CN108735637B - Improved atomizing spray structure - Google Patents
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- CN108735637B CN108735637B CN201810877552.9A CN201810877552A CN108735637B CN 108735637 B CN108735637 B CN 108735637B CN 201810877552 A CN201810877552 A CN 201810877552A CN 108735637 B CN108735637 B CN 108735637B
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- 239000007921 spray Substances 0.000 title claims description 71
- 238000005507 spraying Methods 0.000 claims abstract description 11
- 239000007788 liquid Substances 0.000 claims description 32
- 238000007789 sealing Methods 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 14
- 229910052710 silicon Inorganic materials 0.000 abstract description 14
- 239000010703 silicon Substances 0.000 abstract description 14
- 238000000889 atomisation Methods 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 238000004140 cleaning Methods 0.000 description 11
- 235000012431 wafers Nutrition 0.000 description 11
- 230000000694 effects Effects 0.000 description 6
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Nozzles (AREA)
Abstract
Description
技术领域Technical field
本发明涉及太阳能电池硅片生产设备技术领域,尤其涉及一种改良型雾化喷淋结构。The invention relates to the technical field of solar cell silicon wafer production equipment, and in particular to an improved atomizing spray structure.
背景技术Background technique
硅片,又叫做“芯片”、集成电路块。一只硅片里面通常含有数十到数万个硅晶体管组成的电路,完成一个或者数个功能。硅片在制作过程中需要清洗和烘干,现有的硅片雾化喷淋装置(如图1-3所示),在对硅片进行雾化喷淋时,液体从进口6进入,下端的一排均匀小孔7喷出,内部没有均流结构,导致喷出的液体两端出液量和压力比中间的出液量和压力要小,喷淋不均匀,影响硅片清洁效果。Silicon wafers are also called "chips" and integrated circuit blocks. A silicon chip usually contains circuits composed of tens to tens of thousands of silicon transistors to complete one or several functions. Silicon wafers need to be cleaned and dried during the production process. In the existing silicon wafer atomization spray device (shown in Figure 1-3), when atomizing and spraying the silicon wafer, the liquid enters from the inlet 6, and the lower end A row of uniform small holes 7 is sprayed out, and there is no flow-equalizing structure inside, resulting in the liquid volume and pressure at both ends of the sprayed liquid being smaller than the liquid volume and pressure in the middle, resulting in uneven spraying, which affects the silicon wafer cleaning effect.
发明内容Contents of the invention
本发明要解决的技术问题是:为了解决现有技术中硅片雾化喷淋装置清洗效果不佳的技术问题,本发明提供一种改良型雾化喷淋结构。The technical problem to be solved by the present invention is: in order to solve the technical problem of poor cleaning effect of the silicon wafer atomizing spray device in the prior art, the present invention provides an improved atomizing spray structure.
本发明解决其技术问题所采用的技术方案是:一种改良型雾化喷淋结构,包括喷淋长管、第一内管和第二内管,喷淋长管的上侧中间设置有主进口,喷淋长管的底部沿喷淋长管长度方向设置有多个均匀的主出孔,第一内管和第二内管均设置在喷淋长管内部,第一内管和第二内管的轴线和喷淋长管的长度方向相平行,第一内管和第二内管的两端均封闭,第一内管位于第二内管的上方,第一内管的上面开设有一个进风口和多个出风小孔,进风口位于中间,出风小孔位于进风口的两边且向第一内管的两端延伸,出风小孔的密度从中间向两边逐渐变大,第二内管的底部沿第二内管长度方向设置有多个均匀的出液口,进风口连通有进气管,第二内管连通有进液管。改良后的雾化喷淋结构,外部空气介质由进风口先充进第一内管,由第一内管上面的出风小孔出风,把气体均匀的排入喷淋长管中,第一内管上面的出风小孔在靠近进风口的位置出风小孔比较疏松,远离次进风口的位置出风小孔比较密集,这样也是有利于整个第一内管出风均匀,气体撞击喷淋长管内的上壁后改变方向向下运行从而到达喷淋长管底部的主出孔,这样的方式会让空气充满整个喷淋长管内,使得喷淋长管的两端和中间主出孔的风量与风压一致。第二内管和外部的进液管相连通,接通清洗液,通过均匀的风量与风压从主出孔喷出,对硅片起到了良好的清洗效果。The technical solution adopted by the present invention to solve the technical problem is: an improved atomization spray structure, which includes a long spray pipe, a first inner pipe and a second inner pipe. A main main pipe is arranged in the middle of the upper side of the long spray pipe. Inlet, the bottom of the long spray pipe is provided with a plurality of uniform main outlets along the length direction of the long spray pipe. The first inner pipe and the second inner pipe are both arranged inside the long spray pipe. The first inner pipe and the second inner pipe are arranged inside the long spray pipe. The axis of the inner pipe is parallel to the length direction of the long spray pipe. Both ends of the first inner pipe and the second inner pipe are closed. The first inner pipe is located above the second inner pipe. There is a hole on the top of the first inner pipe. One air inlet and multiple air outlet holes. The air inlet is located in the middle. The air outlet holes are located on both sides of the air inlet and extend toward both ends of the first inner tube. The density of the air outlet holes gradually becomes larger from the center to both sides. The bottom of the second inner tube is provided with a plurality of uniform liquid outlets along the length direction of the second inner tube. The air inlet is connected with an air inlet pipe, and the second inner pipe is connected with a liquid inlet pipe. In the improved atomizing spray structure, the external air medium is first filled into the first inner pipe through the air inlet, and the air is discharged from the air outlet hole on the first inner pipe, and the gas is evenly discharged into the long spray pipe. The air outlet holes on the first inner tube are relatively loose near the air inlet, and the air outlet holes are dense at the position far away from the secondary air inlet. This is also conducive to the uniform air outlet of the entire first inner tube and the gas impact. After spraying the upper wall of the long spray pipe, it changes direction and runs downward to reach the main outlet hole at the bottom of the long spray pipe. This way, the air will fill the entire long spray pipe, so that the main outlet holes at both ends and in the middle of the long spray pipe are The air volume of the hole is consistent with the wind pressure. The second inner tube is connected to the external liquid inlet pipe, and the cleaning fluid is connected and sprayed from the main outlet hole through uniform air volume and air pressure, which achieves a good cleaning effect on the silicon wafer.
为了便于液体喷出液体,所述喷淋长管的截面呈上宽下窄的形状。In order to facilitate the spraying of liquid, the cross-section of the long spray pipe is wide at the top and narrow at the bottom.
为了避免气体从上面泄漏,影响喷出的压力,所述进气管穿过主进口后和进风口相连通,进气管和主进口之间密封连接。In order to prevent gas from leaking from above and affecting the spray pressure, the air inlet pipe is connected to the air inlet after passing through the main inlet, and the air inlet pipe and the main inlet are sealedly connected.
为了有助于让气体充满整个喷淋长管内,所述第一内管底部和第二内管顶部相接触,且第一内管和第二内管均位于喷淋长管中部。In order to help the gas fill the entire long spray pipe, the bottom of the first inner pipe and the top of the second inner pipe are in contact, and both the first inner pipe and the second inner pipe are located in the middle of the long spray pipe.
为了保证清洁效果,所述每个主出孔上均设置有扇形喷嘴,所述扇形喷嘴呈上下相通的圆锥形,扇形喷嘴的上端为开口小的一端,扇形喷嘴的下端为开口大的一端,扇形喷嘴的上端和主出孔相连接,扇形喷嘴的下端口设置有密封平板,密封平板上开设有长条形的喷液口,喷液口的长度方向和喷淋长管长度方向相一致。将喷口设计成长条状,不仅节约喷淋的液体,还能够使得喷出的压力进一步增强,进一步提高清洁效果,能够根据需要更有针对性的清洗硅片某些区域。In order to ensure the cleaning effect, each of the main outlet holes is provided with a fan-shaped nozzle. The fan-shaped nozzle is in the shape of a cone that communicates up and down. The upper end of the fan-shaped nozzle is the end with the smaller opening, and the lower end of the fan-shaped nozzle is the end with the larger opening. The upper end of the fan-shaped nozzle is connected to the main outlet hole. The lower port of the fan-shaped nozzle is provided with a sealing plate. A long liquid spray port is provided on the sealing plate. The length direction of the liquid spray port is consistent with the length direction of the long spray pipe. Designing the nozzle into a long strip not only saves the spray liquid, but also further enhances the spray pressure, further improves the cleaning effect, and can clean certain areas of the silicon wafer more specifically as needed.
本发明的有益效果是,本发明的改良型雾化喷淋结构,通过在喷淋长管内设置了第一内管和第二内管,提高了现有的喷淋压力与雾化能力,能够让硅片表面一些附着的脏污清洁更干净,并降低液体介质的使用量。The beneficial effect of the present invention is that the improved atomizing spray structure of the present invention improves the existing spray pressure and atomizing capacity by arranging the first inner pipe and the second inner pipe in the long spray pipe. Clean some attached dirt on the surface of the silicon wafer and reduce the amount of liquid media used.
附图说明Description of the drawings
下面结合附图和实施例对本发明进一步说明。The present invention will be further described below in conjunction with the accompanying drawings and examples.
图1是现有技术中雾化喷淋结构的侧视图。Figure 1 is a side view of an atomizing spray structure in the prior art.
图2是现有技术中雾化喷淋结构的俯视图。Figure 2 is a top view of an atomizing spray structure in the prior art.
图3是现有技术中雾化喷淋结构的仰视图。Figure 3 is a bottom view of the atomizing spray structure in the prior art.
图4是本发明改良型雾化喷淋结构的内部结构示意图(图中箭头是表示气体和液体走向)。Figure 4 is a schematic diagram of the internal structure of the improved atomizing spray structure of the present invention (the arrows in the figure indicate the direction of gas and liquid).
图5是本发明改良型雾化喷淋结构的喷淋长管的俯视图。Figure 5 is a top view of the long spray pipe of the improved atomizing spray structure of the present invention.
图6是本发明改良型雾化喷淋结构的喷淋长管的俯视图透视图。Figure 6 is a top perspective view of the long spray pipe of the improved atomizing spray structure of the present invention.
图7是本发明改良型雾化喷淋结构的喷淋长管的仰视图透视图。Figure 7 is a bottom perspective view of the long spray pipe of the improved atomizing spray structure of the present invention.
图中:1、喷淋长管,11、主进口,12、主出孔,13、扇形喷嘴,14、密封平板,15、喷液口,2、第一内管,21、进风口,22、出风小孔,3、第二内管,31、出液口,4、进气管,5、进液管,6、进口,7、小孔。In the picture: 1. Spray long pipe, 11. Main inlet, 12. Main outlet, 13. Fan-shaped nozzle, 14. Sealing plate, 15. Liquid spray port, 2. First inner pipe, 21. Air inlet, 22 , air outlet small hole, 3. second inner tube, 31. liquid outlet, 4. air inlet pipe, 5. liquid inlet pipe, 6. inlet, 7. small hole.
具体实施方式Detailed ways
现在结合附图对本发明作进一步详细的说明。这些附图均为简化的示意图,仅以示意方式说明本发明的基本结构,因此其仅显示与本发明有关的构成。The present invention will now be described in further detail with reference to the accompanying drawings. These drawings are simplified schematic diagrams that only illustrate the basic structure of the present invention in a schematic manner, and therefore only show the structures related to the present invention.
如图4-7所示,是本发明最优实施例,一种改良型雾化喷淋结构,包括喷淋长管1、第一内管2和第二内管3,喷淋长管1的上侧中间设置有主进口11,喷淋长管1的底部沿喷淋长管1长度方向设置有多个均匀的主出孔12,第一内管2和第二内管3均设置在喷淋长管1内部,第一内管2和第二内管3的轴线和喷淋长管1的长度方向相平行,第一内管2和第二内管3的两端均封闭,第一内管2位于第二内管3的上方,第一内管2和第二内管3相互独立不连通,第一内管2的上面(顶部)开设有一个进风口21和多个出风小孔22,进风口21位于第一内管2的中间,出风小孔22位于进风口21的两边且向第一内管2的两端延伸,出风小孔22的密度从中间向两边逐渐变大,第二内管3的底部沿第二内管3长度方向设置有多个均匀的出液口31,进风口21连通有外部的进气管4,第二内管3连通有外部的进液管5。As shown in Figure 4-7, it is the best embodiment of the present invention, an improved atomization spray structure, including a long spray pipe 1, a first inner pipe 2 and a second inner pipe 3. The long spray pipe 1 There is a main inlet 11 in the middle of the upper side of the spray long pipe 1. A plurality of uniform main outlets 12 are provided at the bottom of the long spray pipe 1 along the length direction of the spray long pipe 1. The first inner pipe 2 and the second inner pipe 3 are both arranged at Inside the long spray pipe 1, the axes of the first inner pipe 2 and the second inner pipe 3 are parallel to the length direction of the long spray pipe 1. Both ends of the first inner pipe 2 and the second inner pipe 3 are closed. An inner tube 2 is located above the second inner tube 3. The first inner tube 2 and the second inner tube 3 are independent and not connected to each other. An air inlet 21 and multiple air outlets are provided on the top (top) of the first inner tube 2. Small holes 22, the air inlet 21 is located in the middle of the first inner tube 2, and the small air holes 22 are located on both sides of the air inlet 21 and extend to both ends of the first inner tube 2. The density of the small air holes 22 is from the middle to both sides. It gradually becomes larger. The bottom of the second inner tube 3 is provided with a plurality of uniform liquid outlets 31 along the length direction of the second inner tube 3. The air inlet 21 is connected to the external air inlet pipe 4, and the second inner tube 3 is connected to the external air inlet pipe 4. Liquid inlet pipe 5.
喷淋长管1的截面呈上宽下窄的形状。进气管4穿过主进口11后和进风口21相连通,进气管4和主进口11之间密封连接。第一内管2底部和第二内管3顶部相接触,且第一内管2和第二内管3均位于喷淋长管1中部。The cross section of the long spray pipe 1 is wide at the top and narrow at the bottom. The air inlet pipe 4 passes through the main inlet 11 and is connected to the air inlet 21, and the air inlet pipe 4 and the main inlet 11 are sealed. The bottom of the first inner pipe 2 and the top of the second inner pipe 3 are in contact, and both the first inner pipe 2 and the second inner pipe 3 are located in the middle of the long spray pipe 1 .
每个主出孔12上均设置有扇形喷嘴13,扇形喷嘴13呈上下相通的圆锥形,扇形喷嘴13的上端为开口小的一端,扇形喷嘴13的下端为开口大的一端,扇形喷嘴13的上端和主出孔12相连接,扇形喷嘴13的下端口设置有密封平板14,密封平板14上开设有长条形的喷液口15,喷液口15的长度方向和喷淋长管1长度方向相一致。Each main outlet hole 12 is provided with a fan-shaped nozzle 13. The fan-shaped nozzle 13 is in the shape of a cone that communicates up and down. The upper end of the fan-shaped nozzle 13 is the end with the smaller opening, and the lower end of the fan-shaped nozzle 13 is the end with the larger opening. The upper end is connected to the main outlet hole 12. The lower port of the fan-shaped nozzle 13 is provided with a sealing plate 14. The sealing plate 14 is provided with a long liquid spray port 15. The length direction of the liquid spray port 15 is consistent with the length of the long spray pipe 1. The direction is consistent.
工作原理:改良后的雾化喷淋结构,外部无油压缩空气由进气管4进入进风口21先充入第一内管2内,由第一内管2上面的出风小孔22出风,把气体均匀的排入喷淋长管1中,第一内管2上面的出风小孔22在靠近进风口21的位置出风小孔22比较疏松,远离进风口21的位置出风小孔22比较密集,这样也是有利于整个第一内管2的出风均匀,气体撞击喷淋长管1内的上壁后改变方向向下运行从而到达喷淋长管1底部的主出孔12,这样的方式会让空气充满整个喷淋长管1内,使得喷淋长管1的两端和中间的主出孔12的风量与风压一致,Working principle: In the improved atomization spray structure, the external oil-free compressed air enters the air inlet 21 from the air inlet pipe 4 and is first filled into the first inner pipe 2, and then the air is discharged from the air outlet hole 22 on the first inner pipe 2 , the gas is evenly discharged into the long spray pipe 1. The air outlet holes 22 on the first inner pipe 2 are relatively loose near the air inlet 21, and the air outlet is small at the position far away from the air inlet 21. The holes 22 are relatively dense, which is also beneficial to the uniform air outlet of the entire first inner pipe 2. The gas hits the upper wall in the long spray pipe 1 and then changes direction and runs downward to reach the main outlet hole 12 at the bottom of the long spray pipe 1. , this method will allow air to fill the entire long spray pipe 1, so that the air volume at both ends of the long spray pipe 1 and the main outlet 12 in the middle is consistent with the wind pressure.
进液管5同时向第二内管3(第二内管3的侧面通入)内通入清洁液体,清洁液体从第二内管3底部的出液口31进入喷淋长管1中,由于喷淋长管1中充满了均匀的压缩空气,使得喷淋长管1中的清洁液体从主出孔12均匀的喷出,又由于扇形喷嘴13呈圆锥形,且扇形喷嘴13底部具有长条形的喷液口15,使得在细长条形的喷液口15处又会形成进一步的加压,使得喷出的液体呈扁平的扇形雾化状,不仅节约喷淋的液体,还能够使得喷出的压力进一步增强,进一步提高清洁效果,能够根据需要更有针对性的清洗硅片某些区域。The liquid inlet pipe 5 simultaneously passes the cleaning liquid into the second inner pipe 3 (the side of the second inner pipe 3 passes through), and the cleaning liquid enters the long spray pipe 1 from the liquid outlet 31 at the bottom of the second inner pipe 3. Since the long spray pipe 1 is filled with uniform compressed air, the cleaning liquid in the long spray pipe 1 is sprayed out uniformly from the main outlet hole 12, and because the fan-shaped nozzle 13 is conical, and the bottom of the fan-shaped nozzle 13 has a long The strip-shaped liquid spray port 15 will form further pressure at the elongated strip-shaped liquid spray port 15, so that the sprayed liquid will be in a flat fan-shaped atomization shape, which not only saves the sprayed liquid, but also can This further enhances the spray pressure, further improves the cleaning effect, and enables more targeted cleaning of certain areas of the silicon wafer as needed.
以上述依据本发明的理想实施例为启示,通过上述的说明内容,相关工作人员完全可以在不偏离本项发明技术思想的范围内,进行多样的变更以及修改。本项发明的技术性范围并不局限于说明书上的内容,必须要根据权利要求范围来确定其技术性范围。Taking the above-mentioned ideal embodiments of the present invention as inspiration and through the above description, relevant workers can make various changes and modifications without departing from the scope of the technical idea of the present invention. The technical scope of the present invention is not limited to the content in the description, and must be determined based on the scope of the claims.
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CN203170476U (en) * | 2013-03-26 | 2013-09-04 | 四川什邡东润制造有限公司 | Nozzle |
CN105344511A (en) * | 2015-12-10 | 2016-02-24 | 北京七星华创电子股份有限公司 | Self-cleaning two-phase flow atomized spray cleaning device and cleaning method |
CN207672157U (en) * | 2017-11-20 | 2018-07-31 | 苏州阿特斯阳光电力科技有限公司 | a diffusion furnace |
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US10304705B2 (en) * | 2015-12-10 | 2019-05-28 | Beijing Naura Microelectronics Equipment Co., Ltd. | Cleaning device for atomizing and spraying liquid in two-phase flow |
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CN203170476U (en) * | 2013-03-26 | 2013-09-04 | 四川什邡东润制造有限公司 | Nozzle |
CN105344511A (en) * | 2015-12-10 | 2016-02-24 | 北京七星华创电子股份有限公司 | Self-cleaning two-phase flow atomized spray cleaning device and cleaning method |
CN207672157U (en) * | 2017-11-20 | 2018-07-31 | 苏州阿特斯阳光电力科技有限公司 | a diffusion furnace |
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