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CN109455946A - A kind of W with electrochromic property18O49/WO3Laminated film and preparation method thereof - Google Patents

A kind of W with electrochromic property18O49/WO3Laminated film and preparation method thereof Download PDF

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Publication number
CN109455946A
CN109455946A CN201910008602.4A CN201910008602A CN109455946A CN 109455946 A CN109455946 A CN 109455946A CN 201910008602 A CN201910008602 A CN 201910008602A CN 109455946 A CN109455946 A CN 109455946A
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layer
composite film
conductive glass
transparent conductive
reaction kettle
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CN109455946B (en
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钱旦
宋忠孝
梁琴
李茜
李雁淮
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Ningbo Geostar Photoelectric Technology Co ltd
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Xian Jiaotong University
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/219CrOx, MoOx, WOx
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/24Doped oxides
    • C03C2217/241Doped oxides with halides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions
    • C03C2218/111Deposition methods from solutions or suspensions by dipping, immersion
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/154Deposition methods from the vapour phase by sputtering

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

本发明公开了一种具有电致变色性能的W18O49/WO3复合薄膜,WO3层和W18O49层从下到上依次沉积在透明导电玻璃上。本发明公开了该复合薄膜的制备方法,包括以下步骤:1)利用直流反应溅射法在清洁的透明导电玻璃表面沉积氧化钨,退火得到WO3层;2)在反应釜内放置前驱体溶液,沉积有WO3层的透明导电玻璃置于反应釜内,透明导电玻的WO3层高出液面0‑3mm;3)反应釜在预设温度反应预设时间后,取出后得到具有W18O49/WO3复合薄膜的透明导电玻璃;致密的WO3对复合薄膜的服役循环稳定性能有很大的贡献,为更大比表面积的WO3纳米结构形貌的实现提供了过渡,从而形成更高变色效率的复合薄膜。The invention discloses a W 18 O 49 /WO 3 composite film with electrochromic properties, wherein a WO 3 layer and a W 18 O 49 layer are sequentially deposited on transparent conductive glass from bottom to top. The invention discloses a preparation method of the composite film, comprising the following steps: 1) depositing tungsten oxide on the surface of clean transparent conductive glass by DC reactive sputtering, and annealing to obtain a WO 3 layer; 2) placing a precursor solution in a reaction kettle , the transparent conductive glass deposited with the WO 3 layer is placed in the reaction kettle, and the WO 3 layer of the transparent conductive glass is 0-3 mm higher than the liquid surface; 3) After the reaction kettle is at a preset temperature and reacts for a preset time, it is taken out to obtain a W Transparent conductive glass of 18 O 49 /WO 3 composite film; dense WO 3 has a great contribution to the service cycle stability performance of the composite film, providing a transition for the realization of the WO 3 nanostructure morphology with a larger specific surface area, thereby A composite film with higher discoloration efficiency is formed.

Description

A kind of W with electrochromic property18O49/WO3Laminated film and preparation method thereof
Technical field
It is especially a kind of with electrochromic property the invention belongs to the preparation technical field of electrochomeric films W18O49/WO3Laminated film and preparation method thereof.
Background technique
Under environmentally protective overall background, electrochromic material and device are since it shows in low energy consumption, Electronic Paper, building The application prospect in the fields such as intelligent power saving and infrared stealth and attract attention.Tungsten is the Dominant Mineral Resources in China, three oxidations Tungsten is both research electrochromic material the most sufficient and the most excellent inorganic electrochromic material of performance.Electrochromism Refer to that there is a phenomenon where stablize reversible change under the action of extra electric field for the optical properties of material.Tungstic acid is a kind of N-shaped Semiconductor, forbidden bandwidth about 2.4ev have good response to visible light and near infrared light.A.Antonaia et al. is using electricity Beamlet evaporation is prepared for a-WO3/c-WO3Laminated film, experiment show that the electrochromism response of duplicature under visible light is obvious It is faster than monofilm (Electrochimica Acta, 46 (2001), 2221-2227).With the hair of nano material preparation technology Exhibition, one-dimensional material is since big specific surface area in electrochromism field causes huge concern, simultaneously because solvent heat legal system The standby abundant prefered method for becoming nano material preparation of simple, at low cost and nanostructure product morphology.
Zheng etc. directly prepares hexagonal phase WO in substrate using hydro-thermal method3Nano-stick array thin film, (CrystEng.Comm, 2013,277-284), Yang etc. by hydro-thermal method in FTO substrate grown vertical nanowires chip arrays film, (J.Mater.Chem, 2012,22 (34): 17744-17752).Since substrate uses electro-conductive glass, the tungsten oxide that hydro-thermal generates Combination between different elemental substances therewith belongs to non-natural combination, and mutual binding force is poor, is easy to make under service condition At WO3The removing of film and electro-conductive glass substrate.Jiang-ping Tu etc. is prepared for six sides' on the surface FTO of seeded The numbers of tree-like nanostructures array of tungsten oxide nanometer linear array (J.Mater.Chem, 2011,21,5492) and different-shape (Solar Energy Materials&Solar Cells,124(2014)103–110).Seed layer is prepared using spin-coating method, is had Effect improves the combination of hydro-thermal nanostructure tungsten oxide and electro-conductive glass substrate, but the thickness of the crystal seed of spin-coating method preparation, uniform Property, surface state etc. are not easily adjusted.
Summary of the invention
It is an object of the invention to overcome the above-mentioned prior art, provide a kind of with electrochromic property W18O49/WO3Laminated film and preparation method thereof.
In order to achieve the above objectives, the present invention is achieved by the following scheme:
A kind of W with electrochromic property18O49/WO3Laminated film, WO3Layer and W18O49Layer is sequentially depositing from top to bottom On transparent conducting glass.
Further, WO3For compacted zone, with a thickness of 30-220nm.
Further, W18O49Layer with a thickness of 200-300nm.
A kind of W with electrochromic property18O49/WO3The preparation method of laminated film, comprising the following steps:
1) using DC reactive sputtering method in clean transparent conductive glass surface deposited oxide tungsten, annealing obtains WO3Layer;
2) precursor solution is placed in reaction kettle, is deposited with WO3The transparent conducting glass of layer is placed in reaction kettle, transparent The WO of electro-conductive glass3Layer is higher by liquid level 0.5-3mm;
3) it after reaction kettle reacts preset time under preset temperature, obtains after taking-up with W18O49/WO3Laminated film it is saturating Bright electro-conductive glass.
Further, magnetically controlled DC sputtering parameter is in step 1), and background vacuum is lower than 6 × 10-4Pa, room temperature, sputtering Power is 70W, operating air pressure 0.6Pa, working gas Ar and O2Flow-rate ratio is 20:3.
Further, precursor solution is WCl that mass fraction is 0.169wt.% in step 2)6, solvent is ethyl alcohol.
Further, which is characterized in that preset temperature is 175-185 DEG C in step 3), preset time 9.5-10h.
Compared with prior art, the invention has the following advantages:
A kind of W with electrochromic property18O49/WO3Laminated film and preparation method thereof passes through DC reactive sputtering method Prepare WO3On the one hand crystal seed substantially increases the binding force between transparent conducting glass and film, on the other hand can be very convenient Ground regulates and controls the thickness of crystal seed, crystalline condition etc., and fine and close WO3Have to the military service stable circulation performance of laminated film very big Contribution is the WO of more bigger serface3The realization of nanostructured morphologies provides transition, to form answering for higher discoloration efficiency Close film.In addition, the preparation method simple process and low cost, has a wide range of applications in electrochromism field.
Detailed description of the invention
Fig. 1 is tungsten oxide nanometer structure composite film morphology figure prepared by embodiment 1;
Fig. 2 is the X-ray diffractogram of tungsten oxide nanometer structure composite film prepared by embodiment 1,2,3,4;
Fig. 3 is that tungsten oxide nanometer structure composite film prepared by embodiment 1,2,3,4 exists in colour fading state and coloured state Light transmission rate at 400nm-1300nm;
Fig. 4 is coloration efficiency of the tungsten oxide nanometer structure composite film under -3V voltage prepared by embodiment 1,2,3,4.
Specific embodiment
In order to enable those skilled in the art to better understand the solution of the present invention, below in conjunction in the embodiment of the present invention Attached drawing, technical scheme in the embodiment of the invention is clearly and completely described, it is clear that described embodiment is only The embodiment of a part of the invention, instead of all the embodiments.Based on the embodiments of the present invention, ordinary skill people The model that the present invention protects all should belong in member's every other embodiment obtained without making creative work It encloses.
It should be noted that description and claims of this specification and term " first " in above-mentioned attached drawing, " Two " etc. be to be used to distinguish similar objects, without being used to describe a particular order or precedence order.It should be understood that using in this way Data be interchangeable under appropriate circumstances, so as to the embodiment of the present invention described herein can in addition to illustrating herein or Sequence other than those of description is implemented.In addition, term " includes " and " having " and their any deformation, it is intended that cover Cover it is non-exclusive include, for example, the process, method, system, product or equipment for containing a series of steps or units are not necessarily limited to Step or unit those of is clearly listed, but may include be not clearly listed or for these process, methods, product Or other step or units that equipment is intrinsic.
The invention will be described in further detail with reference to the accompanying drawing:
Embodiment 1
1) tungsten oxide layer is deposited in clean FTO glass surface using direct current magnetron sputtering process, magnetically controlled DC sputtering Parameter are as follows: background vacuum is lower than 6 × 10-4Pa, room temperature, sputtering power 70W, operating air pressure 0.6Pa, Ar:O2=20:3, Sputtering is with a thickness of 36nm;400 DEG C of air anneal 30min form fine and close WO3Monoclinic crystal;
2) electronic balance weighing 0.04g WCl is utilized6Powder pours into 50ml water heating kettle liner and is added the second of 30ml Alcohol is stirred at room temperature to being completely dissolved, and solution gradually becomes brown color by colourless, completes the configuration of precursor solution;It will be clear Clean WO3/ FTO is inverted in supporting table, makes WO3Down, it is parallel to the liquid level of reactant, about in the position of the above 1mm of liquid level It sets.
3) it puts on stainless steel casing and is put into baking oven, taking-up is air-cooled to room after 9.5h is reacted under 175 DEG C of constant temperatures Temperature takes out sample, is dried up with deionized water repeated flushing, W18O49The thickness of layer is about 200nm, obtains W18O49/WO3/ FTO laminated film.
Embodiment 2
1) using direct current magnetron sputtering process in clean FTO glass surface deposited oxide tungsten layer, the ginseng of magnetically controlled DC sputtering Number are as follows: background vacuum is lower than 6 × 10-4Pa, room temperature, sputtering power 70W, operating air pressure 0.6Pa, Ar:O2=20:3, splashes It penetrates with a thickness of 72nm;Then anneal in 400 DEG C of air 30min, forms fine and close WO3Monoclinic crystal.
2) balance precise 0.04g WCl is utilized6Powder pours into 50ml water heating kettle liner and is added the second of 30ml Alcohol is stirred at room temperature to being completely dissolved, and solution gradually becomes brown color by colourless, completes the configuration of precursor solution;It will be clear Clean WO3/ FTO is inverted in supporting table, makes WO3Down, it is parallel to the liquid level of reactant, about in the position of the above 0.5mm of liquid level It sets;
3) it puts on stainless steel casing and is put into baking oven, taking-up is air-cooled to room after 9.5h is reacted under 180 DEG C of constant temperatures Temperature takes out sample, is dried up with deionized water repeated flushing, W18O49Layer with a thickness of 240nm.
Embodiment 3
1) tungsten oxide layer is deposited in clean FTO glass surface using direct current magnetron sputtering process;Magnetically controlled DC sputtering Parameter are as follows: background vacuum is lower than 6 × 10-4Pa, room temperature, sputtering power 70W, operating air pressure 0.6Pa, Ar:O2=20:3, Sputtering is with a thickness of 144nm, and then temperature is 400 DEG C of annealing 30min in air, forms fine and close WO3Monoclinic crystal.
2) balance precise 0.04g WCl is utilized6Powder pours into 50ml water heating kettle liner and is added the second of 30ml Alcohol is stirred at room temperature to being completely dissolved, and solution gradually becomes brown color by colourless, completes the configuration of precursor solution;It will be clear Clean WO3/ FTO is inverted in supporting table, WO3Down, it is parallel to the liquid level of reactant, about in the position of the above 3mm of liquid level.
3) it puts on stainless steel casing and is put into baking oven, taking-up is air-cooled to room after 10h is reacted under 185 DEG C of constant temperatures Temperature takes out sample, is dried up with deionized water repeated flushing, W18O49Layer with a thickness of 300nm.
Embodiment 4
1) using direct current magnetron sputtering process in clean FTO glass surface deposited oxide tungsten layer, the ginseng of magnetically controlled DC sputtering Number are as follows: background vacuum is lower than 6 × 10-4Pa, room temperature, sputtering power 70W, operating air pressure 0.6Pa, Ar:O2=20:3, splashes It penetrates with a thickness of 217nm, then keeps the temperature 30min at 400 DEG C of temperature in air, complete annealing, form fine and close WO3Monoclinic crystal Body;
2) balance precise 0.04g WCl is utilized6Powder pours into 50ml water heating kettle liner and is added the second of 30ml Alcohol is stirred at room temperature to being completely dissolved, and solution gradually becomes brown color by colourless, completes the configuration of presoma;It will be clean WO3/ FTO is inverted in supporting table, makes WO3Down, it is parallel to the liquid level of reactant, about in the position of the above 0-3mm of liquid level.
3) it puts on stainless steel casing and is put into baking oven, taking-up is air-cooled to room after 9.8h is reacted under 175 DEG C of constant temperatures Temperature takes out sample, is dried up with deionized water repeated flushing, W18O49Layer with a thickness of 260nm.
It is tungsten oxide nanometer structure composite film morphology figure prepared by embodiment 1 referring to Fig. 1, Fig. 1, it can be seen that sample table One layer of W of face homoepitaxial18O49Nano wire film, nano wire is in compacted zone WO3Upper mutually overlap joint, forms latticed pattern.
Referring to fig. 2, Fig. 2 is the X-ray diffractogram of tungsten oxide nanometer structure composite film prepared by embodiment 1,2,3,4, It is obtained as a result, figure that embodiment 1,2,3,4 is represented with the nanostructure thicknesses of layers of 36nm, 72nm, 144nm, 217nm respectively In diffraction maximum correspond to monocline WO3Diffraction maximum, due to W18O49(010) diffraction maximum and monocline WO of nano wire3(002) spread out Peak position coincidence is penetrated, therefore the faint diffraction maximum of nano wire is buried in monocline WO3In the diffraction maximum of film.
Referring to Fig. 3 and Fig. 4, Fig. 3 and Fig. 4 are respectively tungsten oxide nanometer structure composite film prepared by embodiment 1,2,3,4 In colour fading state and coloured state at 400~1300nm light transmission rate and the coloration efficiency under -3V voltage;For testing example The electrochromic property of tungsten oxide nanometer structural membrane obtained by 1-4 is divided light using electrochemical workstation and UV, visible light Degree is counted to measure the light transmission rate variation of tungsten oxide nanometer structure composite film obtained and electrochromism response speed, and calculates Coloration efficiency.
Test uses two-electrode system: with the W of preparation18O49/WO3/ FTO laminated film is as working electrode, with platinum filament To electrode, using the polycarbonate solution of the lithium perchlorate of 0.1mol/L as electrolyte.The result shows that: when the side of application -3V and 3V When pressure, the laminated film navy blue and it is transparent between reversible change;
The light transmittance of the laminated film of embodiment 1 has apparent variation in 400~1300nm wave band, in λ=700nm and 67.4% and 76.1% are reached at λ=1000nm, have been 3.8s in the electrochromism coloration time of λ=700nm, fading time is 7.7s, coloration efficiency 46.5cm2/C;
The light transmittance of the laminated film of embodiment 2 has apparent variation in 400~1300nm wave band, in λ=700nm and 49% and 55.7% are reached at λ=1000nm;It is 4.1s in the electrochromism coloration time of λ=700nm, fading time is 6.9s, coloration efficiency 43.6cm2The electrochromism efficiency of/C, the film are preferable, smaller between optical modulation region, and the response time is most Fastly.
The light transmittance of the laminated film of embodiment 3 has apparent variation in 400~1300nm wave band, in λ=700nm and 60.9% and 81.4% are reached at λ=1000nm;It is 7.6s in the electrochromism coloration time of λ=700nm, fading time is 9.5s, coloration efficiency 38.8cm2/C.The electrochromism efficiency of the film is preferable, larger between optical modulation region, the response time compared with Fastly.
The light transmittance of the laminated film of embodiment 4 has apparent variation in 400~1300nm wave band, in λ=700nm and 49% and 55.7% are reached at λ=1000nm;It is 8.8s in the electrochromism coloration time of λ=700nm, fading time is 12.8s, coloration efficiency 26.5cm2/C.The electrochromism efficiency of the film is smaller, and maximum between optical modulation region, the response time is most Slowly.
It to sum up compares, the electrochromism efficiency of the laminated film of embodiment 1 is best, larger between optical modulation region, the response time Comparatively fast.
Electrochromism is substantially electronic conductivity and Li in an electrochemical reaction process, with film+Insertion diffusion Rate is related;W first18O49Nano wire has minor diameter and bigger serface, and has a large amount of Lacking oxygen to provide for Li+ The insertion point of low energy barrier potential, therefore entire electrochromic property can be improved;Secondly with compacted zone WO in embodiment3It is thick The increase of degree, Li+It is embedded in WO3Diffusion length and driving energy in film increase, to reduce electrochromic property.
The above content is merely illustrative of the invention's technical idea, and this does not limit the scope of protection of the present invention, all to press According to technical idea proposed by the present invention, any changes made on the basis of the technical scheme each falls within claims of the present invention Protection scope within.

Claims (7)

1.一种具有电致变色性能的W18O49/WO3复合薄膜,其特征在于,WO3层和W18O49层从下到上依次沉积在透明导电玻璃上。1. A W 18 O 49 /WO 3 composite film with electrochromic properties, characterized in that the WO 3 layer and the W 18 O 49 layer are sequentially deposited on the transparent conductive glass from bottom to top. 2.根据权利要求1所述的具有电致变色性能的W18O49/WO3复合薄膜,其特征在于,WO3为致密层,厚度为30-220nm。2 . The W 18 O 49 /WO 3 composite film with electrochromic properties according to claim 1 , wherein the WO 3 is a dense layer with a thickness of 30-220 nm. 3 . 3.根据权利要求1或2所述的具有电致变色性能的W18O49/WO3复合薄膜,其特征在于,W18O49层的厚度为200-300nm。3. The W 18 O 49 /WO 3 composite film with electrochromic properties according to claim 1 or 2, wherein the thickness of the W 18 O 49 layer is 200-300 nm. 4.一种如权利要求1所述的具有电致变色性能的W18O49/WO3复合薄膜的制备方法,其特征在于,包括以下步骤:4. a preparation method of the W 18 O 49 /WO 3 composite film with electrochromic properties as claimed in claim 1, characterized in that, comprising the following steps: 1)利用直流反应溅射法在清洁的透明导电玻璃表面沉积氧化钨,退火得到WO3层;1) using DC reactive sputtering to deposit tungsten oxide on the surface of the clean transparent conductive glass, and annealing to obtain a WO 3 layer; 2)在反应釜内放置前驱体溶液,沉积有WO3层的透明导电玻璃置于反应釜内,透明导电玻璃的WO3层高出液面0.5-3mm;2) The precursor solution is placed in the reaction kettle, the transparent conductive glass deposited with the WO 3 layer is placed in the reaction kettle, and the WO 3 layer of the transparent conductive glass is 0.5-3mm higher than the liquid surface; 3)反应釜在预设温度下反应预设时间后,取出后得到具有W18O49/WO3复合薄膜的透明导电玻璃。3) After the reaction kettle is reacted at a preset temperature for a preset time, the transparent conductive glass with the W 18 O 49 /WO 3 composite film is obtained after being taken out. 5.根据权利要求4所述的具有电致变色性能的W18O49/WO3复合薄膜的制备方法,其特征在于,步骤1)中直流磁控溅射参数为,本底真空度低于6×10-4Pa,常温,溅射功率为70W,工作气压为0.6Pa,工作气体Ar和O2流量比为20:3。5. The preparation method of the W 18 O 49 /WO 3 composite film with electrochromic properties according to claim 4, wherein the DC magnetron sputtering parameter in step 1) is that the background vacuum is lower than 6 × 10 -4 Pa, normal temperature, sputtering power of 70W, working gas pressure of 0.6Pa, working gas Ar and O 2 flow ratio of 20:3. 6.根据权利要求4所述的具有电致变色性能的W18O49/WO3复合薄膜的制备方法,其特征在于,步骤2)中前驱体溶液为质量分数为0.169wt.%的WCl6,溶剂为乙醇。6. The method for preparing a W 18 O 49 /WO 3 composite film with electrochromic properties according to claim 4, wherein the precursor solution in step 2) is WCl 6 with a mass fraction of 0.169 wt.% , the solvent is ethanol. 7.根据权利要求4所述的具有电致变色性能的W18O49/WO3复合薄膜的制备方法,其特征在于,步骤3)中预设温度为175-185℃,预设时间为9.5-10h。7 . The preparation method of the W 18 O 49 /WO 3 composite film with electrochromic properties according to claim 4 , wherein the preset temperature in step 3) is 175-185° C., and the preset time is 9.5 -10h.
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