CN108708863A - Vacuum pump, the rotary body of vacuum pump and the quiet wing and its manufacturing method - Google Patents

Abstract

The present invention provides a kind of vacuum pump, the rotary body of vacuum pump and the quiet wing and its manufacturing method, it is suitble to the high temperature for avoiding the part as the parts of electric of the driving of control rotary body without high temperature, such as thread groove pump stator is efficiently set to need the part high temperature of high temperature in vacuum pump like that, to reduce the accumulation of reaction product.Rotary body（4）Has the 1st cylinder for constituting thread groove pump mechanism part（4A）With the 2nd cylinder for constituting turbomolecular pump mechanism part（4B）, it is configured in the 2nd cylinder（4B）Peripheral surface on multistage be configured with multiple dynamic wings（6）, by the 1st cylinder（4A）Inner surface（S1）With the 2nd cylinder（4B）Inner surface（S2）At least part of the cylinder inner surface of composition and the 1st cylinder（4A）Outer surface（Q1）It is configured to emissivity than the dynamic wing（6）The small low radiation in outer surface command troops.

Description

Vacuum pump, rotating body and stationary vane of vacuum pump, and manufacturing method thereof

technical field

The present invention relates to a vacuum pump used as a processing chamber in a semiconductor manufacturing device, a flat panel display manufacturing device, a solar cell panel manufacturing device, and a gas exhaust mechanism in other closed chambers, a rotating body and a stationary vane of the vacuum pump, and a manufacturing method thereof .

Background technique

Conventionally, as such a vacuum pump, for example, a vacuum pump described in Patent Document 1 or Patent Document 2 is known. Referring to FIG. 3(c) of Patent Document 1, in the conventional vacuum pump described in Patent Document 1, the upper surface of one moving vane (12) is configured as a high emissivity portion (high emissivity region), and the The wing ( 12 ) is specifically the lowest-stage rotor blade ( 12 ), and on the other hand, the lower surface of the same rotor blade (the lowest-stage rotor blade) is configured as a low-emission rate portion (low-emission area). This is because, by reducing the heat radiation from the screw groove pump stator (cylindrical stator 22 ) to the lowest stage rotor blade ( 12 ), it is easy to increase the temperature of the screw groove pump stator (cylindrical stator 22 ), reducing Accumulation of reaction products in the thread groove pump stator (cylindrical stator 22 ).

However, in order to obtain the rotor blade (12) having the high emissivity portion and the low emissivity portion as described above, for example, when the high emissivity portion is provided through the liquid medicine, in order to protect the low emissivity portion (lowest emissivity portion (12) )) from the chemical solution, it is necessary to shield the lower surface of the rotor wing of the lowest stage (low emissivity part) with a shielding member.

However, according to the vacuum pump described in Patent Document 1, in terms of the structure of the rotor blade (12), it is difficult to shield the lower surface (low emissivity portion) of the rotor blade (12) at the lowest stage with the shielding member as described above, and there is As a defect due to poor shielding, that is, an undesired high emissivity portion is locally formed in an original range (the lower surface of the lowest-stage rotor blade ( 12 )) that is expected to be configured as a low emissivity portion. In this case, it is easy to transfer heat from the screw groove pump stator (cylindrical stator 22 ) toward the bottommost rotor blade ( 12 ) side via the undesired high emissivity portion, so it is difficult to reduce the desired temperature by local high temperature increase. The portion where the reaction product accumulates, that is, the screw groove pump stator (cylindrical stator 22 ), is heated, and there is a problem that the accumulation of the reaction product in the screw groove pump stator cannot be sufficiently reduced.

In addition, in Patent Document 1, there is no disclosure or suggestion regarding what degree of emissivity the inner surface of the rotating body (pump rotor 10 ) has. In the case where the emissivity of the inner surface of the rotating body (pump rotor 10) is high, the heat of the rotating body (pump rotor 10) is radiated to the parts inside the rotating body (pump rotor 10), and it is more difficult to realize the screw groove pump stator, That is, the high temperature of the part that needs to be increased in temperature, and the electrical components located inside the rotating body (pump rotor 10), such as the magnetic bearing supporting the rotating body, the motor that drives the rotating body, etc., will be heated, so it is also conceivable Malfunctions such as misoperation of the electrical components and pump failure may occur.

Patent Document 1: Japanese Patent Laid-Open No. 2015-229949.

Patent Document 2: Japanese Unexamined Patent Publication No. 2005-320905.

Contents of the invention

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a vacuum pump, a vacuum pump rotor, stationary vanes, and a method for manufacturing the same, which are suitable for avoiding temperature rise in parts that do not require high temperature, such as electrical components that control the drive of the rotor. , Efficiently increase the temperature of parts that require high temperature in the vacuum pump, such as the screw groove pump stator, thereby reducing the accumulation of reaction products.

In order to achieve the aforementioned objects, the first present invention is a vacuum pump that sucks in and exhausts gas by utilizing the rotation of a rotating body, wherein the above-mentioned vacuum pump is characterized in that the rotating body has a first cylinder constituting a screw groove pump mechanism part. body and the second cylindrical body constituting the mechanism part of the turbomolecular pump, a plurality of moving blades are arranged in multiple stages on the outer peripheral surface of the second cylindrical body, and the inner surface of the first cylindrical body and the second circular At least a part of the cylindrical inner surface constituted by the inner surface of the cylindrical body and the outer surface of the first cylindrical body constitute a low emissivity portion having a lower emissivity than the outer surface of the rotor blade.

In the aforementioned first invention, it may also be characterized in that there is an intermediate portion between the above-mentioned low emissivity portion and the high emissivity portion provided adjacent to the low emissivity portion, and the intermediate portion has a The high emissivity portion has a large emissivity and is smaller than the emissivity of the above-mentioned high emissivity portion.

In the aforementioned first invention, it may also be characterized in that the intermediate portion is located within the design range of one of the respective design ranges of the high-emissivity portion and the low-emissivity portion, so that the other design range is within the design range of the other. The interior is constituted only by the high emissivity portion or the low emissivity portion excluding the intermediate portion.

In the aforementioned first invention, the inner surface of the second cylindrical body may be configured as a high emissivity portion having a higher emissivity than the low emissivity portion.

In the aforementioned first invention, the end face of the first cylindrical body may be configured as a high emissivity portion having a higher emissivity than the low emissivity portion.

In the aforementioned first invention, the end surface of the first cylindrical body may be configured as a low-emissivity portion having a lower emissivity than the high-emissivity portion.

In the first aspect of the present invention, the surface of the lowermost rotor blade among the rotor blades may be configured as the low emissivity portion.

In the above-mentioned first invention, it may also be characterized in that, in the rotor blade of the lowest stage among the rotor blades, the above-mentioned low emissivity department.

In the aforementioned first invention, it may also be characterized in that a shielding member is disposed between the lowermost movable blade among the movable blades and the fixing member of the screw groove pump mechanism, and the shielding member The low emissivity part mentioned above is comprised.

In the aforementioned first present invention, it may also be characterized in that a stationary blade is provided between the above-mentioned movable blades in the direction of the pump axis among the above-mentioned movable blades, and the above-mentioned static blades have an outer rim for The outer peripheral portion of the outer rim and/or the vicinity of the outer peripheral portion are supported, and at least one of the upper and lower surfaces and the outer peripheral surface of the outer rim constitutes the low emissivity portion.

In the aforementioned first invention, it may also be characterized in that a stationary vane is provided between the movable vanes in the direction of the pump axial center among the movable vanes, and the stationary vanes are provided with an outer rim, and the outer rim is used in the The outer peripheral portion of the outer rim and/or the vicinity of the outer peripheral portion are supported, and the outer rim is formed into a ring shape as a whole by butting and joining a plurality of rim members, and the mating surface of the rim member is constituted as the low emissivity portion .

In the aforementioned first aspect of the present invention, the low emissivity portion may be constituted by a multilayer structure in which the second low emissivity portion is laminated on the first low emissivity portion.

The second invention is a method of manufacturing a rotary body of a vacuum pump including a first cylindrical body constituting a screw groove pump mechanism and a second cylindrical body constituting a turbomolecular pump mechanism. 2. A plurality of moving blades are arranged in multiple stages on the outer peripheral surface of the cylindrical body. The above-mentioned method for manufacturing a rotating body of a vacuum pump is characterized in that the method for manufacturing a rotating body of a vacuum pump includes the following steps: At least a part of the inner surface of the cylinder formed by the inner surface of the cylindrical body and the inner surface of the second cylindrical body and/or the outer surface of the first cylindrical body is protected from high emissivity surface treatment; and a surface treatment step of performing the high emissivity surface treatment on the rotating body after the protection step.

In the above-mentioned second invention, it may also be characterized in that: the rotating body has a through hole for fastening and coupling the first cylindrical body or the second cylindrical body to the rotating shaft, and the protecting step includes A process of sealing the above-mentioned through-holes.

In the above-mentioned second invention, it may also be characterized in that there is a fastening and connecting step before the above-mentioned protection step, and the above-mentioned rotating body has a device for fastening and connecting the first cylindrical body or the second cylindrical body. In the plurality of through-holes of the rotating shaft, the fastening and connecting step is a step of inserting the end of the rotating shaft into the through-hole from the inner surface side of the rotating body, which is located on the rotation center line of the rotating body. one through hole, and then fastening and connecting bolts are inserted into and fastened to other through holes, thereby fastening and connecting the second cylindrical body and the above-mentioned rotating shaft. The process of attaching a protective cover to the tip of the rotating shaft.

In the aforementioned second invention, the protection cover may be characterized in that the protective cover has a function to prevent the high emissivity surface treatment from being applied to the inner surface side of the rotating body through the gap between the fastening bolt and the through hole. Function, and the function of preventing the corrosion product of the above-mentioned rotating shaft and the above-mentioned fastening bolts from flowing out of the vacuum pump caused by corrosive gas.

A third present invention is a method of manufacturing a rotary body of a vacuum pump including a first cylindrical body constituting a screw groove pump mechanism and a second cylindrical body constituting a turbomolecular pump mechanism. 2 The outer peripheral surface of the cylindrical body is provided with a plurality of moving blades arranged in multiple stages, and a through hole for fastening and connecting the first cylindrical body or the second cylindrical body to the rotating shaft is provided. The above-mentioned method of manufacturing a rotating body of a vacuum pump It is characterized in that the above-mentioned through-hole is processed after the high-emissivity surface treatment is applied to the outer surface of the above-mentioned rotating body.

In the aforementioned second and third inventions, it may also be characterized in that the outer rim of the stationary blade provided between the above-mentioned movable blades is formed in a ring shape as a whole by butting and joining a plurality of rim members, so that The high emissivity surface treatment is applied to the stator blade in a state where the rim member is butted and joined, so that the mating surface of the rim member has a higher emissivity portion than the surface of the stator blade formed by the high emissivity surface treatment. The state of low emissivity.

In the aforementioned second and third inventions, the outer surface of the first cylindrical body may be protected by an acid-resistant shielding member when the high emissivity surface treatment is performed.

In the aforementioned second and third inventions, the protection step includes a step of protecting with an acid-resistant shielding member.

In the aforementioned second and third inventions, the shielding member may be a rubber material containing fluorine.

A fourth present invention is a method of manufacturing a rotary body of a vacuum pump including a first cylindrical body constituting a screw groove pump mechanism and a second cylindrical body constituting a turbomolecular pump mechanism. 2. A plurality of rotor blades are arranged in multiple stages on the outer peripheral surface of the cylindrical body. The method for manufacturing the rotating body of the vacuum pump described above is characterized in that the method for manufacturing the rotating body of the vacuum pump includes the following steps: a first surface treatment step, the above-mentioned Low-emissivity surface treatment is performed on at least the portion of the entire outer peripheral surface of the rotating body that is desired to be the low-emissivity portion; the masking step is to apply the above-mentioned method in the first surface treatment step to the portion that is desired to be the low-emissivity portion. masking the low-emissivity surface layer formed by the low-emissivity surface treatment; and performing a high-emissivity surface treatment on the entire rotating body masked by the masking step in a second surface treatment step.

In the aforementioned fourth invention, it may also be characterized in that the first surface treatment step is a step of preparing a treatment tank filled with a low-emissivity surface treatment liquid, and submerging the entire outer peripheral surface of the above-mentioned rotating body. It is desirable that at least part of the above-mentioned low-emissivity part is immersed in the treatment tank to perform the above-mentioned low-emissivity surface treatment on the part, and the above-mentioned second surface treatment step is the following step: prepare and fill the high-emissivity surface treatment liquid The above-mentioned high-emissivity surface treatment is performed on the above-mentioned rotating body by immersing the whole of the above-mentioned rotating body shielded by the above-mentioned masking step in the processing tank.

In the above-mentioned fourth invention, the shielding member may be characterized in that it has elasticity capable of deforming following a concave-convex shape caused by surface roughness of the shielded surface.

Another aspect of the present invention is a rotary body characterized by being used in the above-mentioned vacuum pump, or a stationary vane characterized by being used in the above-mentioned vacuum pump.

According to the present invention, as described above, at least a part of the cylindrical inner surface in the rotating body is configured as a low emissivity portion having a lower emissivity than the outer surface of the rotor blade. Therefore, it is possible to provide a vacuum pump that reduces the amount of heat radiated to the outer surface of the rotating body from a part located on the outside of the rotating body, such as a screw groove pump stator, in which a high temperature is particularly required in a vacuum pump. By increasing the temperature, it is possible to efficiently increase the temperature of the portion that needs to be increased in temperature, and it is suitable for reducing the accumulation of reaction products by increasing the temperature in this portion.

In addition, in the present invention, as described above, the amount of heat radiation from the rotating body to its inner side is reduced, so electrical components located inside the rotating body (for example, magnetic bearings supporting the rotating body, rotating the rotating body, etc.) The part where it is desired to avoid high temperature, such as the driving motor, etc.) maintains a relatively low temperature, and it is also possible to effectively reduce malfunctions, pump failures, etc. caused by overheating of the electrical components.

Furthermore, in the present invention employing the protection step, when the high emissivity surface treatment is applied to the outer surface of the rotating body, the inner surface of the rotating body is protected from being subjected to the high emissivity surface treatment, and the rotating body can be The inner surface of the inner surface is constituted as a low-emissivity part, so this can also obtain the above-mentioned effect, that is, the effect of efficiently increasing the temperature of the part that is located on the outer side of the rotating body and is located in the vacuum pump. In particular, high temperature is also required.

Description of drawings

Fig. 1 is a sectional view of a vacuum pump to which the present invention is applied.

FIG. 2 is an explanatory diagram of the range of a low-emissivity portion and a high-emissivity portion in a rotating body constituting the vacuum pump of FIG. 1 .

3 is an explanatory diagram of a step (first example) of obtaining a high emissivity portion by plating.

4 is an explanatory diagram of a step (second example) of obtaining a high emissivity portion by plating.

5 is an explanatory diagram of a step (third example) of obtaining a high emissivity portion by plating.

6 is an explanatory diagram of a structure (boundary structure) near a boundary between a low-emissivity portion and a high-emissivity portion.

FIG. 7 is an explanatory diagram of an example in which the surface of the rotor blade at the lowest stage is configured as a low emissivity portion.

8 is an explanatory diagram of an example in which a member serving as a heat insulating member having a low-emissivity portion is interposed between the lowest-stage rotor blade and a fixed member opposed thereto.

9 is an explanatory diagram of an example in which at least one of the upper and lower surfaces and the outer peripheral surface of the outer rim is configured as a low emissivity portion.

FIG. 10 is an explanatory diagram of an example in which the butting surfaces of a plurality of rim members are configured as low emissivity portions.

FIG. 11 is an explanatory diagram of an example in which a high emissivity portion is the uppermost layer of a multilayer structure.

Fig. 12 is an explanatory view of the surface roughness of the shielding member and the shielded surface.

Fig. 13 is an explanatory view of a state where an elastic shielding member is attached to a shielded surface.

Detailed ways

Hereinafter, the best mode for carrying out the present invention will be described in detail with reference to the attached drawings.

1 is a cross-sectional view of a vacuum pump to which the present invention is applied, and FIG. 2 is an explanatory view illustrating the range of low emissivity portions and high emissivity portions in a rotating body constituting the vacuum pump P of FIG. 1 .

The vacuum pump P in FIG. 1 is a compound pump equipped with a turbomolecular mechanism part Pt and a screw groove pump mechanism part Ps as a gas exhaust mechanism, and is used, for example, as a processing chamber in semiconductor manufacturing equipment, flat panel display manufacturing equipment, and solar panel manufacturing equipment. Chambers, gas exhaust mechanisms for other closed chambers, etc.

In the vacuum pump P shown in FIG. 1 , the exterior body 1 has a substantially cylindrical shape with a bottom by integrally connecting a cylindrical pump casing C and a pump base B in the direction of the cylinder axis with fastening members.

The upper end side of the pump case C (upper side in FIG. 1 ) is opened as a gas intake port 1A, and the pump base B is provided with a gas exhaust port 2 . In addition, the gas intake port 1A is connected to a high-vacuum sealed chamber (not shown), such as a processing chamber of a semiconductor manufacturing apparatus, and the gas exhaust port 2 is connected to an auxiliary pump (not shown).

A cylindrical stator column 3 is provided at a central portion inside the pump casing C. As shown in FIG. The stator column 3 is erected on the pump base B, and a rotating body 4 is provided on the outside of the stator column 3, and a magnet as a mechanism for supporting the rotating body 4 in its radial and axial directions is built in the inside of the stator column 3. Various electrical components such as a bearing MB, a drive motor MT as a mechanism for rotationally driving the rotary body 4 , and the like. In addition, since the magnetic bearing MB and the drive motor MT are known, detailed description of their specific structures will be omitted.

The rotating body 4 is rotatably arranged on the pump base B, and is covered by the pump base B and the pump casing C. As shown in FIG.

In addition, the rotating body 4 has a substantially cylindrical shape surrounding the outer periphery of the stator column 3, and becomes two cylindrical bodies having different diameters by the connecting portion 4C (in the vacuum pump P of FIG. The structure in which the first cylindrical body 4A and the second cylindrical body 4B constituting the turbomolecular pump mechanism Pt) are connected in the direction of the cylinder axis, and the inner surface of the second cylindrical body 4B is equipped with a The body 4B has a structure in which a fastening portion 4D is fastened to a rotating shaft 4 described later, and a structure in which a plurality of rotor blades 6 described later are arranged in multiple stages on the outer peripheral surface of the second cylindrical body 4B.

A rotating shaft 41 is provided inside the rotating body 4, and the rotating shaft 41 is integrally fastened and connected to the second cylindrical body 4B via a fastened connection portion 4D. As a specific fastening structure of such a rotating shaft 41, in the vacuum pump P of FIG. H1, H2 (refer to Figure 2).

Furthermore, the through-holes (hereinafter referred to as "centers") located on the rotation center line of the rotating body 4 are inserted into the plurality of through-holes H1, H2 by press-fitting the ends of the rotating shaft 41 from the inner surface side of the rotating body 4. through hole H1"), insert and fasten fastening bolts BT into other through holes (hereinafter referred to as "peripheral through holes H2") located around the center through hole H1, thereby fastening the second cylindrical body 4B It is integrally fastened with the rotating shaft 41 .

In addition, the assembly by inserting the rotating shaft 41 into the through hole H1 as described above is not limited to the press-fitting as described above, and may be an assembly under thermal press fit, shrink fit, or clearance fit.

In addition, in the vacuum pump P of FIG. 1 , the rotating shaft 41 is supported by the magnetic bearing MB built in the stator column 3, and the rotating shaft 41 is rotationally driven by the driving motor MT built in the stator column 3, so that the rotating body 4 It has a structure in which it rotates around a rotation center (the center of the rotation shaft 41 ) while being magnetically supported at predetermined positions in the axial and radial directions. In the case of this structure, the rotating shaft 41, the magnetic bearing MB, and the drive motor MT function as a support and a drive mechanism of the rotating body 4. As shown in FIG. The rotary body 4 may be rotatably supported around its axis and rotationally driven by a structure other than this.

The vacuum pump P shown in FIG. 1 is provided with gas flow paths R1 and R2 as the gas is sucked from the gas suction port 1A by the rotation of the rotating body 4 centered on the rotating shaft 41, and the sucked gas is discharged from the gas exhaust port 2 to the outside. exhaust mechanism.

As an embodiment of the gas flow paths R1 and R2, in the vacuum pump P shown in FIG. The upstream side) is formed by a plurality of moving vanes 6 provided on the outer peripheral surface of the rotating body 4 and a plurality of stationary vanes 7 fixed to the inner peripheral surface of the pump housing C via a spacer 9 . The side gas flow path R2 (downstream side of the connecting portion 4C of the rotating body 4 ) utilizes the outer peripheral surface of the rotating body 4 (specifically, the outer peripheral surface of the first cylindrical body 4A) and the screw groove pump stator facing it. 8 is formed as a flow path in the shape of a screw groove.

To describe the structure of the suction-side gas flow path R1 in more detail, in the vacuum pump P shown in FIG. ) are arranged radially at the center. On the other hand, the vanes 7 constituting the suction-side gas flow path R1 are arranged and fixed on the inner peripheral side of the pump casing C in a manner of positioning along the pump radial direction and the pump axial direction via the spacer 9 , and are centered on the pump axis. A plurality of them are arranged radially in the center.

Furthermore, in the vacuum pump P of FIG. 1 , the radially arranged movable blades 6 and stationary blades 7 are alternately arranged in multiple stages in the pump axial direction to form the intake side gas flow path R1 .

In the intake-side gas passage R1 constituted by the above structure, the rotary body 4 and the plurality of rotor blades 6 are integrally rotated at high speed by the activation of the drive motor MT, so that the rotor blades 6 respond to the gas incident from the gas inlet port 1A. The gas molecules impart a downward motion. Then, the gas molecules having such downward motion are sent by the stationary vanes 7 to the rotor vane side of the next stage. By repeating the above-mentioned kinetic energy imparting and sending operations to the gas molecules in multiple stages, the gas molecules on the gas intake port side advance sequentially in the direction of passing through the intake-side gas flow channel R1 to the exhaust-side gas flow channel R2 way is exhausted.

Next, the structure of the exhaust-side gas flow path R2 will be described in more detail. In the vacuum pump P shown in FIG. Surface (specifically, the outer peripheral surface of the first cylindrical body 4A. The same applies hereinafter), and its inner peripheral surface side is separated from the downstream side outer peripheral surface of the rotating body 4 (specifically, by a predetermined gap) In other words, the outer peripheral surface of the first cylindrical body 4A) is arranged facing each other.

In addition, a thread groove 8A is formed on the inner peripheral portion of the thread groove pump stator 8, and the thread groove 8A changes in a conical shape in which the depth thereof decreases downward, and is carved in a spiral shape from the upper end to the lower end of the thread groove pump stator 8. shape.

In addition, in the vacuum pump P shown in FIG. 1 , the downstream side outer peripheral surface of the rotating body 4 is opposed to the screw groove pump stator 8 having the screw groove 8A, so that the exhaust side gas flow path R2 is formed in the shape of a screw groove. gas flow path. As another embodiment different from this, although illustration is omitted, for example, a structure in which the above-mentioned exhaust-side gas flow path R2 is formed by providing the thread groove 8A on the downstream side outer peripheral surface of the rotating body 4 may also be adopted. .

In the exhaust-side gas flow path R2 constituted by the above structure, when the rotary body 4 is rotated by the activation of the drive motor MT, gas flows in from the suction-side gas flow path R1, and the thread groove 8A and the downstream side of the rotary body 4 are connected to each other. The drag effect of the side outer peripheral surface exhausts the inflowing gas while being compressed from the transitional flow into a viscous flow while being transferred.

Referring to FIG. 2, in the vacuum pump P of FIG. 1, at least a part of the inner surface of the rotating body 4 (in the example of FIG. 2, the entirety of the inner surface S1 and the inner surface S2) and the outer surface of the first cylindrical body 4A The surface Q1 is configured as a low-emissivity portion EM1 having a lower emissivity than the outer surface of the rotor blade 6. Specifically, the inner surface of the rotating body 4 is composed of the inner surface S1 of the first cylindrical body 4A and the inner surface S1 of the second cylindrical body. The inner surface of the cylinder formed by the inner surface S2 of 4B. In addition, in the present embodiment, the inner surface S3 of the fastening portion 4D is also configured as a low emissivity portion EM1 having an emissivity lower than that of the outer surface of the rotor blade 6 .

According to the vacuum pump P of FIG. 1 , at least a part of the cylindrical inner surface of the rotating body 4 is configured as the low emissivity portion EM1 as described above. Therefore, the amount of heat radiated to the outer surface of the rotating body 4 from a part of the vacuum pump P such as the thread groove pump stator 8 that requires a high temperature is reduced, so that the high temperature of the part that requires a high temperature can be efficiently raised. Increasing the temperature of this part reduces accumulation of reaction products.

In addition, according to the vacuum pump P of FIG. 1 , as described above, the radiation amount of heat from the rotating body 4 to its inner side is reduced, so it is possible to place electrical components (for example, supporting the rotating body 4 ) inside the rotating body 4 The magnetic bearing MB, the motor MT that rotates the rotating body 4, etc.), where it is desired to avoid high temperature, can be maintained at a relatively low temperature, and it can also effectively reduce the misoperation caused by overheating of electrical components, pumps, etc. Fault.

The low emissivity portion EM1 includes a portion obtained without any surface treatment (for example, plating treatment) that changes the emissivity of heat, that is, a portion that constitutes the first or second cylindrical body 4A, 4B or a fastening connection portion. The part with emissivity of the 4D material (non-plating type), and the part with emissivity (plating type) formed by forming a low-emissivity plating layer by plating such as nickel alloy plating, etc.

In addition, the low emissivity part EM1 may form the multilayer structure which laminated|stacked the 2nd low emissivity part on the 1st low emissivity part. The low emissivity portion of such a multilayer structure can be formed by, for example, performing nickel alloy plating on the surface to be plated to form a base layer (the first low emissivity portion), and then performing nickel alloy plating on the base layer. It is obtained by installing a nickel alloy plating layer (2nd low emissivity part).

In the entire surface of the rotating body 4, the parts other than the low-emissivity portion EM1 described above are configured to have a high-emissivity portion EM2 having a higher emissivity than the low-emissivity portion EM1. The parts are, for example, the outer surface Q2 of the second cylindrical body 4B and the outer surface Q3 of the rotor blade 6 . Such a high emissivity portion EM2 can be obtained, for example, by high emissivity surface treatment with a high emissivity plating solution.

In addition, it can be formed by immersing the rotating body 4 in acid to oxidize the surface.

As for the high emissivity part EM2, nickel oxide plating can be employ|adopted, for example. Here, when the heat dissipation properties of no plating, nickel alloy plating, and nickel oxide plating are compared, the magnitude relationship becomes the magnitude relationship of heat dissipation properties as follows.

・Size relationship of heat dissipation

Nickel oxide plating>Nickel alloy plating>No plating (base material)

The reason why the outer surface Q2 of the second cylindrical body 4B and the outer surface Q3 of the rotor blade 6 are configured as the high emissivity portion EM2 as described above is to reduce the dynamics by improving the heat dissipation from the rotating body 4 to the direction of the outer body 1. Thermal expansion deformation and creep failure of wing 6.

[Explanation of the first manufacturing method of the rotating body 4]

FIG. 3 is an explanatory diagram of a first manufacturing method of a rotating body constituting the vacuum pump of FIG. 1 .

As the first manufacturing method of the rotating body 4 provided with the low-emissivity portion EM1 and the high-emissivity portion EM2 as described above, the rotating body 4 can be manufactured by Manufactured by performing a protection step and a surface treatment step described later.

The protecting step is a step of protecting the desired low-emissivity portion EM1 (specifically, the cylindrical inner surface composed of the inner surface S1 of the first cylindrical body 4A and the inner surface S2 of the second cylindrical body 4B). At least a part of and the outer surface Q1 of the first cylindrical body 4A are not subjected to high emissivity surface treatment.

In addition, the surface treatment step is a step in which high emissivity surface treatment is given to the rotating body 4 after the protection step.

In the protection step, as shown in FIG. 3 , a portion desired to be configured as the low emissivity portion ME1 (see FIG. 2 ) may be protected by a shielding member MSK1 or a jig dedicated to shielding (not shown).

The shielding member MSK1 prevents high-emissivity surface treatment from being applied to the outer surface Q1 of the first cylindrical body 4A that is desired to be configured as the low-emissivity portion ME1, and closes the lower end opening of the first cylindrical body 4A, thereby preventing the desired configuration as In the low emissivity part ME1, the cylindrical inner surface comprised by the inner surface S1 of the 1st cylindrical body 4A and the inner surface S2 of the 2nd cylindrical body 4B is given high emissivity surface treatment.

In addition, in the protection process, as shown in FIG. 3 , the upper end opening of the second cylindrical body 4B is closed by using the shielding member MSK2 or a special shielding jig not shown, thereby indirectly sealing the plurality of through holes ( H1 , H2 ). processing (hereinafter referred to as "through-hole plugging processing").

The through-hole sealing process prevents high-emissivity surface treatment from being applied to the portion desired to constitute the low-emissivity portion ME1, specifically, the inner surface S1 of the first cylindrical body 4A. The cylindrical inner surface constituted with the inner surface S2 of the second cylindrical body 4B.

In the surface treatment process, by immersing the entire rotating body 4 in a plating tank PB filled with a high-emissive plating solution or an acidic solution, a high emissivity is applied to the outer surface of the rotating body 4 except for the masking treatment-applied portion. surface treatment.

[Explanation of the second manufacturing method of the rotating body 4]

FIG. 4 is an explanatory diagram of a second manufacturing method of a rotating body constituting the vacuum pump of FIG. 1 .

This second manufacturing method differs from the previously described first manufacturing method only in the through-hole sealing process in the protection step, and is the same as the first manufacturing method except for that, so detailed description thereof will be omitted.

Referring to FIG. 4 , the through-hole sealing process in the protection step in the second manufacturing method directly seals all of the through-holes (H1, H2) by closing one or both openings of the through-holes (H1, H2) with the lid member LID. Through holes (H1, H2). The difference from the protecting step in FIG. 3 is that part of the upper end opening of the rotating body 4 is not protected, and the lid member LID can be fixed using existing through holes ( H1 , H2 ).

[Description of the third manufacturing method of the rotating body 4]

Fig. 5 is an explanatory diagram of a third manufacturing method of a rotating body constituting the vacuum pump of Fig. 1 .

As the third manufacturing method of the rotating body 4 provided with the low emissivity portion EM1 and the high emissivity portion EM2 as described above, the rotating body 4 can be processed by sequentially providing a fastening and connecting process, a protection process, and a plating process after the machining is completed. Overlapping process to manufacture.

In the first or second manufacturing method described above, before the rotating shaft 41 is attached to the rotating body 4, the outer surface of the rotating body 4 is subjected to high emissivity surface treatment. On the other hand, referring to FIG. 5 , in the third manufacturing method, the second cylindrical body 4B is fastened to the rotating shaft 41 , that is, the rotating shaft 41 is attached to the rotating body 4 . The entire rotating body 4 is immersed in a plating tank PB filled with a high emissivity plating solution or an acidic solution, whereby the high emissivity surface treatment is given to the rotating body 4 .

The fastening and connecting process in the third manufacturing method is to press the end of the rotating shaft 41 into the center through hole H1 among the plurality of through holes ( H1 , H2 ) from the inner surface side of the rotating body 4 , and then fasten and connect The bolts BT are inserted into the peripheral through-holes H2 and tightened, whereby the second cylindrical body 4B and the rotating shaft 41 are fastened together.

Part of the protection step in the third manufacturing method is different from the protection step in the first manufacturing method described above, and a part of the protection step is specifically a through-hole sealing process. That is, referring to FIG. 5 , in the protection step in the third manufacturing method, as an example of the through-hole sealing process, the protective cover PC is attached to the end portion of the rotating shaft 41 pressed in through the fastening and connection step, thereby The inner surface of the rotating body 4 is protected from high emissivity surface treatment.

In addition, since the plating process in this 3rd manufacturing method is the same as the plating process in the 1st manufacturing method, the detailed description is abbreviate|omitted.

However, the protective cover PC attached as above functions as a mechanism for preventing the inner surface of the rotating body 4 from being subjected to high emissivity surface treatment through the gap between the through holes ( H1 , H2 ) and the fastening bolt BT. In addition, the protective cover PC installed as described above is not disassembled after the assembly of the vacuum pump P is completed, but exists as a component of the vacuum pump, so as to prevent the rotating shaft 41 and the fastening bolt BT from being caused by corrosive gas. Corrosion, and a mechanism that prevents corrosion from flowing out of the vacuum pump P even if corroded functions.

[Description of the fourth manufacturing method of the rotating body 4]

In the first to third manufacturing methods described above, in the state where the plurality of through-holes (H1, H2) have been formed in the rotating body 4, the rotating body 4 is dipped in a plating solution filled with a high-radiation plating solution. The outer surface of the rotating body 4 is subjected to high emissivity surface treatment by covering the tank or in an acidic solution. In contrast, in the fourth manufacturing method, a plurality of through-holes ( H1 , H2 ) are processed (formed) after high-emissivity surface treatment.

Therefore, according to the fourth manufacturing method, since there are not many through-holes (H1, H2) at the stage of performing high-emissivity surface treatment, it is not necessary to seal the through-holes during high-emissivity surface treatment ( H1, H2) treatment (through hole plugging treatment).

[Description of the fifth manufacturing method of the rotating body 4]

In the case where the outer surface Q1 of the first cylindrical body 4A in the rotating body 4 is constituted as a plating-type low-emissivity portion EM1, the plating-type low-emissivity portion EM1 is, for example, plated with a nickel alloy. Low emissivity coating layer formed by other plating treatment.

On the other hand, on the outer surface of the rotating body 4 constituting the high emissivity portion EM2 such as the outer surface Q2 of the second cylindrical body 4B, the outer surface Q3 of the rotor blade 6, etc., for example, nickel oxide is provided as a high Emissivity section EM2.

Therefore, in order to manufacture the rotating body 4 including the low emissivity portion EM1 and the high emissivity portion EM2 as described above, a so-called partial plating process for forming a low emissivity plating layer and a high emissivity layer is performed. Regarding specific aspects of the partial plating treatment, the following [partial plating treatment (part 1)] and [partial plating treatment (part 2)] are considered.

[partially plated (1 of them)]

The partial plating process (Part 1) consists of the following (1-1) 1st masking process, (1-2) 1st plating process, (1-3) 2nd masking process, (1-4) 2nd plating process These 4 processes constitute the overlay process.

(1-1) The first masking step

In the first shielding step, the portion desired to be configured as the low emissivity portion EM1 out of the entire outer surface of the rotating body 4 is shielded and protected by the first shielding member.

(1-2) 1st plating process (1st surface treatment process)

In the first plating step, a plating tank filled with a low-emissivity plating solution is prepared as a treatment tank filled with a low-emissivity surface treatment solution, and the entire rotating body 4 shielded by the first shielding step is immersed in the plating tank. The tank (treatment tank) is coated so that low-emissivity surface treatment (plating treatment in this example) is performed only on the portion desired to constitute the low-emissivity portion EM1. Thereafter, the first shielding member is removed from the rotating body 4 .

(1-3) Second masking process

In the second masking process, the low emissivity surface treatment layer formed by the low emissivity surface treatment in the first plating process (in this example, the low emissivity layer formed by the aforementioned plating treatment) emissivity coating) for shielding protection.

(1-4) Second plating treatment process (second surface treatment process)

In the second plating treatment step, a plating tank filled with a high-emissivity plating solution is prepared as a treatment tank filled with a high-emissivity surface treatment solution, and the entire rotating body 4 shielded by the second shielding step is immersed in the plating tank. Cover tank (treatment tank), that is, apply high-emissivity surface treatment to the entire rotating body 4 shielded by the second shielding process, and apply high-emissivity to the part (other than the shielding treatment implementation part) that is desired to constitute the high-emissivity part EM2 rate surface treatment. Thereafter, the second shielding member is removed.

Here, plating is used to form the low emissivity portion EM1 or the high emissivity portion EM2 , but it is not limited thereto, and any method for forming the low emissivity portion EM1 or the high emissivity portion EM2 is applicable.

[Partial Plating (2 of them)]

The partial plating process (Part 1) is comprised of the following three processes of (2-1) 1st plating process, (2-2) 1st masking process, and (2-3) 2nd plating process.

(2-1) The first plating process (the first surface treatment process)

In the first plating process, a plating tank filled with a low-emissivity plating solution is prepared as a treatment tank filled with a low-emissivity surface treatment solution, and only the desired parts of the entire outer surface of the rotating body 4 are configured to be low-emissivity. The part of the rate part EM1, that is, the lower half of the rotating body 4 (specifically, the first cylindrical body 4A), is immersed in the coating tank (treatment tank), so that only the lower half of the rotating body 4 (rotating Out of the entire outer surface of the body 4 , the portion desired to be configured as the low-emissivity portion EM1 ) is subjected to low-emissivity surface treatment.

(2-2) Masking process

In the masking step, the low-emissivity plating layer formed by the low-emissivity surface treatment in the first plating step, that is, the lower half of the rotating body 4 is protected with a shielding member or the like.

(2-3) Second plating step (second surface treatment step)

In the second plating step, a plating tank filled with a high-radiation plating solution is prepared as a treatment tank filled with a high-radiation surface treatment solution, and the entire rotating body 4 shielded by the shielding step is immersed in the coating tank (treatment Groove) to implement high emissivity surface treatment on the entire outer surface of the rotating body 4 . Thereafter, the second shielding member is removed.

Here, plating is used to form the low emissivity portion EM1 or the high emissivity portion EM2 , but it is not limited thereto, and any method for forming the low emissivity portion EM1 or the high emissivity portion EM2 is applicable. For example, in the case of implementing a nickel oxide plating layer as a high-emissivity surface treatment, as long as the part of the low-emissivity part is shielded so as not to be subjected to high-emissivity treatment, it can still be used as a low-emissivity part. The nickel alloy plating layer exists as it is.

[Explanation of the boundary structure between the low emissivity area and the high emissivity area]

FIG. 6 is an explanatory diagram of a structure (boundary structure) near the boundary between the low emissivity portion EM1 and the high emissivity portion EM2 .

If referring to FIG. 6 , between the low emissivity portion EM1 and the high emissivity portion EM2 provided adjacent thereto, there is a low emissivity portion EM1 with a higher emissivity than the low emissivity portion EM1 and a lower emissivity than the high emissivity portion EM2. The middle part of the emissivity is EM3.

The above-mentioned high emissivity portion EM1 and the low emissivity portion EM2 are configured to be provided within a previously designed (set) range (hereinafter referred to as “design range”). However, in the processing described above, for example, the lower surface side of the shielding member MSK1 may be subjected to a high emissivity surface treatment. In this case, the above-mentioned intermediate portion EM3 is formed. At this time, by placing the middle portion EM3 in one of the design ranges A1 and A2 of the low emissivity portion EM1 and the high emissivity portion EM2 (the design range of the low emissivity portion EM1 in the example of FIG. A1), so that the other design range (the design range A2 of the high emissivity part EM2 in the example of FIG. In the example of FIG. 5, the high emissivity part EM2) is comprised. In addition, whether one of the design ranges A1 and A2 is constituted by only one of the high emissivity portion EM2 or the low emissivity portion EM1 can be appropriately adjusted as necessary by shifting the position of the shielding member MSK1.

The middle part EM3 here refers to the emissivity of the original low-emissivity part EM1 and high-emissivity part EM2, and the method of high-emissivity surface treatment. part of the distribution.

[Other embodiments of the low emissivity section and the high emissivity section]

In the vacuum pump P of FIG. 1 employing the rotating body 4 of FIG. 2 , the outer surface Q2 of the second cylindrical body 4B and the outer surface Q3 of the rotor blade 6 are constituted as the high emissivity portion EM2, whereby the The radiation amount of the heat of the cylindrical body 4B toward the exterior body 1 increases. Therefore, although not shown, the inner surface S2 of the second cylindrical body 4B can be configured as a high emissivity portion EM2 having a higher emissivity than the low emissivity portion EM1, thereby increasing the emissivity from the stator post 3 to the second cylinder. The amount of heat emitted in the direction of the body 4B is used to reduce the overheating of the stator column 3.

In the rotating body 4 of FIG. 2 , the end surface S4 of the first cylindrical body 4A is also constituted as the low emissivity portion EM1 , but instead of this, the end surface S4 may be constituted to have a lower emissivity portion than the low emissivity portion EM1. The high emissivity portion EM2 of the high emissivity portion EM1. According to this configuration, the radiation amount of heat in the direction of the pump base B from the end surface S4 of the first cylindrical body 4A increases, thereby improving the heat dissipation performance of the rotating body 4 as a whole.

FIG. 7 is an explanatory diagram of an example in which the surface of the rotor blade at the lowest stage is configured as a low emissivity portion.

In the rotating body 4 in FIG. 2 , the surfaces of all the rotor blades 6 are configured as the high emissivity portion EM2 , but instead of this, as shown in FIG. 7 , the lowest stage of the rotor blades 6 may be The surface of the blade 6E is configured to include a low emissivity portion EM1 having a lower emissivity than the high emissivity portion EM2 .

According to this structure, the amount of heat radiation from the fixed member (specifically, the screw groove pump stator 8 ) facing the lowest-stage rotor blade 6E to the direction of the lowest-stage rotor blade 6E is reduced, thereby effectively reducing the Overheating of rotor 6. Compared with configuring only the surface of the lowermost rotor blade 6E that faces the screw groove pump stator 8 as the low emissivity portion EM1, such an effect of reducing overheating of the rotor blade can be obtained more effectively, and it is also possible to omit Complicated masking processing such as masking only the opposing faces.

8 is an explanatory diagram of an example in which a member serving as a heat insulating member having a low-emissivity portion is interposed between the lowest-stage rotor blade and a fixed member opposed thereto.

Instead of configuring the surface of the lowest-stage rotor blade 6E as the low-emissivity portion EM1 as described above, as shown in FIG. 8) A structure in which a member (in the example of FIG. 8 , the lowest-stage fixed wing 7E whose surface constitutes the low-emissivity portion EM1 ) is interposed as a heat insulating member having a low-emissivity portion, can also obtain the above-mentioned structure. Such a rotor overheating reduction effect.

9 is an explanatory diagram of an example in which at least one of the upper and lower surfaces and the outer peripheral surface of the outer rim is constituted as a low emissivity portion, and FIG. Illustrating.

The vacuum pump P in FIG. 1 has a structure in which the radially arranged movable blades 6 and the stationary blades 7 are alternately arranged in multiple stages along the pump axis direction as described above, that is, the movable blade 6 in the direction of the pump axis among the plurality of movable blades 6 Between is provided with the structure of static wing 7. Furthermore, as shown in FIG. 9 , a plurality of stationary vanes 7 arranged radially in each stage have a structure in which their outer peripheral ends 7A are held by the outer rim 10 and their inner peripheral ends 7B are held by the inner rim 11 . Furthermore, the plurality of vanes 7 are fixed (supported) to the inner peripheral surface of the pump casing C by sandwiching the outer peripheral portion of the outer rim 10 or its vicinity by upper and lower spacers 9 (see FIG. 1 ). .

According to the fixed structure of the vane 7 as described above, the heat of the vane 7 is dissipated to the exterior body 1 side by heat conduction through the outer rim 10 and the spacer 9. Therefore, in order to improve the thermal conductivity of the heat dissipation path, it is preferable to As shown in FIG. 9, at least one of the upper and lower surfaces and the outer peripheral surface of the outer rim 10 (in the example of FIG. 9, the outer peripheral surface of the outer rim 10) is formed by non-plating or nickel alloy plating. The low emissivity part EM1 formed by the formed nickel alloy plating layer and the like.

When it is desired to configure the contact portion of the outer peripheral surface of the outer rim 10 that is in contact with the spacer 9 as the low emissivity portion EM1, for example, in a state where the stationary vanes 7 are butted and joined, the outer peripheral surface of the outer rim 10 is mounted with a A shield member made of a rubber ring or the like may be subjected to high emissivity surface treatment in this state. In this case, the vane 7 is subject to the high-emissivity surface treatment, while the contact portion of the outer peripheral surface of the outer rim 10 that has been masked and in contact with the spacer 9 is not subject to the high-emissivity surface treatment. , that is, a state without plating, and therefore constitutes a low-emissivity portion having an emissivity lower than that of the vane 7 .

In addition, referring to FIG. 9 , the outer rim 10 is integrally formed in an annular shape by butting and joining a plurality of rim members (in the example of FIG. The mating surfaces S5 of the individual rim members 10A, 10B are preferably constituted as low emissivity portions EM1 composed of no plating or nickel alloy plating formed by nickel alloy plating as shown in FIG. 10 .

According to such a configuration, for example, when heat is concentratedly accumulated in one rim member 10A, overheating of one rim member 10A can be effectively reduced by distributing the concentrated heat toward the other rim member 10B.

As a method of configuring the butting surface S5 of the rim members 10A, 10B as the low emissivity portion EM1 as described above, for example, it is conceivable to apply a high emissivity to the stator blade 7 in a state where the plurality of rim members 10A, 10B are butted and joined to each other. The method of surface treatment.

According to such a method, since the high-emissivity surface treatment is not applied between the butt surface S5 of the rim members 10A, 10B, the butt surface S5 has a higher emissivity than the surface of the vane 7 formed by the high-emissivity surface treatment. The emissivity part EM2 is in a low emissivity state.

In the case where the low emissivity portion EM1 is constituted by a nickel alloy plating layer and the high emissivity portion EM2 is constituted by a nickel oxide, as shown in FIG. After the low emissivity portion EM1 of the nickel alloy plating layer Me1, the surface of the nickel alloy plating layer Me1 is oxidized with a chemical solution to form the high emissivity portion EM2 of nickel oxide Me2. In this case, the high emissivity part EM2 which consists of nickel oxide Me2 has a structure formed on the low emissivity part EM which consists of nickel alloy plating layer Me1.

FIG. 11 is an explanatory diagram of an example in which a high emissivity portion is the uppermost layer of a multilayer structure.

The previously described high emissivity portion EM2 may also be formed, as shown in FIG. 11 , by forming a nickel alloy plating layer Me1 on the base layer Me0 after forming a base layer Me0 made of nickel alloy plating on the surface to be plated. After that, the surface of the nickel alloy plating layer Me1 is oxidized with a chemical solution (acid) to form the high emissivity portion EM2 made of nickel oxide Me2. In this case, the high emissivity portion EM2 made of nickel oxide Me2 has a structure formed on the nickel alloy plating layer Me1, that is, a multilayer structure (in the case of this embodiment, a two-layer structure). Peak.

As an advantage in this case, it is possible to prevent a gap at the boundary between the low-emission portion EM1 and the high-emission portion EM2 that is likely to occur in the partial plating method (1, 2), and to prevent a decrease in corrosion resistance against corrosive gas. . In addition, the number of pinholes generated in the low emissivity portion EM2 can be reduced.

[Explanation of cover parts]

FIG. 12 is an explanatory diagram of the surface roughness of the shielding member and the shielded surface, and FIG. 13 is an explanatory diagram of a state in which an elastic shielding member is attached to the shielded surface.

Since the solution used in the high-emissivity surface treatment in the first to fifth manufacturing methods described above is acidic, an acid-resistant specification is preferable as the shielding member MSK1 used in the high-emissivity surface treatment. As a material having acid resistance, there is a rubber material containing fluorine.

Referring to FIG. 12 , the shielding member MSK1 and the surface to be shielded (in the example of the figure, the outer surface of the first cylindrical body 4A) have inherent surface roughnesses SR1 and SR2, respectively. Therefore, when the shielding member MSK1 is installed on the shielded surface, it is inevitable that a gap G1 will be generated between the shielding member MSK1 and the shielded surface due to unevenness caused by surface roughness, and a high emissivity surface treatment is applied to the gap G1. possible. Therefore, it is preferable that the shielding member MSK1 has elasticity capable of deforming to follow the concave-convex shape caused by the surface roughness of the shielded surface.

Referring to FIG. 13 , the above-mentioned elastic shielding member MSK1 is formed in an annular shape, and the inner diameter of the shielding member MSK1 is set smaller than the outer diameter of the first cylindrical body 4A. If such a shielding member MSK1 is attached to the outer surface of the first cylindrical body 4A, the shielding member MSK1 that is elastically deformed and expanded during the attachment generates tension in the entire shielding member MSK1 by the restoring force that is about to return to the original state. , the surface pressure caused by tension is generated on the entire shielding member MSK1, so that the shielding member MSK1 is deformed to follow the uneven shape caused by the surface roughness of the shielded surface (the outer surface of the first cylindrical body 4A), and the above-mentioned gap G1 becomes smaller, and it is possible to reduce the need for low-emissivity surface treatment and high-emissivity surface treatment on unnecessary parts.

In addition, the respective embodiments described above may be used in combination.

The present invention is not limited to the embodiments described above, and many modifications can be made within the technical idea of the present invention by those having ordinary knowledge in the art.

[Description of Reference Signs]

1 exterior body

1A Gas suction port

2 gas exhaust ports

3 stator post

4 rotating bodies

41 axis of rotation

4A 1st cylinder

4B Second cylinder

4C link

4D fastening link

6 moving wings

6E The lowest level of the rotor

7 static wing

8 thread groove pump stator

8A threaded groove

9 Spacers

10 outer rim

10A, 10B rim parts

11 inner rim

A1 Design scope of low emissivity part

A2 Design scope of high emissivity part

B pump base

BT fastening bolt

C pump housing

G1 Gap due to surface roughness

EM1 Low emissivity department

EM2 High emissivity department

EM3 Middle

H1 Through Hole (Central Through Hole)

H2 Through hole (peripheral through hole)

LID cover parts

MSK1, MSK2 shielding parts

MB magnetic bearing

MT drive motor

Me0 basal layer

Me1 nickel alloy plating

Me2 nickel oxide

P vacuum pump

PB plating tank

PC protective cover

R gas flow path

R1 Suction side gas flow path

R2 Exhaust side gas flow path

Q1 The outer surface of the first cylinder

Q2 The outer surface of the second cylinder

Q3 Outer surface of moving wing

R1, R2 gas flow path

S Inner surface of the body of revolution

S1 Inner surface of the first cylinder

S2 Inner surface of the second cylinder

S3 Inner surface of fastening joint

S4 End face of the first cylindrical body

The mating surface of the S5 outer rim.

Claims (27)

1. A vacuum pump that uses the rotation of a rotating body to inhale and exhaust gas, wherein the above-mentioned vacuum pump is characterized in that, The rotating body includes a first cylindrical body constituting a screw groove pump mechanism part and a second cylindrical body constituting a turbomolecular pump mechanism part, and a plurality of moving blades are arranged in multiple stages on the outer peripheral surface of the second cylindrical body, At least a part of the cylindrical inner surface constituted by the inner surface of the first cylindrical body and the inner surface of the second cylindrical body, and the outer surface of the first cylindrical body are configured to have a higher emissivity than the outer surface of the rotor blade. Low emissivity part with small surface. 2. The vacuum pump according to claim 1, characterized in that, There is an intermediate portion between the low emissivity portion and the high emissivity portion adjacent to the low emissivity portion, and the intermediate portion has a higher emissivity than the low emissivity portion and a higher emissivity than the high emissivity portion small emissivity. 3. The vacuum pump according to claim 2, characterized in that, The middle portion is located within the design range of one of the respective design ranges of the high emissivity portion and the low emissivity portion, so that only the high emissivity portion excluding the middle portion or the above-mentioned Low emissivity part composition. 4. The vacuum pump according to claim 1, characterized in that, The inner surface of the second cylindrical body is configured to have a high emissivity portion having a higher emissivity than the low emissivity portion. 5. The vacuum pump according to claim 1, characterized in that, The end surface of the first cylindrical body is configured as a high emissivity portion having a higher emissivity than the low emissivity portion. 6. The vacuum pump according to claim 1, characterized in that, The end surface of the first cylindrical body is configured as a low emissivity portion having a lower emissivity than the high emissivity portion. 7. The vacuum pump according to claim 1, characterized in that, The surface of the lowermost rotor blade among the rotor blades is configured as the low emissivity portion. 8. The vacuum pump of claim 1, wherein: In the lowermost rotor blade among the rotor blades, the low emissivity portion is formed on a surface facing the fixing member of the screw groove pump mechanism portion. 9. The vacuum pump of claim 1, wherein: A shielding member is disposed between the lowermost movable blade among the movable blades and the fixing member of the screw groove pump mechanism, and the low emissivity portion is formed on the shielding member. 10. The vacuum pump of claim 1, wherein: Static vanes are arranged between the above-mentioned moving wings in the direction of the pump axis in the above-mentioned moving wings, The stationary blade includes an outer rim for being supported on an outer peripheral portion of the outer rim and/or in the vicinity of the outer peripheral portion, At least one of upper and lower surfaces and an outer peripheral surface of the outer rim constitutes the low emissivity portion. 11. The vacuum pump of claim 1, wherein: Static vanes are arranged between the above-mentioned moving wings in the direction of the pump axis in the above-mentioned moving wings, The stationary blade includes an outer rim for being supported on an outer peripheral portion of the outer rim and/or in the vicinity of the outer peripheral portion, The outer rim is integrally formed into a ring shape by butting and joining a plurality of rim members, The mating surface of the rim member is configured as the low emissivity portion. 12. The vacuum pump of claim 1, wherein: The low emissivity portion is constituted by a multilayer structure in which the second low emissivity portion is laminated on the first low emissivity portion. 13. A method for manufacturing a rotating body of a vacuum pump, which comprises manufacturing a rotating body of a vacuum pump comprising a first cylindrical body constituting a screw groove pump mechanism part and a second cylinder constituting a turbomolecular pump mechanism part A body in which a plurality of moving blades are arranged in multiple stages on the outer peripheral surface of the second cylindrical body, and the method for manufacturing the rotating body of the vacuum pump is characterized in that the method for manufacturing the rotating body of the vacuum pump includes the following steps: The protection step is to protect at least a part of the cylindrical inner surface composed of the inner surface of the first cylindrical body and the inner surface of the second cylindrical body and/or the outer surface of the first cylindrical body so as not to have been given a high emissivity surface treatment; and In the surface treatment step, the high emissivity surface treatment is applied to the rotating body after the protection step. 14. The method of manufacturing a rotating body of a vacuum pump according to claim 13, wherein: The rotating body has a through hole for fastening the first cylindrical body or the second cylindrical body to the rotating shaft, The protection step includes a process of sealing the through-hole. 15. The method of manufacturing the rotating body of a vacuum pump according to claim 13, wherein: There is a fastening and connecting process before the above-mentioned protection process, The rotating body has a plurality of through holes for fastening the first cylindrical body or the second cylindrical body to the rotating shaft, The above-mentioned fastening and connecting step is a step of inserting the end of the above-mentioned rotating shaft from the inner surface side of the above-mentioned rotating body into one of the through-holes located on the rotation center line of the above-mentioned rotating body in the above-mentioned through-hole, and then fastening and connecting Bolts are inserted and tightened into other through holes, thereby fastening the second cylindrical body to the rotating shaft, The protection step includes a step of attaching a protective cover to an end portion of the rotating shaft inserted in the fastening step. 16. The method of manufacturing a rotating body of a vacuum pump according to claim 15, wherein: The protective cover has the function of preventing the high emissivity surface treatment from being applied to the inner surface side of the rotating body through the gap between the fastening bolt and the through hole, and preventing the rotating shaft and the tightening caused by corrosive gas. The function of the corrosive products of the fastening bolts to flow out of the vacuum pump. 17. A method for manufacturing a rotating body of a vacuum pump, which comprises manufacturing a rotating body of a vacuum pump comprising a first cylindrical body constituting a screw groove pump mechanism part and a second cylinder constituting a turbomolecular pump mechanism part body, a plurality of moving blades are arranged in multiple stages on the outer peripheral surface of the second cylindrical body, and a through hole for fastening and coupling the first cylindrical body or the second cylindrical body to the rotating shaft is provided, and the vacuum pump The method of manufacturing a rotating body is characterized in that After the high-emissivity surface treatment is performed on the outer surface of the rotating body, the through-hole is processed. 18. A method for manufacturing a static vane of a vacuum pump, the vacuum pump being the vacuum pump according to any one of claims 1 to 12, the method for manufacturing the stationary vane of the vacuum pump is characterized in that: The outer rim of the stationary blade provided between the above-mentioned movable blades is formed into a ring shape as a whole by butting and joining a plurality of rim members, The high emissivity surface treatment is applied to the stator blade in a state where the rim member is butted and joined, so that the mating surface of the rim member has a higher emissivity than the surface of the stator blade formed by the high emissivity surface treatment. State of low emissivity. 19. The method of manufacturing a rotating body of a vacuum pump according to claim 17, wherein: When performing the above-mentioned high emissivity surface treatment, the outer surface of the above-mentioned first cylindrical body is protected by an acid-resistant shielding member. 20. The method of manufacturing a rotating body of a vacuum pump according to any one of claims 13 to 16, wherein: The above-mentioned protecting step includes a step of protecting with an acid-resistant shielding member. 21. The manufacturing method of the rotary body of the vacuum pump as claimed in claim 19 or 20, it is characterized in that, The shielding member is a rubber material containing fluorine. 22. A method for manufacturing a rotating body of a vacuum pump, which comprises manufacturing a rotating body of a vacuum pump comprising a first cylindrical body constituting a screw groove pump mechanism part and a second cylinder constituting a turbomolecular pump mechanism part A body, a plurality of movable blades are arranged in multiple stages on the outer peripheral surface of the second cylindrical body, and the method for manufacturing the rotating body of the vacuum pump is characterized in that the method for manufacturing the rotating body of the vacuum pump includes the following steps: A first surface treatment step of performing a low-emissivity surface treatment on at least a portion desired to be a low-emissivity portion of the entire outer peripheral surface of the rotating body; a masking step of masking the low-emissivity surface layer formed by the low-emissivity surface treatment in the first surface treatment step of the portion desired to constitute the low-emissivity portion; and In the second surface treatment step, a high-emissivity surface treatment is applied to the entirety of the rotating body masked in the masking step. 23. The method of manufacturing a rotating body of a vacuum pump according to claim 22, wherein: The above-mentioned first surface treatment step is a step of preparing a treatment tank filled with a low-emissivity surface treatment liquid, and immersing at least a part of the entire outer peripheral surface of the above-mentioned rotating body that is desired to be configured as the low-emissivity portion in the treatment. trough, so that the above-mentioned low emissivity surface treatment is applied to the part, The second surface treatment step is a step of preparing a treatment tank filled with a high-emissivity surface treatment liquid, immersing the entirety of the above-mentioned rotating body shielded by the above-mentioned masking step in the treatment tank, thereby performing the above-mentioned treatment on the above-mentioned rotating body. High emissivity surface treatment. 24. The manufacturing method of the rotary body of the vacuum pump as claimed in claim 22 or 23, it is characterized in that, The above-mentioned shielding step is a step of protecting with a shielding member. 25. The method for manufacturing the rotating body of a vacuum pump according to any one of claims 19 to 21, 24, wherein: The above-mentioned shielding member has elasticity capable of deforming following the concave-convex shape caused by the surface roughness of the shielded surface. 26. A rotating body, which is used in the vacuum pump according to any one of claims 1 to 12. 27. A static vane, which is used in the vacuum pump according to any one of claims 1 to 12.