CN108342707B - Curved surface particle source - Google Patents
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
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- Mechanical Engineering (AREA)
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- Organic Chemistry (AREA)
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- Physical Vapour Deposition (AREA)
Abstract
Description
技术领域Technical field
本发明属于真空镀膜技术领域,具体是指曲面粒子源。The invention belongs to the technical field of vacuum coating, and specifically refers to a curved surface particle source.
背景技术Background technique
物理气相沉积(PVD)主要是通过将某种原材料通过蒸发、激光辐照或气体放电等物理过程实现某种物理状态的改变(固态变为气态、固态变为可溢出的原子态),并沉积在待镀工件表面的过程。物理气相沉积过程中原材料的状态对成膜涂层的质量有很大的影响。例如:蒸发镀膜过程沉积的材料为气化后的物料,只能利用高真空(10-3pa)下,较大的气体原子自由程来沉积涂层,沉积原子能量低,涂层质量相对较差;磁控溅射(辉光放电)通过离化的惰性气体轰击溅射出的沉积材料离化率低,溅射原子能量低,形成的涂层结构疏松;电弧离子镀(弧光放电)是通过电极之间的弧光放电高能热电子离化沉积粒子,但放电过程中伴随有大颗粒,对涂层的结构、性能都有影响。Physical vapor deposition (PVD) mainly changes a certain physical state (solid state into gaseous state, solid state into overflowable atomic state) through physical processes such as evaporation, laser irradiation or gas discharge, and deposits The process on the surface of the workpiece to be plated. The state of the raw materials during the physical vapor deposition process has a great impact on the quality of the film-forming coating. For example: the materials deposited during the evaporation coating process are vaporized materials. The coating can only be deposited using the larger free path of gas atoms under high vacuum (10 -3 Pa). The deposited atomic energy is low and the coating quality is relatively low. Poor; magnetron sputtering (glow discharge) deposits materials sputtered by ionized inert gas bombardment with low ionization rate, low energy of sputtered atoms, and the formed coating structure is loose; arc ion plating (arc discharge) is achieved by The arc discharge between the electrodes ionizes and deposits particles with high energy hot electrons, but large particles are accompanied during the discharge process, which has an impact on the structure and performance of the coating.
现阶段,物理气相沉积过程为获得高能的粒子,只能通过离子源来实现。但现阶段的离子源存在两方面的问题:一是离子源的功率较低,不能形成大束流的离子源(常规的离子源放电电流在0.1-10A之间,等离子密度很低),造成沉积速率极低;另一方面现阶段的离子源离化对象主要为惰性气体(Ar)、反应气体(C2H2)为主,不能直接对沉积的金属或非金属原子(Ti、Si)进行离化。At this stage, the physical vapor deposition process can only obtain high-energy particles through ion sources. However, there are two problems with the current ion source: First, the power of the ion source is low and it cannot form a large beam ion source (the conventional ion source discharge current is between 0.1-10A, and the plasma density is very low), causing deposition The rate is extremely low; on the other hand, the current ion source ionization objects are mainly inert gases (Ar) and reactive gases (C 2 H 2 ), and cannot directly ionize deposited metal or non-metal atoms (Ti, Si). dissociation.
类金刚石薄膜(Diamond-like carbon film) 由于具有许多优异的物理、化学性能,如高硬度、低摩擦系数、优良的耐磨性、高介电常数、高击穿电压、宽带隙、化学惰性和生物相容性等。经过多年的发展,DLC薄膜在很多领域的应用也已进入实用和工业化生产阶段。然而,在类金刚石涂层的制备过程仍存在较多问题。Diamond-like carbon film has many excellent physical and chemical properties, such as high hardness, low friction coefficient, excellent wear resistance, high dielectric constant, high breakdown voltage, wide band gap, chemical inertness and Biocompatibility, etc. After years of development, the application of DLC films in many fields has also entered the stage of practical and industrial production. However, there are still many problems in the preparation process of diamond-like coatings.
现有的DLC沉积技术主要是物理气相沉积(PVD)及化学气相沉积(CVD),PVD主要包括离子束沉积(IBD)、磁控溅射、多弧离子镀、脉冲激光沉积等,CVD包括热丝化学气相沉积、等离子化学增强气相沉积(PECVD),这几种技术都存在一些问题:离子束沉积因石墨溅射速率低二沉积速率低;磁控溅射沉积一方面溅射速率低,另一方面原子能量低导致结构疏松硬度低;多弧离子镀沉积过程中会产生大量碳颗粒;脉冲激光沉积能耗高,涂层均匀性差,有效沉积区小;热丝气相沉积技术沉积温度高,极大地限制了基体材料的范围;PECVD虽然有效的降低了反应温度,但沉积过程中沉积效率较低,碳原子离化率低,成膜质量结构不够致密。The existing DLC deposition technologies are mainly physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD mainly includes ion beam deposition (IBD), magnetron sputtering, multi-arc ion plating, pulse laser deposition, etc. CVD includes thermal Silk chemical vapor deposition and plasma chemically enhanced vapor deposition (PECVD) all have some problems: ion beam deposition has a low deposition rate due to low graphite sputtering rate; magnetron sputtering deposition has a low sputtering rate on the one hand and a low deposition rate on the other. On the one hand, low atomic energy leads to loose structure and low hardness; a large number of carbon particles are produced during the multi-arc ion plating deposition process; pulse laser deposition has high energy consumption, poor coating uniformity, and small effective deposition area; hot wire vapor deposition technology has high deposition temperature, It greatly limits the range of matrix materials; although PECVD effectively reduces the reaction temperature, the deposition efficiency during the deposition process is low, the carbon atom ionization rate is low, and the film quality structure is not dense enough.
现有的碳粒子源主要有气体碳粒子源、磁控溅射源、多弧粒子镀碳粒子源、激光碳粒子源等,其中气体碳粒子源主要是通过离子源及其他等离子体装置对碳氢气体进行离化,磁控溅射源是指磁控溅射石墨靶,为沉积提供碳粒子,多弧离子镀碳粒子源是对石墨靶或金属碳化物靶表面进行弧光放电;其中气体碳粒子源因需离化气体,一方面离化率低,另一方面离化过程中,碳粒子会沉积在源上,会影响放电过程的稳定性及生产的连续性,需要经常人工清理;而磁控溅射源沉积速率低,离化率低,以及多弧离子镀碳粒子源石墨放电的特性,放电过程中大颗粒的存在都影响了多弧离子镀碳粒子源的应用。The existing carbon particle sources mainly include gaseous carbon particle sources, magnetron sputtering sources, multi-arc particle carbon particle sources, laser carbon particle sources, etc. Among them, gaseous carbon particle sources mainly use ion sources and other plasma devices to treat carbon particles. Hydrogen gas is ionized. The magnetron sputtering source refers to the magnetron sputtering graphite target, which provides carbon particles for deposition. The multi-arc ion plating carbon particle source performs arc discharge on the surface of the graphite target or metal carbide target; among which the gaseous carbon The particle source requires ionized gas. On the one hand, the ionization rate is low. On the other hand, during the ionization process, carbon particles will be deposited on the source, which will affect the stability of the discharge process and the continuity of production, and requires frequent manual cleaning; The low deposition rate and low ionization rate of the magnetron sputtering source, as well as the characteristics of graphite discharge from the multi-arc ion plating carbon particle source, and the presence of large particles during the discharge process have affected the application of the multi-arc ion plating carbon particle source.
发明内容Contents of the invention
本发明实施例所要解决的技术问题在于,提供一种可高效沉积并具有高离化率的曲面粒子源,即可作为金属粒子源、气体离子源,又可作为类金刚石涂层功能层的碳粒子源。The technical problem to be solved by the embodiments of the present invention is to provide a curved particle source that can be deposited efficiently and has a high ionization rate, which can be used as a metal particle source, a gas ion source, and as a carbon source for the diamond-like coating functional layer. Particle source.
为实现上述目的,本发明的技术方案是包括粒子源主体,该粒子源主体包括有磁靴组件、绝缘套组件、靶材、电极和水冷套,所述的靶材热传导固定连接于水冷套内侧,所述的靶材包括有相互对称分布的第一曲面放电靶材和第二靶材曲面放电靶材,磁靴组件包括有第一磁靴组件和第二磁靴组件,第一磁靴组件和第二磁靴组件分别通过绝缘套组件设置于第一曲面放电靶材和第二靶材曲面放电靶材所对应的水冷套外侧,该第一曲面放电靶材和第二靶材曲面放电靶材的两端之间分别设置有第一开口和第二开口,第一曲面放电靶材和第二靶材曲面放电靶材均由多组可表面复合非金属材料的金属基片瓦组成,所述的靶材的内部空腔构成气体电离区,该曲面靶材的第一开口处构成工艺气体进气口,所述的该曲面靶材的第二开口处构成粒子出射口;所述的曲面靶材的第一开口处设置有进气管,该进气管的侧壁上设置对应靶材的内部空腔的进气孔;所述的第一曲面放电靶材和第二靶材曲面放电靶材连接负电压,会产生辉光放电,受靶材形状影响,电子束汇合发生空心阴极放电效应;所述的第二开口的外端设置有两组相互间隔的筛网,其中靠近第二开口的筛网为接正电压的阳极筛网,另一组筛网为接负电压的引出极筛网。In order to achieve the above object, the technical solution of the present invention is to include a particle source body. The particle source body includes a magnetic shoe assembly, an insulating sleeve assembly, a target material, an electrode and a water-cooling jacket. The target material is thermally conductively and fixedly connected to the inside of the water-cooling jacket. , the target material includes a first curved surface discharge target and a second target curved surface discharge target that are symmetrically distributed with each other, the magnetic shoe assembly includes a first magnetic shoe assembly and a second magnetic shoe assembly, the first magnetic shoe assembly and the second magnetic shoe assembly are respectively arranged on the outside of the water-cooling jacket corresponding to the first curved surface discharge target and the second target curved surface discharge target through an insulating sleeve assembly. The first curved surface discharge target and the second curved surface discharge target A first opening and a second opening are respectively provided between both ends of the material. The first curved surface discharge target and the second target curved surface discharge target are composed of multiple groups of metal substrate tiles that can be surface-composited with non-metallic materials, so The internal cavity of the target constitutes a gas ionization zone, the first opening of the curved target constitutes a process gas inlet, and the second opening of the curved target constitutes a particle exit port; the curved surface An air inlet pipe is provided at the first opening of the target, and an air inlet hole corresponding to the internal cavity of the target is provided on the side wall of the air inlet pipe; the first curved surface discharge target and the second target curved surface discharge target When a negative voltage is connected, a glow discharge will be generated. Affected by the shape of the target, the electron beams will converge to produce a hollow cathode discharge effect; the outer end of the second opening is provided with two sets of screens spaced apart from each other, among which the ones close to the second opening The screen is an anode screen connected to positive voltage, and the other set of screens is an outlet screen connected to negative voltage.
进一步设置是所述的第二开口的弧度角大于第一开口的弧度角。It is further provided that the arc angle of the second opening is greater than the arc angle of the first opening.
进一步设置是第一磁靴组件和第二磁靴组件均包括有背板以及固定设置于背板上且相互依次排布的多片磁体,且相邻的磁体之间磁性相反布置,该第一磁靴组件和第二磁靴组件在第一开口处形成闭合磁场,抑制粒子溢出,在第二开口处形成发散型磁场,有助于粒子的离化溢出。It is further provided that both the first magnetic shoe assembly and the second magnetic shoe assembly include a back plate and a plurality of magnets fixedly arranged on the back plate and arranged in sequence, and the adjacent magnets are magnetically arranged in opposite directions, and the first magnets are arranged in opposite directions. The magnetic shoe assembly and the second magnetic shoe assembly form a closed magnetic field at the first opening to inhibit the overflow of particles, and form a divergent magnetic field at the second opening to facilitate the ionization and overflow of particles.
进一步设置是所述靶材的金属基片瓦为钛、铬、钨、铜、铝中的一种或其合金。It is further provided that the metal substrate tile of the target material is one of titanium, chromium, tungsten, copper, aluminum or an alloy thereof.
本发明还提供第二种结构形式的方案,即提供一种类金刚石涂层的中心阳极曲面粒子源,包括粒子源主体,该粒子源主体包括有磁靴组件、绝缘套组件、靶材、电极和水冷套,所述的靶材热传导固定连接于水冷套内侧,所述的靶材为带有一侧开口的曲面放电靶材,所述的曲面放电靶材的内部空腔构成气体电离区,该曲面放电靶材的开口处构成粒子的出射口,磁靴组件通过绝缘套组件设置于曲面放电靶材所对应的水冷套外侧,The present invention also provides a second structural form, that is, a diamond-like coating central anode curved surface particle source, including a particle source main body, which includes a magnetic shoe assembly, an insulating sleeve assembly, a target material, an electrode, and a Water-cooling jacket, the heat conduction of the target material is fixedly connected to the inside of the water-cooling jacket, the target material is a curved discharge target with an opening on one side, the internal cavity of the curved discharge target constitutes a gas ionization zone, and the curved surface The opening of the discharge target constitutes the exit port of the particles, and the magnetic shoe assembly is arranged on the outside of the water-cooling jacket corresponding to the curved discharge target through the insulating sleeve assembly.
所述的曲面放电靶材的内部的气体电离区中心设置有沿着曲面放电靶材的轴向方向设置且连接有正电压的中心阳极进气管,该中心阳极进气管的侧壁上设置有多个进气孔,该中心阳极进气管的两侧连接有用于中心阳极进气管散热的冷媒座,所述的曲面放电靶材的开口处的外端设置有接负电压的引出极筛网。The center of the gas ionization zone inside the curved surface discharge target is provided with a central anode air inlet pipe arranged along the axial direction of the curved surface discharge target and connected to a positive voltage. The side wall of the central anode air inlet pipe is provided with multiple There are two air inlets, and both sides of the central anode air inlet pipe are connected with refrigerant seats for heat dissipation of the central anode air inlet pipe. The outer end of the opening of the curved discharge target is provided with a lead-out screen that is connected to a negative voltage.
进一步设置是磁靴组件包括有背板以及固定设置于背板上且相互依次排布的多片磁体,且相邻的磁体之间磁性相反布置,使得相邻磁体之间构成闭合磁场,靠近曲面放电靶材的开口处两侧的磁体磁性相同设置,在开口处形成发散型磁场,有助于粒子的离化溢出。It is further configured that the magnetic shoe assembly includes a back plate and a plurality of magnets fixedly arranged on the back plate and arranged in sequence, and the adjacent magnets are magnetically oppositely arranged, so that a closed magnetic field is formed between the adjacent magnets, close to the curved surface The magnets on both sides of the opening of the discharge target have the same magnetic properties, forming a divergent magnetic field at the opening, which is helpful for the ionization and overflow of particles.
进一步设置是曲面放电靶材的开口的弧度角度为30°-90°。It is further set that the arc angle of the opening of the curved discharge target is 30°-90°.
本发明还提供第三中结构形式的方案,即提供一种类金刚石涂层的双筛网曲面粒子源,包括碳粒子源主体,该碳粒子源主体包括有磁靴组件、绝缘套组件、靶材、电极和水冷套,所述的靶材热传导固定连接于水冷套内侧,所述的靶材为带有一侧开口的曲面放电靶材,所述的曲面放电靶材的内部空腔构成气体电离区,该曲面放电靶材的开口处构成粒子的出射口,磁靴组件通过绝缘套组件设置于曲面放电靶材所对应的水冷套外侧,The present invention also provides a third structural form, that is, a diamond-like coating double mesh curved surface particle source, including a carbon particle source main body, and the carbon particle source main body includes a magnetic shoe assembly, an insulating sleeve assembly, and a target material. , electrode and water-cooling jacket, the heat conduction of the target material is fixedly connected to the inside of the water-cooling jacket, the target material is a curved discharge target with an opening on one side, and the internal cavity of the curved discharge target constitutes a gas ionization zone , the opening of the curved discharge target constitutes the exit port of the particles, and the magnetic shoe assembly is arranged on the outside of the water-cooling jacket corresponding to the curved discharge target through the insulating sleeve assembly,
所述的曲面放电靶材的内部的气体电离区中心设置有沿着曲面放电靶材的轴向方向设置中心进气管,该中心进气管的侧壁上设置有多个出气孔,该中心进气管的两侧连接有用于中心进气管散热的水冷座,所述的曲面放电靶材的开口处的外端设置有两组相互间隔的筛网,其中靠近开口处的筛网为接正电压的阳极筛网,另一组筛网为接负电压的引出极筛网。The center of the internal gas ionization zone of the curved surface discharge target is provided with a central air inlet pipe along the axial direction of the curved surface discharge target. The side walls of the central air inlet pipe are provided with a plurality of air outlets. The central air inlet pipe Both sides of the target are connected with water-cooling seats for heat dissipation of the central air inlet pipe. The outer end of the opening of the curved discharge target is provided with two sets of screens spaced apart from each other. The screen close to the opening is an anode connected to a positive voltage. The other set of screens is the lead-out screen that is connected to the negative voltage.
进一步设置是磁靴组件包括有背板以及固定设置于背板上且相互依次排布的多片磁体,且相邻的磁体之间磁性相反布置,使得相邻磁体之间构成闭合磁场,靠近曲面放电靶材的开口处两侧的磁体磁性相同设置,在开口处形成发散型磁场,有助于粒子的离化溢出。It is further provided that the magnetic shoe assembly includes a back plate and a plurality of magnets fixedly arranged on the back plate and arranged in sequence, and the adjacent magnets are magnetically oppositely arranged, so that a closed magnetic field is formed between the adjacent magnets, close to the curved surface The magnets on both sides of the opening of the discharge target have the same magnetic properties, forming a divergent magnetic field at the opening, which is helpful for the ionization and overflow of particles.
本发明的创新机理是:通过接线柱将曲面放电靶材接通负电压,会产生辉光放电,受曲面放电靶材形状影响,电子束汇聚发生空心阴极放电效应,阳极即可是中心阳极进气管亦可是阳极筛网,阳极加正电即可接收电子,又可加速粒子输出,筛网可加负电,可作为粒子的引出极,三种电极的配合,可获得大量高能粒子,放电阴极即可是由多组可复合非金属材料的金属基片拼接固定在水冷套上,也可是由多组金属基片拼接固定在水冷套上,绝缘套主要是对各个组件之间绝缘,磁靴组件内置磁铁。本发明利用环形阴极放电过程中的空心阴极效应为类金刚石涂层提供高能粒子。The innovative mechanism of the present invention is: connecting the curved surface discharge target to a negative voltage through a connecting post will produce glow discharge. Affected by the shape of the curved surface discharge target, the electron beam converges to produce a hollow cathode discharge effect. The anode can be the central anode air inlet pipe. It can also be an anode screen. The anode can be positively charged to receive electrons and accelerate particle output. The screen can be negatively charged and can be used as an extraction electrode for particles. The cooperation of the three electrodes can obtain a large number of high-energy particles. The discharge cathode can be Multiple sets of metal substrates that can be composited with non-metallic materials are spliced and fixed on the water-cooling jacket. Multiple sets of metal substrates can also be spliced and fixed on the water-cooling jacket. The insulating sleeve is mainly used to insulate each component. The magnetic shoe assembly has built-in magnets. . The invention utilizes the hollow cathode effect in the annular cathode discharge process to provide high-energy particles for the diamond-like coating.
与现有技术相比,本发明提供的类金刚石涂层粒子源,具有如下实质性区别和显著性进步:Compared with the existing technology, the diamond-like coating particle source provided by the present invention has the following substantial differences and significant improvements:
1)阴极靶材采用金属基片瓦及金属基片瓦复合(bonding)非金属材料瓦片式拼接机械固定的方式固定在水冷管上,一方面可高效冷却靶材,另一方面金属及金属及非金属共同溅射,可获得高能金属粒子、非金属粒子及金属非金属复合粒子,有效的解决涂层内应力的问题。1) The cathode target is fixed on the water-cooling tube using metal substrate tiles and metal substrate tile composite (bonding) non-metallic material tile-type splicing and mechanical fixation. On the one hand, it can efficiently cool the target material, and on the other hand, the metal and metal By co-sputtering with non-metals, high-energy metal particles, non-metal particles and metal-non-metal composite particles can be obtained, effectively solving the problem of internal stress in the coating.
2)曲面阴极设计,可装配多组闭合磁组,可高效利用靶材及提高离化效果。2) The curved cathode design can be equipped with multiple closed magnet groups, which can efficiently utilize the target material and improve the ionization effect.
3)环形设计,大束流高能电子汇聚,高效溅射离化粒子。3) Annular design, large beam of high-energy electrons converge, and efficient sputtering of ionized particles.
4)设备沉积过程中,大束电子流能够高效离化粒子,一方面溅射作用可在基体表面获得无大颗粒的涂层,另一方面在制备类金刚石涂层中高能离化碳粒子可减少石墨相的存在,提升类金刚石涂层的质量。4) During the equipment deposition process, a large beam of electron flow can efficiently ionize particles. On the one hand, the sputtering effect can obtain a coating without large particles on the surface of the substrate. On the other hand, high-energy ionized carbon particles can be reduced in the preparation of diamond-like coatings. The existence of graphite phase improves the quality of diamond-like coating.
5)相较于传统的气体离子源,突破性的可形成金属、非金属高能粒子源。5) Compared with traditional gas ion sources, it can form a breakthrough source of metal and non-metal high-energy particles.
总之,本发明所提供的曲面粒子源,在高真空利用环形放电电子束汇聚技术,可独立完成大束流的粒子离化,并从侧面开口处溢出,从而可在基体表面获得高能高沉积速率的高离化率的粒子。In short, the curved surface particle source provided by the present invention uses annular discharge electron beam convergence technology in high vacuum to independently complete particle ionization of large beams and overflow from the side openings, thereby obtaining high-energy and high-deposition rate particles on the surface of the substrate. Particles with high ionization rate.
附图说明Description of the drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动性的前提下,根据这些附图获得其他的附图仍属于本发明的范畴。In order to explain the embodiments of the present invention or the technical solutions in the prior art more clearly, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings in the following description are only These are some embodiments of the present invention. For those of ordinary skill in the art, it is still within the scope of the present invention to obtain other drawings based on these drawings without exerting any creative effort.
图1是本发明所提供的实施例一的剖面结构示意图;Figure 1 is a schematic cross-sectional structural diagram of Embodiment 1 provided by the present invention;
图2 靶材的结构示意图;Figure 2 Structural diagram of the target;
图3是水冷套的结构示意图;Figure 3 is a schematic structural diagram of the water cooling jacket;
图4是屏蔽组件及绝缘套组件的结构示意图;Figure 4 is a schematic structural diagram of the shielding component and the insulation sleeve component;
图5是磁靴及支撑固定的结构示意图;Figure 5 is a schematic structural diagram of the magnetic shoe and supporting fixation;
图6是本发明所提供的实施例二的剖面结构示意图;Figure 6 is a schematic cross-sectional structural diagram of Embodiment 2 provided by the present invention;
图7 靶材的结构示意图;Figure 7 Structural diagram of the target;
图8是水冷套的结构示意图;Figure 8 is a schematic structural diagram of the water cooling jacket;
图9是屏蔽组件及绝缘套组件的结构示意图;Figure 9 is a schematic structural diagram of the shielding component and the insulating sleeve component;
图10是磁靴及支撑固定的结构示意图;Figure 10 is a schematic structural diagram of the magnetic shoe and supporting fixation;
图11是本发明所提供的实施例三的剖面结构示意图;Figure 11 is a schematic cross-sectional structural diagram of Embodiment 3 provided by the present invention;
图12 靶材的结构示意图;Figure 12 Structural diagram of the target;
图13是水冷套的结构示意图;Figure 13 is a schematic structural diagram of the water cooling jacket;
图14是屏蔽组件及绝缘套组件的结构示意图;Figure 14 is a schematic structural diagram of the shielding assembly and the insulating sleeve assembly;
图15是磁靴及支撑固定的结构示意图;Figure 15 is a schematic structural diagram of the magnetic shoe and supporting fixation;
图16磁场模拟示意图。Figure 16 Schematic diagram of magnetic field simulation.
具体实施方式Detailed ways
为使本发明的目的、技术方案和优点更加清楚,下面将结合附图对本发明作进一步地详细描述。In order to make the purpose, technical solutions and advantages of the present invention clearer, the present invention will be described in further detail below with reference to the accompanying drawings.
本发明所提到的方向和位置用语,例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「顶部」、「底部」、「侧面」等,仅是参考附图的方向或位置。因此,使用的方向和位置用语是用以说明及理解本发明,而非对本发明保护范围的限制。Direction and position terms mentioned in this invention, such as "up", "down", "front", "back", "left", "right", "inside", "outside", "top", "bottom" ”, “side”, etc. are only for reference to the direction or position in the drawings. Therefore, the directional and positional terms used are used to illustrate and understand the present invention, but not to limit the scope of the present invention.
为便于绘图,曲面放电管中,水冷回字形管道焊接在冷却钢管上,靶材为四组瓦片式拼装,实际应用中,为使靶材能够紧密的贴合水冷管,靶材将尽量多瓦片式拼装而成;类金刚石涂层放电管中部分部件未画出(磁铁、外接水冷管、外接进气管路)。本发明所述的水冷套和水冷座优选采用以水作为冷却介质的水冷套或水冷座。In order to facilitate drawing, in the curved discharge tube, the water-cooled zigzag pipe is welded on the cooling steel pipe, and the target material is assembled in four sets of tiles. In actual application, in order to make the target material closely fit the water-cooled pipe, the target material will be as many as possible It is assembled in a tile type; some parts of the diamond-like coating discharge tube are not shown (magnet, external water-cooling pipe, external air inlet pipe). The water-cooling jacket and water-cooling block of the present invention preferably use water as the cooling medium.
为了更突出性的描述本发明的优点及特点,本发明中所使用的实施例是以类金刚石涂层制备过程中所使用的粒子源为基础进行描述的,众所周知的是本发明可对不同的金属及非金属进行高能离化,不单单只限于类金刚石涂层中的金属粒子源、非金属粒子源、金属及非金属粒子源。In order to more prominently describe the advantages and characteristics of the present invention, the embodiments used in the present invention are described based on the particle source used in the preparation process of diamond-like coating. It is well known that the present invention can be used for different High-energy ionization of metals and non-metals is not limited to metal particle sources, non-metal particle sources, metal and non-metal particle sources in diamond-like coatings.
下面,对本发明中工件的具体工作方式进行说明。Next, the specific working mode of the workpiece in the present invention will be described.
实施例一、双侧开口侧面阳极类金刚石涂层碳粒子源Example 1. Double-sided open side anode diamond-like carbon particle source
参见图1所示:一种双侧开口曲面类金刚石涂层碳粒子源10,其为侧面双开口结构,其包括曲面放电靶材101、水冷套102、接线柱103、屏蔽组件104、绝缘套105、两组磁靴组件106、固定组件107、多组筛网108、进气管109。水冷套102是不锈钢管表面焊接水冷管,接线柱103装配在水冷套102上,曲面放电靶材101是由多组金属基片瓦表面复合(bonding)石墨片拼接并通过螺栓机械法固定在水冷套102上,绝缘套组件105包括多个绝缘件对整个阴极内带电部件与非电部件的进行绝缘,屏蔽组件104由2个屏蔽组成对阴极靶面进行屏蔽,磁靴组件106内置多组磁铁,形成对称的闭合磁场,固定组件107通过螺纹装配磁靴组件106,并可在装配进气管109及多组筛网108,固定组件107可支撑固定整个碳粒子源10。See Figure 1 as shown: a double-side opening curved surface diamond-like carbon particle source 10, which has a double-side opening structure and includes a curved surface discharge target 101, a water cooling jacket 102, a terminal 103, a shielding component 104, and an insulating sleeve. 105. Two sets of magnetic shoe assemblies 106, fixed assembly 107, multiple sets of screens 108, and air inlet pipe 109. The water-cooling jacket 102 is a stainless steel pipe surface welded water-cooling pipe. The terminal 103 is assembled on the water-cooling jacket 102. The curved discharge target 101 is made of multiple groups of metal substrate tiles with surface composite (bonding) graphite sheets spliced together and mechanically fixed on the water-cooled pipe through bolts. On the sleeve 102, the insulating sleeve assembly 105 includes a plurality of insulating pieces to insulate the live parts and non-electrical parts in the entire cathode. The shielding assembly 104 consists of two shields to shield the cathode target surface. The magnetic shoe assembly 106 has multiple sets of magnets built in. , forming a symmetrical closed magnetic field, the fixing component 107 is assembled with the magnetic shoe component 106 through threads, and can be assembled with the air inlet pipe 109 and multiple sets of screens 108. The fixing component 107 can support and fix the entire carbon particle source 10.
参加图2所示:曲面放电靶材101是由三组金属基片1011瓦拼接而成,金属基片瓦1011上有阵列螺纹孔,可通过螺栓机械方法固定在水冷套102上,非金属材料1012通过靶材的一种加工方法复合(bonding)的形式固定在金属基片瓦1011上。As shown in Figure 2: the curved discharge target 101 is made of three groups of metal substrate tiles 1011. The metal substrate tiles 1011 have an array of threaded holes and can be mechanically fixed on the water cooling jacket 102 through bolts. Non-metallic materials 1012 is fixed on the metal substrate tile 1011 in the form of bonding through a processing method of the target material.
参见图3、4、5所示:水冷套102钢管焊接回字形冷水道,外接电极103装配在水冷套102上,屏蔽组件104包括上端屏蔽套1041、下端屏蔽套1042,上端屏蔽套1041、下端屏蔽套1042自身装配卡位,绝缘套组件105包括绝缘封头1051、第一曲面绝缘卡套1052、 第二曲面绝缘卡套1053、绝缘堵头1054、电极绝缘套(图中未显示,套装在外接电极上),第一曲面绝缘卡套1052及第二曲面绝缘卡套1053套装配在水冷套102上使水冷套102与磁靴组件106之间绝缘,绝缘封头1051套装在水冷套102上下两端及绝缘堵头1054套装水冷套102端面上使水冷套102与屏蔽组件104之间绝缘,上、下端屏蔽套1041、1042套装在绝缘封头1051上,磁靴组件106是由磁靴及与之螺纹紧固的背板组成;支撑固定组件107包括阴极固定绝缘片1071、阴极固定板1072,阴极固定板通过螺栓紧固在阴极的屏蔽组件104上,中间为阴极固定绝缘片1071,阴极固定板1072一端焊有外接气管套1073,可装配进气管109,进行工艺气体的布气,可利用气流的作用,利于碳粒子流的溢出,阴极固定板1072对侧焊有筛网固定套,可装配固定端头1081、绝缘陶瓷片1082、引出极筛网1083、阳极筛网1084。一组磁靴组件106上装配四组磁铁NSNS,另一组磁靴组件106装配三组磁铁SNS,其可在小角度开口处形成闭合磁场,抑制粒子溢出,在大角度开口处形成发散型磁场,有助于粒子的离化溢出。See Figures 3, 4, and 5: the water-cooling jacket 102 has a steel pipe welded to a back-shaped cold water channel, and the external electrode 103 is assembled on the water-cooling jacket 102. The shielding assembly 104 includes an upper end shielding sleeve 1041 and a lower end shielding sleeve 1042. The shielding sleeve 1042 itself is assembled into a clamping position, and the insulating sleeve assembly 105 includes an insulating head 1051, a first curved surface insulating ferrule 1052, a second curved surface insulating ferrule 1053, an insulating plug 1054, and an electrode insulating sleeve (not shown in the figure, the set is in on the external electrode), the first curved surface insulating ferrule 1052 and the second curved surface insulating ferrule 1053 are assembled on the water-cooling jacket 102 to insulate the water-cooling jacket 102 and the magnetic shoe assembly 106, and the insulating head 1051 is assembled on the top and bottom of the water-cooling jacket 102. Both ends and the insulating plugs 1054 are installed on the end face of the water-cooling jacket 102 to insulate the water-cooling jacket 102 and the shielding assembly 104. The upper and lower shielding sleeves 1041 and 1042 are installed on the insulating head 1051. The magnetic shoe assembly 106 is composed of a magnetic shoe and It consists of a back plate that is threaded with it; the support and fixation component 107 includes a cathode fixing insulating sheet 1071 and a cathode fixing plate 1072. The cathode fixing plate is fastened to the cathode shielding component 104 through bolts, with a cathode fixing insulating sheet 1071 in the middle, and a cathode fixing plate 1072. An external air pipe sleeve 1073 is welded to one end of the fixed plate 1072, which can be assembled with the air inlet pipe 109 to distribute the process gas. The effect of the air flow can be used to facilitate the overflow of the carbon particle flow. A screen fixed sleeve is welded to the opposite side of the cathode fixed plate 1072. It can be assembled with a fixed end 1081, an insulating ceramic sheet 1082, a lead-out screen 1083, and an anode screen 1084. One set of magnetic shoe assemblies 106 is equipped with four sets of magnets NSNS, and the other set of magnetic shoe assemblies 106 is equipped with three sets of magnets SNS, which can form a closed magnetic field at small-angle openings, suppress particle overflow, and form a divergent magnetic field at large-angle openings. , which contributes to the ionization overflow of particles.
参见图1-5所示:双侧开口曲面类金刚石涂层碳粒子源10在真空状态下,通过接线柱103接通负电压(300v-500v),在高真空(0.1-1.0Pa)下,发生辉光发电,工艺气体氩气离化,碰撞靶材101表面,溅射出金属粒子、碳粒子,环形管放电过程中,电子束汇聚,在磁场的作用下,大量离化金属粒子、碳粒子,离化态的金属粒子、碳粒子受气流及引出极筛网1083的影响,将从大角度开口处溢出,基材表面施加负偏压,在电场的作用下,金属离子、碳离子沉积在基体表面,获得类金刚石涂层。See Figure 1-5: The double-sided open curved diamond-like carbon particle source 10 is in a vacuum state and connected to a negative voltage (300v-500v) through the terminal 103. In a high vacuum (0.1-1.0Pa), Glow power generation occurs, the process gas argon is ionized, collides with the surface of the target 101, and sputters out metal particles and carbon particles. During the discharge process of the annular tube, the electron beam converges, and under the action of the magnetic field, a large number of metal particles and carbon particles are ionized , the ionized metal particles and carbon particles will overflow from the large-angle opening due to the influence of the air flow and the extraction pole screen 1083. A negative bias voltage is applied to the surface of the substrate. Under the action of the electric field, the metal ions and carbon ions are deposited on the On the surface of the substrate, a diamond-like coating is obtained.
实施例二、中心阳极曲面类金刚石涂层碳粒子源Example 2: Central anode curved surface diamond-like carbon particle source
参见图6所示:一种中心阳极曲面类金刚石涂层碳粒子源11,其为单侧面开口结构,开口角度为30。-90。,其包括曲面放电靶材111、水冷套112、接线柱113、屏蔽组件114、绝缘套115、磁靴组件116、固定组件117、筛网118、进气管119,水冷套112是不锈钢管表面焊接水冷管,接线柱113装配在水冷套112上,曲面放电靶材111是由多组金属基片瓦表面复合(bonding)石墨片拼接并通过螺栓机械法固定在水冷套112上,绝缘套115包括多个绝缘件对整个阴极内带电部件与非电部件的进行绝缘,屏蔽组件114包括三个屏蔽件对阴极靶面进行屏蔽,磁靴组件116内置多组磁铁,形成闭合磁场,固定组件117固定整个阴极,筛网118装配在固定组件上,作为引出极,进气管119为两端装配有水冷的阳极进气管,装配在固定组件上。See Figure 6 as shown: a central anode curved surface diamond-like carbon particle source 11, which has a single side opening structure and an opening angle of 30° . -90 . , which includes curved discharge target 111, water cooling jacket 112, terminal 113, shielding component 114, insulation sleeve 115, magnetic shoe component 116, fixed component 117, screen 118, air inlet pipe 119, water cooling jacket 112 is a stainless steel pipe surface welded The water-cooling tube and terminal posts 113 are assembled on the water-cooling jacket 112. The curved discharge target 111 is made of multiple groups of metal substrate tiles with composite (bonding) graphite sheets on the surface and is mechanically fixed on the water-cooling jacket 112 through bolts. The insulation sleeve 115 includes Multiple insulators insulate the live parts and non-electric parts in the entire cathode. The shield assembly 114 includes three shields to shield the cathode target surface. The magnetic shoe assembly 116 has multiple sets of magnets built in to form a closed magnetic field. The fixing assembly 117 is fixed The entire cathode and the screen 118 are assembled on the fixed assembly as the lead-out pole. The air inlet pipe 119 is an anode air inlet pipe equipped with water-cooling at both ends and is assembled on the fixed assembly.
参加图7所示:靶材111是由三组金属基片1111瓦拼接而成,金属基片瓦1111上有阵列螺纹孔,可通过螺栓机械方法固定在水冷套112上,非金属材料10112通过靶材的一种加工方法复合(bonding,系钎焊工艺)的形式固定在金属基片瓦1111上。As shown in Figure 7: the target 111 is made of three groups of metal substrate tiles 1111 spliced together. The metal substrate tiles 1111 have an array of threaded holes, which can be mechanically fixed on the water-cooling jacket 112 through bolts. Non-metallic materials 1112 can pass through A processing method of the target material is to fix it on the metal substrate tile 1111 in the form of bonding (brazing process).
参见图8、9所示:水冷套112钢管焊接回字形冷水道,接线柱113装配在水冷套112上,屏蔽组件114包括上下两端屏蔽套1141、端面屏蔽套1142,绝缘套组件115包括电极绝缘套1151、绝缘封头1152、平面绝缘套1153、曲面绝缘盖1154,曲面绝缘盖1154套装配在水冷套112上使水冷套112与磁靴116之间绝缘,绝缘封头1152套装在水冷套112上下两端及平面绝缘套1153套装水冷套112端面上使水冷套112与屏蔽组件114之间绝缘,上下两端屏蔽套1141套装在绝缘封头1152上,端面屏蔽套1142固定在上下两端屏蔽套1141上,磁靴组件116包括磁铁座1161及背板1162。磁靴116上装配九组磁铁NSNSNSNSN,一方面两组磁铁之间可形成闭合磁力线,另一方面开口处最近的两组磁铁极性相同,形成开放式磁力线,有助于粒子的离化溢出。See Figures 8 and 9 as shown: the water-cooling jacket 112 is a steel pipe welded to a zigzag cold water channel, the terminals 113 are assembled on the water-cooling jacket 112, the shielding assembly 114 includes upper and lower end shielding sleeves 1141 and end face shielding sleeves 1142, and the insulation sleeve assembly 115 includes electrodes Insulating sleeve 1151, insulating head 1152, flat insulating sleeve 1153, curved insulating cover 1154. The curved insulating cover 1154 is installed on the water cooling jacket 112 to insulate the water cooling jacket 112 and the magnetic shoe 116. The insulating head 1152 is installed on the water cooling jacket. The upper and lower ends of 112 and the flat insulating sleeve 1153 are set on the water-cooling sleeve 112 to insulate the water-cooling sleeve 112 and the shielding component 114 on the end surface. The shielding sleeves 1141 on the upper and lower ends are set on the insulating head 1152, and the end shielding sleeves 1142 are fixed on the upper and lower ends. On the shielding sleeve 1141, the magnetic shoe assembly 116 includes a magnet base 1161 and a back plate 1162. The magnetic shoe 116 is equipped with nine sets of magnets NSNSNSNSN. On the one hand, closed magnetic lines of force can be formed between the two groups of magnets. On the other hand, the two groups of magnets closest to the opening have the same polarity, forming open magnetic lines of force, which is conducive to the ionization and overflow of particles.
参见图10所示:固定组件117(悬浮电位)通过螺丝固定磁靴116并通过进气119的螺纹固定水冷座1191固定整个阴极,固定组件117上可通过陶瓷垫片1171及压片1181装配筛网118作为引出极。通过进气管119上套装的绝缘片及固定组件117、螺纹固定水冷座1191,可实现整个阴极的固定及卡位。See Figure 10 as shown: the fixed component 117 (suspended potential) fixes the magnetic shoe 116 with screws and fixes the entire cathode with the water-cooling seat 1191 through the thread of the air inlet 119. The fixed component 117 can be assembled with a ceramic gasket 1171 and a press plate 1181. Net 118 serves as the lead pole. Through the insulating sheet and fixing assembly 117 and the threaded water-cooling seat 1191 installed on the air inlet pipe 119, the entire cathode can be fixed and locked.
参见图6-10所示:中心阳极曲面类金刚石涂层碳粒子源11在真空状态下,通过接线柱113接通负电压(300v-500v),在高真空(0.1-1.0Pa)下,发生辉光发电,工艺气体氩气离化,碰撞靶材111表面,溅射出金属粒子、碳粒子,环形管放电过程中,电子束汇聚,在磁场的作用下,大量离化金属粒子、碳粒子,离化态的金属粒子、碳粒子受中心阳极及引出极的影响,将从开口处溢出,基材表面施加负偏压,在电场的作用下,金属离子、碳离子沉积在基体表面,获得类金刚石涂层。See Figure 6-10: the central anode curved surface diamond-like carbon particle source 11 is in a vacuum state and connected to a negative voltage (300v-500v) through the terminal 113. Under high vacuum (0.1-1.0Pa), Glow power generation, the process gas argon is ionized, collides with the surface of the target 111, and sputters out metal particles and carbon particles. During the discharge process of the annular tube, the electron beam converges, and under the action of the magnetic field, a large number of metal particles and carbon particles are ionized. The ionized metal particles and carbon particles will be affected by the central anode and the extraction electrode and will overflow from the opening. A negative bias voltage is applied to the surface of the substrate. Under the action of the electric field, the metal ions and carbon ions are deposited on the surface of the substrate to obtain a similar Diamond coating.
实施例三、侧面阳极曲面类金刚石涂层碳粒子源Example 3: Side anode curved surface diamond-like carbon particle source
参见图11所示:一种中心阳极曲面类金刚石涂层碳粒子源12,其为单侧面开口结构,开口角度为30。-90。,其包括曲面放电靶材121、水冷套122、接线柱123、屏蔽组件124、绝缘套125、磁靴组件126、固定组件127、两组筛网128、进气管129,水冷套122是不锈钢管表面焊接水冷管,接线柱123装配在水冷套122上,靶材121是由多组金属基片瓦表面复合(bonding)石墨片拼接并通过螺栓机械法固定在水冷套122上,绝缘套125包括多个绝缘件对整个阴极内带电部件与非电部件的进行绝缘,屏蔽组件124包括三个屏蔽件对阴极靶面进行屏蔽,磁靴组件126内置多组磁铁,形成闭合磁场,固定组件127固定整个阴极,两组筛网128装配在固定组件上,一组筛网1284作为引出极,另一组筛网1283作为阳极,进气管119为装配在固定组件127上的进气管。See Figure 11 as shown: a central anode curved surface diamond-like carbon particle source 12, which has a single side opening structure and an opening angle of 30° . -90 . , which includes a curved discharge target 121, a water-cooling jacket 122, a terminal 123, a shielding component 124, an insulating sleeve 125, a magnetic shoe component 126, a fixing component 127, two sets of screens 128, and an air inlet pipe 129. The water-cooling jacket 122 is a stainless steel pipe. The water-cooling pipe is surface welded, and the terminal 123 is assembled on the water-cooling jacket 122. The target 121 is made of multiple groups of metal substrate tiles with surface composite (bonding) graphite sheets and is mechanically fixed on the water-cooling jacket 122 through bolts. The insulation sleeve 125 includes Multiple insulators insulate the live parts and non-electric parts in the entire cathode. The shielding assembly 124 includes three shielding members to shield the cathode target surface. The magnetic shoe assembly 126 has multiple sets of magnets built in to form a closed magnetic field. The fixing assembly 127 is fixed For the entire cathode, two sets of screens 128 are assembled on the fixed component, one set of screens 1284 serves as the lead-out pole, the other set of screens 1283 serves as the anode, and the air inlet pipe 119 is an air inlet pipe assembled on the fixed assembly 127 .
参加图12所示:靶材111是由三组金属基片1111瓦拼接而成,金属基片瓦1111上有阵列螺纹孔,可通过螺栓机械方法固定在水冷套112上,石墨10112通过靶材的一种加工方法复合的形式固定在金属基片瓦1111上。As shown in Figure 12: the target 111 is made of three groups of metal substrate tiles 1111 spliced together. The metal substrate tiles 1111 have an array of threaded holes and can be mechanically fixed on the water cooling jacket 112 through bolts. The graphite 10112 passes through the target. A processing method in which the composite form is fixed on the metal substrate tile 1111.
参见图13、14所示:水冷套122钢管焊接回字形冷水道,接线柱123装配在水冷套122上,屏蔽组件124包括上下两端屏蔽套1241、端面屏蔽套1242,绝缘套组件125包括电极绝缘套1251、绝缘封头1252、平面绝缘套1253、曲面绝缘盖1254,曲面绝缘盖1254套装配在水冷套122上使水冷套122与磁靴126之间绝缘,绝缘封头1252套装在水冷套122上下两端及平面绝缘套1253套装水冷套122端面上使水冷套122与屏蔽组件124之间绝缘,上下两端屏蔽套1241套装在绝缘封头1252上,端面屏蔽套1242固定在上下两端屏蔽套1241上,磁靴126包括磁铁座1261及背板1262。磁靴组件126装配九组磁铁NSNSNSNSN,一方面两组磁铁之间可形成闭合磁力线,另一方面开口处最近的两组磁铁极性相同,形成开放式磁力线,有助于粒子的离化溢出。See Figures 13 and 14 as shown: the water-cooling jacket 122 steel pipe is welded to a zigzag cold water channel, the terminals 123 are assembled on the water-cooling jacket 122, the shielding assembly 124 includes upper and lower end shielding sleeves 1241, end face shielding sleeves 1242, and the insulation sleeve assembly 125 includes electrodes Insulating sleeve 1251, insulating head 1252, flat insulating sleeve 1253, curved surface insulating cover 1254. The curved surface insulating cover 1254 is installed on the water cooling jacket 122 to insulate the water cooling jacket 122 and the magnetic shoe 126. The insulating head 1252 is installed on the water cooling jacket. The upper and lower ends of 122 and the flat insulating sleeve 1253 are installed on the water-cooling sleeve 122 to insulate the water-cooling sleeve 122 and the shielding component 124 on the end surface. The shielding sleeves 1241 on the upper and lower ends are set on the insulating head 1252, and the end shielding sleeves 1242 are fixed on the upper and lower ends. On the shielding sleeve 1241, the magnetic shoe 126 includes a magnet base 1261 and a back plate 1262. The magnetic shoe assembly 126 is equipped with nine groups of magnets NSNSNSNSN. On the one hand, closed magnetic lines of force can be formed between the two groups of magnets. On the other hand, the two groups of magnets closest to the opening have the same polarity, forming open magnetic lines of force, which is conducive to the ionization and overflow of particles.
参见图15所示:固定组件127(悬浮电位)通过螺丝固定磁靴组件126并通过进气129的螺纹固定座1291固定整个阴极,固定组件127上可通过陶瓷垫片1271及压片1281装配筛网1283作为阳极、筛网1284作为引出极。通过进气129上套装的绝缘片及固定组件127、螺纹固定座1291,可实现整个阴极的固定及卡位。See Figure 15: the fixed component 127 (suspended potential) fixes the magnetic shoe component 126 with screws and fixes the entire cathode through the threaded fixing seat 1291 of the air inlet 129. The fixed component 127 can be assembled with a ceramic gasket 1271 and a press plate 1281. The mesh 1283 serves as the anode and the screen 1284 serves as the extraction pole. Through the insulating sheet, fixing assembly 127 and threaded fixing seat 1291 installed on the air inlet 129, the entire cathode can be fixed and locked.
参见图11-15所示:侧面阳极曲面类金刚石涂层碳粒子源11在真空状态下,通过接线柱113接通负电压(300v-500v),在高真空(0.1-1.0Pa)下,发生辉光发电,工艺气体氩气离化,碰撞靶材111表面,溅射出金属粒子、碳粒子,环形管放电过程中,电子束汇聚,在磁场的作用下,大量离化金属粒子、碳粒子,离化态的金属粒子、碳粒子受侧面阳极及引出极的影响,将从开口处溢出,基材表面施加负偏压,在电场的作用下,金属离子、碳离子沉积在基体表面,获得类金刚石涂层。See Figure 11-15: The side anode curved surface diamond-like carbon particle source 11 is in a vacuum state and connected to a negative voltage (300v-500v) through the terminal 113. Under high vacuum (0.1-1.0Pa), Glow power generation, the process gas argon is ionized, collides with the surface of the target 111, and sputters out metal particles and carbon particles. During the discharge process of the annular tube, the electron beam converges, and under the action of the magnetic field, a large number of metal particles and carbon particles are ionized. The ionized metal particles and carbon particles will be affected by the side anode and the extraction electrode and will overflow from the opening. A negative bias voltage is applied to the surface of the substrate. Under the action of the electric field, the metal ions and carbon ions are deposited on the surface of the substrate to obtain a similar Diamond coating.
图16为实施例二及实施例三所应用的单开口的类金刚石涂层曲面碳粒子源内磁场的模拟情况,碳粒子源内的磁靴放置的磁铁为多组(不少于三组),本模拟中使用九组磁铁模拟,其磁铁排布为NSNSNSNSN,在开口处形成发散式磁场,有利于粒子的溢出。Figure 16 shows the simulation of the magnetic field in the single-opening diamond-like carbon coating curved carbon particle source used in Examples 2 and 3. The magnets placed in the magnetic shoes in the carbon particle source are multiple groups (not less than three groups). Nine groups of magnets are used in the simulation. The magnets are arranged as NSNSNSNSN, forming a divergent magnetic field at the opening, which is conducive to the overflow of particles.
以上所揭露的仅为本发明较佳实施例而已,当然不能以此来限定本发明之权利范围,因此依本发明权利要求所作的等同变化,仍属本发明所涵盖的范围。What is disclosed above is only the preferred embodiment of the present invention. Of course, it cannot be used to limit the scope of the present invention. Therefore, equivalent changes made according to the claims of the present invention still fall within the scope of the present invention.
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CN1397660A (en) * | 2002-04-16 | 2003-02-19 | 北京科技大学 | Non-magentic shielding type ferromagnetic target as sputter cathode |
KR20050109766A (en) * | 2004-05-17 | 2005-11-22 | 세메스 주식회사 | Apparatus for depositing having curved surface target |
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CN208308951U (en) * | 2018-02-26 | 2019-01-01 | 温州职业技术学院 | A kind of surface particle source |
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