CN108303023A - A kind of method of ultraprecise two-dimension moving platform system place precision compensation - Google Patents
A kind of method of ultraprecise two-dimension moving platform system place precision compensation Download PDFInfo
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- CN108303023A CN108303023A CN201810062298.7A CN201810062298A CN108303023A CN 108303023 A CN108303023 A CN 108303023A CN 201810062298 A CN201810062298 A CN 201810062298A CN 108303023 A CN108303023 A CN 108303023A
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- 238000000034 method Methods 0.000 title claims abstract description 38
- 230000008569 process Effects 0.000 claims description 7
- 238000004088 simulation Methods 0.000 claims description 6
- 238000004364 calculation method Methods 0.000 claims description 5
- 238000005259 measurement Methods 0.000 claims description 5
- 238000013519 translation Methods 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 230000008859 change Effects 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 238000007747 plating Methods 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000012546 transfer Methods 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 230000009897 systematic effect Effects 0.000 abstract description 7
- 238000012545 processing Methods 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 238000007514 turning Methods 0.000 description 2
- 230000001447 compensatory effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000035772 mutation Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The present invention provides a kind of method of ultraprecise two-dimension moving platform system place precision compensation, pass through the processing of approximating method, isolate the placement error of scaling board and the systematic error of platform, and then realize the positional precision compensation of platform, overcome the shortcomings of existing ultraprecise two-dimension moving platform system place precision compensation method so that require the placement location of environment temperature and scaling board not being special harsh.
Description
Technical field
The present invention relates to Ultra-precision Turnings and field of measuring technique, and in particular to one kind being used for ultraprecise two-dimension moving platform
The method of system place precision compensation, is applied to the ultraprecise motion platform system of direct-write photoetching.
Background technology
With the fast development of Ultra-precision Turning and measuring technique, ultraprecise motion platform also obtains in direct-write photoetching field
It is more and more widely used, and then the requirement to the positional precision of motion platform is also higher and higher.It is such as flat for two dimensional motion
For platform, main error comes from the systematic error of motion platform, such as the installation of the kinematic accuracy of servo motor, guide rail
Precision and the precision etc. for feeding back measuring cell can all cause the generation of systematic error.And be corrected to the systematic error can be with
The effective precision for improving motion platform.Although currently, can be demarcated using high-precision laser interferometer flat with compensation campaign
The positional precision of platform, but being affected for external environment is suffered from, and operating process is also cumbersome.
Regarding to the issue above with existing shortcoming, CCD camera vision system also slowly be applied to motion platform
In positional precision compensation.In general method, and the coordinate by measuring etching pattern mark above scaling board, typically
Obtained actual coordinate value will directly be measured and subtract ideal coordinate value.But in order to obtain the coordinate bit of accurate pattern mark
It sets, the status requirement placed to scaling board is very harsh, and the precision of commonsense method is inadequate.In consideration of it, it is necessary to provide one
New motion platform compensation method is planted to solve the above shortcoming.
Invention content
The present invention provides a kind of method of ultraprecise two-dimension moving platform system place precision compensation, and the method overcome
There are the shortcoming of ultraprecise two-dimension moving platform system place precision compensation method, this method to have at easy to operate, data
The advantages that speed is fast and detection device is at low cost is managed, can be good at meeting ultraprecise two-dimension moving platform system place precision
Requirement.
In order to solve the above technical problems, the present invention adopts the following technical scheme that：
A kind of method of ultraprecise two-dimension moving platform system place precision compensation, includes the following steps：
1) the smaller calibration mask plate of selection mismachining tolerance, is placed in the regional extent to be calibrated of motion platform, the mark
Determine mask plate has identical symmetrical pattern in the both horizontally and vertically equidistantly distributed on its surface；
2) the actual coordinate data of the center of symmetrical pattern on the moving platform are obtained using CCD camera vision system；
3) corresponding ideal coordinates data and actual coordinate data are subjected to data the Fitting Calculation and obtain digital simulation coordinate
Data；
4) the ideal coordinates data and digital simulation coordinate data are asked poor, obtains each symmetrical pattern center position
Offset data；
5) obtained offset data is loaded into motion platform in the form of compensating table.
Further, in step 3, the data the Fitting Calculation method is as follows：
According to variation in rigidity rule, compare the ideal coordinates data and actual coordinate data of motion platform, by rotation and
The Fitting Coordinate System data at corresponding symmetrical pattern center are calculated in the coordinate transform of translation, in transfer process, setting starting
The site error of point, the starting point is zero, and remaining measurement data points are all changed with the starting point accordingly.
The coordinate transform is reflected by following coordinate relationship：
Wherein, Δ x0、Δy0It is measurement data points respectively relative to ideal strong point translational movement in the x and y direction in x
With the translational movement on the directions y, θ is rotation angle, x0、y0It is the motion platform got by CCD camera vision system respectively
Actual coordinate data.
By above technical scheme it is found that the present invention has the advantages that：
1, by the processing of approximating method, the placement error of scaling board and the systematic error of platform are isolated, and then realize
The positional precision of platform compensates for deficiency that, and overcomes existing ultraprecise two-dimension moving platform system place precision compensation method so that
The placement location of environment temperature and scaling board is required not to be special harsh；
2, since this method is mainly made of calibration mask plate and CCD camera vision system, purchase is considerably reduced
The cost of expensive special measurement equipment；
3, this method, can be on the basis of original compensation table when facing external environment mutation so that compensation rate changes
The upper superposition for carrying out offset data, so that it may improve the positional precision of motion platform；
4, the calibration compensation work of nanoscale and higher precision may be implemented in this method.
Description of the drawings
Fig. 1 is flow chart of the method for the present invention；
Fig. 2 is the systematic error schematic diagram of two-dimensional stage system of the present invention；
Fig. 3 is the positional precision error fit schematic diagram of two-dimensional stage system of the present invention.
Specific implementation mode
A kind of preferred embodiment of the present invention is described in detail below in conjunction with the accompanying drawings.
As shown in Figure 1, ultraprecise two-dimension moving platform system place precision compensation method, including being as follows：
The smaller optical calibrating mask plate of one piece of S1, selection mismachining tolerance, mainly by etching technics in chromium plating
It is etched above quartz glass plate in both horizontally and vertically equidistant equally distributed cross pattern or other symmetrical patterns, so
It is placed on afterwards in the regional extent to be calibrated of motion platform.In this embodiment, spacing of the pattern in horizontal and vertical direction is 5
Millimeter, the length and width of scaling board are 140 millimeters, but are not limited to the size, can accomplish finer and broader range.
S2, the actual coordinate data of cross pattern center on the moving platform are obtained using CCD camera vision system.It should
CCD camera vision system has active focus function, can obtain cross pattern centre coordinate automatically in platform motion process
Data.In order to ensure that each pattern is in viewing field of camera in platform motion process, therefore starting to place scaling board on platform
When, suitably to adjust the angle of scaling board.
S3, the central point that all cross patterns in platform calibration range are collected by CCD camera vision system are sat
Data are marked, corresponding ideal coordinates data and actual coordinate data, which are then carried out data the Fitting Calculation, obtains digital simulation coordinate
Data.It is fitted what basic principle was mainly variation in rigidity principle by figure to reach, that is, compare ideal coordinates data with
The Fitting Coordinate System data at corresponding cross pattern center are calculated by the coordinate transform of rotation and translation for actual coordinate data,
Wherein rigid transformation can be reflected by following coordinate relationship：
Wherein, Δ x0, Δ y0It is the translational movement in the directions x and y, rotation angle θ, x respectively0, y0It is by CCD phases respectively
The platform actual coordinate data that machine vision system is got.
By the processing of the approximating method, the placement error of scaling board and the systematic error of platform can be isolated, into
And realize the positional precision compensation of platform, plateform system error as shown in Figure 2 can be corrected.
S4, ideal coordinates data and digital simulation coordinate data are asked poor, you can obtain each symmetrical pattern center
The offset data at place.As shown in Fig. 3 the two-dimensional stage system place precision error fit schematic diagram, it can be seen that
The variation tendency of total compensatory zone, shown in the longer error for having reacted the compensation point range of arrow it is bigger.
S5, obtained offset data is loaded into the form of compensating table inside platform.Data in specific compensation table
Distribution mode will be handled according to the platform controller of actual use and corresponding coordinate system.And when external environment changes
When offset data amount being caused to change, it can be improved online by the superposition of data in compensation table, it can be great with this
Improve compensation efficiency.In this embodiment, the positional precision eventually for direct-write photoetching platform kinematic system can reach orthogonal
Within 1 rad of property, within 150 nanometers of harmomegathus error.In addition, the increase of sampled data points can further increase positional precision.
Embodiment described above is only that the preferred embodiment of the present invention is described, not to the model of the present invention
It encloses and is defined, under the premise of not departing from design spirit of the present invention, technical side of the those of ordinary skill in the art to the present invention
The various modifications and improvement that case is made should all be fallen into the protection domain of claims of the present invention determination.
Claims (8)
1. a kind of method of ultraprecise two-dimension moving platform system place precision compensation, which is characterized in that include the following steps：
1) the smaller calibration mask plate of selection mismachining tolerance, is placed in the regional extent to be calibrated of motion platform, which covers
Both horizontally and vertically equidistantly distributed of the diaphragm plate on its surface has identical symmetrical pattern；
2) the actual coordinate data of the center of symmetrical pattern on the moving platform are obtained using CCD camera vision system；
3) corresponding ideal coordinates data and actual coordinate data are subjected to data the Fitting Calculation and obtain digital simulation coordinate data；
4) the ideal coordinates data and digital simulation coordinate data are asked poor, obtains the benefit of each symmetrical pattern center position
Repay data；
5) obtained offset data is loaded into motion platform in the form of compensating table.
2. according to the method described in claim 1, it is characterized in that, in step 1, the calibration mask plate uses the quartz of chromium plating
Glass plate is both horizontally and vertically equidistantly etched with identical cross pattern on its surface.
3. according to the method described in claim 1, it is characterized in that, in step 2, the CCD camera vision system has actively
Focus function, can obtain the coordinate data at symmetrical pattern center automatically in platform motion process, every in platform motion process
A pattern is all in viewing field of camera.
4. according to the method described in claim 1, it is characterized in that, in step 3, the data the Fitting Calculation method is as follows：
According to variation in rigidity rule, the ideal coordinates data and actual coordinate data of motion platform are compared, rotation and translation is passed through
Coordinate transform the Fitting Coordinate System data at corresponding symmetrical pattern center are calculated, in transfer process, set starting point, should
The site error of starting point is zero, and remaining measurement data points are all changed with the starting point accordingly.
5. according to the method described in claim 4, it is characterized in that, the coordinate transform is reflected by following coordinate relationship：
Wherein, Δ x0、Δy0It is the translational movement of measurement data points in the x and y direction relative to ideal strong point respectively, θ is rotation
Angle, x0、y0It is the actual coordinate data of the motion platform got by CCD camera vision system respectively.
6. according to the method described in claim 1, it is characterized in that, in step 4, the offset data has directivity requirement.
7. according to the method described in claim 1, it is characterized in that, in step 5, the data distribution mode in the compensation table is wanted
It is handled according to the platform controller of actual use and corresponding coordinate system.
8. according to claim 1-7 any one of them methods, which is characterized in that when external environment change leads to offset data amount
When changing, improve positional precision by the data being superimposed online in compensation table.
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109656105A (en) * | 2019-01-07 | 2019-04-19 | 安徽工程大学 | A kind of method of big Range Ultraprecise two-dimension moving platform position precision compensation |
| CN110083020A (en) * | 2019-03-01 | 2019-08-02 | 安徽工程大学 | A kind of method of different machine alignment precision optimization |
| CN110722018A (en) * | 2019-10-21 | 2020-01-24 | 广东正业科技股份有限公司 | A precision correction method and device thereof |
| CN110815203A (en) * | 2018-08-14 | 2020-02-21 | 广东若铂智能机器人有限公司 | Method for correcting end effector of robot arm |
| CN110823155A (en) * | 2018-08-10 | 2020-02-21 | 维嘉数控科技（苏州）有限公司 | Error correction method and device for mechanical platform |
| CN111983900A (en) * | 2020-08-28 | 2020-11-24 | 合肥众群光电科技有限公司 | LDI platform error compensation method |
| CN112486093A (en) * | 2020-10-29 | 2021-03-12 | 钧迪智能装备科技(苏州)有限公司 | Method, apparatus, device and medium for compensating for platform accuracy |
| CN113551600A (en) * | 2021-07-29 | 2021-10-26 | 河北工业大学 | Detection system for path precision of two-dimensional motion platform |
| CN115979120A (en) * | 2022-09-28 | 2023-04-18 | 南京颖图电子技术有限公司 | Precision verification method for liquid crystal polarizer laminating system |
| CN116592757A (en) * | 2022-06-22 | 2023-08-15 | 源卓微纳科技(苏州)股份有限公司 | A Two-Dimensional Accuracy Compensation Method for Measuring System |
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110823155A (en) * | 2018-08-10 | 2020-02-21 | 维嘉数控科技（苏州）有限公司 | Error correction method and device for mechanical platform |
| CN110815203A (en) * | 2018-08-14 | 2020-02-21 | 广东若铂智能机器人有限公司 | Method for correcting end effector of robot arm |
| CN109656105A (en) * | 2019-01-07 | 2019-04-19 | 安徽工程大学 | A kind of method of big Range Ultraprecise two-dimension moving platform position precision compensation |
| CN110083020B (en) * | 2019-03-01 | 2021-02-23 | 安徽工程大学 | A method for optimizing the precision of different machine overlay engraving |
| CN110083020A (en) * | 2019-03-01 | 2019-08-02 | 安徽工程大学 | A kind of method of different machine alignment precision optimization |
| CN110722018A (en) * | 2019-10-21 | 2020-01-24 | 广东正业科技股份有限公司 | A precision correction method and device thereof |
| CN111983900A (en) * | 2020-08-28 | 2020-11-24 | 合肥众群光电科技有限公司 | LDI platform error compensation method |
| CN111983900B (en) * | 2020-08-28 | 2022-09-06 | 合肥众群光电科技有限公司 | LDI platform error compensation method |
| CN112486093A (en) * | 2020-10-29 | 2021-03-12 | 钧迪智能装备科技(苏州)有限公司 | Method, apparatus, device and medium for compensating for platform accuracy |
| CN113551600A (en) * | 2021-07-29 | 2021-10-26 | 河北工业大学 | Detection system for path precision of two-dimensional motion platform |
| CN116592757A (en) * | 2022-06-22 | 2023-08-15 | 源卓微纳科技(苏州)股份有限公司 | A Two-Dimensional Accuracy Compensation Method for Measuring System |
| CN115979120A (en) * | 2022-09-28 | 2023-04-18 | 南京颖图电子技术有限公司 | Precision verification method for liquid crystal polarizer laminating system |
| CN115979120B (en) * | 2022-09-28 | 2023-12-15 | 南京颖图电子技术有限公司 | Method for verifying precision of liquid crystal polarizer laminating system |
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