CN108022864B - Wet process equipment - Google Patents

Abstract

The present invention provides a wet process device. The present invention provides a secondary liquid removal unit next to a primary liquid removal unit and forms a second air port between the secondary liquid removal unit and the primary liquid removal unit to generate a Bernoulli phenomenon, thereby removing liquid near a container side wall through the second air port to avoid liquid accumulation.

Description

Wet process equipment

technical field

The present invention relates to a process device, especially a wet process device suitable for panel industry and semiconductor industry.

Background technique

In the panel industry and the semiconductor industry, the development of wet process has been quite mature. However, limited by the existing mechanism design, there are still many problems in practical operation. For example, a wet process requires the continuous application of different liquids to a substrate. For example, etching liquid A may be used in one container to etch the substrate, and pure water may be used in another adjacent container to etch the substrate. The substrate is cleaned. Generally speaking, the substrates are sequentially transferred and moved in a plurality of containers that store different liquids. However, in order to ensure that the liquids are not brought from one container to another and contaminate each other, the liquid must be used. When the substrate leaves each container, the removing device (commonly known as air knife) can not take away the liquid in the container to another container, so as to avoid pollution and product defects.

Referring to FIGS. 1-2 , FIG. 1 is a schematic diagram of a conventional wet processing apparatus 10 . FIG. 2 is a cross-sectional side view of a prior art wet processing apparatus 10 . The wet process apparatus 10 includes a first container 11 and a main liquid removal unit 15 . The first container 11 includes an opening 12 in a first side wall 19 for allowing a substrate 14 to exit or enter the first container along the first axis 13 of the first container 11 from the opening 12 10. The main liquid removing unit 15 is disposed inside the first container 11 near the first side wall 19 and the opening 12 , and the main liquid removing unit 15 includes a first tuyere 16 . The direction 21 of the first air outlet 16 is toward the lower left (based on the first axis 13, about 225 degrees, generally speaking, the direction 21 is between 180-270 degrees), so that the The liquid 18 on the substrate 14 is blown off. However, the side wall 19 being provided with the opening 12 makes the side wall 19 relatively fragile and cannot be used for fixing the main liquid removing unit 15 . Therefore, the main liquid removing unit 15 can only be fixed through other inner walls, so that the main liquid removing unit 15 cannot be fixed on the side wall 11 . Therefore, a guide plate 17 is usually installed above the main liquid removal unit 15 , and the guide plate 17 can avoid the gap of the liquid 18 between the main liquid removal unit 15 and the side wall 11 . drop onto the substrate 14 . Although the liquid 18 above the guide plate 17 can be prevented from dripping onto the substrate 14 , the liquid 18 will still accumulate in the gap between the guide plate 17 and the side wall 11 over time, and furthermore The technical problem of dripping on the substrate 14 .

To sum up, due to the structural problems of the side wall 11 , the main liquid removing unit 15 cannot be fixed on the side wall 11 . Even if the main liquid removal unit 15 can be fixed on the side wall 11, the liquid 18 may still accumulate between the main liquid removal unit 15 and the side wall, and then drip on the The technical problems on the substrate 14 are described.

Therefore, it is necessary to provide a wet processing apparatus to solve the above problems.

SUMMARY OF THE INVENTION

In view of this, an object of the present invention is to provide a wet process device, by arranging a secondary liquid removal unit beside a main liquid removal unit, and between the secondary liquid removal unit and the main liquid removal unit A second tuyere is formed between the two to generate a Bernoulli phenomenon, and then the liquid close to the side wall of a container is taken away by the second tuyere to avoid the accumulation of liquid.

In order to achieve the above object, the present invention provides a wet process apparatus, which includes a first container, a main liquid removal unit, a gas supply unit, and a secondary liquid removal unit.

The first container includes an opening in a first side wall for allowing a substrate to exit or enter the first container along a first axis of the first container from the opening. The main liquid removing unit is disposed in an area inside the first container close to the first side wall and the opening, and the main liquid removing unit includes a first tuyere. The gas supply unit supplies a gas to the main liquid removal unit to flow to the substrate from the first tuyere. The auxiliary liquid removing unit is adjacent to the main liquid removing unit, and a second tuyere is formed between the auxiliary liquid removing unit and the main liquid removing unit. The secondary liquid removal unit includes a guide plate connected to the first side wall.

Substances between the main liquid removal unit, the first side wall, the guide plate and the auxiliary liquid removal unit pass through the guide plate and the auxiliary liquid removal unit in sequence to the second tuyere move.

In a preferred embodiment, the position of the second tuyere is farther from the opening than the first tuyere.

In a preferred embodiment, the first gas pressure generated by the gas at the second tuyere is lower than the pressure between the main liquid removal unit, the first side wall, the guide plate and the auxiliary liquid removal unit. the second gas pressure in between.

In a preferred embodiment, the gas is a clean dry gas.

In a preferred embodiment, the main liquid removal unit and the auxiliary liquid removal unit are disposed above the substrate.

In a preferred embodiment, the first included angle between the direction of the first tuyere and the first axis is between 180-270 degrees.

In a preferred embodiment, the second included angle between the direction of the second tuyere and the first axis is between 180-270 degrees.

In a preferred embodiment, the second included angle is smaller than the first included angle.

Compared with the prior art, the present invention provides a secondary liquid removing unit beside a main liquid removing unit, and forms a second tuyere between the secondary liquid removing unit and the main liquid removing unit, A Bernoulli phenomenon is generated, and the liquid close to the side wall of a container is taken away by the second tuyere to avoid the accumulation of liquid.

Description of drawings

FIG. 1 is a schematic diagram of a wet process apparatus in the prior art;

FIG. 2 is a cross-sectional side view of a prior art wet processing apparatus;

FIG. 3 is a schematic diagram of the wet process apparatus of the present invention;

FIG. 4 is a cross-sectional side view of the wet processing apparatus of the present invention; and

FIG. 5 is a schematic diagram showing the first included angle and the second included angle of the present invention.

Detailed ways

The embodiments described in detail below with reference to the accompanying drawings will make the advantages and features of the present invention and the methods for achieving them more apparent. However, the present invention is not limited to the embodiments disclosed below, and the present invention can be implemented in various ways different from each other. The embodiments disclosed below are only used to make the disclosure of the present invention more complete and contribute to the present invention Those of ordinary skill in the art can fully understand the scope of the present invention, and the present invention is defined according to the scope of the patent application. Throughout the specification, the same reference numerals refer to the same device components.

Refer to Figures 3-5. FIG. 3 is a schematic diagram of the wet processing apparatus 100 of the present invention. FIG. 4 is a cross-sectional side view of the wet processing apparatus 100 of the present invention. FIG. 5 is a schematic diagram of the first included angle 161 and the second included angle 181 of the present invention.

The wet process apparatus 100 includes a first container 110 , a main liquid removal unit 150 , a gas supply unit 210 and a secondary liquid removal unit 170 .

The first container 110 includes an opening 120 in a first side wall 112 for allowing a substrate 140 to exit or enter the first container 110 from the opening 120 along the first axis 130 of the first container 110 . The main liquid removing unit 150 is disposed inside the first container 110 near the first side wall 112 and the opening 120 , and the main liquid removing unit 150 includes a first tuyere 160 . The direction of the first tuyere 160 and the first angle 161 of the first shaft 130 are between 180-270 degrees. The gas supply unit 210 supplies a gas to the main liquid removal unit 150 to flow to the substrate 140 from the first air outlet 160 . Preferably, the gas is clean dry air (CDA). The auxiliary liquid removal unit 170 is adjacent to the main liquid removal unit 150 and away from the opening 120 . A second air outlet is formed between the auxiliary liquid removal unit 170 and the main liquid removal unit 150 . 180. The auxiliary liquid removing unit 170 is connected to a guide plate 190 of the first side wall 112 . The position of the second tuyere 180 is farther from the opening 120 than the first tuyere 160 . The direction of the second tuyere 180 and the second angle 181 of the first axis 130 are between 180-270 degrees.

In the present invention, by using Bernoulli's principle, the gas supply unit 210 provides gas, and the gas is blown from the liquid 200 on the first tuyere 160 to the left, and the gas will be at the second tuyere 180 A high-speed flow field is generated. The first gas pressure P1 generated by the gas at the second tuyere 180 is lower than that between the main liquid removal unit 150 , the first side wall 112 , the guide plate 190 and the auxiliary liquid removal unit 170 The second gas pressure P2. In detail, according to Bernoulli's law, in a horizontal fluid (here the height difference is negligible), where the flow velocity is high, the pressure will be low, so the pressure of the first gas at the second tuyere 180 is low. P1 will be less than the gas pressure P2, therefore, the air between the main liquid removal unit 150, the first side wall 112, the guide plate 190 and the auxiliary liquid removal unit 170 will be carried around The liquid 200 is pulled toward the second tuyere 180 , thereby removing the liquid close to the first side wall 112 .

Preferably, the second included angle 181 is smaller than the first included angle 161 . Therefore, the second tuyere 180 can further assist the first tuyere 160 to remove the liquid 200 from the substrate 140 . Further, the main liquid removal unit 150 and the auxiliary liquid removal unit 170 are disposed above the moving direction of the substrate 140 . However, in other preferred embodiments, the main liquid removing unit 150 and the auxiliary liquid removing unit 170 are disposed below the moving direction of the substrate 140 , so as to remove the liquid below the substrate 140 accordingly. In this preferred embodiment, the main liquid removal unit 150 and the auxiliary liquid removal unit 170 are both disposed above the substrate 140 , the opening 120 is on the right side, and the first included angle The angles of 161 and the second included angle 181 are designed in this way; for example, when the main liquid removal unit 150 and the auxiliary liquid removal unit 170 are both arranged below the substrate 140, all the When the opening 120 is still on the right side, the angles of the first included angle 161 and the second included angle 181 are between 90-180 degrees.

Compared with the prior art, the present invention does not need to provide gas to the secondary liquid removing unit 170, that is, only needs to use the same amount of air. A pulling force is generated at the tuyere 180, so that the liquid 200 close to the first side wall 112 can be drawn away through the second tuyere 180, thereby preventing it from falling to the substrate 140 close to the first side wall 112 places.

Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Those skilled in the art to which the present invention pertains can make various modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of the appended patent application.

Claims (4)

1. A wet process device, characterized in that, comprising: a first container including an opening in a first side wall for allowing a substrate to exit from or enter the first container along a first axis of the first container; a main liquid removing unit, disposed in the area of the inside of the first container close to the first side wall and the opening, and the main liquid removing unit includes a first tuyere; a gas supply unit for supplying a gas to the main liquid removal unit to flow to the substrate from the first tuyere; and A secondary liquid removal unit, adjacent to the main liquid removal unit and away from the opening, a second tuyere is formed between the secondary liquid removal unit and the main liquid removal unit, the secondary liquid the removal unit includes a guide plate connected to the first side wall; Wherein, substances between the main liquid removal unit, the first side wall, the guide plate and the auxiliary liquid removal unit pass through the main liquid removal unit and the first side wall in sequence. the guide plate and the auxiliary liquid removing unit move toward the second air outlet, and the first angle between the direction of the first air outlet and the first axis is between 180-270 degrees. The second included angle between the direction of the second tuyere and the first axis is between 180-270 degrees, wherein the second included angle is smaller than the first included angle; The first gas pressure generated by the gas at the second tuyere is lower than the second gas pressure between the main liquid removal unit, the first side wall, the guide plate and the auxiliary liquid removal unit . 2 . The wet processing apparatus of claim 1 , wherein the second air outlet is located farther from the opening than the first air outlet. 3 . 3 . The wet process apparatus of claim 1 , wherein the gas is clean and dry gas. 4 . 4 . The wet processing apparatus of claim 1 , wherein the main liquid removal unit and the auxiliary liquid removal unit are disposed above the substrate. 5 .

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