CN108766205A - A kind of generation technique of antifalsification label and the antifalsification label - Google Patents
A kind of generation technique of antifalsification label and the antifalsification label Download PDFInfo
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- CN108766205A CN108766205A CN201810572367.9A CN201810572367A CN108766205A CN 108766205 A CN108766205 A CN 108766205A CN 201810572367 A CN201810572367 A CN 201810572367A CN 108766205 A CN108766205 A CN 108766205A
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- tio
- sio
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Links
- 238000000034 method Methods 0.000 title claims abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 127
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 119
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 119
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 119
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 119
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 119
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 114
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims abstract description 3
- 238000000576 coating method Methods 0.000 claims abstract description 3
- 238000005516 engineering process Methods 0.000 claims description 5
- 241000209094 Oryza Species 0.000 claims description 4
- 235000007164 Oryza sativa Nutrition 0.000 claims description 4
- 235000009566 rice Nutrition 0.000 claims description 4
- 239000012528 membrane Substances 0.000 claims description 2
- 238000007738 vacuum evaporation Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 6
- 230000000903 blocking effect Effects 0.000 abstract 1
- 238000009472 formulation Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
- G09F3/02—Forms or constructions
- G09F3/0291—Labels or tickets undergoing a change under particular conditions, e.g. heat, radiation, passage of time
- G09F3/0294—Labels or tickets undergoing a change under particular conditions, e.g. heat, radiation, passage of time where the change is not permanent, e.g. labels only readable under a special light, temperature indicating labels and the like
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
- G09F3/02—Forms or constructions
- G09F2003/0257—Multilayer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of antifalsification label, the antifalsification label is an effigurate film layer of tool, and film layer includes the first TiO successively2Layer, the first SiO2Layer, the 2nd TiO2Layer, the 2nd SiO2Layer, the 3rd TiO2Layer, the 3rd SiO2Layer, the 4th TiO2Layer, the 4th SiO2Layer, the 5th TiO2Layer, the 5th SiO2Layer, the 6th TiO2Layer, the 6th SiO2Layer, the 7th TiO2Layer, the 7th SiO2Layer, the 8th TiO2Layer, the 8th SiO2Layer, the 9th TiO2Layer, the 9th SiO2Layer, the tenth TiO2Layer, the tenth SiO2Layer, the 11st TiO2Layer, the 11st SiO2Layer, the 12nd TiO2Layer, the 12nd SiO2Layer, the 13rd TiO2Layer, the 13rd SiO2Layer.The antifalsification label of the present invention generates the antifalsification label of formulation shape by blocking coating technique.The antifalsification label of the present invention can be widely used on various product, and tag recognition is easy to operate, and recognition effect is apparent, it is not easy to which counterfeit, anti-counterfeiting cost is low.
Description
Technical field
The present invention relates to a kind of antifalsification label and the generation techniques of the antifalsification label.
Background technology
Antifalsification label scientific name anti-counterfeiting mark is the mark with anti-fake effect.Antifalsification label include laser anti-counterfeiting label,
Double card antifalsification label, images outputting laser anti fake label, picture and text disclose antifalsification label etc..Existing antifalsification label is to palming off phenomenon
Play the role of it is certain prevent, but itself there is also certain drawbacks：Technically simple, anti-counterfeiting characteristic does not have unique
Property, antifalsification label itself is also easy counterfeit；Identification is complicated, strongly professional, and ordinary consumer can not pass through antifalsification label
To screen the true and false of commodity；Label is easily damaged, and is easy to be wiped out, or just lose anti-fake effect after getting wet.This hair
It is bright aiming at the deficiencies in the prior art, propose a kind of antifalsification label and the generation technique of the antifalsification label.
Invention content
In order to solve the above technical problems, the technical solution adopted by the present invention is：A kind of antifalsification label, the antifalsification label are
The one effigurate film layer of tool, film layer includes the first TiO successively2Layer, the first SiO2Layer, the 2nd TiO2Layer, the 2nd SiO2
Layer, the 3rd TiO2Layer, the 3rd SiO2Layer, the 4th TiO2Layer, the 4th SiO2Layer, the 5th TiO2Layer, the 5th SiO2Layer, the 6th TiO2
Layer, the 6th SiO2Layer, the 7th TiO2Layer, the 7th SiO2Layer, the 8th TiO2Layer, the 8th SiO2Layer, the 9th TiO2Layer, the 9th SiO2
Layer, the tenth TiO2Layer, the tenth SiO2Layer, the 11st TiO2Layer, the 11st SiO2Layer, the 12nd TiO2Layer, the 12nd SiO2Layer, the
13 TiO2Layer, the 13rd SiO2Layer.
First TiO as a preferred embodiment of the above solution,2The thickness of layer is 8.68 nanometers；First SiO2Layer thickness be
56.21 nanometers；2nd TiO2The thickness of layer is 24.43 nanometers；2nd SiO2The thickness of layer is 43.19 nanometers；3rd TiO2Layer
Thickness is 33.73 nanometers；3rd SiO2The thickness of layer is 48.33 nanometers；4th TiO2The thickness of layer is 28.45 nanometers；4th
SiO2The thickness of layer is 55.53 nanometers；5th TiO2The thickness of layer is 31.75 nanometers；5th SiO2The thickness of layer is received for 49.10
Rice；6th TiO2The thickness of layer is 31.74 nanometers；6th SiO2The thickness of layer is 56.56 nanometers；7th TiO2Layer thickness be
30.72 nanometers；7th SiO2The thickness of layer is 50.37 nanometers；8th TiO2The thickness of layer is 32.71 nanometers；8th SiO2Layer
Thickness is 58.13 nanometers；9th TiO2The thickness of layer is 28.69 nanometers；9th SiO2The thickness of layer is 49.62 nanometers；Tenth
TiO2The thickness of layer is 35.78 nanometers；Tenth SiO2The thickness of layer is 57.19 nanometers；11st TiO2The thickness of layer is 19.73
Nanometer；11st SiO2The thickness of layer is 65.87 nanometers；12nd TiO2The thickness of layer is 33.19 nanometers；12nd SiO2Layer
Thickness be 9.68 nanometers；13rd TiO2The thickness of layer is 68.61 nanometers；13rd SiO2The thickness of layer is 84.96 nanometers.
A kind of generation technique of antifalsification label, is covered using shelter with holes on product, and vacuum vapor plating skill is utilized
Art plates the first TiO successively against hole2Layer, the first SiO2Layer, the 2nd TiO2Layer, the 2nd SiO2Layer, the 3rd TiO2Layer, the 3rd SiO2
Layer, the 4th TiO2Layer, the 4th SiO2Layer, the 5th TiO2Layer, the 5th SiO2Layer, the 6th TiO2Layer, the 6th SiO2Layer, the 7th TiO2
Layer, the 7th SiO2Layer, the 8th TiO2Layer, the 8th SiO2Layer, the 9th TiO2Layer, the 9th SiO2Layer, the tenth TiO2Layer, the tenth SiO2
Layer, the 11st TiO2Layer, the 11st SiO2Layer, the 12nd TiO2Layer, the 12nd SiO2Layer, the 13rd TiO2Layer, the 13rd SiO2
Layer forms film layer identical with the shape in hole on product, removes shelter, completes the generation of antifalsification label on product.
The present invention operation principle be：Utilize the TiO of different-thickness2Layer and SiO2Layer to the transmitance of different-waveband light not
Same principle, by the TiO of specific thicknesses2Layer and SiO2Layer alternately and repeatedly cooperatively forms film layer.Plated film is blocked in product surface to generate
Film layer with certain pattern form forms antifalsification label.Under day ordinary ray irradiation, pattern can not show antifalsification label, work as purple
When UV light irradiates antifalsification label, there is the pattern cleaned, to reach antifalse effect.
The beneficial effects of the invention are as follows：The antifalsification label of the present invention can be widely used on various product, and label is known
Not easy to operate, recognition effect is apparent, it is not easy to which counterfeit, anti-counterfeiting cost is low.
Description of the drawings
Fig. 1 is the transmitance of different wavelengths of light under the illumination of this antifalsification label.
Specific implementation mode
Embodiment one
A shelter with holes is prepared first, and the shape in hole can be the pictorial trademark of product, or the security pattern formulated.
Shelter with holes is covered on product, using vacuum evaporation coating membrane technology, the first TiO is plated successively against hole2Layer, the first SiO2
Layer, the 2nd TiO2Layer, the 2nd SiO2Layer, the 3rd TiO2Layer, the 3rd SiO2Layer, the 4th TiO2Layer, the 4th SiO2Layer, the 5th TiO2
Layer, the 5th SiO2Layer, the 6th TiO2Layer, the 6th SiO2Layer, the 7th TiO2Layer, the 7th SiO2Layer, the 8th TiO2Layer, the 8th SiO2
Layer, the 9th TiO2Layer, the 9th SiO2Layer, the tenth TiO2Layer, the tenth SiO2Layer, the 11st TiO2Layer, the 11st SiO2Layer, the 12nd
TiO2Layer, the 12nd SiO2Layer, the 13rd TiO2Layer, the 13rd SiO2Layer, wherein the first TiO2The thickness of layer is 8.68 nanometers；The
One SiO2The thickness of layer is 56.21 nanometers；2nd TiO2The thickness of layer is 24.43 nanometers；2nd SiO2The thickness of layer is 43.19
Nanometer；3rd TiO2The thickness of layer is 33.73 nanometers；3rd SiO2The thickness of layer is 48.33 nanometers；4th TiO2The thickness of layer
It is 28.45 nanometers；4th SiO2The thickness of layer is 55.53 nanometers；5th TiO2The thickness of layer is 31.75 nanometers；5th SiO2Layer
Thickness be 49.10 nanometers；6th TiO2The thickness of layer is 31.74 nanometers；6th SiO2The thickness of layer is 56.56 nanometers；7th
TiO2The thickness of layer is 30.72 nanometers；7th SiO2The thickness of layer is 50.37 nanometers；8th TiO2The thickness of layer is received for 32.71
Rice；8th SiO2The thickness of layer is 58.13 nanometers；9th TiO2The thickness of layer is 28.69 nanometers；9th SiO2Layer thickness be
49.62 nanometers；Tenth TiO2The thickness of layer is 35.78 nanometers；Tenth SiO2The thickness of layer is 57.19 nanometers；11st TiO2Layer
Thickness be 19.73 nanometers；11st SiO2The thickness of layer is 65.87 nanometers；12nd TiO2The thickness of layer is 33.19 nanometers；
12nd SiO2The thickness of layer is 9.68 nanometers；13rd TiO2The thickness of layer is 68.61 nanometers；13rd SiO2The thickness of layer
It is 84.96 nanometers.Film layer identical with the shape in hole is formed on product, removes shelter, completes antifalsification label on product
It generates.Film layer is subjected to spectrum test, obtained test data, can using the generation technique of the present invention as shown in Figure 1, therefore
It is formed under ultraviolet light and shows clear pattern, the film layer of pattern will not be shown under the irradiation of daily light.Film layer being capable of conduct
The antifalsification label of product uses, and antifalse effect is good, and when anti-counterfeit recognition is easy to operate, and antifalsification label is not easy to be imitated.
The preferred embodiment of the present invention has been described in detail above, it should be understood that those skilled in the art without
It needs creative work according to the present invention can conceive and makes many modifications and variations, therefore, all technologies in the art
Personnel are available by logical analysis, reasoning, or a limited experiment on the basis of existing technology under this invention's idea
Technical solution, all should be in the protection domain being defined in the patent claims.
Claims (3)
1. a kind of antifalsification label, which is characterized in that the antifalsification label is an effigurate film layer of tool, and film layer includes successively
There is the first TiO2Layer, the first SiO2Layer, the 2nd TiO2Layer, the 2nd SiO2Layer, the 3rd TiO2Layer, the 3rd SiO2Layer, the 4th TiO2Layer,
4th SiO2Layer, the 5th TiO2Layer, the 5th SiO2Layer, the 6th TiO2Layer, the 6th SiO2Layer, the 7th TiO2Layer, the 7th SiO2Layer, the
Eight TiO2Layer, the 8th SiO2Layer, the 9th TiO2Layer, the 9th SiO2Layer, the tenth TiO2Layer, the tenth SiO2Layer, the 11st TiO2Layer, the
11 SiO2Layer, the 12nd TiO2Layer, the 12nd SiO2Layer, the 13rd TiO2Layer, the 13rd SiO2Layer.
2. antifalsification label as described in claim 1, which is characterized in that the first TiO2The thickness of layer is 8.68 nanometers；First
SiO2The thickness of layer is 56.21 nanometers；2nd TiO2The thickness of layer is 24.43 nanometers；2nd SiO2The thickness of layer is received for 43.19
Rice；3rd TiO2The thickness of layer is 33.73 nanometers；3rd SiO2The thickness of layer is 48.33 nanometers；4th TiO2Layer thickness be
28.45 nanometers；4th SiO2The thickness of layer is 55.53 nanometers；5th TiO2The thickness of layer is 31.75 nanometers；5th SiO2Layer
Thickness is 49.10 nanometers；6th TiO2The thickness of layer is 31.74 nanometers；6th SiO2The thickness of layer is 56.56 nanometers；7th
TiO2The thickness of layer is 30.72 nanometers；7th SiO2The thickness of layer is 50.37 nanometers；8th TiO2The thickness of layer is received for 32.71
Rice；8th SiO2The thickness of layer is 58.13 nanometers；9th TiO2The thickness of layer is 28.69 nanometers；9th SiO2Layer thickness be
49.62 nanometers；Tenth TiO2The thickness of layer is 35.78 nanometers；Tenth SiO2The thickness of layer is 57.19 nanometers；11st TiO2Layer
Thickness be 19.73 nanometers；11st SiO2The thickness of layer is 65.87 nanometers；12nd TiO2The thickness of layer is 33.19 nanometers；
12nd SiO2The thickness of layer is 9.68 nanometers；13rd TiO2The thickness of layer is 68.61 nanometers；13rd SiO2The thickness of layer
It is 84.96 nanometers.
3. a kind of generation technique of antifalsification label as described in claim 1, which is characterized in that covered and produced using shelter with holes
On product, using vacuum evaporation coating membrane technology, the first TiO is plated successively against hole2Layer, the first SiO2Layer, the 2nd TiO2Layer, second
SiO2Layer, the 3rd TiO2Layer, the 3rd SiO2Layer, the 4th TiO2Layer, the 4th SiO2Layer, the 5th TiO2Layer, the 5th SiO2Layer, the 6th
TiO2Layer, the 6th SiO2Layer, the 7th TiO2Layer, the 7th SiO2Layer, the 8th TiO2Layer, the 8th SiO2Layer, the 9th TiO2Layer, the 9th
SiO2Layer, the tenth TiO2Layer, the tenth SiO2Layer, the 11st TiO2Layer, the 11st SiO2Layer, the 12nd TiO2Layer, the 12nd SiO2
Layer, the 13rd TiO2Layer, the 13rd SiO2Layer forms film layer identical with the shape in hole on product, removes shelter, completes
The generation of antifalsification label on product.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810572367.9A CN108766205A (en) | 2018-06-06 | 2018-06-06 | A kind of generation technique of antifalsification label and the antifalsification label |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810572367.9A CN108766205A (en) | 2018-06-06 | 2018-06-06 | A kind of generation technique of antifalsification label and the antifalsification label |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108766205A true CN108766205A (en) | 2018-11-06 |
Family
ID=63999162
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810572367.9A Pending CN108766205A (en) | 2018-06-06 | 2018-06-06 | A kind of generation technique of antifalsification label and the antifalsification label |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108766205A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1123921A (en) * | 1993-12-27 | 1996-06-05 | 凸版印刷株式会社 | Transparent Holographic Seal |
| CN2234640Y (en) * | 1995-12-22 | 1996-09-04 | 电子科技大学 | Laser holographic watermark card protecting film |
| CN102514443A (en) * | 2011-12-09 | 2012-06-27 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element |
| CN103852815A (en) * | 2014-03-11 | 2014-06-11 | 深圳市科彩印务有限公司 | Variable saturation optical interference radiochromic anti-counterfeit film and preparation method thereof |
| CN104620159A (en) * | 2012-09-27 | 2015-05-13 | 富士胶片株式会社 | Polarized film and birefringent object to which polarized film is affixed |
-
2018
- 2018-06-06 CN CN201810572367.9A patent/CN108766205A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1123921A (en) * | 1993-12-27 | 1996-06-05 | 凸版印刷株式会社 | Transparent Holographic Seal |
| CN2234640Y (en) * | 1995-12-22 | 1996-09-04 | 电子科技大学 | Laser holographic watermark card protecting film |
| CN102514443A (en) * | 2011-12-09 | 2012-06-27 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element |
| CN104620159A (en) * | 2012-09-27 | 2015-05-13 | 富士胶片株式会社 | Polarized film and birefringent object to which polarized film is affixed |
| CN103852815A (en) * | 2014-03-11 | 2014-06-11 | 深圳市科彩印务有限公司 | Variable saturation optical interference radiochromic anti-counterfeit film and preparation method thereof |
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| PB01 | Publication | ||
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Application publication date: 20181106 |