CN108479326B - Mutually vertical electron beam reflection resonance avalanche desulfurization system - Google Patents
Mutually vertical electron beam reflection resonance avalanche desulfurization system Download PDFInfo
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- 238000010894 electron beam technology Methods 0.000 title claims abstract description 51
- 238000006477 desulfuration reaction Methods 0.000 title abstract description 8
- 230000023556 desulfurization Effects 0.000 title abstract description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 7
- QHRPVRRJYMWFKB-UHFFFAOYSA-N [Sb].[Cs] Chemical compound [Sb].[Cs] QHRPVRRJYMWFKB-UHFFFAOYSA-N 0.000 claims description 2
- 239000005864 Sulphur Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 claims 1
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 abstract description 27
- 239000007789 gas Substances 0.000 abstract description 22
- 239000011593 sulfur Substances 0.000 abstract description 6
- 229910052815 sulfur oxide Inorganic materials 0.000 abstract description 6
- 239000000428 dust Substances 0.000 abstract description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 238000003915 air pollution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005686 electrostatic field Effects 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- -1 antimony cesium basic metal Chemical class 0.000 description 1
- 229910052728 basic metal Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/60—Simultaneously removing sulfur oxides and nitrogen oxides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
- B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
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- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/017—Combinations of electrostatic separation with other processes, not otherwise provided for
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- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
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Abstract
互垂电子束反射谐振雪崩除硫硝系统，属于静电除尘领域。它主要解决的技术问题是增大电子束的电子数量，更有效的氧化SO2和NOx，从而去除硫及氮氧化物。它由气体出口、出口左壁、高压正极板、下连接壁、高压电源、电子枪、照射窗、入口左壁、气体入口、入口右壁、入射电子束、反应器、上反射壁、第一反射电子束、下反射壁、主负极板、第二反射电子束、辅助负极板、出口右壁组成，其特征是：气体出口通过反应器同气体入口相连，反应器在由照射窗的上端和入口右壁的下端相连的水平面下方，反应器在辅助负极板下端的水平面上方，反应器在上反射壁左侧，反应器在下反射壁左侧，反应器在照射窗右侧。它主要用于静电除尘领域。
The utility model relates to a mutually perpendicular electron beam reflection resonance avalanche desulfurization system, which belongs to the field of electrostatic dust removal. The main technical problem it solves is to increase the number of electrons in the electron beam to more effectively oxidize SO 2 and NO x , thereby removing sulfur and nitrogen oxides. It consists of gas outlet, outlet left wall, high voltage positive plate, lower connecting wall, high voltage power supply, electron gun, irradiation window, inlet left wall, gas inlet, inlet right wall, incident electron beam, reactor, upper reflection wall, first reflection The electron beam, the lower reflection wall, the main negative plate, the second reflected electron beam, the auxiliary negative plate, and the right wall of the outlet are composed of: the gas outlet is connected with the gas inlet through the reactor, and the reactor is connected by the upper end of the irradiation window and the inlet Below the horizontal plane where the lower end of the right wall is connected, the reactor is above the horizontal plane of the lower end of the auxiliary negative plate, the reactor is on the left side of the upper reflective wall, the reactor is on the left side of the lower reflective wall, and the reactor is on the right side of the irradiation window. It is mainly used in the field of electrostatic dust removal.
Description
技术领域technical field
本发明属于静电除尘领域，尤其是指互垂电子束反射谐振雪崩除硫硝系统。The invention belongs to the field of electrostatic dust removal, in particular to a mutually perpendicular electron beam reflection resonance avalanche desulfurization system.
背景技术Background technique
硫及氮氧化物是大气污染的重要因素，因而脱硫及氮氧化物是大气污染治理的重要任务。利用电子束干法脱硫、氮氧化物是一种常用方法。将温度为150摄氏度的排放气体冷却到70摄氏度左右，根据气体中二氧化硫及氮氧化物的浓度确定加入微量的氨量，然后将含有氨的混合气体送入反应器。经电子束照射，排气中的SO2和NOx受电子束强烈氧化，在极短时间内被氧化成硫酸和硝酸，这些酸与其周围的氨反应生成(NH4)2SO4和NH4NO3的细微颗粒。电子束的电子数量对SO2和NOx的氧化反应起到非常大的作用，但是仅靠电子枪的发射数量不能很好的满足氧化反应的需要。为了增大电子束的电子数量，更有效的氧化SO2和NOx，从而去除硫及氮氧化物，本发明提出了互垂电子束反射谐振雪崩除硫硝系统。Sulfur and nitrogen oxides are important factors of air pollution, so desulfurization and nitrogen oxides are important tasks of air pollution control. The use of electron beam dry desulfurization and nitrogen oxides is a common method. Cool the exhaust gas with a temperature of 150 degrees Celsius to about 70 degrees Celsius, add a trace amount of ammonia according to the concentration of sulfur dioxide and nitrogen oxides in the gas, and then send the mixed gas containing ammonia into the reactor. After being irradiated by electron beam, SO 2 and NO x in exhaust gas are strongly oxidized by electron beam, and are oxidized into sulfuric acid and nitric acid in a very short time. These acids react with surrounding ammonia to form (NH 4 ) 2 SO 4 and NH 4 Fine particles of NO 3 . The number of electrons in the electron beam plays a very important role in the oxidation reaction of SO 2 and NO x , but the emission number of the electron gun alone cannot meet the needs of the oxidation reaction. In order to increase the number of electrons in the electron beam, more effectively oxidize SO 2 and NO x , so as to remove sulfur and nitrogen oxides, the present invention proposes a mutual-perpendicular electron beam reflection resonance avalanche desulfurization system.
发明内容SUMMARY OF THE INVENTION
为了增大电子束的电子数量，更有效的氧化SO2和NOx，从而去除硫及氮氧化物，本发明提出了互垂电子束反射谐振雪崩除硫硝系统。In order to increase the number of electrons in the electron beam, more effectively oxidize SO 2 and NO x , so as to remove sulfur and nitrogen oxides, the present invention proposes a mutual-perpendicular electron beam reflection resonance avalanche desulfurization system.
本发明解决其技术问题所采用的技术方案是：本发明装置由气体出口、出口左壁、高压正极板、下连接壁、高压电源、电子枪、照射窗、入口左壁、气体入口、入口右壁、入射电子束、反应器、上反射壁、第一反射电子束、下反射壁、主负极板、第二反射电子束、辅助负极板、出口右壁组成，其特征是：气体出口通过反应器同气体入口相连，反应器在由照射窗的上端和入口右壁的下端相连的水平面下方，反应器在辅助负极板下端的水平面上方，反应器在上反射壁左侧，反应器在下反射壁左侧，反应器在照射窗右侧，反应器在下连接壁右侧，反应器在高压正极板右侧，反应器在出口左壁的右侧，出口左壁通过高压正极板同下连接壁相连，下连接壁通过照射窗同入口左壁相连，高压电源通过电子枪同照射窗相连，照射窗通过入射电子束同上反射壁相连，入射电子束同第一反射电子束相连，第二反射电子束同第一反射电子束相连，第二反射电子束同高压正极板相连，入口右壁通过上反射壁同下反射壁相连，主负极板同下反射壁相连，出口右壁同下反射壁相连，辅助负极板同出口右壁相连；上反射壁同下反射壁互相垂直；上反射壁的长度同下反射壁的长度相等；下反射壁同出口右壁的夹角为一百三十五度；入口右壁同上反射壁的夹角为一百三十五度。The technical scheme adopted by the present invention to solve the technical problem is as follows: the device of the present invention consists of a gas outlet, a left wall of the outlet, a high-voltage positive plate, a lower connecting wall, a high-voltage power supply, an electron gun, an irradiation window, a left wall of the inlet, a gas inlet, and a right wall of the inlet. , the incident electron beam, the reactor, the upper reflective wall, the first reflective electron beam, the lower reflective wall, the main negative plate, the second reflected electron beam, the auxiliary negative plate, and the right wall of the outlet, characterized in that the gas outlet passes through the reactor Connected to the gas inlet, the reactor is below the horizontal plane connected by the upper end of the irradiation window and the lower end of the right wall of the inlet, the reactor is above the horizontal plane of the lower end of the auxiliary negative plate, the reactor is on the left side of the upper reflective wall, and the reactor is on the left side of the lower reflective wall. side, the reactor is on the right side of the irradiation window, the reactor is on the right side of the lower connecting wall, the reactor is on the right side of the high-voltage positive plate, the reactor is on the right side of the left wall of the outlet, and the left wall of the outlet is connected with the lower connecting wall through the high-voltage positive plate, The lower connecting wall is connected to the left wall of the entrance through the irradiation window, the high-voltage power supply is connected to the irradiation window through the electron gun, the irradiation window is connected to the upper reflecting wall through the incident electron beam, the incident electron beam is connected to the first reflected electron beam, and the second reflected electron beam is connected to the first reflected electron beam. The first reflected electron beam is connected to the high-voltage positive electrode plate, the right wall of the entrance is connected to the lower reflecting wall through the upper reflecting wall, the main negative plate is connected to the lower reflecting wall, the right wall of the exit is connected to the lower reflecting wall, and the auxiliary negative electrode is connected to the lower reflecting wall. The plate is connected to the right wall of the outlet; the upper reflection wall and the lower reflection wall are perpendicular to each other; the length of the upper reflection wall is equal to the length of the lower reflection wall; the angle between the lower reflection wall and the right wall of the outlet is one hundred and thirty-five degrees; The angle between the wall and the reflecting wall above is one hundred and thirty-five degrees.
上反射壁和下反射壁均涂有锑铯碱性金属，当受到电子照射时会引起雪崩效应。电子枪由灯丝、加速管、加速电极、扫描线圈等组成。反应器为由照射窗的上端和入口右壁的下端相连的水平面、辅助负极板下端的水平面、上反射壁、下反射壁、照射窗、下连接壁、高压正极板，和出口左壁被辅助负极板下端的水平面所截上部分，所围成的空间区域。烟道由气体入口、反应器、气体出口三部分组成，也就是说反应器是烟道除去气体入口和气体出口的部分。Both the upper and lower reflective walls are coated with antimony cesium basic metal, which causes an avalanche effect when irradiated by electrons. The electron gun consists of a filament, an accelerating tube, an accelerating electrode, and a scanning coil. The reactor is a horizontal plane connected by the upper end of the irradiation window and the lower end of the right wall of the inlet, the horizontal plane of the lower end of the auxiliary negative plate, the upper reflective wall, the lower reflective wall, the irradiation window, the lower connecting wall, the high-voltage positive plate, and the outlet left wall is assisted The space area enclosed by the upper part of the horizontal plane at the lower end of the negative plate. The flue is composed of three parts: the gas inlet, the reactor, and the gas outlet, that is to say, the reactor is the part of the flue that removes the gas inlet and the gas outlet.
电子枪发射出电子通过照射窗进入反应器，一部分电子同SO2和NOx分子相遇，对其进行氧化，另一部分电子束射到上反射壁，由于上反射壁涂有锑铯碱性金属，所以一个电子将激发出二个电子，激发后的电子绝大部分将射向下反射壁。由于下反射壁也涂有锑铯碱性这样一个电子也会激发出二个电子，电子的数目将是电子枪发射出电子的二的二次方倍增加，即雪崩效应。由下反射壁产生的电子束在主负极板和主负极板的静电场的作用下将加速射向主负极板，在反应器内将再次同同SO2和NOx分子相遇，对其进行氧化。氧化后生成的细微颗粒将被高压正极板和辅助负极板组成的静电场吸附，处理后的气体由气体出口排出，从而完成了去除硫及氮氧化物，并且吸附了处理过程中所产生的细微颗粒。The electrons emitted by the electron gun enter the reactor through the irradiation window, some of the electrons meet with SO 2 and NO x molecules to oxidize them, and the other part of the electron beams shoot to the upper reflective wall. One electron will excite two electrons, and most of the excited electrons will be directed towards the downward reflecting wall. Since the lower reflective wall is also coated with antimony cesium alkali, one electron will also excite two electrons, and the number of electrons will be a quadratic increase of the two electrons emitted by the electron gun, that is, the avalanche effect. The electron beam generated by the lower reflective wall will be accelerated to the main negative plate under the action of the electrostatic field of the main negative plate and the main negative plate, and will meet with SO 2 and NO x molecules again in the reactor to oxidize them. . The fine particles generated after oxidation will be adsorbed by the electrostatic field composed of the high-voltage positive plate and the auxiliary negative plate, and the treated gas will be discharged from the gas outlet, thus completing the removal of sulfur and nitrogen oxides, and adsorbing the fine particles generated during the treatment process. particles.
本发明的有益效果是可以增大电子束的电子数量，更有效的氧化SO2和NOx，从而去除硫及氮氧化物。它主要用于静电除尘领域。The beneficial effect of the present invention is that the number of electrons in the electron beam can be increased, SO 2 and NO x can be oxidized more effectively, thereby removing sulfur and nitrogen oxides. It is mainly used in the field of electrostatic dust removal.
附图说明Description of drawings
下面结合附图和实施例对本发明进一步说明。The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
图1是互垂电子束反射谐振雪崩除硫硝系统的侧剖面构造图。Figure 1 is a side cross-sectional structural diagram of a mutually perpendicular electron beam reflection resonance avalanche desulfurization system.
图中1.气体出口，2.出口左壁，3.高压正极板，4.下连接壁，5.高压电源，6.电子枪，7.照射窗，8.入口左壁，9.气体入口，10.入口右壁，11.入射电子束，12.反应器，13.上反射壁，14.第一反射电子束，15.下反射壁，16.主负极板，17.第二反射电子束，18.辅助负极板，19.出口右壁。In the figure 1. Gas outlet, 2. Left wall of outlet, 3. High voltage positive plate, 4. Lower connecting wall, 5. High voltage power supply, 6. Electron gun, 7. Irradiation window, 8. Left wall of inlet, 9. Gas inlet, 10. Entrance right wall, 11. Incident electron beam, 12. Reactor, 13. Upper reflecting wall, 14. First reflecting electron beam, 15. Lower reflecting wall, 16. Main negative plate, 17. Second reflecting electron beam , 18. Auxiliary negative plate, 19. Right wall of outlet.
具体实施方式Detailed ways
在图1中，气体出口1通过反应器12同气体入口9相连，出口左壁2通过高压正极板3同下连接壁4相连，下连接壁4通过照射窗7同入口左壁8相连，高压电源5通过电子枪6同照射窗7相连，照射窗7通过入射电子束11同上反射壁13相连，入射电子束11同第一反射电子束14相连，第二反射电子束17同第一反射电子束14相连，第二反射电子束17同高压正极板3相连，入口右壁10通过上反射壁13同下反射壁15相连，主负极板16同下反射壁15相连，出口右壁19同下反射壁15相连，辅助负极板18同出口右壁19相连。In FIG. 1, the gas outlet 1 is connected to the gas inlet 9 through the
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