CN107932199A - A kind of polishing method of metal works - Google Patents
A kind of polishing method of metal works Download PDFInfo
- Publication number
- CN107932199A CN107932199A CN201711306813.3A CN201711306813A CN107932199A CN 107932199 A CN107932199 A CN 107932199A CN 201711306813 A CN201711306813 A CN 201711306813A CN 107932199 A CN107932199 A CN 107932199A
- Authority
- CN
- China
- Prior art keywords
- metal works
- grinding
- polishing
- polishing method
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 59
- 239000002184 metal Substances 0.000 title claims abstract description 59
- 238000005498 polishing Methods 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims abstract description 18
- 239000012530 fluid Substances 0.000 claims abstract description 15
- 239000003792 electrolyte Substances 0.000 claims abstract description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 6
- 239000010439 graphite Substances 0.000 claims abstract description 6
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 6
- 239000004745 nonwoven fabric Substances 0.000 claims abstract description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 5
- -1 Alcohol acid anhydrides Chemical class 0.000 claims description 5
- 108010010803 Gelatin Proteins 0.000 claims description 5
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 claims description 5
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 5
- 239000004744 fabric Substances 0.000 claims description 5
- 229920000159 gelatin Polymers 0.000 claims description 5
- 239000008273 gelatin Substances 0.000 claims description 5
- 235000019322 gelatine Nutrition 0.000 claims description 5
- 235000011852 gelatine desserts Nutrition 0.000 claims description 5
- 239000001863 hydroxypropyl cellulose Substances 0.000 claims description 5
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 claims description 5
- MRDKYAYDMCRFIT-UHFFFAOYSA-N oxalic acid;phosphoric acid Chemical compound OP(O)(O)=O.OC(=O)C(O)=O MRDKYAYDMCRFIT-UHFFFAOYSA-N 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 239000007921 spray Substances 0.000 claims description 5
- IAHFWCOBPZCAEA-UHFFFAOYSA-N succinonitrile Chemical compound N#CCCC#N IAHFWCOBPZCAEA-UHFFFAOYSA-N 0.000 claims description 5
- 230000005611 electricity Effects 0.000 claims description 4
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 claims description 3
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- 150000004968 peroxymonosulfuric acids Chemical class 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- 238000004381 surface treatment Methods 0.000 abstract description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 6
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 3
- 235000019253 formic acid Nutrition 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 3
- 235000019394 potassium persulphate Nutrition 0.000 description 3
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 230000003796 beauty Effects 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
A kind of polishing method of metal works, belongs to field of metal surface treatment technology.It is in comprising the following steps that：1）Metal works are ground with abrasive brush, polishing fluid is sprayed to metal works while grinding；2）Naturally dry after metal works grinding；3）At room temperature, it is cathode by anode, graphite of metal works, under operating voltage, metal works is inserted in electrolyte, handles 1~5 minute；4）Wiped after metal works electrolysis with non-woven fabrics.A kind of polishing method of above-mentioned metal works, design is reasonable, and the surface that metal works can be effectively realized by this method polishes, and visually observes the surface of each workpiece, workpiece surface appearance uniform, without heterochromatic or have slight color differences；Using the glossiness of each polishing workpiece surface of miniature glossometer test, glossiness is up to 40 Gu.
Description
Technical field
The invention belongs to field of metal surface treatment technology, and in particular to a kind of polishing method of metal works.
Background technology
Metal works, which shape rear surface, would generally adhere to one layer of greasy dirt or other chemicals, and metal works use one
By the corrosion of use environment after the section time, rusty stain can be produced on surface, for beauty and is prolonged the service life, commonly uses dedicated gold
Belong to cleaning agent or polishing agent to clear up the dirt on surface, but existing polishing agent product exist return rust is fast, applicable metal species are narrow,
Clean halfway problem.
The content of the invention
In view of the problems of the existing technology, it is an object of the invention to design to provide a kind of polishing method of metal works
Technical solution.
The polishing method of a kind of metal works, it is characterised in that comprise the following steps that：
1）Metal works are ground with abrasive brush, polishing fluid, the polishing fluid are sprayed to metal works while grinding
Include the component of following mass percent：2- arsenic pyridine formic acid 1-2%, monoethanolamine 2-3%, diethylene glycol monomethyl ether 1-3%, persulfuric acid
Potassium 2-4%, hydroxypropyl cellulose 3-4%, silica 2-4%, nano aluminium oxide 2-8%, gelatin 0.5-1%, more than deionized water
Amount；The abrasive brush includes rotating roller and the grinding fabric being coated in rotating roller；
2）Naturally dry after metal works grinding；
3）At room temperature, it is cathode by anode, graphite of metal works, under operating voltage, metal works is inserted in electrolyte,
Processing 1~5 minute, the electrolyte includes the component of following mass percent：Three oxalic acid phosphate 20~30%, diethyl two
Alcohol acid anhydrides 5~15%, succinonitrile 10~15%, water surplus；
4）Wiped after metal works electrolysis with non-woven fabrics.
A kind of polishing method of metal works, it is characterised in that the step 1）Middle polishing fluid spray flow rate
For 2~5L/min.
A kind of polishing method of metal works, it is characterised in that the step 1）Middle operating voltage for 200~
300V。
A kind of polishing method of above-mentioned metal works, design is reasonable, and metal work can be effectively realized by this method
The surface polishing of part, visually observes the surface of each workpiece, workpiece surface appearance uniform, without heterochromatic or have slight color differences；Using micro-
The glossiness of each polishing workpiece surface of type glossometer test, glossiness is up to 40 Gu.
Embodiment
The invention will be further described with reference to embodiments.
Embodiment 1：A kind of polishing method of metal works
1）Metal works are ground with abrasive brush, while grinding metal works are sprayed with polishing fluid, polishing fluid spray stream
Speed is 3L/min, and the polishing fluid includes the component of following mass percent：2- arsenic pyridines formic acid 1.5%, monoethanolamine 2.5%,
Diethylene glycol monomethyl ether 2.5%, potassium peroxydisulfate 3%, hydroxypropyl cellulose 3.5%, silica 3%, nano aluminium oxide 6%, gelatin
0.8%th, deionized water surplus；The abrasive brush includes rotating roller and the grinding fabric being coated in rotating roller；
2）Naturally dry after metal works grinding；
3）At room temperature, it is cathode by anode, graphite of metal works, in the case where operating voltage is 250V, metal works is inserted electricity
Solve in liquid, handle 3 minutes, the electrolyte includes the component of following mass percent：Three oxalic acid phosphate 25%, diethyl two
Alcohol acid anhydrides 10%, succinonitrile 12%, water surplus；
4）Wiped after metal works electrolysis with non-woven fabrics.
Embodiment 2：A kind of polishing method of metal works
1）Metal works are ground with abrasive brush, while grinding metal works are sprayed with polishing fluid, polishing fluid spray stream
Speed is 2L/min, and the polishing fluid includes the component of following mass percent：2- arsenic pyridines formic acid 1%, monoethanolamine 2%, diethyl
Glycol monomethyl ether 1%, potassium peroxydisulfate 2%, hydroxypropyl cellulose 3%, silica 2%, nano aluminium oxide 2%, gelatin 0.5%, go
Ion water surplus；The abrasive brush includes rotating roller and the grinding fabric being coated in rotating roller；
2）Naturally dry after metal works grinding；
3）At room temperature, it is cathode by anode, graphite of metal works, in the case where operating voltage is 200V, metal works is inserted electricity
Solve in liquid, handle 1 minute, the electrolyte includes the component of following mass percent：Three oxalic acid phosphate 20%, diethyl two
Alcohol acid anhydrides 5%, succinonitrile 10%, water surplus；
4）Wiped after metal works electrolysis with non-woven fabrics.
Embodiment 3：A kind of polishing method of metal works
1）Metal works are ground with abrasive brush, while grinding metal works are sprayed with polishing fluid, polishing fluid spray stream
Speed is 5L/min, and the polishing fluid includes the component of following mass percent：2- arsenic pyridines formic acid 2%, monoethanolamine 3%, diethyl
Glycol monomethyl ether 3%, potassium peroxydisulfate 4%, hydroxypropyl cellulose 4%, silica 4%, nano aluminium oxide 8%, gelatin 1%, go from
Sub- water surplus；The abrasive brush includes rotating roller and the grinding fabric being coated in rotating roller；
2）Naturally dry after metal works grinding；
3）At room temperature, it is cathode by anode, graphite of metal works, in the case where operating voltage is 300V, metal works is inserted electricity
Solve in liquid, handle 5 minutes, the electrolyte includes the component of following mass percent：Three oxalic acid phosphate 30%, diethyl two
Alcohol acid anhydrides 15%, succinonitrile 15%, water surplus；
4）Wiped after metal works electrolysis with non-woven fabrics.
Claims (3)
1. a kind of polishing method of metal works, it is characterised in that comprise the following steps that：
1）Metal works are ground with abrasive brush, polishing fluid, the polishing fluid are sprayed to metal works while grinding
Include the component of following mass percent：2- arsenic pyridine formic acid 1-2%, monoethanolamine 2-3%, diethylene glycol monomethyl ether 1-3%, persulfuric acid
Potassium 2-4%, hydroxypropyl cellulose 3-4%, silica 2-4%, nano aluminium oxide 2-8%, gelatin 0.5-1%, more than deionized water
Amount；The abrasive brush includes rotating roller and the grinding fabric being coated in rotating roller；
2）Naturally dry after metal works grinding；
3）At room temperature, it is cathode by anode, graphite of metal works, under operating voltage, metal works is inserted in electrolyte,
Processing 1~5 minute, the electrolyte includes the component of following mass percent：Three oxalic acid phosphate 20~30%, diethyl two
Alcohol acid anhydrides 5~15%, succinonitrile 10~15%, water surplus；
4）Wiped after metal works electrolysis with non-woven fabrics.
A kind of 2. polishing method of metal works as claimed in claim 1, it is characterised in that the step 1）Middle grinding stream
Body spray flow rate is 2~5L/min.
A kind of 3. polishing method of metal works as claimed in claim 1, it is characterised in that the step 1）Middle work electricity
Press as 200~300V.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711306813.3A CN107932199A (en) | 2017-12-11 | 2017-12-11 | A kind of polishing method of metal works |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711306813.3A CN107932199A (en) | 2017-12-11 | 2017-12-11 | A kind of polishing method of metal works |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107932199A true CN107932199A (en) | 2018-04-20 |
Family
ID=61946438
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711306813.3A Pending CN107932199A (en) | 2017-12-11 | 2017-12-11 | A kind of polishing method of metal works |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107932199A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114378532A (en) * | 2021-12-20 | 2022-04-22 | 中国科学院长春光学精密机械与物理研究所 | Electrochemical polishing method based on single-point diamond turning surface and application |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030211742A1 (en) * | 2000-11-02 | 2003-11-13 | Akira Kubo | CMP process for a damascene pattern |
| CN102586855A (en) * | 2012-03-30 | 2012-07-18 | 河北省安装工程公司 | Electrochemical and mechanical composite polishing device |
| CN103114323A (en) * | 2013-02-06 | 2013-05-22 | 中国科学院上海微系统与信息技术研究所 | Surface polishing method for GaN monocrystal substrate |
| CN104025366A (en) * | 2011-12-28 | 2014-09-03 | 三菱化学株式会社 | Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery |
| CN104112870A (en) * | 2009-08-31 | 2014-10-22 | 三菱化学株式会社 | Non-aqueous Electrolytic Solution, And Non-aqueous Electrolyte Battery Comprising Same |
| CN107059108A (en) * | 2017-01-20 | 2017-08-18 | 上海材料研究所 | A kind of composite surface treatment method of hts band timber-used Hastelloy base band |
| CN107429120A (en) * | 2015-03-05 | 2017-12-01 | 嘉柏微电子材料股份公司 | Include the polishing composition of cation type polymer additive |
| CN107488872A (en) * | 2017-08-28 | 2017-12-19 | 南方科技大学 | Electrochemical polishing method and electrochemical polishing device |
-
2017
- 2017-12-11 CN CN201711306813.3A patent/CN107932199A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030211742A1 (en) * | 2000-11-02 | 2003-11-13 | Akira Kubo | CMP process for a damascene pattern |
| CN104112870A (en) * | 2009-08-31 | 2014-10-22 | 三菱化学株式会社 | Non-aqueous Electrolytic Solution, And Non-aqueous Electrolyte Battery Comprising Same |
| CN104025366A (en) * | 2011-12-28 | 2014-09-03 | 三菱化学株式会社 | Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery |
| CN102586855A (en) * | 2012-03-30 | 2012-07-18 | 河北省安装工程公司 | Electrochemical and mechanical composite polishing device |
| CN103114323A (en) * | 2013-02-06 | 2013-05-22 | 中国科学院上海微系统与信息技术研究所 | Surface polishing method for GaN monocrystal substrate |
| CN107429120A (en) * | 2015-03-05 | 2017-12-01 | 嘉柏微电子材料股份公司 | Include the polishing composition of cation type polymer additive |
| CN107059108A (en) * | 2017-01-20 | 2017-08-18 | 上海材料研究所 | A kind of composite surface treatment method of hts band timber-used Hastelloy base band |
| CN107488872A (en) * | 2017-08-28 | 2017-12-19 | 南方科技大学 | Electrochemical polishing method and electrochemical polishing device |
Non-Patent Citations (3)
| Title |
|---|
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114378532A (en) * | 2021-12-20 | 2022-04-22 | 中国科学院长春光学精密机械与物理研究所 | Electrochemical polishing method based on single-point diamond turning surface and application |
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| PB01 | Publication | ||
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| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180420 |
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