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CN108046268A - The method that plasma enhanced chemical vapor synthetic method prepares high-purity nm boron carbide powder - Google Patents

The method that plasma enhanced chemical vapor synthetic method prepares high-purity nm boron carbide powder Download PDF

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CN108046268A
CN108046268A CN201711313870.4A CN201711313870A CN108046268A CN 108046268 A CN108046268 A CN 108046268A CN 201711313870 A CN201711313870 A CN 201711313870A CN 108046268 A CN108046268 A CN 108046268A
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蔡杉
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Jiangxi Rui Fine Chemical Co Ltd
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    • B82NANOTECHNOLOGY
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    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity

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Abstract

等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,首先将氩气导入等离子发生器,启动等离子体发生电源产生电弧放电,形成稳定的氩气等离子体弧;再将氢气与甲烷导入等离子发生器,与氩气等离子体混合放电形成等离子体射流;而后将等离子体射流导入等离子发生器下方的反应器,同时从反应器导入三氯化硼气体,与等离子体射流撞击迅速混合完成气相合成反应,空间生成固态B4C和气态HCl;固态B4C随气流喷射至冷却收粉器的冷却壁上骤冷沉积形成纳米碳化硼粉体;工艺步骤简单,一步制得成品;等离子体反应效率极高且气相反应无外来杂质,制得的碳化硼粉体纯度高且粒度均匀,无需后处理即可用于制备陶瓷材料,具有更好的综合优势。

The method of preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis method firstly introduces argon gas into the plasma generator, starts the plasma generator power supply to generate arc discharge, and forms a stable argon plasma arc; then introduces hydrogen and methane into the plasma The generator is mixed with argon plasma to form a plasma jet; then the plasma jet is introduced into the reactor below the plasma generator, and at the same time, boron trichloride gas is introduced from the reactor to collide with the plasma jet and quickly mix to complete the gas phase synthesis Reaction, the space generates solid B 4 C and gaseous HCl; solid B 4 C is sprayed with the airflow to the cooling wall of the cooling powder collector to form nano-boron carbide powder; the process steps are simple, and the finished product is produced in one step; plasma reaction The efficiency is extremely high and the gas phase reaction has no foreign impurities. The boron carbide powder produced has high purity and uniform particle size, and can be used to prepare ceramic materials without post-processing, which has better comprehensive advantages.

Description

等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法Method for preparing high-purity nano boron carbide powder by plasma chemical vapor phase synthesis

技术领域technical field

本发明涉及无机非金属材料制备技术领域,尤其涉及一种等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法。The invention relates to the technical field of preparation of inorganic non-metallic materials, in particular to a method for preparing high-purity nano boron carbide powder by a plasma chemical vapor phase synthesis method.

背景技术Background technique

碳化硼由于具有高硬度、高模量、高熔点、低密度、耐磨性好、耐酸碱腐蚀性强等特点,并且具有较高的中子吸收能力及半导体导电性等诸多优点,在耐火材料、硬质材料、工业陶瓷、防弹陶瓷、核工业、航天航空及半导体工业等领域得到广泛应用。碳化硼陶瓷材料制备主要工艺是粉末制备、成型与烧结,由于碳化硼是一种共价键很强的化合物,使得其很难进行烧结,为了提高烧结质量,必须采用超细、高纯的碳化硼粉体,纳米尺度的碳化硼粉体由于具有小尺寸效应、量子效应、不饱和价效应和电子隧道效应等,使其具有易烧结的特性,是碳化硼粉体发展的一个重要方向,具有非常大的开发价值和应用前景。Boron carbide has the characteristics of high hardness, high modulus, high melting point, low density, good wear resistance, strong acid and alkali corrosion resistance, etc., and has many advantages such as high neutron absorption capacity and semiconductor conductivity. Materials, hard materials, industrial ceramics, bulletproof ceramics, nuclear industry, aerospace and semiconductor industries and other fields are widely used. The main process of boron carbide ceramic material preparation is powder preparation, molding and sintering. Since boron carbide is a compound with strong covalent bonds, it is difficult to sinter. In order to improve the sintering quality, ultrafine, high-purity carbonization must be used. Boron powder, nanoscale boron carbide powder has the characteristics of easy sintering due to its small size effect, quantum effect, unsaturated valence effect and electron tunnel effect, which is an important direction for the development of boron carbide powder. Very great development value and application prospect.

碳化硼粉末的工业制取方法主要有高温自蔓延合成法(SHS)和碳热还原法,近年来还出现有激光化学气相反应法、溶胶-凝胶碳热还原法等,高温自蔓延合成法多以镁为助熔剂,又称镁热法,具有节约能源、反应迅速等优点,但缺点是所合成的碳化硼粉的粒度仅为微米级且反应物中残留的镁及氧化镁杂质极难彻底除去;碳热还原法是将含硼的化合物与碳粉或含碳的化合物放入碳管炉或电弧炉中,通以保护气体在一定温度下合成碳化硼粉末,该方法的缺点是能耗大、效率低、合成的粉末粒径大(20~40μm)且含有难以去除的碳粉或硼酐等杂质,作为烧结碳化硼的原料还需要大量的后处理工序,大大增加了生产成本;激光诱导化学气相沉积法(LICVD)是利用反应气体分子对特定波长激光束的吸收进而产生热分解或化学反应,经成核生长形成超细粉末,该方法生产能力较低,设备昂贵,能耗大且对反应原料的纯度要求较高;溶胶-凝胶(sol-gel)碳热还原法是将无机物或金属醇盐经过溶液、溶胶、凝胶而固化,再经热处理合成化合物的方法,由于提供硼源的硼化物很难与其他无机物或有机物形成凝胶,故用此法合成碳化硼的工艺复杂且成本高。The industrial preparation methods of boron carbide powder mainly include high-temperature self-propagating synthesis (SHS) and carbothermal reduction method. In recent years, laser chemical gas phase reaction method, sol-gel carbothermal reduction method, etc. Magnesium is mostly used as flux, also known as magnesia thermal method, which has the advantages of energy saving and rapid reaction, but the disadvantage is that the particle size of the synthesized boron carbide powder is only micron and the residual magnesium and magnesium oxide impurities in the reactant are extremely difficult Thorough removal; the carbothermal reduction method is to put boron-containing compounds and carbon powder or carbon-containing compounds into a carbon tube furnace or electric arc furnace, and synthesize boron carbide powder at a certain temperature with a protective gas. The disadvantage of this method is that it can High consumption, low efficiency, large particle size of the synthesized powder (20-40μm) and containing impurities such as carbon powder or boric anhydride that are difficult to remove, as a raw material for sintered boron carbide, a large number of post-processing procedures are required, which greatly increases the production cost; Laser Induced Chemical Vapor Deposition (LICVD) uses the absorption of specific wavelength laser beams by reaction gas molecules to generate thermal decomposition or chemical reaction, and form ultrafine powder through nucleation and growth. This method has low production capacity, expensive equipment and energy consumption. Large and high purity requirements for reaction raw materials; sol-gel (sol-gel) carbothermal reduction method is to solidify inorganic substances or metal alkoxides through solutions, sols, and gels, and then synthesize compounds by heat treatment. Since borides that provide boron sources are difficult to form gels with other inorganic or organic substances, the process of synthesizing boron carbide by this method is complex and costly.

发明内容Contents of the invention

本发明所解决的技术问题在于提供一种等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,以解决上述背景技术中的缺点。The technical problem to be solved by the present invention is to provide a method for preparing high-purity nano boron carbide powder by plasma chemical vapor phase synthesis, so as to solve the above-mentioned shortcomings in the background technology.

本发明所解决的技术问题采用以下技术方案来实现:The technical problem solved by the present invention adopts following technical scheme to realize:

等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,采用等离子体化学气相合成法制备高纯纳米碳化硼粉末的装置制备高纯纳米碳化硼粉末,具体步骤如下:A method for preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis, using a device for preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis to prepare high-purity nano-boron carbide powder, the specific steps are as follows:

1)将氩气导入等离子发生器,启动等离子体发生电源产生电弧放电,形成稳定的氩气等离子体弧;1) Introduce argon gas into the plasma generator, start the plasma generating power supply to generate arc discharge, and form a stable argon plasma arc;

2)再将氢气与甲烷导入等离子发生器,与氩气等离子体混合放电形成等离子体射流,等离子体射流中包含大量的电离离子及解离的还原活性极高的氢原子和碳原子;2) Then introduce hydrogen and methane into the plasma generator, and mix and discharge with argon plasma to form a plasma jet, which contains a large number of ionized ions and dissociated highly active hydrogen atoms and carbon atoms;

3)而后将等离子体射流导入等离子发生器下方的反应器,同时从反应器的三氯化硼进气孔导入三氯化硼气体,与等离子体射流撞击迅速混合均匀,在等离子体的高温及活性粒子的作用下三氯化硼断键与射流中的C、H原子快速进行气相合成反应,空间生成固态B4C和气态HCl;3) Then the plasma jet is introduced into the reactor below the plasma generator, and boron trichloride gas is introduced from the boron trichloride inlet hole of the reactor at the same time, and it is quickly mixed with the plasma jet and mixed evenly. Under the action of active particles, boron trichloride breaks bonds and reacts quickly with C and H atoms in the jet, and generates solid B 4 C and gaseous HCl in space;

4)步骤3)中生成的固态B4C随气流喷射至冷却收粉器的冷却壁上骤冷沉积形成纳米碳化硼粉体;4) The solid B 4 C generated in step 3) is sprayed with the airflow to the cooling wall of the cooling powder collector for quenching deposition to form nano boron carbide powder;

5)步骤4)中的部分纳米碳化硼粉体在气流的带动下进入水吸收气固分离收粉器,粉末被水吸收而气体溢出,最后收集粉末并经洗涤、干燥后得到纳米碳化硼粉体。5) Part of the nano boron carbide powder in step 4) is driven by the airflow into the water absorption gas-solid separation powder collector, the powder is absorbed by water and the gas overflows, and finally the powder is collected and washed and dried to obtain nano boron carbide powder body.

在本发明中,步骤1)中,氩气流量1.5~2m3/h,压力0.3~0.5MPa,启动等离子体发生电源产生电弧放电的功率为10KW,电流为105~115A,电压为90~100V。In the present invention, in step 1), the flow rate of argon gas is 1.5-2m 3 /h, the pressure is 0.3-0.5MPa, the power of starting the plasma generating power supply to generate arc discharge is 10KW, the current is 105-115A, and the voltage is 90-100V .

在本发明中,步骤2)中,氢气与甲烷的体积流量比为4~6:1,供气压力0.3~0.5MPa,调节等离子发生器的电源使其输出功率为10~100KW。In the present invention, in step 2), the volume flow ratio of hydrogen to methane is 4-6:1, the gas supply pressure is 0.3-0.5 MPa, and the power supply of the plasma generator is adjusted so that the output power is 10-100KW.

在本发明中,步骤3)中,三氯化硼与甲烷的体积流量比为4:1,三氯化硼加热温度40~60℃,三氯化硼供气压力0.3~0.5MPa。In the present invention, in step 3), the volume flow ratio of boron trichloride to methane is 4:1, the heating temperature of boron trichloride is 40-60° C., and the gas supply pressure of boron trichloride is 0.3-0.5 MPa.

在本发明中,等离子体化学气相合成法制备高纯纳米碳化硼粉末的装置包括等离子体发生电源、等离子发生器、反应器、冷却收粉器、水吸收气固分离收粉器、尾气吸收器、氩气源、氢气源、甲烷气源及三氯化硼气源,其中,所述等离子发生器为由聚四氟材料绝缘组成的半封闭容器,半封闭容器上端封闭下端开口,且在半封闭容器上部设置有铈钨材料制成的阴极,半封闭容器下部设置有铜材料制成的阳极,阴极与等离子体发生电源负极连接,阳极与等离子体发生电源正极连接;同时在等离子发生器阴极底部设有用于通过氩气源导入氩气的氩气进气孔,等离子发生器阳极顶部设有用于通过氢气源导入氢气及通过甲烷气源导入甲烷的混合气进气孔;等离子发生器内置有冷却循环水系统进行冷却保护,为工作在大气压或更高气压的等离子发生器降温;所述反应器与等离子发生器的下端密封连接,反应器顶部对称设置有两个用于通过三氯化硼气源导入三氯化硼气体的三氯化硼进气孔,三氯化硼气源外设置有用于三氯化硼进行加热汽化的三氯化硼加热源,反应器下端口置于冷却收粉器内,冷却收粉器的外夹套设置有循环冷却水系统,进行冷却降温,所述水吸收气固分离收粉器与冷却收粉器出口连接,并在氩气源、氢气源、甲烷气源及三氯化硼气源四个气源出口端分别设置有流量计,所述氩气源经流量计计量后连接至等离子发生器阴极底部氩气进气孔,所述氢气源与甲烷气源分别经流量计计量后连接至等离子发生器阳极顶部的氢气和甲烷混合气进气孔,所述三氯化硼气源经三氯化硼加热源加热汽化后再经流量计计量后连接至反应器顶部的三氯化硼进气孔,所述水吸收气固分离收粉器与尾气吸收器连接。In the present invention, the device for preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis method includes a plasma generating power supply, a plasma generator, a reactor, a cooling powder collector, a water absorption gas-solid separation powder collector, and an exhaust gas absorber. , argon gas source, hydrogen gas source, methane gas source and boron trichloride gas source, wherein, the plasma generator is a semi-closed container made of polytetrafluoro material insulation, the upper end of the semi-closed container is closed and the lower end is open, and in the semi-closed The upper part of the closed container is provided with a cathode made of cerium-tungsten material, and the lower part of the semi-closed container is provided with an anode made of copper material. The cathode is connected to the negative pole of the plasma generator power supply, and the anode is connected to the positive pole of the plasma generator power supply; There is an argon gas inlet hole at the bottom for introducing argon through the argon source, and a mixed gas inlet hole for introducing hydrogen through the hydrogen source and methane through the methane gas source at the top of the anode of the plasma generator; the plasma generator has a built-in The cooling circulating water system is used for cooling protection to cool down the plasma generator working at atmospheric pressure or higher pressure; the reactor is sealed and connected to the lower end of the plasma generator, and the top of the reactor is symmetrically arranged with two for the passage of boron trichloride The gas source is introduced into the boron trichloride inlet hole of the boron trichloride gas, and the boron trichloride heating source for heating and vaporizing the boron trichloride is arranged outside the boron trichloride gas source, and the lower port of the reactor is placed in a cooling and receiving port. In the powder collector, the outer jacket of the cooling powder collector is provided with a circulating cooling water system for cooling and cooling. The water absorbing gas-solid separation powder collector is connected to the outlet of the cooling powder collector, and is connected to the argon source, hydrogen source, The four gas source outlets of the methane gas source and the boron trichloride gas source are respectively provided with flowmeters, and the argon gas source is connected to the argon gas inlet hole at the bottom of the cathode of the plasma generator after being measured by the flowmeter. The methane gas source is measured by the flowmeter and connected to the hydrogen and methane mixture gas inlet hole on the top of the anode of the plasma generator. The boron trichloride gas source is heated and vaporized by the boron trichloride heating source and then measured by the flowmeter It is connected to the boron trichloride air inlet at the top of the reactor, and the water absorption gas-solid separation powder collector is connected to the tail gas absorber.

在本发明中,所述等离子体发生电源为输出功率为10~100kW的直流电弧电源。In the present invention, the plasma generating power supply is a DC arc power supply with an output power of 10-100 kW.

在本发明中,所述氩气进气孔、混合气进气孔均为环状切线结构。In the present invention, the argon gas inlet and the mixed gas inlet are both annular tangent structures.

在本发明中,所述反应器为含水冷外夹套和通孔石墨管构成的管式反应器。In the present invention, the reactor is a tubular reactor composed of a water-cooled outer jacket and a through-hole graphite tube.

在本发明中,所述冷却收粉器由上部含对称开口视镜的柱形桶身、中部为沉降锥形桶身及底部为积粉罐组成。In the present invention, the cooling powder collector is composed of a cylindrical barrel body with a symmetrical opening mirror on the upper part, a conical sedimentation barrel body in the middle part and a powder accumulation tank at the bottom.

在本发明中,所述水吸收气固分离收粉器上设置有用于连接冷却收粉器出口的伸底管和用于连接尾气吸收器的出气管。In the present invention, the water absorption gas-solid separation powder collector is provided with a bottom extension pipe for connecting the outlet of the cooling powder collector and an air outlet pipe for connecting the tail gas absorber.

在本发明中,所述伸底管伸入水面以下5cm。In the present invention, the bottom extension pipe extends 5cm below the water surface.

在本发明中,所述流量计为空气标定的转子流量计。In the present invention, the flowmeter is an air calibrated rotameter.

在本发明中,所述尾气吸收器为尾气喷淋吸收塔。In the present invention, the tail gas absorber is a tail gas spray absorption tower.

在本发明中,所述氩气在反应中一直使用,即作为吹扫置换气体,又做保护气体,可延长等离子发生器的使用寿命。In the present invention, the argon gas is always used in the reaction, that is, as a purge replacement gas and as a protective gas, which can prolong the service life of the plasma generator.

在本发明中,所述氩气、氢气、甲烷、三氯化硼的纯度均为99.99%。In the present invention, the purity of the argon, hydrogen, methane and boron trichloride is all 99.99%.

有益效果:本发明采用等离子体反应工艺步骤简单,可一步制得成品;且等离子体产生的高温及大量活性粒子使得合成反应速率极高,生产效率高;同时气相反应体系中非产品物质均以气体溢出,没有外来杂质,制得的碳化硼粉体纯度高;而等离子体气相合成反应生成的固相产物具有空间均匀成核及气流喷射分散和冷壁骤冷沉积的特点,使制得的碳化硼粉末超细且粒度分布均匀,碳化硼粉收率最高可达到68%以上,产品的纯度可达99%以上,其平均粒径大约在30~80nm之间,无需后处理即可用于制备陶瓷材料,与传统工艺方法相比具有更好的综合优势。Beneficial effects: the invention adopts the plasma reaction process with simple steps, and the finished product can be produced in one step; and the high temperature and a large number of active particles generated by the plasma make the synthesis reaction rate extremely high and the production efficiency high; at the same time, the non-product substances in the gas phase reaction system are all in the form of The gas overflows, there is no foreign impurity, and the boron carbide powder produced is of high purity; while the solid-phase product generated by the plasma gas-phase synthesis reaction has the characteristics of uniform nucleation in space, air jet dispersion and cold wall quenching deposition, which makes the prepared boron carbide powder The boron carbide powder is ultra-fine and has a uniform particle size distribution. The highest yield of boron carbide powder can reach more than 68%, the purity of the product can reach more than 99%, and its average particle size is about 30-80nm. It can be used for preparation without post-treatment Ceramic materials have better comprehensive advantages compared with traditional craft methods.

附图说明Description of drawings

图1为本发明的较佳实施例的结构示意图。Fig. 1 is a schematic structural diagram of a preferred embodiment of the present invention.

图2为本发明的较佳实施例中的碳化硼粉末产品SEM照片。Fig. 2 is the SEM picture of the boron carbide powder product in the preferred embodiment of the present invention.

图3为本发明的较佳实施例中的碳化硼粉末产品X射线衍射(XRD)图谱。Fig. 3 is an X-ray diffraction (XRD) spectrum of the boron carbide powder product in a preferred embodiment of the present invention.

具体实施方式Detailed ways

为了使本发明实现的技术手段、创作特征、达成目的与功效易于明白清晰,下面结合具体图示,进一步阐述本发明。In order to make the technical means, creative features, goals and effects achieved by the present invention easy to understand, the present invention will be further described below in conjunction with specific illustrations.

参见图1~图3的等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,采用等离子体化学气相合成法制备高纯纳米碳化硼粉末的装置制备高纯纳米碳化硼粉末,所述等离子体化学气相合成法制备高纯纳米碳化硼粉末的装置包括等离子体发生电源1、等离子发生器2、反应器3、冷却收粉器4、水吸收气固分离收粉器5、氩气源6、氢气源7、甲烷气源8、三氯化硼气源9、流量计10、三氯化硼加热源11、尾气喷淋吸收塔12、伸底管13及出气管14,其中,所述等离子体发生电源1为直流电弧电源,输出功率为10~100kW可调,所述等离子发生器2上部为铈钨材料制成的棒状阴极,下部为铜材料制成的环状阳极,且阴极与阳极由聚四氟材料绝缘组成一个上端封闭下端开口的容器,阴极与直流电弧电源负极连接,阳极与直流电弧电源正极连接;等离子发生器2的阴极底部设有环状切线氩气进气孔用于通过氩气源6导入氩气、阳极顶部设有环状切线氢气进气孔用于通过氢气源7与甲烷气源8分别导入氢气和甲烷的混合气进气孔;等离子发生器2采用内置冷却循环水系统进行冷却保护,为工作在大气压或更高气压的直流电弧热等离子发生器降温,故无需在真空条件下进行;所述反应器3为与等离子发生器2的下端密封连接的含水冷外夹套及通孔石墨管构成的管式反应器,反应器3顶部对称设置有三氯化硼进气孔用于通过三氯化硼气源9导入三氯化硼气体,所述反应器3的下端口置于所述冷却收粉器4内,冷却收粉器4由上部含对称开口视镜的柱形桶身、中部为沉降锥形桶身及底部为积粉罐组成,并采用外夹套循环冷却水系统进行冷却,所述水吸收气固分离收粉器5为包含连接冷却收粉器4出口的伸底管13及出气管14的密封容器,其中伸底管伸入水面以下5cm,所述氩气源6经流量计10计量后连接至等离子发生器2阴极底部氩气进气孔,所述氢气源7与甲烷气源8分别经流量计10计量后连接至等离子发生器阳极顶部的混合气进气孔,所述三氯化硼气源9经三氯化硼加热源11加热汽化后再经流量计10计量后连接至反应器3顶部的三氯化硼进气孔,所述流量计10为空气标定的转子流量计,所述尾气喷淋吸收塔12与出气管14连接;采用等离子发生器将氩气电离为等离子体弧,同时将氢气、甲烷引入等离子体弧进行混合放电并形成高温等离子体射流,将此射流导入反应器,再将原料BCl3气体通过相向对称的三氯化硼进气孔也导入反应器与贯穿的等离子体射流混合,高温氢气、甲烷与BCl3迅速混合并解离进行空间重组,完成气相合成反应,获得碳化硼粉末产品,具体步骤如下:Referring to the method for preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis in Fig. 1 to Fig. 3, the device for preparing high-purity nano-boron carbide powder by plasma chemical vapor The device for preparing high-purity nano-boron carbide powder by bulk chemical vapor synthesis method includes plasma power supply 1, plasma generator 2, reactor 3, cooling powder collector 4, water absorption gas-solid separation powder collector 5, argon gas source 6 , hydrogen source 7, methane gas source 8, boron trichloride gas source 9, flow meter 10, boron trichloride heating source 11, tail gas spray absorption tower 12, bottom extension pipe 13 and outlet pipe 14, wherein, the The plasma generating power supply 1 is a DC arc power supply with an adjustable output power of 10-100kW. The upper part of the plasma generator 2 is a rod-shaped cathode made of cerium-tungsten material, and the lower part is a ring-shaped anode made of copper material, and the cathode and The anode is insulated by PTFE material to form a container with the upper end closed and the lower end open. The cathode is connected to the negative pole of the DC arc power supply, and the anode is connected to the positive pole of the DC arc power supply. Argon gas is introduced through the argon gas source 6, and a ring-shaped tangential hydrogen gas inlet hole is provided on the top of the anode, which is used to respectively introduce the mixed gas gas inlet hole of hydrogen and methane through the hydrogen gas source 7 and the methane gas source 8; the plasma generator 2 adopts a built-in The cooling circulating water system is used for cooling protection to cool down the DC arc thermal plasma generator working at atmospheric pressure or higher pressure, so it does not need to be carried out under vacuum conditions; A tubular reactor composed of a water-cooled outer jacket and a through-hole graphite tube. The top of the reactor 3 is symmetrically provided with boron trichloride air intake holes for introducing boron trichloride gas through the boron trichloride gas source 9. The reactor The lower port of 3 is placed in the cooling powder collector 4. The cooling powder collector 4 is composed of a cylindrical barrel body with a symmetrical opening mirror on the upper part, a conical barrel body for sedimentation in the middle, and a powder accumulation tank at the bottom. The outer jacket circulating cooling water system is used for cooling, and the water absorption gas-solid separation powder collector 5 is a sealed container including a bottom extension pipe 13 and an air outlet pipe 14 connected to the outlet of the cooling powder collector 4, wherein the bottom extension pipe extends into the water surface Below 5cm, the argon gas source 6 is connected to the argon gas inlet hole at the bottom of the cathode of the plasma generator 2 after being metered by the flow meter 10, and the hydrogen gas source 7 and the methane gas source 8 are respectively connected to the plasma generator after being metered by the flow meter 10 The mixed gas inlet hole at the top of the anode of the reactor, the boron trichloride gas source 9 is heated and vaporized by the boron trichloride heating source 11 and then connected to the boron trichloride gas inlet at the top of the reactor 3 after being metered by the flow meter 10 The flowmeter 10 is a rotameter calibrated with air, and the tail gas spray absorption tower 12 is connected to the gas outlet pipe 14; argon is ionized into a plasma arc by a plasma generator, and hydrogen and methane are introduced into the plasma at the same time The arc is mixed and discharged to form a high-temperature plasma jet. This jet is introduced into the reactor, and then the raw material BCl 3 gas is also introduced into the reactor through the oppositely symmetrical boron trichloride gas inlet holes to mix with the penetrating plasma jet. High-temperature hydrogen, Methane and BCl 3 rapidly Mix and dissociate for spatial recombination, complete the gas phase synthesis reaction, and obtain boron carbide powder products. The specific steps are as follows:

首先将氩气导入等离子发生器2,启动等离子体发生电源1产生氩气等离子体弧,再将氢气及甲烷导入等离子发生器2与氩气等离子体混合放电形成等离子体射流;而后将等离子体射流导入等离子发生器2下方的反应器3,同时从反应器3的三氯化硼进气孔导入三氯化硼气体,与等离子体射流撞击迅速混合完成气相合成反应,空间生成固态B4C和气态HCl;固态B4C随气流喷射至冷却收粉器4的冷却壁上骤冷沉积形成纳米碳化硼粉体;部分纳米碳化硼粉体在气流的带动下进入水吸收气固分离收粉器5,粉末被水吸收而气体溢出,最后收集粉末并经洗涤、干燥后得到纳米碳化硼粉体;尾气HCl由尾气喷淋吸收塔12处理;具体实施例如下:First, argon gas is introduced into the plasma generator 2, and the plasma generator power supply 1 is started to generate an argon plasma arc, and then hydrogen and methane are introduced into the plasma generator 2 and mixed with the argon plasma to form a plasma jet; then the plasma jet is It is introduced into the reactor 3 below the plasma generator 2, and at the same time, the boron trichloride gas is introduced from the boron trichloride inlet hole of the reactor 3, and it is rapidly mixed with the plasma jet to complete the gas-phase synthesis reaction, and the space generates solid B 4 C and Gaseous HCl; solid B 4 C is sprayed with the airflow to the cooling wall of the cooling powder collector 4 and quenched and deposited to form nano-boron carbide powder; part of the nano-boron carbide powder enters the water absorption gas-solid separation powder collector driven by the airflow 5. The powder is absorbed by water and the gas overflows, and finally the powder is collected and washed and dried to obtain nano-boron carbide powder; the tail gas HCl is treated by the tail gas spray absorption tower 12; specific examples are as follows:

实施例1Example 1

首先打开冷却循化水供至等离子发生器2、反应器3、冷却收粉器4,再打开氩气源6,气瓶压力维持在0.3MPa,送入氩气流量1.6m3/h,吹扫置换系统10min;打开等离子体发生电源1,旋转电流调节器,使电流数值处于105A,按启动开关,产生氩气等离子体炬,此时电压数值显示约90V,从观察窗可看到氩气等离子体弧,稳定1min;随后旋转电流调节器,使电流升至130 A,打开氢气源7与甲烷气源8,气瓶压力维持在0.3MPa,从流量计10(空气标定)慢慢送入氢气0.6 m3/h、甲烷0.6 m3/h,此时电压升至130 V,再旋转电流调节器将电流调至200A,此时等离子体射流放电功率为25KW,混合放电形成等离子体射流;打开三氯化硼气源9,由三氯化硼加热源11加热系统至恒温40℃,三氯化硼供气压力0.3MPa,慢慢送入三氯化硼约2.5kg/h;三氯化硼喷入等离子体射流,与其中电离、解离的氢气、甲烷进行等离子体气相合成反应,空间生成固态B4C和气态HCl;固态B4C随气流喷射至冷却收粉器4的冷却壁上骤冷沉积形成纳米碳化硼粉体并沉降至积粉罐收集;部分纳米碳化硼粉体在气流的带动下进入水吸收气固分离收粉器5,粉末被水吸收而气体溢出,收集粉末并经洗涤、干燥后得到纳米碳化硼粉体,尾气HCl由尾气喷淋吸收塔12处理;反应持续30min,积粉罐及水吸收气固分离收粉器5收集的碳化硼粉末总计70g;按三氯化硼的供给产出比计算,收料率大于60%,所得碳化硼粉末产品经XRD定性分析及SEM、EDS及ICP检测分析表明:碳化硼粉末粒径为30~80nm、纯度大于99%(其中:氧含量小于0.5%、总金属离子含量小于300ppm)。First turn on the cooling circulating water to supply to the plasma generator 2, the reactor 3, and the cooling powder collector 4, then turn on the argon gas source 6, keep the pressure of the gas cylinder at 0.3MPa, feed in the argon gas with a flow rate of 1.6m 3 /h, blow Scan the replacement system for 10 minutes; turn on the plasma generator power supply 1, rotate the current regulator to make the current value at 105A, press the start switch, and generate an argon plasma torch. At this time, the voltage value shows about 90V, and the argon gas can be seen from the observation window Stabilize the plasma arc for 1 min; then rotate the current regulator to increase the current to 130 A, turn on the hydrogen source 7 and the methane gas source 8, maintain the pressure of the gas cylinder at 0.3 MPa, and slowly feed it from the flow meter 10 (air calibration) Hydrogen is 0.6 m 3 /h, methane is 0.6 m 3 /h. At this time, the voltage is raised to 130 V, and then the current regulator is rotated to adjust the current to 200A. At this time, the plasma jet discharge power is 25KW, and the mixed discharge forms a plasma jet; Open the boron trichloride gas source 9, heat the system to a constant temperature of 40°C by the boron trichloride heating source 11, and the boron trichloride gas supply pressure is 0.3MPa, and slowly feed in about 2.5kg/h of boron trichloride; Boron is sprayed into the plasma jet, and the ionized and dissociated hydrogen and methane in it undergo plasma gas phase synthesis reaction, and the space generates solid B 4 C and gaseous HCl; solid B 4 C is sprayed with the air flow to the cooling of the cooling powder collector 4 The nano boron carbide powder is formed by quenching and depositing on the wall and is deposited into the powder accumulation tank for collection; part of the nano boron carbide powder enters the water absorption gas-solid separation powder collector 5 driven by the air flow, the powder is absorbed by water and the gas overflows, and is collected The powder is washed and dried to obtain nano-boron carbide powder, and the tail gas HCl is processed by the tail gas spray absorption tower 12; the reaction lasts for 30 minutes, and the total amount of boron carbide powder collected by the powder accumulation tank and the water absorption gas-solid separation powder collector 5 is 70g; Calculated according to the supply-output ratio of boron trichloride, the yield is greater than 60%. The obtained boron carbide powder product is qualitatively analyzed by XRD and detected by SEM, EDS and ICP. % (of which: the oxygen content is less than 0.5%, the total metal ion content is less than 300ppm).

实施例2Example 2

首先打开冷却循化水供至等离子发生器2、反应器3、冷却收粉器4,再打开氩气源6,气瓶压力维持在0.4MPa,送入氩气流量1.8m3/h,吹扫置换系统10min;打开等离子体发生电源1,旋转电流调节器,使电流数值处于110 A,按启动开关,产生氩气等离子体炬,此时电压数值显示约95V,从观察窗可看到氩气等离子体弧,稳定1min;随后旋转电流调节器,使电流升至200A,打开氢气源7与甲烷气源8,气瓶压力维持在0.4MPa,从流量计10(空气标定)慢慢送入氢气0.8m3/h、甲烷0.8 m3/h,此时电压升至200V,再旋转电流调节器将电流调至220A,此时等离子体射流放电功率为45KW,混合放电形成等离子体射流;打开三氯化硼气源9,由三氯化硼加热源11加热系统至恒温50℃,三氯化硼供气压力0.4MPa,慢慢送入三氯化硼约4.5kg/h;三氯化硼喷入等离子体射流,与其中电离、解离的氢气、甲烷进行等离子体气相合成反应,空间生成固态B4C和气态HCl;固态B4C随气流喷射至冷却收粉器4的冷却壁上骤冷沉积形成纳米碳化硼粉体并沉降至积粉罐收集;部分纳米碳化硼粉体在气流的带动下进入水吸收气固分离收粉器5,粉末被水吸收而气体溢出,收集粉末并经洗涤、干燥后得到纳米碳化硼粉体,尾气HCl由尾气喷淋吸收塔12处理;反应持续30min,积粉罐及水吸收气固分离收粉器5收集的碳化硼粉末总计130g;按三氯化硼的供给产出比计算,收料率大于65%。所得碳化硼粉末产品经XRD定性分析及SEM、EDS及ICP检测分析表明:碳化硼粉末粒径为30~80nm、纯度大于99%(其中:氧含量小于0.5%、总金属离子含量小于300ppm)。First turn on the cooling circulating water to supply to the plasma generator 2, the reactor 3, and the cooling powder collector 4, then turn on the argon gas source 6, keep the pressure of the gas cylinder at 0.4MPa, feed in the argon gas with a flow rate of 1.8m 3 /h, blow Scan the replacement system for 10 minutes; turn on the plasma generator power supply 1, rotate the current regulator to make the current value at 110 A, press the start switch, and generate an argon plasma torch. At this time, the voltage value shows about 95V, and the argon can be seen from the observation window Gas plasma arc, stable for 1min; then rotate the current regulator to increase the current to 200A, turn on the hydrogen source 7 and methane gas source 8, maintain the pressure of the gas cylinder at 0.4MPa, and slowly feed it from the flow meter 10 (air calibration) Hydrogen 0.8m 3 /h, methane 0.8 m 3 /h, at this time the voltage rises to 200V, then turn the current regulator to adjust the current to 220A, at this time the plasma jet discharge power is 45KW, mixed discharge forms a plasma jet; open The boron trichloride gas source 9 is heated by the boron trichloride heating source 11 to a constant temperature of 50°C, and the boron trichloride gas supply pressure is 0.4MPa, and slowly feeds in about 4.5kg/h of boron trichloride; Boron is sprayed into the plasma jet, and the ionized and dissociated hydrogen and methane in it undergo plasma gas-phase synthesis reaction, and the space generates solid B 4 C and gaseous HCl; solid B 4 C is sprayed to the cooling wall of the cooling powder collector 4 along with the air flow The upper quenching deposition forms nano-boron carbide powder and settles to the powder accumulation tank for collection; part of the nano-boron carbide powder enters the water absorption gas-solid separation powder collector 5 driven by the airflow, the powder is absorbed by water and the gas overflows, and the powder is collected And after washing and drying, nano boron carbide powder is obtained, tail gas HCl is processed by tail gas spray absorption tower 12; reaction continues for 30min, and the boron carbide powder collected by powder accumulation tank and water absorption gas-solid separation powder collector 5 is 130g in total; According to the calculation of the supply-output ratio of boron trichloride, the recovery rate is greater than 65%. The obtained boron carbide powder product is qualitatively analyzed by XRD and detected by SEM, EDS and ICP. It shows that the boron carbide powder has a particle size of 30-80nm and a purity of more than 99% (of which: the oxygen content is less than 0.5%, and the total metal ion content is less than 300ppm).

实施例3Example 3

打开冷却循化水供至等离子发生器2、反应器3、冷却收粉器4,再打开氩气源6,气瓶压力维持在0.5MPa,送入氩气流量2m3/h,吹扫置换系统10min;打开等离子体发生电源1,旋转电流调节器,使电流数值处于115A,按下启动开关,产生氩气等离子体炬,此时电压数值显示约100V,从观察窗可看到氩气等离子体弧,稳定1min;随后旋转电流调节器,使电流升至220A,打开氢气源7与甲烷气源8,气瓶压力维持在0.5MPa,从流量计10(空气标定)慢慢送入氢气1.2m3/h、甲烷1.2m3/h,此时电压升至220V,再旋转电流调节器将电流调至260A,此时等离子体射流放电功率为60KW,混合放电形成等离子体射流;打开三氯化硼气源9,由三氯化硼加热源11加热系统至恒温60℃,三氯化硼供气压力0.5MPa,慢慢送入三氯化硼约6kg/h;三氯化硼喷入等离子体射流,与其中电离、解离的氢气、甲烷进行等离子体气相合成反应,空间生成固态B4C和气态HCl;固态B4C随气流喷射至冷却收粉器4的冷却壁上骤冷沉积形成纳米碳化硼粉体并沉降至积粉罐收集;部分纳米碳化硼粉体在气流的带动下进入水吸收气固分离收粉器5,粉末被水吸收而气体溢出,收集粉末并经洗涤、干燥后得到纳米碳化硼粉体;尾气HCl由尾气喷淋吸收塔12处理;反应持续30min,积粉罐及水吸收气固分离收粉器5收集的碳化硼粉末总计185g;按三氯化硼的供给产出比计算,收料率大于68%。所得碳化硼粉末产品经XRD定性分析及SEM、EDS及ICP检测分析表明:碳化硼粉末粒径为30~80nm、纯度大于99%(其中:氧含量小于0.5%、总金属离子含量小于300ppm)。Turn on the cooling circulating water to supply to the plasma generator 2, reactor 3, and cooling powder collector 4, then turn on the argon gas source 6, keep the pressure of the gas cylinder at 0.5 MPa, feed in argon gas with a flow rate of 2m 3 /h, and purge and replace System for 10 minutes; turn on the plasma generator power supply 1, rotate the current regulator to make the current value at 115A, press the start switch, and generate an argon plasma torch. At this time, the voltage value shows about 100V, and the argon plasma can be seen from the observation window Body arc, stable for 1min; then rotate the current regulator to increase the current to 220A, turn on the hydrogen source 7 and the methane gas source 8, maintain the pressure of the gas cylinder at 0.5MPa, and slowly send in hydrogen gas 1.2 from the flow meter 10 (air calibration) m 3 /h, methane 1.2m 3 /h, at this time, the voltage rises to 220V, and then rotate the current regulator to adjust the current to 260A, at this time, the plasma jet discharge power is 60KW, and the mixed discharge forms a plasma jet; turn on the trichloro Boron trichloride gas source 9, the system is heated by boron trichloride heating source 11 to a constant temperature of 60°C, boron trichloride gas supply pressure is 0.5MPa, slowly feed boron trichloride at about 6kg/h; boron trichloride is sprayed into Plasma jet, and the ionized and dissociated hydrogen and methane in the plasma gas phase synthesis reaction, space to generate solid B 4 C and gaseous HCl; solid B 4 C is jetted to the cooling wall of the cooling powder collector 4 along with the air flow for quenching Deposit to form nano-boron carbide powder and deposit it to the powder accumulation tank for collection; part of the nano-boron carbide powder enters the water absorption gas-solid separation powder collector 5 driven by the airflow, the powder is absorbed by water and the gas overflows, the powder is collected and washed , obtain nanometer boron carbide powder after drying; Tail gas HCl is processed by tail gas spray absorption tower 12; Reaction continues 30min, the boron carbide powder totaling 185g that powder accumulation tank and water absorption gas-solid separation powder collector 5 collect; Based on the boron supply-output ratio calculation, the recovery rate is greater than 68%. The obtained boron carbide powder product is qualitatively analyzed by XRD and detected by SEM, EDS and ICP. It shows that the boron carbide powder has a particle size of 30-80nm and a purity of more than 99% (of which: the oxygen content is less than 0.5%, and the total metal ion content is less than 300ppm).

在上述实施例中,用氩气起弧并和氢气、甲烷混合放电,形成温度大于4000℃的电弧等离子体射流,在此温度下氢气、甲烷大部分被解离为还原活性极高的氢原子和碳原子(部分电离成离子);气态BCl3引入后迅速与等离子体射流混合形成温度大于2000℃的反应体系,在温度辐射及大量高能活性粒子的作用下,三氯化硼快速断键并与氢原子、碳原子在空间碰撞重组完成还原反应,生成HCl和碳化硼;由于氢气、甲烷、三氯化硼体系一般在1150℃即可断键产生反应生成碳化硼,因此,在等离子体产生的超高温及大量高能活性粒子的作用,等离子体气相合成反应的效率及速度远高于传统方式,在反应器3中进行的反应如下:In the above examples, argon is used to start the arc and mixed with hydrogen and methane to form an arc plasma jet with a temperature higher than 4000°C. At this temperature, most of hydrogen and methane are dissociated into hydrogen atoms with extremely high reduction activity. and carbon atoms (partially ionized into ions); gaseous BCl 3 is quickly mixed with the plasma jet to form a reaction system with a temperature greater than 2000°C, and under the action of temperature radiation and a large number of high-energy active particles, boron trichloride quickly breaks bonds and Collision and recombination with hydrogen atoms and carbon atoms in space completes the reduction reaction to generate HCl and boron carbide; because hydrogen, methane, and boron trichloride systems can generally break bonds at 1150 ° C to generate boron carbide, therefore, in the plasma generation Due to the ultra-high temperature and a large number of high-energy active particles, the efficiency and speed of the plasma gas phase synthesis reaction are much higher than the traditional method. The reaction carried out in the reactor 3 is as follows:

4BCl3+4H2+CH4→B4C+12HCl; 4BCl3 + 4H2 + CH4B4C +12HCl;

4BCl3+8H·+C→B4C+12HCl; 4BCl3 +8H+C→ B4C +12HCl;

氩气及“氢气和甲烷”混合气分别从等离子发生器2的阴极底部及阳极顶部以环状切线的方式进气,可保证等离子体弧及等离子体射流的稳定性;三氯化硼在反应器3顶部以相向对称的方式进气,在保证三氯化硼切入动能的同时增加反应气体混合的均匀性。Argon and "hydrogen and methane" mixed gas are respectively fed from the bottom of the cathode and the top of the anode of the plasma generator 2 in a circular tangential manner, which can ensure the stability of the plasma arc and plasma jet; The top of the device 3 is fed in a symmetrical manner to increase the uniformity of reaction gas mixing while ensuring the cutting kinetic energy of boron trichloride.

在上述实施例中,氩气流量为1.5~2 m3/h,氩气、氢气、甲烷、三氯化硼的供气压力为0.3~0.5MPa,此条件是保证等离子体弧(射流)持续稳定性及气相合成反应的充分高效性、保证与粒度相关的气流喷射速率的基础;同时氢气、甲烷、三氯化硼的体积流量比为4~6:1:4;氢气稍过量,有助于提高硼的转化率;而甲烷与三氯化硼的体积流量比保持为1:4,以避免碳化硼粉末中产生游离硼或游离碳。In the above examples, the flow rate of argon is 1.5-2 m 3 /h, and the gas supply pressure of argon, hydrogen, methane, and boron trichloride is 0.3-0.5 MPa. This condition is to ensure that the plasma arc (jet) continues The stability and sufficient efficiency of the gas phase synthesis reaction are the basis for ensuring the gas injection rate related to the particle size; at the same time, the volume flow ratio of hydrogen, methane, and boron trichloride is 4 to 6:1:4; a slight excess of hydrogen is helpful In order to improve the conversion rate of boron; while the volume flow ratio of methane and boron trichloride is kept at 1:4, so as to avoid free boron or free carbon in boron carbide powder.

当工作气体配比和流量不变时,调高等离子体发生电源的放电功率,等离子体温度必然上升,氢气、甲烷的电离度、解离度也随之提高,等离子体中产生的高能活性粒子也大量增加,因此高功率下反应的效率及碳化硼的收率也大幅增加;反应气体在反应器3内完成气相合成反应后,生成的固态B4C在空间均匀成核长大,并随气流喷射到冷却收粉器4的冷却壁上骤冷沉积并停止结晶长大,从而形成纳米尺寸的碳化硼粉体,并顺锥形桶身沉降于收粉器底部的积粉罐;必要时,可打开冷却收粉器4上的视镜窗口将内壁粘附的粉体刷入积粉罐收集;When the ratio and flow rate of the working gas remain unchanged, the discharge power of the plasma generating power supply is increased, and the plasma temperature will inevitably rise, and the degree of ionization and dissociation of hydrogen and methane will also increase accordingly, and the high-energy active particles produced in the plasma will Therefore, the efficiency of the reaction under high power and the yield of boron carbide are also greatly increased; after the reaction gas completes the gas phase synthesis reaction in the reactor 3, the generated solid B 4 C nucleates and grows uniformly in the space, and grows with the The air flow is sprayed onto the cooling wall of the cooling powder collector 4 to quench the deposition and stop the crystallization growth, thereby forming nano-sized boron carbide powder, and sinking along the conical barrel body to the powder accumulation tank at the bottom of the powder collector; if necessary , the sight glass window on the cooling powder collector 4 can be opened to brush the powder adhered to the inner wall into the powder accumulation tank for collection;

反应物从反应器3中喷出后,有部分粉体在气体的带动下溢出冷却收粉器4,将其导入水吸收气固分离收粉器5进行气固分离,伸底管14伸入水面下方5cm,即可有效吸收溢出的碳化硼粉,又能轻松溢出气体,高效达到气固分离的目的,又不会对反应气流造成阻力,相比于普通采用的筛网式、布袋式气固分离器,效果更好、反应更顺畅;水吸收的碳化硼粉末经收集后用去离子水洗涤并在100℃条件下真空烘干2h即可;由尾气喷淋吸收塔12处理后的HCl气体可作盐酸副产品使用。After the reactant is sprayed out from the reactor 3, some powder overflows the cooling powder collector 4 driven by the gas, and is introduced into the water absorption gas-solid separation powder collector 5 for gas-solid separation, and the bottom extension pipe 14 extends into the 5cm below the water surface can effectively absorb the overflowing boron carbide powder, and can easily overflow the gas, so as to achieve the purpose of gas-solid separation efficiently without causing resistance to the reaction flow. Compared with the commonly used screen type and cloth bag type gas solid separator, with better effect and smoother reaction; the boron carbide powder absorbed by water is collected, washed with deionized water and dried in vacuum at 100°C for 2 hours; the HCl treated by the tail gas spray absorption tower 12 The gas can be used as a by-product of hydrochloric acid.

以上显示和描述了本发明的基本原理和主要特征和本发明的优点。本行业的技术人员应该了解,本发明不受上述实施例的限制,上述实施例和说明书中描述的只是说明本发明的原理,在不脱离本发明精神和范围的前提下,本发明还会有各种变化和改进,这些变化和改进都落入要求保护的本发明范围内。本发明要求保护范围由所附的权利要求书及其等效物界定。The basic principles and main features of the present invention and the advantages of the present invention have been shown and described above. Those skilled in the industry should understand that the present invention is not limited by the above-mentioned embodiments. What are described in the above-mentioned embodiments and the description only illustrate the principle of the present invention. Without departing from the spirit and scope of the present invention, the present invention will also have Variations and improvements all fall within the scope of the claimed invention. The protection scope of the present invention is defined by the appended claims and their equivalents.

Claims (10)

1.等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,其特征在于,采用等离子体化学气相合成法制备高纯纳米碳化硼粉末的装置制备高纯纳米碳化硼粉末,具体步骤如下:1. The method for preparing high-purity nano-boron carbide powder by plasma chemical vapor-phase synthesis is characterized in that the device for preparing high-purity nano-boron carbide powder by plasma chemical vapor-phase synthesis is used to prepare high-purity nano-boron carbide powder, and the specific steps are as follows: 1)将氩气导入等离子发生器,启动等离子体发生电源产生电弧放电,形成稳定的氩气等离子体弧;1) Introduce argon gas into the plasma generator, start the plasma generating power supply to generate arc discharge, and form a stable argon plasma arc; 2)再将氢气与甲烷导入等离子发生器,与氩气等离子体混合放电形成等离子体射流;2) Then introduce hydrogen and methane into the plasma generator, and mix and discharge with argon plasma to form a plasma jet; 3)而后将等离子体射流导入等离子发生器下方的反应器,同时从反应器的三氯化硼进气孔导入三氯化硼气体,与等离子体射流撞击迅速混合完成气相合成反应,空间生成固态B4C和气态HCl;3) Then the plasma jet is introduced into the reactor below the plasma generator, and at the same time, boron trichloride gas is introduced from the boron trichloride inlet hole of the reactor, and the gas-phase synthesis reaction is completed by colliding with the plasma jet and quickly mixed to form a solid state in space. B 4 C and gaseous HCl; 4)步骤3)中生成的固态B4C随气流喷射至冷却收粉器的冷却壁上骤冷沉积形成纳米碳化硼粉体;4) The solid B 4 C generated in step 3) is sprayed with the airflow to the cooling wall of the cooling powder collector for quenching deposition to form nano boron carbide powder; 5)步骤4)中的部分纳米碳化硼粉体在气流的带动下进入水吸收气固分离收粉器,粉末被水吸收而气体溢出,最后收集粉末并经洗涤、干燥后得到纳米碳化硼粉体。5) Part of the nano boron carbide powder in step 4) is driven by the airflow into the water absorption gas-solid separation powder collector, the powder is absorbed by water and the gas overflows, and finally the powder is collected and washed and dried to obtain nano boron carbide powder body. 2.根据权利要求1所述的等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,其特征在于,步骤1)中,氩气流量1.5~2m3/h,压力0.3~0.5MPa,启动等离子体发生电源产生电弧放电的功率为10KW,电流为105~115A,电压为90~100V。2. The method for preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis according to claim 1, characterized in that, in step 1), the flow rate of argon gas is 1.5-2m 3 /h, the pressure is 0.3-0.5MPa, The power of starting the plasma generating power supply to generate arc discharge is 10KW, the current is 105-115A, and the voltage is 90-100V. 3.根据权利要求1所述的等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,其特征在于,步骤2)中,氢气与甲烷的体积流量比为4~6:1,供气压力0.3~0.5MPa,调节等离子发生器的电源使其输出功率为10~100KW。3. The method for preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis according to claim 1, characterized in that, in step 2), the volume flow ratio of hydrogen to methane is 4 to 6:1, and the gas supply The pressure is 0.3-0.5MPa, and the power supply of the plasma generator is adjusted so that the output power is 10-100KW. 4.根据权利要求1所述的等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,其特征在于,步骤3)中,三氯化硼与甲烷的体积流量比为4:1,三氯化硼加热温度40~60℃,三氯化硼供气压力0.3~0.5MPa。4. The method for preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis according to claim 1, characterized in that, in step 3), the volume flow ratio of boron trichloride and methane is 4:1, three The boron chloride heating temperature is 40-60°C, and the boron trichloride gas supply pressure is 0.3-0.5MPa. 5.根据权利要求1所述的等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,其特征在于,等离子体化学气相合成法制备高纯纳米碳化硼粉末的装置包括等离子体发生电源、等离子发生器、反应器、冷却收粉器、水吸收气固分离收粉器、尾气吸收器、氩气源、氢气源、甲烷气源及三氯化硼气源,所述等离子发生器为由聚四氟材料绝缘组成的半封闭容器,半封闭容器上端封闭下端开口,且在半封闭容器上部设置有铈钨材料制成的阴极,半封闭容器下部设置有铜材料制成的阳极,阴极与等离子体发生电源负极连接,阳极与等离子体发生电源正极连接;同时在等离子发生器阴极底部设有用于通过氩气源导入氩气的氩气进气孔,等离子发生器阳极顶部设有用于通过氢气源导入氢气及通过甲烷气源导入甲烷的混合气进气孔;等离子发生器内置有冷却循环水系统进行冷却保护;所述反应器与等离子发生器的下端密封连接,反应器顶部对称设置有两个用于通过三氯化硼气源导入三氯化硼气体的三氯化硼进气孔,三氯化硼气源外设置有用于三氯化硼进行加热汽化的三氯化硼加热源,反应器下端口置于冷却收粉器内,冷却收粉器的外夹套设置有循环冷却水系统,所述水吸收气固分离收粉器与冷却收粉器出口连接,并在氩气源、氢气源、甲烷气源及三氯化硼气源四个气源出口端分别设置有流量计,所述水吸收气固分离收粉器与尾气吸收器连接。5. the method for preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis according to claim 1, is characterized in that the device for preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis comprises plasma generation power supply, Plasma generator, reactor, cooling powder collector, water absorption gas-solid separation powder collector, tail gas absorber, argon gas source, hydrogen gas source, methane gas source and boron trichloride gas source, the plasma generator is composed of A semi-closed container made of PTFE insulation, the upper end of the semi-closed container is closed and the lower end is open, and a cathode made of cerium-tungsten material is installed on the upper part of the semi-closed container, and an anode made of copper material is installed on the lower part of the semi-closed container. The negative electrode of the plasma generator power supply is connected, and the anode is connected to the positive electrode of the plasma generator power supply; at the same time, an argon inlet hole is provided at the bottom of the cathode of the plasma generator for introducing argon gas through an argon source, and an argon inlet hole is provided at the top of the anode of the plasma generator for passing hydrogen gas. The mixed gas inlet hole of introducing hydrogen from the source and introducing methane through the methane source; the plasma generator has a built-in cooling circulating water system for cooling protection; the reactor is sealed and connected with the lower end of the plasma generator, and two A boron trichloride air inlet hole for introducing boron trichloride gas through a boron trichloride gas source, a boron trichloride heating source for heating and vaporizing boron trichloride is arranged outside the boron trichloride gas source, The lower port of the reactor is placed in the cooling powder collector, and the outer jacket of the cooling powder collector is provided with a circulating cooling water system. The water absorbing gas-solid separation powder collector is connected to the outlet of the cooling powder collector, and the The outlets of the four gas sources, hydrogen source, methane gas source and boron trichloride gas source are respectively provided with flowmeters, and the water absorption gas-solid separation powder collector is connected with the tail gas absorber. 6.根据权利要求5所述的等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,其特征在于,所述等离子体发生电源为输出功率为10~100kW的直流电弧电源。6 . The method for preparing high-purity nano boron carbide powder by plasma chemical vapor synthesis according to claim 5 , wherein the plasma generating power supply is a DC arc power supply with an output power of 10-100 kW. 7.根据权利要求5所述的等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,其特征在于,所述氩气进气孔、混合气进气孔均为环状切线结构。7. The method for preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis according to claim 5, wherein the argon gas inlet and the mixed gas inlet are all ring-shaped tangent structures. 8.根据权利要求5所述的等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,其特征在于,所述反应器为含水冷外夹套和通孔石墨管构成的管式反应器。8. the method for preparing high-purity nanometer boron carbide powder by plasma chemical vapor synthesis according to claim 5, is characterized in that, described reactor is the tubular reactor that contains water-cooled outer jacket and through-hole graphite tube constitutes . 9.根据权利要求5所述的等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,其特征在于,所述冷却收粉器由上部含对称开口视镜的柱形桶身、中部为沉降锥形桶身及底部为积粉罐组成。9. plasma chemical vapor synthesis according to claim 5 prepares the method for high-purity nanometer boron carbide powder, it is characterized in that, described cooling powder collection device is by the cylinder barrel body that the top contains symmetrical opening mirror, the middle part is The sedimentation conical barrel body and the bottom are composed of powder accumulation tanks. 10.根据权利要求5所述的等离子体化学气相合成法制备高纯纳米碳化硼粉末的方法,其特征在于,所述水吸收气固分离收粉器上设置有用于连接冷却收粉器出口的伸底管和用于连接尾气吸收器的出气管。10. the method for preparing high-purity nano-boron carbide powder by plasma chemical vapor synthesis according to claim 5, is characterized in that, the described water absorption gas-solid separation powder collector is provided with for connecting cooling powder collector outlet Outrigger pipe and outlet pipe for connecting exhaust absorber.
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