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CN108101547A - 光学镀膜材料及其制作方法 - Google Patents

光学镀膜材料及其制作方法 Download PDF

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CN108101547A
CN108101547A CN201711399300.1A CN201711399300A CN108101547A CN 108101547 A CN108101547 A CN 108101547A CN 201711399300 A CN201711399300 A CN 201711399300A CN 108101547 A CN108101547 A CN 108101547A
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nitride
filming material
optical filming
mixture
boron nitride
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秦海波
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Beijing Fuxingkai Photo-Electronic Tech Co Ltd
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Abstract

本发明提供了一种光学镀膜材料及其制作方法，光学镀膜材料由如下重量百分比的各组分组成：氮化硼：50‑100％，其它氮化物：0‑50％，其它氮化物包括：Si3N4、Ti3N2和Zr3N4。上述制作方法包括：选取氮化硼和其它氮化物的混合物，混合物中按照重量百分比氮化硼占50‑100％，其它氮化物占0‑50％；将混合物制成颗粒状、片状或者板状后，将混合物在空气或真空或氮气或者氢气保护下进行烧结，烧结温度为800‑2000℃，生成一定强度的片状、颗粒状或板材状的光学镀膜材料。本发明的光学镀膜材料通过镀膜在刀具刀口等器具上，可以实现刀具刀口不粘胶，从而可以增加刀具的使用寿命，减少刀具的更换频率，降低企业的成本。

Description

光学镀膜材料及其制作方法
技术领域
本发明涉及镀膜材料技术领域，尤其涉及一种光学镀膜材料及其制作方法。
背景技术
在切割行业，最易损的是刀具刀口，刀口的磨损和更换，常常会影响生产效率，同时，有些行业切割，如切割含胶的不干胶纸，由于有粘性胶的存在，导致常常粘接切口，影响生产效率。
因此，开发一种可以有效地增加刀具的使用寿命的镀膜材料是一个亟待解决的问题。
发明内容
本发明的实施例提供了一种光学镀膜材料及其制作方法，以增加刀具的使用寿命。
为了实现上述目的，本发明采取了如下技术方案。
根据本发明的一个方面，提供了一种光学镀膜材料，由如下重量百分比的各组分组成：氮化硼：50-100％，其它氮化物：0-50％。
进一步地，所述其它氮化物包括：Si3N4、Ti3N2和Zr3N4。
进一步地，所述光学镀膜材料在空气或真空条件下烧结，烧结温度在800-2000℃。
进一步地，所述光学镀膜材料为颗粒状、片状或者板状。
根据本发明的另一个方面，提供了一种光学镀膜材料的制作方法，包括：
选取氮化硼和其它氮化物的混合物，所述混合物中按照重量百分比氮化硼占50-100％，其它氮化物占0-50％；
将所述混合物制成颗粒状、片状或者板状后，将混合物在空气或真空或氮气或者氢气保护下进行烧结，烧结温度为800-2000℃，生成一定强度的片状、颗粒状或板材状的光学镀膜材料。
进一步地，所述其它氮化物包括：Si3N4、Ti3N2和Zr3N4。
由上述本发明的实施例提供的技术方案可以看出，本发明实施例的光学镀膜材料通过镀膜在刀具刀口等器具上，可以实现刀具刀口不粘胶，从而可以增加刀具的使用寿命，减少刀具的更换频率，降低企业的成本。
本发明附加的方面和优点将在下面的描述中部分给出，这些将从下面的描述中变得明显，或通过本发明的实践了解到。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明实施例提供的一种光学镀膜材料的制作方法的处理流程图。
具体实施方式
下面详细描述本发明的实施方式，所述实施方式的示例在附图中示出，其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施方式是示例性的，仅用于解释本发明，而不能解释为对本发明的限制。
本技术领域技术人员可以理解，除非特意声明，这里使用的单数形式“一”、“一个”、“所述”和“该”也可包括复数形式。应该进一步理解的是，本发明的说明书中使用的措辞“包括”是指存在所述特征、整数、步骤、操作、元件和/或组件，但是并不排除存在或添加一个或多个其他特征、整数、步骤、操作、元件、组件和/或它们的组。应该理解，当我们称元件被“连接”或“耦接”到另一元件时，它可以直接连接或耦接到其他元件，或者也可以存在中间元件。此外，这里使用的“连接”或“耦接”可以包括无线连接或耦接。这里使用的措辞“和/或”包括一个或更多个相关联的列出项的任一单元和全部组合。
本技术领域技术人员可以理解，除非另外定义，这里使用的所有术语(包括技术术语和科学术语)具有与本发明所属领域中的普通技术人员的一般理解相同的意义。还应该理解的是，诸如通用字典中定义的那些术语应该被理解为具有与现有技术的上下文中的意义一致的意义，并且除非像这里一样定义，不会用理想化或过于正式的含义来解释。
为便于对本发明实施例的理解，下面将结合附图以几个具体实施例为例做进一步的解释说明，且各个实施例并不构成对本发明实施例的限定。
在实际工作中，发现一类层状结构材料，如石墨、氮化硼、硼砂、滑石等材料，由于具有层状结构，在运动过程中，很易脱落，这样可以使材料不容易粘在上面。但石墨发黑，易污染其它物体。硼砂、滑石强度太低，只有氮化硼材料，不仅强度高、白色，不污染其它物体，还具有层分子结构，层与层之间可以滑动，这两点满足硬度高、耐磨、不粘、不污染物体等几方面的要求。
基于上述特点，本发明实施例选用氮化硼和其它氮化物的混合物作为一种硬度高、耐磨损和胶类不粘结的光学镀膜材料，上述其它氮化物可以为：Si3N4、Ti3N2和Zr3N4。
本领域技术人员应能理解上述其它氮化物的应用类型仅为举例，其他现有的或今后可能出现的其它氮化物的应用类型如可适用于本发明实施例，也应包含在本发明保护范围以内，并在此以引用方式包含于此。
上述光学镀膜材料由如下重量百分比的各组分组成：氮化硼：50-100％，其它氮化物占：0-50％。
上述光学镀膜材料是在空气或真空条件下烧结，烧结温度在800-2000℃。
上述光学镀膜材料可以是颗粒，也可以是不同尺寸的片、板。
图1为本发明实施例提供的一种光学镀膜材料的制作方法的处理流程图，包括如下的处理流程：
步骤S110、选取氮化硼和其它氮化物的混合物，所述混合物中按照重量百分比氮化硼占50-100％，其它氮化物占0-50％，所述其它氮化物包括：Si3N4、Ti3N2和Zr3N4。
步骤S120、将氮化硼或含一定氮化硼的混合物造粒或压片，或制成一定尺寸的板材。
步骤S130、将颗粒状、片状或者板材状的混合物在空气或真空或氮气保护、氢气保护下进行烧结，烧结温度为800-2000℃，生成一定强度的片状、颗粒状或板材状的光学镀膜材料。
将生成的光学镀膜材料在真空镀膜中进行实验，镀膜机的直径为1100mm，镀膜机的基片温度为200℃，材料的蒸发速率为10A°/S，双面镀膜的厚度为100nm，实验结果如下附表一。
附表一：
通过附表一实验，我们发现刀具刀口上镀上述光学镀膜材料，不仅不粘胶，而且使用寿命成倍的增加，降低了企业的成本，因刀具使用寿命的增加，减少了刀具的更换频率，提高了生产效率。
综上所述，本发明实施例的光学镀膜材料具有硬度高、耐磨损和胶类不粘结的特点，通过镀膜在刀具刀口等器具上，可以实现刀具刀口不粘胶，从而可以增加刀具的使用寿命，减少刀具的更换频率，降低了企业的成本。
本领域普通技术人员可以理解：附图只是一个实施例的示意图，附图中的模块或流程并不一定是实施本发明所必须的。
本说明书中的各个实施例均采用递进的方式描述，各个实施例之间相同相似的部分互相参见即可，每个实施例重点说明的都是与其他实施例的不同之处。尤其，对于装置或系统实施例而言，由于其基本相似于方法实施例，所以描述得比较简单，相关之处参见方法实施例的部分说明即可。以上所描述的装置及系统实施例仅仅是示意性的，其中所述作为分离部件说明的单元可以是或者也可以不是物理上分开的，作为单元显示的部件可以是或者也可以不是物理单元，即可以位于一个地方，或者也可以分布到多个网络单元上。可以根据实际的需要选择其中的部分或者全部模块来实现本实施例方案的目的。本领域普通技术人员在不付出创造性劳动的情况下，即可以理解并实施。
以上所述，仅为本发明较佳的具体实施方式，但本发明的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本发明揭露的技术范围内，可轻易想到的变化或替换，都应涵盖在本发明的保护范围之内。因此，本发明的保护范围应该以权利要求的保护范围为准。

Claims (6)

1.一种光学镀膜材料，其特征在于，由如下重量百分比的各组分组成：氮化硼：50-100％，其它氮化物：0-50％。
2.根据权利要求1所述的光学镀膜材料，其特征在于，所述其它氮化物包括：Si3N4、Ti3N2和Zr3N4。
3.根据权利要求1所述的光学镀膜材料，其特征在于，所述光学镀膜材料在空气或真空条件下烧结，烧结温度在800-2000℃。
4.根据权利要求1所述的光学镀膜材料，其特征在于，所述光学镀膜材料为颗粒状、片状或者板状。
5.一种光学镀膜材料的制作方法，其特征在于，包括：
选取氮化硼和其它氮化物的混合物，所述混合物中按照重量百分比氮化硼占50-100％，其它氮化物占0-50％；
将所述混合物制成颗粒状、片状或者板状后，将混合物在空气或真空或氮气或者氢气保护下进行烧结，烧结温度为800-2000℃，生成一定强度的片状、颗粒状或板材状的光学镀膜材料。
6.根据权利要求5所述的光学镀膜材料的制作方法，其特征在于，所述其它氮化物包括：Si3N4、Ti3N2和Zr3N4。
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