CN108319110B - Color photoresist composition, color filter and preparation method thereof - Google Patents
Color photoresist composition, color filter and preparation method thereof Download PDFInfo
- Publication number
- CN108319110B CN108319110B CN201710040963.8A CN201710040963A CN108319110B CN 108319110 B CN108319110 B CN 108319110B CN 201710040963 A CN201710040963 A CN 201710040963A CN 108319110 B CN108319110 B CN 108319110B
- Authority
- CN
- China
- Prior art keywords
- formula
- photoresist composition
- color
- weight
- photoinitiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
Abstract
The disclosure relates to a color photoresist composition, which contains a pigment, a photosensitive monomer, an alkali-soluble resin, a photoinitiator and a photoinitiation inhibitor, wherein the photoinitiation inhibitor has a structure shown in a formula (1);
x is an alkoxy group having 1 to 10 carbon atoms, an alkylsiloxy group having 1 to 10 carbon atoms and a silicon atom number of 1 to 5, or an acetoxy group, R 1 、R 2 And R 3 Each independently is one of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, a halogen atom, a methoxy group and an ethoxy group. The color photoresist composition disclosed by the disclosure contains a photoinitiation inhibitor, the photoinitiation inhibitor can inhibit the polymerization of monomers on a substrate irradiated by UV, a 'photoinitiation inhibition zone' can be formed on the substrate after the color photoresist is developed, a photoresist curing film with an inverted trapezoidal longitudinal section is formed, and a color photoresist film with a gentle slope angle is formed after post-baking.
Description
Technical Field
The disclosure relates to the field of liquid crystal display, in particular to a color photoresist composition, a color filter and a preparation method thereof.
Background
Color Filter layers (CF) are an important component of Liquid Crystal Displays (LCD), which are the source of Color generated by the LCD. The color filter layer is made of color photoresist (Colorresist) through a series of manufacturing processes, including: substrate processing, gluing, front baking, exposure, development and back baking. The commonly used color photoresist composition is mainly formed by dispersing Pigment (Pigment), resin (Binder), monomer (monomer), photoinitiator (photo initiator) and other auxiliary agents in Solvent (Solvent), and the performance of the color photoresist directly influences the display effect of the liquid crystal display. The preparation method of the color filter comprises the steps of coating a color photoresist composition on a glass substrate to form a coating film or a color photoresist film with a certain thickness, then using a mask (photomask) to expose a specific part area of the color photoresist film through ultraviolet irradiation, enabling the exposed area to be subjected to cross-linking polymerization reaction due to a photoinitiator to form a polymerization network structure, reserving the exposed area in subsequent alkali liquor development, and obtaining the color filter after the reserved pattern is developed, cleaned and baked at high temperature, wherein the non-exposed area is cleaned by the alkali liquor.
However, after a general color photoresist composition is subjected to film formation, exposure and development, due to uniformity and compactness of photo-initiated polymerization, a vertical slope shape is formed between a photo-cured film and a glass substrate, even if the cured film collapses due to baking at a high temperature, the slope of the color photoresist film and the glass substrate is still steep and approaches to 85-90 degrees, and a gentle slope angle cannot be formed, and the problem cannot be solved no matter the process conditions such as formula, exposure and development are changed, so that the subsequent ITO glass substrate color photoresist film is unevenly prepared and the subsequent other film preparation processes are affected.
Disclosure of Invention
The purpose of the present disclosure is to provide a color photoresist composition, which can solve the technical problem of an excessively large slope angle of a color photoresist film prepared by the existing composition, and a color filter with a smooth slope angle and a controllable angle can be prepared by the color photoresist composition.
In order to achieve the above object, the present disclosure provides a color photoresist composition, characterized in that the composition contains a pigment, a photosensitive monomer, an alkali-soluble resin, a photoinitiator, and a photoinitiation inhibitor, the photoinitiation inhibitor having a structure represented by formula (1);
x is an alkoxy group having 1 to 10 carbon atoms, an alkylsiloxy group having 1 to 10 carbon atoms and a silicon atom number of 1 to 5, or an acetoxy group, R 1 、R 2 And R 3 Each independently is one of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, a halogen atom, a methoxy group and an ethoxy group.
The present disclosure also provides a color filter including a substrate and a color photoresist composition coated on the substrate and cured; the color photoresist composition is the color photoresist composition.
The present disclosure also provides a method for manufacturing a color filter, including:
(1) subjecting a substrate to a pretreatment comprising: at least one of ultraviolet cleaning, pure water cleaning, and drying;
(2) uniformly mixing the color photoresist composition and coating the mixture on a substrate; sequentially pre-baking and exposing the color photoresist composition coated on the substrate to cure the photoresist composition to obtain exposed photoresist;
(3) washing the exposed photoresist by using a developing solution to obtain a photoresist cured film with an inverted trapezoid longitudinal section;
(4) and baking the photoresist curing film to obtain the color filter.
Through the technical scheme, the color photoresist composition disclosed by the disclosure contains the photoinitiation inhibitor, the photoinitiation inhibitor can inhibit the polymerization of monomers on a substrate irradiated by UV, a 'photoinitiation inhibition zone' is formed on the substrate after the color photoresist is developed, a photoresist curing film with an inverted trapezoid-shaped longitudinal section is formed after the color photoresist is developed, and the upper layer polymerized color photoresist film can 'collapse' onto glass after the inverted trapezoid-shaped photoresist curing film is subjected to postbaking, so that a gentle slope is formed. The width of the photoinitiation inhibition zone can be controlled by controlling the content of the photoinitiation inhibitor, so that the gradient of the colored glue can be controlled, and finally, a smooth and controllable gradient angle is formed.
Additional features and advantages of the disclosure will be set forth in the detailed description which follows.
Drawings
The accompanying drawings, which are included to provide a further understanding of the disclosure and are incorporated in and constitute a part of this specification, illustrate embodiments of the disclosure and together with the description serve to explain the disclosure without limiting the disclosure. In the drawings:
FIG. 1 is a schematic diagram of the photoresist exposure development principle for a conventional color photoresist composition without photoinitiation inhibitor.
FIG. 2 is a schematic illustration of the principle of exposure and development of a photoresist prepared from the color photoresist composition containing the photoinitiation inhibitor of the present disclosure.
FIG. 3 is an SEM photograph of a cross-section of a color filter prepared according to one embodiment of the prior art color photoresist composition after development (left) and after post-baking (right).
FIG. 4 is an SEM image of a cross-section of a color filter prepared according to one embodiment of the color photoresist composition provided by the present disclosure after development (left) and after post-baking (right).
FIG. 5 is an SEM photograph of a post-bake cross-section of a color filter prepared according to one embodiment of the color photoresist composition provided by the present disclosure.
FIG. 6 is an SEM photograph of a post-bake cross-section of a color filter prepared according to one embodiment of the color photoresist composition provided by the present disclosure.
FIG. 7 is an SEM photograph of a post-bake cross-section of a color filter prepared according to one embodiment of the color photoresist composition provided by the present disclosure.
FIG. 8 is an SEM photograph of a post-bake cross-section of a color filter prepared according to one embodiment of the color photoresist composition provided by the present disclosure.
Detailed Description
The following describes in detail specific embodiments of the present disclosure. It should be understood that the detailed description and specific examples, while indicating the present disclosure, are given by way of illustration and explanation only, not limitation.
In the present disclosure, unless otherwise stated, the terms "up" and "down" refer to the up and down of the color filter during normal exposure and development, and refer to the directions of the drawings of fig. 1 to 7.
The present disclosure provides a color photoresist composition containing a pigment, a photosensitive monomer, an alkali-soluble resin, a photoinitiator, and a photoinitiation inhibitor, the photoinitiation inhibitor having a structure represented by formula (1);
x is an alkoxy group having 1 to 10 carbon atoms, an alkylsiloxy group having 1 to 10 carbon atoms and a silicon atom number of 1 to 5, or an acetoxy group, R 1 、R 2 And R 3 Each independently is one of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, a halogen atom, a methoxy group and an ethoxy group.
The color photoresist composition disclosed by the disclosure contains a photoinitiation inhibitor, the photoinitiation inhibitor can inhibit the polymerization of monomers on a substrate after UV irradiation, a 'photoinitiation inhibition zone' can be formed on the substrate after the color photoresist is developed, a photoresist cured film with an inverted trapezoidal longitudinal section is formed after the color photoresist is developed, and the upper polymerized color photoresist film of the inverted trapezoidal photoresist cured film can 'collapse' onto glass after post-baking, so that a gentle slope is formed. The width of the photoinitiation inhibition zone can be controlled by controlling the content of the photoinitiation inhibitor, so that the gradient of the colored glue can be controlled, and finally, a smooth and controllable gradient angle is formed.
In accordance with the present disclosure, to further enhance the photoinitiation inhibitor inhibiting polymerization of monomers in the photoresist composition, preferably, X may be OCH 3 、OCH 2 CH 3 、OC 2 H 4 OCH 3 And OSi (CH) 3 ) 3 At least one of (1).
Further preferably, R 1 、R 2 And R 3 May each independently be a hydrogen atom or a methyl group.
Still more preferably, the photoinitiation inhibitor may be any one of the structures represented by formula (2) to formula (17):
according to the present disclosure, the amount of the photoinitiation inhibitor used in the photoresist composition may vary widely, and in order to further improve the gradient angle of the cured film while ensuring the properties of the cured film of the photoresist composition, preferably, the molar ratio between the photoinitiation inhibitor and the photoinitiator may be 1: (0.01-5).
In the color photoresist composition of the present disclosure, the content of each component may vary within a wide range, the content of the alkali-soluble resin may be 10 to 100 parts by weight, the content of the photosensitive monomer may be 1 to 80 parts by weight, and the content of the photoinitiator may be 0.1 to 10 parts by weight, with respect to 100 parts by weight of the pigment;
preferably, the alkali-soluble resin may be contained in an amount of 20 to 60 parts by weight, the photosensitive monomer may be contained in an amount of 5 to 50 parts by weight, and the photoinitiator may be contained in an amount of 1 to 10 parts by weight, relative to 100 parts by weight of the pigment. Within the preferable content range, the color photoresist composition has better developing performance, and the gradient angle of the obtained color photoresist cured film is more gentle.
Wherein, the alkali-soluble resin is a resin containing alkali-soluble groups, which is well known to those skilled in the art, and preferably can be acrylic resin and/or acrylate resin, the acid value of the alkali-soluble resin can be 50-200mg/KOH, the molecular weight can be 2000-20000, and the mass content of benzene rings in the alkali-soluble resin can be 7-18%;
the photosensitive monomer can be a monomer compound containing unsaturated double bonds, such as an acrylate compound containing unsaturated double bonds, and specifically can be at least one selected from dipentaerythritol hexaacrylate, trimethylolpropane triacrylate, pentaerythritol pentaacrylate, 3- (trimethoxy silane) propyl acrylate, glycidyl methacrylate and benzyl methacrylate;
the photoinitiator may be a cleavage radical photoinitiator and/or a cationic photoinitiator, preferably a cleavage radical photoinitiator, more preferably at least one of 2-phenylbenzyl-2-dimethylamino-1- (4-morpholinebenzylphenyl) -1-butanone, 1-hydroxy-cyclohexylbenzophenone, 2-methyl-2- (4-morpholinyl) -1- [4- (methylthio) phenyl ] -1-propanone, 2-hydroxy-2-methyl-1-p-hydroxyethyl ether phenyl propanone, acylphosphorus oxide, isopropylthioxanthone and oxime lipid photoinitiators.
The pigment can be one or more of red pigment, green pigment, blue pigment, yellow pigment and orange pigment. The specific type of pigment may be well known to those skilled in the art and will not be described further herein.
In order to facilitate coating and improve the quality of a resin cured film, the color photoresist composition may further contain a solvent and/or an auxiliary agent, the solvent may be at least one of 3-methoxybutyl acetate, dipropylene glycol methyl ether, diethylene glycol butyl ether acetate, ethylene glycol methyl ether, ethylene glycol ethyl ether, propylene glycol methyl ether, 3-ethyl propionate, propylene glycol methyl ether acetate, diethylene glycol diethyl ether ethyl acetate and cyclohexane, and the auxiliary agent may be at least one of a sensitizer, an antifoaming agent, a leveling agent, a coupling agent and a surfactant. The specific types and amounts of the above-mentioned adjuvants may be those known to those skilled in the art, and are not specifically required in the present disclosure.
The color photoresist composition can be used for preparing a photoresist film part in a color filter (color filter).
The present disclosure also provides a color filter including a substrate and a color photoresist composition coated on the substrate and cured; the color photoresist composition is the color photoresist composition.
The color filter disclosed by the invention comprises a cured film formed by curing the photoresist composition, and after development and postbaking, the gradient angle of the color film is smooth and uniform, thereby being beneficial to the subsequent preparation process of other films.
According to the disclosure, as shown in fig. 1, in the common color lithography, due to the compactness and uniformity of the formed photoresist film, the light-cured film and the glass substrate surface form a vertical slope shape, and even after the cured film collapses due to high-temperature post-baking, the slope of the color photoresist film and the glass substrate is still steep and is close to 85 degrees to 90 degrees, and a relatively gentle slope angle cannot be formed. The process of inhibiting the polymerization of the monomers by the photoinitiation inhibitor in the color photoresist composition of the present disclosure may include: the photoinitiation inhibitor reacts with active hydroxyl radicals HO & on the surface of the substrate to obtain an inhibitor intermediate, the inhibitor intermediate can react with free radicals Mx & generated in the photoinitiation process to inhibit the activity of the free radicals, so that the cross-linking reaction of the partial area is terminated to form a 'photoinitiation inhibition area', a photoresist cured film with an inverted trapezoid longitudinal section shown in figure 2 can be obtained after development, and after post-baking, the upper layer of the photoresist cured film is 'collapsed' to the lower layer, so that a certain gentle slope angle is formed.
The above process can be represented by the following formula (18) to formula (20):
the present disclosure also provides a method for manufacturing a color filter, including:
(1) subjecting a substrate to a pretreatment comprising: at least one of ultraviolet cleaning, pure water cleaning, and drying;
(2) uniformly mixing the color photoresist composition and coating the mixture on a substrate; sequentially pre-baking and exposing the color photoresist composition coated on the substrate to cure the photoresist composition to obtain exposed photoresist;
(3) washing the exposed photoresist by using a developing solution to obtain a photoresist cured film with an inverted trapezoidal longitudinal section;
(4) and baking the photoresist curing film to obtain the color filter.
In order to further increase the activation degree of the substrate surface and increase the number of the substrate surface active groups, preferably, the steps of pre-treating the substrate sequentially include ultraviolet cleaning, pure water cleaning and drying, the number of hydroxyl radicals on the substrate surface after the pre-treatment is increased, which is beneficial for reacting with the photoinitiation inhibitor to form an inhibitor intermediate, the inhibitor intermediate can react with the free radicals generated by photoinitiation to inhibit the photoinitiation activity, so that the cross-linking reaction in the part of the area is terminated to form a 'photoinitiation inhibition zone', thereby improving the gradient angle of the photoresist cured film.
The present disclosure is further illustrated by the following examples, but is not to be construed as being limited thereby.
Example 1
This example illustrates a color photoresist composition of the present disclosure.
100 parts by weight of a pigment (45% by mass of a green paste, LG, Korea), 4.4 parts by weight of a photoinitiator OXE-01 (Basf), 26.7 parts by weight of an alkali-soluble resin Sarbox SB400 (available from Saedoma), 23.4 parts by weight of a photosensitive monomer (8.9 parts by weight of pentaerythritol hexaacrylate (available from Saedoma), 7.8 parts by weight of pentaerythritol pentaacrylate (available from Saedoma), 6.7 parts by weight of trimethylolpropane triacrylate (available from Saedoma)), 0.22 part by weight of the photoinitiation inhibitor represented by the formula (2) (the molar ratio between the photoinitiator and the photoinitiation inhibitor was 1: 0.21), 33.3 parts by weight of propylene glycol methyl ether acetate (Dow Co., Ltd.), 33.3 parts by weight of 3-methoxybutyl acetate (Dow Co., Ltd.) as a solvent and 1.3 parts by weight of the auxiliary A151 (Dow Corning Co., Ltd.) were mixed uniformly to obtain a color resist composition R1 of the present example.
Examples 2 to 5
The raw materials of example 1 were used except that the photoinitiation inhibitor represented by the formula (2) was used in amounts of 0.44 parts by weight, 0.67 parts by weight, 0.89 parts by weight and 1.11 parts by weight, respectively, (molar ratios between the photoinitiator and the photoinitiation inhibitor were 1: 0.42, 1: 0.63, 1: 0.83 and 1: 1.04, respectively), to obtain color photoresist compositions R2 to R5.
Example 6
100 parts by weight of a pigment (45% by mass of a green paste, LG, Korea), 0.1 part by weight of a photoinitiator OXE-01 (Basf), 10 parts by weight of an alkali-soluble resin Sarbox SB400 (available from Sartomer), 1 part by weight of a photosensitive monomer (0.4 part by weight of pentaerythritol hexaacrylate (available from Sartomer), 0.3 part by weight of pentaerythritol pentaacrylate (available from Sartomer), 0.3 part by weight of trimethylolpropane triacrylate (available from Sartomer)), 0.22 part by weight of the photoinitiation inhibitor represented by the formula (2) (the molar ratio between the photoinitiator and the photoinitiation inhibitor was 1: 0.21), 33.3 parts by weight of propylene glycol methyl ether acetate (Dow Co., Ltd.), 33.3 parts by weight of 3-methoxybutyl acetate (Dow Co., Ltd.) as a solvent and 1.3 parts by weight of the auxiliary A151 (Dow Corning Co., Ltd.) were mixed uniformly to obtain a color resist composition R6 of the present example.
Example 7
100 parts by weight of a pigment (45% by mass of a green paste, LG, Inc. in Korea), 10 parts by weight of a photoinitiator OXE-01(Basf Corp.), 26.7 parts by weight of an alkali-soluble resin Sarbox SB400 (available from Sartomer Corp.), 80 parts by weight of a photosensitive monomer (30 parts by weight of pentaerythritol hexaacrylate (available from Sartomer Corp.), 25 parts by weight of pentaerythritol pentaacrylate (available from Sartomer Corp.), 25 parts by weight of trimethylolpropane triacrylate (available from Sartomer Corp.), 0.22 part by weight of the photoinitiation inhibitor represented by the formula (2) (the molar ratio between the photoinitiator and the photoinitiation inhibitor was 1: 0.21), 33.3 parts by weight of propylene glycol methyl ether acetate (Dow Co., Ltd.), 33.3 parts by weight of 3-methoxybutyl acetate (Dow Co., Ltd.) as a solvent and 1.3 parts by weight of the auxiliary A151 (Dow Corning Co., Ltd.) were mixed uniformly to obtain a color resist composition R7 of the present example.
Example 8
100 parts by weight of a pigment (45% by mass of green paste, LG Co., Korea), 8 parts by weight of a photoinitiator OXE-01(Basf Co.), 52 parts by weight of an alkali-soluble resin Sarbox SB400 (available from Saedoma), 45 parts by weight of a photosensitive monomer (15 parts by weight of pentaerythritol hexaacrylate (available from Saedoma), 15 parts by weight of pentaerythritol pentaacrylate (available from Saedoma), 15 parts by weight of trimethylolpropane triacrylate (available from Saedoma)), 0.22 part by weight of the photoinitiation inhibitor represented by the formula (2) (the molar ratio between the photoinitiator and the photoinitiation inhibitor was 1: 0.21), 33.3 parts by weight of propylene glycol methyl ether acetate (Dow Co., Ltd.), 33.3 parts by weight of 3-methoxybutyl acetate (Dow Co., Ltd.) as a solvent and 1.3 parts by weight of the auxiliary A151 (Dow Corning Co., Ltd.) were mixed uniformly to obtain a color resist composition R8 of the present example.
Examples 9 to 23
Color resist compositions R9 to R23 were obtained using the starting materials of example 1 except that the photoinitiation inhibitor represented by the formula (2) was replaced with equal amounts by weight of the photoinitiation inhibitors represented by the formulae (3) to (17), respectively.
Example 24
A color resist composition R24 was obtained by using the raw materials of example 1 except that the photoinitiation inhibitor represented by the formula (2) was used in an amount of 0.01 part by weight (molar ratio between the photoinitiator and the photoinitiation inhibitor was 1: 0.01).
Example 25
A color resist composition R25 was obtained using the raw materials of example 1 except that the photoinitiation inhibitor represented by the formula (2) was used in an amount of 5.33 parts by weight (molar ratio between the photoinitiator and the photoinitiation inhibitor was 1: 5).
Comparative example 1
The materials of example 1 were used except that the color photoresist composition R26 of this example did not contain a photoinitiation inhibitor.
Test examples
Mixing the above color photoresist composition R1-R25, and baking at 115 deg.C for 2minAnd exposure (exposure amount 50 mj/cm) 2 Gap (Gap) of 180 μm), developing, baking at 230 deg.C for 20min to obtain color filters S1-S26, and scanning electron microscope (instrument model: s-4700, hitachi, japan) were subjected to a scan test of the cross section of the color filter S1-S26, and the slope angle of the cross section of the color filter layer was measured, and the results are shown in table 1, and SEM photographs of the interface after post-baking of the color filters S1-S5 are shown in fig. 4-8, respectively:
TABLE 1
As can be seen from Table 1, comparing examples 1-25 with comparative example 1, the use of the photoinitiation inhibitor represented by formula (1) in the photoresist composition can make the pattern slope of the color filter prepared flat and the slope angle significantly reduced, compared to the color photoresist composition without the photoinitiation inhibitor;
comparing the data of examples 1 and 8 with those of examples 6 to 7, it can be seen that when the alkali-soluble resin content is 20 to 60 parts by weight, the photosensitive monomer content is 5 to 50 parts by weight, and the photoinitiator content is 1 to 10 parts by weight, based on 100 parts by weight of the pigment, which is preferred in the present disclosure, the slope angle of the color resist film formed after curing of the color resist composition is more gentle; comparison of the data of examples 1-5 shows that the slope angle of the cured color film can be adjusted by changing the amount of the photoinitiation inhibitor in the color photoresist composition, thereby improving the quality of the color film.
The preferred embodiments of the present disclosure have been described above in detail, however, the present disclosure is not limited to the specific details of the above embodiments, and various simple modifications may be made to the technical solution of the present disclosure within the technical idea of the present disclosure, and these simple modifications all belong to the protection scope of the present disclosure.
It should be noted that the various features described in the foregoing embodiments may be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, various possible combinations will not be separately described in this disclosure.
In addition, any combination of various embodiments of the present disclosure may be made, and the same should be considered as the disclosure of the present disclosure, as long as it does not depart from the spirit of the present disclosure.
Claims (10)
1. A color photoresist composition is characterized in that the composition contains pigment, photosensitive monomer, alkali soluble resin, photoinitiator and photoinitiation inhibitor, wherein the photoinitiation inhibitor has a structure shown in a formula (1);
x is an alkoxy group having 1 to 10 carbon atoms, an alkylsiloxy group having 1 to 10 carbon atoms and a silicon atom number of 1 to 5, or an acetoxy group, R 1 、R 2 And R 3 Each independently is one of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms and a halogen atom;
the molar ratio between the photoinitiator and the photoinitiation inhibitor is 1: (0.01-5);
the content of the alkali-soluble resin is 10-100 parts by weight, the content of the photosensitive monomer is 1-80 parts by weight, and the content of the photoinitiator is 0.1-10 parts by weight, relative to 100 parts by weight of the pigment.
2. The color photoresist composition of claim 1, wherein R is 1 、R 2 And R 3 Each independently is one of methoxy and ethoxy.
3. The color photoresist composition of claim 1, wherein X is OCH 3 、OCH 2 CH 3 、OC 2 H 4 OCH 3 And OSi (CH) 3 ) 3 At least one of (1).
4. The color photoresist composition of claim 1, wherein R is 1 、R 2 And R 3 Each independently is a hydrogen atom or a methyl group.
5. The color photoresist composition of claim 3, wherein the photoinitiation inhibitor is any one of the structures represented by formula (2) to formula (17):
6. The color photoresist composition according to claim 1 or 5, wherein the alkali-soluble resin is contained in an amount of 20 to 60 parts by weight, the photosensitive monomer is contained in an amount of 5 to 50 parts by weight, and the photoinitiator is contained in an amount of 1 to 10 parts by weight, relative to 100 parts by weight of the pigment.
7. The color photoresist composition according to any one of claims 1 to 5, wherein the alkali-soluble resin is an acrylic resin and/or an acrylate resin; the photosensitive monomer is at least one selected from dipentaerythritol hexaacrylate, trimethylolpropane triacrylate, pentaerythritol pentaacrylate, 3- (trimethoxy silane) propyl acrylate, glycidyl methacrylate and benzyl methacrylate; the photoinitiator is at least one of 2-phenylbenzyl-2-dimethylamino-1- (4-morpholine benzyl phenyl) -1-butanone, 1-hydroxy-cyclohexanone, 2-methyl-2- (4-morpholinyl) -1- [4- (methylthio) phenyl ] -1-acetone, 2-hydroxy-2-methyl-1-p-hydroxyethyl ether phenyl acetone, acyl phosphorus oxide, isopropyl thioxanthone and oxime lipid photoinitiator.
8. The color photoresist composition according to any one of claims 1 to 5, further comprising a solvent and/or an auxiliary, wherein the solvent is at least one of 3-methoxybutyl acetate, dipropylene glycol methyl ether, diethylene glycol butyl ether acetate, ethylene glycol methyl ether, ethylene glycol ethyl ether, propylene glycol methyl ether, 3-ethyl propionate, propylene glycol methyl ether acetate, diethylene glycol diethyl ether ethyl acetate, and cyclohexane, and the auxiliary is at least one of a sensitizer, an antifoaming agent, a leveling agent, a coupling agent, and a surfactant.
9. A color filter is characterized by comprising a substrate and a color photoresist composition coated on the substrate and cured; the color photoresist composition is the color photoresist composition according to any one of claims 1 to 8.
10. A method for manufacturing a color filter, the method comprising:
(1) subjecting a substrate to a pretreatment comprising: ultraviolet cleaning, pure water cleaning and drying;
(2) uniformly mixing and coating the color photoresist composition of any one of claims 1 to 8 on a substrate; sequentially pre-baking and exposing the color photoresist composition coated on the substrate to cure the photoresist composition to obtain exposed photoresist;
(3) washing the exposed photoresist by using a developing solution to obtain a photoresist cured film with an inverted trapezoid longitudinal section;
(4) and baking the photoresist curing film to obtain the color filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710040963.8A CN108319110B (en) | 2017-01-17 | 2017-01-17 | Color photoresist composition, color filter and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710040963.8A CN108319110B (en) | 2017-01-17 | 2017-01-17 | Color photoresist composition, color filter and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108319110A CN108319110A (en) | 2018-07-24 |
| CN108319110B true CN108319110B (en) | 2022-08-02 |
Family
ID=62892415
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710040963.8A Active CN108319110B (en) | 2017-01-17 | 2017-01-17 | Color photoresist composition, color filter and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108319110B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111338182B (en) * | 2018-12-19 | 2024-07-02 | 固安鼎材科技有限公司 | Photosensitive composition and application thereof |
| CN112764315A (en) * | 2019-10-21 | 2021-05-07 | 固安鼎材科技有限公司 | Photosensitive composition suitable for no-prebaking process and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012064001A1 (en) * | 2010-11-12 | 2012-05-18 | 오씨아이 주식회사 | Composition for etching metal films |
| CN102778813A (en) * | 2012-07-31 | 2012-11-14 | 京东方科技集团股份有限公司 | Photosensitive resin composition |
| CN104650281A (en) * | 2014-12-26 | 2015-05-27 | 北京鼎材科技有限公司 | Alkali-soluble resin polymer for color light filter and light-sensitive resin composition |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2810783B1 (en) * | 2013-06-03 | 2015-10-21 | Hewlett-Packard Industrial Printing Ltd. | Inkjet printing method |
-
2017
- 2017-01-17 CN CN201710040963.8A patent/CN108319110B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012064001A1 (en) * | 2010-11-12 | 2012-05-18 | 오씨아이 주식회사 | Composition for etching metal films |
| CN102778813A (en) * | 2012-07-31 | 2012-11-14 | 京东方科技集团股份有限公司 | Photosensitive resin composition |
| CN104650281A (en) * | 2014-12-26 | 2015-05-27 | 北京鼎材科技有限公司 | Alkali-soluble resin polymer for color light filter and light-sensitive resin composition |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108319110A (en) | 2018-07-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN111796484B (en) | Colored photosensitive resin composition, color filter and image display device provided with same | |
| JP5281357B2 (en) | Photosensitive resin composition for black resist and color filter light-shielding film | |
| KR101583538B1 (en) | A photosensitive resin composition for a black resist containing a polyfunctional thiol compound, a black matrix for a color filter using the same, | |
| CN103502888A (en) | Negative photosensitive resin composition, cured film, partition wall, black matrix, method for producing partition wall, method for producing black matrix, color filter, and organic EL element | |
| CN101617272A (en) | Be used for the photosensitive resin composition of black matrix, by the black matrix of said composition preparation with comprise the LCD of this black matrix | |
| JP2005222028A (en) | Photosensitive resin composition for black matrix | |
| CN107111232A (en) | Black matrix" photo-corrosion-resisting agent composition for liquid crystal display panel | |
| JP7256247B2 (en) | Resin, curable resin composition and cured film | |
| TW201638672A (en) | Negative-type photosensitive resin composition, photo-curable pattern and image display device using the same | |
| CN105607422A (en) | Alkali-soluble resin, photosensitive resin composition containing same and application | |
| CN108319110B (en) | Color photoresist composition, color filter and preparation method thereof | |
| TWI665518B (en) | Negative-type photosensitive resin composition, photo-curable pattern and image display device using the same | |
| JP5416434B2 (en) | Photosensitive resin composition for black resist and color filter light-shielding film | |
| TWI697736B (en) | Black photosensitive resin composition and column spacer comprising the same | |
| KR102180283B1 (en) | Black photosensitive resin composition, cured film thereof, and colour filter or touch panel made by using that film | |
| CN1611495B (en) | Compound containing epoxy group and chalcone group, preparation method thereof, and photoresist containing the compound | |
| KR20170112923A (en) | Negative-type Photosensitive Resin Composition | |
| KR101840984B1 (en) | A photo sensitive resin composition, a color filter comprising a black metrics, a column spacer or black column spacer prepared by using the composition, and a display device comprising the color filter | |
| JPH1124245A (en) | Photosensitive liquid for forming a colored image and a method for producing a color filter using the same | |
| CN115368583A (en) | Multi-branched polymer, alkali-soluble resin, and photocurable composition | |
| KR102414298B1 (en) | Novel compounds and photosensitive resin composition | |
| KR20210056011A (en) | Compound, colorant dispersed solution, negative-type photosensitive resin composition and display apparatus comprising black bank formed by using same | |
| CN106249546B (en) | Negative photosensitive resin composition | |
| KR20200090587A (en) | A black photo sensitive resin composition, a color filter comprising a black metrics and/or a column spacer prepared by using the composition, and a display comprising the color filter | |
| JP7382768B2 (en) | Photosensitive resin composition for black resist, its cured coating film, and method for producing color filter light-shielding film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |