CN109166780B - Strip-shaped Hall ion source - Google Patents
Strip-shaped Hall ion source Download PDFInfo
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- CN109166780B CN109166780B CN201811133963.3A CN201811133963A CN109166780B CN 109166780 B CN109166780 B CN 109166780B CN 201811133963 A CN201811133963 A CN 201811133963A CN 109166780 B CN109166780 B CN 109166780B
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- cooling
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- power supply
- strip
- process gas
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/14—Other arc discharge ion sources using an applied magnetic field
- H01J27/143—Hall-effect ion sources with closed electron drift
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Abstract
The invention provides a strip-shaped Hall ion source, which comprises a strip-shaped shell, a hollow cathode arranged at one end of the shell, and a cathode opening of the hollow cathode positioned above an opening at the upper end of the shell; an anode which is arranged in the shell and corresponds to the hollow cathode, and an anode opening which corresponds to the opening at the upper end of the shell is arranged above the anode; a cooling mechanism and a process gas conveying mechanism are arranged at the lower end of the anode; and a plurality of magnets disposed in the housing and positioned at a lower end of the cooling floor. The invention has simple structure and reasonable design, the service life of the cathode is further prolonged, the power is greatly improved by using the hollow cathode tube to realize a filament-free structure, in addition, the coverage area is greatly improved by arranging the ion source in a strip shape, the invention is more suitable for the use of a continuous production line, and the uniform distribution of ion beams is ensured by arranging a plurality of paths of process gas supply pipelines and by accurately supplying gas in each path.
Description
Technical Field
The invention relates to the technical field of ion sources, in particular to a strip Hall ion source.
Background
An ion source is a device that ionizes neutral atoms or molecules and directs a stream of ions therefrom. The Hall ion source ionizes gas filled in a vacuum chamber under the interaction of an electric field and a magnetic field by utilizing emitted electrons in a vacuum environment, and emits ions under the interaction of the electric field and the magnetic field.
The Hall ion source is used as a grid-free ion source, is widely applied to the field of general auxiliary coating due to low maintenance cost, and the anode of the Hall ion source is used for plasmatizing process gas under the cooperation of a strong axial magnetic field, gas ions are separated and form an ion beam by the strong unbalance of the axial magnetic field, electrons are required to be supplemented for the ion beam of the Hall ion source to neutralize ion flow due to the strong action of the axial magnetic field, a tungsten wire is mainly adopted as a cathode of the traditional Hall ion source, but the service life of the tungsten wire is shorter, the service efficiency is low, the tungsten wire needs to be replaced generally about ten hours when the ion beam impact is received, and the environment is polluted to the tungsten wire. In addition, the existing Hall ion sources are mostly round, have limited coverage range, and are not suitable for a streamline production line due to uneven beam current distribution caused by larger gas near the process gas due to only one air inlet.
Disclosure of Invention
Aiming at the defects of the prior art, the invention provides the strip-shaped Hall ion source, which greatly improves the working capacity of the Hall ion source by using the hollow cathode as the neutralizer of the Hall ion source, realizes the strip-shaped distribution of ion beam current by the strip-shaped Hall ion source, further increases the coverage area of ion beams, and is more suitable for the production of flow lines and the production and use of winding products.
The technical scheme of the invention is as follows: a bar-shaped hall ion source comprising:
the upper end and the lower end of the shell are provided with strip-shaped hollow shells with openings, and the shells are made of magnetic conductive materials;
the hollow cathode is fixed at one end of the shell, and a cathode opening of the hollow cathode is positioned above an opening at the upper end of the shell;
an anode which is arranged in the shell and corresponds to the hollow cathode, and an anode opening which corresponds to the opening at the upper end of the shell is arranged above the anode;
a cooling mechanism arranged in the shell and positioned at the lower end of the anode and a process gas conveying mechanism with multiple inputs;
and a plurality of magnets arranged in the shell and positioned at the lower ends of the cooling mechanism and the process gas conveying mechanism.
Further, the hollow cathode comprises a metal shell and a hollow cathode tube arranged in the metal shell, an inert gas conveying pipeline communicated with the hollow cathode tube, inert gas for ionization is conveyed into the hollow cathode tube through the inert gas conveying pipeline, a 1500V direct-current starting power supply, a 2A direct-current maintaining power supply and a 10A direct-current cathode power supply are also connected outside the hollow cathode, the starting power supply, the maintaining power supply and the cathode of the cathode power supply are connected with the hollow cathode tube, the anode of the starting power supply and the anode of the maintaining power supply are connected with the metal shell, and the anode of the cathode power supply is grounded; firstly, a direct current voltage of more than 1500V is provided by a starting power supply for puncturing an inert gas generation current loop at the head of a hollow cathode tube, after puncturing, in order to ensure that the current is always maintained, a stable current output of 2A is provided by a maintaining power supply, meanwhile, the starting power supply is turned off, and then a proper voltage is provided by a 10A direct current cathode power supply, so that the continuous output of the electron current from the cathode tube is realized.
Further, cooling mechanism include cooling bottom plate, a plurality of cooling plates, and cooling water inlet channel and cooling water outlet conduit, cooling bottom plate on be provided with a plurality of cooling plates, a plurality of cooling plate in all be provided with the cooling pipeline, cooling water inlet channel and cooling water outlet conduit be linked together with the cooling pipeline of one of them cooling plate to still be linked together through the connecting pipe between the two adjacent cooling plates, cooling water gets into one of them cooling plate through the cooling water inlet channel, then flows to rather than adjacent cooling plate through the connecting pipe, after flowing through all cooling plates in proper order, the cooling water that absorbs heat gets back to original cooling plate, finally discharges through the cooling water outlet conduit.
Further, the process gas conveying mechanism comprises a gas inlet, and a process gas conveying pipeline a and a process gas conveying pipeline b which are connected with the gas inlet, wherein the process gas conveying pipeline a and the process gas conveying pipeline b transversely extend along the strip-shaped shell, a plurality of process gas splitting pipelines for splitting are further arranged on the process gas conveying pipeline a and the process gas conveying pipeline b, the process gas splitting pipelines are communicated with splitting ports on splitting plates arranged on the cooling plates, and a gas flow controller is correspondingly arranged on each process gas splitting pipeline, so that accurate control of ventilation quantity at different positions is realized through multipath gas flow control, and accurate splitting of process gas is realized, and uniform distribution of ion beam current in space is ensured.
Further, a magnetic field distribution plate is further arranged on the cooling plate.
Further, the bottom end of the shell is also provided with a shell bottom plate, and the magnets are arranged between the shell bottom plate and the cooling bottom plate.
Further, a plurality of fixing columns are arranged between the shell bottom plate and the cooling bottom plate.
Further, the N pole and the S pole of the magnet are respectively used for connecting the negative pole and the positive pole of a magnetic field direct current power supply, the anode is also connected with the positive pole of the 50-300V direct current power supply, hot electrons are generated through ionization of the hollow cathode, when positive potential is applied to the anode, electrons move to the anode under the action of an electric field, and due to the effect of the magnetic field, the electrons move around magnetic lines in a spiral track to collide with atoms of working or reaction gas to ionize the atoms, are accelerated under the effect of a Hall electric field to obtain corresponding energy, form plasma with part of hot electrons emitted by the hollow cathode, and are emitted by a plasma source to react with a substrate to achieve the purposes of cleaning and auxiliary coating.
The beneficial effects of the invention are as follows: the structure is simple, the design is reasonable, the service life of the cathode is further prolonged, the power is greatly improved by using the hollow cathode tube, and the environment is prevented from being polluted by using inert gas.
Drawings
FIG. 1 is a schematic diagram of a first embodiment of the present invention;
FIG. 2 is a schematic diagram of a second embodiment of the present invention;
FIG. 3 is a schematic diagram III of the structure of the present invention;
FIG. 4 is a schematic view of the hollow cathode of the present invention;
FIG. 5 is a frame diagram of a process gas delivery mechanism of the present invention;
in the figure, 1-shell, 2-hollow cathode, 3-anode, 4-shell bottom plate, 5-magnet, 6-cooling bottom plate, 7-cooling plate, 8-cooling water inlet pipeline, 9-cooling water outlet pipeline, 10-air inlet, 11-process gas conveying pipeline a, 12-process gas conveying pipeline b, 13-splitter plate, 14-connecting pipe, 15-fixed column, 16-magnetic field distribution plate, 21-shell, 22-hollow cathode tube and 23-inert gas conveying pipeline.
Detailed Description
The following is a further description of embodiments of the invention, taken in conjunction with the accompanying drawings:
as shown in fig. 1 to 4, a bar-shaped hall ion source includes: the upper end and the lower end are both provided with the hollow shell 1 with the open-ended strip, the shell 1 is made of magnetic conduction materials, so that the magnetic field of the magnet is limited in the range of a prototype, the effect of the magnetic field is improved, and the coverage of the ion beam current is further increased by arranging the ion source into the strip shape, thereby solving the problem that the traditional ion source can only cover a certain round area.
The ion source further comprises a hollow cathode 2 fixed at one end of the shell 1, a cathode opening of the hollow cathode 2 is positioned above an opening at the upper end of the shell 2, wherein the hollow cathode 2 comprises a metal shell 21 and a hollow cathode tube 22 arranged in the shell 21, an inert gas conveying pipeline 23 communicated with the hollow cathode tube 22 is used for conveying inert gas used for ionization into the hollow cathode tube 22 through the inert gas conveying pipeline 23, a 1500V direct current starting power supply, a 2A direct current maintaining power supply and a 10A direct current cathode power supply are further connected to the hollow cathode 2, the starting power supply, the maintaining power supply and the cathode of the cathode power supply are connected with the hollow cathode tube 22, the anode of the starting power supply and the anode of the maintaining power supply are connected with the metal shell 21, a direct current loop is generated by the inert gas with the starting power supply for puncturing the head of the hollow cathode tube 22, after puncturing, in order to ensure that the current is maintained constantly, a 2A stable current output is provided through the maintaining power supply, and then a proper output of electrons from the hollow cathode is realized by switching off the 10A direct current maintaining power supply.
The ion source also comprises an anode 3 which is arranged in the shell 1 and corresponds to the hollow cathode 2, the shell 1 which corresponds to the anode 2 is also arranged in a strip shape and is distributed along the transverse direction of the strip-shaped shell 1, and an anode opening which corresponds to the opening at the upper end of the shell 1 is arranged above the anode 3.
The ion source also comprises a cooling mechanism arranged in the shell 1 and positioned at the lower end of the anode 3 and a process gas conveying mechanism with multiple inputs, wherein the cooling mechanism comprises a cooling bottom plate 6, a plurality of cooling plates 7, a cooling water inlet pipeline 8 and a cooling water outlet pipeline 9, the cooling bottom plate 6 is provided with the cooling plates 7, the cooling plates 7 are internally provided with cooling pipelines, the cooling water inlet pipeline 8 and the cooling water outlet pipeline 9 are communicated with the cooling pipelines of one cooling plate 7, two adjacent cooling plates 7 are communicated through a connecting pipe 14, cooling water enters one cooling plate 7 through the cooling water inlet pipeline 8, then flows to the cooling plate 7 adjacent to the cooling plate through the connecting pipe 14, and after sequentially flowing through all the cooling plates 7, the cooling water absorbing heat returns to the original cooling plate 7 and finally is discharged through the cooling water outlet pipeline 9.
As shown in fig. 5, the process gas delivery mechanism of the ion source comprises an air inlet 10, and a process gas delivery pipeline a11 and a process gas delivery pipeline b12 connected with the air inlet 10, wherein the process gas delivery pipeline a11 and the process gas delivery pipeline b12 transversely extend along the strip-shaped shell 1, a plurality of process gas split pipelines for splitting are further arranged on the process gas delivery pipeline a11 and the process gas delivery pipeline b12, the process gas split pipelines are communicated with split ports on a split plate 13 arranged on the cooling plate 7, and a gas flow controller is correspondingly arranged on each process gas split pipeline, so that the ventilation amount of different positions of the strip-shaped hall ion source is accurately controlled through multi-path gas flow control, and the accurate split of the process gas is ensured, so that the uniform distribution of ion beam in space is ensured.
The ion source also comprises a plurality of magnets 5 which are arranged in the shell 1 and are positioned at the lower end of the cooling bottom plate 6, the bottom end of the shell 1 is also provided with a shell bottom plate 4, the plurality of magnets 5 are arranged between the shell bottom plate 4 and the cooling bottom plate 6, a plurality of fixing columns 15 are also arranged between the shell bottom plate 4 and the cooling bottom plate 6, the cooling plate 7 is also provided with a magnetic field distribution plate 16, the N pole and the S pole of the magnets 5 are respectively connected with the negative pole and the positive pole of the magnetic field direct current power supply, the anode 3 is also connected with the positive pole of the 50-300V direct current power supply, hot electrons are generated through hollow cathode ionization, when positive potential is applied to the anode, electrons move to the anode under the action of an electric field, and due to the action of the magnetic field, the electrons move around the magnetic force lines in a spiral track, collide with atoms of working or reaction gas to ionize, corresponding energy is obtained under the action of a Hall electric field, and the hot electrons emitted by the plasma source and the part of the hollow cathode form hot electrons to be emitted by the plasma source to the substrate to achieve the purposes of cleaning and auxiliary film plating.
The foregoing embodiments and description have been provided merely to illustrate the principles and best modes of carrying out the invention, and various changes and modifications can be made therein without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (8)
1. A strip hall ion source comprising:
the upper end and the lower end are provided with strip-shaped hollow shells with openings;
the hollow cathode is fixed at one end of the shell, and a cathode opening of the hollow cathode is positioned above an opening at the upper end of the shell;
the anode is arranged in the shell and corresponds to the hollow cathode, the strip-shaped shell corresponding to the anode is also arranged in a strip shape, and an anode port corresponding to an opening at the upper end of the shell is arranged above the anode;
a cooling mechanism arranged in the shell and positioned at the lower end of the anode and a process gas conveying mechanism with multiple inputs;
and a plurality of magnets arranged in the shell and positioned at the lower ends of the cooling mechanism and the process gas conveying mechanism; the N pole and the S pole of the magnet are respectively used for connecting the negative pole and the positive pole of the magnetic field direct current power supply;
the hollow cathode comprises a metal shell and a hollow cathode tube arranged in the metal shell, an inert gas conveying pipeline is communicated with the hollow cathode tube, inert gas for ionization is conveyed into the hollow cathode tube through the inert gas conveying pipeline, a 1500V direct-current starting power supply, a 2A direct-current maintaining power supply and a 10A direct-current cathode power supply are also connected outside the hollow cathode, the starting power supply, the maintaining power supply and the cathode of the cathode power supply are connected with the hollow cathode tube, the anode of the starting power supply and the anode of the maintaining power supply are connected with the metal shell, and the anode of the cathode power supply is grounded; firstly, a direct current voltage of more than 1500V is provided by a starting power supply for puncturing an inert gas generation current loop at the head of a hollow cathode tube, after puncturing, in order to ensure that the current is always maintained, a stable current output of 2A is provided by a maintaining power supply, meanwhile, the starting power supply is turned off, and then a proper voltage is provided by a 10A direct current cathode power supply, so that the continuous output of the electron current from the cathode tube is realized.
2. The strip hall ion source of claim 1, wherein: the cooling mechanism comprises a cooling bottom plate, a plurality of cooling plates, a cooling water inlet pipeline and a cooling water outlet pipeline, wherein the cooling bottom plate is provided with the cooling plates, the cooling plates are internally provided with the cooling pipelines, the cooling water inlet pipeline and the cooling water outlet pipeline are communicated with the cooling pipeline of one cooling plate, two adjacent cooling plates are communicated through connecting pipes, cooling water enters one cooling plate through the cooling water inlet pipeline, then flows to the cooling plate adjacent to the cooling plate through the connecting pipes, and after sequentially flowing through all the cooling plates, the cooling water absorbing heat returns to the original cooling plate and is finally discharged through the cooling water outlet pipeline.
3. The strip hall ion source of claim 1, wherein: the process gas conveying mechanism comprises a gas inlet, a first process gas conveying pipeline and a second process gas conveying pipeline which are connected with the gas inlet, wherein the first process gas conveying pipeline and the second process gas conveying pipeline transversely extend along the strip-shaped hollow shell, a plurality of process gas split pipelines used for splitting are further arranged on the first process gas conveying pipeline and the second process gas conveying pipeline, the process gas split pipelines are communicated with split openings on split plates arranged on the cooling plates, and a gas flow controller is correspondingly arranged on each process gas split pipeline.
4. A strip hall ion source as defined in claim 2, wherein: the bottom of the shell is also provided with a shell bottom plate, and the magnets are arranged between the shell bottom plate and the cooling bottom plate.
5. A strip hall ion source as defined in claim 2, wherein: the cooling plate is also provided with a magnetic field distribution plate.
6. The strip hall ion source of claim 1, wherein: the anode is also connected with the positive electrode of a 50-300V direct current power supply.
7. The strip hall ion source of claim 4, wherein: a plurality of fixing columns are further arranged between the shell bottom plate and the cooling bottom plate.
8. The strip hall ion source of claim 4, wherein: the shell is made of magnetic conductive materials.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811133963.3A CN109166780B (en) | 2018-09-27 | 2018-09-27 | Strip-shaped Hall ion source |
| PCT/CN2018/123204 WO2020062656A1 (en) | 2018-09-27 | 2018-12-24 | Strip-shaped hall-effect ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811133963.3A CN109166780B (en) | 2018-09-27 | 2018-09-27 | Strip-shaped Hall ion source |
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| Publication Number | Publication Date |
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| CN109166780A CN109166780A (en) | 2019-01-08 |
| CN109166780B true CN109166780B (en) | 2023-10-24 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201811133963.3A Active CN109166780B (en) | 2018-09-27 | 2018-09-27 | Strip-shaped Hall ion source |
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| CN (1) | CN109166780B (en) |
| WO (1) | WO2020062656A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111081510A (en) * | 2020-03-02 | 2020-04-28 | 成都国泰真空设备有限公司 | Hall ion source device |
| CN112626483A (en) * | 2020-12-17 | 2021-04-09 | 南阳清水科技有限公司 | Two-way parameter setting Hall ion source control system |
| CN113793791B (en) * | 2021-09-15 | 2024-08-09 | 中山市博顿光电科技有限公司 | Ion beam shaping ion source, starting method thereof and vacuum chamber |
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2018
- 2018-09-27 CN CN201811133963.3A patent/CN109166780B/en active Active
- 2018-12-24 WO PCT/CN2018/123204 patent/WO2020062656A1/en active Application Filing
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| CN102308358A (en) * | 2008-12-08 | 2012-01-04 | 通用等离子公司 | Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewith |
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| CN102254775A (en) * | 2011-03-29 | 2011-11-23 | 核工业西南物理研究院 | Magnetic field reinforced type linear ion source |
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| WO2020062656A1 (en) | 2020-04-02 |
| CN109166780A (en) | 2019-01-08 |
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