CN108507498A - Micro mirror monitoring method and device and lighting device and litho machine - Google Patents
Micro mirror monitoring method and device and lighting device and litho machine Download PDFInfo
- Publication number
- CN108507498A CN108507498A CN201710115102.1A CN201710115102A CN108507498A CN 108507498 A CN108507498 A CN 108507498A CN 201710115102 A CN201710115102 A CN 201710115102A CN 108507498 A CN108507498 A CN 108507498A
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- micro mirror
- flip angle
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- vector
- spacing
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- 238000012544 monitoring process Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims abstract description 17
- 238000005259 measurement Methods 0.000 claims abstract description 22
- 210000001747 pupil Anatomy 0.000 claims description 12
- 238000005286 illumination Methods 0.000 claims description 11
- 238000012806 monitoring device Methods 0.000 claims description 10
- 238000012545 processing Methods 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Abstract
The present invention provides a kind of micro mirror monitoring method and device and lighting device and litho machine, this method monitoring the flip angle of micro mirror and face type in real time, including：The laser beam of at least two beam parallel equidistants is first provided；The hot spot that two beam laser beams are formed in after the micro mirror reflects and fourier lense transmits on photosensitive element is obtained again；Then：Measurement obtains the position of hot spot, and then the flip angle of the micro mirror is determined according to facula position；Measurement obtains the spacing of hot spot caused by the two beams laser beam, and then the variation according to hot spot spacing determines the face type variation of the micro mirror.
Description
Technical field
The present invention relates to pupil illumination field more particularly to a kind of micro mirror monitoring method and device and lighting device and
Litho machine.
Background technology
It please refers to Fig.1, wherein 1 is incident laser, and 2 be micro mirror, in the adjusting for carrying out arbitrary pupil illumination using micro mirror
When, in order to generate target pupil, micro mirror 2 needs to overturn certain angle, and the practical flip angle to micro mirror 2 is needed after the completion of overturning
Degree carries out on-line measurement, at the same time, when hot spot is irradiated on micro mirror will produce certain heat, heat will cause micro mirror to produce
Raw certain deformation, the deformation of micro mirror can lead to the deformation of hot spot, will have a direct impact on lighting quality.
It needs to carry out the flip angle and face type of micro mirror when therefore carrying out arbitrary pupil illumination using micro mirror online real-time
Monitoring measures.
Invention content
The technical problem to be solved by the present invention is to how carry out on line real-time monitoring survey to the flip angle and face type of micro mirror
Amount.
In order to solve this technical problem, the present invention provides a kind of micro mirror monitoring methods, to monitor micro mirror in real time
Flip angle and face type, including：
The laser beam of at least two beam parallel equidistants is first provided；
Two beam laser beams are obtained again to be formed on photosensitive element after the micro mirror reflects and fourier lense transmits
Hot spot；
Then：
Measurement obtains the position of hot spot, and then the flip angle of the micro mirror is determined according to facula position；
Measurement obtains the spacing of hot spot caused by the two beams laser beam, and then the variation according to hot spot spacing determines institute
State the face type variation of micro mirror.
Optionally, when determining the flip angle of the micro mirror, by the flip angle and light of the micro mirror precalculated
The relationship of spot position determines that the flip angle of micro mirror instantly, the relationship are calculated by following steps：
Normal line vector of the micro mirror after X, Y-direction overturning is first calculated；
The relationship between the incident ray and reflection light of the micro mirror is acquired, and then it is anti-with it to obtain micro mirror flip angle
Penetrate the vector correlation between light；
Spatial relation based on the photosensitive element and fourier lense, obtains the flip angle of facula position and micro mirror
The relationship of degree.
Optionally, in normal line vector after overturning is calculated：
Initial normal position is expressed as with unit vector：
Wherein nox、noy、nozFor unit vector coefficient,For unit vector；
Assuming that around X to the angles α are turned, around the angles Z-direction rotation β；
Enable plane mirror overturn after normal unit vector be：
It obtains：
nx=noxcosβ-(noycosα-nozsinα)sinβ
ny=noxsinβ+(noycosα-nozsinα)cosβ
nz=noysinα+nozcosα
Optionally, when acquiring the relationship between the incident ray and reflection light of the micro mirror：
If incident ray normal vector is：
Reflection light normal vector isThe normal unit vector of micro mirror isAccording to emission law vector equation：
Then there is the vector of reflection light to be：
It enables：
Then have：
A′x=Ax-2nx(Axnx+Ayny+Aznz)
A′y=Ay-2ny(Axnx+Ayny+Aznz)
A′z=Az-2nz(Axnx+Ayny+Aznz)
Optionally, it when determining the face type variation of the micro mirror according to the variation of hot spot spacing, is determined by following relationship：
Wherein, D0For the initial spacing of the two beams laser beam；δ d are between the two beam laser beams after micro mirror reflection
Away from variable quantity, θ is the incidence angle of the two beams laser beam, and L is the reflection light path after micro mirror reflection；κpreIt is preset
Micromirror curvature, κpostFor the micromirror curvature of actual measurement.
Optionally, after the flip angle for determining the micro mirror, further include：
By identified flip angle compared with target angle pair, according to comparison result to the flip angle of the micro mirror into
Row feedback control corrects the flip angle of the micro mirror.
The present invention also provides it is a kind of using alternative of the present invention offer micro mirror monitoring method micro mirror monitoring device,
Including light source, fourier lense, photosensitive element and signal processing unit, the light source provides the laser of at least two beam parallel equidistants
Beam is incident to the micro mirror, and two beam laser beams are formed in the photosensitive member after the micro mirror reflects and fourier lense transmits
On part, the signal processing unit obtains hot spot caused by the position of hot spot and the two beams laser beam on the photosensitive element
Spacing, and then according to the flip angle of micro mirror described in the location determination of the hot spot, the variation of the spacing according to the hot spot
Determine the face type variation of the micro mirror.
Optionally, the photosensitive element is CCD elements.
The lighting system for the micro mirror monitoring device that the present invention also provides a kind of to be provided including alternative of the present invention,
It is characterized in that, when carrying out the adjusting of arbitrary pupil illumination using micro mirror, the arbitrary pupil of micro mirror monitoring device on-line measurement
The flip angle and face type of micro mirror described in illumination, and according to the flip angle and face type of the micro mirror measured to the micro mirror
Flip angle be modified.
The present invention also provides a kind of litho machines, including the lighting system that alternative of the present invention provides.
The present invention can be realized by measuring position of the hot spot on photosensitive element to the survey school of micro mirror flip angle, be passed through
Calculate real-time measurement of the spacing variation realization of two hot spots to micromirror curvature, it is seen then that the present invention passes through to facula position and light
Spot spacing measures while achieving the purpose that survey school and micro mirror surface type measurement to micro mirror flip angle.
Description of the drawings
Fig. 1 is the operating diagram of micro mirror array in the prior art；
Fig. 2 is the principle schematic that micro mirror monitors in pupil illumination in an alternate embodiment of the present invention；
Fig. 3 is that normal position calculates schematic diagram when micro mirror is overturn in an alternate embodiment of the present invention；
Fig. 4 is that reflection light calculates schematic diagram in an alternate embodiment of the present invention；
Schematic diagram when Fig. 5 is the variation of an alternate embodiment of the present invention medium spacing.
Specific implementation mode
Detailed retouch is carried out to the monitoring method of micro mirror in pupil illumination provided by the invention below with reference to Fig. 2 to Fig. 5
It states, is optional embodiment of the present invention, it is believed that those skilled in the art are in the model for not changing spirit of that invention and content
In enclosing, can it be modified and be polished.
Referring to FIG. 1, inventive conception is that, after being irradiated to micro mirror by using one group of parallel equidistant laser beam
The measurement of micro mirror flip angle and face type is obtained by the survey calculation to the reflected beams facula position and spacing.Based on the think of
Think, laser beam 1 is irradiated to by specific direction on micro mirror 2, and micro mirror 2 carries out the overturning of X, Y both direction, and micro mirror 2 enters after overturning
Light beam 5 direction of the laser beam 1 penetrated after micro mirror reflects will also change, and micro mirror 2 overturns different angle and corresponds to reflection light 3
Different directions, when reflection light 3 is incident on by different directions on fourier lense 4, corresponding hot spot on photosensitive element 5 not
Same position, theoretical calculation obtain the relationship of micro mirror flip angle and hot spot on photosensitive element 5 between position, are measured in real time
When can reach micro mirror flip angle by measuring position of the hot spot on photosensitive element 5 and measure purpose.Wherein, photosensitive element 5
CCD elements can be used.
Based on the above, the present invention provides a kind of micro mirror monitoring method, to monitor flip angle and the face of micro mirror 2 in real time
Type, including：
The laser beam 1 of at least two beam parallel equidistants is first provided；
Two beam laser beams 1 are obtained again to be formed on photosensitive element 5 after micro mirror reflection and fourier lense transmission
Hot spot；
Then：
Measurement obtains the position of hot spot, and then the flip angle of the micro mirror 2 is determined according to facula position；
Measurement obtains the spacing of hot spot caused by the two beams laser beam 1, and then is determined according to the variation of hot spot spacing
The face type variation of the micro mirror 2.
Referring to FIG. 3, when determining the flip angle of the micro mirror, by the flip angle of micro mirror that precalculates with
The relationship of facula position determines the flip angle of micro mirror instantly；The relationship is calculated by following steps：
Normal line vector of the micro mirror after X, Y-direction overturning is first calculated；
In further alternative, in normal line vector after overturning is calculated：
Initial normal position is expressed as with unit vector：
Wherein nox、noy、nozFor unit vector coefficient,For unit vector；
Assuming that around X to the angles α are turned, around the angles Z-direction rotation β；
Enable plane mirror overturn after normal unit vector be：
It obtains：
nx=noxcosβ-(noycosα-nozsinα)sinβ
ny=noxsinβ+(noycosα-nozsinα)cosβ
nz=noysinα+nozcosα………(3)。
The relationship between the incident ray and reflection light of the micro mirror is acquired, and then it is anti-with it to obtain micro mirror flip angle
Penetrate the vector correlation between light；
Referring to FIG. 4, when relationship between acquiring the incident ray and reflection light of the micro mirror：
If incident ray normal vector is：
Reflection light normal vector isThe normal unit vector of micro mirror isAccording to emission law vector equation：
Then there is the vector of reflection light to be：
It enables：
Then have：
A'x=Ax-2nx(Axnx+Ayny+Aznz)
A'y=Ay-2ny(Axnx+Ayny+Aznz)
A'z=Az-2nz(Axnx+Ayny+Aznz)……………(8)。
Spatial relation based on the photosensitive element and fourier lense, obtains the flip angle of facula position and micro mirror
The relationship of degree.Specifically, by first two steps by the arrow of micro mirror 2 flip angle α, β and the reflection light 3 after the reflection of micro mirror 2
Opening relationships is measured, hot spot can be acquired on photosensitive element 5 after defining the spatial position of fourier lense 4 and photosensitive element 5
Position, to establish the relationship on photosensitive element 5 between facula position and micro mirror 2 flip angle α, β, to 2 flip angle of micro mirror
Position of the hot spot on 5 photosurface of photosensitive element need to be only read when carrying out survey school can to measure the flip angle of micro mirror 2.
In the preferred embodiment of the invention, after the flip angle for determining the micro mirror 2, further include：
By identified flip angle compared with target angle pair, according to comparison result to the flip angle of the micro mirror 2
Feedback control is carried out, the flip angle of the micro mirror is corrected.Specifically, obtained actual measurement flip angle will be measured to turn over target
The difference of gyration carries out feedback control to micro mirror 2, forms the flip angle progress self-correction for turning over micro mirror 2.
In alternative of the present invention, when the variation according to hot spot spacing determines the face type variation of the micro mirror, by following
Relationship determines：
Wherein, D0For the initial spacing of the two beams laser beam；δ d are the spacing of the two laser after micro mirror reflection
Variable quantity, θ are the incidence angle of the two beams laser beam, and L is the reflection light path after micro mirror reflection；κpreIt is not preset micro-
Mirror curvature, κpostFor the micromirror curvature of actual measurement.
For specific explanations, referring to FIG. 5, the parallel equidistant laser beam of two beams 1 is irradiated on micro mirror, because of the shape of micro mirror
Change can cause the spacing of the reflected beams 3 to change, if the initial spacing of light beam is D03 spacing of laser beam after the reflection of micro mirror 2
Variation is D0The incidence angle of+δ d, two collimated light beams are θ, and reflection light path is L, the variation of face type when the variation of micromirror type is smaller
It can be assessed with the variation of curvature, micromirror curvature is by κpreChange to κpostIn the process, by geometric optics can obtain with
The relationship of upper δ d and Curvature varying.
The present invention also provides it is a kind of using alternative of the present invention offer micro mirror monitoring method micro mirror monitoring device,
Including light source, fourier lense 4, photosensitive element 5 and signal processing unit, the light source provides swashing at least two beam parallel equidistants
Light beam 1 is incident to the micro mirror 2, and two beam laser beams 1 are formed in institute after the micro mirror 2 reflects and fourier lense 4 transmits
It states on photosensitive element 5, the signal processing unit obtains the position of hot spot and the two beams laser beam 1 on the photosensitive element 5
The spacing of generated hot spot, and then according to the flip angle of micro mirror 2 described in the location determination of the hot spot, according to the hot spot
The variation of spacing determine the face type variation of the micro mirror 2.Wherein, the photosensitive element 5 is chosen as CCD elements.
The lighting system for the micro mirror monitoring device that the present invention also provides a kind of to be provided including alternative of the present invention,
It is micro- described in the arbitrary pupil illumination of micro mirror monitoring device on-line measurement when carrying out the adjusting of arbitrary pupil illumination using micro mirror
The flip angle and face type of mirror, and according to the flip angle of the micro mirror measured and face type to the flip angle of the micro mirror into
Row is corrected.
The present invention also provides a kind of litho machines, including the lighting system that alternative of the present invention provides.
In conclusion the present invention can be realized by measuring position of the hot spot on photosensitive element to micro mirror flip angle
School is surveyed, the real-time measurement to micromirror curvature is realized in the spacing variation by calculating two hot spots, it is seen then that the present invention passes through to hot spot
The measurement of position and hot spot spacing achievees the purpose that simultaneously to micro mirror flip angle survey school and micro mirror surface type measurement.
Claims (9)
1. a kind of micro mirror monitoring method, to monitor the flip angle and face type of micro mirror in real time, it is characterised in that：Including：
The laser beam of at least two beam parallel equidistants is first provided；
The hot spot that two beam laser beams are formed in after the micro mirror reflects and fourier lense transmits on photosensitive element is obtained again；
Then：
Measurement obtains the position of hot spot, and then the flip angle of the micro mirror is determined according to facula position；
Measurement obtains the spacing of hot spot caused by the two beams laser beam, so the variation according to hot spot spacing determine it is described micro-
The face type variation of mirror.
2. micro mirror monitoring method as described in claim 1, it is characterised in that：When determining the flip angle of the micro mirror, pass through
The flip angle of the micro mirror precalculated and the relationship of facula position determine that the flip angle of micro mirror instantly, the relationship pass through
Following steps are calculated：
Normal line vector of the micro mirror after X, Y-direction overturning is first calculated；
The relationship between the incident ray and reflection light of the micro mirror is acquired, and then obtains micro mirror flip angle and its reflected light
Vector correlation between line；
Spatial relation based on the photosensitive element and fourier lense, obtains the flip angle of facula position and micro mirror
Relationship.
3. micro mirror monitoring method as claimed in claim 2, it is characterised in that：In normal line vector after overturning is calculated：
Initial normal position is expressed as with unit vector：
Wherein nox、noy、nozFor unit vector coefficient,For unit vector；
Assuming that around X to the angles α are turned, around the angles Z-direction rotation β；
Enable plane mirror overturn after normal unit vector be：
It obtains：
nx=noxcosβ-(noycosα-nozsinα)sinβ
ny=noxsinβ+(noycosα-nozsinα)cosβ
nz=noysinα+nozcosα；
When acquiring the relationship between the incident ray and reflection light of the micro mirror：
If incident ray normal vector is：
Reflection light normal vector isThe normal unit vector of micro mirror isAccording to emission law vector equation：
Then there is the vector of reflection light to be：
It enables：
Then have：
A'x=Ax-2nx(Axnx+Ayny+Aznz)
A'y=Ay-2ny(Axnx+Ayny+Aznz)
A'z=Az-2nz(Axnx+Ayny+Aznz)。
4. micro mirror monitoring method as described in claim 1, it is characterised in that：Variation according to hot spot spacing determines the micro mirror
The variation of face type when, determined by following relationship：
Wherein, D0For the initial spacing of the two beams laser beam；δ d are the spacing variation of the two beam laser beams after micro mirror reflection
Amount, θ are the incidence angle of the two beams laser beam, and L is the reflection light path after micro mirror reflection；κpreFor preset micro mirror
Curvature, κpostFor the micromirror curvature of actual measurement.
5. micro mirror monitoring method as described in claim 1, it is characterised in that：After the flip angle for determining the micro mirror, also
Including：
By identified flip angle compared with target angle pair, the flip angle of the micro mirror is carried out according to comparison result anti-
Feedback control, corrects the flip angle of the micro mirror.
6. a kind of micro mirror monitoring device using the micro mirror monitoring method as described in any in claim 1 to 5, feature exists
In, including light source, fourier lense, photosensitive element and signal processing unit, the light source offer at least two beam parallel equidistants
Laser beam is incident to the micro mirror, and two beam laser beams are formed in the sense after the micro mirror reflects and fourier lense transmits
On optical element, the signal processing unit obtains on the photosensitive element caused by the position of hot spot and the two beams laser beam
The spacing of hot spot, and then according to the flip angle of micro mirror described in the location determination of the hot spot, spacing according to the hot spot
Variation determines the face type variation of the micro mirror.
7. micro mirror monitoring device as claimed in claim 6, which is characterized in that the photosensitive element is CCD elements.
8. a kind of lighting system including micro mirror monitoring device as claimed in claim 6, which is characterized in that using micro mirror into
When the adjusting of the arbitrary pupil illumination of row, the flip angle of micro mirror described in the arbitrary pupil illumination of micro mirror monitoring device on-line measurement
Degree and face type, and the flip angle of the micro mirror is modified according to the flip angle and face type of the micro mirror measured.
9. a kind of litho machine, which is characterized in that including lighting system as claimed in claim 8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710115102.1A CN108507498B (en) | 2017-02-28 | 2017-02-28 | Micro-mirror monitoring method and device, illumination device and photoetching machine |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710115102.1A CN108507498B (en) | 2017-02-28 | 2017-02-28 | Micro-mirror monitoring method and device, illumination device and photoetching machine |
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| CN108507498A true CN108507498A (en) | 2018-09-07 |
| CN108507498B CN108507498B (en) | 2020-01-24 |
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| CN112731340A (en) * | 2019-10-14 | 2021-04-30 | 上海禾赛科技股份有限公司 | Angle measuring method, reflector system and laser radar |
| CN113341304A (en) * | 2021-02-23 | 2021-09-03 | 歌尔光学科技有限公司 | Testing method and testing device for reflecting micromirror array |
| CN114252028A (en) * | 2022-01-12 | 2022-03-29 | 内蒙古工业大学 | Compact four-light-spot two-dimensional corner detection device combined with laser triangulation method |
| CN116068863A (en) * | 2023-01-16 | 2023-05-05 | 上海镭望光学科技有限公司 | Pupil monitoring system |
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| CN112731340A (en) * | 2019-10-14 | 2021-04-30 | 上海禾赛科技股份有限公司 | Angle measuring method, reflector system and laser radar |
| CN113341304A (en) * | 2021-02-23 | 2021-09-03 | 歌尔光学科技有限公司 | Testing method and testing device for reflecting micromirror array |
| CN114252028A (en) * | 2022-01-12 | 2022-03-29 | 内蒙古工业大学 | Compact four-light-spot two-dimensional corner detection device combined with laser triangulation method |
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| CN116068863B (en) * | 2023-01-16 | 2025-07-15 | 上海镭望光学科技有限公司 | A pupil monitoring system |
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| Publication number | Publication date |
|---|---|
| CN108507498B (en) | 2020-01-24 |
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