CN108265271A - A kind of method that physical vaporous deposition makes blue film on product - Google Patents
A kind of method that physical vaporous deposition makes blue film on product Download PDFInfo
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- CN108265271A CN108265271A CN201810046674.3A CN201810046674A CN108265271A CN 108265271 A CN108265271 A CN 108265271A CN 201810046674 A CN201810046674 A CN 201810046674A CN 108265271 A CN108265271 A CN 108265271A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0664—Carbonitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
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- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
A kind of method for making blue film on product the invention discloses physical vaporous deposition, including cleaning deoiling step, bottom preparation process, buffer layer preparation process, wearing layer preparation process, color layers preparation process, cooling step of coming out of the stove；Wherein, cleaning deoiling step includes trichloro ethylene solution soaking and washing processing step, Wax removal water ultrasonic cleaning step, acetone soln ultrasonic cleaning step, baking oven baking procedure；It is designed by above-mentioned processing step, the physical vaporous deposition of the present invention is made on product the blue film formed prepared by the method for blue film have the advantages that corrosion resistance by force, good in oxidation resistance, and product routine use can be met very well can simultaneously extend product service life.
Description
Technical field
The present invention relates to PVD blue Manufacturing Techniques fields more particularly to a kind of physical vaporous deposition on product
The method for making blue film.
Background technology
Currently, various electronic products high speed development, dog-eat-dog, requirement of the consumer to product are not only quality mistake
Firmly, durable, to appearance requirement, high-end fashion, lucuriant in design, attractive property requirements are particularly strong for they, and PVD
Ji Intraoperative, which make blue decorating film, can assign product surface metal-like and beautiful color, when meeting appearance of the consumer to product
Still with the requirement of trend.
It should further be noted that traditional PVD blues manufacture craft has, hardness is low, corrosion resistance is poor, not wear-resisting, technique is steady
The defects of qualitative difference.So, it is necessary to existing PVD blues manufacture craft is improved.
Invention content
The purpose of the present invention is to solve the shortcomings of the prior art and a kind of physical vaporous deposition is provided and is made on product
Make the method for blue film, which makes the blue film formed prepared by the method for blue film on product has
The advantages of corrosion resistance is strong, good in oxidation resistance, and product routine use can be met very well can simultaneously extend product service life.
In order to achieve the above objectives, the present invention is achieved through the following technical solutions.
A kind of method that physical vaporous deposition makes blue film on product, includes following processing step, specifically：
A, oil removing is cleaned：
A1, the product processed will be needed first to be placed in progress soaking and washing processing in trichloro ethylene solution, soaking and washing processing when
Between be 5 minutes；
A2, again will through trichloro ethylene solution soaking and washing, treated that product is placed in Wax removal water carries out ultrasonic cleaning, ultrasound
The time of wave cleaning is 5 minutes；
A3, it the product through Wax removal water ultrasonic cleaning is placed in acetone soln carries out ultrasonic cleaning, acetone soln ultrasonic wave
The time of cleaning is 3 minutes；
A4, it the product Jing Guo acetone soln ultrasonic cleaning is placed in baking oven carries out baking processing, the temperature for toasting processing is
150-180 DEG C, the time for toasting processing is 30 minutes；After product baking is disposed, it is simultaneously naturally cold that product is removed into baking oven
But to room temperature；
B, prepared by bottom：
B1, the product for handling and being cooled to room temperature through overbaking is placed in vacuum drying oven, starts vacuum extractor and take out true
Vacancy is managed, and the vacuum degree inside vacuum drying oven opens the heating unit of vacuum drying oven when reaching 0.1 pa, treat the temperature inside vacuum drying oven
Reach 180 DEG C when start timing constant temperature 30 minutes, treat constant temperature time reach after close vacuum drying oven heating unit and stop plus
Heat；
B2, the vacuum extractor for continuing startup vacuum drying oven and the vacuum degree inside vacuum drying oven reach 0.8 × 10-3Pa, then
Start argon flow amount controller and toward 100-150SCCM argon gas is passed through inside vacuum drying oven, treat the vacuum degree rising inside vacuum drying oven
Grid bias power supply, Cr arc target power supplies are opened after to 0.15-0.20Pa successively, the voltage of grid bias power supply is set as -250--300V, Cr
The electric current of arc target power supply is set as 60-65A, closes Cr arc target power supplies after five minutes in product ion bombardment, is deposited on product at this time
Cr metal back layers；
C, prepared by buffer layer：
C1, start argon flow amount controller and toward 250SCCM argon gas is passed through inside vacuum drying oven, so that the vacuum inside vacuum drying oven
Degree rises to 0.3Pa；
C2, the voltage of grid bias power supply is set as -800~-150V and opens Cr column targets intermediate frequency power supply, TiAl column target medium frequency electrics
Source, the electric current of Cr column target intermediate frequency power supplies are set as 25A, and the electric current of TiAl column target intermediate frequency power supplies is set as 20A, are banged in product ion
Cr and TiAl mixed deposit layers are deposited on Cr metal back layers surface after hitting 6-18 minutes, so as to be prepared into buffer layer；
D, prepared by wearing layer：
D1, start argon flow amount controller, nitrogen flow controller, and 180-280SCCM argon gas and 80- inside past vacuum drying oven
150SCCM nitrogen, so that the vacuum degree inside vacuum drying oven rises to 0.41-0.8Pa；
D2, Cr targets, TiAl alloy target power supply are opened, Cr targets, TiAl alloy target power supply electric current be set as 20-25A, grid bias power supply
Voltage be set as -60--130V, depositing Ti AlN individual layers when product turns to TiAl targets, deposition CrN is mono- when product turns to Cr targets
Layer, so as to which TiAlN individual layers and CrN individual layers alternating deposit be made to form wearing layer, sedimentation time is 25-55 minutes；
E, prepared by color layers：
E1, start argon flow amount controller, nitrogen flow controller, acetylene flow controller, and toward being passed through inside vacuum drying oven
180-280SCCM argon gas, 80-150SCCM nitrogen and 80-150SCCM acetylene, so that the vacuum degree inside vacuum drying oven rises
To 0.2-0.6Pa；
E2, unlatching TiAl alloy target and electrical current are 8-18A, and the voltage of grid bias power supply is set as -80--150V, are being produced
Product ion bombardment is after 30-50 minutes depositing Ti AlCN layers on wearing layer；
F, it comes out of the stove cooling：Product after AlCN layers of depositing Ti out of vacuum drying oven is taken out, is placed in cooling down at aeration-drying.
Wherein, in the step a1, the mass concentration of trichloro ethylene is 2%-10% in trichloro ethylene solution.
Beneficial effects of the present invention are：A kind of physical vaporous deposition of the present invention makes blue film on product
Method is prepared including cleaning deoiling step, bottom preparation process, buffer layer preparation process, wearing layer preparation process, color layers
Step, cooling step of coming out of the stove；Wherein, cleaning deoiling step includes trichloro ethylene solution soaking and washing processing step, Wax removal water
Ultrasonic cleaning step, acetone soln ultrasonic cleaning step, baking oven baking procedure；It is designed by above-mentioned processing step, this hair
It is strong, anti-with corrosion resistance that bright physical vaporous deposition makes the blue film formed prepared by the method for blue film on product
The advantages of oxidisability is good, and product routine use can be met very well can simultaneously extend product service life.
Specific embodiment
With reference to specific embodiment, the present invention will be described.
A kind of method that physical vaporous deposition makes blue film on product, includes following processing step, specifically：
A, oil removing is cleaned：
A1, the product processed will be needed first to be placed in progress soaking and washing processing in trichloro ethylene solution, soaking and washing processing when
Between be 5 minutes；
A2, again will through trichloro ethylene solution soaking and washing, treated that product is placed in Wax removal water carries out ultrasonic cleaning, ultrasound
The time of wave cleaning is 5 minutes；
A3, it the product through Wax removal water ultrasonic cleaning is placed in acetone soln carries out ultrasonic cleaning, acetone soln ultrasonic wave
The time of cleaning is 3 minutes；
A4, it the product Jing Guo acetone soln ultrasonic cleaning is placed in baking oven carries out baking processing, the temperature for toasting processing is
150-180 DEG C, the time for toasting processing is 30 minutes；After product baking is disposed, it is simultaneously naturally cold that product is removed into baking oven
But to room temperature；
B, prepared by bottom：
B1, the product for handling and being cooled to room temperature through overbaking is placed in vacuum drying oven, starts vacuum extractor and take out true
Vacancy is managed, and the vacuum degree inside vacuum drying oven opens the heating unit of vacuum drying oven when reaching 0.1 pa, treat the temperature inside vacuum drying oven
Reach 180 DEG C when start timing constant temperature 30 minutes, treat constant temperature time reach after close vacuum drying oven heating unit and stop plus
Heat；
B2, the vacuum extractor for continuing startup vacuum drying oven and the vacuum degree inside vacuum drying oven reach 0.8 × 10-3Pa, then
Start argon flow amount controller and toward 100-150SCCM argon gas is passed through inside vacuum drying oven, treat the vacuum degree rising inside vacuum drying oven
Grid bias power supply, Cr arc target power supplies are opened after to 0.15-0.20Pa successively, the voltage of grid bias power supply is set as -250--300V, Cr
The electric current of arc target power supply is set as 60-65A, closes Cr arc target power supplies after five minutes in product ion bombardment, is deposited on product at this time
Cr metal back layers；
C, prepared by buffer layer：
C1, start argon flow amount controller and toward 250SCCM argon gas is passed through inside vacuum drying oven, so that the vacuum inside vacuum drying oven
Degree rises to 0.3Pa；
C2, the voltage of grid bias power supply is set as -800~-150V and opens Cr column targets intermediate frequency power supply, TiAl column target medium frequency electrics
Source, the electric current of Cr column target intermediate frequency power supplies are set as 25A, and the electric current of TiAl column target intermediate frequency power supplies is set as 20A, are banged in product ion
Cr and TiAl mixed deposit layers are deposited on Cr metal back layers surface after hitting 6-18 minutes, so as to be prepared into buffer layer；
D, prepared by wearing layer：
D1, start argon flow amount controller, nitrogen flow controller, and 180-280SCCM argon gas and 80- inside past vacuum drying oven
150SCCM nitrogen, so that the vacuum degree inside vacuum drying oven rises to 0.41-0.8Pa；
D2, Cr targets, TiAl alloy target power supply are opened, Cr targets, TiAl alloy target power supply electric current be set as 20-25A, grid bias power supply
Voltage be set as -60--130V, depositing Ti AlN individual layers when product turns to TiAl targets, deposition CrN is mono- when product turns to Cr targets
Layer, so as to which TiAlN individual layers and CrN individual layers alternating deposit be made to form wearing layer, sedimentation time is 25-55 minutes；
E, prepared by color layers：
E1, start argon flow amount controller, nitrogen flow controller, acetylene flow controller, and toward being passed through inside vacuum drying oven
180-280SCCM argon gas, 80-150SCCM nitrogen and 80-150SCCM acetylene, so that the vacuum degree inside vacuum drying oven rises
To 0.2-0.6Pa；
E2, unlatching TiAl alloy target and electrical current are 8-18A, and the voltage of grid bias power supply is set as -80--150V, are being produced
Product ion bombardment is after 30-50 minutes depositing Ti AlCN layers on wearing layer；
F, it comes out of the stove cooling：Product after AlCN layers of depositing Ti out of vacuum drying oven is taken out, is placed in cooling down at aeration-drying.
Wherein, in the step a1, the mass concentration of trichloro ethylene is 2%-10% in trichloro ethylene solution.
It should further be noted that it is made on product prepared by the method for blue film by the physical vaporous deposition of the present invention
The composite coating formed includes bottom, buffer layer, wearing layer and color layers successively from inside to outside, and wherein bottom is Cr metals
Layer, buffer layer are TiAl and Cr mixed layers, and the composite bed that wearing layer is formed for CrN and TiAlN, color layers are TiAlCN layers.Cr
Metal layer improves the toughness and hardness of composite coating, and buffer layer strengthens the adhesion strength inside composite coating；Wearing layer CrN and
TiAlN transmits the stress wave between buffer layer and wearing layer, weakens influence of the ambient pressure to composite coating, the opposing party
Face can be combined with color layers TiAlCN well, improve the binding force of film layer, improve the abrasion resistant effect of film layer entirety；Color layers
TiAlCN film layers have that appearance is beautiful, and acid-resisting and alkali resistance ability be strong, so as to make composite coating tool high abrasion, corrosion resistance
Advantage, while can also reach the requirement of fashionable appearance.
Based on the above situation, it may be appreciated that being designed by above-mentioned processing step, physical vaporous deposition of the invention is on product
The blue film that forms prepared by making the method for blue film have the advantages that corrosion resistance by force, good in oxidation resistance, and can expire very well
Sufficient product routine use can simultaneously extend product service life.
More than content is only presently preferred embodiments of the present invention, for those of ordinary skill in the art, according to the present invention
Thought, there will be changes, the content of the present specification should not be construed as to the present invention in specific embodiments and applications
Limitation.
Claims (2)
1. a kind of method that physical vaporous deposition makes blue film on product, which is characterized in that include following technique step
Suddenly, specifically：
A, oil removing is cleaned：
A1, the product processed will be needed first to be placed in progress soaking and washing processing in trichloro ethylene solution, soaking and washing processing when
Between be 5 minutes；
A2, again will through trichloro ethylene solution soaking and washing, treated that product is placed in Wax removal water carries out ultrasonic cleaning, ultrasound
The time of wave cleaning is 5 minutes；
A3, it the product through Wax removal water ultrasonic cleaning is placed in acetone soln carries out ultrasonic cleaning, acetone soln ultrasonic wave
The time of cleaning is 3 minutes；
A4, it the product Jing Guo acetone soln ultrasonic cleaning is placed in baking oven carries out baking processing, the temperature for toasting processing is
150-180 DEG C, the time for toasting processing is 30 minutes；After product baking is disposed, it is simultaneously naturally cold that product is removed into baking oven
But to room temperature；
B, prepared by bottom：
B1, the product for handling and being cooled to room temperature through overbaking is placed in vacuum drying oven, starts vacuum extractor and take out true
Vacancy is managed, and the vacuum degree inside vacuum drying oven opens the heating unit of vacuum drying oven when reaching 0.1 pa, treat the temperature inside vacuum drying oven
Reach 180 DEG C when start timing constant temperature 30 minutes, treat constant temperature time reach after close vacuum drying oven heating unit and stop plus
Heat；
B2, the vacuum extractor for continuing startup vacuum drying oven and the vacuum degree inside vacuum drying oven reach 0.8 × 10-3Pa, then
Start argon flow amount controller and toward 100-150SCCM argon gas is passed through inside vacuum drying oven, treat the vacuum degree rising inside vacuum drying oven
Grid bias power supply, Cr arc target power supplies are opened after to 0.15-0.20Pa successively, the voltage of grid bias power supply is set as -250--300V, Cr
The electric current of arc target power supply is set as 60-65A, closes Cr arc target power supplies after five minutes in product ion bombardment, is deposited on product at this time
Cr metal back layers；
C, prepared by buffer layer：
C1, start argon flow amount controller and toward 250SCCM argon gas is passed through inside vacuum drying oven, so that the vacuum inside vacuum drying oven
Degree rises to 0.3Pa；
C2, the voltage of grid bias power supply is set as -800~-150V and opens Cr column targets intermediate frequency power supply, TiAl column target medium frequency electrics
Source, the electric current of Cr column target intermediate frequency power supplies are set as 25A, and the electric current of TiAl column target intermediate frequency power supplies is set as 20A, are banged in product ion
Cr and TiAl mixed deposit layers are deposited on Cr metal back layers surface after hitting 6-18 minutes, so as to be prepared into buffer layer；
D, prepared by wearing layer：
D1, start argon flow amount controller, nitrogen flow controller, and 180-280SCCM argon gas and 80- inside past vacuum drying oven
150SCCM nitrogen, so that the vacuum degree inside vacuum drying oven rises to 0.41-0.8Pa；
D2, Cr targets, TiAl alloy target power supply are opened, Cr targets, TiAl alloy target power supply electric current be set as 20-25A, grid bias power supply
Voltage be set as -60--130V, depositing Ti AlN individual layers when product turns to TiAl targets, deposition CrN is mono- when product turns to Cr targets
Layer, so as to which TiAlN individual layers and CrN individual layers alternating deposit be made to form wearing layer, sedimentation time is 25-55 minutes；
E, prepared by color layers：
E1, start argon flow amount controller, nitrogen flow controller, acetylene flow controller, and toward being passed through inside vacuum drying oven
180-280SCCM argon gas, 80-150SCCM nitrogen and 80-150SCCM acetylene, so that the vacuum degree inside vacuum drying oven rises
To 0.2-0.6Pa；
E2, unlatching TiAl alloy target and electrical current are 8-18A, and the voltage of grid bias power supply is set as -80--150V, are being produced
Product ion bombardment is after 30-50 minutes depositing Ti AlCN layers on wearing layer；
F, it comes out of the stove cooling：Product after AlCN layers of depositing Ti out of vacuum drying oven is taken out, is placed in cooling down at aeration-drying.
2. the method that a kind of physical vaporous deposition according to claim 1 makes blue film on product, feature exist
In：In the step a1, the mass concentration of trichloro ethylene is 2%-10% in trichloro ethylene solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810046674.3A CN108265271A (en) | 2018-01-18 | 2018-01-18 | A kind of method that physical vaporous deposition makes blue film on product |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810046674.3A CN108265271A (en) | 2018-01-18 | 2018-01-18 | A kind of method that physical vaporous deposition makes blue film on product |
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Cited By (3)
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| CN110205583A (en) * | 2019-06-24 | 2019-09-06 | 精研（东莞）科技发展有限公司 | A kind of method of physical vaporous deposition preparation blue-green coating |
| CN114182214A (en) * | 2021-12-14 | 2022-03-15 | 安徽昊方机电股份有限公司 | A method for depositing AlCrCN coating on the surface of tungsten copper alloy material |
| CN115433902A (en) * | 2022-07-27 | 2022-12-06 | 精研（东莞）科技发展有限公司 | Preparation of golden composite coating by physical vapor deposition method and its preparation process |
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Application publication date: 20180710 |