CN108254946B - Display device and its manufacturing method and manufacturing device - Google Patents
Display device and its manufacturing method and manufacturing device Download PDFInfo
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- CN108254946B CN108254946B CN201710887131.XA CN201710887131A CN108254946B CN 108254946 B CN108254946 B CN 108254946B CN 201710887131 A CN201710887131 A CN 201710887131A CN 108254946 B CN108254946 B CN 108254946B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133519—Overcoatings
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
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Abstract
本发明提供一种能够抑制亮点缺陷所导致的显示品质的降低的显示装置及其制造方法和制造装置。显示装置(LCD)具备：第1玻璃基板(SUB1)、和与第1玻璃基板对置并位于显示面侧的第2玻璃基板(SUB2)，在第1玻璃基板以及第2玻璃基板的至少一者的内部，具有从显示面侧观察而覆盖亮点缺陷部(133)的减光部(1)，从显示面侧观察，减光部在减光部的一个端部(B)，具有可见光的透过率比减光部的其他区域(1g)高的线状的透过部(7)，减光部在与线状的透过部的长边方向正交的厚度方向的剖面，是多个着色层(2‑1、2‑2)连续且折弯的折线形状，并且，透过部位于折线的折弯端部(47)。
The present invention provides a display device, a method of manufacturing the same, and a manufacturing device capable of suppressing deterioration of display quality due to a bright spot defect. The display device (LCD) includes: a first glass substrate (SUB1); and a second glass substrate (SUB2) facing the first glass substrate and positioned on the display surface side; Inside, there is a dimming part (1) that covers the bright spot defect part (133) when viewed from the display surface side, and the dimming part is located at one end (B) of the dimming part when viewed from the display surface side, and has visible light. The linear transmissive portion (7) having a higher transmittance than the other regions (1g) of the light-reducing portion, the cross-section of the light-reducing portion in the thickness direction perpendicular to the longitudinal direction of the linear transmissive portion is many The coloring layers (2-1, 2-2) are continuous and folded in the shape of a folded line, and the transparent portion is located at the folded end (47) of the folded line.
Description
Technical Field
The invention relates to a display device, a method and an apparatus for manufacturing the same.
Background
Among various display devices, for example, a liquid crystal display device performs image display by applying an electric field generated between a pixel electrode and a common electrode to a liquid crystal layer sandwiched between a pair of substrates to drive liquid crystals, and adjusting the amount of light transmitted through a region between the pixel electrode and the common electrode.
Conventionally, for example, in a liquid crystal display device, a problem of a so-called bright point defect (also referred to as a pixel defect) in which the display luminance of a pixel is higher than a desired luminance has been known. The bright defects are caused by, for example, foreign substances mixed between the pair of substrates in the manufacturing process of the liquid crystal display device, and the foreign substances disturb the alignment of the liquid crystal or short-circuit occurs between the pixel electrode and the common electrode.
For example, patent document 1 discloses a method of correcting a bright spot defect. In the method of patent document 1, a planar colored layer is formed by irradiating laser light into a glass substrate so as to cover an area where a bright point defect occurs, and the amount of light transmission of the bright point is reduced in the colored layer.
Prior art documents
Patent document
Patent document 1: JP 2015-175857 publication
However, in the conventional technique, the final scanning portion when forming a colored layer by surface scanning with laser light becomes thin, light leakage occurs, and a defect due to a bright point defect cannot be sufficiently corrected.
Disclosure of Invention
The present invention has been made in view of the above circumstances, and provides a display device, a method of manufacturing the same, and a manufacturing apparatus capable of suppressing a reduction in display quality due to a bright point defect.
In order to achieve the above object, a display device according to an aspect of the present invention includes:
a1 st glass substrate; and
a2 nd glass substrate facing the 1 st glass substrate and positioned on the display surface side,
the display device has a light-reducing portion that covers a bright point defect portion when viewed from the display surface side, in at least one of the 1 st glass substrate and the 2 nd glass substrate,
the light reducing section has a linear transmitting section having a visible light transmittance higher than that of other regions of the light reducing section at one end of the light reducing section as viewed from the display surface side,
the light reducing part has a broken line shape in which a plurality of colored layers are continuously and bent in a cross section in a thickness direction orthogonal to a longitudinal direction of the linear transmissive part, and the transmissive part is located at a bent end of the broken line.
In order to achieve the above object, a method for manufacturing a display device according to another aspect of the present invention includes: a1 st glass substrate, and a2 nd glass substrate facing the 1 st glass substrate and positioned on a display surface side,
the manufacturing method of the display device includes:
irradiating the 1 st or 2 nd glass substrate with a laser beam so as to cover the bright point defect portion, and condensing the laser beam into at least one of the 1 st or 2 nd glass substrate;
a step of forming a1 st colored layer of a light reducing portion covering the bright point defect portion in a planar shape from a scanning start position to a scanning end position, as viewed from the display surface side, by relatively moving the laser beam and the display device; and
next, forming the dimming portion by relatively moving the laser beam and the display device, thereby starting scanning with the scanning end position of the 1 st colored layer as a scanning start position and forming a2 nd colored layer of the dimming portion into a planar shape until the scanning end position, the 1 st colored layer and the 2 nd colored layer being arranged so as to overlap each other in a cross section in a thickness direction of the 2 nd glass substrate as viewed from the display surface side, the 1 st colored layer and the 2 nd colored layer forming a continuous and bent broken line shape in the 2 nd colored layer,
the laser light irradiated in the step of irradiating the laser light has a wavelength of 100nm or more and 10 μm or less, a pulse width of 1 femtosecond or more and 100 picoseconds or less, a pulse energy of 0.1 μ J or more and 1mJ or less, and is condensed by a lens having an NA of 0.1 or more and 0.95 or less.
In order to achieve the above object, a display device manufacturing apparatus according to another aspect of the present invention is a display device manufacturing apparatus, including: a1 st glass substrate, and a2 nd glass substrate facing the 1 st glass substrate and positioned on a display surface side,
the manufacturing device of the display device comprises:
a laser irradiation device that irradiates the 1 st glass substrate or the 2 nd glass substrate with laser light so as to cover the bright point defect portion;
a lens configured to condense the laser light irradiated from the laser irradiation device into at least one of the 1 st glass substrate and the 2 nd glass substrate;
a display device holding device that holds the display device; and
a driving device configured to move the laser beam from the laser irradiation device relative to the display device held by the display device holding device, thereby forming a1 st colored layer of the dimming portion covering the bright point defect portion in a planar shape from a scanning start position to a scanning end position when viewed from the display surface side, and then forming a2 nd colored layer of the dimming portion in a planar shape when viewed from the display surface side by moving the laser beam relative to the display device, wherein the 1 st colored layer and the 2 nd colored layer are arranged so as to overlap each other in a cross section in a thickness direction of the 2 nd glass substrate when viewed from the display surface side, and the 1 st colored layer and the 2 nd colored layer are formed in a broken line shape in which the 1 st colored layer and the 2 nd colored layer are continuously bent in a thickness direction of the 2 nd glass substrate, thereby forming the light-reducing portion so as to form the light-reducing portion,
the laser light irradiated from the laser irradiation device has a wavelength of 100nm or more and 10 μm or less, a pulse width of 1 femtosecond or more and 100 picoseconds or less, a pulse energy of 0.1 μ J or more and 1mJ or less, and is condensed by a lens having an NA of 0.1 or more and 0.95 or less.
As described above, according to the display device, the manufacturing method thereof, and the manufacturing apparatus thereof according to the aspect of the present invention, the plurality of colored layers are formed in a continuous and bent broken line shape in a cross section in the thickness direction orthogonal to the longitudinal direction of the linear transmissive portion as the light reducing portion, and the transmissive portion is positioned at the bent end portion of the broken line, so that the final scanning portion of the colored layer on the lower layer side of the adjacent colored layer is covered with the initial scanning portion of the colored layer on the upper layer side, and the light colored portion can be prevented from being formed. As a result, a display device in which deterioration of display quality due to a bright point defect is suppressed can be provided.
Drawings
Fig. 1 is a plan view showing the entire configuration of a liquid crystal display device LCD according to embodiment 1 of the present invention.
Fig. 2 is a plan view showing a structure of a part of a display panel in embodiment 1 of the present invention.
Fig. 3 is an end view of a cut-off portion cut at line a1-a2 in fig. 2 of the liquid crystal display device LCD in embodiment 1 of the present invention.
Fig. 4 is a cross-sectional view schematically showing an example of a bright point defect in embodiment 1 of the present invention.
Fig. 5 is a cross-sectional view showing the structure of a pixel having a light-reducing section in embodiment 1 of the present invention.
Fig. 6 is a schematic view showing the configuration of an optical system and the state near the focal point at the time of internal processing of glass in embodiment 1 of the present invention.
Fig. 7 is a state diagram for explaining embodiment 1 of the present invention in which linear processing is performed on the inside of glass.
Fig. 8 is a process flowchart for performing planar processing for describing embodiment 1 of the present invention.
Fig. 9 is a state diagram of a planar colored layer for explaining embodiment 1 of the present invention.
Fig. 10 is a cross-sectional view and a cross-sectional photograph of a comparative example according to embodiment 1 of the present invention.
Fig. 11A is a schematic view of the case of forming 2 layers in a comparative example according to embodiment 1 of the present invention.
Fig. 11B is a schematic view of the case of forming 2 layers in a comparative example according to embodiment 1 of the present invention.
Fig. 12 is a cross-sectional view of the case of forming 2 layers in embodiment 1 of the present invention.
-description of symbols-
AF alignment film
BM black matrix
CF color filter
CIT common electrode
CONT contact hole
DL data line
DM drain electrode
DP display panel
F focal point
GB. GB1, GB2 glass substrate
GSN insulating film
GL gate line
LC liquid crystal layer
LCD liquid crystal display device
OC protective layer
PAS insulating film
PIT pixel electrode
POL1 and POL2 polarizing plates
SEM semiconductor layer
SM source electrode
SUB1 TFT substrate
SUB2 CF substrate
UPAS insulating film
1 dimming part
Other area of 1g dimming part
2 coloured layer
2-1 st colored layer
2-2 nd colored layer
2-3 rd colored layer
2a colored region
3 layer of voids
3a void area
4. 4a laser
5 lens
6 dark colored portion
7 transmissive portion (straight light colored portion 7)
8 lighter colored areas
33 foreign matter
34 backlight light
40 linear machining trace
42. 43, 44 arrows
46 fold line
472 one vertex of the fold line (bending end)
94 laser irradiation device
95 glass substrate holding device
96 driving device
101 dimming part
Other region of the 101g dimming part
133 bright spot defective portion
P pitch
S scanning start part
E scanning end part
Detailed Description
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
In the following embodiments, a liquid crystal display device is exemplified, but the display device according to the present invention is not limited to the liquid crystal display device, and may be, for example, an organic EL display device or a plasma display panel.
(embodiment mode 1)
Fig. 1 is a plan view showing the entire configuration of a liquid crystal display device LCD as an example of a display device according to embodiment 1 of the present invention.
The liquid crystal display device LCD includes: a display panel DP for displaying an image, a display panel drive circuit (data line drive circuit 30, gate line drive circuit 31) for driving the display panel DP, a control circuit (not shown) for controlling the display panel drive circuit, and a backlight 134 for irradiating backlight light for irradiating the display panel DP from the rear side.
Fig. 2 is a plan view showing a structure of a part of the display panel DP. Fig. 3 is an end view of the cut portion cut at line a1-a2 of fig. 2. Fig. 2 and 3 show one pixel P in the display panel DP.
As shown in fig. 3, the display panel DP includes: a thin film transistor substrate SUB1 (hereinafter referred to as a TFT substrate SUB1) disposed on the back surface side, a color filter substrate SUB2 (hereinafter referred to as a CF substrate SUB2) disposed on the display surface side and facing the TFT substrate SUB1, and a liquid crystal layer LC interposed between the TFT substrate SUB1 and the CF substrate SUB 2. The thin film transistor substrate SUB1 functions as an example of the 1 st substrate. The color filter substrate SUB2 functions as an example of the 2 nd substrate.
On the TFT substrate SUB1, a plurality of data lines DL extending in the column direction and a plurality of gate lines GL extending in the row direction are formed, and thin film transistors TFT are formed near intersections of the plurality of data lines DL and the plurality of gate lines GL. Further, a rectangular area surrounded by the adjacent 2 data lines DL and the adjacent 2 gate lines GL is defined as one pixel P. A plurality of pixels P are arranged in a matrix on the TFT substrate SUB 1.
In the pixel P, a pixel electrode (display electrode) PIT formed of a transparent (or light-transmitting) conductive film such as Indium Tin Oxide (ITO) is formed. As shown in fig. 2, the pixel electrode PIT has an opening 32 (e.g., a slit) and is formed in a stripe shape. The thin film transistor TFT includes a semiconductor layer SEM made of amorphous silicon (aSi) formed on the gate insulating film GSN (see fig. 3), and a drain electrode DM and a source electrode SM (see fig. 2) formed on the semiconductor layer SEM. The drain electrode DM is electrically connected to the data line DL. The source electrode SM and the pixel electrode PIT are electrically connected to each other through the contact hole CONT.
The laminated structure of each part constituting the pixel P is not limited to the structure of fig. 3, and a known structure can be applied. For example, in the configuration shown in fig. 3, on the TFT substrate SUB1, the gate line GL (see fig. 2) is formed on the 1 st glass substrate GB1, and the gate insulating film GSN is formed so as to cover the gate line GL. Further, the data line DL is formed on the gate insulating film GSN, and the insulating film PAS is formed so as to cover the data line DL. Further, a common electrode CIT (display electrode) is formed on the insulating film PAS, and an upper insulating film UPAS is formed so as to cover the common electrode CIT. Further, the pixel electrode PIT is formed on the upper-layer insulating film UPAS, and the alignment film AF is formed so as to cover the pixel electrode PIT. On the back surface side of the 1 st glass substrate GB1, a polarizing plate POL1 (1 st polarizing plate) is formed.
Further, in the CF substrate SUB2, a black matrix BM (an example of a light shielding portion) and a color filter CF (for example, a red portion, a green portion, a blue portion) (an example of a light transmitting portion) are formed on a2 nd glass substrate GB 2(a lower surface side of the 2 nd glass substrate GB2 of fig. 3), and a protective layer OC is formed so as to cover the black matrix BM and the color filter CF. On the display surface side of the 2 nd glass substrate GB2, a polarizing plate POL 2(2 nd polarizing plate) is formed. Thus, the 2 nd glass substrate GB2 is opposed to the 1 st glass substrate GB1 and positioned on the display surface side, and the liquid crystal layer LC is disposed between the 1 st glass substrate GB1 and the 2 nd glass substrate GB 2.
According to the configuration shown In fig. 3, the liquid crystal display device LCD has a so-called IPS (In Plane Switching) configuration, but the liquid crystal display device LCD according to embodiment 1 is not limited to this.
Next, a method of driving the liquid crystal display device LCD will be briefly described. The gate line GL is supplied with a gate voltage for scanning output from the gate line driving circuit 31, and the data line DL is supplied with a data voltage for video output from the data line driving circuit 30. When a gate-on voltage is applied to the gate line GL, the semiconductor layer SEM of the thin film transistor TFT has a low resistance, and a data voltage applied to the data line DL is applied to the pixel electrode PIT via the source electrode SM. The common electrode CIT is supplied with a common voltage output from a common electrode driving circuit (not shown). As a result, an electric field (driving electric field) is generated between the pixel electrode PIT and the common electrode CIT, and the liquid crystal layer LC is driven by the electric field, whereby an image is displayed.
Here, in the liquid crystal display device LCD, a bright point defect (pixel defect) may occur in which the display luminance of the pixel is higher than desired luminance in the manufacturing process thereof. Fig. 4 shows an example of a case where the pixel P is the bright point defect 133. Fig. 4 illustrates a case where a foreign substance 33 such as an organic substance or a metal is mixed between the TFT substrate SUB1 and the CF substrate SUB2 in the manufacturing process of the liquid crystal display device LCD. In the pixel P shown in fig. 4, since the orientation of the liquid crystal is disturbed by the foreign substance (contaminant) 33, light leakage of the backlight 34 occurs, and the pixel P becomes a bright point defect portion 133 having a bright point defect.
The liquid crystal display device LCD according to embodiment 1 has a structure for suppressing the bright point defect. Specifically, as shown in fig. 5, a light reduction unit 1 for reducing the amount of transmission of the backlight 34 is formed inside the 2 nd glass substrate GB2 of the CF substrate SUB 2. The dimming portion 1 is arranged in a plane direction (planar direction) parallel to the surface of the panel, and is formed to cover and hide the bright point defect portion 133 by the foreign substance 33 when viewed from the display surface side of the 2 nd glass substrate GB 2. That is, the dimming portion 1 is disposed inside at least one of the 1 st glass substrate GB1 and the 2 nd glass substrate GB2 so as to cover the bright point defect portion 133 when viewed from the display surface side. In the light reduction part 1, a colored layer 2 having a color different from each of the 1 st glass substrate GB1 and the 2 nd glass substrate GB2 is formed, and a void layer 3 having a plurality of, that is, a plurality of voids is formed below the colored layer 2. In addition, as described below, when the colored layer 2 is formed of a plurality of layers, a plurality of colored layers may be stacked on the void layer 3.
Fig. 6 is a schematic diagram showing the configuration of an optical system of a manufacturing apparatus of a display device and the state of the vicinity of a focal point (condensing point) F when processing the inside of glass.
The manufacturing device of the display device is configured to include: the laser irradiation device 94, the lens 5, a glass substrate holding device 95 as an example of a display device holding device, and a driving device 96 for moving the laser irradiation device 94 relative to the glass substrate holding device 95 as an example of a laser relative moving device.
The wavelength of the laser beam 4 irradiated from the laser irradiation device 94 is preferably 100nm or more and 10 μm or less of the wavelength of the transmitted glass, the pulse width is 1 femtosecond or more and 100 picoseconds or less, the pulse energy is 0.1 μ J or more and 1mJ or less, and the frequency is 10Hz or more and 10MHz or less.
The lens 5 has an NA of 0.1 to 0.95, and may have an aberration correction function.
The laser beam 4a is a laser beam transmitted through the lens 5 and condensed, and enters the 2 nd glass substrate GB2 held by the glass substrate holding device 95, and is condensed at a desired processing depth L.
The vicinity of the condensed light F is composed of a colored region 2a and a void region 3a containing fine voids (voids) having a diameter of 1nm or more and 50 μm or less.
Further, a control system capable of relatively moving the laser beams 4 and 4a and the 2 nd glass substrate GB2 by the driving device 96 and irradiating and stopping the laser beams 4 and 4a at desired positions in conjunction with the driving device 96 is configured to be incorporated in the laser irradiation device 94.
Next, the operation will be described.
After the laser irradiation device 94 is moved to a desired position with respect to the 2 nd glass substrate GB2 held by the glass substrate holding device 95 by the drive device 96, the laser 4 is irradiated onto the 2 nd glass substrate GB2, and the laser 4a condensed by the lens 5 is made incident on the 2 nd glass substrate GB2 and condensed inside the 2 nd glass substrate GB 2. Here, since the laser light used for the laser light 4 and the laser light 4a is a laser light called an ultrashort pulse laser light, the peak output is very high, and the energy density is very high at the converging point F. Therefore, the glass is sublimated and vaporized in the vicinity of the light converging point F, and then solidified, thereby forming minute holes (voids) having a diameter of 1nm or more and 50 μm or less. In the region of the 2 nd glass substrate GB2 closer to the surface of the 2 nd glass substrate GB2 than the focal point F, the glass melts, and the periphery is colored in brown or black due to the influence of the laser light diffused by the gap between the focal points F and the heat conduction generated during processing, thereby forming a colored region 2 a. It is considered that the coloring of the colored region 2a is caused by the formation of oxygen defects called non-crosslinked oxygen vacancy centers in the glass.
The position of the laser beam 4a and the position of the 2 nd glass substrate GB2 are linearly moved relative to each other, linear scanning or planar scanning is performed, and the colored region 2a and the void region 3a are enlarged to form the light reduction section 1 (see fig. 5) including the colored layer 2 and the void layer 3. The backlight light 34 irradiated from the back surface of the glass substrate GB is scattered by the void layer 3, is further absorbed by the colored layer 2 to be dimmed, and the dimmed light is emitted on the surface of the 2 nd glass substrate GB2, so that the reduction in display quality due to the bright point defect can be suppressed.
Fig. 7 is a photograph showing a state in which the inside of glass of the 2 nd glass substrate GB2 is processed linearly to form the dimming part 1. Fig. 7(a) is a view seen from a direction perpendicular to the liquid crystal panel. A dark colored portion 6 is formed at the peripheral portion of the linear processing trace 40, and a light colored portion 7 is formed at the central portion of the linear processing trace 40. FIG. 7(b) is a sectional view taken along line A3-A4 of FIG. 7 (a). It is found that a void region 3a is formed on the back surface side of the 2 nd glass substrate GB2, and a dark colored portion 6 and a light colored portion 7 (i.e., a transmission portion having a higher visible light transmittance than the surrounding portions) are formed on the front surface side of the void region 3 a.
Here, a relation between a processing method of the linear processing and a position of the light colored portion 7 will be described.
Fig. 8 shows a process flow in the linear processing of the 1-layer color layer 2 as the light reduction unit 101 according to the comparative example, and fig. 9 shows a state diagram of the 1-layer color layer 2 of the light reduction unit 101. The 1 st line processing by the laser beam provides a line processing trace 40 having a thick, linear, dark colored portion 6 in the peripheral portion and a thin, linear, light colored portion 7 in the central portion (see fig. 8 (a)). In the drawings of fig. 8 and later, the colored layers 2 are cross-hatched as necessary for easy understanding.
Next, fig. 8(b) shows a state in which 2 nd straight line processing is performed after moving the glass surface of the 2 nd glass substrate GB2 by the pitch P in parallel (for example, after moving the glass surface by the pitch P in fig. 8). For example, the pitch P can be set to 0.1 to 200 μm. In fig. 8(b), the periphery of each linear machining mark 40 is surrounded by a broken line for explanation, but the boundary is not actually different. Since the processing is performed with the processing trace 40 of 2 lines scanned and the pitch between scans set to P, the dark colored portion 6 in the peripheral portion of the planar colored layer 2 is enlarged, the 1 st light colored portion 7 is covered with the dark colored portion 6 in the peripheral portion of the 2 nd line by the scanning of the 2 nd line and disappears, and the 2 nd light colored portion 7 remains only in the final scanning portion.
By repeating the linear processing operation up to the nth (N is an integer of 4 or more) after the 3 rd by shifting the pitch P, the planar colored portion 6 having a thick color formed by expanding and connecting the colored portions 6 having a thick color in the peripheral portion can be obtained (see fig. 8 c). Here, the entire surface of the planar colored layer 2 is heavily colored, but a straight light colored portion 7 remains only in the final scanning portion (i.e., the uppermost scanning portion in fig. 8 (c)). In fig. 8, although the periphery of each linear machining mark 40 is surrounded by a broken line for explanation, fig. 9(a) shows a case where the broken line is removed, and fig. 9(b) shows an actual machining mark 40. As shown in fig. 9 a, the planar colored layer 2 constituting a part of the light reduction section 101 has a linear transmission section (light-colored section 7) having a higher visible light transmittance than the other region 101g of the light reduction section 101 at the end of the light reduction section 101 (i.e., the upper end of fig. 9 a) when viewed from the display surface side. Similarly, in the state diagram of fig. 9(b), a linear light-colored portion 7 is formed at an end portion of the light-reducing portion 101 (i.e., an upper end portion of fig. 9 (b)). Fig. 9 is a view of the dimmer 101 as viewed from the display surface side.
Fig. 10(a) is a schematic view showing a state where a cross section taken along line a5-a6 in fig. 9(b) is rotated 90 degrees clockwise, and fig. 10(b) is a photograph thereof. The cross section taken along line a5-a6 in fig. 9(b) is a cross section taken in the thickness direction perpendicular to the longitudinal direction of the straight-line transmissive portion (i.e., the light-colored portion 7). In the final scanning portion, the light-colored portions 7 in a linear shape remain, and light leakage occurs from this portion. This is because, when scanning the ultra-short pulse laser, the non-crosslinked oxygen hole centers are formed temporarily and the ultra-short pulse laser is irradiated from the heavily colored region, and when the colored portion 6 of the dense color is melted, the laser intensity is strong at the center portion of the linear processing, and therefore the structure of the non-crosslinked oxygen hole centers is collapsed and decolored, and a linear transmission portion (i.e., the colored portion 7 of the light color) is formed. The decolored position is also colored again by the colored portion 6 of a dark color by repeating the scanning, but only the region 8 of a light color (i.e., the colored portion 7 of a light color linear on the plane) which remains decolored at the final scanning position remains in the cross section, and light leakage occurs from this region. Further, in the linearly light-colored portion 7, that is, the lightly colored region 8, voids are likely to condense, which is also considered to be a cause of easy penetration of backlight light of the liquid crystal panel. At this time, the visible light transmittance at the heavily colored position (i.e., the colored portion 6 of a dark color) is 0% or more and 50% or less, but the visible light transmittance at the light leakage position (i.e., the colored portion 7 of a light color on the plane and the region 8 of a lighter color on the cross section) is 60% or more higher.
Fig. 11A and 11B are schematic diagrams of a comparative example in which 2 layers are formed in the dimming part 101 at positions different in the thickness direction of the 2 nd glass substrate GB 2.
The direction of the arrow 42 shown in fig. 11A (a-1) indicates the pitch direction of the linear scanning by the laser light, and indicates that the pitch directions of the 2 layers are all the same direction. Fig. 11A (a-2) shows a state in which a cross-sectional view at a line a7-a8 when 2 layers are formed by separating the layers subjected to surface processing by repeating linear scanning of laser light at each pitch P in the thickness direction of the 2 nd glass substrate GB2 by a predetermined distance is rotated by 90 degrees clockwise. The arrow 43 shown in FIG. 11A (a-2) is the pitch direction as in FIG. 11A (a-1). Fig. 11A (a-1) and 11B (B-1) are views viewed from the display surface side, and the depth direction of the paper surface is the back surface side. In this scan, since the 2 layers are all subjected to surface processing by pitch feeding in the same direction, the lightly colored region 8 overlaps with the final scan portion, and light leakage cannot be reduced.
On the other hand, the arrow 44 in FIG. 11B (B-1) indicates that the pitch direction of the 1 st layer is opposite to that of the 2 nd layer. FIG. 11B (B-2) shows a cross section taken along line A9-A10. Light leakage due to the lighter colored region 8 is reduced by the upper colored portion 6 of the dark color and the lower colored portion 6 of the dark color, but the light leakage of the entire dimmer 101 cannot be sufficiently reduced because there are 2 positions of the lighter colored region 8.
In the processing method described above, the influence of the lightly colored region 8 cannot be suppressed, and the degradation of the display quality cannot be suppressed.
Therefore, the dimmer 1 according to embodiment 1 has a linear transmissive portion (lighter colored region 8) having a higher visible light transmittance than the other region 1g of the dimmer 1 at an end B of the dimmer 1 when viewed from the display surface side, and the dimmer 1 has a folded line shape in which 2 colored layers 2 are continuously folded in a V-shape in a cross section in the thickness direction orthogonal to the longitudinal direction of the linear transmissive portion (lighter colored region 8), and the transmissive portion (lighter colored region 8) is located at a folded end 47 of the folded line 46.
Fig. 12 is a cross-sectional view showing an example of a pattern for forming the light reducing section 1 according to embodiment 1 of the present invention.
Fig. 12(a) is a cross-sectional view when 2 colored layers 2(2-1, 2-2) are formed as the light reduction section 1 as viewed in cross section in a state of being bent into a V-shaped folding line 46. That is, the cross section of the fold line 46 is formed such that the 2 colored layers 2(2-1, 2-2) form one apex (i.e., the apex at the right end of fig. 12(a), in other words, the bent end portion) 47. The point S is a start position (i.e., a first scanning section) on the first scanning side of the 1 st colored layer 2-1, and the point E is an end position (i.e., a final scanning section) on the final scanning side of the 2 nd colored layer 2-2. The following features exist: in the bent end portion 47 as the B portion, the final scanning portion of the 1 st colored layer 2-1 and the first scanning portion of the 2 nd colored layer 2-2 are scanned at the same position, and the final scanning portion of the 1 st colored layer 2-1 is covered with the first scanning portion of the 2 nd colored layer 2-2, so that the less colored region 8 is not formed.
That is, first, by moving the laser light 4 and the 2 nd glass substrate GB2 relative to each other, the 1 st colored layer 2-1 of the light reducing section 1 covering the bright point defective section 133 is formed in a planar shape from the scanning start position S to the scanning end position B as viewed from the display surface side. Next, the laser beam 4 is moved relative to the 2 nd glass substrate GB2, and the scanning is started from the scanning start position B of the 1 st colored layer 2-1 as the scanning end position E, and the 2 nd colored layer 2-2 of the dimmer 1 is formed in a planar shape as viewed from the display surface side, and the dimmer 1 is formed by being arranged so as to overlap with the scanning end position E, as viewed from the display surface side, such that the 1 st colored layer 2-1 and the 2 nd colored layer 2-2 form a shape of a continuous and bent broken line 46 in a cross section in the thickness direction of the 2 nd glass substrate GB 2.
In addition, when the 2 nd colored layer is formed, if it is overlapped at the same depth as the 1 st colored layer 2-1, the 1 st colored layer 2-1 is covered and the coloring concentration is almost the same, and therefore, it cannot contribute to the transmittance reduction. Therefore, the 2 nd colored layer 2-2 is formed as a colored layer 2-2 in an oblique direction by changing the processing depth every 1 scan. A lightly colored region 8 remains in the final scanning portion of the 2 nd colored layer 2-2. However, the 1 st colored layer 2-1 has a reduced transmittance, and the region 8 having a lighter color is formed only in 1 position in the plane, so that light leakage of the entire colored layer can be suppressed.
Fig. 12(b) shows a cross-sectional view of a case where the number of coloring layers is increased to 3 as a modification of embodiment 1. That is, the folding line 46 is formed such that the 3 colored layers 2(2-1, 2-2, 2-3) form 2 vertexes 47. The point S is the starting position of the 1 st colored layer 2-1 on the first scanning side, and the point E is the ending position of the 3 rd colored layer 2-3 on the final scanning side. By scanning the final scanning portion of the 1 st colored layer 2-1 and the first scanning portion of the 2 nd colored layer 2-2 at the same position and scanning the final scanning portion of the 2 nd colored layer 2-2 and the first scanning portion of the 3 rd colored layer 2-3 at the same position, the light colored region 8 is not formed in each of the final scanning portion of the 1 st colored layer 2-1 and the final scanning portion of the 2 nd colored layer 2-2, and the light colored region 8 is formed only in 1 position of the final scanning portion of the 3 rd colored layer 2-3. This can suppress light leakage of the entire colored layer in accordance with the decrease in transmittance due to the 3-layer formation. In this way, by forming the fold line by the 3 or more colored layers 2, that is, by forming the dimming part 1 to have 2 or more vertexes 47, it is possible to further prevent the deterioration of the display quality.
In embodiment 1, the distance between the 1 st colored layer 2-1 and the 3 rd colored layer 2-3 is, for example, about 60 to 100 μm, and the 1 st and 3 rd colored layers 2-1, 2-3 and the void layer 3 do not overlap with each other, whereby the concentration can be efficiently increased. The distance between the 1 st colored layer 2-1 and the 3 rd colored layer 2-3 is not limited to the above, and the coloring density can be increased by setting the distance to be not less than 5 μm and not more than the thickness of the glass.
The shape of the light reduction portion 1 in a plan view is described as a quadrangle, but may be a circle, an ellipse, a polygon with rounded corners, an oval, or a polygon with a triangle or more. However, by forming the planar shape of the colored layer 2 into a circular shape, stress generated at the corner can be relaxed, and light leakage at the corner can be suppressed. The size of the dimmer part 1 is also 10 μm to 500 μm in size based on the pixel size or the distance from the rear surface of the glass substrate GB. The 3 rd colored layer 2-3 is formed at a distance of 10 μm or more and 200 μm or less from the surface of the glass substrate GB to the colored layer 2-1 of the 1 st colored layer, and the 2 nd colored layer 2-2 is formed so as to connect the 1 st colored layer 2-1 and the 3 rd colored layer 2-3.
This time, the 1 st colored layer 2-1 and the 3 rd colored layer 2-3 were formed in parallel (horizontal) with respect to the glass surface, and the 2 nd colored layer 2-2 was formed in an obliquely inclined manner. The shape or angle of the 1 st colored layer 2-1, the 2 nd colored layer 2-2, and the 3 rd colored layer 2-3 can be selected arbitrarily, but for the following reason, the 1 st colored layer 2-1 as the lowermost layer is preferably formed in a horizontal shape.
In forming the lowermost layer, it is necessary to prevent the CF layer on the lower surface of the 2 nd glass substrate GB2 from being damaged by the laser light that is transmitted without being absorbed in the vicinity of the focal point F. Therefore, the 1 st colored layer 2-1 is formed at a distance from the lower surface of the 2 nd glass substrate GB 2. On the other hand, if the 1 st colored layer 2-1 is formed above the inside of the 2 nd glass substrate GB2, light in an oblique direction due to scattered light of foreign matter cannot be blocked by the colored layer 2-1, and therefore light leakage occurs. As described above, the 1 st colored layer 2-1 needs to be formed at the deepest position at a depth where the CF layer of the 2 nd glass substrate GB2 is not damaged, and as shown in fig. 12(a) and (b), the 1 st colored layer 2-1 is preferably a horizontal colored layer 2.
In embodiment 1, the reason why the 1 st colored layer 2-1, the 2 nd colored layer 2-2, and the 3 rd colored layer 2-3 are formed from a deep position is that when the 1 st colored layer 2-1 is formed at a shallow position, for example, the 2 nd colored layer 2-2 is formed, laser light is absorbed or scattered by the 1 st colored layer 2-1, and power and energy necessary for forming the 2 nd colored layer 2-2 cannot be supplied to the colored layer forming position in the 2 nd glass substrate GB 2. That is, the transmissive portion (the lightly colored region 8) is preferably located in the colored layer 2 located closest to the display surface side among the plurality of colored layers 2 constituting the folding line 46. The number of layers of the colored layer 2 can be increased as long as the thickness of the glass allows.
Further, a void layer 3 is formed on the back surface side of each colored layer 2. Light leakage can be suppressed by these void layers 3.
According to embodiment 1, at least one of the 1 st glass substrate GB1 and the 2 nd glass substrate GB2 has a plurality of light reducing portions 1 covering the bright point defect 133 when viewed from the display surface side, and as the light reducing portions, a broken line shape in which a plurality of colored layers are continuously bent is formed in a cross section in the thickness direction orthogonal to the longitudinal direction of the linear transmissive portion, and the transmissive portion is positioned at the bent end portion of the broken line, whereby the final scanning portion of the colored layer on the lower layer side of the adjacent colored layer is covered with the first scanning portion on the upper layer side, and the light colored portion can be prevented from being formed. In other words, the final scanning portion and the initial scanning portion of the adjacent colored layers 2 that overlap in the thickness direction of the glass substrate are at the same scanning position. With this configuration, the final scanning portion of the colored layer 2 on the lower layer side of the adjacent colored layers 2 is covered with the first scanning portion of the colored layer 2 on the upper layer side, so that the region 8 with a lighter color is not formed, and the reduction in display quality due to the bright point defect can be suppressed.
Although the processing in the state where the polarizing plate POL2 is not present has been described in embodiment 1 of the present invention, the same results and effects can be obtained also for a liquid crystal panel to which the polarizing plate POL2 is attached by using the laser light 4 in the polarized light state transmitted through POL 2.
Further, although laser light is irradiated from the front side of the panel, the colored layer 2 is formed in GB1 by irradiation from the back side of the panel, whereby the backlight light irradiated with foreign matter can also be weakened.
In addition, any of the various embodiments or modifications can be combined as appropriate to achieve the effects of each. Further, combinations of the embodiments or examples or combinations of the embodiments and examples can be made, and combinations of features in different embodiments or examples can also be made.
Industrial applicability
The display device according to the above aspect of the present invention, the manufacturing method and the manufacturing apparatus thereof, can suppress the reduction of the display quality due to the bright point defect, and are particularly useful for a liquid crystal display or an organic EL flat panel display incorporating a display device, and can be widely used for a display device requiring a display with high luminance, high definition, and image quality uniformity, a manufacturing method and a manufacturing apparatus thereof, and an electric apparatus or an apparatus having the display device.
Claims (6)
1. A display device is provided with:
a1 st glass substrate; and
a2 nd glass substrate facing the 1 st glass substrate and positioned on the display surface side,
the display device has a light-reducing portion that covers a bright point defect portion when viewed from the display surface side, in at least one of the 1 st glass substrate and the 2 nd glass substrate,
the light reducing section has a linear transmitting section having a visible light transmittance higher than that of other regions of the light reducing section at one end of the light reducing section as viewed from the display surface side,
a cross section of the light reducing part in a thickness direction orthogonal to a longitudinal direction of the linear transmissive part is a broken line shape in which a plurality of colored layers are continuously and bent, and the transmissive part is located at a bent end of the broken line,
the final scanning portion of the colored layer on the lower layer side of the adjacent colored layer is covered with the initial scanning portion of the colored layer on the upper layer side.
2. The display device according to claim 1,
the light reducing portion is a portion formed in a circular shape, an elliptical shape, a rounded polygonal shape, an oval shape, or a polygonal shape of a triangle or more in a plan view.
3. The display device according to claim 1,
the polyline has more than 2 vertices.
4. A display device according to any one of claims 1 to 3,
the transmissive portion is located in a colored layer located closest to the display surface among the plurality of colored layers.
5. A method of manufacturing a display device, the display device comprising: a1 st glass substrate, and a2 nd glass substrate facing the 1 st glass substrate and positioned on a display surface side,
the manufacturing method of the display device includes:
irradiating the 1 st glass substrate or the 2 nd glass substrate with laser light so as to cover the bright point defect portion, and condensing the laser light into at least one of the 1 st glass substrate and the 2 nd glass substrate;
a step of forming a1 st colored layer of the light reducing section covering the bright point defect section in a planar shape from a scanning start position to a scanning end position, as viewed from the display surface side, by relatively moving the laser beam and the display device; and
next, the step of forming the dimming portion by relatively moving the laser beam and the display device, starting scanning with the scanning end position of the 1 st colored layer as a scanning start position and forming a2 nd colored layer of the dimming portion into a planar shape until the scanning end position, the 1 st colored layer and the 2 nd colored layer being arranged so as to overlap each other in a cross section in a thickness direction of the 2 nd glass substrate as viewed from the display surface side, the 1 st colored layer and the 2 nd colored layer forming a continuous and bent broken line shape in the 2 nd colored layer,
the laser light irradiated in the step of irradiating the laser light has a wavelength of 100nm or more and 10 μm or less, a pulse width of 1 femtosecond or more and 100 picoseconds or less, a pulse energy of 0.1 μ J or more and 1mJ or less, and is condensed by a lens having an NA of 0.1 or more and 0.95 or less.
6. A manufacturing apparatus for a display device, which manufactures a display device, the display device comprising: a1 st glass substrate, and a2 nd glass substrate facing the 1 st glass substrate and positioned on a display surface side,
the manufacturing device of the display device comprises:
a laser irradiation device that irradiates the 1 st glass substrate or the 2 nd glass substrate with laser light so as to cover the bright point defect portion;
a lens configured to condense the laser light irradiated from the laser irradiation device into at least one of the 1 st glass substrate and the 2 nd glass substrate;
a display device holding device that holds the display device; and
a driving device configured to move the laser beam from the laser irradiation device relative to the display device held by the display device holding device, thereby forming a1 st colored layer of the dimming portion covering the bright point defect portion in a planar shape from a scanning start position to a scanning end position when viewed from the display surface side, and then forming a2 nd colored layer of the dimming portion in a planar shape when viewed from the display surface side by moving the laser beam relative to the display device, wherein the 1 st colored layer and the 2 nd colored layer are arranged so as to overlap each other when viewed from the display surface side, and the 1 st colored layer and the 2 nd colored layer are formed in a broken line shape in which the 1 st colored layer and the 2 nd colored layer are continuous and bent in a cross section in a thickness direction of the 2 nd glass substrate, thereby forming the light-reducing portion so as to form the light-reducing portion,
the laser light irradiated from the laser irradiation device has a wavelength of 100nm or more and 10 μm or less, a pulse width of 1 femtosecond or more and 100 picoseconds or less, a pulse energy of 0.1 μ J or more and 1mJ or less, and is condensed by a lens having an NA of 0.1 or more and 0.95 or less.
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| JP2016255760A JP6362013B2 (en) | 2016-12-28 | 2016-12-28 | Display device, manufacturing method thereof, and manufacturing apparatus |
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| JP2018106124A (en) | 2018-07-05 |
| KR20180077007A (en) | 2018-07-06 |
| JP6362013B2 (en) | 2018-07-25 |
| KR102368452B1 (en) | 2022-02-28 |
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