CN108388076B - A kind of mask plate and its mask method, manufacture method, mask system - Google Patents
A kind of mask plate and its mask method, manufacture method, mask system Download PDFInfo
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- CN108388076B CN108388076B CN201810181739.5A CN201810181739A CN108388076B CN 108388076 B CN108388076 B CN 108388076B CN 201810181739 A CN201810181739 A CN 201810181739A CN 108388076 B CN108388076 B CN 108388076B
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 23
- 230000010287 polarization Effects 0.000 claims description 40
- 239000000758 substrate Substances 0.000 claims description 17
- 239000013077 target material Substances 0.000 claims description 14
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 230000000873 masking effect Effects 0.000 claims description 6
- 238000010586 diagram Methods 0.000 description 13
- 230000003760 hair shine Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
本发明公开了一种掩膜版及其掩膜方法、制造方法、掩膜系统，该掩膜版包括本体和位于本体上的第一曝光图案、第二曝光图案和位于所述第一曝光图案和所述第二曝光图案之外的遮光图案，第一曝光图案用于当第一光线照射时透光且当第二光线照射时不透光，第二曝光图案用于当第二光线照射时透光且当第一光线照射时不透光。本发明仅通过单张掩膜版即可实现多条产线的掩膜功能，有效降低了生产成本。
The invention discloses a mask, a mask method, a manufacturing method and a mask system thereof. The mask comprises a body and a first exposure pattern, a second exposure pattern and a first exposure pattern located on the body. and the shading pattern other than the second exposure pattern, the first exposure pattern is used to transmit light when the first light is irradiated and not to transmit light when the second light is irradiated, and the second exposure pattern is used when the second light is irradiated Transparent and opaque when the first light is irradiated. The invention can realize the mask function of multiple production lines only through a single mask, and effectively reduces the production cost.
Description
Technical Field
The invention relates to the technical field of display, in particular to a mask plate, a mask method, a manufacturing method and a mask system thereof.
Background
In the manufacturing process of the color film substrate, the mask plate needs to be used for multiple times, and because the existing mask plate can only carry out single-side exposure, in the manufacturing process of the color film substrate, one mask plate needs to be designed for each of a plurality of production lines, which leads to high cost.
Disclosure of Invention
The invention provides a mask plate, a mask method, a manufacturing method and a mask system thereof, which can realize the mask function of a plurality of production lines only by a single mask plate, thereby effectively reducing the production cost.
In order to achieve the above object, the present invention provides a reticle, including a body, a first exposure pattern, a second exposure pattern and a light shielding pattern, wherein the first exposure pattern and the second exposure pattern are located on the body;
the first exposure pattern is used for transmitting light when the first light is irradiated and transmitting light when the second light is irradiated;
the second exposure pattern is used for transmitting light when the second light is irradiated and not transmitting light when the first light is irradiated.
Optionally, the body comprises at least one set of oppositely arranged first and second exposure faces;
the first exposure pattern is located at a relative position on the first exposure surface and the second exposure surface; or the first exposure pattern is positioned on a first exposure surface, and a first opening structure is arranged at the opposite position on the second exposure surface;
the second exposure pattern is located at a relative position on the first exposure surface and the second exposure surface; or the second exposure pattern is positioned on the first exposure surface, and a second opening structure is arranged at the opposite position on the second exposure surface.
Optionally, the first exposure pattern is a first polarizer, the second exposure pattern is a second polarizer, and polarization directions of the first polarizer and the second polarizer are perpendicular;
the polarization direction of the first polarizer is the same as that of the first light ray, and the polarization direction of the second polarizer is the same as that of the second light ray.
Optionally, the body comprises three sets of opposing first and second exposure faces.
Optionally, the body is shaped as a cuboid.
Optionally, the body is square in shape.
In order to achieve the above object, the present invention further provides a mask system, comprising an exposure machine and the above mask;
the exposure machine is used for emitting the first light and the second light to the mask.
In order to achieve the above object, the present invention further provides a mask method using the above mask, comprising:
placing a mask plate above a substrate;
irradiating the mask plate through first light to expose a first target material layer on the substrate base plate;
and irradiating the mask plate through second light to expose a second target material layer on the substrate base plate.
In order to achieve the above object, the present invention further provides a method for manufacturing the above mask, comprising:
a first exposure pattern and a second exposure pattern are formed on the body.
The invention has the following beneficial effects:
the mask provided by the invention comprises a body, a first exposure pattern, a second exposure pattern and a shading pattern, wherein the first exposure pattern and the second exposure pattern are positioned on the body, the shading pattern is positioned outside the first exposure pattern and the second exposure pattern, the first exposure pattern is used for transmitting light when first light is irradiated and is opaque when second light is irradiated, and the second exposure pattern is used for transmitting light when second light is irradiated and is opaque when the first light is irradiated.
Drawings
Fig. 1a is a schematic front-side structure view of a mask according to an embodiment of the present invention;
FIG. 1b is a schematic diagram of a reverse structure of a mask according to an embodiment of the present invention;
fig. 1c is a schematic structural diagram of a main body of a mask according to an embodiment of the present invention;
fig. 2a is a schematic front-side structure view of a mask according to a second embodiment of the present invention;
FIG. 2b is a schematic diagram of a reverse structure of a mask according to a second embodiment of the present invention;
fig. 3a is a schematic front-side structure view of a mask provided in the third embodiment of the present invention;
FIG. 3b is a schematic diagram of a reverse structure of a mask provided in the third embodiment of the present invention;
fig. 4 is a schematic flowchart of a masking method of a mask according to a fifth embodiment of the present invention;
FIG. 5 is a diagram illustrating a first exposure pattern corresponding to a first exposure pattern formed according to a fifth embodiment of the present invention;
fig. 6 is a schematic diagram of forming a second exposure pattern corresponding to the second exposure pattern in the fifth embodiment of the present invention.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the following clear and complete description of the technical solution of the present invention is made with reference to the accompanying drawings, and it is obvious that the described embodiments are a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention.
Fig. 1a is a schematic front-side structure diagram of a mask provided in an embodiment of the present invention, fig. 1b is a schematic back-side structure diagram of a mask provided in an embodiment of the present invention, and fig. 1c is a schematic structural diagram of a body of a mask provided in an embodiment of the present invention. As shown in fig. 1a, 1b and 1c, the reticle includes a body 10 and a first exposure pattern 11, a second exposure pattern 12 and a light-shielding pattern 15 outside the first exposure pattern 11 and the second exposure pattern 12 on the body 10, the first exposure pattern 11 is used for transmitting light when the first light is irradiated and being opaque when the second light is irradiated, the second exposure pattern 12 is used for transmitting light when the second light is irradiated and being opaque when the first light is irradiated.
The region covered by the light shielding pattern 15 is not transparent, the material of the light shielding pattern 15 may be metal, and the light shielding pattern may be a metal layer.
The body 10 includes at least one set of a first exposure surface 1 and a second exposure surface 2 which are oppositely disposed, a first exposure pattern 11 is located at an opposite position on the first exposure surface 1 and the second exposure surface 2, and a second exposure pattern 12 is located at an opposite position on the first exposure surface 1 and the second exposure surface 2. Namely: the first exposure pattern 11 is located on the first exposure face 1, and the first exposure pattern 11 is located at an opposite position on the second exposure face 2; the second exposed pattern 12 is located on the first exposed surface 1, and the second exposed pattern 12 is located at an opposite position on the second exposed surface 2. The relative position in the embodiment specifically means that the first exposure patterns 11 on the first exposure surface 1 and the second exposure surface 2 are correspondingly arranged, and the second exposure patterns 12 on the first exposure surface 1 and the second exposure surface 2 are correspondingly arranged.
In this embodiment, the front side of the mask is referred to as the first exposure side 1, the back side of the mask is referred to as the second exposure side 2, and the first exposure side 1 and the second exposure side 2 are parallel and opposite to each other.
Preferably, the first exposure pattern 11 is a first polarizing plate, the second exposure pattern 12 is a second polarizing plate, and the first polarizing plate and the second polarizing plate have different polarization directions. Preferably, the polarization direction of the first polarizer and the polarization direction of the second polarizer are perpendicular. The polarization direction of the first polarizer is the same as that of the first light ray, and the polarization direction of the second polarizer is the same as that of the second light ray.
The polarization direction of the first light is the same as the polarization direction of the first polarizer (i.e., the first exposure pattern 11), so that when the first light irradiates the first exposure surface 1, the first polarizer on the first exposure surface 1 and the first polarizer on the second exposure surface 2 can both transmit the first light, and then the first light sequentially passes through the first polarizer on the first exposure surface 1 and the first polarizer on the second exposure surface 2 to penetrate through the mask, thereby realizing that the first exposure pattern 11 can transmit light when the first light irradiates; and the polarization direction of the first light is perpendicular to the polarization direction of the second polarizer (i.e. the second exposure pattern 12), so when the first light irradiates the first exposure surface 1, the second polarizer on the first exposure surface 1 and the second polarizer on the second exposure surface 2 are not permeable to the first light, and the first light cannot sequentially pass through the second polarizer on the first exposure surface 1 and the second polarizer on the second exposure surface 2 to penetrate through the mask, thereby realizing that the second exposure pattern 12 is not permeable when the first light irradiates.
Or, when the first light irradiates the second exposure surface 2, the first polarizer on the second exposure surface 2 and the first polarizer on the first exposure surface 1 can both transmit the first light, and then the first light sequentially passes through the first polarizer on the second exposure surface 2 and the first polarizer on the first exposure surface 1 to penetrate through the mask, so that the first exposure pattern 11 can transmit light when the first light irradiates; when the first light irradiates the second exposure surface 2, the second polaroid on the second exposure surface 2 and the second polaroid on the first exposure surface 1 are not permeable to the first light, so that the first light cannot sequentially pass through the second polaroid on the second exposure surface 2 and the second polaroid on the first exposure surface 1 to penetrate through the mask, and the second exposure pattern 12 is opaque when the first light irradiates.
Since the polarization direction of the second light is the same as the polarization direction of the second polarizer (i.e., the second exposure pattern 12), and the polarization direction of the second light is perpendicular to the polarization direction of the first polarizer (i.e., the first exposure pattern 11), when the second light is irradiated, the second exposure pattern 12 is transparent, and the first exposure pattern 11 is opaque, and the specific process can refer to the situation of the first light irradiation, which is not described herein again.
Preferably, each of the first and second exposure patterns 11 and 12 is plural. The shapes of the first exposure pattern 11 and the second exposure pattern 12 may be set according to product design requirements, for example: the first exposure pattern 11 has a rectangular shape, and the second exposure pattern 12 has a circular shape.
In this embodiment, one set, two sets or three sets of the first exposure surface 1 and the second exposure surface 2 opposite to each other may be provided in the body 10 according to product design requirements. Preferably, the body 10 comprises three sets of opposing first and second exposure faces 1, 2. The mask plate of the embodiment can realize the mask of six exposure patterns by arranging three sets of opposite first exposure surfaces 1 and second exposure surfaces 2.
In this embodiment, the body 10 may be a rectangular parallelepiped. For example, the rectangular parallelepiped has a length L of 1200mm, a width D of 800mm, and a height H of 10 mm. Preferably, the body 10 may be in the shape of a cube.
In this embodiment, the material of the body 10 may be glass.
The mask provided by the embodiment comprises a body, a first exposure pattern, a second exposure pattern and a shading pattern, wherein the first exposure pattern and the second exposure pattern are positioned on the body, the shading pattern is positioned outside the first exposure pattern and the second exposure pattern, the body comprises at least one group of first exposure surface and second exposure surface which are arranged oppositely, the first exposure pattern is positioned at the relative position of the first exposure surface and the second exposure surface, the second exposure pattern is positioned at the relative position of the first exposure surface and the second exposure surface, the first exposure pattern is used for transmitting light when the first light irradiates and is opaque when the second light irradiates, the second exposure pattern is used for transmitting light when the second light irradiates and is opaque when the first light irradiates, the mask of the embodiment can realize the mask functions of a plurality of production lines only through a single production line, and the production cost is effectively reduced.
Fig. 2a is a schematic front structure diagram of a mask provided by a second embodiment of the present invention, and fig. 2b is a schematic back structure diagram of the mask provided by the second embodiment of the present invention, as shown in fig. 2a and fig. 2b, the difference between the present embodiment and the first embodiment is only that: the first exposure pattern 11 is located on the first exposure face 1, and the first opening structure 13 is provided at an opposite position on the second exposure face 2. The second exposure pattern 12 is located on the first exposure face 1 and a second opening structure 14 is provided at an opposite position on the second exposure face 2. The relative position in this embodiment specifically means that the first exposure pattern 11 on the first exposure surface 1 and the first opening structure 13 on the second exposure surface 2 are disposed correspondingly, and the second exposure pattern 12 on the first exposure surface 1 and the second opening structure 14 on the second exposure surface 2 are disposed correspondingly.
The polarization direction of the first light is the same as the polarization direction of the first polarizer (i.e., the first exposure pattern 11), so that when the first light irradiates the first exposure surface 1, the first polarizer on the first exposure surface 1 and the first opening structure 13 on the second exposure surface 2 can both transmit the first light, and then the first light sequentially passes through the first polarizer on the first exposure surface 1 and the first opening structure 13 on the second exposure surface 2 to penetrate through the mask, thereby realizing that the first exposure pattern 11 transmits light when the first light irradiates; the polarization direction of the first light is perpendicular to the polarization direction of the second polarizer (i.e., the second exposure pattern 12), so that when the first light irradiates the first exposure surface 1, the second polarizer on the first exposure surface 1 is not permeable to the first light, and the first light cannot sequentially pass through the second polarizer on the first exposure surface 1 and the second opening structure 14 on the second exposure surface 2 to penetrate through the mask, thereby realizing the light-tight property of the second exposure pattern 12 when the first light irradiates.
When the first light irradiates the second exposure surface 2, the first opening structures 13 on the second exposure surface 2 and the first polaroids on the first exposure surface 1 can transmit the first light, and then the first light sequentially passes through the first opening structures 13 on the second exposure surface 2 and the first polaroids on the first exposure surface 1 to penetrate through the mask, so that the first exposure patterns 11 can transmit light when the first light irradiates; when the first light irradiates the second exposure surface 2, the second opening structure 14 on the second exposure surface 2 can transmit the first light, but the second exposure pattern 12 on the first exposure surface 1 corresponding to the second opening structure 14 can not transmit the first light, so that the first light can not sequentially pass through the second opening structure 14 on the second exposure surface 2 and the second polarizer on the first exposure surface 1 to penetrate through the mask, thereby realizing that the second exposure pattern 12 can not transmit light when the first light irradiates.
Since the polarization direction of the second light is the same as the polarization direction of the second polarizer (i.e., the second exposure pattern 12), and the polarization direction of the second light is perpendicular to the polarization direction of the first polarizer (i.e., the first exposure pattern 11), when the second light is irradiated, the second exposure pattern 12 is transparent, and the first exposure pattern 11 is opaque, and the specific process can refer to the situation of the first light irradiation, which is not described herein again.
The mask provided by the embodiment comprises a body, a first exposure pattern, a second exposure pattern and a shading pattern, wherein the first exposure pattern and the second exposure pattern are arranged on the body, the shading pattern is arranged outside the first exposure pattern and the second exposure pattern, the body comprises at least one group of first exposure surface and second exposure surface which are arranged oppositely, the first exposure pattern is arranged on the first exposure surface, and a first opening structure is arranged at the opposite position on the second exposure surface. The second exposure pattern is located first exposure face, and the relative position on the second exposure face is provided with second open structure, and first exposure pattern is used for printing opacity when first light shines and when the second light shines light-tight, and the second exposure pattern is used for printing opacity when the second light shines and when first light shines light-tight, and the mask version of this embodiment only can realize many mask functions of producing the line through the sola, has effectively reduced manufacturing cost.
Fig. 3a is a schematic front structure diagram of a mask provided by a third embodiment of the present invention, and fig. 3b is a schematic back structure diagram of the mask provided by the third embodiment of the present invention, as shown in fig. 3a and fig. 3b, the difference between the first embodiment and the second embodiment is only that: the first exposure pattern 11 is located on the first exposure face 1, and the first opening structure 13 is provided at an opposite position on the second exposure face 2. The second exposure pattern 12 is located on the second exposure face 2, and the second opening structure 14 is provided at an opposite position on the first exposure face 1. The relative position in this embodiment specifically means that the first exposure pattern 11 on the first exposure surface 1 and the first opening structure 13 on the second exposure surface 2 are correspondingly disposed, and the second opening structure 14 on the first exposure surface 1 and the second exposure pattern 12 on the second exposure surface 2 are correspondingly disposed.
The polarization direction of the first light is the same as the polarization direction of the first polarizer (i.e., the first exposure pattern 11), so that when the first light irradiates the first exposure surface 1, the first polarizer on the first exposure surface 1 and the first opening structure 13 on the second exposure surface 2 can both transmit the first light, and then the first light sequentially passes through the first polarizer on the first exposure surface 1 and the first opening structure 13 on the second exposure surface 2 to penetrate through the mask, thereby realizing that the first exposure pattern 11 transmits light when the first light irradiates; the polarization direction of the first light is perpendicular to the polarization direction of the second polarizer (i.e., the second exposure pattern 12), so that when the first light irradiates the first exposure surface 1, the second opening structure 14 on the first exposure surface 1 can transmit the first light, but the second exposure pattern 12 on the second exposure surface 2 corresponding to the second opening structure 14 can not transmit the first light, and the first light cannot sequentially pass through the second opening structure 14 on the first exposure surface 1 and the second exposure pattern 12 on the second exposure surface 2 to penetrate through the mask, thereby realizing the light-tight second exposure pattern 12 when the first light irradiates.
Since the polarization direction of the second light is the same as the polarization direction of the second polarizer (i.e., the second exposure pattern 12), and the polarization direction of the second light is perpendicular to the polarization direction of the first polarizer (i.e., the first exposure pattern 11), when the second light is irradiated, the second exposure pattern 12 is transparent, and the first exposure pattern 11 is opaque, and the specific process can refer to the situation of the first light irradiation, which is not described herein again.
The mask provided by the embodiment comprises a body, a first exposure pattern, a second exposure pattern and a shading pattern, wherein the first exposure pattern and the second exposure pattern are arranged on the body, the shading pattern is arranged outside the first exposure pattern and the second exposure pattern, the body comprises at least one group of first exposure surface and second exposure surface which are arranged oppositely, the first exposure pattern is arranged on the first exposure surface, and a first opening structure is arranged at the opposite position on the second exposure surface. The second exposure pattern is located the second exposure face, and the relative position on the first exposure face is provided with second open structure, and first exposure pattern is used for printing opacity when first light shines and when the second light shines light-tight, and the second exposure pattern is used for printing opacity when the second light shines and when first light shines light-tight, and the mask version of this embodiment only can realize many mask functions of producing the line through the sola, has effectively reduced manufacturing cost.
The fourth embodiment of the invention provides a mask system which comprises an exposure machine and a mask, wherein the mask provided by the first embodiment, the second embodiment or the third embodiment is adopted.
The exposure machine is used for emitting a first light and a second light to the mask plate. The polarization direction of the first light is the same as that of the first polaroid on the mask, and the polarization direction of the second light is the same as that of the second polaroid on the mask.
The mask system provided by the embodiment comprises an exposure machine and a mask plate, wherein the mask plate comprises a body, a first exposure pattern, a second exposure pattern and a shading pattern, the first exposure pattern and the second exposure pattern are positioned on the body, the shading pattern is positioned outside the first exposure pattern and the second exposure pattern, the first exposure pattern is used for transmitting light when first light is irradiated and is opaque when second light is irradiated, the second exposure pattern is used for transmitting light when second light is irradiated and is opaque when the first light is irradiated, the first exposure pattern is a first polaroid, and the second exposure pattern is a second polaroid. The exposure machine is used for emitting a first light and a second light to the mask plate. The polarization direction of the first light is the same as that of the first polaroid on the mask plate, the polarization direction of the second light is the same as that of the second polaroid on the mask plate, the mask system can realize the mask function of a plurality of production lines only through a single mask plate, and the production cost is effectively reduced.
The fifth embodiment of the invention provides a mask method of a mask, which is based on the mask provided in the first embodiment, the second embodiment or the third embodiment.
Fig. 4 is a schematic flowchart of a masking method of a mask according to the fifth embodiment, and as shown in fig. 4, the masking method includes the following steps:
The mask method of the mask is described below by taking the mask provided in the first embodiment as an example. Fig. 5 is a schematic view of forming a first exposure pattern corresponding to the first exposure pattern, and as shown in fig. 5, a reticle is placed above the base substrate 3 with the second exposure surface 2 of the reticle facing the base substrate 3. Alternatively, when the mask is placed on top of the substrate base plate, the first exposure surface 1 of the mask may also face the substrate base plate 3, which is not specifically shown.
As shown in FIG. 5, the first exposure surface 1 of the reticle is irradiated with a first light, which sequentially passes through only the first exposure pattern 11 on the first exposure surface 1 and the first exposure pattern 11 on the second exposure surface 2 to expose the first target material layer.
For example: when the masking method of the mask is used for manufacturing a color film substrate, the exposed first target material layer includes an exposed area and an unexposed area, and further, the exposed first target material layer is developed, the unexposed area is removed, the exposed area is reserved, and the exposed area forms a first exposed pattern 110. At this time, the first exposure pattern 110 may be a color resist, a spacer, or a black matrix.
FIG. 6 is a schematic view showing the formation of a second exposure pattern corresponding to a second exposure pattern, in which, as shown in FIG. 6, the first exposure surface 1 of the reticle is irradiated with a second light beam, and the second light beam sequentially passes through only the second exposure pattern 12 on the first exposure surface 1 and the second exposure pattern 12 on the second exposure surface 2 to expose a second target material layer.
For example: when the masking method of the mask is used for manufacturing a color film substrate, the exposed second target material layer includes an exposed area and an unexposed area, and further, the exposed second target material layer is developed, the unexposed area is removed, the exposed area is reserved, and the exposed area forms a second exposed pattern 120. At this time, the second exposure pattern 120 may be a color resist, a spacer, or a black matrix.
It should be noted that: an insulating layer may be disposed between the first target material layer and the second target material layer according to product design requirements, and is not specifically shown in the figures.
The mask method of the mask provided by the embodiment comprises a body, a first exposure pattern, a second exposure pattern and a shading pattern, wherein the first exposure pattern and the second exposure pattern are positioned on the body, the shading pattern is positioned outside the first exposure pattern and the second exposure pattern, the first exposure pattern is used for transmitting light when first light is irradiated and is opaque when second light is irradiated, the second exposure pattern is used for transmitting light when second light is irradiated and is opaque when the first light is irradiated, the mask method can realize the mask function of a plurality of production lines only through a single mask, and the production cost is effectively reduced.
The sixth embodiment of the invention provides a manufacturing method of a mask, which is used for manufacturing the mask provided by the first embodiment, the second embodiment or the third embodiment. The manufacturing method includes forming a first exposure pattern and a second exposure pattern on a body.
The following describes a manufacturing method of a mask by taking the mask provided in the third embodiment as an example, and the manufacturing method includes:
step 201, a first exposure pattern is formed on a first exposure surface of the body.
And forming a first shading layer on the first exposure surface of the body, and performing a composition process on the first shading layer to form a third opening structure. A first polarizing film layer is formed on the first light-shielding layer and the third open structure to form a first exposure pattern in the third open structure.
Step 202, forming a second opening structure on the first exposure surface.
A second opening structure is formed in the first light-shielding layer and the first polarizing film layer.
Step 203, forming a second exposure pattern and a first opening structure on a second exposure surface of the body.
And forming a second shading layer on the second exposure surface of the body, and performing a composition process on the second shading layer to form a fourth opening structure. The fourth opening structure and the second opening structure are correspondingly arranged. And forming a second polarizing film layer on the second light-shielding layer and the fourth open structure to form a second exposure pattern in the fourth open structure.
Step 204, forming a first opening structure on the second exposure surface.
And forming a first opening structure on the second light shielding layer and the second polarization film layer, wherein the first opening structure is arranged corresponding to the first exposure pattern.
The manufacturing method of the mask provided by the embodiment is used for manufacturing the mask, the mask comprises a body, a first exposure pattern, a second exposure pattern and a shading pattern, the first exposure pattern and the second exposure pattern are positioned on the body, the first exposure pattern is used for transmitting light when first light is irradiated and is opaque when second light is irradiated, the second exposure pattern is used for transmitting light when second light is irradiated and is opaque when the first light is irradiated, the mask can realize the mask function of a plurality of production lines only through a single piece, and the production cost is effectively reduced.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.
Claims (7)
1. A mask is characterized by comprising a body, a first exposure pattern, a second exposure pattern and a shading pattern, wherein the first exposure pattern and the second exposure pattern are arranged on the body;
the first exposure pattern is used for transmitting light when the first light is irradiated and transmitting light when the second light is irradiated;
the second exposure pattern is used for transmitting light when the second light is irradiated and transmitting light when the first light is irradiated;
the body comprises two or three groups of first exposure surfaces and second exposure surfaces which are oppositely arranged, and the shading pattern comprises a first shading layer and a second shading layer;
the first shading layer is positioned on the first exposure surface, a third opening structure and a second opening structure are arranged on the first shading layer, and the first exposure pattern is positioned in the third opening structure;
the second light shielding layer is positioned on the second exposure surface, a fourth opening structure and a first opening structure are arranged on the second light shielding layer, and the second exposure pattern is positioned in the fourth opening structure;
the first opening structure is arranged corresponding to the first exposure pattern, and the second opening structure is arranged corresponding to the second exposure pattern.
2. The reticle of claim 1, wherein the first exposure pattern is a first polarizer, the second exposure pattern is a second polarizer, and the polarization directions of the first polarizer and the second polarizer are perpendicular;
the polarization direction of the first polarizer is the same as that of the first light ray, and the polarization direction of the second polarizer is the same as that of the second light ray.
3. The reticle of claim 1, wherein the body is rectangular parallelepiped in shape.
4. The reticle of claim 3, wherein the body is square in shape.
5. A mask system comprising an exposure machine and a mask according to any one of claims 1 to 4;
the exposure machine is used for emitting the first light and the second light to the mask.
6. A method for masking a reticle according to any one of claims 1 to 4, comprising:
placing a mask plate above a substrate;
irradiating the mask plate through first light to expose a first target material layer on the substrate base plate;
and irradiating the mask plate through second light to expose a second target material layer on the substrate base plate.
7. A method of manufacturing a reticle recited in any one of claims 1 to 4, comprising:
a first exposure pattern and a second exposure pattern are formed on the body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810181739.5A CN108388076B (en) | 2018-03-06 | 2018-03-06 | A kind of mask plate and its mask method, manufacture method, mask system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810181739.5A CN108388076B (en) | 2018-03-06 | 2018-03-06 | A kind of mask plate and its mask method, manufacture method, mask system |
Publications (2)
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06118624A (en) * | 1992-10-07 | 1994-04-28 | Fujitsu Ltd | Photomask and semiconductor exposure method using the same |
| CN101435990A (en) * | 2007-11-15 | 2009-05-20 | 北京京东方光电科技有限公司 | Mask plate and manufacturing method thereof |
| CN105974653A (en) * | 2016-07-21 | 2016-09-28 | 京东方科技集团股份有限公司 | Color film substrate, manufacturing method of color film substrate, mask, manufacturing method of mask and display device |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06118624A (en) * | 1992-10-07 | 1994-04-28 | Fujitsu Ltd | Photomask and semiconductor exposure method using the same |
| CN101435990A (en) * | 2007-11-15 | 2009-05-20 | 北京京东方光电科技有限公司 | Mask plate and manufacturing method thereof |
| CN105974653A (en) * | 2016-07-21 | 2016-09-28 | 京东方科技集团股份有限公司 | Color film substrate, manufacturing method of color film substrate, mask, manufacturing method of mask and display device |
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| CN108388076A (en) | 2018-08-10 |
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