CN109031799B - Display panel and manufacturing method thereof - Google Patents
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- CN109031799B CN109031799B CN201811125603.9A CN201811125603A CN109031799B CN 109031799 B CN109031799 B CN 109031799B CN 201811125603 A CN201811125603 A CN 201811125603A CN 109031799 B CN109031799 B CN 109031799B
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 72
- 230000003287 optical effect Effects 0.000 claims abstract description 14
- 229920002120 photoresistant polymer Polymers 0.000 claims description 120
- 239000000758 substrate Substances 0.000 claims description 30
- 238000005286 illumination Methods 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 21
- 230000001678 irradiating effect Effects 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 7
- 230000006750 UV protection Effects 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 36
- 239000010408 film Substances 0.000 description 15
- 230000008569 process Effects 0.000 description 8
- 239000011159 matrix material Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 239000004974 Thermotropic liquid crystal Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- 239000004990 Smectic liquid crystal Substances 0.000 description 1
- 230000003098 cholesteric effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000029264 phototaxis Effects 0.000 description 1
- 230000004224 protection Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- Optics & Photonics (AREA)
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention provides a display panel and a manufacturing method thereof. The manufacturing method comprises the following steps: providing a light alignment machine, and placing the display panel injected with the liquid crystal on the light alignment machine; and in a preset time, carrying out optical alignment on the display panel by using the optical alignment machine so as to enable the pretilt angle of the liquid crystal in the display panel to reach a target pretilt angle. In the invention, the liquid crystal is subjected to optical alignment within the preset time, so that the pretilt angle of the liquid crystal can reach the target pretilt angle, and the stability of the light resistor is not greatly reduced, thereby ensuring the yield of the display panel.
Description
Technical Field
The invention relates to the field of liquid crystal display, in particular to a display panel and a manufacturing method thereof.
Background
Liquid Crystal Displays (LCDs) have many advantages such as thin body, power saving, and no radiation, and are widely used, such as Liquid Crystal televisions, mobile phones, personal digital assistants, digital cameras, computer screens, or notebook computer screens.
The liquid crystal display comprises a shell, a liquid crystal panel arranged in the shell and a backlight module arranged in the shell. Generally, a Liquid Crystal panel is composed of a Thin Film Transistor Array Substrate (TFT Array Substrate), a Color Filter Substrate (Color Filter, CF), and a Liquid Crystal Layer (Liquid Crystal Layer) filled between the two substrates, and the Liquid Crystal panel operates by applying a driving voltage to the CF Substrate and the TFT Substrate to control the rotation of Liquid Crystal molecules of the Liquid Crystal Layer, control the output of light, and refract the light of a backlight module to generate a picture.
In the manufacturing process of the liquid crystal display panel, the liquid crystal molecules need to be arranged according to a specific direction and angle through an alignment process. Currently, in the production of TFT-LCD, there are two alignment methods: rubbing alignment and photo alignment. Rubbing alignment is a physical process that can generate static electricity and particle contamination. The photo-alignment is a non-contact alignment technology, and a photo-alignment microstructure with a certain inclination angle is formed on the surface of an alignment film by irradiating linearly polarized light on a photo-sensitive high molecular polymer alignment film through a photomask to achieve an alignment effect.
The existing photo-alignment process is as follows: the method comprises the steps of doping a certain proportion of high-purity reactive liquid crystal (phototaxis monomer) in a liquid crystal layer, applying an alignment voltage between a CF substrate and a TFT substrate to promote liquid crystal molecules to generate a pre-tilt angle, enabling the liquid crystal molecules to have different tilt directions corresponding to different domains of a pixel, and then irradiating the reactive liquid crystal from one side of the TFT substrate by Ultraviolet (UV) light within a specific wavelength range to enable the reactive liquid crystal to be polymerized into a polymer network to attract the liquid crystal molecules on the surface layer to form a fixed pre-tilt angle. However, during the photo-alignment process, the UV light may react with the photoresist of the color film layer on the CF substrate, so that the stability of the photoresist is deteriorated, which causes bubbles (bubbles) or bright spots (mura) to be generated on the subsequent panel, and the yield of the display panel is low.
Disclosure of Invention
Accordingly, it is desirable to provide a display panel and a method for fabricating the same, which can solve the problem of the reduction of the stability of the photoresist due to the UV light irradiation during the photo-alignment process, thereby affecting the yield of the panel.
The embodiment of the invention provides a manufacturing method of a display panel, which comprises the following steps:
providing a light alignment machine, and placing the display panel injected with the liquid crystal on the light alignment machine;
and in a preset time, carrying out optical alignment on the display panel by using the optical alignment machine so as to enable the pretilt angle of the liquid crystal in the display panel to reach a target pretilt angle.
In some embodiments of the present invention, the predetermined time is 100-200 minutes.
In some embodiments provided herein, the manufacturing method further comprises:
and before the display panel is subjected to photo-alignment, determining the preset time, wherein the preset time is the intersection of the ultraviolet tolerance time of a light resistance layer of the display panel and the time required for liquid crystal alignment.
In some embodiments provided herein, the manufacturing method further comprises:
respectively determining a first tolerance time corresponding to a red photoresist in the photoresist layer, a second tolerance time corresponding to a green photoresist in the photoresist layer and a third tolerance time corresponding to a blue photoresist in the photoresist layer;
and determining the ultraviolet tolerance time of the photoresist layer according to the first tolerance time, the second tolerance time and the third tolerance time.
In some embodiments, the determining a first endurance time corresponding to a red photoresist in the photoresist layer includes:
forming red light resistances in a plurality of groups of light resistance layers;
irradiating the multiple groups of red light resistors under preset ultraviolet illumination intensity, and standing the irradiated multiple groups of red light resistors for 120 hours at the temperature of 110 ℃, wherein the illumination time of each group of red light resistors is different;
and detecting the characteristics of the red light resistances of the multiple groups of red light resistances under different illumination time conditions, and determining the first tolerance time of the red light resistances.
In some embodiments, the determining a second endurance time corresponding to a green photoresist in the photoresist layer includes:
forming green light resistances in a plurality of groups of light resistance layers;
irradiating the multiple groups of green light resistors under preset ultraviolet illumination intensity, and standing the irradiated multiple groups of green light resistors for 120 hours at the temperature of 110 ℃, wherein the illumination time of each group of green light resistors is different;
and detecting the characteristics of the green light resistances of the multiple groups of green light resistances under different illumination time conditions, and determining the second tolerance time of the green light resistances.
In some embodiments, the determining a third tolerant time corresponding to the blue photoresist in the photoresist layer includes:
forming blue light resistances in a plurality of groups of light resistance layers;
irradiating the multiple groups of blue light resistors under preset ultraviolet illumination intensity, and standing the irradiated multiple groups of blue light resistors for 120 hours at the temperature of 110 ℃, wherein the illumination time of each group of blue light resistors is different;
and detecting the characteristics of the multiple groups of blue light resistors under different illumination time conditions, and determining the third tolerance time of the blue light resistors.
In some embodiments provided herein, the manufacturing method further comprises:
before photo-aligning the display panel, determining a time required for photo-aligning the liquid crystal so that a pre-tilt angle of the liquid crystal reaches a target pre-tilt angle according to a material of the injected liquid crystal.
In some embodiments provided herein, the manufacturing method further comprises:
carrying out box alignment on the array substrate of the display panel and the color film substrate matched with the array substrate;
and injecting liquid crystal into the display panel after the cell is aligned to form a liquid crystal layer.
Based on the same inventive concept, the embodiment of the invention also provides a display panel, and the display panel is manufactured by adopting the method.
In summary, the present invention provides a display panel and a method for fabricating the same. The manufacturing method comprises the following steps: providing a light alignment machine, and placing the display panel injected with the liquid crystal on the light alignment machine; and in a preset time, carrying out optical alignment on the display panel by using the optical alignment machine so as to enable the pretilt angle of the liquid crystal in the display panel to reach a target pretilt angle. In the invention, the liquid crystal is subjected to optical alignment within the preset time, so that the pretilt angle of the liquid crystal can reach the target pretilt angle, and the stability of the light resistor is not greatly reduced, thereby ensuring the yield of the display panel.
Drawings
Fig. 1 is a schematic flow chart illustrating a method for manufacturing a display panel according to an embodiment of the present invention;
FIG. 2 is a schematic view of the process for performing photo-alignment of liquid crystals;
fig. 3 is a schematic structural diagram of a display panel according to an embodiment of the present invention;
fig. 4 is a schematic flow chart illustrating a manufacturing method of another display panel according to an embodiment of the present invention.
The reference numbers illustrate:
10 display panel
100 array substrate
200 color film substrate
210 substrate base plate
220 black matrix
230 photoresist layer
231 Red Photoresist
232 green photoresist
233 blue photoresist
240 isolating column
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein, but rather should be construed as broadly as the present invention is capable of modification in various respects, all without departing from the spirit and scope of the present invention.
Referring to fig. 1 and fig. 2 together, an embodiment of the invention provides a manufacturing method of a display panel 10, where the manufacturing method includes:
step S110, providing an optical alignment platform, and placing the display panel 10 with the injected liquid crystal on the optical alignment platform;
step S120, performing photo-alignment on the display panel 10 by using the photo-alignment machine within a preset time, so that a pre-tilt angle of liquid crystals in the display panel 10 reaches a target pre-tilt angle.
In some embodiments of the present invention, the predetermined time is 100-200 minutes.
It can be understood that, referring to fig. 3, a typical lcd panel is composed of a tft array substrate 100, a color filter substrate 200 and a liquid crystal layer 300 filled between the two substrates. The CF substrate 200 includes a substrate 210, a black matrix 220, a color film layer 230, and an isolation pillar 240. The color film 230 includes a Red (R) photoresist 231, a Green (G) photoresist 232, and a Blue (B) photoresist 233. In the photo-alignment process, after the UV light is irradiated for a period of time, the R photoresist 231, the G photoresist 232, and the B photoresist 233 are deformed, and the surface roughness is also changed, so that the stability of the R photoresist 231, the G photoresist 232, and the B photoresist 233 is deteriorated, and the yield of the liquid crystal display panel is reduced. In the invention, the liquid crystal is aligned within the preset time, so that the pre-tilt angle of the liquid crystal can reach the target pre-tilt angle, the stability changes of the R photoresist 231, the G photoresist 232 and the B photoresist 233 are all not obvious, and the yield of the display panel 10 is not greatly influenced, thereby ensuring the quality of the display panel 10.
Referring to fig. 4, in some embodiments of the present invention, the manufacturing method further includes:
step S100, before performing photo-alignment on the display panel 10, determining the preset time, where the preset time is an intersection of the UV tolerant time of the photoresist layer of the display panel 10 and the time required for photo-alignment of the liquid crystal.
It is understood that, in the present invention, the stability of the R photoresist 231, the G photoresist 232, and the B photoresist 233 does not change significantly within the UV-resistant time of the photoresist layer, that is, the characteristic of the R photoresist 231, the G photoresist 232, and the B photoresist 233 does not change significantly. And irradiating the liquid crystal by using the UV light within the time required for the alignment of the liquid crystal, so that the inclination angle of the liquid crystal reaches a target inclination angle. Based on this, the intersection of the two time periods is calculated, and the preset time is obtained. Therefore, in the preset time, the pre-tilt angle of the liquid crystal can reach the target pre-tilt angle, and the characteristics of the R photoresist 231, the G photoresist 232, and the B photoresist 233 are not significantly changed.
In some embodiments provided herein, the manufacturing method further comprises:
respectively determining a first tolerance time corresponding to an R photoresist 231 in the photoresist layer, a second tolerance time corresponding to a G photoresist 232 in the photoresist layer and a third tolerance time corresponding to a B photoresist 233 in the photoresist layer;
and determining the UV tolerance time of the light resistance layer according to the first tolerance time, the second tolerance time and the third tolerance time.
In some embodiments, the determining the first endurance time corresponding to the R photoresist 231 in the photoresist layer includes:
forming R photoresist 231 in multiple groups of the photoresist layers;
irradiating the multiple groups of R photoresist 231 under preset UV illumination intensity, and standing the irradiated multiple groups of R photoresist 231 for 120 hours at the temperature of 110 ℃, wherein the illumination time of each group of R photoresist 231 is different;
the characteristics of the R photoresists 231 of the plurality of groups 231 under different illumination time conditions are detected, and the first tolerance time of the R photoresists 231 is determined.
TABLE 1
Referring to table 1, in the embodiment, a layer of R photoresist 231 is coated on a substrate to form a photoresist layer, and then the R photoresist 231 is formed after exposure, development and baking at 230 ℃ for 24 minutes. After cooling, the film thickness, the chromaticity, and the roughness of the R photoresist 231 in each direction were measured and recorded. The R photoresist 231 is repeatedly fabricated to form a plurality of groups of the R photoresist 231. Next, the multiple groups of R photo resists 231 are irradiated under a preset UV light intensity, wherein the light irradiation time of each group of R photo resists 231 is different. After the irradiation of the UV light, the multiple groups of R photoresist 231 are left standing for 120 hours in an environment of 110 ℃ to develop the defective spots in the R photoresist 231 as soon as possible. Then, the characteristic values of the plurality of sets of the R resists 231, that is, the film thickness, the surface roughness, and the like of the R resists 231 in each direction are measured. Finally, according to the characteristic values of the plurality of groups of R photo-resists 231, a first tolerance time corresponding to the R photo-resists 231 is determined.
In some embodiments of the present invention, the determining the second endurance time corresponding to the G photoresist 232 in the photoresist layer includes:
forming G photoresist 232 in multiple groups of the photoresist layers;
irradiating the multiple groups of G photoresist 232 under preset UV illumination intensity, and standing the irradiated multiple groups of G photoresist 232 for 120 hours at the temperature of 110 ℃, wherein the illumination time of each group of G photoresist 232 is different;
and detecting the characteristics of the multiple groups of G photoresist 232 under different illumination time conditions, and determining the second tolerance time of the G photoresist 232.
TABLE 2
Referring to table 2, in the embodiment, a layer of G photoresist 232 is first coated on a substrate to form a photoresist layer, and then the G photoresist 232 is formed after exposure, development and baking at 230 ℃ for 24 minutes. After cooling, the film thickness, the chromaticity, the roughness, and the like of the G photoresist 232 in each direction are measured and recorded. And repeatedly manufacturing the G photoresist 232 to form a plurality of groups of G photoresist 232, and recording the film thickness, the chromaticity and the roughness of each group of G photoresist 232 in each direction. Secondly, the multiple groups of G photoresist 232 are irradiated under a preset UV light intensity, wherein the light irradiation time of each group of G photoresist 232 is different. After UV irradiation, standing the multiple groups of G photoresist 232 for 120 hours in an environment of 110 ℃ so as to enable bad points in the G photoresist 232 to be displayed as soon as possible. Then, the characteristic values of the plurality of groups of G resists 232, that is, the arithmetic average Ra of the film thickness and the roughness and the root mean square Rq of the roughness in each direction of the G resists 232 are measured. Finally, according to the characteristic values of the multiple groups of G photo resistors 232, a second endurance time corresponding to the G photo resistors 232 is determined.
In some embodiments of the present invention, the determining the third endurance time corresponding to the photoresist 233 in the photoresist layer includes:
forming a B photoresist 233 in a plurality of groups of the photoresist layers;
irradiating the multiple groups of B photoresists 233 under preset UV illumination intensity, and standing the irradiated multiple groups of B photoresists 233 at 110 ℃ for 120h, wherein the illumination time of each group of B photoresists 233 is different;
and detecting the characteristics of the plurality of groups of the B photoresist 233 under different illumination time conditions, and determining the third tolerance time of the B photoresist 233.
TABLE 3
Referring to table 3, in the present embodiment, a layer of B photoresist 233 material is first coated on a substrate to form the B photoresist 233. And repeatedly manufacturing the B photoresist 233 to form a plurality of groups of the B photoresist 233, cooling, measuring the film thickness, the chromaticity and the roughness of the B photoresist 233 in each direction, and recording. Next, the plurality of groups of B resists 233 are irradiated under a predetermined UV light intensity, wherein the light irradiation time of each group of B resists 233 is different. After UV irradiation, the multiple groups of the B photoresist 233 are kept stand for 120 hours in an environment of 110 ℃ so as to enable bad spots in the G photoresist 232 to be displayed as soon as possible. Then, the characteristic values of the plurality of sets of the B resists 233, that is, the film thickness, the arithmetic average Ra of the roughness, and the root mean square Rq of the roughness in each direction of the G resist 232 are measured. Finally, according to the characteristic values of the plurality of groups of B photoresist 233, a third endurance time corresponding to the B photoresist 233 is determined.
In some embodiments provided herein, the manufacturing method further comprises:
before the photo-alignment of the display panel 10, a time required for the liquid crystal to be aligned so that the pre-tilt angle of the liquid crystal reaches a target pre-tilt angle is determined according to the material of the injected liquid crystal.
It will be appreciated that the liquid crystal materials currently used for displays are essentially thermotropic liquid crystals. Among the thermotropic liquid crystals, they are further classified into three major classes, SMECTIC phase (smetic), NEMATIC phase (nemtic) and CHOLESTERIC phase (cholseteric), according to the arrangement structure of the liquid crystal molecules. In the liquid crystal display mode, common nematic phase displays include a TN (twisted nematic) mode, an HTN (high twisted nematic) mode, an STN (super twisted nematic) mode, a TFT (thin film transistor) mode, and the like. Therefore, when the injected liquid crystal material is different and the photo-alignment is performed by the UV light of the same intensity, the time required for the tilt angle of the liquid crystal to reach the target tilt angle may be different. Therefore, before photo-alignment is performed, the liquid crystal material to be used and the time required for the tilt angle of the liquid crystal to reach the target tilt angle should also be determined, so that the preset time is determined according to the required time and the UV resistance time of the photoresist layer.
In some embodiments provided herein, the manufacturing method further comprises:
carrying out box alignment on the array substrate of the display panel 10 and the color film substrate matched with the array substrate;
the liquid crystal is injected into the display panel 10 after the cell is aligned, thereby forming a liquid crystal layer.
It should be noted that UV light may also affect the stability of the black matrix 220 and the isolation pillars 240, and therefore, the tolerance time corresponding to each of the black matrix 220 and the isolation pillars 240 may also be determined by the method for determining the first tolerance time, the second tolerance time, or the third tolerance time in the present invention. In the photo-alignment process, the respective corresponding tolerance times of the black matrix 220 and the spacers 240 are taken into consideration, so as to further improve the yield of the display panel 10.
Based on the same inventive concept, the invention further provides a display panel 10, and the display panel 10 is manufactured by the manufacturing method provided by the invention.
In summary, the present invention provides a display panel 10 and a method for fabricating the same. The manufacturing method comprises the following steps: providing a photo-alignment platform, and placing the display panel 10 with the injected liquid crystal on the photo-alignment platform; and performing optical alignment on the display panel 10 by using the optical alignment machine within a preset time, so that the pretilt angle of the liquid crystal in the display panel 10 reaches a target pretilt angle. In the invention, the liquid crystal is optically aligned within the preset time, so that the pretilt angle of the liquid crystal can reach the target pretilt angle, and the stability of the light resistor is not greatly reduced, thereby ensuring the yield of the display panel 10.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (9)
1. A method for manufacturing a display panel is characterized by comprising the following steps:
determining preset time, wherein the preset time is the intersection of the ultraviolet tolerance time of a light resistance layer of the display panel and the time required for liquid crystal alignment in the display panel;
providing a light alignment machine, and placing the display panel injected with the liquid crystal on the light alignment machine;
and in the preset time, carrying out optical alignment on the display panel by using the optical alignment machine so as to enable the pretilt angle of the liquid crystal in the display panel to reach a target pretilt angle.
2. The method as claimed in claim 1, wherein the predetermined time is 100-200 minutes.
3. The method of manufacturing of claim 1, further comprising:
respectively determining a first tolerance time corresponding to a red photoresist in the photoresist layer, a second tolerance time corresponding to a green photoresist in the photoresist layer and a third tolerance time corresponding to a blue photoresist in the photoresist layer;
and determining the ultraviolet tolerance time of the photoresist layer according to the first tolerance time, the second tolerance time and the third tolerance time.
4. The method of claim 3, wherein determining the first endurance time for the red photoresist in the photoresist layer comprises:
forming red light resistances in a plurality of groups of light resistance layers;
irradiating the multiple groups of red light resistors under preset ultraviolet illumination intensity, and standing the irradiated multiple groups of red light resistors for 120 hours at the temperature of 110 ℃, wherein the illumination time of each group of red light resistors is different;
and detecting the characteristics of the red light resistances of the multiple groups of red light resistances under different illumination time conditions, and determining the first tolerance time of the red light resistances.
5. The method of claim 3, wherein determining the second endurance time for the green photoresist in the photoresist layer comprises:
forming green light resistances in a plurality of groups of light resistance layers;
irradiating the multiple groups of green light resistors under preset ultraviolet illumination intensity, and standing the irradiated multiple groups of green light resistors for 120 hours at the temperature of 110 ℃, wherein the illumination time of each group of green light resistors is different;
and detecting the characteristics of the green light resistances of the multiple groups of green light resistances under different illumination time conditions, and determining the second tolerance time of the green light resistances.
6. The method of claim 3, wherein determining a third endurance time for a blue photoresist in the photoresist layer comprises:
forming blue light resistances in a plurality of groups of light resistance layers;
irradiating the multiple groups of blue light resistors under preset ultraviolet illumination intensity, and standing the irradiated multiple groups of blue light resistors for 120 hours at the temperature of 110 ℃, wherein the illumination time of each group of blue light resistors is different;
and detecting the characteristics of the multiple groups of blue light resistors under different illumination time conditions, and determining the third tolerance time of the blue light resistors.
7. The method of manufacturing of claim 1, further comprising:
before photo-aligning the display panel, determining a time required for photo-aligning the liquid crystal so that a pre-tilt angle of the liquid crystal reaches a target pre-tilt angle according to a material of the injected liquid crystal.
8. The method of manufacturing of claim 1, further comprising:
carrying out box alignment on the array substrate of the display panel and the color film substrate matched with the array substrate;
and injecting liquid crystal into the display panel after the cell is aligned to form a liquid crystal layer.
9. A display panel manufactured by the manufacturing method according to any one of claims 1 to 8.
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| CN201811125603.9A CN109031799B (en) | 2018-09-26 | 2018-09-26 | Display panel and manufacturing method thereof |
| PCT/CN2018/114642 WO2020062465A1 (en) | 2018-09-26 | 2018-11-08 | Display panel and manufacturing method thereof |
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| TWI395012B (en) * | 2008-09-03 | 2013-05-01 | Au Optronics Corp | Liquid crystal display panel and method for manufacturing the same |
| JP5763769B2 (en) * | 2011-08-12 | 2015-08-12 | シャープ株式会社 | Liquid crystal display |
| CN203786440U (en) * | 2013-06-28 | 2014-08-20 | 上海中航光电子有限公司 | Mask plate |
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| CN106405942A (en) * | 2016-12-06 | 2017-02-15 | 深圳市华星光电技术有限公司 | Optical alignment method of liquid crystal display panel |
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