CN108538985A - Light emitting diode and filament light-emitting diode lights including the light emitting diode - Google Patents
Light emitting diode and filament light-emitting diode lights including the light emitting diode Download PDFInfo
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/832—Electrodes characterised by their material
- H10H20/833—Transparent materials
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
- F21K9/00—Light sources using semiconductor devices as light-generating elements, e.g. using light-emitting diodes [LED] or lasers
- F21K9/20—Light sources comprising attachment means
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
- F21S2/00—Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction
- F21S2/005—Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction of modular construction
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V19/00—Fastening of light sources or lamp holders
- F21V19/001—Fastening of light sources or lamp holders the light sources being semiconductors devices, e.g. LEDs
- F21V19/0015—Fastening arrangements intended to retain light sources
- F21V19/002—Fastening arrangements intended to retain light sources the fastening means engaging the encapsulation or the packaging of the semiconductor device
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V23/00—Arrangement of electric circuit elements in or on lighting devices
- F21V23/06—Arrangement of electric circuit elements in or on lighting devices the elements being coupling devices, e.g. connectors
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
- H10H20/82—Roughened surfaces, e.g. at the interface between epitaxial layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/831—Electrodes characterised by their shape
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
- F21Y2115/00—Light-generating elements of semiconductor light sources
- F21Y2115/10—Light-emitting diodes [LED]
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Abstract
Description
技术领域technical field
本发明涉及一种发光二极管以及包括该发光二极管的灯丝发光二极管灯,具体地,提供一种发热量较低的发光二极管以及包括该发光二极管的灯丝发光二极管灯。The invention relates to a light-emitting diode and a filament light-emitting diode lamp including the light-emitting diode, in particular, provides a light-emitting diode with low calorific value and a filament light-emitting diode lamp including the light-emitting diode.
背景技术Background technique
通常,作为在室内或者室外的照明灯而较多地使用白炽灯或者荧光灯,但是这样的白炽灯或者荧光灯具有使用寿命短、耗电大的缺点。Generally, incandescent lamps or fluorescent lamps are often used as indoor or outdoor lighting lamps, but such incandescent lamps or fluorescent lamps have disadvantages of short service life and high power consumption.
为了解决这样的问题,研发出一种应用了具有简单的驱动控制、较快的响应速度、较长的使用寿命、耗电少以及高亮度特性的发光二极管的灯丝发光二极管灯。In order to solve such problems, a filament light-emitting diode lamp using a light-emitting diode having characteristics of simple driving control, fast response speed, long service life, low power consumption, and high brightness has been developed.
然而,灯丝发光二极管灯所包含的发光二极管一般大小较小,因此被驱动的电流密度大,因此产生较高温的热。另外,灯丝发光二极管灯包括多个发光二极管,多个发光二极管的配置间隔较密,所以因热受损的可能性较高。However, the LEDs contained in filament LED lamps are generally smaller in size, so they are driven with a higher current density and thus generate higher temperature heat. In addition, since the filament light-emitting diode lamp includes a plurality of light-emitting diodes, and the arrangement of the plurality of light-emitting diodes is closely spaced, there is a high possibility of heat damage.
发明内容Contents of the invention
本发明所要解决的课题是提供一种发热量较少的发光二极管。The problem to be solved by the present invention is to provide a light-emitting diode with less heat generation.
本发明所要解决的另一课题是提供一种正向电压低,且光提取效率得到改善的发光二极管。Another problem to be solved by the present invention is to provide a light emitting diode with low forward voltage and improved light extraction efficiency.
本发明所要解决的又一课题是提供一种可以防止电极的剥离的发光二极管。Still another problem to be solved by the present invention is to provide a light emitting diode capable of preventing peeling of electrodes.
本发明所要解决的又一课题是提供一种具有较高的可靠性的灯丝发光模块。Another problem to be solved by the present invention is to provide a filament light-emitting module with high reliability.
本发明所要解决的又一课题是提供一种包括具有较高的可靠性的灯丝发光模块的灯丝发光二极管灯。Another problem to be solved by the present invention is to provide a filament light-emitting diode lamp including a filament light-emitting module with high reliability.
根据本发明的一实施例的发光二极管的其特征在于,包括:半导体层叠体,其包括第一导电型半导体层、第二导电型半导体层、以及介于所述第一导电型半导体层与第二导电型半导体层之间的活性层;ZnO透明电极层,其位于所述第二导电型半导体层上;第一电极,其与所述第一导电型半导体层相连接;以及第二电极,其与所述ZnO透明电极层相连接,其中,所述ZnO透明电极层的表面包括局限于没有形成所述第二电极的部分而形成的凹凸。A light emitting diode according to an embodiment of the present invention is characterized by comprising: a semiconductor laminate including a first conductivity type semiconductor layer, a second conductivity type semiconductor layer, and a semiconductor layer between the first conductivity type semiconductor layer and the second conductivity type semiconductor layer The active layer between the two conductivity type semiconductor layers; the ZnO transparent electrode layer, which is located on the second conductivity type semiconductor layer; the first electrode, which is connected to the first conductivity type semiconductor layer; and the second electrode, It is connected with the ZnO transparent electrode layer, wherein the surface of the ZnO transparent electrode layer includes unevenness formed limited to the part where the second electrode is not formed.
所述ZnO透明电极层的末端可以与所述第二导电型半导体层的上表面所形成的角为直角或锐角。An angle formed by the end of the ZnO transparent electrode layer and the upper surface of the second conductive type semiconductor layer may be a right angle or an acute angle.
所述ZnO透明电极层的末端可以与所述第二导电型半导体层的上表面所形成的角为钝角。An angle formed by an end of the ZnO transparent electrode layer and an upper surface of the second conductive type semiconductor layer may be an obtuse angle.
所述半导体层叠体可以包括使所述第一导电型半导体层的一部分裸露的台面蚀刻区域,所述第一电极在所述台面蚀刻区域内与所述第一导电型半导体层相连接。The semiconductor stacked body may include a mesa-etched region exposing a part of the first conductive type semiconductor layer, and the first electrode is connected to the first conductive type semiconductor layer in the mesa-etched region.
所述第一电极可以包括第一电极焊盘以及从所述第一电极焊盘延伸的第一电极延伸部,所述第二电极可以包括第二电极焊盘以及从所述第二电极焊盘延伸的第二电极延伸部。The first electrode may include a first electrode pad and a first electrode extension extending from the first electrode pad, and the second electrode may include a second electrode pad and a first electrode extension extending from the second electrode pad. An extended second electrode extension.
根据本发明的一实施例的灯丝发光二极管灯的其特征在于,包括:灯座部;固定于所述灯座部的透明盖;以及位于所述透明盖内,且与所述灯座部连接的至少一个灯丝发光模块,其中,所述至少一个灯丝发光模块包括多个发光二极管,各个发光二极管包括:半导体层叠体,其包括第一导电型半导体层、第二导电型半导体层、以及介于所述第一导电型半导体层与第二导电型半导体层之间的活性层;ZnO透明电极层,其位于所述第二导电型半导体层上;第一电极,其与所述第一导电型半导体层相连接;以及第二电极,其与所述ZnO透明电极层相连接,其中,所述ZnO透明电极层的表面包括局限于没有形成所述第二电极的部分而形成的凹凸。A filament light-emitting diode lamp according to an embodiment of the present invention is characterized by comprising: a lamp holder; a transparent cover fixed to the lamp holder; and a transparent cover located in the transparent cover and connected to the lamp holder At least one filament light-emitting module, wherein the at least one filament light-emitting module includes a plurality of light-emitting diodes, and each light-emitting diode includes: a semiconductor stack, which includes a first conductivity type semiconductor layer, a second conductivity type semiconductor layer, and an intervening The active layer between the first conductive type semiconductor layer and the second conductive type semiconductor layer; the ZnO transparent electrode layer, which is located on the second conductive type semiconductor layer; the first electrode, which is connected to the first conductive type semiconductor layer The semiconductor layer is connected; and a second electrode is connected to the ZnO transparent electrode layer, wherein the surface of the ZnO transparent electrode layer includes unevenness limited to a portion where the second electrode is not formed.
所述ZnO透明电极层的末端可以与所述第二导电型半导体层的上表面所形成的角为直角或锐角。An angle formed by the end of the ZnO transparent electrode layer and the upper surface of the second conductive type semiconductor layer may be a right angle or an acute angle.
所述ZnO透明电极层的末端可以与所述第二导电型半导体层的上表面所形成的角为钝角。An angle formed by an end of the ZnO transparent electrode layer and an upper surface of the second conductive type semiconductor layer may be an obtuse angle.
所述半导体层叠体可以包括使所述第一导电型半导体层的一部分裸露的台面蚀刻区域,所述第一电极在所述台面蚀刻区域内与所述第一导电型半导体层相连接。The semiconductor stacked body may include a mesa-etched region exposing a part of the first conductive type semiconductor layer, and the first electrode is connected to the first conductive type semiconductor layer in the mesa-etched region.
所述第一电极可以包括第一电极焊盘以及从所述第一电极焊盘延伸的第一电极延伸部,所述第二电极可以包括第二电极焊盘以及从所述第二电极焊盘延伸的第二电极延伸部。The first electrode may include a first electrode pad and a first electrode extension extending from the first electrode pad, and the second electrode may include a second electrode pad and a first electrode extension extending from the second electrode pad. An extended second electrode extension.
还可以包括用于控制所述至少一个灯丝发光模块的驱动的驱动器。A driver for controlling the driving of the at least one filament light emitting module may also be included.
还可以包括用于将所述至少一个灯丝发光模块固定于所述灯座部的支撑体。A supporting body for fixing the at least one filament light-emitting module to the lamp socket part may also be included.
所述灯丝发光模块还可以包括:支撑基板;以及位于所述支撑基板的两端的电极,所述多个发光二极管贴装于所述支撑基板上。The filament light-emitting module may further include: a support substrate; and electrodes located at both ends of the support substrate, and the plurality of light-emitting diodes are mounted on the support substrate.
所述灯丝发光模块还可以包括覆盖贴装有所述多个发光二极管的支撑基板的波长转换层。The filament light-emitting module may further include a wavelength conversion layer covering the support substrate on which the plurality of light-emitting diodes are mounted.
所述支撑基板可以具有直线型杆形状。The support substrate may have a linear rod shape.
所述支撑基板包括至少一部分的曲线区域。The support substrate includes at least a portion of a curved area.
所述透明盖的内部可以为真空状态。The inside of the transparent cover may be in a vacuum state.
根据本发明的实施例的发光二极管包括厚度较厚的ZnO透明电极层,从而能够用较低的正向电压驱动,因此自身产生的热量能够较少。另外,包括发热量较少的发光二极管的灯丝发光二极管灯即使不包括用于散热的其他散热板、散热气体,也可以有效地工作。The light emitting diode according to the embodiment of the present invention includes a thicker ZnO transparent electrode layer, so that it can be driven with a lower forward voltage, and thus less heat can be generated by itself. In addition, the filament light-emitting diode lamp including light-emitting diodes that generate less heat can work efficiently even without including other heat dissipation plates and heat dissipation gas for heat dissipation.
附图说明Description of drawings
图1是根据本发明的实施例的发光二极管的平面图;图2是沿着图1的切割线A-A'得到的剖面图;图3是沿着图1的切割线B-B'得到的剖面图。Fig. 1 is a plan view of a light emitting diode according to an embodiment of the present invention; Fig. 2 is a cross-sectional view obtained along the cutting line AA' of Fig. 1; Fig. 3 is obtained along the cutting line BB' of Fig. 1 Sectional view.
图4至图10是用于说明根据本发明的实施例的发光二极管的制造方法的示意性剖面图。4 to 10 are schematic cross-sectional views for explaining a method of manufacturing a light emitting diode according to an embodiment of the present invention.
图11a至图11c示出本根据发明的一实施例的灯丝发光模块的制造方法及灯丝发光模块。11a to 11c show a method for manufacturing a filament light-emitting module and a filament light-emitting module according to an embodiment of the present invention.
图12至图15示出根据本发明的灯丝发光二极管灯的各种实施例。12 to 15 show various embodiments of filament LED lamps according to the invention.
具体实施方式Detailed ways
为使本发明所属技术领域的一般技术人员能够充分理解本发明的思想,举例说明以下实施例。因此,本发明并不限定于以下所述的实施例,也可以通过其他方式实现。并且,在附图中,为了便于说明组件的宽度、长度以及厚度等,有时会采用夸张的描述方式。另外,在记载为一个组件位于另一组件的“上部”或者“上方”的情况下,不仅包括各部分位于另一部分的“正上部”或者“正上方”的情况,而且还包括在各组件与其他组件之间设有其他组件的情况。在整个说明书中,相同的附图符号表示相同的组件。In order to enable those of ordinary skill in the technical field of the present invention to fully understand the idea of the present invention, the following embodiments are exemplified. Therefore, the present invention is not limited to the embodiments described below, but can also be implemented in other ways. In addition, in the drawings, in order to illustrate the width, length, thickness, etc. of the components, exaggerated descriptions are sometimes used. In addition, when it is described that one component is located "on" or "above" another component, not only the case where each part is located "directly above" or "directly above" another part, but also the case where each component is located on the other side is also included. A case where other components are placed between other components. Throughout the specification, the same reference symbols refer to the same components.
根据本发明的实施例的发光二极管其特征在于,包括:半导体层叠体,其包括第一导电型半导体层、第二导电型半导体层、以及介于所述第一导电型半导体层与第二导电型半导体层之间的活性层;ZnO透明电极层,其位于所述第二导电型半导体层上;第一电极,其与所述第一导电型半导体层相连接;以及第二电极,其与所述ZnO透明电极层相连接,其中,其中,所述ZnO透明电极层的表面具有局限于没有形成所述第二电极的部分而形成的凹凸。A light emitting diode according to an embodiment of the present invention is characterized by comprising: a semiconductor laminate including a first conductivity type semiconductor layer, a second conductivity type semiconductor layer, and a semiconductor layer between the first conductivity type semiconductor layer and the second conductivity type active layer between the semiconductor layers; ZnO transparent electrode layer, which is located on the second conductive semiconductor layer; a first electrode, which is connected with the first conductive semiconductor layer; and a second electrode, which is connected with the semiconductor layer of the second conductive type. The ZnO transparent electrode layers are connected, wherein the surface of the ZnO transparent electrode layer has concavities and convexities limited to a portion where the second electrode is not formed.
其特征在于,所述凹凸具有50nm以上的大小。It is characterized in that the unevenness has a size of 50 nm or more.
另外,其特征在于,所述ZnO透明电极层的末端与所述第二导电型半导体层的上表面形成的角为直角或锐角或钝角。In addition, it is characterized in that the angle formed by the end of the ZnO transparent electrode layer and the upper surface of the second conductivity type semiconductor layer is a right angle or an acute angle or an obtuse angle.
所述半导体层叠体包括使所述第一导电型半导体层的一部分裸露的台面蚀刻区域,所述第一电极焊盘以及第一电极延伸部在所述台面蚀刻区域内与所述第一导电型半导体层相连接。The semiconductor laminate includes a mesa-etched region exposing a part of the semiconductor layer of the first conductivity type, and the first electrode pad and the first electrode extension are in the mesa-etched region in contact with the first conductivity-type semiconductor layer. The semiconductor layer is connected.
所述第一电极包括第一电极焊盘及从所述第一电极焊盘延伸的第一电极延伸部,所述第二电极包括第二电极焊盘及从所述第二电极焊盘延伸的第二电极延伸部。The first electrode includes a first electrode pad and a first electrode extension extending from the first electrode pad, and the second electrode includes a second electrode pad and a first electrode extension extending from the second electrode pad. The second electrode extension.
根据本发明的实施例的灯丝发光二极管灯的其特征在于,包括:灯座部;透明盖,固定于所述灯座部;至少一个灯丝发光模块,位于所述透明盖内,与所述灯座部相连接,其中,所述至少一个灯丝发光模块包括多个发光二极管,各个发光二极管包括:半导体层叠体,其包括第一导电型半导体层、第二导电型半导体层、以及介于所述第一导电型半导体层与第二导电型半导体层之间的活性层;ZnO透明电极层,其位于所述第二导电型半导体层上;第一电极,其与所述第一导电型半导体层相连接;以及第二电极,其与所述ZnO透明电极层相连接,其中,所述ZnO透明电极层的表面具有局限于没有形成所述第二电极的部分而形成的凹凸。The filament light-emitting diode lamp according to the embodiment of the present invention is characterized in that it comprises: a lamp holder; a transparent cover fixed on the lamp holder; at least one filament light-emitting module located in the transparent cover and connected to the lamp The seats are connected, wherein the at least one filament light-emitting module includes a plurality of light-emitting diodes, and each light-emitting diode includes: a semiconductor stack, which includes a first conductivity type semiconductor layer, a second conductivity type semiconductor layer, and a semiconductor layer interposed between the The active layer between the first conductivity type semiconductor layer and the second conductivity type semiconductor layer; the ZnO transparent electrode layer, which is located on the second conductivity type semiconductor layer; the first electrode, which is connected with the first conductivity type semiconductor layer and a second electrode, which is connected to the ZnO transparent electrode layer, wherein the surface of the ZnO transparent electrode layer has unevenness limited to a portion where the second electrode is not formed.
所述灯丝发光二极管灯还可以包含用于控制所述至少一个灯丝发光模块的驱动的驱动器,并且,还可以包括将所述至少一个灯丝发光模块固定于所述灯座部的支撑体。The filament light-emitting diode lamp may further include a driver for controlling the driving of the at least one filament light-emitting module, and may further include a support for fixing the at least one filament light-emitting module to the lamp socket.
在这里,所述灯丝发光模块的特征在于,还包括支撑基板;以及位于所述支撑基板两端的电极,所述多个发光二极管贴装于所述支撑基板上。Here, the filament light-emitting module is characterized in that it further includes a support substrate; and electrodes located at both ends of the support substrate, and the plurality of light-emitting diodes are mounted on the support substrate.
所述灯丝发光模块还可以包括覆盖贴装有所述多个发光二极管的支撑基板的波长转换层。The filament light-emitting module may further include a wavelength conversion layer covering the support substrate on which the plurality of light-emitting diodes are mounted.
在这里,所述支撑基板整体上可以具有直线型杆形状或者包括至少一部分的曲线区域。所述透明盖的内部可以保持真空状态。Here, the support substrate may have a linear rod shape as a whole or include at least a part of a curved area. The inside of the transparent cover can maintain a vacuum state.
以下,参照附图详细说明本发明的实施例。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
图1是根据本发明的实施例的发光二极管的平面图;图2是沿着图1的切割线A-A'得到的剖面图;图3是沿着图1的切割线B-B'得到的剖面图。Fig. 1 is a plan view of a light emitting diode according to an embodiment of the present invention; Fig. 2 is a cross-sectional view obtained along the cutting line AA' of Fig. 1; Fig. 3 is obtained along the cutting line BB' of Fig. 1 Sectional view.
参照图1至图3,根据本实施例的发光二极管包括:基板10;半导体层叠体20,其位于所述基板10上,且包括第一导电型半导体层21、活性层23以及第二导电型半导体层25;以及透明电极层30,其位于所述半导体层叠体20上。另外,发光二极管还包括与第一导电型半导体层21相连接的第一电极40以及与透明电极层30相连接的第二电极50。Referring to FIGS. 1 to 3 , the light emitting diode according to the present embodiment includes: a substrate 10; a semiconductor stack 20, which is located on the substrate 10, and includes a first conductivity type semiconductor layer 21, an active layer 23 and a second conductivity type semiconductor layer 21; a semiconductor layer 25 ; and a transparent electrode layer 30 located on the semiconductor stack 20 . In addition, the light emitting diode further includes a first electrode 40 connected to the first conductive type semiconductor layer 21 and a second electrode 50 connected to the transparent electrode layer 30 .
发光二极管可以具有长方形的平面形状,据此可以包括第一侧面1、第二侧面2、与第一侧面1相对的第三侧面3以及与第二侧面2相对的第四侧面4。然而,根据本发明的发光二极管的平面形状并不限定于此,可以包括各种各样的形状。The light emitting diode may have a rectangular planar shape, thereby including a first side 1 , a second side 2 , a third side 3 opposite to the first side 1 , and a fourth side 4 opposite to the second side 2 . However, the planar shape of the light emitting diode according to the present invention is not limited thereto, and various shapes may be included.
如果基板10是适合于使氮化镓系半导体层叠体20生长的基板10,则不受特殊限定。基板10例如可以包括蓝宝石基板10、碳化硅基板10、氮化镓基板10、氮化铝基板10、硅基板10等。The substrate 10 is not particularly limited as long as it is a substrate 10 suitable for growing the gallium nitride-based semiconductor laminate 20 . The substrate 10 may include, for example, a sapphire substrate 10 , a silicon carbide substrate 10 , a gallium nitride substrate 10 , an aluminum nitride substrate 10 , a silicon substrate 10 and the like.
第一导电型半导体层21可以位于所述基板10上。第一导电型半导体层21是掺杂有第一导电型掺杂剂的半导体层。第一导电型半导体层21可以由GaN层、InGaN层、AlGaN层、InAlGaN层中的至少一种形成,在所述第一导电型半导体层21为n型半导体层时,所述第一导电型掺杂剂可以包括作为n型掺杂剂的Si、Ge、Sn、Se、Te中的一种以上。The first conductive type semiconductor layer 21 may be located on the substrate 10 . The first conductivity type semiconductor layer 21 is a semiconductor layer doped with a first conductivity type dopant. The first conductivity type semiconductor layer 21 can be formed by at least one of a GaN layer, an InGaN layer, an AlGaN layer, and an InAlGaN layer. When the first conductivity type semiconductor layer 21 is an n-type semiconductor layer, the first conductivity type The dopant may include one or more of Si, Ge, Sn, Se, and Te as n-type dopants.
活性层23可以位于第一导电型半导体层21上。活性层23可以形成为单量子阱或者多重量子阱(MQW)结构。活性层23可以利用3族-5族化合物半导体材料而形成为GaN层、InGaN层、AlGaN层、InAlGaN层中的至少一种。例如,活性层23可以具有包括InGaN层的阱层和包括GaN层的势垒层(barrier)交替重复层叠的结构。活性层23可以通过从第一导电型半导体层21供应的载子和从后述的第二导电型半导体层25供应的载子所重组的机理而产生光。当所述第一导电型半导体层21为n型半导体层时,从所述第一导电型半导体层21供应的载子可以是电子,当第二导电型半导体层25为p型半导体层时,从所述第二导电型半导体层25供应的载子可以是空穴。The active layer 23 may be on the first conductive type semiconductor layer 21 . The active layer 23 may be formed in a single quantum well or multiple quantum well (MQW) structure. The active layer 23 may be formed as at least one of a GaN layer, an InGaN layer, an AlGaN layer, and an InAlGaN layer using a Group 3-5 compound semiconductor material. For example, the active layer 23 may have a structure in which well layers including InGaN layers and barrier layers (barrier layers) including GaN layers are alternately and repeatedly stacked. The active layer 23 can generate light by a mechanism of recombination of carriers supplied from the first conductive type semiconductor layer 21 and carriers supplied from the second conductive type semiconductor layer 25 described later. When the first conductivity type semiconductor layer 21 is an n-type semiconductor layer, the carriers supplied from the first conductivity type semiconductor layer 21 may be electrons; when the second conductivity type semiconductor layer 25 is a p-type semiconductor layer, Carriers supplied from the second conductive type semiconductor layer 25 may be holes.
虽然未在附图中图示,但发光二极管还可以包括位于所述第一导电型半导体层21和活性层23之间的超晶格层。超晶格层可以阻挡根据基板10和第一导电型半导体层21的晶格常数差异而使形成于第一导电型半导体层21的转位(dislocation)向活性层23的转移,从而提高活性层23的结点品质。Although not shown in the drawings, the light emitting diode may further include a superlattice layer between the first conductive type semiconductor layer 21 and the active layer 23 . The superlattice layer can block the transfer of the dislocation (dislocation) formed in the first conductivity type semiconductor layer 21 to the active layer 23 according to the lattice constant difference between the substrate 10 and the first conductivity type semiconductor layer 21, thereby improving the activity of the active layer. 23 node quality.
第二导电型半导体层25可以位于活性层23上。第二导电型半导体层25包括掺杂有第二导电型掺杂剂的半导体层,可以形成为单层或者多层。所述第二导电型半导体层25可以由GaN层、InGaN层、AlGaN层、InAlGaN层中的至少一种形成。当第二导电型半导体层25为p型半导体层时,所述第二导电型掺杂剂可以包括作为p型掺杂剂的Mg、Zn、Ca、Sr、Ba中的一种以上。The second conductive type semiconductor layer 25 may be on the active layer 23 . The second conductivity type semiconductor layer 25 includes a semiconductor layer doped with a second conductivity type dopant, and may be formed as a single layer or multiple layers. The second conductivity type semiconductor layer 25 may be formed of at least one of a GaN layer, an InGaN layer, an AlGaN layer, and an InAlGaN layer. When the second conductivity type semiconductor layer 25 is a p-type semiconductor layer, the second conductivity type dopant may include more than one of Mg, Zn, Ca, Sr, and Ba as a p-type dopant.
除了第一导电型半导体层21、活性层23以及第二导电型半导体层25之外,为了提高结晶品质,半导体层叠体20可以包括非掺杂层或者其他缓冲层,当第二导电型半导体层25为p型半导体层时,可以如在活性层23和第二导电型半导体层25之间形成的电流阻挡层(未图示)地包括各种各样的功能层。In addition to the first conductivity type semiconductor layer 21, the active layer 23 and the second conductivity type semiconductor layer 25, in order to improve the crystal quality, the semiconductor laminate 20 may include an undoped layer or other buffer layers, when the second conductivity type semiconductor layer When 25 is a p-type semiconductor layer, various functional layers may be included such as a current blocking layer (not shown) formed between the active layer 23 and the second conductivity type semiconductor layer 25 .
半导体层叠体20可以在腔体内利用MOCVD(Metal Organic Chemical VaporDepositin,金属有机物化学气相沉积)技术生长于基板10上。然而,本发明的实施例并不限定于此,所述半导体层叠体20可以利用MBE(Molecular Beam Epitaxy,分子束外延)、HVPE(Hydride Vapor Phase Epitaxy,氢化物气相外延)等技术生长于所述基板10上。The semiconductor laminate 20 can be grown on the substrate 10 in a cavity by using MOCVD (Metal Organic Chemical Vapor Depositin, Metal Organic Chemical Vapor Deposition) technology. However, the embodiments of the present invention are not limited thereto, and the semiconductor laminate 20 can be grown on the semiconductor laminate 20 by techniques such as MBE (Molecular Beam Epitaxy, Molecular Beam Epitaxy), HVPE (Hydride Vapor Phase Epitaxy, Hydride Vapor Phase Epitaxy) and the like. on the substrate 10.
所述半导体层叠体20可以包括使第一导电型半导体层21的一部分裸露的台面蚀刻区域20a。所述台面蚀刻区域20a可以通过对第二导电型半导体层25以及活性层23的一部分进行蚀刻而形成。另外,在台面蚀刻区域20a的形成过程中,第一导电型半导体层21的一部分也可以被蚀刻。参照图1,台面蚀刻区域20a可以在从发光二极管的第二侧面2和第三侧面3相遇的边角沿着第二侧面2向第一侧面1的方向延伸的部分具有相对较宽的形状。台面蚀刻区域20a可以提供用于形成后述的第一电极40的区域。The semiconductor stacked body 20 may include a mesa-etched region 20 a exposing a part of the first conductivity type semiconductor layer 21 . The mesa etching region 20 a may be formed by etching a part of the second conductive type semiconductor layer 25 and the active layer 23 . In addition, a part of the first conductive type semiconductor layer 21 may also be etched during the formation of the mesa-etched region 20a. Referring to FIG. 1 , the mesa-etched region 20a may have a relatively wide shape at a portion extending from the corner where the second side 2 and the third side 3 of the light emitting diode meet along the second side 2 toward the first side 1 . The mesa-etched region 20 a can provide a region for forming a first electrode 40 described later.
透明电极层30可以位于第二导电型半导体层25上。透明电极层30是由金属氧化物形成的欧姆接触层,尤其,在第二导电型半导体层25为p型半导体层时,通过与第二导电型半导体层25形成欧姆接触而可以提高电流扩散效果。The transparent electrode layer 30 may be located on the second conductive type semiconductor layer 25 . The transparent electrode layer 30 is an ohmic contact layer formed of a metal oxide. Especially, when the second conductive type semiconductor layer 25 is a p-type semiconductor layer, the current spreading effect can be improved by forming an ohmic contact with the second conductive type semiconductor layer 25. .
根据本发明的发光二极管可以包括ZnO透明电极层30。ZnO透明电极层30与ITO透明电极层30相比,具有吸光率较低的特性。例如,假设具有相同的厚度时,ZnO透明电极层30的光吸光率可相当于ITO透明电极层30的光吸光率的1/20水平,由此,被ZnO透明电极层30吸收而损耗的光量可能会比ITO透明电极层30小。A light emitting diode according to the present invention may include a ZnO transparent electrode layer 30 . The ZnO transparent electrode layer 30 has a lower light absorption rate than the ITO transparent electrode layer 30 . For example, when assuming the same thickness, the light absorptivity of the ZnO transparent electrode layer 30 can be equivalent to the 1/20 level of the light absorptivity of the ITO transparent electrode layer 30, thus, the amount of light absorbed by the ZnO transparent electrode layer 30 and lost It may be smaller than the ITO transparent electrode layer 30 .
ZnO透明电极层30由于具有光吸收率较低的特性,因此可以形成为较厚的厚度。随着较厚地形成透明电极层30的厚度,可以期待如下效果。Since the ZnO transparent electrode layer 30 has a characteristic of low light absorption rate, it can be formed thick. As the thickness of the transparent electrode layer 30 is formed thicker, the following effects can be expected.
首先,根据电阻值与厚度成反比的特性,在将透明电极层30的厚度形成为较厚时,透明电极层30的电阻值可以变小。当透明电极层30的电阻值变小时,电流扩散较易,其结果,发光二极管的正向电压(Vf)会变小。当施加相同大小的电流时,发光二极管的正向电压(Vf)越小则耗电会越小,其结果,发光二极管的发热量也可以变小。First, according to the property that the resistance value is inversely proportional to the thickness, when the thickness of the transparent electrode layer 30 is formed thicker, the resistance value of the transparent electrode layer 30 can be reduced. When the resistance value of the transparent electrode layer 30 becomes smaller, the current spreads more easily, and as a result, the forward voltage (Vf) of the LED becomes smaller. When the same magnitude of current is applied, the smaller the forward voltage (Vf) of the light-emitting diode is, the smaller the power consumption will be. As a result, the heat generation of the light-emitting diode can also be reduced.
另外,在将透明电极层30的厚度形成为较厚时,有利于在透明电极层30表面形成凹凸31的工序,并且,对所形成的凹凸31的大小的限制可能会较小。在透明电极层30的表面形成的一定大小的凹凸31可以降低光的全反射率从而提高发光二极管的光提取效率。在根据本申请发明的发光二极管的ZnO透明电极层30的表面形成的凹凸可以具有50nm以上的大小。然而,在透明电极层30如ITO透明电极层一样地较薄的情况下,也可以在其表面形成凹凸,但在这种情况下,凹凸形成工艺可能会很棘手,所形成的凹凸的大小可能会受很大限制。在凹凸的大小受限的情况下,无法有效地减少光的全反射。In addition, when the thickness of the transparent electrode layer 30 is thicker, the step of forming the unevenness 31 on the surface of the transparent electrode layer 30 is facilitated, and there may be less restrictions on the size of the formed unevenness 31 . The irregularities 31 of a certain size formed on the surface of the transparent electrode layer 30 can reduce the total reflectance of light so as to improve the light extraction efficiency of the LED. The unevenness formed on the surface of the ZnO transparent electrode layer 30 of the light emitting diode according to the invention of the present application may have a size of 50 nm or more. However, in the case where the transparent electrode layer 30 is as thin as the ITO transparent electrode layer, unevenness can also be formed on the surface, but in this case, the unevenness forming process may be difficult, and the size of the formed unevenness may be will be greatly restricted. When the size of the bumps is limited, the total reflection of light cannot be effectively reduced.
参照图2及图3,虽然凹凸31形成于透明电极层30的表面,但具有不形成于与第二电极50连接的区域α的特征。即,凹凸31可以在透明电极层30的表面的除了第二电极焊盘51及第二电极延伸部53所连接的区域α之外的其他区域形成。这是因为,在透明电极层30的表面,在连接第二电极50的区域α形成凹凸时,第二电极50容易从透明电极层30剥离。因此,为了提高发光二极管的可靠性,透明电极层30的表面与第二电极50相连接的区域α可以不包括凹凸31。Referring to FIGS. 2 and 3 , although the unevenness 31 is formed on the surface of the transparent electrode layer 30 , it has a characteristic that it is not formed in the region α connected to the second electrode 50 . That is, the unevenness 31 may be formed in other areas of the surface of the transparent electrode layer 30 except the area α where the second electrode pad 51 and the second electrode extension 53 are connected. This is because the second electrode 50 is easily peeled off from the transparent electrode layer 30 when the surface of the transparent electrode layer 30 is uneven in the region α connected to the second electrode 50 . Therefore, in order to improve the reliability of the light emitting diode, the region α where the surface of the transparent electrode layer 30 is connected to the second electrode 50 may not include the unevenness 31 .
第一电极40可以位于通过台面蚀刻区域20a裸露的第一导电型半导体层21上。第一电极40可以包括第一电极焊盘41以及从第一电极焊盘41延伸的第一电极延伸部43。参照图1,第一电极焊盘41在发光二极管的第二侧面2与第三侧面3相接的边角附近的台面蚀刻区域20a内,可以位于第一导电型半导体层21上。另外,第一电极延伸部43可以从第一电极焊盘41延伸并沿着发光二极管的第二侧面2而向第一侧面1的方向延伸。The first electrode 40 may be located on the first conductive type semiconductor layer 21 exposed by the mesa-etched region 20a. The first electrode 40 may include a first electrode pad 41 and a first electrode extension 43 extending from the first electrode pad 41 . Referring to FIG. 1 , the first electrode pad 41 may be located on the first conductivity type semiconductor layer 21 in the mesa etching region 20a near the corner where the second side 2 and the third side 3 of the LED meet. In addition, the first electrode extension 43 may extend from the first electrode pad 41 and extend toward the first side 1 along the second side 2 of the LED.
第二电极50可以位于透明电极层30上。即,第二电极50可以位于透明电极层30上,而与第二导电型半导体层25电性连接。第二电极50可以包括第二电极焊盘51以及从第二电极焊盘51延伸的第二电极延伸部53。参照图1,第二电极焊盘51可以在发光二极管的第一侧面1与第四侧面4相接的边角附近,位于透明电极层30上。另外,第二电极延伸部53可以从第二电极焊盘51延伸并沿着发光二极管的第四侧面4向第三侧面3的方向延伸。The second electrode 50 may be located on the transparent electrode layer 30 . That is, the second electrode 50 may be located on the transparent electrode layer 30 and electrically connected to the second conductive type semiconductor layer 25 . The second electrode 50 may include a second electrode pad 51 and a second electrode extension 53 extending from the second electrode pad 51 . Referring to FIG. 1 , the second electrode pad 51 may be located on the transparent electrode layer 30 near the corner where the first side 1 and the fourth side 4 of the LED meet. In addition, the second electrode extension part 53 may extend from the second electrode pad 51 and extend along the direction from the fourth side 4 to the third side 3 of the LED.
第一电极焊盘41以及第二电极焊盘51用于电连接发光二极管,例如,可以在第一电极焊盘41以及第二电极焊盘51分别形成引线键合。通过分别与第一电极焊盘41和第二电极焊盘51键合的引线,发光二极管可以与外部装置电连接,且可以得到电力供给。根据第一电极焊盘41及第二电极焊盘51在发光二极管上的两个边角相面对地配置的结构,可以有效地实现电流扩散。另外,借助第一电极延伸部43以及第二电极延伸部53,可以在发光二极管有效地实现电流扩散,其结果,可以提高发光二极管的输出。The first electrode pad 41 and the second electrode pad 51 are used to electrically connect the light emitting diodes, for example, wire bonding can be formed on the first electrode pad 41 and the second electrode pad 51 respectively. Through the wires respectively bonded to the first electrode pad 41 and the second electrode pad 51 , the light emitting diode can be electrically connected to an external device and can be supplied with power. According to the structure in which the two corners of the first electrode pad 41 and the second electrode pad 51 are arranged facing each other on the light emitting diode, current spreading can be effectively realized. In addition, the first electrode extension 43 and the second electrode extension 53 can efficiently spread current in the light emitting diode, and as a result, the output of the light emitting diode can be improved.
第一电极40及第二电极50虽然并不限定于此,但可以由从金(Au)、银(Ag)、铝(Al)、铜(Cu)或者包括这些的合金中选择的至少一种导电性材料形成。并且,第一电极40和第二电极50可以通过相同的工序形成。Although the first electrode 40 and the second electrode 50 are not limited thereto, they may be made of at least one selected from gold (Au), silver (Ag), aluminum (Al), copper (Cu), or alloys including these. Conductive material is formed. Also, the first electrode 40 and the second electrode 50 may be formed through the same process.
图4至图10是用于说明根据本发明的实施例的发光二极管的制造方法的示意性剖面图。4 to 10 are schematic cross-sectional views for explaining a method of manufacturing a light emitting diode according to an embodiment of the present invention.
参照图4,首先准备基板10,然后在所述基板10上形成半导体层叠体20及透明电极层30。半导体层叠体20可以包括氮化物系半导体层,透明电极层30可以包括ZnO透明电极层30。半导体层叠体20,例如,可以通过将基板10配置在腔体内,并利用MOCVD(Metal OrganicChemical Vapor Depositin)技术而生长于基板10上。ZnO透明电极层30,可以通过将生长有半导体层叠体20的基板10配置在腔体内,并利用水热合成(hydrothermal synthesis)技术而生长于所述半导体层叠体20上。ZnO透明电极层30与位于其下方的半导体层叠体20相同地具有纤锌矿(wurtzite)结晶结构。Referring to FIG. 4 , first, a substrate 10 is prepared, and then a semiconductor laminate 20 and a transparent electrode layer 30 are formed on the substrate 10 . The semiconductor laminate 20 may include a nitride-based semiconductor layer, and the transparent electrode layer 30 may include a ZnO transparent electrode layer 30 . The semiconductor laminate 20 can be grown on the substrate 10 by, for example, disposing the substrate 10 in a cavity and utilizing MOCVD (Metal Organic Chemical Vapor Depositin) technology. The ZnO transparent electrode layer 30 can be grown on the semiconductor stack 20 by arranging the substrate 10 on which the semiconductor stack 20 has been grown in a cavity, and utilizing a hydrothermal synthesis technique. The ZnO transparent electrode layer 30 has the same wurtzite crystal structure as the semiconductor laminate 20 located thereunder.
参照图5,在透明电极层30上形成第一掩膜60。第一掩膜60可以包括使透明电极层30的一部分裸露的第一开口部60a。Referring to FIG. 5 , a first mask 60 is formed on the transparent electrode layer 30 . The first mask 60 may include a first opening part 60 a exposing a part of the transparent electrode layer 30 .
参照图6a至图6c,可以利用第一掩膜60的第一开口部60a而将透明电极层30蚀刻。根据本发明的发光二极管包括ZnO透明电极层30,ZnO具有对酸非常脆弱的特性。因此,可以利用酸性溶液对通过第一掩膜60的第一开口部60a裸露的透明电极层30进行湿式蚀刻。Referring to FIGS. 6 a to 6 c , the transparent electrode layer 30 may be etched using the first opening portion 60 a of the first mask 60 . The light emitting diode according to the present invention comprises a transparent electrode layer 30 of ZnO, which has a property of being very fragile to acids. Therefore, the transparent electrode layer 30 exposed through the first opening 60 a of the first mask 60 may be wet-etched using an acidic solution.
在这种情况下,在进行湿式蚀刻时,可以通过控制酸性溶液的ph值来控制透明电极层30的末端与第二导电型半导体层25的上表面形成的倾斜度。例如,在利用ph值较低的强酸性溶液湿式蚀刻ZnO透明电极层30时,如图6a所示,可以形成ZnO透明电极层30的末端与第二导电型半导体层25的上表面所形成的角为钝角的倒台面结构30a。当ZnO透明电极层30的末端具有倒台面结构30a时,光提取效率可能会很佳。即,在ZnO透明电极层30的末端具有倒台面结构30a时,在ZnO透明电极层30的表面全反射而朝向ZnO透明电极层30的末端的光不再全反射而向外部射出。In this case, during wet etching, the gradient formed between the end of the transparent electrode layer 30 and the upper surface of the second conductive type semiconductor layer 25 can be controlled by controlling the pH value of the acidic solution. For example, when using a strong acidic solution with a lower pH value to wet etch the ZnO transparent electrode layer 30, as shown in FIG. The inverted mesa structure 30a with an obtuse angle. When the end of the ZnO transparent electrode layer 30 has the inverted mesa structure 30a, light extraction efficiency may be excellent. That is, when the end of the ZnO transparent electrode layer 30 has the inverted mesa structure 30a, the light that is totally reflected on the surface of the ZnO transparent electrode layer 30 and goes toward the end of the ZnO transparent electrode layer 30 is no longer totally reflected and emitted to the outside.
相反,当利用ph值较高的弱酸性溶液湿式蚀刻ZnO透明电极层30时,如图6c所示,可以形成ZnO透明电极层30的末端与第二导电型半导体层25的上表面所形成的角为锐角的台面结构(30c)。并且,在利用ph值在其中间的酸性溶液湿式蚀刻ZnO透明电极层30时,如图6b所示,可以形成ZnO透明电极层30的末端与第二导电型半导体层25的上表面所形成的角为直角的结构(30b)。当ZnO透明电极层30的末端具有台面结构30c时,在电学特性方面可能会比倒台面结构30a更有效。即,当ZnO透明电极层30的末端具有台面结构30c时,ZnO透明电极层30与第二导电型半导体层25所接触的面积可能会比倒台面结构30a更宽,因此能够更有效地实现电流扩散。On the contrary, when the ZnO transparent electrode layer 30 is wet-etched with a weakly acidic solution with a higher pH value, as shown in FIG. Mesa structures (30c) with acute corners. And, when utilizing the pH value in the middle acidic solution wet etching ZnO transparent electrode layer 30, as shown in Fig. A structure with right angles (30b). When the end of the ZnO transparent electrode layer 30 has the mesa structure 30c, it may be more effective in electrical characteristics than the inverted mesa structure 30a. That is, when the end of the ZnO transparent electrode layer 30 has a mesa structure 30c, the area where the ZnO transparent electrode layer 30 is in contact with the second conductivity type semiconductor layer 25 may be wider than the inverted mesa structure 30a, so that the current flow can be realized more effectively. diffusion.
参照图7,对在图6a至图6c中通过透明电极层30的蚀刻而裸露的半导体层叠体20的一部分进行蚀刻,从而可以形成台面蚀刻区域20a。台面蚀刻区域20a可以通过干式蚀刻法形成。具体而言,利用第一掩膜60的第一开口部60a并利用溅射蚀刻、反应离子蚀刻、气相刻蚀等方法对第二导电型半导体层25及活性层23进行蚀刻,从而可以使第一导电型半导体层21裸露。在这种情况下,第一导电型半导体层21的一部分也可以被蚀刻。参照图7,台面蚀刻区域20a的侧面可以倾斜地形成。Referring to FIG. 7 , a portion of the semiconductor laminate 20 exposed by etching of the transparent electrode layer 30 in FIGS. 6 a to 6 c is etched to form a mesa-etched region 20 a. The mesa-etched region 20a may be formed by dry etching. Specifically, the second conductive type semiconductor layer 25 and the active layer 23 are etched by using the first opening 60a of the first mask 60 and using methods such as sputter etching, reactive ion etching, and vapor phase etching, so that the second conductive type semiconductor layer 25 can be etched. A conductive semiconductor layer 21 is exposed. In this case, a part of the first conductive type semiconductor layer 21 may also be etched. Referring to FIG. 7, the sides of the mesa-etched region 20a may be formed obliquely.
参照图8,可以在透明电极层30及台面蚀刻区域20a上形成第二掩膜70。第二掩膜70可以包括第二开口部70a。第二开口部70a可以形成为多个。例如,第二开口部70a中的一个可以位于透明电极层30上而使透明电极层30的一部分裸露,并且,第二开口部70a中的另一个可以位于台面蚀刻区域20a上而使第一导电型半导体层21的一部分裸露。Referring to FIG. 8, a second mask 70 may be formed on the transparent electrode layer 30 and the mesa etching region 20a. The second mask 70 may include a second opening portion 70a. The second opening portion 70a may be formed in plural. For example, one of the second openings 70a may be located on the transparent electrode layer 30 to expose a part of the transparent electrode layer 30, and the other of the second openings 70a may be located on the mesa-etched region 20a to expose the first conductive layer 30. A part of the semiconductor layer 21 is exposed.
参照图9,可以利用第二掩膜70的第二开口部70a形成第一电极40以及第二电极50。虽然在图9中仅公开了利用第二开口部70a形成的第一电极延伸部43,但可以充分类推能够利用同样的方法形成第一电极焊盘41、第二电极焊盘51以及第二电极延伸部53。并且,附图虽然仅示出了第一电极延伸部43,但可以利用通常的剥离技术形成第一电极40及第二电极50。Referring to FIG. 9 , the first electrode 40 and the second electrode 50 may be formed using the second opening 70 a of the second mask 70 . Although only the first electrode extension 43 formed by the second opening 70a is disclosed in FIG. 9 , it can be fully deduced that the same method can be used to form the first electrode pad 41 , the second electrode pad 51 and the second electrode. extension 53 . In addition, although the drawing only shows the first electrode extension 43, the first electrode 40 and the second electrode 50 can be formed by a common lift-off technique.
参照图10,在透明电极层30的表面可以形成凹凸31。具体而言,可以使用酸性溶液对透明电极层30的表面进行蚀刻而形成凹凸31。根据本申请发明的发光二极管可以包括ZnO透明电极30,如上所述,能够由于较低的光吸收特性而使ZnO透明电极层30的厚度形成为较厚。即,ZnO透明电极层30可以具有能够在其表面包括凹凸31的程度的足够的厚度。ZnO具有对酸非常脆弱的特性。因此,通过使用稀释得较多的酸性溶液短时间处理ZnO透明电极层30的方法可以在其表面形成凹凸31,并且可以根据其处理时间及酸性溶液的浓度而控制凹凸31的大小。例如,可以使用大致以1000:1的比例稀释得较多的酸性溶液处理ZnO透明电极层30约40秒左右,而在其表面形成凹凸31。通过这种方法形成的凹凸31可以具有约50nm以上的大小。Referring to FIG. 10 , unevenness 31 may be formed on the surface of the transparent electrode layer 30 . Specifically, the unevenness 31 can be formed by etching the surface of the transparent electrode layer 30 using an acidic solution. The light emitting diode according to the invention of the present application may include the ZnO transparent electrode 30, and as described above, the thickness of the ZnO transparent electrode layer 30 can be formed thicker due to lower light absorption characteristics. That is, the ZnO transparent electrode layer 30 may have a thickness sufficient to include unevenness 31 on its surface. ZnO has a property of being very fragile to acids. Therefore, the unevenness 31 can be formed on the surface of the ZnO transparent electrode layer 30 by treating the ZnO transparent electrode layer 30 with a relatively diluted acidic solution for a short time, and the size of the unevenness 31 can be controlled according to the treatment time and the concentration of the acidic solution. For example, the ZnO transparent electrode layer 30 may be treated for about 40 seconds with an acidic solution diluted at a ratio of approximately 1000:1 to form unevenness 31 on its surface. The unevenness 31 formed by this method can have a size of about 50 nm or more.
由于凹凸31的形成工序在第二电极50的形成工序之后实施,因此在连接有第二电极焊盘51以及第二电极延伸部53的部分的透明电极层30的表面无法形成凹凸31图案。这种特征已经通过前述的图3而公开。即,可以在除了形成有第二电极50的部分以外的透明电极层30的其余区域形成凹凸31。如果在与第二电极50连接的透明电极层30的表面形成凹凸31图案,则由于第二电极50容易从透明电极层30剥离,因此在连接有第二电极50的透明电极层30的表面不形成凹凸31图案。Since the formation of the unevenness 31 is performed after the formation of the second electrode 50 , the unevenness 31 pattern cannot be formed on the surface of the transparent electrode layer 30 where the second electrode pad 51 and the second electrode extension 53 are connected. This feature has already been disclosed by the aforementioned FIG. 3 . That is, the unevenness 31 may be formed in the remaining area of the transparent electrode layer 30 except for the portion where the second electrode 50 is formed. If the concave-convex 31 pattern is formed on the surface of the transparent electrode layer 30 connected with the second electrode 50, then since the second electrode 50 is easily peeled off from the transparent electrode layer 30, the surface of the transparent electrode layer 30 connected with the second electrode 50 will not A concavo-convex 31 pattern is formed.
图11a至图11c示出根据本发明的一实施例的灯丝发光模块的制造方法及灯丝发光模块。11a to 11c show a method for manufacturing a filament light-emitting module and a filament light-emitting module according to an embodiment of the present invention.
参照图11a,首先准备支撑基板310。支撑基板310可以由玻璃、硬质玻璃、石英玻璃、透明陶瓷或者塑料等形成。或者,支撑基板310可以根据一实施例而由柔性(flexible)材质形成。支撑基板310的两端可以分别具有电极320。所述电极320用于向灯丝发光模块300供给外部电力。所述电极320可以通过粘合剂等而固定在支撑基板310。Referring to FIG. 11a, firstly, a support substrate 310 is prepared. The supporting substrate 310 may be formed of glass, hard glass, quartz glass, transparent ceramics, plastic, or the like. Alternatively, the supporting substrate 310 may be formed of a flexible material according to an embodiment. Both ends of the supporting substrate 310 may have electrodes 320 respectively. The electrodes 320 are used to supply external power to the filament light emitting module 300 . The electrodes 320 may be fixed on the support substrate 310 by adhesive or the like.
虽然在图11a中公开了支撑基板310具有直线型杆(bar)形状的情形,但并不局限于此。即,支撑基板310的至少一部分区域可以包括曲线形状。支撑基板310可以形成为具有曲线形状,或者,直线型杆形状的支撑基板310可以由柔性(flxible)材质形成而使至少一部分由于外力能够变形为曲线形状。由于曲线形状的支撑基板310,可以制作出例如图13至15所示的各种形状的灯丝发光模块300。Although a case where the support substrate 310 has a linear bar shape is disclosed in FIG. 11a, it is not limited thereto. That is, at least a portion of an area of the support substrate 310 may include a curved shape. The supporting substrate 310 may be formed to have a curved shape, or the linear rod-shaped supporting substrate 310 may be formed of a flexible material so that at least a part thereof can be deformed into a curved shape due to external force. Due to the curved support substrate 310 , various shapes of filament light emitting modules 300 such as those shown in FIGS. 13 to 15 can be fabricated.
参照图11b,在所述支撑基板310上可以贴装至少一个发光二极管330。贴装在灯丝发光模块300的发光二极管330相对较小,据此能够在较高的电流密度条件下被驱动,从而在各个发光二极管产生高温的热。此外,贴装于灯丝发光模块300的发光二极管330可以以非常高的密度配置。即,发光二极管330之间的距离有可能相对地非常小,因此在单位面积中产生的热量可能会非常大。在这种情况下,灯丝发光模块300有可能因自身所产生的较多的热而受损。Referring to FIG. 11 b , at least one light emitting diode 330 can be mounted on the support substrate 310 . The light-emitting diodes 330 attached to the filament light-emitting module 300 are relatively small, so they can be driven under high current density conditions, thereby generating high-temperature heat in each light-emitting diode. In addition, the light emitting diodes 330 attached to the filament light emitting module 300 can be arranged at a very high density. That is, the distance between the light emitting diodes 330 may be relatively very small, so the heat generated per unit area may be very large. In this case, the filament light emitting module 300 may be damaged due to the high heat generated by itself.
因此,根据本申请发明的灯丝发光模块300可以包括包含ZnO透明电极层30的图1至图10所示的发光二极管。如上所述,包含ZnO透明电极层30的发光二极管能够用相对较低的正向电压(Vf)驱动,因此具有发热量较少的特征。因此,包含ZnO透明电极层30的发光二极管可以在高电流密度条件下被驱动,且适合于高密度地配置的灯丝发光模块。Therefore, the filament light emitting module 300 according to the invention of the present application may include the light emitting diode shown in FIGS. 1 to 10 including the ZnO transparent electrode layer 30 . As described above, the light emitting diode including the ZnO transparent electrode layer 30 can be driven with a relatively low forward voltage (Vf), and thus has a feature of generating less heat. Therefore, the light emitting diode including the ZnO transparent electrode layer 30 can be driven under a high current density condition, and is suitable for a high density filament light emitting module.
再次参照图11b,多个发光二极管330可以借助引线331电连接。虽然在图11b中示出多个发光二极管330借助引线331串联连接的情形,但这不能被理解为是对实施例的限制。即,根据其他实施例,多个发光二极管330也可以并联连接或者串联/并联连接。多个发光二极管330中的位于最外围的发光二极管330可以通过所述电极320和引线331电连接。Referring again to FIG. 11 b , a plurality of light emitting diodes 330 may be electrically connected by wires 331 . Although a situation in which a plurality of light emitting diodes 330 are connected in series by wires 331 is shown in FIG. 11 b , this should not be construed as a limitation to the embodiment. That is, according to other embodiments, the plurality of light emitting diodes 330 may also be connected in parallel or in series/parallel. The outermost light emitting diode 330 among the plurality of light emitting diodes 330 may be electrically connected through the electrode 320 and the lead wire 331 .
另外,支撑基板310可以包括电气布线(未图示),此时,各个发光二极管并不要求借助引线331的键合。即,在这种情况下,各个发光二极管可以通过支撑基板310所包含的电气布线(未图示)而以串联/并联连接的方式电连接。In addition, the support substrate 310 may include electrical wiring (not shown), and at this time, the respective light emitting diodes do not require bonding by wires 331 . That is, in this case, the light emitting diodes can be electrically connected in series/parallel through electrical wiring (not shown) included in the support substrate 310 .
参照图11c,可以形成覆盖贴装有所述至少一个发光二极管330的支撑基板310的波长转换层340。波长转换层340可以为了提高结构的稳定性而覆盖电极320的一部分。波长转换层340包括荧光体,荧光体可以使来自发光二极管的光的波长发生变化。波长转换层340可以包括各种组合的荧光体组合,从而可以控制从灯丝发光模块300发出的光的波长。Referring to FIG. 11c, a wavelength converting layer 340 may be formed covering the supporting substrate 310 on which the at least one light emitting diode 330 is mounted. The wavelength conversion layer 340 may cover a part of the electrode 320 in order to improve the stability of the structure. The wavelength conversion layer 340 includes phosphors that can change the wavelength of light from the light emitting diodes. The wavelength conversion layer 340 may include phosphors in various combinations, so that the wavelength of light emitted from the filament light emitting module 300 may be controlled.
图12至图15示出根据本发明的灯丝发光二极管灯的各种实施例。12 to 15 show various embodiments of filament LED lamps according to the invention.
参照图12至图15,灯丝发光二极管灯可以同时包括灯座部100、透明盖200以及灯丝发光模块300。此外,灯丝发光二极管灯还可以包括布线部400以及支撑体500。Referring to FIG. 12 to FIG. 15 , the filament light-emitting diode lamp may include a lamp base part 100 , a transparent cover 200 and a filament light-emitting module 300 at the same time. In addition, the filament LED lamp may further include a wiring part 400 and a supporting body 500 .
灯座部100可以由导电体构成,可以与外部装置连接而发挥向所述灯丝发光模块300供给电力的作用。The socket part 100 can be made of a conductor, and can be connected to an external device to play a role of supplying electric power to the filament light emitting module 300 .
透明盖200可以由可以使光线透过的透明的材质构成,其下端可以与所述灯座部100连接固定。透明盖200可以是使光扩散而向外部发射的光扩散盖,因此,灯丝发光二极管灯可以具有较宽的指向角。另外,透明盖200可以起到保护位于其内部的灯丝发光模块300的作用。如图12至图15所示的所述透明盖200的形状可以为具有其下端开放且大致球形的形状,但并不仅限于此。The transparent cover 200 can be made of a transparent material that can transmit light, and its lower end can be connected and fixed with the lamp socket part 100 . The transparent cover 200 may be a light diffusion cover that diffuses light to be emitted to the outside, and thus, the filament LED lamp may have a wider directivity angle. In addition, the transparent cover 200 can protect the filament light-emitting module 300 inside it. The shape of the transparent cover 200 shown in FIGS. 12 to 15 may be a substantially spherical shape with its lower end open, but is not limited thereto.
灯丝发光模块300可以包括多个发光二极管。另外,灯丝发光模块300还可以包括支撑基板、电极以及波长转换层。多个发光二极管贴装于支撑基板上,且能够以分别串联、并联或者串联/并联的方式电连接。The filament light emitting module 300 may include a plurality of light emitting diodes. In addition, the filament light emitting module 300 may further include a supporting substrate, electrodes and a wavelength conversion layer. A plurality of light emitting diodes are mounted on the supporting substrate and can be electrically connected in series, parallel or series/parallel respectively.
灯丝发光模块300包括图11a至图11c所示的灯丝发光模块300,灯丝发光模块300所包含的多个发光二极管可以包括图1至图10所示的发光二极管。即,灯丝发光模块300可以包括上述的ZnO透明电极层,且可以包括能够用较低的正向电压驱动且发热量较少的发光二极管。据此,灯丝发光模块300自身所产生的热量可能会较少,因此,因高温受损的危险性能够较少。The filament light emitting module 300 includes the filament light emitting module 300 shown in FIGS. 11 a to 11 c , and the plurality of light emitting diodes included in the filament light emitting module 300 may include the light emitting diodes shown in FIGS. 1 to 10 . That is, the filament light-emitting module 300 may include the above-mentioned ZnO transparent electrode layer, and may include a light-emitting diode that can be driven with a lower forward voltage and generates less heat. Accordingly, the filament light-emitting module 300 itself may generate less heat, so the risk of damage due to high temperature can be less.
与此相反,根据现有技术的灯丝发光模块包括借助以较薄的厚度形成的ITO透明电极层而具有相对较高的正向电压的发光二极管,因此产生由于较高的发热量而使灯丝发光模块受损而降低可靠性的问题。因此,利用如氦气等粘性系数小且导热率较高的气体而将在灯丝发光模块产生的热量排放到外部。即,采用了将粘性系数低且导热率较高的气体填充到透明盖内部,并利用所述气体的对流而将从灯丝发光模块产生的热量排放到外部的方法。In contrast, the filament light emitting module according to the prior art includes a light emitting diode having a relatively high forward voltage by means of an ITO transparent electrode layer formed with a thin thickness, thus generating light emission due to a high heat generation. A problem that reduces reliability due to damaged modules. Therefore, the heat generated in the filament light emitting module is discharged to the outside by using a gas such as helium gas with a small viscosity coefficient and high thermal conductivity. That is, a method of filling the inside of the transparent cover with a gas with a low viscosity coefficient and high thermal conductivity, and utilizing convection of the gas to discharge heat generated from the filament light emitting module to the outside.
然而,根据本申请发明的灯丝发光模块300由于发光二极管的正向电压较低的特性,而使自身发热量较少,因此具有在透明盖200内不用包含其他用于散热的气体的优点。据此,根据本申请发明的灯丝发光二极管灯不包含气体,因此具有制造费用及制造工艺上的优势,并且在选择透明盖的材料及形状时受到的限制较少。例如,透明盖200可以是被密封,其内部可以保持不包含气体的真空状态。作为另一例,透明盖200可以包括与外部相连的开口部,透明盖200内部可以填充有大气。However, the filament light-emitting module 300 according to the present application has the advantage of not containing other gases for heat dissipation in the transparent cover 200 due to the low forward voltage of the light-emitting diodes, so that it generates less heat. Accordingly, the filament LED lamp according to the present application does not contain gas, so it has advantages in manufacturing cost and manufacturing process, and there are less restrictions when selecting the material and shape of the transparent cover. For example, the transparent cover 200 may be sealed, and the inside thereof may maintain a vacuum state that does not contain gas. As another example, the transparent cover 200 may include an opening connected to the outside, and the inside of the transparent cover 200 may be filled with air.
布线部400起到支撑灯丝发光模块300的作用,并且可以起到将灯丝发光模块300电连接到灯座部100的作用。布线部400的一端连接到灯丝发光模块300的电极部,另一端可以连接到灯座部100。The wiring part 400 plays a role of supporting the filament light emitting module 300 and may play a role of electrically connecting the filament light emitting module 300 to the lamp socket part 100 . One end of the wiring part 400 is connected to the electrode part of the filament light emitting module 300 , and the other end may be connected to the socket part 100 .
支撑体500可以起到支撑所述布线部400以及所述灯丝发光模块300的作用。支撑体500可以固定在灯座部100,所述布线部400的一部分可以通过贯穿所述支撑体500的结构而固定在支撑体500。The supporting body 500 can play a role of supporting the wiring part 400 and the filament light emitting module 300 . The supporting body 500 may be fixed to the lamp socket part 100 , and a part of the wiring part 400 may be fixed to the supporting body 500 through a structure passing through the supporting body 500 .
并且,虽然在附图中没有公开,但是灯丝发光二极管灯还可以包括用于控制灯丝发光模块的驱动的驱动部。所述驱动部可以控制单一灯丝发光模块或者串联/并联连接的多个灯丝发光模块的驱动。所述驱动部可以位于灯座部100内部的空间。And, although not disclosed in the drawings, the filament light emitting diode lamp may further include a driving part for controlling driving of the filament light emitting module. The driving part can control the driving of a single filament light emitting module or a plurality of filament light emitting modules connected in series/parallel. The driving part may be located in a space inside the lamp socket part 100 .
根据单独的研究,图12所示的灯丝发光二极管灯包括两个直线型灯丝发光模块300a,300b,所述两个直线型灯丝发光模块300a,300b具有串联连接的结构。然而,这不能理解为是对实施例的限定,因此灯丝发光二极管灯可以包括一个、三个、四个等多种数量的灯丝发光模块300。另外,多个灯丝发光模块300不仅可以具有串联连接的结构,还可以具有并联连接、串联/并联连接的结构。另外,多个灯丝发光模块300可以具有可以使互相产生的影子最小化的各种配置结构。According to a separate study, the filament LED lamp shown in FIG. 12 includes two linear filament light emitting modules 300a, 300b having a structure connected in series. However, this should not be construed as a limitation to the embodiment, so the filament light emitting diode lamp may include one, three, four filament light emitting modules 300 and other various numbers. In addition, the plurality of filament light emitting modules 300 may not only have a structure connected in series, but may also have a structure connected in parallel or in series/parallel. In addition, the plurality of filament light emitting modules 300 may have various configuration structures that can minimize mutual shadows.
图13所示的灯丝发光二极管灯包括一个曲线形灯丝发光模块300,且具有灯丝发光模块300的两端与布线部400连接的结构。另外,还可以包括用于将灯丝发光模块300固定在支撑体500的引线510。The filament light-emitting diode lamp shown in FIG. 13 includes a curved filament light-emitting module 300 and has a structure in which two ends of the filament light-emitting module 300 are connected to wiring parts 400 . In addition, a lead wire 510 for fixing the filament light emitting module 300 on the support body 500 may also be included.
图14所示的灯丝发光二极管灯可以包括两个灯丝发光模块300a,300b,各个灯丝发光模块300a,300b可以包括直线区域及曲线区域。The filament light-emitting diode lamp shown in FIG. 14 may include two filament light-emitting modules 300a, 300b, and each filament light-emitting module 300a, 300b may include a straight line area and a curved line area.
图15所示的灯丝发光二极管灯包括一个螺旋形灯丝发光模块300,且具有灯丝发光模块300以支撑体500为中心而螺旋状地旋转而包围支撑体500的结构。The filament light-emitting diode lamp shown in FIG. 15 includes a spiral filament light-emitting module 300 , and has a structure in which the filament light-emitting module 300 spirally rotates around the support body 500 to surround the support body 500 .
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010143360A1 (en) * | 2009-06-11 | 2010-12-16 | パナソニック株式会社 | Organic el display |
CN102447027A (en) * | 2011-12-16 | 2012-05-09 | 北京工业大学 | Vertical structure type light-emitting diode with high light extraction window |
CN203644774U (en) * | 2013-12-24 | 2014-06-11 | 深圳市研一科技有限公司 | LED bulb |
CN105144415A (en) * | 2012-12-28 | 2015-12-09 | 日进Led有限公司 | Nitride semiconductor light-emitting device and method of manufacturing same |
CN106256026A (en) * | 2014-04-22 | 2016-12-21 | 首尔伟傲世有限公司 | Light emitting diode and manufacture method thereof |
CN206727099U (en) * | 2017-03-06 | 2017-12-08 | 首尔伟傲世有限公司 | Light emitting diode and the filament light-emitting diode lights including the light emitting diode |
-
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---|---|---|---|---|
WO2010143360A1 (en) * | 2009-06-11 | 2010-12-16 | パナソニック株式会社 | Organic el display |
CN102447027A (en) * | 2011-12-16 | 2012-05-09 | 北京工业大学 | Vertical structure type light-emitting diode with high light extraction window |
CN105144415A (en) * | 2012-12-28 | 2015-12-09 | 日进Led有限公司 | Nitride semiconductor light-emitting device and method of manufacturing same |
CN203644774U (en) * | 2013-12-24 | 2014-06-11 | 深圳市研一科技有限公司 | LED bulb |
CN106256026A (en) * | 2014-04-22 | 2016-12-21 | 首尔伟傲世有限公司 | Light emitting diode and manufacture method thereof |
CN206727099U (en) * | 2017-03-06 | 2017-12-08 | 首尔伟傲世有限公司 | Light emitting diode and the filament light-emitting diode lights including the light emitting diode |
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