CN108490519A - A kind of coating designs method and transparent substrate - Google Patents
A kind of coating designs method and transparent substrate Download PDFInfo
- Publication number
- CN108490519A CN108490519A CN201810247555.4A CN201810247555A CN108490519A CN 108490519 A CN108490519 A CN 108490519A CN 201810247555 A CN201810247555 A CN 201810247555A CN 108490519 A CN108490519 A CN 108490519A
- Authority
- CN
- China
- Prior art keywords
- accounting
- transparent substrate
- coating
- reflectance coating
- regional transmission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
This application discloses a kind of coating designs method and transparent substrates, are related to display technology field, solve the problems, such as that the whole film plating process design that existing semi-transparent semi-reflecting film uses is complicated, technological requirement is high and cost is higher；The coating designs method includes the following steps：(1) selected reflective film material is plated on the transparent substrate；(2) accounting of regional transmission is calculated according to required transmissivity or reflectivity；(3) it according to the accounting of the regional transmission calculated, is open to the reflectance coating of plating on the transparent substrate, specially：Entire reflective film region is divided into M*N homalographic sub-rectangular areas；When the accounting of regional transmission is ZaWhen, to wherein Za* M*N sub-regions carry out completely open, form reflectance coating graphic structure.The present processes have design simply, the low feature of manufacturing technique requirent, and can greatly improve the stability of product.
Description
Technical field
This application involves display technology fields, and in particular to a kind of coating designs method and transparent substrate.
Background technology
The fields such as augmented reality and vehicle/airborne new line display since it is desired that merge outer transmissive light beam and internal components simultaneously
Imaging beam has extensive demand for Transflective class optical device.The prior art is passed through using whole coating technique
Design multi-layer film structure realize to light beam transflection than control, since film material needs the relatively long-wave band covered to visible light
With Transflective proportional control action, film layer design can be caused complicated, for film material, base material, technology stability
It is required that it is high, cause device manufacturing process complicated, cost is higher.
Apply for content
The embodiment of the present application solves existing semi-transparent semi-reflecting film and adopts by a kind of coating designs method of offer and transparent substrate
The design of whole film plating process is complicated, technological requirement is high and the higher problem of cost, and providing a kind of Transflective ratio can
It adjusts and designs the film plating process simple, manufacturing technique requirent is low and stability is high.
In order to achieve the above objectives, the application mainly provides the following technical solutions：
On the one hand, the embodiment of the present application provides a kind of coating designs method, includes the following steps：
(1) selected reflective film material is plated on the transparent substrate；
(2) accounting of regional transmission is calculated according to required transmissivity or reflectivity；
(3) it according to the accounting of the regional transmission calculated, is open to the reflectance coating of plating on the transparent substrate, specifically
For：Entire reflective film region is divided into M*N homalographic sub-rectangular areas；When the accounting of regional transmission is ZaWhen, to wherein Za*
M*N sub-regions carry out completely open, formation reflectance coating graphic structure.
Preferably, the scale of the subregion is less than the limit of resolution of human eye.
Preferably, the accounting of regional transmission is calculated according to formula below according to required transmissivity or reflectivity：
Plate the whole transmissivity T=Z of the transparent substrate of reflectance coatinga*Tg+Zb*Tf, plate the entirety of the transparent substrate of reflectance coating
Reflectivity R=Za*Rg+Zb*Rf, and Tg+Ag+Rg=1, Tf+Af+Rf=1, Za+Zb=1, wherein TgFor the transmissivity of transparent substrate,
AgFor the absorptivity of transparent substrate, RgFor the reflectivity of transparent substrate, TfFor the transmissivity of reflector space, AfFor reflector space
Absorptivity, RfFor the reflectivity of reflector space, ZaFor the accounting of regional transmission, ZbFor the accounting of reflector space, thus can release：
The accounting of regional transmission is：Za=(T-Tf)/(Tg-Tf),
The accounting of reflector space is：Zb=(R-Rg)/(Rf-Rg)。
Preferably, to wherein Za* after the progress of M*N sub-regions is completely open, the reflectance coating graphic structure of formation is grid
Columns structure.
Preferably, the width of the paliform structure is less than the limit of resolution of human eye.
Preferably, the paliform structure is curve paliform structure.
Preferably, the graphic structure generated using computer random, opens the reflectance coating of plating on the transparent substrate
Mouthful.
Preferably, the graphic structure generated using computer random, to plate reflectance coating on the transparent substrate into
Row opening, specially：
Using computer to each sub-regions random assignment, i-th of subregion assignment Xi, wherein Xi∈ { 1,2,3 ..., M*
N }, as i ≠ j, Xi≠Xj, 1≤i≤M*N, 1≤j≤M*N, and the size of the numerical value of each sub-regions is evenly distributed, then it is right
Value is more than (1-Za) all subregions of * M*N are open.
Preferably, the transparent substrate is glass substrate.
On the other hand, the embodiment of the present application also provides a kind of transparent substrate, have according to above-mentioned on the transparent substrate
The reflectance coating that coating designs method is coated with.
One or more technical solutions provided in the embodiments of the present application have at least the following technical effects or advantages：
1. pure reflectance coating is only arranged by changing the conventional method for plating multilayer film production in the embodiment of the present application on the transparent substrate
Structure realizes semi-transparent semi-reflecting effect, the duty ratio by controlling reflectance coating on transparent base can be realized to transmissivity
With the adjusting of reflectivity, there is design simply, the low feature of manufacturing technique requirent, and the stabilization of product can be greatly improved
Property.
2. the method that the embodiment of the present application generates graphic structure by computer random, makes the film layer on transparent substrate be open
Location and shape are random, avoid the diffraction effect of film layer structure periodic structure, reduce interference of the diffraction light to observation, simultaneously
The transmitted light beam of transparent region and the reflected beams of reflector space are evenly distributed, and can promote sight of the transparent region to external beam
Effect is examined, and the imaging effect of reflective film region can be promoted, synthesis improves the semi-transparent semi-reflecting display effect of transparent substrate.
Description of the drawings
Fig. 1 is that the reflecting film structure that one embodiment of the application provides realizes the semi-transparent semi-reflecting effect diagram of light beam；
Fig. 2 is the schematic diagram for the reflecting film structure that another embodiment of the application provides；
Fig. 3 is the schematic diagram for the reflecting film structure that another embodiment of the application provides；
Fig. 4 is the schematic diagram for the reflecting film structure that another embodiment of the application provides.
Specific implementation mode
Further to illustrate that the application is to reach the technological means and effect that predetermined goal of the invention is taken, below in conjunction with
Preferred embodiment, specific implementation mode, structure, feature and its effect to the technical solution proposed according to the application, specifically
It is bright as after.In the following description, what different " embodiment " or " embodiment " referred to is not necessarily the same embodiment.In addition, one
Or the special characteristic, structure or feature in multiple embodiments can be combined by any suitable form.
The embodiment of the present application provides a kind of coating designs method, specifically includes following steps：
(1) one piece of transparent substrate is chosen, selected reflective film material is plated on the transparent substrate.The transparent substrate
Material is glass or plastics, preferably glass substrate；The reflective film material can be selected based on the actual application requirements, generally may be used
For metal films such as aluminium film, silverskin, golden film, chromium film or platinum films, or include the alloy film of aluminium, silver, gold, chromium or platinum.The application is real
It applies the method that vacuum splashing and plating can be used in example and is coated with reflectance coating.
(2) accounting that regional transmission is calculated according to required transmissivity or reflectivity, can specifically carry out as follows
It calculates：
Plate the whole transmissivity T=Z of the transparent substrate of reflectance coatinga*Tg+Zb*Tf, plate the entirety of the transparent substrate of reflectance coating
Reflectivity R=Za*Rg+Zb*Rf, and Tg+Ag+Rg=1, Tf+Af+Rf=1, Za+Zb=1, wherein TgFor the transmissivity of transparent substrate,
AgFor the absorptivity of transparent substrate, RgFor the reflectivity of transparent substrate, TfFor the transmissivity of reflector space, AfFor reflector space
Absorptivity, RfFor the reflectivity of reflector space, ZaFor the accounting of regional transmission, ZbFor the accounting of reflector space, thus can release：
The accounting of regional transmission is：Za=(T-Tf)/(Tg-Tf),
The accounting of reflector space is：Zb=(R-Rg)/(Rf-Rg)。
(3) it according to the accounting of the regional transmission calculated, is open to the reflectance coating of plating on the transparent substrate, specifically
For：Entire reflective film region is divided into M*N homalographic sub-rectangular areas；When the accounting of regional transmission is ZaWhen, to wherein Za*
M*N sub-regions carry out completely open, formation reflectance coating graphic structure.
The conventional plating multilayer film production of the embodiment of the present application change, the method for realizing semi-transparent semi-reflecting effect by different film layers,
Pure reflecting film structure is only set on transparent substrate, semi-transparent semi-reflecting effect is realized by catoptric arrangement spatially, such as Fig. 1 institutes
Show, the transmission of external beam realized by transparent region a, the reflection of internal components imaging beam is realized by reflective film region b,
And the adjusting to Transflective ratio can be realized in the accounting by controlling reflector space on transparent base, has design simply,
The low feature of manufacturing technique requirent, and the stability of product can be greatly improved.The embodiment of the present application is by by reflectance coating area
Domain is divided into the sub-rectangular areas of several homalographics, is open by unit of subregion, can be in actual production according to actually setting
Meter requires that the accounting of reflecting film structure, aperture position and graphic structure is adjusted flexibly.Quarter can be used in the embodiment of the present application
Etching technique is open to reflectance coating, can make full use of image transfer in the prior art, and only need to once be etched
Reflectance coating graphic structure can be formed, it is low to coating technique requirement, it is easy to inexpensive mass production.The embodiment of the present application provides
Above-mentioned coating designs method can be applied to penetrate display field, such as augmented reality, vehicle/airborne new line display field, translucent
The incoherent lights energy such as display case, Peoper's ghost (Pepper's ghost) display distribute field.
Preferably, the scale of above-mentioned subregion is less than the limit of resolution of human eye.When the scale of above-mentioned subregion is less than people
When the limit of resolution of eye, the reflectance coating graphic structure to be formed can be prevented from the blur-free imaging in the eyes of observer, avoided to seeing
Examine generation interference.
Preferably, the embodiment of the present application is to wherein Za* after the progress of M*N sub-regions is completely open, the reflectance coating of formation
Graphic structure is paliform structure, as shown in Figure 2.The embodiment of the present application is based on paliform structural principle, and external beam is through saturating
Area pellucida domain a is observed, and internal imaging light beam is reflected by reflective film region b to be observed, and makes observer through transparent region a observations
Shi Jiben is not influenced by paliform structure reflectance coating, realizes semi-transparent semi-reflecting effect.
Preferably, the limit of resolution that the width of above-mentioned paliform structure is less than human eye can make paliform by the design
The reflection film pattern of structure cannot be imaged in observer's eyes, avoid generating interference to observation.For example, being shown in vehicle-mounted new line
Field is coated with paliform structure reflectance coating on windshield, and windshield is located in front of observer at 1m, and people
The angle resoluting ability of eye is about 2.9*10-4The width of rad, design paliform structure reflective film region b are less than 2.9*10-4m(290
μm), human eye cannot be to paliform structure reflectance coating blur-free imaging, to avoid influence of the reflectance coating to observation.
Preferably, above-mentioned paliform structure is curve paliform structure.When the paliform structure of reflective film region b is close
When the scale of wavelength, there will be Grating Properties, and apparent diffraction effect be will produce, in order to reduce shadow of the diffracted beam to observation
It rings, the methods of wavelength dimension structural periodicity can be destroyed by extending diffraction direction.When paliform structure is set as curve fence
When shape structure, it can make structure that no longer there is unique diffraction direction, intensity of the diffraction light on direction can be reduced, to
Reduce interference of the diffraction light to observation.
Preferably, the graphic structure generated using computer random, opens the reflectance coating of plating on the transparent substrate
Mouthful.Since the graphic structure that computer random generates has scrambling, reflectance coating aperture position and shape are random, can avoid week
The diffraction effect of phase property structure, greatly promotes observing effect.
Preferably, the graphic structure generated using computer random, opens the reflectance coating of plating on the transparent substrate
Mouthful, specially：Using computer to each sub-regions random assignment, i-th of subregion assignment Xi, wherein Xi∈ 1,2,3 ...,
M*N }, as i ≠ j, Xi≠Xj, 1≤i≤M*N, 1≤j≤M*N, and the size of the numerical value of each sub-regions is evenly distributed, then
(1-Z is more than to valuea) all subregions of * M*N are open.The embodiment of the present application is given birth to by way of computer random assignment
At graphic structure, the aperture position for the reflectance coating graphic structure to be formed can be made to be evenly distributed, reflectance coating graphic structure is evenly distributed,
On the one hand do not have structural periodicity, interference will not be generated to observation, on the other hand can make the transmitted light beam of transparent region and anti-
The reflected beams for penetrating region are evenly distributed, and can promote transparent region to the observing effect of external beam and promote reflectance coating
The imaging effect in region, synthesis improve the semi-transparent semi-reflecting display effect of transparent substrate.
Have the embodiment of the present application also provides a kind of transparent substrate, on the transparent substrate and is coated with according to above-mentioned film plating process
Reflectance coating.
Illustrate above-mentioned coating designs method provided by the embodiments of the present application below by way of specific embodiment.
Embodiment 1
(1) one piece of glass substrate is provided, the method aluminum film of vacuum splashing and plating is used on the glass substrate；
(2) accounting of regional transmission is calculated according to following equation：
Glass substrate to plating reflectance coating has following formula：Plate the whole transmissivity T=Z of the glass substrate of reflectance coatinga*Tg+
Zb*Tf, plate the overall reflectivity R=Z of the glass substrate of reflectance coatinga*Rg+Zb*Rf, and Tg+Ag+Rg=1, Tf+Af+Rf=1, Za+Zb
=1, wherein TgFor the transmissivity of glass substrate, AgFor the absorptivity of glass substrate, RgFor the reflectivity of glass substrate, TfIt is anti-
Penetrate the transmissivity in region, AfFor the absorptivity of reflector space, RfFor the reflectivity of reflector space, ZaFor the accounting of regional transmission, Zb
For the accounting of reflector space, thus can release：
The accounting of regional transmission is：Za=(T-Tf)/(Tg-Tf),
The accounting of reflector space is：Zb=(R-Rg)/(Rf-Rg)；
The whole transmissivity T of the glass substrate of the present embodiment design plating reflectance coating is 85%, and glass substrate is learnt through measuring
Transmissivity TgIt is 98%, the transmissivity T of reflector spacefIt is 1%, the accounting Z of regional transmission can be calculated by above-mentioned formulaa
It is 86.6%, the accounting Z of reflector spacebIt is 13.4%.
(3) entire reflective film region is divided into M homalographic sub-rectangular areas, and this M sub-rectangular areas is combined into N
The grid region that a pitch is 290 μm；According to the accounting 86.6% of the regional transmission of above-mentioned calculating, to wherein 86.6%*N grid
Lattice region performs etching opening, and it is straight line paliform structure to make the reflectance coating graphic structure to be formed, as shown in Figure 1；Wherein etch
Technical process is：A layer photoresist is coated on the reflective coating of glass substrate, and place is exposed using panchromatic tune masking process
Reason, wherein photoresist protection zone are above-mentioned straight line paliform structure, then pass through wet-etching technology or dry etch process
Photoresist removal region is performed etching, plasma ashing processing finally is carried out to get to above-mentioned reflectance coating to photoresist
Graphic structure.
Embodiment 2
(1) one piece of plastic base is provided, the method aluminum film of vacuum splashing and plating is used on the plastic base；
(2) accounting of regional transmission is calculated according to following equation：
Plastic base to plating reflectance coating has following formula：Plate the whole transmissivity T=Z of the plastic base of reflectance coatinga*Tg+
Zb*Tf, plate the overall reflectivity R=Z of the plastic base of reflectance coatinga*Rg+Zb*Rf, and Tg+Ag+Rg=1, Tf+Af+Rf=1, Za+Zb
=1, wherein TgFor the transmissivity of plastic base, AgFor the absorptivity of plastic base, RgFor the reflectivity of plastic base, TfIt is anti-
Penetrate the transmissivity in region, AfFor the absorptivity of reflector space, RfFor the reflectivity of reflector space, ZaFor the accounting of regional transmission, Zb
For the accounting of reflector space, thus can release：
The accounting of regional transmission is：Za=(T-Tf)/(Tg-Tf),
The accounting of reflector space is：Zb=(R-Rg)/(Rf-Rg)；
The whole transmissivity T of the plastic base of the present embodiment design plating reflectance coating is 70%, and plastic base is learnt through measuring
Transmissivity TgIt is 98%, the transmissivity T of reflector spacefIt is 1%, the accounting Z of regional transmission can be calculated by above-mentioned formulaa
It is 71.1%, the accounting Z of reflector spacebIt is 28.9%.
(3) entire reflective film region is divided into M homalographic sub-rectangular areas, and this M sub-rectangular areas is combined into N
The curve grid region that a pitch is 290 μm；According to the accounting 71.1% of the regional transmission of above-mentioned calculating, to wherein 71.1%*N
A curve grid region performs etching opening, and it is curve paliform structure to make the reflectance coating graphic structure to be formed, as shown in Figure 2；
Wherein etching process is：A layer photoresist is coated on the reflective coating of plastic base, using panchromatic tune masking process into
Row exposure-processed, wherein photoresist protection zone are above-mentioned curve paliform structure, then pass through wet-etching technology or dry method
Etching technics performs etching photoresist removal region, finally carries out plasma ashing processing to photoresist to get to above-mentioned
Reflectance coating graphic structure.
Embodiment 3
(1) one piece of glass substrate is provided, aluminium nickel film is coated with using the method for vacuum splashing and plating on the glass substrate；
(2) accounting of regional transmission is calculated according to following equation：
Glass substrate to plating reflectance coating has following formula：Plate the whole transmissivity T=Z of the glass substrate of reflectance coatinga*Tg+
Zb*Tf, plate the overall reflectivity R=Z of the glass substrate of reflectance coatinga*Rg+Zb*Rf, and Tg+Ag+Rg=1, Tf+Af+Rf=1, Za+Zb
=1, wherein TgFor the transmissivity of glass substrate, AgFor the absorptivity of glass substrate, RgFor the reflectivity of glass substrate, TfIt is anti-
Penetrate the transmissivity in region, AfFor the absorptivity of reflector space, RfFor the reflectivity of reflector space, ZaFor the accounting of regional transmission, Zb
For the accounting of reflector space, thus can release：
The accounting of regional transmission is：Za=(T-Tf)/(Tg-Tf),
The accounting of reflector space is：Zb=(R-Rg)/(Rf-Rg)；
The whole transmissivity T of the glass substrate of the present embodiment design plating reflectance coating is 85%, and glass substrate is learnt through measuring
Transmissivity TgIt is 98%, the transmissivity T of reflector spacefIt is 1%, the accounting Z of regional transmission can be calculated by above-mentioned formulaa
It is 86.6%, the accounting Z of reflector spacebIt is 13.4%.
(3) entire reflective film region is divided into 500*400 homalographic sub-rectangular areas, using computer to each sub-district
Domain random assignment, i-th of subregion assignment Xi, wherein Xi∈ { 1,2,3 ..., 500*400 }, as i ≠ j, Xi≠Xj, 1≤i≤
500*400,1≤j≤500*400, and the size of the numerical value of each sub-regions is evenly distributed, then 13.4%* is more than to value
All subregions of 500*400 perform etching opening；Wherein etching process is：It is coated on the reflective coating of glass substrate
One layer photoresist is exposed processing using panchromatic tune masking process, and wherein non-lithographic glue protection zone is that above-mentioned value is more than
The graphic structure that all subregions of 13.4%*500*400 are formed, then by wet-etching technology or dry etch process to light
Photoresist removal region performs etching, and finally carries out plasma ashing processing to photoresist, obtains reflectance coating figure as shown in Figure 3
Shape structure.
Embodiment 4
(1) one piece of glass substrate is provided, aluminium nickel film is coated with using the method for vacuum splashing and plating on the glass substrate；
(2) accounting of regional transmission is calculated according to following equation：
Glass substrate to plating reflectance coating has following formula：Plate the whole transmissivity T=Z of the glass substrate of reflectance coatinga*Tg+
Zb*Tf, plate the overall reflectivity R=Z of the glass substrate of reflectance coatinga*Rg+Zb*Rf, and Tg+Ag+Rg=1, Tf+Af+Rf=1, Za+Zb
=1, wherein TgFor the transmissivity of glass substrate, AgFor the absorptivity of glass substrate, RgFor the reflectivity of glass substrate, TfIt is anti-
Penetrate the transmissivity in region, AfFor the absorptivity of reflector space, RfFor the reflectivity of reflector space, ZaFor the accounting of regional transmission, Zb
For the accounting of reflector space, thus can release：
The accounting of regional transmission is：Za=(T-Tf)/(Tg-Tf),
The accounting of reflector space is：Zb=(R-Rg)/(Rf-Rg)；
The whole transmissivity T of the glass substrate of the present embodiment design plating reflectance coating is 80%, and glass substrate is learnt through measuring
Transmissivity TgIt is 98%, the transmissivity T of reflector spacefIt is 1%, the accounting Z of regional transmission can be calculated by above-mentioned formulaa
It is 81.4%, the accounting Z of reflector spacebIt is 18.6%.
(3) entire reflective film region is divided into 500*400 homalographic sub-rectangular areas, using computer to each sub-district
Domain random assignment, i-th of subregion assignment Xi, wherein Xi∈ { 1,2,3 ..., 500*400 }, as i ≠ j, Xi≠Xj, 1≤i≤
500*400,1≤j≤500*400, and the size of the numerical value of each sub-regions is evenly distributed, then 18.6*500* is more than to value
400 all subregions perform etching opening；Wherein etching process is：One layer is coated on the reflective coating of glass substrate
Photoresist is exposed processing using panchromatic tune masking process, and wherein non-lithographic glue protection zone is that above-mentioned value is more than 18.6*
The graphic structure that all subregions of 500*400 are formed, then photoresist is gone by wet-etching technology or dry etch process
Except region performs etching, plasma ashing processing finally is carried out to photoresist, obtains reflection film pattern knot as shown in Figure 4
Structure.
As can be seen from the above-described embodiment, coating designs method provided by the embodiments of the present application need not be on the transparent substrate
Multilayer film production is plated, pure reflecting film structure is only coated with, semi-transparent semi-reflecting effect can be realized by catoptric arrangement spatially, and logical
Adjusting to Transflective ratio can be realized in the accounting for crossing reflector space on control transparent base, has that design is simple, production
The low feature of technological requirement, and the stability of product can be greatly improved.
In the above-described embodiments, it all emphasizes particularly on different fields to the description of each embodiment, there is no the portion being described in detail in some embodiment
Point, it may refer to the associated description of other embodiment.
It is understood that the correlated characteristic in above-mentioned apparatus can be referred to mutually.In addition, in above-described embodiment " the
One ", " second " etc. is and not represent the quality of each embodiment for distinguishing each embodiment.
In the instructions provided here, numerous specific details are set forth.It is to be appreciated, however, that the implementation of the present invention
Example can be put into practice without these specific details.In some instances, well known structure and skill is not been shown in detail
Art, so as not to obscure the understanding of this description.
Similarly, it should be understood that in order to simplify the disclosure and help to understand one or more of each inventive aspect,
Above in the description of exemplary embodiment of the present invention, each feature of the invention is grouped together into single implementation sometimes
In example, figure or descriptions thereof.However, the device of the disclosure should be construed to reflect following intention：It is i.e. required to protect
Shield the present invention claims the more features of feature than being expressly recited in each claim.More precisely, as following
Claims reflect as, inventive aspect is all features less than single embodiment disclosed above.Therefore,
Thus the claims for following specific implementation mode are expressly incorporated in the specific implementation mode, wherein each claim itself
All as a separate embodiment of the present invention.
It will be understood to those skilled in the art that can adaptively be changed to the component in the device in embodiment
Become and they are arranged in the one or more devices different from the embodiment.Can the component combination in embodiment at
One component, and it can be divided into multiple subassemblies in addition.In addition at least some of such feature is mutually to arrange
Except reprimand, any combinations may be used to owning disclosed in this specification (including adjoint claim, abstract and attached drawing)
All components of feature and so disclosed any device are combined.Unless expressly stated otherwise, this specification (including companion
With claim, abstract and attached drawing) disclosed in each feature can be by providing identical, equivalent or similar purpose alternative features
To replace.
In addition, it will be appreciated by those of skill in the art that although some embodiments described herein include other embodiments
In included certain features rather than other feature, but the combination of the feature of different embodiments means in of the invention
Within the scope of and form different embodiments.For example, in the following claims, embodiment claimed is appointed
One of meaning mode can use in any combination.The present invention all parts embodiment can with hardware realization, or
It is realized with combination thereof.
It should be noted that the present invention will be described rather than limits the invention for above-described embodiment, and ability
Field technique personnel can design alternative embodiment without departing from the scope of the appended claims.In the claims,
Any reference mark between bracket should not be configured to limitations on claims.Word "comprising" does not exclude the presence of not
Component or component listed in the claims.Word "a" or "an" before component or component does not exclude the presence of multiple
Such component or component.The present invention can be realized by means of including the device of several different components.It is several listing
In the claim of component, several in these components can be embodied by the same component item.Word first,
Second and the use of third etc. do not indicate that any sequence.These words can be construed to title.
Finally illustrate, above example is only to illustrate the technical solution of the application and unrestricted, although with reference to compared with
The application is described in detail in good embodiment, it will be understood by those of ordinary skill in the art that, it can be to the skill of the application
Art scheme is modified or replaced equivalently, and without departing from the objective and range of technical scheme, should all be covered at this
In the right of application.
Claims (10)
1. a kind of coating designs method, which is characterized in that include the following steps：
(1) selected reflective film material is plated on the transparent substrate；
(2) accounting of regional transmission is calculated according to required transmissivity or reflectivity；
(3) it according to the accounting of the regional transmission calculated, is open to the reflectance coating of plating on the transparent substrate, specially：It will
Entire reflective film region is divided into M*N homalographic sub-rectangular areas；When the accounting of regional transmission is ZaWhen, to wherein Za* M*N
Subregion carries out completely open, formation reflectance coating graphic structure.
2. coating designs method according to claim 1, which is characterized in that point of the scale of the subregion less than human eye
Distinguish the limit.
3. coating designs method according to claim 1, which is characterized in that pressed according to required transmissivity or reflectivity
The accounting of regional transmission is calculated according to formula below：
Plate the whole transmissivity T=Z of the transparent substrate of reflectance coatinga*Tg+Zb*Tf, plate the overall reflectivity of the transparent substrate of reflectance coating
R=Za*Rg+Zb*Rf, and Tg+Ag+Rg=1, Tf+Af+Rf=1, Za+Zb=1, wherein TgFor the transmissivity of transparent substrate, AgIt is saturating
The absorptivity of bright substrate, RgFor the reflectivity of transparent substrate, TfFor the transmissivity of reflector space, AfFor the absorptivity of reflector space,
RfFor the reflectivity of reflector space, ZaFor the accounting of regional transmission, ZbFor the accounting of reflector space, thus can release：
The accounting of regional transmission is：Za=(T-Tf)/(Tg-Tf),
The accounting of reflector space is：Zb=(R-Rg)/(Rf-Rg)。
4. coating designs method according to claim 1, which is characterized in that wherein Za* M*N sub-regions carry out complete
After opening, the reflectance coating graphic structure of formation is paliform structure.
5. coating designs method according to claim 4, which is characterized in that the width of the paliform structure is less than human eye
The limit of resolution.
6. coating designs method according to claim 4, which is characterized in that the paliform structure is curve paliform knot
Structure.
7. coating designs method according to claim 1, which is characterized in that the figure knot generated using computer random
Structure is open to the reflectance coating of plating on the transparent substrate.
8. coating designs method according to claim 7, which is characterized in that the figure generated using computer random
Structure is open to the reflectance coating of plating on the transparent substrate, specially：
Using computer to each sub-regions random assignment, i-th of subregion assignment Xi, wherein Xi∈ { 1,2,3 ..., M*N }, when
When i ≠ j, Xi≠Xj, 1≤i≤M*N, 1≤j≤M*N, and the size of the numerical value of each sub-regions is evenly distributed, then it is big to being worth
In (1-Za) all subregions of * M*N are open.
9. coating designs method according to claim 1, which is characterized in that the transparent substrate is glass substrate.
10. a kind of transparent substrate, which is characterized in that have according to claim 1-9 any one of them on the transparent substrate
The reflectance coating that coating designs method is coated with.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810247555.4A CN108490519A (en) | 2018-03-23 | 2018-03-23 | A kind of coating designs method and transparent substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810247555.4A CN108490519A (en) | 2018-03-23 | 2018-03-23 | A kind of coating designs method and transparent substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108490519A true CN108490519A (en) | 2018-09-04 |
Family
ID=63319660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810247555.4A Pending CN108490519A (en) | 2018-03-23 | 2018-03-23 | A kind of coating designs method and transparent substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108490519A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115626764A (en) * | 2022-11-03 | 2023-01-20 | 芜湖长信新型显示器件有限公司 | Vehicle-mounted HUD curved reflector and manufacturing process thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1493903A (en) * | 2003-09-15 | 2004-05-05 | 信利半导体有限公司 | Method of determining ratio of coloured liquid crystal screen reflectivity and transmisivity from reflecting film opening |
| CN102203660A (en) * | 2008-11-28 | 2011-09-28 | 夏普株式会社 | Optical system and display |
| CN102887115A (en) * | 2011-07-21 | 2013-01-23 | 株式会社村上开明堂 | Rearview mirror with monitor |
| CN103200411A (en) * | 2012-01-05 | 2013-07-10 | 索尼公司 | Display device |
| CN107678588A (en) * | 2017-09-27 | 2018-02-09 | 京东方科技集团股份有限公司 | Touch screen and touch control display apparatus |
-
2018
- 2018-03-23 CN CN201810247555.4A patent/CN108490519A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1493903A (en) * | 2003-09-15 | 2004-05-05 | 信利半导体有限公司 | Method of determining ratio of coloured liquid crystal screen reflectivity and transmisivity from reflecting film opening |
| CN102203660A (en) * | 2008-11-28 | 2011-09-28 | 夏普株式会社 | Optical system and display |
| CN102887115A (en) * | 2011-07-21 | 2013-01-23 | 株式会社村上开明堂 | Rearview mirror with monitor |
| CN103200411A (en) * | 2012-01-05 | 2013-07-10 | 索尼公司 | Display device |
| CN107678588A (en) * | 2017-09-27 | 2018-02-09 | 京东方科技集团股份有限公司 | Touch screen and touch control display apparatus |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115626764A (en) * | 2022-11-03 | 2023-01-20 | 芜湖长信新型显示器件有限公司 | Vehicle-mounted HUD curved reflector and manufacturing process thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10877214B2 (en) | Diffraction gratings for beam redirection | |
| RU2670078C1 (en) | Optical component for counterfeit protection and product with optical counterfeit protection | |
| US6922267B2 (en) | Image display apparatus | |
| US4582389A (en) | Holographic device | |
| US20010053023A1 (en) | Wire grid type polarizer and method of manufacturing the same | |
| US11262698B2 (en) | Preparation system and method for polymer-dispersed liquid crystal holographic grating | |
| CN110088672A (en) | Optical system | |
| RU2317574C2 (en) | Lamellar structure with lens-like effect creating structure having optical diffraction property | |
| JPS62502150A (en) | Graded index aspherical combiner and display system using it | |
| RU2008119511A (en) | MULTILAYERED BODY AND METHOD FOR ITS MANUFACTURE | |
| JPH02275902A (en) | Filter device using holographic element | |
| US20080123073A1 (en) | Optical element, exposure apparatus using the same, and device manufacturing method | |
| JP2018081138A (en) | Image display device | |
| CN102998798A (en) | Virtual image display device and manufacturing method of virtual image display device | |
| JPS61289320A (en) | Optical type display unit and manufacture thereof | |
| WO2018045836A1 (en) | Reflective holographic display device and display method thereof | |
| JPS62501238A (en) | Method for manufacturing side lobe suppression hologram and side lobe suppression hologram | |
| CN107850707A (en) | Display body, article, the manufacture method of bottom plate and bottom plate | |
| DE112016004665T5 (en) | Variable reflectivity image combiner for portable displays | |
| KR20170140321A (en) | Manufacturing method of display body, article, original plate and original plate | |
| CN108490519A (en) | A kind of coating designs method and transparent substrate | |
| CN102402015A (en) | Thin film device and manufacturing method of thin film device | |
| CN111596402B (en) | A metasurface-based multi-polarization state generator | |
| CN110546556A (en) | Diffractive Antiglare in Multilayer Displays | |
| CN204631441U (en) | A Device for Rapidly Fabricating Color Filters in a Large Area Using Synchrotron Radiation |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180904 |