CN109065493B - A device for assisting the precise alignment of a hard via mask and a sample - Google Patents

Abstract

The utility model belongs to the technical field of film materials, and particularly relates to a device for assisting in accurately aligning a hard through hole mask and a sample. The device of the utility model comprises: sample tray, carrying disc, mask plate adsorption head, displacement regulator, microscope, etc.; the object carrying disc has rotation adjustment freedom, and the object carrying disc rotates to drive the sample tray to rotate, so that the rotation angle of the sample is accurately controlled; the displacement adjusting device has X, Y, Z three-axis rotation and horizontal adjustment degrees of freedom; the position of the through hole hard mask plate can be accurately adjusted through the displacement adjusting device; the whole device has the advantages of simple structure, convenient operation, high alignment precision and strong practicability. The photoetching function is replaced to a certain extent, the influence of photoresist on a sample in the photoetching process is avoided, and the method is very suitable for processing devices made of thin film materials such as organic materials or two-dimensional materials (graphene and the like).

Description

A device for assisting the precise alignment of a hard via mask and a sample

technical field

The invention belongs to the technical field of thin film materials, and in particular relates to a device for assisting precise alignment between a hard through-hole mask and a sample.

Background technique

In the device manufacturing process of organic semiconductors or two-dimensional materials, there are mainly two methods for defining electrode patterns: photolithography exposure patterns (using photomasks) and using through-hole hard masks to define patterns. Among them, photolithographic definition of graphics requires spin-coating photoresist on the substrate. After development, there will inevitably be photoresist residues, resulting in degradation of device performance. For example, it is difficult to form a good metal-semiconductor contact, which affects carrier mobility. etc. In contrast, using a through-hole hard mask plate can directly process the device process (such as metal evaporation, dry etching, etc.) on the exposed part of the through-hole, and does not need to contact any chemical substances during the process, so there is no need to Will cause damage to the film material.

However, in the usual experiment or processing process, there is no good alignment method between the through-hole hard mask and the sample, and rough methods such as manual alignment are often used, and when the through-hole hard mask has higher precision , it is difficult to achieve precise alignment. Existing methods generally use a small alignment device (refer to the utility model CN104064505A) to align and fix the sample with the through-hole hard mask, and then perform subsequent processing (evaporation or etching, etc.). Alignment can easily be damaged during manipulation. There is also a remote alignment device directly installed inside the processing equipment (vapor deposition machine or etching machine, etc.), but the cost is very expensive.

Contents of the invention

The purpose of the present invention is to provide a device with high alignment accuracy and low equipment cost for assisting the precise alignment of hard through-hole masks and samples.

The device provided by the present invention to assist in the precise alignment of the hard through-hole mask and the sample has multiple degrees of freedom (including the rotation and horizontal adjustment degrees of freedom of the X, Y, and Z axes). After the mask is aligned, it is separated from the alignment platform. Therefore, the next step of processing can be carried out conveniently. This device can realize the precise alignment of the sample and the hard mask plate, replace the function of photolithography to a certain extent, and avoid the problem that the photoresist will affect the sample during the photolithography process.

The device for assisting the precise alignment of hard through-hole masks and samples provided by the present invention has a structure as shown in Figure 1, including: a sample tray 1, a loading disk 3, a loading disk fixture 2, and a mask Adsorption head 5, displacement adjustment device 6, microscope 7; among them, the sample tray 1 is used to load the sample; the sample tray 1 is coaxially fixed on the loading disc 3 through the loading disc clamp 2; the sample is fixed on the sample tray 1 ; The loading disk 3 has a degree of freedom of rotation and adjustment, and the rotation of the loading disk 3 drives the rotation of the sample tray 1, thereby precisely controlling the rotation angle of the sample; the displacement adjustment device 6 has the rotation and horizontal adjustment degrees of freedom of the X, Y, and Z axes ; The displacement adjusting device 6 has an extension arm, the mask plate adsorption head 5 is fixed on the extension arm, the through-hole hard mask plate 4 is placed on the mask plate adsorption head 5 bottom, and the mask plate adsorption head 5 bottom is provided with a small hole, which can absorb the through-hole hard mask 4 under the action of external pump suction; through the displacement adjustment device 6, the position of the through-hole hard mask 4 can be precisely adjusted; the loading disc 3 and the displacement adjustment device 6 are fixed on the same horizontal board.

In the present invention, there are two ways to adsorb the through-hole hard mask plate:

Method 1: There is a small hole at the bottom of the through-hole hard mask plate adsorption head 5 that can be connected to an external air pump. The stencil 4 can be separated from the adsorption head 5;

Method 2: Use electromagnet to absorb (the corresponding position of the mask plate needs to be attached with an iron sheet), and the adsorption or not can be controlled by the switch of the current.

In addition, an elastic clamp 8 is provided on the sample tray 1 , and a magnetic sheet 9 may be attached to fix the aligned sample and the through-hole hard mask 4 .

The alignment operation is carried out with the help of the microscope 7, and the morphology of the sample on the sample tray 1 (or the alignment mark patterned on the sample in advance) is observed through the hollow area of the through-hole hard mask plate 4. By adjusting The threaded rod corresponding to the displacement adjustment device 6 drives the mask plate suction head 5 connected thereto. First, the horizontal degree of freedom is used to adjust the through-hole hard mask 4 to keep parallel to the sample surface, and then the through-hole hard mask 4 is aligned with relative displacement in the X and Y directions, and finally the adjustment in the Z direction will The through-hole hard mask is tightly attached to the sample. The alignment operation is thus completed.

After the alignment is completed, fix the sample with the through-hole hard mask. There are two ways to fix it:

Method 1: Using the elastic clamp 8 fixed on the sample tray 1 to fix the through-hole hard mask 4;

Method 2: Using the magnetic sheet 9 to fix the through-hole hard mask plate 4 through the magnetic attraction generated by the iron sample tray.

The specific operation is as follows: Slowly approach the elastic clamp 8 connected to the loading tray, or use the magnetic sheet 9, to the surface of the through-hole hard mask board 4 that has been aligned, and slowly lower it and fix it on the through-hole hard mask board. 4 surface, so that the through-hole hard mask plate 4 remains in close contact with the sample. Then turn off the pump to release the adsorption between the through-hole hard mask suction head 5 and the through-hole hard mask 4 , and slowly lift the mask suction head 5 through the Z-axis threaded rod of the displacement adjustment device 6 . Release the clamp 2 to separate the sample tray 1 from the loading disk 3 . At this point, the alignment operation and fixation between the through-hole hard mask board 4 and the sample are completed on the sample tray 1 , and they are separated from the alignment device without destroying the alignment relationship.

In the present invention, the through-hole hard mask plate is usually made of stainless steel or silicon wafer (refer to the invention patent CN105261588A), and the required pattern is obtained by patterning and etching. It has a certain degree of flatness and mechanical strength, which meets the operating requirements of this system.

The high-precision through-hole hard mask is used to define graphics, and the graphics can be defined at any position on the film material without damage to the film material; it can be repeatedly aligned, and the through-hole hard mask can also be reused.

The whole device of the invention has simple structure, convenient operation, high alignment precision and strong practicability. This device can realize the precise alignment of the sample and the hard mask plate, replace the function of photolithography to a certain extent, avoid the influence of photoresist on the sample during the photolithography process, and is very suitable for organic materials or two-dimensional materials (graphite Graphene, etc.) and other thin-film material device processing.

Description of drawings

Fig. 1 is an overall structure diagram of the precise overlay alignment platform for the auxiliary hard mask.

Numbers in the figure: 1 is the sample tray, 2 is the loading disc fixture, 3 is the loading disc, 4 is the through-hole hard mask plate, 5 is the mask plate adsorption head, 6 is the displacement adjustment device, 7 is the microscope , 8 is the elastic clamp for fixing the mask plate, and 9 is the magnetic sheet.

Detailed ways

A specific embodiment is given below to further describe the present invention.

The sample tray 1 is an iron disc with a diameter of 100 mm; the loading disc fixture 2 is a pair of copper elastic sheets fixed to the base with screws; the loading disc 3 is 150 mm in diameter and 3 mm thick, with a rotating function, and the material is Aluminum; silicon-based high-precision through-hole hard mask plate 4 (refer to invention patent CN105261588A); mask plate adsorption piece 5 is a plastic square with a small hole at the bottom, and the other end of the small hole at the bottom is connected to an external pump; displacement adjustment Device 6 is a mechanical device that can be composed of three threaded rods X, Y, and Z and three horizontal adjustment knobs, which can be finely adjusted to cause displacement of the mask plate suction head connected to it; microscope 7 is a common long-focus microscope; elastic The clamp 8, a rectangular sheet made of a magnetic sheet 9, can be designed as a frame shape, and the center of one end near the mask plate 4 is hollowed out to expose the alignment area of the mask plate while fixing the mask plate.

Claims (3)

1. A device for assisting the precise alignment of a hard through-hole mask and a sample, characterized in that it includes: a sample tray (1), a loading disc (3), a loading disc clamp (2), a mask The stencil adsorption head (5), the displacement adjustment device (6), and the microscope (7); among them, the sample tray (1) is used to load the sample; the sample tray (1) is coaxially fixed on the on the loading disk (3); the sample is fixed on the sample tray (1); the loading disk (3) has a degree of freedom to rotate and adjust, and the rotation of the loading disk (3) drives the rotation of the sample tray (1), thereby precisely Control the rotation angle of the sample; the displacement adjustment device (6) has three-axis rotation and horizontal adjustment degrees of freedom of X, Y, Z; the displacement adjustment device (6) has an extension arm, and the mask plate adsorption head (5) is fixed on the extension arm On the arm, the through-hole hard mask (4) is placed at the bottom of the mask suction head (5). There is a small hole at the bottom of the mask suction head (5), which can be sucked under the action of the external pump. Through-hole hard mask (4); through the displacement adjustment device (6), the position of the through-hole hard mask (4) can be precisely adjusted; the loading disc (3) and the displacement adjustment device (6) are fixed on the same horizontal plate; There are two methods of adsorption of through-hole hard mask: Method 1: There is a small hole at the bottom of the through-hole hard mask plate adsorption head (5) that can be connected to an external air pump. When the external pump pumps air, the through-hole hard mask plate (4) can be adsorbed, and the air pump is turned off. The through-hole hard mask plate (4) can be separated from the adsorption head (5); Method 2: Electromagnet is used for adsorption, and an iron sheet needs to be attached to the corresponding position of the through-hole hard mask (4), and the adsorption or not is controlled by the current switch; The sample tray (1) is also provided with an elastic clamp (8), and a magnetic sheet (9) is attached to fix the aligned sample and the through-hole hard mask (4). 2. The device according to claim 1, characterized in that the alignment operation is carried out with the help of a microscope (7), and the sample tray (1) is observed through the hollowed out area of the through-hole hard mask (4) The shape of the sample is adjusted by adjusting the threaded rod corresponding to the displacement adjustment device (6) to drive the mask plate adsorption head (5) connected to it; firstly, the through-hole hard mask plate (4) and the sample The surface is kept parallel, and then the through-hole hard mask (4) is aligned with the relative displacement in the X and Y directions, and finally the through-hole hard mask is closely attached to the sample through the adjustment in the Z direction, thereby completing the alignment. ready to operate. 3. The device according to claim 2, wherein after the alignment is completed, there are two ways to fix the sample and the through-hole hard mask: Method 1: Use the elastic clamp (8) fixed on the sample tray (1) to fix the through-hole hard mask plate (4); Method 2: Using the magnetic sheet (9) to fix the through-hole hard mask plate (4) through the magnetic attraction generated by the iron sample tray.