此将不再对上述部分进行赘述,说明书附图也进行了相应简化。但应该理解,本发明在范围上并不因此而受到限制。It should be noted that other necessary modules or components included in the electronic device can be selected from any suitable existing structures. In order to clearly and briefly describe the technical solutions provided by the present invention, the above-mentioned parts will not be repeated here, and the accompanying drawings in the description are also simplified accordingly. It should be understood, however, that the present invention is not thereby limited in scope.
如图25所示,该电子设备可以配置有显示屏200。该显示屏200可以为采用自发光单元作为显示像素的自发光显示屏,例如可以为OLED显示屏或者LED显示屏。当然,显示屏200也可以是LCD显示屏或者其他被动发光显示屏,本发明实施例对此不作限定。As shown in FIG. 25 , the electronic device may be configured with a display screen 200 . The display screen 200 may be a self-luminous display screen using self-luminous units as display pixels, for example, an OLED display screen or an LED display screen. Certainly, the display screen 200 may also be an LCD display screen or other passive light-emitting display screen, which is not limited in this embodiment of the present invention.
本发明实施例的识别组件100被设置在显示屏200的下方。具体的,电子设备中可以设置有中框,识别组件100通过该中框被安装在显示屏200的下方,并实现固定。并且,识别组件100和显示屏200之间相对且间隔设置。The identification component 100 of the embodiment of the present invention is disposed below the display screen 200 . Specifically, the electronic device may be provided with a middle frame, and the identification assembly 100 is installed under the display screen 200 through the middle frame, and is fixed. Moreover, the identification assembly 100 and the display screen 200 are opposite and spaced apart.
下面将结合图1至图24,对本发明实施例的识别组件100进行解释和说明。需要说明的是,为了便于说明,在本发明的实施例中,相同的附图标记表示相同的部件。而为了简洁,在不同的实施例中,省略对相同部件的详细说明,且相同部件的说明可互相参照和引用。The identification component 100 of the embodiment of the present invention will be explained and described below with reference to FIG. 1 to FIG. 24 . It should be noted that, for convenience of description, in the embodiments of the present invention, the same reference numerals denote the same components. For the sake of brevity, in different embodiments, the detailed descriptions of the same components are omitted, and the descriptions of the same components can be referred to and quoted from each other.
如图1至图24所示,该识别组件100包括用于将光信号转换成电信号的光感芯片1。光感芯片1在识别组件100设置在显示屏200的下方时,用于接收自显示屏200上方的目标生物体(例如用户的手指)反射回来的目标信号光。并且,可以将目标信号光转换为电信号,以生成指纹图像。光感芯片1进一步可以将该指纹图像发送给与之信号连接的图像处理器,图像处理器进行图像处理得到指纹信号,并通过算法对指纹信号进行指纹识别。As shown in FIG. 1 to FIG. 24 , the identification assembly 100 includes a photosensitive chip 1 for converting optical signals into electrical signals. When the identification component 100 is disposed below the display screen 200 , the light sensor chip 1 is used to receive the target signal light reflected from the target organism (eg, the user's finger) above the display screen 200 . And, the target signal light can be converted into an electrical signal to generate a fingerprint image. The photosensitive chip 1 can further send the fingerprint image to an image processor that is signal-connected to it, and the image processor performs image processing to obtain a fingerprint signal, and performs fingerprint identification on the fingerprint signal through an algorithm.
光感芯片1至少包含有金属层1a。由于金属层1a用于布线或走线,因此金属层1a需要被保护。光感芯片1进一步还可以包括硅层1b,该硅层1b与金属层1a层叠。且两者的相对位置,可根据不同的情况进行变换和调整。The photosensitive chip 1 at least includes a metal layer 1a. Since the metal layer 1a is used for wiring or wiring, the metal layer 1a needs to be protected. The photosensitive chip 1 may further include a silicon layer 1b, which is stacked with the metal layer 1a. And the relative positions of the two can be transformed and adjusted according to different situations.
光感芯片1的上方可以设置有聚光构件,具体可以为聚光构件位于下文提及的保护腔2中。并且,聚光构件在识别组件100设置在显示屏200的下方时位于光感芯片1和显示屏200之间,其用于汇聚信号光,从而可以实现将广角范围内较为分散的信号光汇聚至光感芯片1上,以提升成像质量。A light-condensing member may be disposed above the photosensitive chip 1 , and specifically, the light-concentrating member may be located in the protection cavity 2 mentioned below. In addition, when the identification assembly 100 is disposed below the display screen 200, the light-condensing member is located between the photosensitive chip 1 and the display screen 200, and is used for collecting the signal light, so that the signal light scattered in the wide-angle range can be concentrated to the display screen 200. on the photosensitive chip 1 to improve the imaging quality.
在本实施例中,聚光构件可以由多个微透镜13构成。多个微透镜13可以设置在光感芯片1上,从而光感芯片1可以为多个微透镜13提供设置位置及支撑。In this embodiment, the condensing member may be composed of a plurality of microlenses 13 . A plurality of microlenses 13 can be arranged on the photosensitive chip 1 , so that the photosensitive chip 1 can provide arrangement positions and supports for the plurality of microlenses 13 .
当然,多个微透镜13也可以与光感芯片1间隔设置。具体的,可以在光感芯片1的上方设置用于供多个微透镜13设置的透光板或透光片,籍此实现多个微透镜13与光感芯片1的间隔设置。Of course, the plurality of microlenses 13 may also be arranged at intervals from the photosensitive chip 1 . Specifically, a light-transmitting plate or a light-transmitting sheet for arranging the plurality of microlenses 13 may be arranged above the photosensitive chip 1 , thereby realizing the spaced arrangement of the plurality of microlenses 13 and the photosensitive chip 1 .
为了不影响光感芯片1的成像质量,多个微透镜13与光感芯片1之间的间隔距离,与微透镜13的焦距相等或相近。具体可以为,多个微透镜13与光感芯片1之间的间隔距离的差值在预定范围[0,Φ]内,即可认为多个微透镜13与光感芯片1之间的间隔距离与微透镜13的焦距相等或相近。In order not to affect the imaging quality of the photosensitive chip 1 , the spacing distance between the plurality of microlenses 13 and the photosensitive chip 1 is equal to or similar to the focal length of the microlenses 13 . Specifically, the difference between the distances between the plurality of microlenses 13 and the photosensitive chip 1 can be considered as the separation distance between the plurality of microlenses 13 and the photosensitive chip 1 when the difference in the distance between the plurality of microlenses 13 and the photosensitive chip 1 is within a predetermined range [0, Φ]. It is equal to or close to the focal length of the microlens 13 .
其中,预定范围的上限值Φ可以根据实际情况进行设定,本发明实施例对此不作限定。The upper limit value Φ of the predetermined range may be set according to actual conditions, which is not limited in this embodiment of the present invention.
光感芯片1的上方设置有防护组件5,防护组件5具有透光区域,目标信号光能经透光区域达到光感芯片1。A protective component 5 is arranged above the photosensitive chip 1 , and the protective component 5 has a light-transmitting area, and the target signal light can reach the photosensitive chip 1 through the light-transmitting area.
该透光区域可以占据防护组件5的整个迎光面(例如上表面)。此时防护组件5整体可以由透光材料制成,其迎光面不存在光线无法透过的区域。The light-transmitting area may occupy the entire light-facing surface (eg, the upper surface) of the shield assembly 5 . At this time, the entire protective component 5 can be made of light-transmitting material, and there is no area on the light-facing surface where the light cannot penetrate.
或者,该透光区域也可以仅占据防护组件5的部分迎光面。例如,防护组件5由透光材料和不透光材料分不同的区域制成;其中透光材料所占据的区域形成透光区域。Alternatively, the light-transmitting area may only occupy part of the light-facing surface of the protective assembly 5 . For example, the protective component 5 is made of light-transmitting material and opaque material in different regions; the region occupied by the light-transmitting material forms a light-transmitting region.
亦或者,防护组件5整体由透光材料制成,其迎光面上可以存在或分布由不透光材料所覆盖的区域;而未被不透光材料覆盖的区域即可形成该透光区域。Alternatively, the protective component 5 is made of light-transmitting material as a whole, and areas covered by the opaque material may exist or be distributed on the light-facing surface; and the area that is not covered by the opaque material can form the light-transmitting area. .
防护组件5可以设置在沿目标信号光至光感芯片1所在方向的传播路径上的任意位置。换句话说,即是防护组件5沿目标信号光的传播方向的投影,至少部分的覆盖光感芯片1。The protection component 5 can be arranged at any position along the propagation path of the target signal light to the direction in which the photosensitive chip 1 is located. In other words, it is the projection of the protection component 5 along the propagation direction of the target signal light, at least partially covering the photosensitive chip 1 .
例如,如果目标信号光沿垂直于光感芯片1迎光面的方式传播,则防护组件5可以位于光感芯片1的正上方。而如果目标信息光以倾斜于光感芯片1迎光面的方式传播,则防护组件5可以相应的位于光感芯片1的斜上方。如此,使得目标信息光能够尽可能多的透过防护组件5的透光区域达到光感芯片1。For example, if the target signal light propagates in a manner perpendicular to the light-facing surface of the photosensitive chip 1 , the protective component 5 may be located directly above the photosensitive chip 1 . However, if the target information light propagates in a manner inclined to the light-facing surface of the photosensitive chip 1 , the protective component 5 can be correspondingly located obliquely above the photosensitive chip 1 . In this way, the target information light can pass through the light-transmitting area of the protection component 5 as much as possible to reach the photosensitive chip 1 .
此外,防护组件5的耐受温度高于150℃。即防护组件5在温度大于150℃时,其物理形态不发生变化(例如软化变形、熔化)。由此,当本发明实施例的识别组件100后续通过回流焊与外部电路连接的过程中,即便防护组件5升温,亦不会变形或损坏,从而使得与之相邻或者相连的部件亦能保持原有的形状。In addition, the withstand temperature of the protective assembly 5 is higher than 150°C. That is, when the temperature of the protective component 5 is higher than 150° C., its physical form does not change (for example, softening deformation, melting). Therefore, when the identification component 100 of the embodiment of the present invention is subsequently connected to the external circuit through reflow soldering, even if the protection component 5 is heated up, it will not be deformed or damaged, so that the adjacent or connected components can also remain original shape.
由于回流焊过程中,温度呈阶梯状升高。因此,150℃可以为防护组件5在回流焊伊始时的耐受温度。为了适配回流焊的阶梯状升温,防护组件5的耐受温度进一步可以提高。例如,回流焊过程中温度最高点可以为260℃,则防护组件5的耐受温度相应为大于260℃,例如可达到280℃或者300℃。Due to the reflow process, the temperature rises in a step-like manner. Therefore, 150° C. can be the withstand temperature of the shield assembly 5 at the beginning of reflow soldering. In order to adapt to the step-like temperature rise of reflow soldering, the withstand temperature of the protective component 5 can be further increased. For example, the highest temperature in the reflow soldering process may be 260°C, and the withstand temperature of the protective component 5 is correspondingly greater than 260°C, eg, 280°C or 300°C.
防护组件5具体可以包括透光载体5a和滤光片5b中的至少一个。例如,可以为透光载体5a和滤光片5b中的任意一个构成该防护组件,例如仅透光载体5a构成防护组件5,或者仅滤光片5b构成防护组件5。当然,也可以为透光载体5a和滤光片5b相结合构成该防护组件。Specifically, the protective assembly 5 may include at least one of a light-transmitting carrier 5a and a light filter 5b. For example, any one of the light-transmitting carrier 5a and the optical filter 5b may constitute the protective component, for example, only the light-transmitting carrier 5a constitutes the protective component 5, or only the optical filter 5b constitutes the protective component 5. Of course, the protective component can also be formed by combining the light-transmitting carrier 5a and the filter 5b.
当防护组件5具体为透光载体5a和滤光片5b中的至少一个构造形成时,防护组件5的整个迎光面均可以形成透光区域。When the protective component 5 is specifically formed by at least one of the light-transmitting carrier 5a and the optical filter 5b, the entire light-facing surface of the protective component 5 can form a light-transmitting area.
透光载体5a可以为滤光片5b提供设置位置,并起到支撑滤光片5b的作用。由此,透光载体5a和滤光片5b之间的相对位置可以较为自由。The light-transmitting carrier 5a can provide a setting position for the optical filter 5b, and play a role of supporting the optical filter 5b. Thus, the relative position between the light-transmitting carrier 5a and the optical filter 5b can be relatively free.
具体的,滤光片5b可以以粘贴的方式设置于透光载体5a的上表面或者下表面。从而滤光片5b的表面与透光载体5a的表面相贴合。Specifically, the filter 5b may be disposed on the upper surface or the lower surface of the light-transmitting carrier 5a in a sticking manner. Therefore, the surface of the optical filter 5b is attached to the surface of the light-transmitting carrier 5a.
在该实施例中,滤光片5b可以以膜片的形式贴合在透光载体5a的表面。并且,透光载体5a的上表面和下表面也可以同时设置滤光片5b。In this embodiment, the filter 5b may be attached to the surface of the light-transmitting carrier 5a in the form of a film. In addition, the filter 5b may be provided on the upper surface and the lower surface of the light-transmitting carrier 5a at the same time.
或者,滤光片5b可以植入于透光载体5a内。即滤光片5b与透光载体5a融为一体,此时的透光载体5a具有过滤噪声光的功能。Alternatively, the filter 5b may be embedded in the light-transmitting carrier 5a. That is, the filter 5b is integrated with the light-transmitting carrier 5a, and the light-transmitting carrier 5a at this time has the function of filtering noise light.
在该实施例中,透光载体5a可以为一单层的构件,滤光片5b可以以光学过滤涂层的形式形成在透光载体5a中。并且,该光学过滤涂层可以在透光载体5a中离散或者连续分布。In this embodiment, the light-transmitting carrier 5a may be a single-layer member, and the optical filter 5b may be formed in the light-transmitting carrier 5a in the form of an optical filter coating. Also, the optical filter coating may be discretely or continuously distributed in the light-transmitting carrier 5a.
此外,透光载体5a也可以为多个。则滤光片5b可以以膜片的形式贴合在相邻两个透光载体5a之间,也可以以光学过滤涂层的形式形成在某一个或某几个透光载体5a中。In addition, there may also be a plurality of light-transmitting carriers 5a. Then the optical filter 5b may be attached between two adjacent light-transmitting carriers 5a in the form of a film, or may be formed in one or several light-transmitting carriers 5a in the form of an optical filter coating.
在一个实施例中,透光载体5a可以为盖板玻璃或者蓝宝石盖板。In one embodiment, the light-transmitting carrier 5a may be a cover glass or a sapphire cover.
并且,防护组件5与光感芯片1之间相间隔。由此,可以避免防护组件5与光感芯片1之间发生接触而导致光感芯片1被损坏。Moreover, the protective component 5 is spaced apart from the photosensitive chip 1 . In this way, damage to the photosensitive chip 1 due to contact between the protective component 5 and the photosensitive chip 1 can be avoided.
滤光片5b用于至少部分地过滤掉目标信号光中夹杂的噪声光,以提高光感芯片1对接收到的光的感应,提升成像质量。The optical filter 5b is used to at least partially filter out the noise light mixed in the target signal light, so as to improve the sensitivity of the light sensing chip 1 to the received light and improve the imaging quality.
当激励光源不同时,该噪声光也相应的变化。该激励光源为用于向用户的手指发射激励光,该激励光被用户的手指反射,该反射光即为携带有指纹信息的目标信号光。When the excitation light source is different, the noise light also changes accordingly. The excitation light source is used to emit excitation light to the user's finger, the excitation light is reflected by the user's finger, and the reflected light is the target signal light carrying fingerprint information.
在某些场景中,当显示屏200为自发光显示屏,则该自发光显示屏即可以为激励光源。该激励光源发出的激励光一般为可见光,同样的,目标信号光亦为可见光。那么,在这种场景中,噪声光可以为环境光中的不可见光,例如红外光、近红外光等。则此时,滤光片5b具体可以为红外滤光片。In some scenarios, when the display screen 200 is a self-luminous display screen, the self-luminous display screen can be the excitation light source. The excitation light emitted by the excitation light source is generally visible light, and similarly, the target signal light is also visible light. Then, in this scenario, the noise light may be invisible light in ambient light, such as infrared light, near-infrared light, and the like. In this case, the filter 5b may specifically be an infrared filter.
在该场景中,滤光片5b可以允许自发光显示屏发出的光通过,而将环境光(例如太阳光)中的噪声光(包括红外光、近红外光等不可见光)过滤。其中,自发光显示屏发出的光包括直接朝向滤光片5b的未包含有指纹信息的非目标信号光,也包括经用户手指反射后携带有指纹信息的目标信号光。In this scenario, the filter 5b can allow the light emitted by the self-luminous display screen to pass, and filter the noise light (including invisible light such as infrared light, near-infrared light, etc.) in ambient light (eg, sunlight). The light emitted by the self-luminous display screen includes non-target signal light that does not contain fingerprint information directly toward the filter 5b, and also includes target signal light that carries fingerprint information after being reflected by the user's finger.
因此,当配置有本发明实施例的识别组件100的电子设备在户外使用时,滤光片5b可以有效的过滤外界环境光中的噪声光,从而提高到达光感芯片1上的光的信噪比。Therefore, when the electronic device configured with the identification component 100 of the embodiment of the present invention is used outdoors, the filter 5b can effectively filter the noise light in the external ambient light, thereby improving the signal-to-noise of the light reaching the photosensitive chip 1 . Compare.
而在某些情况下,激励光源可以为额外配置在显示屏200下的不可见光源例如红外光源,该激励光源发出的激励光以及目标信号光均为不可见光。那么,在这种场景中,噪声光则为环境光中的可见光,例如白光。则此时,滤光片5b具体可以为可见光滤光片。In some cases, the excitation light source may be an invisible light source additionally disposed under the display screen 200, such as an infrared light source, and the excitation light and target signal light emitted by the excitation light source are both invisible light. In this scenario, then, the noise light is the visible light in the ambient light, such as white light. In this case, the filter 5b may be a visible light filter specifically.
在该场景中,滤光片5b可以允许激励光源发出的不可见激励光通过,而将环境光中的噪声光(包括白光等可见光)过滤。In this scenario, the filter 5b can allow the invisible excitation light emitted by the excitation light source to pass through, and filter the noise light (including visible light such as white light) in the ambient light.
通常情况下,当激励光源为额外配置的不可见光源时,其可以实现光线的定向发射,即朝向显示屏200上的特定区域发射,该特定区域一般为用户的手指的按压区域。由此,激励光源发出的不可见激励光,大部分经手指反射后形成携带有指纹信息的目标信号光,而不会直接向光感芯片1传播。Generally, when the excitation light source is an additionally configured invisible light source, it can realize directional emission of light, that is, emit light toward a specific area on the display screen 200 , and the specific area is generally a pressing area of a user's finger. Therefore, most of the invisible excitation light emitted by the excitation light source is reflected by the finger to form target signal light carrying fingerprint information, and will not propagate directly to the photosensitive chip 1 .
因此,当配置有本发明实施例的识别组件100的电子设备在户外使用时,滤光片5b亦可以有效的过滤外界环境光中的噪声光。并且,由于本发明实施例的识别组件100设置在显示屏200的下方,则滤光片5b同样也可以将显示屏200向下发出的光中的可见光部分过滤掉,从而提高到达光感芯片1上的光的信噪比。Therefore, when the electronic device equipped with the identification component 100 of the embodiment of the present invention is used outdoors, the optical filter 5b can also effectively filter the noise light in the external ambient light. In addition, since the identification component 100 in the embodiment of the present invention is disposed below the display screen 200, the filter 5b can also filter out the visible light part of the light emitted downward from the display screen 200, thereby improving the reach of the light-sensing chip 1. The signal-to-noise ratio of the light.
防护组件5的下方形成有用于保护金属层1a的保护腔2。保护腔2对金属层1a起到的保护作用至少包括隔挡杂质或灰尘,进一步还可以包括防氧化保护。A protective cavity 2 for protecting the metal layer 1a is formed below the protective component 5 . The protective effect of the protective cavity 2 on the metal layer 1a at least includes blocking impurities or dust, and may further include anti-oxidation protection.
此外,保护腔2对金属层1a的保护的主要形式可以包括:将金属层1a收容在保护腔2中。或者,光感芯片1构成保护腔2的部分内壁。In addition, the main form of protection of the metal layer 1 a by the protection cavity 2 may include: accommodating the metal layer 1 a in the protection cavity 2 . Alternatively, the photosensitive chip 1 forms part of the inner wall of the protection cavity 2 .
进一步地,本发明实施例的识别组件100还配置有导电通路。该导电通路的一端(内端)与金属层1a导电连接,另一端(外端)用于与外部电路连接。Further, the identification component 100 of the embodiment of the present invention is further configured with a conductive path. One end (inner end) of the conductive path is conductively connected to the metal layer 1a, and the other end (outer end) is used for connection with an external circuit.
由于光感芯片1的金属层1a被保护腔2所保护,这就为本发明实施例的识别组件100先封装,后采用回流焊实现与外部电路的导电连接提供了条件。Since the metal layer 1a of the photosensitive chip 1 is protected by the protective cavity 2, conditions are provided for the identification component 100 of the embodiment of the present invention to be packaged first, and then to be electrically connected to an external circuit by reflow soldering.
也就是说,本发明实施例的识别组件100,可以在封装厂完成光感芯片1的封装,再在模组厂实现与外部电路的连接。这样,相较于现有技术而言,本发明实施例的识别组件100仅需在模组厂执行一道回流焊工艺即可,从而生产效率大大提高。That is to say, the identification component 100 according to the embodiment of the present invention can complete the packaging of the photosensitive chip 1 in the packaging factory, and then realize the connection with the external circuit in the module factory. In this way, compared with the prior art, the identification component 100 of the embodiment of the present invention only needs to perform a reflow soldering process in a module factory, so that the production efficiency is greatly improved.
需要说明的是,虽然现有技术在关于屏下光学指纹识别技术领域中,存在将指纹芯片收容在其中的封闭空间的已知实施例。但是,在这些已知实施例中,识别组件已与其他用于实现屏下光学指纹识别的相关构造完成了装配,形成了相应的识别装置。而封闭空间即是由识别组件与其他相关构造形成的。也就是说,该用于将指纹芯片收容在其中的封闭空间,存在于识别装置中,而不可能存在于识别组件中。It should be noted that, although the prior art is in the technical field of under-screen optical fingerprint identification, there are known embodiments of an enclosed space in which a fingerprint chip is accommodated. However, in these known embodiments, the identification components have been assembled with other related structures for realizing under-screen optical fingerprint identification to form corresponding identification devices. The enclosed space is formed by the identification components and other related structures. That is, the closed space for accommodating the fingerprint chip exists in the identification device, but cannot exist in the identification assembly.
此时,组装形成的识别装置,已经完成了回流焊工艺的操作。而在将识别装置或者识别组件与外部电路相连接时,一般不采用回流焊来实现。且实践证明,也难以甚至无法通过回流焊工艺来实现。At this point, the assembled identification device has completed the operation of the reflow soldering process. When connecting the identification device or the identification component with the external circuit, it is generally not realized by reflow soldering. And practice has proved that it is difficult or even impossible to achieve through the reflow soldering process.
具体的,例如,公告号为CN208027382U提供了一种屏下生物特征识别装置和电子设备。其中,屏下生物特征识别装置被作为一个已知实施例进行描述。Specifically, for example, the bulletin number CN208027382U provides an under-screen biometric identification device and electronic equipment. Among them, the under-screen biometric identification device is described as a known embodiment.
如图26所示,在该已知实施例中,FPC270固定在钢板上,成像芯片250(即上文所提及的指纹芯片)通过焊盘焊接固定在FPC270的上表面。FPC270的上表面在成像芯片250的边缘区域,与支架230的下表面固定连接。并且,支架230和FPC270之间形成一个封闭的空间。从而,该封闭的空间将成像芯片250收容在其中。As shown in FIG. 26 , in this known embodiment, the FPC 270 is fixed on a steel plate, and the imaging chip 250 (ie, the fingerprint chip mentioned above) is fixed on the upper surface of the FPC 270 by bonding pads. The upper surface of the FPC 270 is in the edge region of the imaging chip 250 and is fixedly connected with the lower surface of the bracket 230 . And, a closed space is formed between the bracket 230 and the FPC 270 . Thus, the closed space accommodates the imaging chip 250 therein.
实质上,在该已知实施例中,包含有钢板、FPC270及成像芯片250的结构等同于本发明实施例的识别组件100(为了简洁和与本发明相区别,将其命名为识别结构)。而配置有镜头210和镜筒220的支架230,即为与其配合的相关构造。由此,识别结构与该相关构造组装形成屏下生物特征识别装置。In essence, in this known embodiment, the structure including the steel plate, the FPC 270 and the imaging chip 250 is equivalent to the identification component 100 of the embodiment of the present invention (for brevity and difference from the present invention, it is named the identification structure). The bracket 230 configured with the lens 210 and the lens barrel 220 is a related structure matched with it. Thus, the identification structure and the related structure are assembled to form an under-screen biometric identification device.
虽然该已知实施例未提及,识别结构与外部电路相连接的实现方式。但值得注意的是,受其自身结构的限制和产品良率的考量,不能采用回流焊来实现识别结构与外部电路的连接。主要原因是,镜头210不能过回流焊,即实施回流焊的温度氛围会损坏镜头210。具体如下:Although not mentioned in this known embodiment, the realization of the connection of the structure to the external circuit is identified. However, it is worth noting that, due to the limitation of its own structure and the consideration of product yield, reflow soldering cannot be used to realize the connection between the identification structure and the external circuit. The main reason is that the lens 210 cannot be subjected to reflow soldering, that is, the temperature atmosphere in which the reflow soldering is performed will damage the lens 210 . details as follows:
镜头210耐温性能较差(目前,运用于屏下光学领域中的镜头多采用塑料材质制成,耐热温度较低,一般为60℃左右),回流焊过程中的温度氛围将导致镜头210变形。The temperature resistance of the lens 210 is poor (at present, the lenses used in the field of under-screen optics are mostly made of plastic materials, and the heat-resistant temperature is low, generally around 60°C). The temperature atmosphere during the reflow soldering process will cause the lens 210 deformed.
进一步地,在该已知实施例中,镜头210固定在镜筒220中,镜筒220通过螺纹连接的方式和支架230连接。同样的,支架230亦通常耐温性能较差(一般为100℃左右)。回流焊过程中的温度氛围,将导致支架230软化变化,挤压镜头210。Further, in this known embodiment, the lens 210 is fixed in the lens barrel 220, and the lens barrel 220 is connected with the bracket 230 by means of screw connection. Similarly, the support 230 also generally has poor temperature resistance (generally about 100° C.). The temperature atmosphere during the reflow soldering process will cause the bracket 230 to soften and change, squeezing the lens 210 .
由于镜头210是精密器件,细微的受损或变形均会导致其报废。Since the lens 210 is a precision device, slight damage or deformation will cause it to be scrapped.
因此,该已知实施例采用COB工艺得到识别结构,并利用该识别结构组装得到的识别装置,难以通过回流焊来实现与外部电路的连接。Therefore, the known embodiment adopts the COB process to obtain the identification structure, and the identification device assembled by using the identification structure is difficult to realize the connection with the external circuit through reflow soldering.
由此,在识别装置中形成将指纹芯片收容于其中的封闭空间,是由于识别组件与相关构造组装时所必须形成的结构。但在识别组件完成组装形成识别装置后再执行回流焊实现与外部电路的连接,则会损坏识别装置中较为脆弱和精密的器件。从而,回流焊无法实施,或者强行实施回流焊将导致产品报废。Therefore, the closed space in which the fingerprint chip is housed is formed in the identification device because of the structure that must be formed when the identification component is assembled with the related structure. However, after the identification components are assembled to form the identification device and then reflow soldering is performed to realize the connection with the external circuit, the relatively fragile and delicate components in the identification device will be damaged. Therefore, reflow soldering cannot be performed, or forcible reflow soldering will result in product rejection.
而如果上述实施例在没有形成封闭的空间的情况下(即此时,识别结构并未与配置有镜头210和镜筒220的支架230装配,也就不存在镜头210这样的精密器件),通过回流焊来实现识别结构与外部电路的连接,虽然不会导致镜头210损坏。但是,此时的识别结构中的成像芯片250处于暴露状态,回流焊过程中的热风吹扫的杂质或者灰尘将可能附着在成像芯片250的表面,进而导致成像芯片250被损坏。However, if the above embodiment does not form a closed space (that is, at this time, the identification structure is not assembled with the bracket 230 configured with the lens 210 and the lens barrel 220, and there is no such precise device as the lens 210), through Reflow soldering is used to realize the connection between the identification structure and the external circuit, although it will not cause damage to the lens 210 . However, at this time, the imaging chip 250 in the identification structure is in an exposed state, and impurities or dust blown by hot air during the reflow soldering process may adhere to the surface of the imaging chip 250 , thereby causing the imaging chip 250 to be damaged.
由此可见,该已知实施例,不论是在识别结构阶段,还是在利用该识别结构装配形成识别装置后的阶段,其均无法通过回流焊这种工艺来实现识别结构与外部电路的导电连接。It can be seen that, in the known embodiment, no matter in the stage of identifying the structure or the stage after the identification device is assembled by using the identification structure, the conductive connection between the identification structure and the external circuit cannot be realized by the process of reflow soldering. .
而本发明实施例中,在识别组件100中形成用于保护光感芯片1的保护腔2,且由于识别组件100中不涉及上述已知实施例中的镜头210这样的精密且耐温性较差的器件,从而使得识别组件100通过回流焊与外部电路连接成为可能。且降低因损坏这些造价昂贵的精密器件而增加的耗材成本。However, in the embodiment of the present invention, a protection cavity 2 for protecting the photosensitive chip 1 is formed in the identification assembly 100, and since the identification assembly 100 does not involve the lens 210 in the above-mentioned known embodiments, such a precise and relatively temperature-resistant poor device, thereby making it possible to connect the identification assembly 100 to an external circuit through reflow soldering. And reduce the cost of consumables due to damage to these expensive precision devices.
进一步地,本发明实施例的识别组件100可在封装厂完成,即包括光感芯片1的封装、保护腔2的形成,而在模组厂仅需实施回流焊将识别组件100与外部连接这一道工序。由此,可以将尽可能多的工序在生产效率较高的封装厂来完成,整体的生产效率大大提升。此外,回流焊对操作环境或氛围的洁净度要求不高,可进一步提升生产效率。Further, the identification component 100 according to the embodiment of the present invention can be completed in a packaging factory, that is, including the packaging of the photosensitive chip 1 and the formation of the protective cavity 2, and in the module factory, only reflow soldering is required to connect the identification component 100 to the outside. a process. As a result, as many processes as possible can be completed in a packaging factory with higher production efficiency, and the overall production efficiency is greatly improved. In addition, reflow soldering does not require high cleanliness of the operating environment or atmosphere, which can further improve production efficiency.
由此,本发明实施例的识别组件100可与外部电路通过回流焊与外部电路连接。具体的,本发明实施例的识别组件100配置有一端与光感芯片1的金属层1a导电连接的导电通路,则该导电通路的另一端能通过回流焊与外部电路导电连接。籍此,实现本发明实施例的识别组件100与外部电路的导电连通。Thus, the identification component 100 of the embodiment of the present invention can be connected to the external circuit through reflow soldering. Specifically, the identification component 100 of the embodiment of the present invention is configured with a conductive path with one end conductively connected to the metal layer 1a of the photosensitive chip 1, and the other end of the conductive path can be conductively connected to an external circuit through reflow soldering. Thereby, the conductive communication between the identification component 100 of the embodiment of the present invention and the external circuit is realized.
此外,导电通路的另一端通过回流焊与外部电路连接方式可以为,通过回流焊将导电通路的另一端与FPC连接,FPC通过连接器或者连接插头以插拔的方式与其他外围电路或者电子元器件连接。In addition, the other end of the conductive path is connected to the external circuit through reflow soldering. The other end of the conductive path is connected to the FPC through reflow soldering, and the FPC is connected to other peripheral circuits or electronic components through connectors or connecting plugs in a plug-and-pull manner. device connection.
此外,为了便于通过回流焊实施导电通路的另一端与外部电路的连接,导电通路的另一端可以处于裸露状态。具体可以为导电通路的另一端不被识别组件100的壁阻挡。例如,当导电通路的另一端位于识别组件100的壁内时,可以通过在识别组件100的壁上设置将导电通路的另一端与外部接通的开口或者通孔,来实现其裸露。In addition, in order to facilitate the connection between the other end of the conductive path and the external circuit through reflow soldering, the other end of the conductive path may be exposed. Specifically, the other end of the conductive path may not be blocked by the wall of the identification component 100 . For example, when the other end of the conductive path is located in the wall of the identification component 100 , it can be exposed by providing an opening or a through hole on the wall of the identification component 100 to connect the other end of the conductive path with the outside.
或者,导电通路的另一端可以露出或者凸出识别组件100的外表面。例如,导电通路的另一端与识别组件100的外表面相平齐,或者延伸至识别组件100外表面的外侧。从而,实现导电通路的另一端裸露,且延伸至位于保护腔2外。Alternatively, the other end of the conductive path may be exposed or protruded from the outer surface of the identification component 100 . For example, the other end of the conductive path is flush with the outer surface of the identification component 100 , or extends to the outside of the outer surface of the identification component 100 . Thus, the other end of the conductive path is exposed and extends to the outside of the protective cavity 2 .
导电通路的另一端可通过植球工艺形成有焊球15。该焊球15具有较佳的可焊性,例如为锡球,以方便的通过回流焊实现焊球15与外部电路的连接。The other end of the conductive path may be formed with solder balls 15 through a ball mounting process. The solder balls 15 have better solderability, such as solder balls, so as to conveniently realize the connection between the solder balls 15 and external circuits through reflow soldering.
本发明实施例的识别组件100中所包含的光感芯片1,可以采用与上述实施例相同的COB工艺来实现封装。当然,也可以采用其他封装工艺来实现。The photosensitive chip 1 included in the identification component 100 of the embodiment of the present invention can be packaged by using the same COB process as the above-mentioned embodiment. Of course, other packaging processes can also be used for implementation.
例如,在一种可行的实施例中,光感芯片1可以通过芯片级封装(CSP,Chip ScalePackage)工艺被封装。由于CSP工艺能够减小封装产品的厚度和体积。由此,本发明实施例采用CSP工艺来实现光感芯片1的封装,可以使得识别组件100的厚度和体积较小,从而可满足电子设备对屏下光学指纹的识别组件100更薄更小的需求。For example, in a feasible embodiment, the photosensitive chip 1 may be packaged through a chip scale package (CSP, Chip ScalePackage) process. Due to the CSP process, the thickness and volume of the packaged product can be reduced. Therefore, the embodiment of the present invention adopts the CSP process to realize the packaging of the photosensitive chip 1, which can make the thickness and volume of the identification component 100 smaller, so that the identification component 100 of the optical fingerprint under the screen of the electronic device can be thinner and smaller. need.
通过采用CSP工艺,使得光感芯片1与封装件的面积之比大于1:1.14,接近于1:1。By adopting the CSP process, the ratio of the area of the photosensitive chip 1 to the package is greater than 1:1.14, which is close to 1:1.
由于光感芯片1在采用CSP工艺进行封装的过程中,需要支撑载体即承载体对其进行支撑。因此,在完成封装后,该承载体既可以与光感芯片1继续保持结合状态,也可以被去除。Since the photosensitive chip 1 needs to be supported by a support carrier, ie, a carrier, during the packaging process using the CSP process. Therefore, after the encapsulation is completed, the carrier can be kept in a combined state with the photosensitive chip 1, or can be removed.
也就是说,在一种情形中,光感芯片1通过CSP工艺与该承载体相结合。并且,该承载体在光感芯片1完成封装后,与光感芯片1继续保持这种结合状态。即最终的识别组件100中包含有该承载体。That is to say, in one case, the photosensitive chip 1 is combined with the carrier through the CSP process. Moreover, after the photosensitive chip 1 is packaged, the carrier and the photosensitive chip 1 continue to maintain this combined state. That is, the carrier is included in the final identification assembly 100 .
而在另一个情形中,该承载体仅在光感芯片1于通过CSP工艺被封装的过程中,对光感芯片1起支撑作用。而完成封装后,该承载体即可被执行剥离操作,从而与光感芯片1分离。即最终的识别组件100中不包含该承载体。In another case, the carrier only supports the photosensitive chip 1 during the process of being packaged by the CSP process. After the encapsulation is completed, the carrier can be peeled off, so as to be separated from the photosensitive chip 1 . That is, the carrier is not included in the final identification assembly 100 .
如图1至图18所示意的,即为完成光感芯片1的封装后承载体与其继续保持结合的情形。As shown in FIG. 1 to FIG. 18 , it is the situation in which the carrier continues to be combined with the photosensitive chip 1 after the packaging of the photosensitive chip 1 is completed.
在该情形中,光感芯片1包括金属层1a和硅层1b。为了保护金属层1a,金属层1a可以被收容在保护腔2中;或者,光感芯片1形成保护腔2的部分内壁。从而,在实施回流焊的过程中,杂质或灰尘可以被隔挡在保护腔2外。并且进一步,也可以保护金属层1a防止其氧化。In this case, the photosensitive chip 1 includes a metal layer 1a and a silicon layer 1b. In order to protect the metal layer 1 a, the metal layer 1 a may be accommodated in the protection cavity 2 ; or, the photosensitive chip 1 forms a part of the inner wall of the protection cavity 2 . Therefore, during the process of reflow soldering, impurities or dust can be blocked out of the protective cavity 2 . Furthermore, the metal layer 1a can be protected from oxidation.
进一步地,硅层1b也可以被收容在保护腔2中。即此时,光感芯片1整体被收容于保护腔2中。Further, the silicon layer 1b may also be accommodated in the protection cavity 2 . That is, at this time, the entire photosensitive chip 1 is accommodated in the protective cavity 2 .
如图1至图8所示,为金属层1a被收容在保护腔2中,且硅层1b也一并被收容于其中。在这些实施例中,承载体可以为基板3(Substrate,SUB)。基板3可为光感芯片1提供电连接、保护、支撑、散热、组装等功能。As shown in FIG. 1 to FIG. 8 , the metal layer 1 a is accommodated in the protective cavity 2 , and the silicon layer 1 b is also accommodated therein. In these embodiments, the carrier may be a substrate 3 (Substrate, SUB). The substrate 3 can provide functions such as electrical connection, protection, support, heat dissipation, and assembly for the photosensitive chip 1 .
基板3可以采用任何合适的现有构造。具体的,基板3可以为采用柔性材料(例如塑料薄膜)制成的柔性基片,该柔性片上制作有多层金属布线。或者,基板3也可以为采用多层布线陶瓷或多层布线层压树脂板制成的硬质基片。亦或者,基板3也可以为引线框架。The substrate 3 may take any suitable existing configuration. Specifically, the substrate 3 may be a flexible substrate made of a flexible material (eg, a plastic film), and a multi-layer metal wiring is fabricated on the flexible sheet. Alternatively, the substrate 3 may also be a rigid substrate made of a multilayer wiring ceramic or a multilayer wiring laminate resin board. Alternatively, the substrate 3 may also be a lead frame.
此外,基板3上设置有支撑壁4,支撑壁4的下端可通过黏胶304粘接在基板3上。并且,防护组件5被顶撑在支撑壁4的上端。同样的,防护组件5也可以通过黏胶固定在支撑壁4的上端。这样,基板3、支撑壁4和防护组件5之间限定出保护腔2。In addition, the base plate 3 is provided with a support wall 4 , and the lower end of the support wall 4 can be adhered to the base plate 3 by the adhesive 304 . And, the guard assembly 5 is supported on the upper end of the support wall 4 . Similarly, the guard assembly 5 can also be fixed on the upper end of the support wall 4 by adhesive. In this way, the protective cavity 2 is defined between the base plate 3 , the support wall 4 and the protective assembly 5 .
在本发明实施例中,用于粘接相邻部件的黏胶采用热固型胶水。从而在后续执行回流焊时,高温氛围不仅不会破坏各部件之间的连接,还会强化胶水的固化效果,使各部件的之间的连接更加牢固。In the embodiment of the present invention, the glue used for bonding the adjacent components adopts thermosetting glue. Therefore, during subsequent reflow soldering, the high-temperature atmosphere will not only not damage the connection between the components, but also strengthen the curing effect of the glue, making the connection between the components stronger.
在本实施例中,保护腔2可以为密闭的腔室,也可以是非密闭的腔室。In this embodiment, the protection chamber 2 may be a sealed chamber or a non-sealed chamber.
其中,保护腔2为密闭的腔室可以通过将支撑壁4配置为周向连续的来实现。支撑壁4周向连续可以为,其限定一个内部空间,且该内部空间沿径向不与外部空间连通。The protective cavity 2 being a closed cavity can be realized by configuring the support wall 4 to be continuous in the circumferential direction. The support wall 4 may be continuous in the circumferential direction, it defines an inner space, and the inner space is not communicated with the outer space in the radial direction.
具体的,例如,支撑壁4可以为筒状体,该筒状体的壁上不设置任何能接通其内部空间和外部空间的贯通结构,例如通孔、开口等。此外,该筒状体的截面可呈圆形、多边形、异性以及其他任意可行的形状,本发明实施例对此不作限定。Specifically, for example, the support wall 4 may be a cylindrical body, and the wall of the cylindrical body is not provided with any through structures, such as through holes, openings, etc., which can connect the inner space and the outer space thereof. In addition, the cross-section of the cylindrical body may be in a circle, a polygon, an opposite shape, or any other feasible shape, which is not limited in this embodiment of the present invention.
保护腔2为非密闭的腔室可以通过将支撑壁4配置为周向不连续的来实现。同样的,支撑壁4周向连续可以为,其限定的内部空间沿径向不与外部空间连通。The protective chamber 2 being a non-hermetic chamber can be achieved by configuring the support wall 4 to be discontinuous in the circumferential direction. Likewise, the support wall 4 may be continuous in the circumferential direction, and the inner space defined by the support wall 4 may not communicate with the outer space in the radial direction.
具体的,例如,支撑壁4也可以为筒状体,该筒状体的壁上设置接通其内部空间和外部空间的贯通结构例如通孔、开口等。Specifically, for example, the support wall 4 can also be a cylindrical body, and the wall of the cylindrical body is provided with a through structure such as a through hole, an opening, etc. that connects the inner space and the outer space thereof.
或者,支撑壁4为周向不闭合的壳体结构,例如其俯视截面形状可以呈圆弧状、C字形等。Alternatively, the support wall 4 is a casing structure that is not closed in the circumferential direction, for example, the cross-sectional shape of the support wall 4 may be circular arc shape, C shape, or the like.
亦或者,支撑壁4可以为多个柱体,多个柱体的上下两端分别与防护组件5的下表面和基板3的上表面连接,从而多个柱体竖立在防护组件5和基板3之间。此外,多个柱体可以沿周向间隔设置,从而形成类似于栅栏的结构。Alternatively, the support wall 4 can be a plurality of cylinders, and the upper and lower ends of the plurality of cylinders are respectively connected to the lower surface of the protection assembly 5 and the upper surface of the base plate 3, so that the multiple cylinders are erected on the protection assembly 5 and the base plate 3. between. Additionally, a plurality of posts may be spaced circumferentially to form a structure similar to a fence.
上述仅为支撑壁4周向不连续以实现保护腔2非密闭的几种可行的实现方式,本发明实施例并不以此为限。The above are only several feasible implementation manners in which the circumferential direction of the support wall 4 is discontinuous to realize the non-sealing of the protection cavity 2, and the embodiment of the present invention is not limited thereto.
此外,支撑壁4需要被配置为具有能够过回流焊的能力。因此,同上文描述,支撑壁4的耐受温度至少大于150℃,进一步可大于260℃。据此,支撑壁4可以选择在温度于150℃甚至260℃以上时不发生物理形态变化的任意合适的材料制成,例如金属(轻质金属为优选,例如铝或铝合金)、陶瓷等。In addition, the support wall 4 needs to be configured to be capable of over-reflow soldering. Therefore, as described above, the withstand temperature of the support wall 4 is at least greater than 150°C, and may further be greater than 260°C. Accordingly, the support wall 4 can be made of any suitable material that does not change its physical form when the temperature is above 150°C or even 260°C, such as metal (light metal is preferred, such as aluminum or aluminum alloy), ceramics, etc.
基板3的上表面可以设置有上引脚301,基板3的下表面设置有与上引脚301导电连通的下引脚302。具体可以为,基板3中埋嵌有金属柱303,金属柱303的上端和下端分别接通至基板3的上下表面,以分别形成上引脚301和下引脚302。The upper surface of the substrate 3 may be provided with upper pins 301 , and the lower surface of the substrate 3 may be provided with lower pins 302 in conductive communication with the upper pins 301 . Specifically, metal pillars 303 are embedded in the substrate 3 , and the upper and lower ends of the metal pillars 303 are respectively connected to the upper and lower surfaces of the substrate 3 to form upper pins 301 and lower pins 302 respectively.
基板3的上引脚301和下引脚302构成导电通路的一部分。上引脚301用于与光感芯片1的金属层1a导电连通,而上引脚301又与下引脚302导电连通,从而光感芯片1与下引脚302亦导电连通。The upper pins 301 and the lower pins 302 of the substrate 3 form part of the conductive paths. The upper pins 301 are used for conductive connection with the metal layer 1 a of the photosensitive chip 1 , and the upper pins 301 are in conductive communication with the lower pins 302 , so that the photosensitive chip 1 and the lower pins 302 are also in conductive communication.
下引脚302位于保护腔2外,形成导电通路的另一端,用于与外部电路连接。如上文描述,下引脚302上可以形成有焊球15。The lower pin 302 is located outside the protective cavity 2 and forms the other end of the conductive path for connecting with an external circuit. As described above, the lower pins 302 may have solder balls 15 formed thereon.
上引脚301与光感芯片1的金属层1a导电连通的方式如下:The manner in which the upper pin 301 is electrically connected to the metal layer 1a of the photosensitive chip 1 is as follows:
在如图1至图2所示意的实施例,光感芯片1通过黏胶103粘接在基板3上。并且,光感芯片1上形成有焊垫101。具体可以为,光感芯片1的金属层1a的表面可形成焊垫101。In the embodiment shown in FIGS. 1 to 2 , the photosensitive chip 1 is bonded to the substrate 3 by an adhesive 103 . In addition, a bonding pad 101 is formed on the photosensitive chip 1 . Specifically, a bonding pad 101 may be formed on the surface of the metal layer 1 a of the photosensitive chip 1 .
焊垫101与上引脚301通过引线6导电连接。引线6可以为金线或者铜线等可导电的金属线,其具体可以通过引线键合(WB,Wire Bonding)工艺与焊垫101、上引脚301连接。由此,焊垫101、引线6、上引脚301和下引脚302形成导电通路。The bonding pads 101 and the upper pins 301 are conductively connected through the leads 6 . The lead 6 may be a conductive metal wire such as a gold wire or a copper wire, which may be specifically connected to the pad 101 and the upper pin 301 through a wire bonding (WB, Wire Bonding) process. Thus, the bonding pads 101, the leads 6, the upper pins 301 and the lower pins 302 form conductive paths.
在如图3至图4所意的实施例中,光感芯片1中埋嵌有接通至其下表面的导电柱7。导电柱7可以为金属柱例如铜柱,其可以通过硅通孔技术(TSV,Through Silicon Vias)形成在光感芯片1中。In the embodiment as shown in FIG. 3 to FIG. 4 , the photosensitive chip 1 is embedded with conductive pillars 7 connected to the lower surface thereof. The conductive pillars 7 may be metal pillars such as copper pillars, which may be formed in the photosensitive chip 1 by a through silicon via (TSV, Through Silicon Vias).
导电柱7与上引脚301导电连接。具体的,导电柱7可以通过黏胶结合焊接工艺与上引脚301相固定。由此,导电柱7、上引脚301和下引脚302形成导电通路。The conductive pillars 7 are conductively connected to the upper pins 301 . Specifically, the conductive posts 7 can be fixed to the upper pins 301 by an adhesive bonding welding process. Thus, the conductive pillars 7 , the upper pins 301 and the lower pins 302 form conductive paths.
实际上,在该实施例中,光感芯片1可通过FC(Flip Chip,倒装芯片)工艺实现与基板3的导电连接。Actually, in this embodiment, the photosensitive chip 1 can be electrically connected to the substrate 3 through an FC (Flip Chip, flip-chip) process.
进一步地,导电柱7的下端亦可通过植球工艺形成有焊球701。并且,焊球701顶触上引脚301。籍此,较佳的实现导电柱7与上引脚301的导电连接。Further, solder balls 701 may also be formed on the lower ends of the conductive pillars 7 through a ball mounting process. And, the solder balls 701 abut on the pins 301 . Thereby, the conductive connection between the conductive column 7 and the upper pin 301 is preferably realized.
在如图5至图6所示意的实施例,光感芯片1上形成焊垫101,光感芯片1外侧设置有导电柱7,焊垫101可通过导电层8与导电柱7导电连接。具体的,导电层8可通过物理接触与焊垫101和导电柱7导电连通。其中,导电柱7的上端与导电层8连接。In the embodiments shown in FIGS. 5 to 6 , a bonding pad 101 is formed on the photosensitive chip 1 , and a conductive column 7 is provided outside the photosensitive chip 1 . Specifically, the conductive layer 8 can be in conductive communication with the pads 101 and the conductive pillars 7 through physical contact. The upper ends of the conductive pillars 7 are connected to the conductive layer 8 .
进一步地,导电柱7与基板3的上引脚301通过黏胶结合焊接工艺导电连接。由此,焊垫101、导电层8、导电柱7、上引脚301和下引脚302形成导电通路。Further, the conductive pillars 7 are conductively connected to the upper pins 301 of the substrate 3 through an adhesive bonding welding process. Thus, the bonding pads 101 , the conductive layer 8 , the conductive pillars 7 , the upper pins 301 and the lower pins 302 form conductive paths.
此外,光感芯片1和支撑壁4之间可以设置有支撑层9,导电柱7可以设置在支撑层9中。由此,通过设置支撑层9,可以为导电柱7提供设置位置,以对导电柱7进行固定,起维持导电柱7稳定的作用,使得导电柱7能够与导电层8和上引脚301导电连接。In addition, a support layer 9 may be disposed between the photosensitive chip 1 and the support wall 4 , and the conductive pillars 7 may be disposed in the support layer 9 . Therefore, by disposing the support layer 9 , it is possible to provide a setting position for the conductive column 7 to fix the conductive column 7 , so as to maintain the stability of the conductive column 7 , so that the conductive column 7 can conduct electricity with the conductive layer 8 and the upper pins 301 connect.
支撑层9可以为任何合适现有材料制成。例如,支撑层9可以与基板3的材料相同。则导电层8可通过重布线层(RDL)工艺形成在支撑层9的表面或者内部。The support layer 9 can be made of any suitable existing material. For example, the support layer 9 may be of the same material as the substrate 3 . Then, the conductive layer 8 may be formed on the surface or inside of the support layer 9 through a redistribution layer (RDL) process.
当然,支撑层9可以不限于上述材料,其也可以为EMC(Epoxy Molding Compound,环氧塑封料),从而可通过封装工艺包覆光感芯片1的侧面。籍此,可以对光感芯片1的侧面,尤其是金属层1a的侧面起到防氧化保护。Of course, the support layer 9 may not be limited to the above-mentioned materials, and may also be EMC (Epoxy Molding Compound, epoxy molding compound), so that the side surface of the photosensitive chip 1 can be covered by the packaging process. In this way, the side surfaces of the photosensitive chip 1, especially the side surfaces of the metal layer 1a, can be protected against oxidation.
此外,导电层8也可以不限于上述实施例。在其他可行的实施例中,例如导电层8可以实现为金属导电片等,只要能实现导电连接焊垫101和导电柱7,均应包含在本发明的保护范围内。In addition, the conductive layer 8 may not be limited to the above-mentioned embodiment. In other feasible embodiments, for example, the conductive layer 8 may be implemented as a metal conductive sheet, etc., as long as the conductive connection pads 101 and the conductive pillars 7 can be implemented, all should be included in the protection scope of the present invention.
进一步地,支撑层9可以与支撑壁4的内壁之间相间隔。这样,支撑层9和支撑壁4之间形成间隔空间,为执行支撑壁4与基板3的粘贴提供适当的操作空间。Further, the support layer 9 may be spaced apart from the inner wall of the support wall 4 . In this way, an interval is formed between the support layer 9 and the support wall 4 , which provides an appropriate operation space for performing the adhesion of the support wall 4 and the substrate 3 .
在如图7至图8所示意的实施例,光感芯片1的下表面设置有导电凸点10,导电凸点10可通过黏胶结合焊接与基板3的上引脚301固定。由此,导电凸点10、上引脚301和下引脚302形成导电通路。In the embodiment shown in FIGS. 7 to 8 , the lower surface of the photosensitive chip 1 is provided with conductive bumps 10 , and the conductive bumps 10 can be fixed to the upper pins 301 of the substrate 3 by adhesive bonding. Thus, the conductive bumps 10 , the upper pins 301 and the lower pins 302 form conductive paths.
同样的,在该实施例中,光感芯片1可为通过FC工艺实现光感芯片1与基板3的导电连接。Likewise, in this embodiment, the photosensitive chip 1 may be electrically connected to the substrate 3 through the FC process.
并且,导电凸点10的下端也可通过植球工艺形成有焊球1001,焊球1001通过焊接工艺与上引脚301连接。籍此,较佳的实现导电凸点10与上引脚301之间的导电连接。In addition, the lower ends of the conductive bumps 10 may also be formed with solder balls 1001 through a ball-mounting process, and the solder balls 1001 are connected to the upper pins 301 through a soldering process. Thereby, the conductive connection between the conductive bump 10 and the upper pin 301 is preferably realized.
上述为采用基板3作为承载体的实施例。在其他可行的实施例中,也可以采用对光感芯片1进行封装的材料来构造形成承载体。The above is the embodiment in which the substrate 3 is used as the carrier. In other feasible embodiments, the material for encapsulating the photosensitive chip 1 may also be used to construct the carrier.
如图9至图18所示,即为采用由封装层11来构造形成承载体的实施例。在这些实施例中,光感芯片1同样可以与封装层11通过CSP封装工艺相结合。As shown in FIG. 9 to FIG. 18 , it is an embodiment in which the carrier is formed by the encapsulation layer 11 . In these embodiments, the photosensitive chip 1 can also be combined with the packaging layer 11 through a CSP packaging process.
并且,封装层11可以是EMC、SMF或者underfill(底部填充)胶水中的任意一种或几种的组合,其可以通过CSP工艺与光感芯片1相结合。Moreover, the encapsulation layer 11 can be any one or a combination of EMC, SMF or underfill glue, which can be combined with the photosensitive chip 1 through a CSP process.
需要说明的是,在由封装层11构造形成承载体的实施例中所出现的,与由基板3构成承载体的实施例中相同或重复的结构,例如支撑壁4、防护组件5、导电柱7、导电层8、支撑层9等,可参照上文描述,在此不作赘述。It should be noted that, in the embodiment in which the carrier is formed by the encapsulation layer 11, the same or repeated structures appear in the embodiment in which the carrier is formed by the substrate 3, such as the supporting wall 4, the protection component 5, the conductive column 7. For the conductive layer 8, the support layer 9, etc., reference may be made to the above description, and details are not repeated here.
由上文描述可知,至少需要对光感芯片1的金属层1a进行保护。因此,当金属层1a位于硅层1b的上方时,此时可以仅对光感芯片1的金属层1a进行封装保护即可。It can be seen from the above description that at least the metal layer 1a of the photosensitive chip 1 needs to be protected. Therefore, when the metal layer 1a is located above the silicon layer 1b, only the metal layer 1a of the photosensitive chip 1 can be encapsulated and protected.
基于此,当金属层1a位于硅层1b的下方时(如图11至图12所示意的实施例),封装层11需要对光感芯片1的底面及侧面进行包覆。Based on this, when the metal layer 1 a is located below the silicon layer 1 b (as shown in the embodiments shown in FIGS. 11 to 12 ), the encapsulation layer 11 needs to encapsulate the bottom and side surfaces of the photosensitive chip 1 .
而当金属层1a位于硅层1b的上方时(如图9至图10,以及图13至图18所示意的实施例),封装层11可以仅包覆光感芯片1的侧面,也可以进一步包覆光感芯片1的底面。When the metal layer 1a is located above the silicon layer 1b (as shown in FIGS. 9 to 10 and the embodiments shown in FIGS. 13 to 18 ), the encapsulation layer 11 may only cover the side surface of the photosensitive chip 1, or may further Cover the bottom surface of the photosensitive chip 1 .
因此,封装层11至少包括包围光感芯片1的侧面的周缘部分11b,进一步还可以包括包覆光感芯片1的底面的衬底部分11a。Therefore, the encapsulation layer 11 at least includes a peripheral portion 11 b surrounding the side surface of the photosensitive chip 1 , and may further include a substrate portion 11 a covering the bottom surface of the photosensitive chip 1 .
衬底部分11a与周缘部分11b为一体构造。由此,封装层11大致可呈上端开口的壳体状,光感芯片1嵌设或包裹在封装层11内。The substrate portion 11a is constructed integrally with the peripheral portion 11b. Therefore, the encapsulation layer 11 can be roughly in the shape of a shell with an open upper end, and the photosensitive chip 1 is embedded or wrapped in the encapsulation layer 11 .
此外,周缘部分11b包围光感芯片1的侧面,可以为周缘部分11b与光感芯片1的侧面直接接触。如图9至图12,以及图15至图18的实施例。此时,周缘部分11b包覆光感芯片1的侧面。In addition, the peripheral portion 11 b surrounds the side surface of the photosensitive chip 1 , and the peripheral portion 11 b may be in direct contact with the side surface of the photosensitive chip 1 . 9 to 12, and 15 to 18 of the embodiment. At this time, the peripheral portion 11b covers the side surface of the photosensitive chip 1 .
或者,周缘部分11b包围光感芯片1的侧面,也可以为周缘部分11b围绕在光感芯片1外侧,两者之间相间隔,并在两者之间设置用于固定导电柱7的支撑层9。如图13至图14的实施例。并且,支撑层9与光感芯片1的外侧面以及周缘部分1b的内壁相贴合。此时,借由支撑层9来对光感芯片1的侧面进行保护。Alternatively, the peripheral portion 11b surrounds the side surface of the photosensitive chip 1, or the peripheral portion 11b surrounds the outer side of the photosensitive chip 1, and the two are spaced apart, and a support layer for fixing the conductive pillars 7 is disposed between the two. 9. 13 to 14 of the embodiment. In addition, the support layer 9 is attached to the outer side surface of the photosensitive chip 1 and the inner wall of the peripheral portion 1b. At this time, the side surface of the photosensitive chip 1 is protected by the support layer 9 .
因此,根据周缘部分11b与光感芯片1的侧面的接触关系,保护腔2的形成方式亦不同。Therefore, according to the contact relationship between the peripheral portion 11b and the side surface of the photosensitive chip 1, the protective cavity 2 is formed in a different manner.
例如,如图9至图12所示意的实施例,周缘部分11b包覆光感芯片1的侧面。在该实施例中,周缘部分11b的上端设置支撑壁4,支撑壁4的上端顶撑防护组件5。从而,由光感芯片1、支撑壁4及防护组件5限定出保护腔2。For example, in the embodiments shown in FIGS. 9 to 12 , the peripheral portion 11 b covers the side surface of the photosensitive chip 1 . In this embodiment, the upper end of the peripheral portion 11b is provided with a support wall 4 , and the upper end of the support wall 4 supports the guard assembly 5 . Therefore, the protection cavity 2 is defined by the photosensitive chip 1 , the support wall 4 and the protection component 5 .
而在如图13至图14所示意的实施例,与图9至图12所示意的实施例相区别的是,周缘部分11b围绕在光感芯片1的外侧,两者之间间隔设置,并且光感芯片1的侧面和周缘部分11b的内壁之前填充支撑层9。则该实施例中,由光感芯片1、支撑层9、支撑壁4及防护组件5限定出保护腔2。In the embodiment shown in FIGS. 13 to 14 , the difference from the embodiment shown in FIGS. 9 to 12 is that the peripheral portion 11 b surrounds the outer side of the photosensitive chip 1 , and the two are spaced apart, and The side surfaces of the photosensitive chip 1 and the inner wall of the peripheral portion 11b are filled with the support layer 9 before. In this embodiment, the protection cavity 2 is defined by the photosensitive chip 1 , the support layer 9 , the support wall 4 and the protection component 5 .
在图9至图14所示意的实施例,导电通路可以由与光感芯片1连接的导电柱7或者导电凸点10形成。具体方式如下:In the embodiments shown in FIGS. 9 to 14 , the conductive paths may be formed by conductive pillars 7 or conductive bumps 10 connected to the photosensitive chip 1 . The specific methods are as follows:
在如图9至图10所示意的实施例,导电柱7埋嵌在光感芯片1中,其下端延伸至保护腔2外,形成导电通路的另一端,用于与外部电路连接。同样的,导电柱7的下端可形成有焊球15。In the embodiment shown in FIGS. 9 to 10 , the conductive column 7 is embedded in the photosensitive chip 1 , and its lower end extends out of the protective cavity 2 to form the other end of the conductive path for connecting to an external circuit. Likewise, the lower ends of the conductive pillars 7 may be formed with solder balls 15 .
此外,在封装层11包括衬底部分11a的实施例中,衬底部分11a的下表面即构成识别组件100的外表面。则导电柱7的下端可以贯穿衬底部分11a的厚度。Furthermore, in embodiments where the encapsulation layer 11 includes the substrate portion 11a, the lower surface of the substrate portion 11a constitutes the outer surface of the identification assembly 100 . Then the lower ends of the conductive pillars 7 may penetrate through the thickness of the substrate portion 11a.
且导电柱7的下端可以与衬底部分11a的下表面平齐,即导电通路的另一端露出识别组件100的外表面并与之平齐。或者,导电柱7的下端可以凸出衬底部分11a的下表面,即导电通路的另一端露出识别组件100的外表面延伸至其外部。And the lower end of the conductive column 7 can be flush with the lower surface of the substrate portion 11a, that is, the other end of the conductive path is exposed to the outer surface of the identification component 100 and is flush with it. Alternatively, the lower ends of the conductive pillars 7 may protrude from the lower surface of the substrate portion 11a, that is, the other end of the conductive path exposes the outer surface of the identification component 100 and extends to the outside thereof.
在如图11至图12所示意的实施例,导电凸点10形成在光感芯片1的下表面,其下端延伸至保护腔2外,形成导电通路的另一端,用于与外部电路连接。同样的,导电凸点10的下端可形成有焊球15。11 to 12, the conductive bumps 10 are formed on the lower surface of the photosensitive chip 1, the lower ends of which extend to the outside of the protective cavity 2 to form the other end of the conductive paths for connecting with external circuits. Likewise, the lower ends of the conductive bumps 10 may be formed with solder balls 15 .
同样的,在封装层11包括衬底部分11a的实施例中,导电凸点10的下端可以贯穿衬底部分11a的厚度。Likewise, in embodiments where the encapsulation layer 11 includes the substrate portion 11a, the lower ends of the conductive bumps 10 may penetrate the thickness of the substrate portion 11a.
且导电凸点10的下端可以与衬底部分11a的下表面平齐;或者,导电凸点10的下端可以凸出衬底部分11a的下表面。And the lower ends of the conductive bumps 10 may be flush with the lower surface of the substrate portion 11a; alternatively, the lower ends of the conductive bumps 10 may protrude from the lower surface of the substrate portion 11a.
在如图13至图14所示意的实施例,光感芯片1上形成有焊垫101,光感芯片1的外侧设置有导电柱7,焊垫101通过导电层8与导电柱7导电连接。并且,导电柱7的下端延伸至保护腔2外。从而,焊垫101、导电层8和导电柱7形成导电通路。In the embodiment shown in FIGS. 13 to 14 , the photosensitive chip 1 is formed with a bonding pad 101 , and the outer side of the photosensitive chip 1 is provided with a conductive column 7 . Moreover, the lower ends of the conductive pillars 7 extend outside the protection cavity 2 . Thus, the pads 101, the conductive layers 8 and the conductive pillars 7 form conductive paths.
其中,导电柱7的下端形成导电通路的另一端,用于与外部电路连接。Wherein, the lower end of the conductive column 7 forms the other end of the conductive path for connecting with an external circuit.
同样的,导电柱7的下端可以贯穿支撑层9。且导电柱7的下端可以与支撑层9的下表面平齐;或者,导电柱7的下端可以凸出支撑层9的下表面。Likewise, the lower ends of the conductive pillars 7 may penetrate through the support layer 9 . And the lower ends of the conductive pillars 7 may be flush with the lower surface of the support layer 9 ; or, the lower ends of the conductive pillars 7 may protrude from the lower surface of the support layer 9 .
需要说明的是,在图9至图14所示意的实施例,当封装层11仅包含周缘部分11b而无衬底部分11a时(即如图9、图11至图13所示意的实施例),导电柱7或者导电凸点10的下端可直接形成导电通路的另一端。It should be noted that, in the embodiments shown in FIGS. 9 to 14 , when the encapsulation layer 11 only includes the peripheral portion 11 b without the substrate portion 11 a (ie, the embodiments shown in FIGS. 9 and 11 to 13 ) , the lower ends of the conductive pillars 7 or the conductive bumps 10 can directly form the other end of the conductive path.
此时,导电柱7或者导电凸点10的下端可以与光感芯片1的下表面(具体为硅层1b的下表面)相平齐,也可以凸出或超出光感芯片1的下表面。At this time, the lower ends of the conductive pillars 7 or the conductive bumps 10 may be flush with the lower surface of the photosensitive chip 1 (specifically, the lower surface of the silicon layer 1 b ), or may protrude or protrude beyond the lower surface of the photosensitive chip 1 .
如图15至图18所示,在由封装层11构造形成承载体的另一种情形中,周缘部分11b的上端顶撑有线路板12,线路板12可以设置有供目标信号光透过的开口,从而目标信号光可通过该开口到达光感芯片1。As shown in FIG. 15 to FIG. 18 , in another case in which the carrier is formed by the encapsulation layer 11, the upper end of the peripheral portion 11b supports the circuit board 12. opening, so that the target signal light can reach the photosensitive chip 1 through the opening.
防护组件5可以嵌设在开口中(如图15至图16所示意的实施例)。并且,防护组件5的外壁与开口的内壁密封贴合。具体可在两者之间设置密封胶。The guard assembly 5 may be embedded in the opening (embodiments illustrated in Figures 15-16). In addition, the outer wall of the protective assembly 5 is in sealing contact with the inner wall of the opening. Specifically, a sealant can be arranged between the two.
或者,防护组件5可以设置在线路板12上并盖合开口(如图17至图18所示意的实施例)。并且,防护组件5可以通过黏胶14固定在线路板12上,并密封开口的边缘。Alternatively, the guard assembly 5 may be disposed on the circuit board 12 and cover the opening (the embodiment shown in FIGS. 17 to 18 ). Moreover, the protective component 5 can be fixed on the circuit board 12 by the adhesive 14, and seal the edge of the opening.
需要说明的是,在该实施例中,防护组件5可以设置在线路板12的上表面,也可以设置在线路板12的下表面,本发明实施例对此不作限定。It should be noted that, in this embodiment, the protection component 5 may be disposed on the upper surface of the circuit board 12 or may be disposed on the lower surface of the circuit board 12 , which is not limited in this embodiment of the present invention.
由此,光感芯片1、线路板12和防护组件5之间限定出保护腔2。Thus, a protective cavity 2 is defined between the photosensitive chip 1 , the circuit board 12 and the protective component 5 .
在图15至图18所示意的实施例,导电通路可以由与光感芯片1连接的导电柱7穿过封装层11的周缘部分11b形成。具体方式如下:In the embodiments illustrated in FIGS. 15 to 18 , the conductive paths may be formed by the conductive pillars 7 connected to the photosensitive chip 1 through the peripheral portion 11 b of the encapsulation layer 11 . The specific methods are as follows:
具体的,光感芯片1上形成焊垫101,周缘部分11b中埋嵌导电柱7,线路板12设置有与导电柱7导电连接的导电层8,导电层8与通过导电凸起16与焊垫101导电连接。从而,焊垫101、导电凸起16、导电层8和导电柱7形成导电通路。Specifically, a bonding pad 101 is formed on the photosensitive chip 1 , and a conductive post 7 is embedded in the peripheral portion 11 b . The pads 101 are conductively connected. Thus, the pads 101 , the conductive bumps 16 , the conductive layers 8 and the conductive pillars 7 form conductive paths.
在该实施例中,导电凸起16可通过电镀的方式形成在线路板12的下表面,其下端亦可形成有焊球。从而导电凸起16可通过焊接的方式固定在线路板12的下表面。In this embodiment, the conductive bumps 16 may be formed on the lower surface of the circuit board 12 by electroplating, and solder balls may also be formed at the lower ends thereof. Therefore, the conductive protrusions 16 can be fixed on the lower surface of the circuit board 12 by soldering.
当然,导电凸起16也形成在光感芯片1的上表面。Of course, the conductive bumps 16 are also formed on the upper surface of the photosensitive chip 1 .
或者,导电凸起16可以为任何的导电体,该导电体的上下两端分别顶触导电层8和光感芯片1的焊垫101。Alternatively, the conductive bump 16 may be any conductive body, and the upper and lower ends of the conductive body touch the conductive layer 8 and the pads 101 of the photosensitive chip 1 respectively.
导电柱7的其下端延伸至保护腔2外,形成导电通路的另一端,用于与外部电路连接。同样的,导电柱7的下端穿过周缘部分11b并延伸至保护腔2外。The lower end of the conductive column 7 extends out of the protective cavity 2 to form the other end of the conductive path for connecting with an external circuit. Likewise, the lower ends of the conductive pillars 7 pass through the peripheral portion 11b and extend out of the protective cavity 2 .
且导电柱7贯穿周缘部分11b,其下端可以与周缘部分11b的下表面相平齐,也可以凸出周缘部分11b的下表面。And the conductive column 7 penetrates through the peripheral portion 11b, and its lower end may be flush with the lower surface of the peripheral portion 11b, or may protrude from the lower surface of the peripheral portion 11b.
在如图1至图2、图5至图6、图13至图18等所示意的所有涉及或包含有焊垫101的实施例中,焊垫101只要与光感芯片1的金属层1a导电连通即可。由此,焊垫101可以不限于形成在上述附图所示意的光感芯片1的上表面。1 to 2 , 5 to 6 , 13 to 18 , etc., in all the embodiments involving or including the bonding pads 101 , the bonding pads 101 only need to be conductive with the metal layer 1 a of the photosensitive chip 1 . Connect it. Therefore, the bonding pads 101 may not be limited to be formed on the upper surface of the photosensitive chip 1 as shown in the above drawings.
在如图3至图6、图9至图10、图13至图18等所示意的所有涉及或包含有导电柱7的实施例中,导电柱7均可通过TSV工艺形成在光感芯片1、周缘部分11b或者支撑层9中。并且,导电柱7贯穿光感芯片1、周缘部分11b或者支撑层9的厚度。由此,导电柱7的上端可以接通至光感芯片1位于上方的层。In all embodiments involving or including the conductive pillars 7 as shown in FIGS. 3 to 6 , 9 to 10 , 13 to 18 , etc., the conductive pillars 7 can be formed on the photosensitive chip 1 by a TSV process. , the peripheral portion 11b or the support layer 9 . Moreover, the conductive pillars 7 penetrate through the thickness of the photosensitive chip 1 , the peripheral portion 11 b or the supporting layer 9 . Thus, the upper ends of the conductive pillars 7 can be connected to the layer on which the photosensitive chip 1 is located.
由于在这些实施例中,导电柱7的下端可直接形成导电通路的外端(如图9至图10、图13至图18所示意的实施例),或者与上引脚301相连接(如图3至图6所示意的实施例)。因此,导电柱7的上端与光感芯片1的金属层1a相连接。In these embodiments, the lower ends of the conductive pillars 7 can directly form the outer ends of the conductive paths (as shown in the embodiments shown in FIGS. Figures 3 to 6 illustrate the embodiment). Therefore, the upper ends of the conductive pillars 7 are connected to the metal layer 1 a of the photosensitive chip 1 .
因此,在这些实施例中,金属层1a位于硅层1b的上方,即金属层1a位于上方。Therefore, in these embodiments, the metal layer 1a is located above the silicon layer 1b, ie the metal layer 1a is located above.
而相应的,在如图7至图8、图11至图12等所示意的所有涉及或包含有导电凸点10的实施例中,导电凸点10均可通过电镀工艺形成在光感芯片1的下表面。同上文描述,该导电凸点10与光感芯片1的金属层1a相连接。Correspondingly, in all embodiments involving or including the conductive bumps 10 as shown in FIGS. 7 to 8 , 11 to 12 , etc., the conductive bumps 10 can be formed on the photosensitive chip 1 by an electroplating process. the lower surface. As described above, the conductive bump 10 is connected to the metal layer 1 a of the photosensitive chip 1 .
因此,在这些实施例中,金属层1a位于硅层1b的下方,即金属层1a位于下方。Therefore, in these embodiments, the metal layer 1a is located below the silicon layer 1b, ie the metal layer 1a is located below.
上述即为完成光感芯片1的封装后,承载体与其继续保持结合的情形。在该情形中,识别组件100的具体制备过程或流程,一般是先通过CSP工艺实现光感芯片1和承载体的封装后,再对其他相应的部件进行贴合或组装。The above is the situation in which the carrier continues to be combined with the photosensitive chip 1 after the packaging of the photosensitive chip 1 is completed. In this case, the specific preparation process or flow of the identification component 100 is generally to first realize the packaging of the photosensitive chip 1 and the carrier through the CSP process, and then to attach or assemble other corresponding components.
在如图1至图8所示意的识别组件100中,采用基板3作为承载体。以如图1至图2所示意的识别组件100为例,其制备过程大致如下:In the identification assembly 100 as shown in FIGS. 1 to 8 , the substrate 3 is used as a carrier. Taking the identification component 100 as shown in FIGS. 1 to 2 as an example, the manufacturing process thereof is roughly as follows:
1、通过切割晶圆获取单个的光感芯片1的单体;1. Obtain a single photosensitive chip 1 monomer by cutting the wafer;
2、将获得的光感芯片1单体通过黏胶103粘贴在基板3的上表面;2. Paste the obtained photosensitive chip 1 on the upper surface of the substrate 3 through the adhesive 103;
3、执行WB工序,实现光感芯片1与基板3的导电连接;3. Execute the WB process to realize the conductive connection between the photosensitive chip 1 and the substrate 3;
4、将支撑壁4通过黏胶304粘贴在基板3上;4. Paste the support wall 4 on the substrate 3 through the adhesive 304;
5、将防护组件5贴合在支撑壁4的上端。5. Fit the protective assembly 5 to the upper end of the support wall 4 .
图3至图4,以及图7至图8所示意的识别组件100,其制备过程与上述的区别在于,光感芯片1与基板3为通过FC工艺实现导电连接。其他流程大致相同。3 to 4 and FIGS. 7 to 8 show the identification component 100 , the difference between the manufacturing process and the above is that the photosensitive chip 1 and the substrate 3 are electrically connected through the FC process. The other processes are roughly the same.
而图5至图6所示意的识别组件100,其制备过程与上述的区别在于,光感芯片1与基板3为通过导电柱7和导电层8实现导电连接。其中,导电柱7被埋嵌在支撑层9中,支撑层9与基板3的材质可以相同,从而导电层8可以通过RDL工艺形成或植入于支撑层9中。而支撑层9与基板3即可黏胶实现贴合固定。The difference between the manufacturing process of the identification component 100 shown in FIGS. 5 to 6 and the above is that the photosensitive chip 1 and the substrate 3 are electrically connected through the conductive pillars 7 and the conductive layer 8 . The conductive pillars 7 are embedded in the support layer 9 , and the materials of the support layer 9 and the substrate 3 can be the same, so that the conductive layer 8 can be formed or implanted in the support layer 9 by the RDL process. And the support layer 9 and the substrate 3 can be pasted and fixed by gluing.
而在如图9至图18所示意的识别组件100中,采用封装层11作为承载体。以如图9至图10所示意的识别组件100为例,其制备过程大致如下:In the identification assembly 100 as shown in FIGS. 9 to 18 , the encapsulation layer 11 is used as the carrier. Taking the identification component 100 as shown in FIGS. 9 to 10 as an example, the preparation process thereof is roughly as follows:
1、通过切割晶圆获取单个的光感芯片1的单体,光感芯片1中埋嵌有导电柱7;1. Obtain a single light sensor chip 1 by cutting the wafer, and the light sensor chip 1 is embedded with a conductive column 7;
2、对获得的光感芯片1单体进行封装,形成包覆其下表面和/或侧面的封装层11,并使导电柱7的下端露出;2. Encapsulate the obtained photosensitive chip 1 monomer to form an encapsulation layer 11 covering its lower surface and/or side surface, and expose the lower end of the conductive post 7;
3、将支撑壁4通过黏胶304粘贴在基板3上;3. Paste the support wall 4 on the substrate 3 through the adhesive 304;
4、将防护组件5贴合在支撑壁4的上端。4. Fit the protective assembly 5 to the upper end of the support wall 4 .
图11至图12所示意的识别组件100,其制备过程与上述的区别在于,光感芯片1的下表面形成导电凸点10。其他流程大致相同。The difference between the manufacturing process of the identification component 100 shown in FIGS. 11 to 12 and the above is that the conductive bumps 10 are formed on the lower surface of the photosensitive chip 1 . The other processes are roughly the same.
图13至图14所示意的识别组件100,其制备过程与上述的区别在于,导电柱7并不是埋嵌在光感芯片1中,而是埋嵌在支撑层9中,并通过导电层8与光感芯片1实现导电连接。其他流程大致相同。13 to 14, the difference between the manufacturing process of the identification component 100 and the above is that the conductive pillars 7 are not embedded in the photosensitive chip 1, but are embedded in the supporting layer 9, and pass through the conductive layer 8. A conductive connection is achieved with the photosensitive chip 1 . The other processes are roughly the same.
而图15至图18所示意的识别组件100,其制备过程与图13至图14所示意的识别组件100的区别在于,支撑层9的上端顶撑的是设置有开口的线路板12,并在开口中或者线路板12上设置防护组件5。其他流程大致相同。The difference in the manufacturing process of the identification assembly 100 shown in FIGS. 15 to 18 from the identification assembly 100 shown in FIGS. 13 to 14 is that the upper end of the support layer 9 supports the circuit board 12 provided with the opening, and The guard assembly 5 is arranged in the opening or on the circuit board 12 . The other processes are roughly the same.
如图19至图24所示意的,为完成光感芯片1的封装后,承载体被去除的情形。As shown in FIG. 19 to FIG. 24 , after the packaging of the photosensitive chip 1 is completed, the carrier is removed.
同样的,在完成光感芯片1的封装后,承载体被去除的情形中所出现的,与承载体继续与光感芯片1保护结合的情形中相同或重复的结构,例如防护组件5、导电柱7、导电层8、支撑层9、线路板12、导电凸起16等,可参照上文描述,在此不作赘述。Similarly, in the case where the carrier is removed after the packaging of the photosensitive chip 1 is completed, the same or repeated structures occur in the case where the carrier continues to be protected and combined with the photosensitive chip 1, such as the protective component 5, the conductive For the pillars 7 , the conductive layer 8 , the support layer 9 , the circuit board 12 , the conductive bumps 16 , etc., reference may be made to the above descriptions, which will not be repeated here.
由于在该情形中,承载体在最终完成光感芯片1的封装后被去除。因此,本情形中的承载体可以并不限于由上一情形中的基板3或封装层11所构成。In this case, the carrier is removed after the packaging of the photosensitive chip 1 is finally completed. Therefore, the carrier in this case may not be limited to being composed of the substrate 3 or the encapsulation layer 11 in the previous case.
实际上,本情形中的承载体可以为任意一种能够为光感芯片1提供支撑或设置表面的物体,或柔性或硬质均可。In fact, the carrier in this case may be any object capable of providing a support or setting surface for the photosensitive chip 1 , and may be flexible or rigid.
例如,在一种可行的实施例中,可以采用玻璃、塑料薄膜或者离型膜作为该承载体。For example, in a feasible embodiment, glass, plastic film or release film may be used as the carrier.
如上文描述,为了不影响光感芯片1的良率及正常运行,至少需要对光感芯片1的金属层1a进行保护。As described above, in order not to affect the yield and normal operation of the photosensitive chip 1 , at least the metal layer 1 a of the photosensitive chip 1 needs to be protected.
然而,由于承载体在光感芯片1的封装过程中,需要对其进行支撑。因此,一般情况下,承载体设置在光感芯片1的下表面。这样,在完成封装承载体被去除后,光感芯片1的下表面将处于暴露状态。However, since the carrier is in the packaging process of the photosensitive chip 1, it needs to be supported. Therefore, in general, the carrier is arranged on the lower surface of the photosensitive chip 1 . In this way, after the package carrier is removed, the lower surface of the photosensitive chip 1 will be in an exposed state.
由此,在该情形中,需要将光感芯片1所包含的金属层1a设置在硅层1b的上方。这样,承载体被去除后,硅层1b的下表面处于暴露状态,而不影响金属层1a的保护。Therefore, in this case, the metal layer 1a included in the photosensitive chip 1 needs to be disposed above the silicon layer 1b. In this way, after the carrier is removed, the lower surface of the silicon layer 1b is exposed without affecting the protection of the metal layer 1a.
此外,为了实现光感芯片1与外部电路的导电连通,该情形中的识别组件100同样需要配置导电通路。由于金属层1a设置在上层,因此,该情形中,用于构成导电通路且与光感芯片1的金属层1a进行导电连接的部件,一般不能位于下方。In addition, in order to realize the conductive connection between the photosensitive chip 1 and the external circuit, the identification component 100 in this case also needs to be configured with a conductive path. Since the metal layer 1a is disposed on the upper layer, in this case, the components used to form the conductive path and conduct conductive connection with the metal layer 1a of the photosensitive chip 1 cannot generally be located below.
亦即,该情形中用于构成导电通路且与光感芯片1的金属层1a进行导电连接的部件,不能选用类似于图11至图12所示意的导电凸点10。由此,需要采用焊垫101配合导电柱7的方式,来构造形成导电通路。That is, in this case, the components used to form conductive paths and conductively connect with the metal layer 1a of the photosensitive chip 1 cannot use conductive bumps 10 similar to those shown in FIGS. 11 to 12 . Therefore, it is necessary to use the manner in which the bonding pads 101 cooperate with the conductive pillars 7 to construct the conductive paths.
由于金属层1a的厚度较薄,因此焊垫101及布线或走线一般形成在光感芯片1的上表面。因此,为了不影响光感芯片1的良率及正常运行,至少需要对金属层1a的上表面进行保护。具体实施例时,可以仅对金属层1a的上表面进行保护,也可以对金属层1a的上表面和侧面同时进行保护。例如,金属层1a的侧面可以涂覆有保护涂层。Since the thickness of the metal layer 1 a is relatively thin, the bonding pads 101 and wirings or traces are generally formed on the upper surface of the photosensitive chip 1 . Therefore, in order not to affect the yield rate and normal operation of the photosensitive chip 1 , at least the upper surface of the metal layer 1 a needs to be protected. In a specific embodiment, only the upper surface of the metal layer 1a may be protected, or the upper surface and the side surface of the metal layer 1a may be protected at the same time. For example, the sides of the metal layer 1a may be coated with a protective coating.
此外,由于承载体被去除,光感芯片1的底面或侧面失去能对其进行支撑的结构。因此,在该情形中,光感芯片1可通过悬固的方式被固定。In addition, since the carrier is removed, the bottom surface or the side surface of the photosensitive chip 1 loses the structure that can support it. Therefore, in this case, the photosensitive chip 1 can be fixed by means of suspension.
具体的,如图19至图22所示意的实施例,光感芯片1的外侧设置有与其相间隔的支撑层9,支撑层9的上端顶撑线路板12,光感芯片1可通过导电凸起16固定在线路板12的下方。Specifically, in the embodiments shown in FIGS. 19 to 22 , the outer side of the photosensitive chip 1 is provided with a supporting layer 9 spaced therefrom, the upper end of the supporting layer 9 supports the circuit board 12 , and the photosensitive chip 1 can pass through the conductive protrusions. The lift 16 is fixed below the circuit board 12 .
具体的,导电凸起16的上端与线路板12的下表面固定连接,其下端可通过焊接与光感芯片1固定。从而,光感芯片1被悬固在线路板12的下表面。Specifically, the upper end of the conductive bump 16 is fixedly connected to the lower surface of the circuit board 12 , and the lower end thereof can be fixed to the photosensitive chip 1 by welding. Thus, the photosensitive chip 1 is suspended on the lower surface of the circuit board 12 .
导电凸起16为多个,多个导电凸起16沿周向均匀且间隔排布,以对光感芯片1起到均匀固定作用。There are a plurality of conductive bumps 16 , and the plurality of conductive bumps 16 are uniformly and spaced apart along the circumferential direction, so as to uniformly fix the photosensitive chip 1 .
此外,线路板12设置有开口,防护组件5可以设置在开口中,也可以设置在线路板12上并遮盖该开口。由此,光感芯片1、线路板12、防护组件5及导电凸起16之间限定出保护腔2。In addition, the circuit board 12 is provided with an opening, and the protection component 5 may be provided in the opening, or may be provided on the circuit board 12 and cover the opening. Thus, the protection cavity 2 is defined between the photosensitive chip 1 , the circuit board 12 , the protection component 5 and the conductive bumps 16 .
由此,该保护腔2可以为非密闭的腔室。Therefore, the protection chamber 2 can be a non-hermetic chamber.
当然,该保护腔2也可以为密闭的腔室。具体的,可以在光感芯片1的上表面和线路板12的下表面之间设置有密封层17,密封层17被止挡在多个导电凸起16的外侧。从而,该密封层17将保护腔2密封以形成密闭的腔室。Of course, the protection chamber 2 can also be a closed chamber. Specifically, a sealing layer 17 may be provided between the upper surface of the photosensitive chip 1 and the lower surface of the circuit board 12 , and the sealing layer 17 is stopped outside the plurality of conductive bumps 16 . Thus, the sealing layer 17 seals the protective chamber 2 to form a closed chamber.
密封层17也可以为EMC、SMF或者underfill胶水中的任意一种或几种的组合,其具体可通过封装工艺包围在多个导电凸起16的外侧。The sealing layer 17 can also be any one or a combination of EMC, SMF, or underfill glue, which can be enclosed on the outer side of the plurality of conductive bumps 16 through a packaging process.
并且,密封层17可以与光感芯片1的上表面以及线路板12的下表面相接触并粘粘固定,从而提高光感芯片1的固定强度。In addition, the sealing layer 17 can be in contact with the upper surface of the photosensitive chip 1 and the lower surface of the circuit board 12 and be adhered and fixed, thereby improving the fixing strength of the photosensitive chip 1 .
光感芯片1的上表面即金属层1a的上表面形成焊垫101,线路板12上设置有导电层8,焊垫101与导电层8通过导电凸起16导电连接。具体可以为,导电凸起16的两端与焊垫101、导电层8之间通过物理接触的方式实现导电连接。并且,支撑层9中埋嵌有导电柱7,导电柱7与导电层8导电连接,具体为导电柱7的上端顶触导电层8实现电连接。导电柱7的下端位于保护腔2外。A pad 101 is formed on the upper surface of the photosensitive chip 1 , that is, the upper surface of the metal layer 1 a , and a conductive layer 8 is provided on the circuit board 12 . Specifically, the two ends of the conductive bump 16 are electrically connected to the pad 101 and the conductive layer 8 through physical contact. In addition, the support layer 9 is embedded with conductive pillars 7 , and the conductive pillars 7 are electrically connected to the conductive layer 8 . Specifically, the upper ends of the conductive pillars 7 contact the conductive layer 8 for electrical connection. The lower ends of the conductive pillars 7 are located outside the protection cavity 2 .
由此,焊垫101、导电凸起16、导电层8和导电柱7形成导电通路。Thus, the bonding pads 101 , the conductive bumps 16 , the conductive layers 8 and the conductive pillars 7 form conductive paths.
其中,导电柱7的下端形成导电通路的另一端,用于与外部电路连接。Wherein, the lower end of the conductive column 7 forms the other end of the conductive path for connecting with an external circuit.
导电柱7的下端可以贯穿支撑层9。且导电柱7的下端可以与支撑层9的下表面平齐;或者,导电柱7的下端可以凸出支撑层9的下表面。The lower ends of the conductive pillars 7 may penetrate through the support layer 9 . And the lower ends of the conductive pillars 7 may be flush with the lower surface of the support layer 9 ; or, the lower ends of the conductive pillars 7 may protrude from the lower surface of the support layer 9 .
同样的,导电层8可以通过RDL工艺形成或植入于内置于线路板12中,从而导电层8构成线路板12自身结构的一部分。具体的,线路板12可以为PCB,导电层8通过RDL工艺可以形成在线路板12的下表面,以实现通过导电凸起16与焊垫101的导电连接。并且,通过使导电层8构成线路板12自身结构的一部分,可实现电路结构的集成化,利于体积的减小。Likewise, the conductive layer 8 may be formed by an RDL process or embedded in the circuit board 12 so that the conductive layer 8 forms part of the structure of the circuit board 12 itself. Specifically, the circuit board 12 may be a PCB, and the conductive layer 8 may be formed on the lower surface of the circuit board 12 by an RDL process, so as to realize the conductive connection with the bonding pads 101 through the conductive bumps 16 . In addition, by making the conductive layer 8 form a part of the structure of the circuit board 12 itself, the integration of the circuit structure can be realized, which is beneficial to the reduction of the volume.
上述为光感芯片1通过导电凸起16固定在线路板12的下表面的实施例。当然,在无承载体的情况下,光感芯片1实现固定的方式也可并不限于此。在其他可行的实施例中,亦可通过光感芯片1的上表面与线路板12的下表面直接贴合并粘接的方式,实现光感芯片1的固定。The above is the embodiment in which the photosensitive chip 1 is fixed on the lower surface of the circuit board 12 through the conductive bumps 16 . Of course, in the case of no carrier, the manner in which the photosensitive chip 1 is fixed may not be limited to this. In other feasible embodiments, the photosensitive chip 1 can also be fixed by directly attaching and bonding the upper surface of the photosensitive chip 1 and the lower surface of the circuit board 12 .
具体的,如图23至图24所示意的实施例,光感芯片1的外侧设置有与其相间隔的支撑层9,支撑层9的上端顶撑有线路板12,光感芯片1的上表面与线路板12下表面相贴合固定。Specifically, as shown in the embodiments shown in FIGS. 23 to 24 , a support layer 9 is provided on the outer side of the photosensitive chip 1 , and the upper end of the support layer 9 supports the circuit board 12 , and the upper surface of the photosensitive chip 1 is It is attached and fixed with the lower surface of the circuit board 12 .
同样的,线路板12上设置有开口,防护组件5可以设置在开口中,也可以设置在线路板12上并遮盖开口。Similarly, the circuit board 12 is provided with an opening, and the protection component 5 may be provided in the opening, or may be provided on the circuit board 12 and cover the opening.
然而,值得注意的是,由于光感芯片1的上表面与线路板12的下表面贴合。因此,为了能够形成保护腔2,防护组件5的下表面需高于线路板12的下表面。However, it is worth noting that, since the upper surface of the photosensitive chip 1 is attached to the lower surface of the circuit board 12 . Therefore, in order to form the protection cavity 2 , the lower surface of the protection component 5 needs to be higher than the lower surface of the circuit board 12 .
具体的,当防护组件5嵌设在开口中时,防护组件5的厚度可以小于线路板12的厚度。并且,防护组件5的上表面与线路板12的上表面相平齐设置。这样,防护组件5的下表面将高出线路板12的下表面。Specifically, when the protective component 5 is embedded in the opening, the thickness of the protective component 5 may be smaller than the thickness of the circuit board 12 . In addition, the upper surface of the protection assembly 5 is disposed flush with the upper surface of the circuit board 12 . In this way, the lower surface of the guard assembly 5 will be higher than the lower surface of the circuit board 12 .
或者,防护组件5的厚度可以等于甚至大于线路板12的厚度,且防护组件5嵌设在开口中,则防护组件5的上表面高出线路板12的上表面,使其下表面亦高出线路板12的下表面即可。Alternatively, the thickness of the protective component 5 can be equal to or even greater than the thickness of the circuit board 12, and the protective component 5 is embedded in the opening, the upper surface of the protective component 5 is higher than the upper surface of the circuit board 12, and its lower surface is also higher than the upper surface of the circuit board 12. The lower surface of the circuit board 12 is sufficient.
亦或者,防护组件5的截面面积大于开口的截面面积,防护组件5设置在线路板12的上表面,且防护组件5的边缘搭置在开口的边缘。同样也可以使得防护组件5的下表面高于线路板12的下表面。Alternatively, the cross-sectional area of the protective component 5 is larger than the cross-sectional area of the opening, the protective component 5 is disposed on the upper surface of the circuit board 12 , and the edge of the protective component 5 overlaps the edge of the opening. Likewise, the lower surface of the protection assembly 5 can be made higher than the lower surface of the circuit board 12 .
由此,光感芯片1、线路板12及防护组件5之间限定出保护腔2。Thus, a protection cavity 2 is defined between the photosensitive chip 1 , the circuit board 12 and the protection component 5 .
同样的,该保护腔2可以为非密闭的腔室,也可以为非密封的腔室。具体实现方式可参照上文描述,在此不作赘述。Likewise, the protection chamber 2 may be a non-sealed chamber or a non-sealed chamber. For a specific implementation manner, reference may be made to the above description, which is not repeated here.
光感芯片1的上表面即金属层1a的上表面形成焊垫101,线路板12的下表面形成有导电层8,焊垫101与导电层8通过贴合的方式相接触,实现导电连通。支撑层9中埋嵌有导电柱7,导电柱7与导电层8导电连接,导电柱7的下端位于保护腔2外。Pads 101 are formed on the upper surface of the photosensitive chip 1 , that is, the upper surface of the metal layer 1 a , and the conductive layer 8 is formed on the lower surface of the circuit board 12 . A conductive column 7 is embedded in the support layer 9 , the conductive column 7 is electrically connected to the conductive layer 8 , and the lower end of the conductive column 7 is located outside the protection cavity 2 .
由此,焊垫101、导电层8和导电柱7形成导电通路。Thus, the bonding pads 101 , the conductive layers 8 and the conductive pillars 7 form conductive paths.
同样的,导电柱7的下端形成导电通路的另一端,用于与外部电路连接。Similarly, the lower end of the conductive column 7 forms the other end of the conductive path for connecting with an external circuit.
上述即为完成光感芯片1的封装后,承载体被去除的情形。同样的,在该情形中,识别组件100的具体制备过程或流程,一般是先通过CSP工艺实现光感芯片1和承载体的封装,再对其他相应的部件进行贴合或组装,随后即可去除承载体。The above is the case where the carrier is removed after the packaging of the photosensitive chip 1 is completed. Similarly, in this case, the specific preparation process or process of the identification component 100 is generally to first realize the packaging of the photosensitive chip 1 and the carrier through the CSP process, and then attach or assemble other corresponding components, and then Remove the carrier.
如图19至图24所示意的识别组件100,其制备过程与图15至图18所示意的识别组件100的制备过程区别在于,封装层11的周缘部分11b包覆光感芯片1的侧面,即封装层11的周缘部分11b与光感芯片1的侧面相接触。而支撑层9包围在光感芯片1的外侧,即支撑层9不与光感芯片1的侧面相接触。并且,在完成防护组件5的贴合后,除去承载体。其他流程大致相同。19 to 24, the manufacturing process of the identification component 100 shown in FIGS. 19 to 24 is different from the preparation process of the identification component 100 shown in FIGS. 15 to 18 in that the peripheral portion 11b of the encapsulation layer 11 covers the side surface of the photosensitive chip 1, That is, the peripheral portion 11 b of the encapsulation layer 11 is in contact with the side surface of the photosensitive chip 1 . The support layer 9 surrounds the outside of the photosensitive chip 1 , that is, the support layer 9 is not in contact with the side surface of the photosensitive chip 1 . And, after the bonding of the guard assembly 5 is completed, the carrier is removed. The other processes are roughly the same.
需要说明的是,在本发明的描述中,术语“第一”、“第二”等仅用于描述目的和区别类似的对象,两者之间并不存在先后顺序,也不能理解为指示或暗示相对重要性。此外,在本发明的描述中,除非另有说明,“多个”的含义是两个或两个以上。It should be noted that, in the description of the present invention, the terms "first", "second", etc. are only used for the purpose of description and to distinguish similar objects, and there is no sequence between the two, nor can they be construed as indicating or imply relative importance. Also, in the description of the present invention, unless otherwise specified, "plurality" means two or more.
应该理解,以上描述是为了进行图示说明而不是为了进行限制。通过阅读上述描述,在所提供的示例之外的许多实施例和许多应用对本领域技术人员来说都将是显而易见的。因此,本教导的范围不应该参照上述描述来确定,而是应该参照前述权利要求以及这些权利要求所拥有的等价物的全部范围来确定。出于全面之目的,所有文章和参考包括专利申请和公告的公开都通过参考结合在本文中。在前述权利要求中省略这里公开的主题的任何方面并不是为了放弃该主体内容,也不应该认为申请人没有将该主题考虑为所公开的发明主题的一部分。It should be understood that the above description is for purposes of illustration and not limitation. From reading the above description, many embodiments and many applications beyond the examples provided will be apparent to those skilled in the art. The scope of the present teachings should, therefore, be determined not with reference to the above description, but should instead be determined with reference to the preceding claims, along with the full scope of equivalents to which such claims are entitled. The disclosures of all articles and references, including patent applications and publications, are incorporated herein by reference for the purpose of being comprehensive. The omission of any aspect of the subject matter disclosed herein in the preceding claims is not intended to disclaim such subject matter, nor should the applicant be considered as not considering such subject matter as part of the disclosed subject matter.
Claims (51)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201811589493.1A CN109492622A (en) | 2018-12-25 | 2018-12-25 | For shielding the recognizer component and electronic equipment of lower optical finger print |
KR1020190174592A KR20200079441A (en) | 2018-12-25 | 2019-12-24 | Identification unit and electronic device for under-screen optical fingerprint |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201811589493.1A CN109492622A (en) | 2018-12-25 | 2018-12-25 | For shielding the recognizer component and electronic equipment of lower optical finger print |
Publications (1)
Publication Number | Publication Date |
---|---|
CN109492622A true CN109492622A (en) | 2019-03-19 |
Family
ID=65711735
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201811589493.1A Pending CN109492622A (en) | 2018-12-25 | 2018-12-25 | For shielding the recognizer component and electronic equipment of lower optical finger print |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR20200079441A (en) |
CN (1) | CN109492622A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109192707A (en) * | 2018-09-07 | 2019-01-11 | 昆山丘钛微电子科技有限公司 | Optical chip mould group and preparation method thereof |
CN109815891A (en) * | 2019-01-22 | 2019-05-28 | 上海思立微电子科技有限公司 | For shielding the identification mould group and electronic equipment of lower optical finger print |
CN110770745A (en) * | 2019-06-05 | 2020-02-07 | 深圳市汇顶科技股份有限公司 | Optical fingerprint device and electronic equipment |
CN111192941A (en) * | 2020-03-02 | 2020-05-22 | 苏州晶方半导体科技股份有限公司 | Packaging structure and method of fingerprint identification chip |
CN111816712A (en) * | 2020-08-27 | 2020-10-23 | 山东盛品电子技术有限公司 | A kind of prefabricated filter cover plate, packaging structure and method of optoelectronic device |
CN114999939A (en) * | 2022-06-08 | 2022-09-02 | 苏州晶方半导体科技股份有限公司 | Chip packaging method and packaging structure |
CN115424303A (en) * | 2021-05-31 | 2022-12-02 | 华天慧创科技(西安)有限公司 | SMT (surface mount technology) -based ultrathin optical screen lower fingerprint module and method |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022056937A1 (en) * | 2020-09-21 | 2022-03-24 | 深圳市汇顶科技股份有限公司 | Fingerprint recognition apparatus and electronic device |
CN113782498B (en) * | 2021-07-27 | 2024-05-17 | 华为数字能源技术有限公司 | Power modules and power devices |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100128350A1 (en) * | 2008-11-25 | 2010-05-27 | Stmicroelectronics (Research & Development) Limited | Imaging assembly |
US20110058088A1 (en) * | 2009-09-09 | 2011-03-10 | Chi-Hsing Hsu | Image-capturing module with a flexible type substrate structure |
CN101989580A (en) * | 2009-07-29 | 2011-03-23 | 胜开科技股份有限公司 | Image sensor package structure with increased gas chamber space |
CN103969811A (en) * | 2014-05-16 | 2014-08-06 | 中山联合光电科技有限公司 | Wide-angle optical lens applied to high-resolution mobile phone and ultra-thin high-image-quality camera |
CN105518706A (en) * | 2013-09-10 | 2016-04-20 | 苹果公司 | Biometric sensor stack structure |
CN106531700A (en) * | 2016-12-06 | 2017-03-22 | 江阴长电先进封装有限公司 | Chip packaging structure and packaging method |
CN107221517A (en) * | 2017-07-10 | 2017-09-29 | 江阴长电先进封装有限公司 | A kind of cladded type chip scale package structure and its method for packing |
CN108885696A (en) * | 2018-02-06 | 2018-11-23 | 深圳市汇顶科技股份有限公司 | Shield lower biometric devices and electronic equipment |
CN108885697A (en) * | 2018-06-15 | 2018-11-23 | 深圳市汇顶科技股份有限公司 | Under-screen biometric devices and electronic devices |
CN109074491A (en) * | 2018-08-02 | 2018-12-21 | 深圳市汇顶科技股份有限公司 | Shield lower biometric devices and electronic equipment |
CN109074477A (en) * | 2017-11-09 | 2018-12-21 | 深圳市汇顶科技股份有限公司 | Optics module and its processing method and terminal device |
CN209086962U (en) * | 2018-12-25 | 2019-07-09 | 上海思立微电子科技有限公司 | For shielding the recognizer component and electronic equipment of lower optical finger print |
-
2018
- 2018-12-25 CN CN201811589493.1A patent/CN109492622A/en active Pending
-
2019
- 2019-12-24 KR KR1020190174592A patent/KR20200079441A/en not_active Ceased
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100128350A1 (en) * | 2008-11-25 | 2010-05-27 | Stmicroelectronics (Research & Development) Limited | Imaging assembly |
CN101989580A (en) * | 2009-07-29 | 2011-03-23 | 胜开科技股份有限公司 | Image sensor package structure with increased gas chamber space |
US20110058088A1 (en) * | 2009-09-09 | 2011-03-10 | Chi-Hsing Hsu | Image-capturing module with a flexible type substrate structure |
CN105518706A (en) * | 2013-09-10 | 2016-04-20 | 苹果公司 | Biometric sensor stack structure |
CN103969811A (en) * | 2014-05-16 | 2014-08-06 | 中山联合光电科技有限公司 | Wide-angle optical lens applied to high-resolution mobile phone and ultra-thin high-image-quality camera |
CN106531700A (en) * | 2016-12-06 | 2017-03-22 | 江阴长电先进封装有限公司 | Chip packaging structure and packaging method |
CN107221517A (en) * | 2017-07-10 | 2017-09-29 | 江阴长电先进封装有限公司 | A kind of cladded type chip scale package structure and its method for packing |
CN109074477A (en) * | 2017-11-09 | 2018-12-21 | 深圳市汇顶科技股份有限公司 | Optics module and its processing method and terminal device |
CN108885696A (en) * | 2018-02-06 | 2018-11-23 | 深圳市汇顶科技股份有限公司 | Shield lower biometric devices and electronic equipment |
CN108885697A (en) * | 2018-06-15 | 2018-11-23 | 深圳市汇顶科技股份有限公司 | Under-screen biometric devices and electronic devices |
CN109074491A (en) * | 2018-08-02 | 2018-12-21 | 深圳市汇顶科技股份有限公司 | Shield lower biometric devices and electronic equipment |
CN209086962U (en) * | 2018-12-25 | 2019-07-09 | 上海思立微电子科技有限公司 | For shielding the recognizer component and electronic equipment of lower optical finger print |
Non-Patent Citations (1)
Title |
---|
周帅;郑大勇;王斌;: "倒装芯片组装集成电路开封方法", 太赫兹科学与电子信息学报, no. 02, 25 April 2017 (2017-04-25), pages 1 - 21 * |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109192707A (en) * | 2018-09-07 | 2019-01-11 | 昆山丘钛微电子科技有限公司 | Optical chip mould group and preparation method thereof |
CN109192707B (en) * | 2018-09-07 | 2024-08-09 | 昆山丘钛微电子科技有限公司 | Optical chip module and manufacturing method thereof |
CN109815891A (en) * | 2019-01-22 | 2019-05-28 | 上海思立微电子科技有限公司 | For shielding the identification mould group and electronic equipment of lower optical finger print |
CN109815891B (en) * | 2019-01-22 | 2021-08-06 | 上海思立微电子科技有限公司 | A discernment module and electronic equipment for optical fingerprint under screen |
CN110770745A (en) * | 2019-06-05 | 2020-02-07 | 深圳市汇顶科技股份有限公司 | Optical fingerprint device and electronic equipment |
WO2020243926A1 (en) * | 2019-06-05 | 2020-12-10 | 深圳市汇顶科技股份有限公司 | Optical fingerprint apparatus and electronic device |
CN110770745B (en) * | 2019-06-05 | 2023-09-05 | 深圳市汇顶科技股份有限公司 | Optical fingerprint device and electronic equipment |
CN111192941A (en) * | 2020-03-02 | 2020-05-22 | 苏州晶方半导体科技股份有限公司 | Packaging structure and method of fingerprint identification chip |
CN111816712A (en) * | 2020-08-27 | 2020-10-23 | 山东盛品电子技术有限公司 | A kind of prefabricated filter cover plate, packaging structure and method of optoelectronic device |
CN115424303A (en) * | 2021-05-31 | 2022-12-02 | 华天慧创科技(西安)有限公司 | SMT (surface mount technology) -based ultrathin optical screen lower fingerprint module and method |
CN114999939A (en) * | 2022-06-08 | 2022-09-02 | 苏州晶方半导体科技股份有限公司 | Chip packaging method and packaging structure |
Also Published As
Publication number | Publication date |
---|---|
KR20200079441A (en) | 2020-07-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN109492622A (en) | For shielding the recognizer component and electronic equipment of lower optical finger print | |
CN207833534U (en) | Optics module and terminal device | |
US7274094B2 (en) | Leadless packaging for image sensor devices | |
US9024403B2 (en) | Image sensor package | |
CN109274876B (en) | Photosensitive assembly and packaging method thereof, lens module and electronic equipment | |
KR100839976B1 (en) | How to manufacture a camera module at the wafer level | |
US9716193B2 (en) | Integrated optical sensor module | |
KR20180043307A (en) | Optical Fingerprint Sensor Package | |
US20180114804A1 (en) | High reliability housing for a semiconductor package | |
JP4673721B2 (en) | Imaging apparatus and manufacturing method thereof | |
CN101937923A (en) | shooting module | |
CN109979891B (en) | Wafer Level Chip Scale Package Structure | |
JP2005317745A (en) | Solid-state imaging device and manufacturing method thereof | |
US20060223216A1 (en) | Sensor module structure and method for fabricating the same | |
CN101299432A (en) | Optical device and method of manufacturing the same | |
CN209086962U (en) | For shielding the recognizer component and electronic equipment of lower optical finger print | |
US11094722B2 (en) | Image sensor package and imaging apparatus | |
CN101764140A (en) | Flip chip image sensing module and manufacturing method thereof | |
CN109815891B (en) | A discernment module and electronic equipment for optical fingerprint under screen | |
CN105355641A (en) | Packaging structure and packaging method of high-pixel image sensing chip | |
KR20120076286A (en) | Lens module, lens wafer module, and method for manufacturing lens module | |
JP4314825B2 (en) | OPTICAL MODULE AND ITS MANUFACTURING METHOD, CIRCUIT BOARD AND ELECTRONIC DEVICE | |
CN101521185A (en) | Package structure and process for optical chip | |
JP5045952B2 (en) | Optical device, optical module, and electronic equipment | |
JP4292383B2 (en) | Optical device manufacturing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |