CN108962730A - A kind of preparation method of infrared optical window - Google Patents
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- 230000003287 optical effect Effects 0.000 title claims abstract description 41
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 239000010408 film Substances 0.000 claims abstract description 56
- 239000012788 optical film Substances 0.000 claims abstract description 50
- 239000000758 substrate Substances 0.000 claims abstract description 43
- 238000000034 method Methods 0.000 claims abstract description 25
- 239000011248 coating agent Substances 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 24
- 229910052751 metal Inorganic materials 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims abstract description 20
- 238000004140 cleaning Methods 0.000 claims abstract description 4
- 230000000873 masking effect Effects 0.000 claims abstract 2
- 230000001681 protective effect Effects 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 11
- 230000007547 defect Effects 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 229910009520 YbF3 Inorganic materials 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims 1
- 238000003331 infrared imaging Methods 0.000 abstract description 5
- 238000000206 photolithography Methods 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000001931 thermography Methods 0.000 description 1
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- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
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- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
Description
技术领域technical field
本发明涉及红外成像技术领域，特别涉及一种红外光学窗口的制备方法。The invention relates to the technical field of infrared imaging, in particular to a preparation method of an infrared optical window.
背景技术Background technique
红外光学窗口是非制冷红外焦平面探测器系统中不可缺少的部件，主要应用于热成像领域，其要求是红外透过率的同时，滤掉某些杂散光，以达到成像效果清晰。The infrared optical window is an indispensable part of the uncooled infrared focal plane detector system. It is mainly used in the field of thermal imaging. Its requirement is to filter out some stray light at the same time as the infrared transmittance, so as to achieve a clear imaging effect.
在某些应用领域对于红外成像的要求越来越高；并且因为大部分时间在野外工作，因此环境中的雨滴、砂粒等颗粒会对窗口表面膜层产生比较大的冲击，其表面需要镀制保护膜以提高其抗雨蚀、砂蚀的能力。In some application fields, the requirements for infrared imaging are getting higher and higher; and because most of the time is spent in the field, particles such as raindrops and sand in the environment will have a relatively large impact on the film layer on the surface of the window, and the surface needs to be plated. Protective film to improve its ability to resist rain erosion and sand erosion.
发明内容Contents of the invention
本发明的目的在于提供一种红外光学窗口的制备方法，在提高红外成像质量的同时，解决了现有窗口的抗磨损能力不足及在恶劣环境下的耐受性差的问题。The purpose of the present invention is to provide a method for preparing an infrared optical window, which solves the problems of insufficient wear resistance and poor tolerance in harsh environments of existing windows while improving the quality of infrared imaging.
为解决上述技术问题，本发明提供一种红外光学窗口的制备方法，包括如下步骤：In order to solve the above technical problems, the present invention provides a method for preparing an infrared optical window, comprising the following steps:
步骤1、清洗基片并甩干；Step 1, cleaning the substrate and drying it;
步骤2、通过光学镀膜机在基片的底部镀制光学膜；Step 2, coating an optical film on the bottom of the substrate by an optical coating machine;
步骤3、在底部光学膜的表面镀制一层保护膜；Step 3, coating a protective film on the surface of the bottom optical film;
步骤4、采用硬掩膜方法在所述基片顶部做出镀膜区域，镀制光学膜；Step 4, using a hard mask method to form a coating area on the top of the substrate, and coating an optical film;
步骤5、采用光刻制作出镀制金属膜的环形区域，镀制金属膜。Step 5, using photolithography to form a ring-shaped area for coating the metal film, and coating the metal film.
可选的，所述步骤3中采用PECVD方法镀制保护膜。Optionally, in the step 3, the protective film is plated by PECVD method.
可选的，所述基片为双面抛光基片，其材质包括锗、硅、硒化锌或石英玻璃。Optionally, the substrate is a double-sided polished substrate, and its material includes germanium, silicon, zinc selenide or quartz glass.
可选的，所述光学膜的材质为Ge、ZnS、CaF、YbF3、SiO中的一种或几种。Optionally, the optical film is made of one or more of Ge, ZnS, CaF, YbF3, and SiO.
可选的，所述金属膜为Ti、Ni、Pt、Cr、Au中的一种或几种。Optionally, the metal film is one or more of Ti, Ni, Pt, Cr, Au.
可选的，所述保护膜为类金刚石薄膜，厚度为10~500nm。Optionally, the protective film is a diamond-like carbon film with a thickness of 10-500 nm.
可选的，所述基片顶部的光学膜、基片底部的光学膜和保护膜的缺陷点直径均小于10μm。Optionally, the defect spot diameters of the optical film at the top of the substrate, the optical film at the bottom of the substrate, and the protective film are all less than 10 μm.
可选的，控制缺陷点的方法包括：提高镀膜材料的纯度、控制成膜速率和通过膜系设计减少光学膜厚度。Optionally, methods for controlling defect points include: improving the purity of the coating material, controlling the film formation rate, and reducing the optical film thickness through film system design.
可选的，所述基片底部的光学膜共1~100层，厚度为0.1~50μm；所述基片顶部的光学膜共1~100层，厚度为0.1~50μm。Optionally, the optical film at the bottom of the substrate has a total of 1-100 layers, with a thickness of 0.1-50 μm; the optical film at the top of the substrate has a total of 1-100 layers, with a thickness of 0.1-50 μm.
本发明还提供了一种根据上述红外光学窗口的制备方法制备出的红外光学窗口，所述红外光学窗口包括基片，所述基片的顶部和底部均镀制有光学膜，顶部光学膜的四周镀制金属膜，所述底部光学膜上镀有一层保护膜。The present invention also provides an infrared optical window prepared according to the above method for preparing an infrared optical window, the infrared optical window includes a substrate, the top and bottom of the substrate are coated with an optical film, and the top of the optical film is A metal film is coated on the surroundings, and a protective film is coated on the bottom optical film.
在本发明中提供了一种红外光学窗口的制备方法，清洗基片并甩干；通过光学镀膜机在基片的底部镀制光学膜；在底部光学膜的表面镀制一层保护膜；采用硬掩膜方法在所述基片顶部做出镀膜区域，镀制光学膜；采用光刻制作出镀制金属膜的环形区域，镀制金属膜。该方法制备出的红外光学窗口，其镀膜缺陷直径小于10μm，具有很高的分辨率和成像质量；在底部光学膜上加镀类金刚石薄膜，提升了该窗口的抗磨损能力及在恶劣环境下的耐受性。Provided in the present invention is a method for preparing an infrared optical window. The substrate is cleaned and dried; an optical film is coated on the bottom of the substrate by an optical coating machine; a protective film is coated on the surface of the bottom optical film; In the hard mask method, a coating area is formed on the top of the substrate to form an optical film; photolithography is used to form an annular area where a metal film is coated to form a metal film. The infrared optical window prepared by this method has a coating defect diameter of less than 10 μm, and has high resolution and imaging quality; the diamond-like film is coated on the bottom optical film, which improves the wear resistance of the window and can withstand harsh environments. tolerance.
附图说明Description of drawings
图1是本发明实施例一提供的红外光学窗口制备方法的流程示意图；Fig. 1 is a schematic flow chart of the method for preparing an infrared optical window provided by Embodiment 1 of the present invention;
图2是本发明实施例一提供的红外光学窗口结构示意图。Fig. 2 is a schematic diagram of the structure of the infrared optical window provided by Embodiment 1 of the present invention.
具体实施方式Detailed ways
以下结合附图和具体实施例对本发明提出的一种红外光学窗口的制备方法作进一步详细说明。根据下面说明和权利要求书，本发明的优点和特征将更清楚。需说明的是，附图均采用非常简化的形式且均使用非精准的比例，仅用以方便、明晰地辅助说明本发明实施例的目的。The method for preparing an infrared optical window proposed by the present invention will be further described in detail below in conjunction with the accompanying drawings and specific examples. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in a very simplified form and use imprecise scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.
实施例一Embodiment one
本发明提供了一种红外光学窗口的制备方法，流程示意图如图1所示，所述红外光学窗口的制备方法包括如下步骤：The present invention provides a method for preparing an infrared optical window. The schematic flow chart is shown in Figure 1. The method for preparing an infrared optical window includes the following steps:
步骤S11、清洗基片并甩干；Step S11, cleaning the substrate and drying it;
步骤S12、通过光学镀膜机在基片的底部镀制光学膜；Step S12, coating an optical film on the bottom of the substrate by an optical coating machine;
步骤S13、在底部光学膜的表面镀制一层保护膜；Step S13, coating a protective film on the surface of the bottom optical film;
步骤S14、采用硬掩膜方法在所述基片顶部做出镀膜区域，镀制光学膜；Step S14, using a hard mask method to form a coating area on the top of the substrate, and coating an optical film;
步骤S15、采用光刻制作出镀制金属膜的环形区域，镀制金属膜。Step S15 , using photolithography to form an annular area where the metal film is to be coated, and to coat the metal film.
具体的，首先对基片1表面进行处理：所述基片1为双面抛光基片，使用超声波清洗机对所述基片1进行清洗，之后用甩干机甩干，确保表面无脏污及灰尘；接着根据设计好的膜系，采用光学镀膜机镀制，在所述基片1的下表面镀制光学膜2b，所述光学膜2b的材料为Ge、ZnS、CaF、YbF3、SiO中的一种或几种，一共镀制1~100层，最终厚度0.1~50μm；然后采用PECVD方法在所述光学膜2b的表面镀制一层保护膜4，具体为类金刚石薄膜，厚度为10~500nm；再对所述基片1的顶部进行光学膜镀制，由于所述基片1顶部的光学膜2a的四周需要镀制金属膜3，故需采用硬掩膜做出镀膜区域，然后镀制光学膜2a，所述光学膜2a的材料为Ge、ZnS、CaF、YbF3、SiO中的一种或几种，一共镀制1~100层，最终厚度0.1~50μm；最后采用光刻方法制作出镀制金属膜3的环形区域，然后镀制金属膜3，其中所述金属膜3的材质为Ti、Ni、Pt、Cr、Au中的一种或几种。所述基片基片顶部的光学膜2a、基片底部的光学膜2b和保护膜4的缺陷点直径均小于10μm，远远低于目前100μm的检验标准，使该光学窗口可用于高分辨率及成像质量要求高的非制冷红外焦平面探测器中。具体的，控制缺陷点的方法主要包括：提高镀膜材料的纯度、控制成膜速率和通过膜系设计减少光学膜厚度。Specifically, first, the surface of the substrate 1 is treated: the substrate 1 is a double-sided polished substrate, and the substrate 1 is cleaned with an ultrasonic cleaner, and then dried with a dryer to ensure that the surface is free of dirt and dust; then according to the designed film system, an optical coating machine is used to coat the lower surface of the substrate 1 with an optical film 2b, and the material of the optical film 2b is Ge, ZnS, CaF, YbF3, SiO One or more of them, 1-100 layers are plated in total, and the final thickness is 0.1-50 μm; then a layer of protective film 4 is plated on the surface of the optical film 2b by PECVD method, specifically a diamond-like carbon film with a thickness of 10 ~ 500nm; then the top of the substrate 1 is coated with an optical film. Since the optical film 2a on the top of the substrate 1 needs to be coated with a metal film 3, a hard mask is used to make the coating area. Then the optical film 2a is plated, and the material of the optical film 2a is one or more of Ge, ZnS, CaF, YbF3, SiO, a total of 1-100 layers are plated, and the final thickness is 0.1-50 μm; finally, photolithography is used. The method is to make an annular area where the metal film 3 is plated, and then the metal film 3 is plated, wherein the material of the metal film 3 is one or more of Ti, Ni, Pt, Cr, and Au. The defect spot diameters of the optical film 2a at the top of the substrate, the optical film 2b at the bottom of the substrate, and the protective film 4 of the substrate are all less than 10 μm, far below the current inspection standard of 100 μm, making the optical window available for high-resolution And uncooled infrared focal plane detectors with high imaging quality requirements. Specifically, the methods for controlling defect points mainly include: improving the purity of the coating material, controlling the film formation rate, and reducing the optical film thickness through film system design.
上述方法制备出的红外光学窗口，用于非制冷红外焦平面探测器，具体结构如图2所示。所述红外光学窗口包括基片1，所述基片1的材质为锗、硅、硒化锌或石英玻璃。所述基片1的顶部镀有光学膜2a，底部镀有光学膜2b，顶部光学膜2a和底部光学膜2b的材质为Ge、ZnS、CaF、YbF3、SiO中的一种或几种。顶部光学膜2a的四周镀制金属膜3，所述金属膜3为Ti、Ni、Pt、Cr、Au中的一种或几种。所述底部光学膜2b上镀有一层保护膜4，所述保护膜4为类金刚石薄膜，厚度为10~500nm。该类金刚石薄膜的形状及大小根据探测器芯片大小及形状可调。本实施例一提供的红外光学窗口在满足红外成像所需的透过率的同时，在底部光学膜上加镀类金刚石薄膜，提升了该窗口的抗磨损能力及在恶劣环境下的耐受性。The infrared optical window prepared by the above method is used in an uncooled infrared focal plane detector, and the specific structure is shown in FIG. 2 . The infrared optical window includes a substrate 1, and the material of the substrate 1 is germanium, silicon, zinc selenide or quartz glass. The top of the substrate 1 is coated with an optical film 2a, and the bottom is coated with an optical film 2b. The materials of the top optical film 2a and the bottom optical film 2b are one or more of Ge, ZnS, CaF, YbF3, and SiO. A metal film 3 is coated around the top optical film 2a, and the metal film 3 is one or more of Ti, Ni, Pt, Cr, and Au. A protective film 4 is coated on the bottom optical film 2 b, and the protective film 4 is a diamond-like film with a thickness of 10-500 nm. The shape and size of the diamond-like film can be adjusted according to the size and shape of the detector chip. The infrared optical window provided in the first embodiment satisfies the transmittance required for infrared imaging, and at the same time, a diamond-like film is coated on the bottom optical film, which improves the wear resistance of the window and the tolerance in harsh environments .
上述描述仅是对本发明较佳实施例的描述，并非对本发明范围的任何限定，本发明领域的普通技术人员根据上述揭示内容做的任何变更、修饰，均属于权利要求书的保护范围。The above description is only a description of the preferred embodiments of the present invention, and does not limit the scope of the present invention. Any changes and modifications made by those of ordinary skill in the field of the present invention based on the above disclosures shall fall within the protection scope of the claims.
Claims (10)
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Cited By (3)
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| CN112821173A (en) * | 2021-02-05 | 2021-05-18 | 无锡奥夫特光学技术有限公司 | A select a mirror for carbon dioxide laser |
| CN114879283A (en) * | 2022-05-20 | 2022-08-09 | 无锡泓瑞航天科技有限公司 | Infrared metalized all-through type germanium window piece and preparation method thereof |
| CN115020502A (en) * | 2022-05-23 | 2022-09-06 | 无锡泓瑞航天科技有限公司 | Metallized window sheet for infrared detector and preparation method thereof |
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