CN108456397A - Halogen-free epoxy resin composition with low dielectric loss - Google Patents
Halogen-free epoxy resin composition with low dielectric loss Download PDFInfo
- Publication number
- CN108456397A CN108456397A CN201710085785.0A CN201710085785A CN108456397A CN 108456397 A CN108456397 A CN 108456397A CN 201710085785 A CN201710085785 A CN 201710085785A CN 108456397 A CN108456397 A CN 108456397A
- Authority
- CN
- China
- Prior art keywords
- epoxy resin
- halogen
- bisphenol
- dielectric loss
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 84
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 84
- 239000000203 mixture Substances 0.000 title claims abstract description 15
- -1 ester compound Chemical class 0.000 claims abstract description 55
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229920005989 resin Polymers 0.000 claims abstract description 20
- 239000011347 resin Substances 0.000 claims abstract description 20
- 239000003063 flame retardant Substances 0.000 claims abstract description 15
- DWSWCPPGLRSPIT-UHFFFAOYSA-N benzo[c][2,1]benzoxaphosphinin-6-ium 6-oxide Chemical compound C1=CC=C2[P+](=O)OC3=CC=CC=C3C2=C1 DWSWCPPGLRSPIT-UHFFFAOYSA-N 0.000 claims abstract description 13
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 19
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 18
- PXKLMJQFEQBVLD-UHFFFAOYSA-N Bisphenol F Natural products C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 16
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 13
- 229920003986 novolac Polymers 0.000 claims description 13
- 229910019142 PO4 Inorganic materials 0.000 claims description 8
- 239000004305 biphenyl Substances 0.000 claims description 8
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical group C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 claims description 7
- 235000010290 biphenyl Nutrition 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 claims description 6
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims description 5
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical class CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- 229930185605 Bisphenol Natural products 0.000 claims description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 239000010452 phosphate Substances 0.000 claims description 4
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 claims description 3
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 3
- 230000004048 modification Effects 0.000 claims description 3
- 238000012986 modification Methods 0.000 claims description 3
- 229920001721 polyimide Polymers 0.000 claims description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 2
- CQOZJDNCADWEKH-UHFFFAOYSA-N 2-[3,3-bis(2-hydroxyphenyl)propyl]phenol Chemical compound OC1=CC=CC=C1CCC(C=1C(=CC=CC=1)O)C1=CC=CC=C1O CQOZJDNCADWEKH-UHFFFAOYSA-N 0.000 claims description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims description 2
- 239000004114 Ammonium polyphosphate Substances 0.000 claims description 2
- 229910015900 BF3 Inorganic materials 0.000 claims description 2
- 229920000877 Melamine resin Polymers 0.000 claims description 2
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 claims description 2
- 125000002723 alicyclic group Chemical group 0.000 claims description 2
- 235000019826 ammonium polyphosphate Nutrition 0.000 claims description 2
- 229920001276 ammonium polyphosphate Polymers 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Substances FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims description 2
- 229930003836 cresol Natural products 0.000 claims description 2
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 claims description 2
- 125000003700 epoxy group Chemical group 0.000 claims description 2
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims description 2
- IHHCJKNEVHNNMW-UHFFFAOYSA-N methane;phenol Chemical compound C.OC1=CC=CC=C1 IHHCJKNEVHNNMW-UHFFFAOYSA-N 0.000 claims description 2
- 150000004780 naphthols Chemical group 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 150000002989 phenols Chemical class 0.000 claims description 2
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 claims description 2
- 235000021286 stilbenes Nutrition 0.000 claims description 2
- 125000006839 xylylene group Chemical group 0.000 claims description 2
- 235000021317 phosphate Nutrition 0.000 claims 4
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 3
- 229940106691 bisphenol a Drugs 0.000 claims 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims 2
- IUBPJIAHYCFKGA-UHFFFAOYSA-N C=1(C(=CC=CC1)C)C.C=1(C(=CC=CC1)C)C.C1(O)=CC(O)=CC=C1 Chemical group C=1(C(=CC=CC1)C)C.C=1(C(=CC=CC1)C)C.C1(O)=CC(O)=CC=C1 IUBPJIAHYCFKGA-UHFFFAOYSA-N 0.000 claims 1
- GHXDFIBBCNLVSG-UHFFFAOYSA-N P(=O)(O)(O)O.C1(=CC=CC=C1)C1=CC=CC=C1.C1(=CC=CC=C1)O.C1(=CC=CC=C1)O Chemical compound P(=O)(O)(O)O.C1(=CC=CC=C1)C1=CC=CC=C1.C1(=CC=CC=C1)O.C1(=CC=CC=C1)O GHXDFIBBCNLVSG-UHFFFAOYSA-N 0.000 claims 1
- 239000010426 asphalt Substances 0.000 claims 1
- 150000003851 azoles Chemical class 0.000 claims 1
- 238000005660 chlorination reaction Methods 0.000 claims 1
- 238000002485 combustion reaction Methods 0.000 claims 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 claims 1
- 150000002460 imidazoles Chemical class 0.000 claims 1
- QPPQHRDVPBTVEV-UHFFFAOYSA-N isopropyl dihydrogen phosphate Chemical compound CC(C)OP(O)(O)=O QPPQHRDVPBTVEV-UHFFFAOYSA-N 0.000 claims 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 150000002790 naphthalenes Chemical group 0.000 claims 1
- 150000004893 oxazines Chemical class 0.000 claims 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims 1
- 229920000137 polyphosphoric acid Polymers 0.000 claims 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-O triphenylphosphanium Chemical compound C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-O 0.000 claims 1
- 239000004848 polyfunctional curative Substances 0.000 abstract description 25
- 239000000758 substrate Substances 0.000 abstract description 19
- 238000010521 absorption reaction Methods 0.000 abstract description 13
- 150000002148 esters Chemical class 0.000 abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 12
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 abstract description 9
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000011342 resin composition Substances 0.000 description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 239000011889 copper foil Substances 0.000 description 9
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 8
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 6
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 125000004185 ester group Chemical group 0.000 description 5
- 230000009477 glass transition Effects 0.000 description 5
- 239000011256 inorganic filler Substances 0.000 description 5
- 229910003475 inorganic filler Inorganic materials 0.000 description 5
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 239000003365 glass fiber Substances 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- DEQUKPCANKRTPZ-UHFFFAOYSA-N (2,3-dihydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1O DEQUKPCANKRTPZ-UHFFFAOYSA-N 0.000 description 3
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- LYKRPDCJKSXAHS-UHFFFAOYSA-N phenyl-(2,3,4,5-tetrahydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC(C(=O)C=2C=CC=CC=2)=C1O LYKRPDCJKSXAHS-UHFFFAOYSA-N 0.000 description 3
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 3
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-dioxonaphthalene Natural products C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- BOKGTLAJQHTOKE-UHFFFAOYSA-N 1,5-dihydroxynaphthalene Chemical compound C1=CC=C2C(O)=CC=CC2=C1O BOKGTLAJQHTOKE-UHFFFAOYSA-N 0.000 description 2
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 2
- BSYJHYLAMMJNRC-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-ol Chemical compound CC(C)(C)CC(C)(C)O BSYJHYLAMMJNRC-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 2
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 2
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- NJXBVBPTDHBAID-UHFFFAOYSA-M ethyl(triphenyl)phosphanium;chloride Chemical compound [Cl-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC)C1=CC=CC=C1 NJXBVBPTDHBAID-UHFFFAOYSA-M 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 239000002648 laminated material Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 description 2
- MNZMMCVIXORAQL-UHFFFAOYSA-N naphthalene-2,6-diol Chemical compound C1=C(O)C=CC2=CC(O)=CC=C21 MNZMMCVIXORAQL-UHFFFAOYSA-N 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
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- PFRGGOIBYLYVKM-UHFFFAOYSA-N 15alpha-hydroxylup-20(29)-en-3-one Natural products CC(=C)C1CCC2(C)CC(O)C3(C)C(CCC4C5(C)CCC(=O)C(C)(C)C5CCC34C)C12 PFRGGOIBYLYVKM-UHFFFAOYSA-N 0.000 description 1
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- XUSNPFGLKGCWGN-UHFFFAOYSA-N 3-[4-(3-aminopropyl)piperazin-1-yl]propan-1-amine Chemical compound NCCCN1CCN(CCCN)CC1 XUSNPFGLKGCWGN-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 208000037427 Beta-propeller protein-associated neurodegeneration Diseases 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
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- 229920000388 Polyphosphate Polymers 0.000 description 1
- SOKRNBGSNZXYIO-UHFFFAOYSA-N Resinone Natural products CC(=C)C1CCC2(C)C(O)CC3(C)C(CCC4C5(C)CCC(=O)C(C)(C)C5CCC34C)C12 SOKRNBGSNZXYIO-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- PZBFGYYEXUXCOF-UHFFFAOYSA-N TCEP Chemical compound OC(=O)CCP(CCC(O)=O)CCC(O)=O PZBFGYYEXUXCOF-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- IUTDVGSJRKTQPM-UHFFFAOYSA-N [4-(1,3-benzothiazol-2-yl)phenyl]boronic acid Chemical compound C1=CC(B(O)O)=CC=C1C1=NC2=CC=CC=C2S1 IUTDVGSJRKTQPM-UHFFFAOYSA-N 0.000 description 1
- BQPNUOYXSVUVMY-UHFFFAOYSA-N [4-[2-(4-diphenoxyphosphoryloxyphenyl)propan-2-yl]phenyl] diphenyl phosphate Chemical compound C=1C=C(OP(=O)(OC=2C=CC=CC=2)OC=2C=CC=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OP(=O)(OC=1C=CC=CC=1)OC1=CC=CC=C1 BQPNUOYXSVUVMY-UHFFFAOYSA-N 0.000 description 1
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- 125000001931 aliphatic group Chemical group 0.000 description 1
- CAVCGVPGBKGDTG-UHFFFAOYSA-N alumanylidynemethyl(alumanylidynemethylalumanylidenemethylidene)alumane Chemical compound [Al]#C[Al]=C=[Al]C#[Al] CAVCGVPGBKGDTG-UHFFFAOYSA-N 0.000 description 1
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
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- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- ASMQGLCHMVWBQR-UHFFFAOYSA-M diphenyl phosphate Chemical compound C=1C=CC=CC=1OP(=O)([O-])OC1=CC=CC=C1 ASMQGLCHMVWBQR-UHFFFAOYSA-M 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 150000002440 hydroxy compounds Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- ULYZAYCEDJDHCC-UHFFFAOYSA-N isopropyl chloride Chemical compound CC(C)Cl ULYZAYCEDJDHCC-UHFFFAOYSA-N 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
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- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 201000007614 neurodegeneration with brain iron accumulation 5 Diseases 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- BOLDJAUMGUJJKM-LSDHHAIUSA-N renifolin D Natural products CC(=C)[C@@H]1Cc2c(O)c(O)ccc2[C@H]1CC(=O)c3ccc(O)cc3O BOLDJAUMGUJJKM-LSDHHAIUSA-N 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
- C08G59/4071—Curing agents not provided for by the groups C08G59/42 - C08G59/66 phosphorus containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4223—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/02—Flame or fire retardant/resistant
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/08—Stabilised against heat, light or radiation or oxydation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/22—Halogen free composition
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/20—Applications use in electrical or conductive gadgets
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
- C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/03—Polymer mixtures characterised by other features containing three or more polymers in a blend
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- Chemical Kinetics & Catalysis (AREA)
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Abstract
Description
技术领域technical field
本发明涉及无卤素环氧树脂组成物,特别有关一种具有低介电损耗的无卤素环氧树脂组成物。The invention relates to a halogen-free epoxy resin composition, in particular to a halogen-free epoxy resin composition with low dielectric loss.
背景技术Background technique
随着电子产品信息处理的高速化和多功能化,应用频率不断提高,3-6GHz将成为主流,除了保持对层压板材料的耐热性有更高的要求外,对其介电常数和介质损耗值要求会越来越低。With the high-speed and multi-functionalization of electronic product information processing, the application frequency continues to increase, and 3-6GHz will become the mainstream. In addition to maintaining higher requirements for the heat resistance of laminate materials, their dielectric constant and dielectric The loss value requirement will be lower and lower.
现有的传统环氧玻璃纤维布层压板(FR-4)很难满足电子产品的高频及高速发展的使用需求,同时基板材料不再是扮演传统意义下的机械支撑角色,而将与电子元件一起成为印制电路板(PCB)和终端厂商设计者提升产品性能的一个重要途径。由于高介电常数(Dk)会使信号传递速率变慢,高介质损耗值(Df)会使信号部分转化为热能损耗在基板材料中,因而降低介电常数及介质损耗值已成为基板业者关注的焦点。传统的环氧玻璃纤维布层压板材料多采用双氰胺作为硬化剂,这种硬化剂由于具有三级反应胺,具有良好的操作性,但是由于其碳-氮键较弱,在高温下容易裂解,导致硬化物的耐热分解温度较低,无法符合不含铅技术的耐热要求。在此背景下,随着几年前不含铅技术的大范围实施,产业界开始采用酚醛树脂作为环氧树脂的硬化剂,酚醛树脂具有高密度的苯环耐热结构,所以环氧硬化后的体系的耐热性非常优异,但是同时出现硬化产物的介电性能被恶化的趋势。The existing traditional epoxy glass fiber cloth laminate (FR-4) is difficult to meet the high-frequency and high-speed development of electronic products. At the same time, the substrate material no longer plays the role of mechanical support in the traditional sense, but will be integrated with Together, components are an important way for designers of printed circuit boards (PCBs) and end manufacturers to improve product performance. Because a high dielectric constant (Dk) will slow down the signal transmission rate, and a high dielectric loss value (Df) will cause part of the signal to be converted into heat energy loss in the substrate material, so reducing the dielectric constant and dielectric loss value has become the focus of the substrate industry. Focus. Traditional epoxy glass fiber cloth laminate materials mostly use dicyandiamide as hardener. This kind of hardener has good operability due to its tertiary reactive amine, but because of its weak carbon-nitrogen bond, it is easy to Cracking, resulting in a low heat-resistant decomposition temperature of the hardened product, which cannot meet the heat-resistant requirements of lead-free technology. In this context, with the large-scale implementation of lead-free technology a few years ago, the industry began to use phenolic resin as a hardener for epoxy resin. Phenolic resin has a high-density benzene ring heat-resistant structure, so after epoxy hardening The heat resistance of the system is very excellent, but at the same time there is a tendency that the dielectric properties of the hardened product are deteriorated.
有报导提出合成一系列含有苯环、萘环或联苯结构的活性酯硬化剂作为环氧树脂的硬化剂,如IAAN、IABN、TriABN和TAAN,得到的硬化产物和传统的酚醛树脂相比,可以明显的降低其介电常数和介质损耗值。It has been reported that a series of active ester hardeners containing benzene ring, naphthalene ring or biphenyl structure have been synthesized as hardeners for epoxy resins, such as IAAN, IABN, TriABN and TAAN. Compared with traditional phenolic resins, the hardened products obtained have Can significantly reduce its dielectric constant and dielectric loss value.
虽然上述报导的技术提出使用活性酯作为环氧树脂的硬化剂可以改善硬化产物的耐湿性,降低吸水率,降低硬化产物的介电常数和介质损耗值,但是其缺点是很难在耐热性和介电性能的间取得一个很好的平衡,使硬化产物同时具有高的玻璃转化温度和低的介质损耗值,且使其介电性能随频率的变化比较稳定,吸水率更低。Although the technology reported above proposes that the use of active ester as a hardener for epoxy resin can improve the moisture resistance of the hardened product, reduce water absorption, and reduce the dielectric constant and dielectric loss value of the hardened product, but its disadvantage is that it is difficult to improve the heat resistance. A good balance is achieved between the dielectric properties and the hardened product, so that the hardened product has a high glass transition temperature and a low dielectric loss value at the same time, and the dielectric properties are relatively stable with the change of frequency, and the water absorption rate is lower.
发明内容Contents of the invention
本发明的一目的,在于提供一种具有低介电损耗的无卤素环氧树脂组成物,采用活性酯作为环氧树脂的硬化剂,使硬化产物可达到高玻璃转化温度、低介电特性、高耐热性、难燃性及不含卤素等电路基板特性。An object of the present invention is to provide a halogen-free epoxy resin composition with low dielectric loss, using active ester as a hardener for epoxy resin, so that the hardened product can reach a high glass transition temperature, low dielectric properties, Circuit board characteristics such as high heat resistance, flame retardancy and halogen-free.
为了达成上述的目的,本发明提供一种具有低介电损耗的无卤素环氧树脂组成物,包含:(A)100重量份的环氧树脂;(B)10-30重量份的DOPO改质硬化剂;(C)1-10重量份的苯并恶嗪树脂;(D)60-90重量份的活性酯化合物;(E)20-50重量份的阻燃剂;以及(F)0.5-10重量份的硬化促进剂。In order to achieve the above object, the present invention provides a halogen-free epoxy resin composition with low dielectric loss, comprising: (A) 100 parts by weight of epoxy resin; (B) 10-30 parts by weight of DOPO modified Hardener; (C) benzoxazine resin of 1-10 parts by weight; (D) active ester compound of 60-90 parts by weight; (E) flame retardant of 20-50 parts by weight; and (F) 0.5- 10 parts by weight of hardening accelerator.
本发明的一态样,环氧树脂为选自:双酚A型环氧树脂、双酚F型环氧树脂、双酚S型环氧树脂、苯酚酚醛型环氧树脂、甲酚酚醛型环氧树脂、双酚A酚醛型环氧树脂、双酚F酚醛型环氧树脂、二苯乙烯型环氧树脂、含三嗪骨架的环氧树脂、含芴骨架的环氧树脂、三酚酚甲烷型环氧树脂、联苯型环氧树脂、亚二甲苯基型环氧树脂、联苯芳烷基型环氧树脂、萘型环氧树脂、二环戊二烯型环氧树脂、脂环式环氧树脂、多官能酚类及稠环芳香族类的二缩水甘油醚化合物、分子内具有3个或4个环氧基的三官能及四官能环氧树脂,及含磷环氧树脂所组成的群组的一者,较佳为二环戊二烯型环氧树脂,其为具有可有效提高玻璃转化温度Tg(~175°)、降低吸水率低、及提升尺寸稳定性等功能。In one aspect of the present invention, the epoxy resin is selected from: bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin Oxygen resin, bisphenol A novolac epoxy resin, bisphenol F novolac epoxy resin, stilbene epoxy resin, epoxy resin containing triazine skeleton, epoxy resin containing fluorene skeleton, triphenol phenol methane Type epoxy resin, biphenyl type epoxy resin, xylylene type epoxy resin, biphenyl aralkyl type epoxy resin, naphthalene type epoxy resin, dicyclopentadiene type epoxy resin, alicyclic type Epoxy resin, diglycidyl ether compound of multifunctional phenols and fused ring aromatics, trifunctional and tetrafunctional epoxy resin with 3 or 4 epoxy groups in the molecule, and phosphorus-containing epoxy resin One of the group is preferably a dicyclopentadiene epoxy resin, which has the functions of effectively increasing the glass transition temperature Tg (~175°), reducing low water absorption, and improving dimensional stability.
本发明的DOPO改质硬化剂为选自:9,10-二氢-9-氧杂-10-磷菲-10-氧化物(9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide(DOPO))及其衍生物或树脂所组成的群组的一者,举例来说DOPO树脂可为DOPO-HQ、DOPO-NQ、DOPO-PN、DOPO-BPN、及DOPO键结的环氧树脂等,其中DOPO-PN为DOPO-phenolic novolac、DOPO-BPN可为DOPO-BPAN(DOPO-bisphenol A novolac)、DOPO-BPFN(DOPO-bisphenol F novolac)、DOPO-BPSN(DOPO-bisphenol S novolac)等双酚酚醛化合物,DOPO改质硬化剂于本树脂组合物内主要做为与环氧树脂结合的硬化剂使用,该硬化剂除了可提供良好的热稳定性和低介电性外,其亦有帮助阻燃的功能。The DOPO modified hardener of the present invention is selected from: 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (9,10-dihydro-9-oxa-10-phosphaphenanthrene-10- oxide (DOPO)) and its derivatives or resins, for example, DOPO resins can be DOPO-HQ, DOPO-NQ, DOPO-PN, DOPO-BPN, and DOPO-bonded epoxy Resin, etc., where DOPO-PN is DOPO-phenolic novolac, DOPO-BPN can be DOPO-BPAN (DOPO-bisphenol A novolac), DOPO-BPFN (DOPO-bisphenol F novolac), DOPO-BPSN (DOPO-bisphenol S novolac) Such as bisphenol novolac compound, DOPO modified hardener is mainly used as a hardener combined with epoxy resin in this resin composition. In addition to providing good thermal stability and low dielectric properties, the hardener is also It has the function of helping flame retardancy.
本发明的苯并恶嗪树脂为选自:双酚F(BPF)型苯并恶嗪、双酚S(BPS)型苯并恶嗪、二氨基二苯甲烷(DDM)型苯并恶嗪、二氨基二苯醚(ODA)型苯并恶嗪及聚酰亚胺化苯并恶嗪(polybenzoxazine with polyimide)所组成的群组的一者,较佳为ODA型苯并恶嗪,其可以降低硬化物介电常数Dk(1至10GHz,平均大约4.0)、介电耗损因子Df(1至10GHz,平均大约0.0065)、提升耐热性、及降低吸水率。本发明的无卤素环氧树脂组成物采用了ODA型苯并恶嗪树脂,该苯并恶嗪树脂含ODA型结构,除了拥有传统苯并恶嗪高玻璃转化温度(Tg)、吸水率低、尺寸稳定性高、低热膨胀系数、耐热阻燃佳等优点外,还具有优异的介电性能,在环氧树脂中混入该苯并恶嗪树脂不仅可以降低硬化物介电常数、介电损耗值、及吸水率,并可保持黏合力不下降;该苯并恶嗪与non-dopo类的含磷阻燃剂的搭配还可以帮助增加阻燃效果,能减少硬化产物阻燃性达到UL 94V-0所需磷含量,进一步降低吸水率。The benzoxazine resin of the present invention is selected from: bisphenol F (BPF) type benzoxazine, bisphenol S (BPS) type benzoxazine, diaminodiphenylmethane (DDM) type benzoxazine, One of the group consisting of diaminodiphenyl ether (ODA) type benzoxazine and polyimide benzoxazine (polybenzoxazine with polyimide), preferably ODA type benzoxazine, which can reduce Dielectric constant Dk (1 to 10GHz, average about 4.0) and dielectric loss factor Df (1 to 10GHz, average about 0.0065) of hardened products, improve heat resistance, and reduce water absorption. The halogen-free epoxy resin composition of the present invention adopts ODA type benzoxazine resin, and this benzoxazine resin contains ODA type structure, besides having traditional benzoxazine high glass transition temperature (Tg), low water absorption, In addition to the advantages of high dimensional stability, low thermal expansion coefficient, good heat resistance and flame retardancy, it also has excellent dielectric properties. Mixing the benzoxazine resin in the epoxy resin can not only reduce the dielectric constant and dielectric loss of the hardened product value, and water absorption, and can keep the adhesive force from falling; the combination of the benzoxazine and non-dopo phosphorus-containing flame retardants can also help increase the flame retardant effect, and can reduce the flame retardancy of the hardened product to reach UL 94V -0 required phosphorus content to further reduce water absorption.
本发明的活性酯化合物为选自:包含至少一个具有高反应性的酯基,该酯基可参与环氧树脂的硬化反应,而该反应由于不会生成极性基团从而提供优异的低介电常数、低介电耗损因子、高耐热性、及低吸水率。该活性脂化合物具备以下结构:活性酯硬化系统是将活性酯作为环氧树脂硬化剂的一种功能,可与环氧树酯发生反应,形成不含二级醇羟基的网状交联结构,相对于一般环氧树酯系统在开环反应产生二级醇羟基的网状结构,会有较低的介电性质及低吸水率性质。另,从现有技术如日本专利特开2002-012650、2003-082063及2003-252958等可得知,有苯环、萘环或联苯结构的活性酯化合物作为环氧树脂的硬化剂时,该环氧树脂组成物可得到的硬化物与传统酚醛相比会有较低的介电常数和介电损耗值。The active ester compound of the present invention is selected from: containing at least one ester group with high reactivity, which can participate in the hardening reaction of epoxy resin, and this reaction provides excellent low dielectric strength due to the absence of polar groups. Electrical constant, low dielectric dissipation factor, high heat resistance, and low water absorption. The active ester compound has the following structure: active ester hardening system is a function of active ester as an epoxy resin hardener, which can react with epoxy resin to form a network cross-linked structure without secondary alcoholic hydroxyl groups. Compared with the general epoxy resin system in the ring-opening reaction to produce a network structure of secondary alcoholic hydroxyl groups, it will have lower dielectric properties and low water absorption properties. In addition, from the prior art such as Japanese Patent Application Laid-Open 2002-012650, 2003-082063 and 2003-252958, etc., it can be known that when active ester compounds with benzene ring, naphthalene ring or biphenyl structure are used as hardeners for epoxy resins, The hardened product obtained from the epoxy resin composition has lower dielectric constant and dielectric loss value compared with traditional phenolic formaldehyde.
用于本发明的活性酯化合物可以是具有活性酯基的活性酯化合物,但在本发明中,较佳在其分子中具有至少两个活性酯基的化合物。活性酯化合物可以由羧酸化合物与羟基化合物及/或硫醇化合物反应而得到,较佳的,活性酯化合物可以通过由羧酸化合物与自由酚化合物和萘酚化合物中的其中一种或一种以上的化合物反应而得到,特别较佳的,则是活性酯化合物与羧酸化合物及萘酚化合物两者反应而得到的芳香族化合物,其为具有酚性羟基并且在分子中具有至少两个活性酯基的芳香族化合物。活性酯化合物可以是直链的或多支链的。如活性酯化合物在其分子中具有至少两个羧酸的化合物且该分子中具有至少两个羧酸的化合物含有脂族链时,其可提高自身与环氧树脂的兼容性,而当其具有芳环时,可以提高耐热性。The active ester compound used in the present invention may be an active ester compound having an active ester group, but in the present invention, a compound having at least two active ester groups in its molecule is preferred. The active ester compound can be obtained by reacting a carboxylic acid compound with a hydroxyl compound and/or a thiol compound. Preferably, the active ester compound can be obtained by reacting a carboxylic acid compound with a free phenol compound and a naphthol compound. The above compounds are obtained by reacting, especially preferably, the aromatic compounds obtained by the reaction of active ester compounds, carboxylic acid compounds and naphthol compounds, which have phenolic hydroxyl groups and have at least two active compounds in the molecule. Ester-based aromatic compounds. Active ester compounds may be linear or highly branched. Such as the active ester compound has at least two carboxylic acids in its molecule and the compound with at least two carboxylic acids in the molecule contains an aliphatic chain, it can improve its compatibility with epoxy resins, and when it has When an aromatic ring is used, heat resistance can be improved.
形成活性酯化合物的羧酸化合物的具体例子,可以包含苯甲酸、乙酸、琥珀酸、马来酸、衣康酸、邻苯二甲酸、间苯二甲酸、对苯二甲酸、均苯四酸等。其中,如以耐热性的观点来看,较佳的是琥珀酸、马来酸、衣康酸、邻苯二甲酸、间苯二甲酸、对苯二甲酸、邻苯二甲酸、间苯二甲酸,更佳的是间苯二甲酸和对苯二甲酸。Specific examples of carboxylic acid compounds that form active ester compounds include benzoic acid, acetic acid, succinic acid, maleic acid, itaconic acid, phthalic acid, isophthalic acid, terephthalic acid, pyromellitic acid, etc. . Among them, from the viewpoint of heat resistance, succinic acid, maleic acid, itaconic acid, phthalic acid, isophthalic acid, terephthalic acid, phthalic acid, and isophthalic acid are preferable. Formic acid, more preferably isophthalic acid and terephthalic acid.
形成活性酯化合物的羟基化合物的具体实例,可以包含氢醌、间苯二酚、双酚A、双酚F、双酚S,酚酞,甲基化双酚A,甲基化双酚F,甲基化双酚S,苯酚,邻甲酚间甲酚,对甲酚,邻苯二酚,α-萘酚,β-萘酚,1,5-二羟基萘,1,6-二羟基萘,2,6-二羟基萘,二羟基二苯甲酮,三羟基二苯甲酮,四羟基二苯甲酮,氟甘氨酸,苯三醇,二环戊二烯基二苯酚,及苯酚酚醛清漆等。其中,从提高活性酯化合物的耐热性来看,较佳的是1,5-二羟基萘,1,6-二羟基萘,2,6-二羟基萘,二羟基二苯甲酮,三羟基二苯甲酮,四羟基二苯甲酮,二环戊二烯基二苯酚和苯酚酚醛清漆,更佳的是二羟基二苯甲酮,三羟基二苯甲酮,四羟基二苯甲酮,二环戊二烯基二苯酚和苯酚酚醛清漆,特别较佳的则是二环戊二烯基二苯酚和苯酚酚醛清漆。该二环戊二烯结构由于是刚性结构,因此在具有提高耐热性的效果的同时,亦具有抑制线膨胀系数在较低的效果,并且有使成型后的基板不易产生翘曲的优点。Specific examples of hydroxy compounds that form active ester compounds may include hydroquinone, resorcinol, bisphenol A, bisphenol F, bisphenol S, phenolphthalein, methylated bisphenol A, methylated bisphenol F, formazan Hydroxylated bisphenol S, phenol, o-cresol m-cresol, p-cresol, catechol, α-naphthol, β-naphthol, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dihydroxybenzophenone, trihydroxybenzophenone, tetrahydroxybenzophenone, fluoroglycine, benzenetriol, dicyclopentadienyl diphenol, and phenol novolac, etc. . Among them, from the viewpoint of improving the heat resistance of active ester compounds, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dihydroxybenzophenone, three Hydroxybenzophenones, tetrahydroxybenzophenones, dicyclopentadienyldiphenols and phenol novolacs, more preferably dihydroxybenzophenones, trihydroxybenzophenones, tetrahydroxybenzophenones , dicyclopentadienyl diphenol and phenol novolaks, particularly preferred are dicyclopentadienyl diphenol and phenol novolacs. Since the dicyclopentadiene structure is a rigid structure, it not only has the effect of improving heat resistance, but also has the effect of suppressing the coefficient of linear expansion at a low level, and has the advantage of making the molded substrate less likely to warp.
本发明的活性酯化合物另外还包含胺类结构,可以增加活性酯化合物与环氧树脂及其它硬化剂的兼容性,该胺类结构可与含胺基的单体反应交联而得,特别较佳的是二胺单体,包含:对苯二胺(p-phenylene diamine;简称PPDA)、4,4′-氧联二苯胺(4,4′-oxydianiline;简称4,4′-ODA)、3,4′-氧联二苯胺(3,4′-Oxydianiline简称3,4′-ODA)、2,2-双(4-[4-氨基苯氧基]苯基)丙烷(2,2-Bis(4-[4-aminophenoxy]phenyl)propane;简称BAPP)、2,2-双(4-[3-氨基苯氧基]苯基)砜(2,2-Bis(4-[3-aminophenoxy]phenyl)sulfone;简称m-BAPS)、1,3-双(4-氨基苯氧基)苯(1,3-Bis(4-aminophenoxy)benzene;简称TPE-R)等单体,特别较佳的则是4,4'-oxydianiline-4,4'-氧化二苯胺(简称4,4'-ODA,结构如下式)。The active ester compound of the present invention also includes an amine structure, which can increase the compatibility of the active ester compound with epoxy resins and other hardeners. The amine structure can be reacted and cross-linked with monomers containing amine groups, especially Preferably, diamine monomers include: p-phenylenediamine (p-phenylene diamine; PPDA for short), 4,4'-oxydianiline (4,4'-oxydianiline; 4,4'-ODA for short), 3,4'-oxydianiline (3,4'-Oxydianiline referred to as 3,4'-ODA), 2,2-bis(4-[4-aminophenoxy]phenyl)propane (2,2- Bis(4-[4-aminophenoxy]phenyl)propane; BAPP for short), 2,2-bis(4-[3-aminophenoxy]phenyl)sulfone (2,2-Bis(4-[3-aminophenoxy ]phenyl)sulfone; m-BAPS for short), 1,3-bis(4-aminophenoxy)benzene (1,3-Bis(4-aminophenoxy)benzene; TPE-R for short), and other monomers, especially preferred The most popular is 4,4'-oxydianiline-4,4'-oxidized diphenylamine (referred to as 4,4'-ODA, the structure is as follows).
该活性酯化合物,可以是1分子中具有1个以上酯基的树脂,也可以由市售品经合成改质后取得。例如可以由DIC株式会社制造的「EXB-9460」、「EXB-9470」、「EXB-9480」、「EXB-9420」等合成改质而成。The active ester compound may be a resin having more than one ester group in one molecule, or may be obtained from a commercially available product through synthetic modification. For example, it can be synthetically modified from "EXB-9460", "EXB-9470", "EXB-9480", "EXB-9420" manufactured by DIC Corporation.
活性酯化合物的制造方法没有特别限定。它可以通过已知的方法经合成后制得。例如,它可以通过羧酸化合物和羟基化合物之间的经缩合的反应获得。The production method of the active ester compound is not particularly limited. It can be produced synthetically by known methods. For example, it can be obtained by a condensation reaction between a carboxylic acid compound and a hydroxyl compound.
采用活性酯作为环氧树脂的硬化剂,活性酯硬化剂分子中有两个或多个具有较高活性的酯基,可以同环氧树脂进行硬化反应,且活性酯在和环氧树脂反应时可形成不含仲醇羟基的网状结构及不易生成极性基团,所以硬化后的环氧树脂具有较低的吸水率、较低的介电损耗和优异的耐热性。Active ester is used as the hardener of epoxy resin. There are two or more ester groups with high activity in the molecule of active ester hardener, which can undergo hardening reaction with epoxy resin, and active ester reacts with epoxy resin It can form a network structure without secondary alcohol hydroxyl groups and is not easy to generate polar groups, so the hardened epoxy resin has low water absorption, low dielectric loss and excellent heat resistance.
本发明的活性酯化合物的一例子,如下式1:An example of active ester compound of the present invention, following formula 1:
X为苯环或萘环,l、m、k=0或1,n=0.25-2。式1中的(二环戊二烯,DCPD)可以萘酚、苯酚、联苯酚、双酚A、双酚F或双酚S等结构取代,主要是可搭配组成物中环氧树脂的结构,以增加两者之间的相溶性。X is a benzene ring or a naphthalene ring, l, m, k=0 or 1, n=0.25-2. in formula 1 (Dicyclopentadiene, DCPD) can be replaced by structures such as naphthol, phenol, biphenol, bisphenol A, bisphenol F or bisphenol S, mainly because it can match the structure of epoxy resin in the composition to increase both compatibility between them.
本发明的无卤素环氧树脂组成物以活性酯化合物为硬化剂,充分发挥了活性酯与环氧树脂反应不生成极性基团,从而介电性能优异耐湿热性能好的优势。The halogen-free epoxy resin composition of the present invention uses an active ester compound as a hardening agent, and fully utilizes the advantages of no polar group formed by the reaction of the active ester and the epoxy resin, thereby having excellent dielectric properties and good heat and humidity resistance.
本发明的树脂组成物无选用马来酸酐改质硬化剂是因为加了马来酸酐脂树脂组成物会导致基板变得易脆(强度变低),且耐热性也会变差,而本发明所使用的活性酯化合物可有效改善树脂组成物整体的耐热性及提供优异的低介电耗损因子(Df)。The reason why the resin composition of the present invention does not use maleic anhydride modified hardener is because the addition of the maleic anhydride resin composition will cause the substrate to become brittle (lower in strength), and the heat resistance will also deteriorate. The active ester compound used in the invention can effectively improve the overall heat resistance of the resin composition and provide excellent low dielectric dissipation factor (Df).
本发明的阻燃剂例如non-dopo阻燃剂,为含有磷及/或乙烯基的化合物,阻燃剂选自具有以下结构式的阻燃剂所组成的群组的一者,其具有阻燃功能;The flame retardant of the present invention, such as non-dopo flame retardant, is a compound containing phosphorus and/or vinyl, and the flame retardant is selected from one of the group consisting of flame retardants with the following structural formula, which has flame retardant Function;
式一formula one
其中R为选自:where R is selected from:
所组成的群组的一者;one of the group formed;
式二formula two
其中X为选自:where X is selected from:
所组成的群组的一者;one of the group formed;
Y为选自:Y is selected from:
所组成的群组的一者,n为0-500的整数;One of the formed groups, n is an integer of 0-500;
式三formula three
其中X为选自:where X is selected from:
所组成的群组的一者;one of the group formed;
A为选自:A is selected from:
所组成的群组的一者;one of the group formed;
当n为0时,Y为:When n is 0, Y is:
当n为1-500的整数时,Y为选自:When n is an integer of 1-500, Y is selected from:
所组成的群组的一者,m≧0;One of the groups formed, m≧0;
Z为选自:Z is selected from:
所组成的群组的一者,m≧0。One of the formed groups, m≧0.
本发明无卤素环氧树脂组成物已有选用DOPO改质硬化剂,其缺点在于DOPO结构内的P-O-C键结容易水解为P-OH,会使材料介电常数及低介电损失上升,故除选用Non-dopo类型阻燃剂系以避免提升材料的Dk/Df,亦借由添加上述活性酯硬化剂以避免提升材料的吸水率。The halogen-free epoxy resin composition of the present invention has already used DOPO as a modified hardener. The disadvantage is that the P-O-C bond in the DOPO structure is easily hydrolyzed into P-OH, which will increase the dielectric constant and low dielectric loss of the material. Non-dopo type flame retardant is selected to avoid increasing the Dk/Df of the material, and the above-mentioned active ester hardener is added to avoid increasing the water absorption of the material.
本发明除了Non-dopo类型阻燃剂外,尚可选择性再添加下列至少一种特定的阻燃性化合物。所选用的阻燃性化合物可为磷酸盐化合物或含氮磷酸盐化合物,但并不以此为限,例如:间苯二酚双二甲苯基磷酸盐(resorcinol dixylenylphosphate,RDXP(如PX-200))、聚磷酸三聚氰胺(melamine polyphosphate)、三(2-羧乙基)膦(tri(2-carboxyethyl)phosphine,TCEP)、三甲基磷酸盐(trimethyl phosphate,TMP)、三(异丙基氯)磷酸盐、二甲基-甲基磷酸盐(dimethyl methyl phosphonate,DMMP)、双酚联苯磷酸盐(bisphenol diphenyl phosphate)、聚磷酸铵(ammonium polyphosphate)、对苯二酚-双-(联苯基磷酸盐)(hydroquinone bis-(diphenyl phosphate))、双酚A-双-(联苯基磷酸盐)(bisphenol A bis-(diphenylphosphate))中的一者或多者。In addition to the Non-dopo type flame retardant, the present invention can optionally add at least one specific flame retardant compound listed below. The selected flame retardant compound may be a phosphate compound or a nitrogen-containing phosphate compound, but is not limited thereto, for example: resorcinol dixylenylphosphate (RDXP (such as PX-200) ), melamine polyphosphate, tri(2-carboxyethyl)phosphine (TCEP), trimethyl phosphate (TMP), tri(isopropyl chloride) Phosphate, dimethyl methyl phosphate (DMMP), bisphenol diphenyl phosphate, ammonium polyphosphate, hydroquinone-bis-(biphenyl Phosphate) (hydroquinone bis-(diphenyl phosphate)), bisphenol A-bis-(biphenyl phosphate) (bisphenol A bis-(diphenylphosphate)) in one or more.
本发明的硬化促进剂为选自:咪唑(imidazole)、三氟化硼胺复合物、2-乙基-4-甲基咪唑(2-ethyl-4-methylimidazole(2E4MI))、2-甲基咪唑(2-methylimidazole(2MI))、2-苯基咪唑(2-phenyl-1H-imidazole(2PZ))、氯化乙基三苯基鏻(ethyltriphenylphosphonium chloride)、三苯基膦(triphenylphosphine(TPP))与4-二甲基胺基吡啶(4-dimethylaminopyridine(DMAP))、低分子量的端溴基液体丁二烯橡胶BTPB(terminalbromine-based liquid butadiene rubber)中的一者或多者。The hardening accelerator of the present invention is selected from: imidazole (imidazole), boron trifluoride amine complex, 2-ethyl-4-methylimidazole (2-ethyl-4-methylimidazole (2E4MI)), 2-methyl Imidazole (2-methylimidazole (2MI)), 2-phenylimidazole (2-phenyl-1H-imidazole (2PZ)), ethyltriphenylphosphonium chloride (ethyltriphenylphosphonium chloride), triphenylphosphine (triphenylphosphine (TPP) ) and one or more of 4-dimethylaminopyridine (DMAP) and low molecular weight bromine-based liquid butadiene rubber BTPB (terminalbromine-based liquid butadiene rubber).
本发明的无卤素环氧树脂组成物进一步可包含无机填料以增加树脂组成物的热传导性、改良其热膨胀性及机械强度等特性。无机填料较佳是均匀分布于该树脂组成物中。无机填料可经由硅烷偶合剂预先进行表面处理。无机填料可为球型、片状、粒状、柱状、板状、针状或不规则状。该无机填料可包含二氧化硅(熔融态、非熔融态、多孔质或中空型)、氧化铝、氢氧化铝、氧化镁、氢氧化镁、碳酸钙、氮化铝、氮化硼、碳化铝硅、碳化硅、二氧化钛、氧化锌、氧化锆、硫酸钡、碳酸镁、碳酸钡、云母、滑石、石墨烯中的一者或多者。The halogen-free epoxy resin composition of the present invention may further contain inorganic fillers to increase the thermal conductivity of the resin composition, improve its thermal expansion and mechanical strength and other properties. The inorganic filler is preferably uniformly distributed in the resin composition. Inorganic fillers can be pre-surface-treated with silane coupling agents. Inorganic fillers can be spherical, flaky, granular, columnar, plate-like, needle-like or irregular. The inorganic filler may contain silica (fused, non-fused, porous or hollow), alumina, aluminum hydroxide, magnesium oxide, magnesium hydroxide, calcium carbonate, aluminum nitride, boron nitride, aluminum carbide One or more of silicon, silicon carbide, titanium dioxide, zinc oxide, zirconium oxide, barium sulfate, magnesium carbonate, barium carbonate, mica, talc, and graphene.
为了使本领域技术人员了解本发明的技术内容并据以实施,且根据本说明书所公开的内容、权利要求范围,本领域技术人员可轻易地理解本发明相关的目的及优点,因此将在实施方式中详细叙述本发明的详细特征以及优点,但不作为对本发明的限定。In order for those skilled in the art to understand the technical content of the present invention and implement it accordingly, and according to the content disclosed in this specification and the scope of the claims, those skilled in the art can easily understand the related objectives and advantages of the present invention, so it will be implemented The detailed features and advantages of the present invention are described in detail in the manner, but they are not intended to limit the present invention.
具体实施方式Detailed ways
为了让本发明的上述目的和其它目的、特征与优点能更明显易懂,特举数个实施例详细说明如下:分别将实施例1至5(E1至E5)的树脂组成物列表于表一,比较例1至4(C1至C4)的树脂组成物列表于表三。In order to make the above purpose and other purposes, features and advantages of the present invention more obvious and understandable, several specific examples are given in detail as follows: The resin compositions of Examples 1 to 5 (E1 to E5) are listed in Table 1 , the resin compositions of Comparative Examples 1 to 4 (C1 to C4) are listed in Table 3.
将上述实施例1至5及比较例1至4的树脂组成物,分批于搅拌槽中混合均匀后置入一含浸槽中,再将玻璃纤维布通过上述含浸槽,使树脂组成物附着于玻璃纤维布,再进行加热烘烤成半固化态而得半固化胶片。Mix the resin compositions of the above-mentioned Examples 1 to 5 and Comparative Examples 1 to 4 in batches in a stirring tank and put them into an impregnation tank, then pass the glass fiber cloth through the impregnation tank to make the resin composition adhere to the Glass fiber cloth, then heated and baked into a semi-cured state to obtain a semi-cured film.
将上述分批制得的半固化胶片,取同一批的半固化胶片四张及两张18μm铜箔,依铜箔、四片半固化胶片、铜箔的顺序进行迭合,再于真空条件下经由220℃压合2小时形成铜箔基板,其中四片半固化胶片固化形成两铜箔间的绝缘层。For the above-mentioned prepregs prepared in batches, take four prepregs and two 18μm copper foils from the same batch, and laminate them in the order of copper foil, four prepregs, and copper foils, and then place them under vacuum conditions. The copper foil substrate is formed by pressing at 220°C for 2 hours, and four prepregs are cured to form an insulating layer between the two copper foils.
分别将上述含铜箔基板及铜箔蚀刻后的不含铜基板做物性量测,物性量测项目包含玻璃转化温度(Tg)、含铜基板耐热性(T288)、不含铜基板PCT吸湿后浸锡测试、铜箔与基板间拉力(peeling strength,half ounce copper foil,P/S)、介电常数(Dk越低越佳)、介电损耗(Df越低越佳)、耐燃性(flaming test,UL94,其中等级优劣排列为V-0>V-1>V-2)。The physical properties of the above-mentioned copper-containing substrates and copper-free substrates etched by copper foil were measured respectively. The physical property measurement items included glass transition temperature (Tg), heat resistance of copper-containing substrates (T288), and PCT moisture absorption of copper-free substrates. Post immersion tin test, peeling strength, half ounce copper foil, P/S, dielectric constant (the lower the Dk, the better), dielectric loss (the lower the Df, the better), flame resistance ( Flaming test, UL94, in which the grades are ranked as V-0>V-1>V-2).
其中实施例1至5的树脂组成物制作的基板物性量测结果列表于表二中,比较例1至4的树脂组成物制作的基板物性量测结果列表于表四中。由表二及表四,综合比较实施例1至5及比较例1至4可发现,依本发明所公开的树脂组成物的各组成份含量添加比例,可得物性皆较佳的基板,比较例1至4的基板物性皆较差。其中,实施例1至5(E1至E5)为使用活性酯化合物搭配DOPO改质硬化剂及苯并恶嗪树脂,结果显示介电损耗(Df)随着活性酯化合物添加量减少而降低。如E1所示,添加活性酯化合物及苯并恶嗪树脂但不含DOPO改质硬化剂的基板得到高的Tg;如E5所示,添加活性酯化合物及DOPO改质硬化剂但不含苯并恶嗪树脂的基板得到较高铜箔拉力(P/S)及较低的介电常数(Dk)。The physical property measurement results of the substrates made of the resin compositions of Examples 1 to 5 are listed in Table 2, and the physical property measurement results of the substrates made of the resin compositions of Comparative Examples 1 to 4 are listed in Table 4. From Table 2 and Table 4, comprehensively comparing Examples 1 to 5 and Comparative Examples 1 to 4, it can be found that according to the addition ratio of each component content of the resin composition disclosed in the present invention, a substrate with better physical properties can be obtained. The physical properties of the substrates in Examples 1 to 4 are all poor. Among them, Examples 1 to 5 (E1 to E5) use the active ester compound together with DOPO modified hardener and benzoxazine resin, and the results show that the dielectric loss (Df) decreases with the decrease of the active ester compound addition. As shown in E1, the substrate with the addition of active ester compound and benzoxazine resin but without DOPO modified hardener obtained a high Tg; as shown in E5, the addition of active ester compound and DOPO modified hardener without benzoxazine Oxazine resin substrates get higher copper foil pull (P/S) and lower dielectric constant (Dk).
比较例1至4(C1至C4)为使用苯乙烯马来酸酐(EF60)搭配苯并恶嗪树脂,结果显示,随着苯乙烯马来酸酐(EF60)添加量增加,基板耐热性皆较差(Tg、T288)。比较实施例1至5及比较例1至4可发现,本发明实施例1至5所使用的活性酯化合物可有效改善树脂组成物整体的耐热性及提供优异的低介电耗损因子(Df)。Comparative examples 1 to 4 (C1 to C4) use styrene maleic anhydride (EF60) with benzoxazine resin. The results show that as the amount of styrene maleic anhydride (EF60) increases, the heat resistance of the substrate is better. Poor (Tg, T288). Comparing Examples 1 to 5 and Comparative Examples 1 to 4, it can be found that the active ester compound used in Examples 1 to 5 of the present invention can effectively improve the overall heat resistance of the resin composition and provide excellent low dielectric dissipation factor (Df ).
表一Table I
表二Table II
表三Table three
表四Table four
本发明的无卤素树脂组成物,其借着包含特定的组成份及比例,以使可达到低介电常数、低介电损耗、高耐热性及高耐燃性;可制作成半固化胶片或树脂膜,进而达到可应用于铜箔基板及印刷电路板的目的;就产业上的可利用性而言,利用本发明所衍生的产品,当可充分满足目前市场的需求。The halogen-free resin composition of the present invention can achieve low dielectric constant, low dielectric loss, high heat resistance and high flame resistance by including specific components and ratios; it can be made into prepreg or The resin film can be applied to copper foil substrates and printed circuit boards; in terms of industrial applicability, the products derived from the present invention can fully meet the needs of the current market.
当然,本发明还可有其它多种实施例,在不背离本发明精神及其实质的情况下,熟悉本领域的技术人员可根据本发明作出各种相应的改变和变形,但这些相应的改变和变形都应属于本发明权利要求的保护范围。Certainly, the present invention also can have other various embodiments, without departing from the spirit and essence of the present invention, those skilled in the art can make various corresponding changes and deformations according to the present invention, but these corresponding changes All changes and modifications should belong to the protection scope of the claims of the present invention.
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CN111205595A (en) * | 2020-02-18 | 2020-05-29 | 联茂(无锡)电子科技有限公司 | Halogen-free low dielectric composition, laminate and printed wiring board |
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WO2024065363A1 (en) * | 2022-09-29 | 2024-04-04 | 上纬创新育成股份有限公司 | Aminolysable benzoxazine resin cured product, and preparation method and aminolysis method therefor |
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