CN107799424A - Method for packaging embedded circuit - Google Patents
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- 238000004806 packaging method and process Methods 0.000 title abstract description 34
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- 239000002184 metal Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
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- 239000000463 material Substances 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 6
- 239000003292 glue Substances 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims description 2
- 238000009713 electroplating Methods 0.000 abstract description 17
- 238000003466 welding Methods 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 139
- 238000005476 soldering Methods 0.000 description 12
- 238000012536 packaging technology Methods 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 10
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- 238000010586 diagram Methods 0.000 description 8
- 230000017525 heat dissipation Effects 0.000 description 7
- 239000012790 adhesive layer Substances 0.000 description 6
- 238000011161 development Methods 0.000 description 6
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/83001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector involving a temporary auxiliary member not forming part of the bonding apparatus
- H01L2224/83005—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector involving a temporary auxiliary member not forming part of the bonding apparatus being a temporary or sacrificial substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
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Abstract
Description
技术领域technical field
本发明是关于一种封装方法,尤指用于内埋式线路封装的方法。The invention relates to a packaging method, especially a method for packaging embedded circuits.
背景技术Background technique
IC封装以塑料/陶瓷或金属的物质,覆盖于IC芯片外部,保护芯片而免于受外部环境因素破坏,且能避免湿气渗透至芯片内部,并将芯片上功能讯号引接至外部达到电性连接、实体支撑、耐热与散热的目的及效果,搭配不同终端电子产品类型,可选择不同种类的封装技术。IC packaging is covered with plastic/ceramic or metal substances on the outside of the IC chip to protect the chip from external environmental factors, prevent moisture from penetrating into the chip, and lead the functional signals on the chip to the outside to achieve electrical performance. The purpose and effect of connection, physical support, heat resistance and heat dissipation, and different types of terminal electronic products can choose different types of packaging technologies.
随着终端电子产品的发展日益轻薄短小、高速及多功能性的趋势,传统导线架封装产品与封装技术日渐无法满足现有IC技术及电子产品的要求,除了将电子零元件缩小化以减少体积外,减少使用电子零元件数量亦为一发展策略,然而,为了避免因减少零元件数量而影响终端电子产品的功能及稳定性,将元件整合为一整合性基板即成为重要的发展方向,因此,许多新世代封装技术陆续被开发。With the development of terminal electronic products becoming increasingly light, thin, small, high-speed and multi-functional, traditional lead frame packaging products and packaging technologies are increasingly unable to meet the requirements of existing IC technology and electronic products, except for the miniaturization of electronic components to reduce volume In addition, reducing the number of electronic components used is also a development strategy. However, in order to avoid affecting the function and stability of terminal electronic products due to the reduction of the number of components, integrating components into an integrated substrate has become an important development direction. Therefore , many new-generation packaging technologies have been developed one after another.
整合型元件的发展尚须仰赖整合技术,在市场需求促使下,使得系统级封装(System in Package,SiP)成为发展趋势。系统级封装于一基板上,透过堆栈或连接至少一种不同功能的元件,以达到终端电子产品所需的系统性功能,意即将不同功能的芯片整合于同一封装模块中。系统级封装以结构外观而言,可分为二维及三维封装,其中,三维系统级封装包含芯片堆栈(Stack Die)、PoP(Package on Package)、PiP(Package in Package)及内埋式元件(Embedded component)等技术,目前系统级封装以整合主动及被动元件为发展方向,藉由不同形式的封装技术,将主动及被动元件埋入基板内,使系统封装产品更能符合下游产品的需求。以内埋式被动元件为例,其将原本设置于印刷电路板基板表面的电阻、电感及电容等被动元件埋入基板中,意即,将习知以表面黏着技术(SMD)贴合于基板表面的被动元件整合到印刷电路板中,如此可减少单一电路板所需要的使用面积,达到缩小产品尺寸、减少电路板的焊锡点、提升电性且降低噪声。由于其将被动元件内埋于电路板中,因此可以减少湿度、腐蚀等问题,而延长使用年限。三维系统级封装因具有薄型、系统成本低、效能高,且容许高度异质芯片整合等优势,近年来受到业界所青睐,并致力于优化现有的系统级封装技术,或结合不同种类的系统级封装技术使用。The development of integrated components still needs to rely on integration technology. Driven by market demand, System in Package (SiP) has become a development trend. The system-in-package is on a substrate, and at least one component with different functions is stacked or connected to achieve the system function required by the terminal electronic product, which means that chips with different functions are integrated in the same package module. In terms of structural appearance, system-in-package can be divided into two-dimensional and three-dimensional packages. Among them, three-dimensional system-in-package includes chip stack (Stack Die), PoP (Package on Package), PiP (Package in Package) and embedded components (Embedded component) and other technologies. At present, the development direction of system-in-package is to integrate active and passive components. Through different forms of packaging technology, active and passive components are embedded in the substrate, so that system package products can better meet the needs of downstream products. . Taking embedded passive components as an example, passive components such as resistors, inductors, and capacitors that were originally placed on the surface of the printed circuit board substrate are embedded in the substrate, that is, the conventional surface mount technology (SMD) is used to attach the surface of the substrate to the surface of the substrate. Passive components are integrated into the printed circuit board, which can reduce the area required for a single circuit board, reduce product size, reduce solder joints on the circuit board, improve electrical performance and reduce noise. Because it embeds passive components in the circuit board, it can reduce problems such as humidity and corrosion, and prolong the service life. Three-dimensional system-in-package has been favored by the industry in recent years due to its advantages of thinness, low system cost, high performance, and allowing highly heterogeneous chip integration. Level packaging technology is used.
然而,目前内埋元件技术多以焊接方式接合芯片与导线层,或导线层与导柱等结构,导致整个模块电阻值提高,此外,习知PoP封装技术,需焊接一中介层以保留打线空间并且保护元件,除增加封装厚度外,亦提高电阻值。有鉴于此些缺点,本发明提出一种崭新的内埋式线路封装的方法,将内埋元件技术现有的问题进行优化,并结合PoP封装技术,降低电阻值,改善繁复的制程。However, the current embedded component technology mostly uses soldering to join the chip and the wire layer, or the wire layer and the guide post, etc., resulting in an increase in the resistance of the entire module. In addition, the conventional PoP packaging technology needs to solder an interposer to preserve the wiring. Space and protect components, in addition to increasing the thickness of the package, it also increases the resistance value. In view of these shortcomings, the present invention proposes a brand-new embedded circuit packaging method, which optimizes the existing problems of embedded component technology, and combines PoP packaging technology to reduce the resistance value and improve the complicated manufacturing process.
发明内容Contents of the invention
本发明的主要目的,在于提供一种内埋式线路封装的方法,其系将一第一导线层直接电镀于一内埋元件上,取代习知以焊接接合的方法,以降低电阻值,提高效能及稳定性。The main purpose of the present invention is to provide a method for embedded circuit packaging, which is to directly electroplate a first wire layer on an embedded component, replacing the conventional method of soldering and joining, so as to reduce the resistance value and improve performance and stability.
本发明的另一目的,在于提供一种内埋式线路封装的方法,系将一第二导线层直接电镀于数个导柱上,而非焊接接合,如此可降低整个模块的电阻值,并提升电性。Another object of the present invention is to provide a method for embedded circuit packaging, which is to directly electroplate a second wire layer on several guide posts instead of soldering, so that the resistance value of the entire module can be reduced, and Improve electricity.
为了达到上述的目的,本发明揭示了一种内埋式线路封装的方法,其包含:提供一载板,且设置一内埋元件于该载板上,并于该内埋元件的至少一侧形成数个导柱;电镀一第一导线层于该内埋元件上;形成一图案化第一介电层用以包覆该些导柱、该内埋元件及该第一导线层,并显露出该些导柱的一第一端面与部分该第一导线层;随后电镀一第二导线层于自该图案化第一介电层所显露出的第一导线层及该些导柱的该第一端面;接续形成一位于图案化第一介电层上的一第二介电层,并包覆该第二导线层,并显露出部分该第二导线层的端面;形成一第三导线层于自该第二介电层显露出的该第二导线层的端面上;接续形成一位于该第二介电层上的一第三介电层以包覆该第三导线层;最后移除该载板并露出该些导柱的一第二端面。由于本发明的封装方法以电镀取代焊接接合,使整个芯片模块电阻值大幅降低,因而可提升其效能及稳定性。In order to achieve the above object, the present invention discloses a method of embedded circuit packaging, which includes: providing a carrier board, and arranging an embedded component on the carrier board, and at least one side of the embedded component forming a plurality of guide pillars; electroplating a first wire layer on the embedded element; forming a patterned first dielectric layer to cover the guide pillars, the embedded element and the first wire layer, and exposing A first end face of the guide pillars and part of the first conductor layer are exposed; then a second conductor layer is electroplated on the first conductor layer exposed from the patterned first dielectric layer and the guide pillars The first end face; forming a second dielectric layer on the patterned first dielectric layer, covering the second wire layer, and exposing part of the end face of the second wire layer; forming a third wire Layer on the end surface of the second wire layer exposed from the second dielectric layer; then form a third dielectric layer on the second dielectric layer to cover the third wire layer; finally move removing the carrier plate and exposing a second end surface of the guide pillars. Since the packaging method of the present invention uses electroplating instead of welding, the resistance value of the entire chip module is greatly reduced, thereby improving its performance and stability.
而利用上述内埋式线路封装的方法所制成的内埋式封装结构包括一第一导线层,设置于该内埋元件上;一图案化第一介电层,包覆该内埋元件、该第一导线层及该些导柱,并显露出该第一导线层的部分区域与该些导柱的一端面;一第二导线层,设置于自该图案化第一介电层所显露出的该第一导线层的部分区域及该些导柱的端面上;一第二介电层,设置于该图案化第一介电层上并且包覆该第二导线层,并露出部分该第二导线层的端面;一第三导线层,设置于自该第二介电层所显露出的该第二导线层的端面上;及一第三介电层,包覆该第三导线层。And the embedded packaging structure made by the above-mentioned embedded circuit packaging method includes a first wire layer disposed on the embedded element; a patterned first dielectric layer covering the embedded element, The first wire layer and the guide pillars, and expose a part of the first wire layer and an end surface of the guide pillars; a second wire layer, disposed on the exposed part of the patterned first dielectric layer Part of the area of the first wire layer and the end surfaces of the guide pillars; a second dielectric layer is disposed on the patterned first dielectric layer and covers the second wire layer, and exposes a part of the The end face of the second wire layer; a third wire layer disposed on the end face of the second wire layer exposed from the second dielectric layer; and a third dielectric layer covering the third wire layer .
本发明的一实施例中,其亦揭露于完成移除该载板的步骤后,进一步包括提供一外接模块并电性连接至该些导柱的该第二端面上及/或该第三介电层显露出该第三导线层一端面,并且形成复数个金属球于自该第三介电层所显露出的该第三导线层的端面上。In an embodiment of the present invention, it is also disclosed that after the step of removing the carrier board is completed, further comprising providing an external module and electrically connecting to the second end surfaces of the guide posts and/or the third interface The electrical layer exposes an end face of the third wire layer, and forms a plurality of metal balls on the end face of the third wire layer exposed from the third dielectric layer.
本发明的一实施例中,其亦揭露于设置该内埋元件的步骤前,进一步包含电镀一散热层于该载板上。In an embodiment of the present invention, it is also disclosed that before the step of arranging the embedded device, further comprising electroplating a heat dissipation layer on the carrier board.
本发明的一实施例中,其亦揭露于设置该内埋元件的步骤中,该内埋元件透过一黏胶层黏附于该载板上。In an embodiment of the present invention, which is also disclosed in the step of arranging the embedded component, the embedded component is adhered to the carrier through an adhesive layer.
本发明的一实施例中,其亦揭露该黏胶层为接合胶或接合膜。In an embodiment of the present invention, it also discloses that the adhesive layer is a joint glue or a joint film.
本发明的一实施例中,其亦揭露该些导柱包含铜。In an embodiment of the present invention, it is also disclosed that the guide posts include copper.
本发明的一实施例中,其亦揭露于电镀该第二导线层的步骤前,以雷射处理该第一介电层而露出该第一导线层。In an embodiment of the present invention, it is also disclosed that before the step of electroplating the second wiring layer, the first dielectric layer is treated with laser to expose the first wiring layer.
本发明的一实施例中,其亦揭露该内埋元件为一主动元件、一被动元件、一半导体芯片或一电路板。In an embodiment of the present invention, it also discloses that the embedded component is an active component, a passive component, a semiconductor chip or a circuit board.
附图说明Description of drawings
图1:其为本发明的第一施例的结构示意图;Fig. 1: it is the structural representation of the first embodiment of the present invention;
图2:其为本发明的第一施例的方法流程图;Fig. 2: it is the method flowchart of the first embodiment of the present invention;
图3A至图3K:其为本发明的第一实施例的封装方法示意图;3A to 3K: they are schematic diagrams of the packaging method of the first embodiment of the present invention;
图4:其为本发明的第二实施例的结构示意图;Fig. 4: it is the structural representation of the second embodiment of the present invention;
图5:其为本发明的第三实施例的结构示意图;以及Figure 5: It is a schematic structural diagram of a third embodiment of the present invention; and
图6:其为习知Package on Package(PoP)封装结构示意图。Figure 6: It is a schematic diagram of a conventional Package on Package (PoP) packaging structure.
【图号对照说明】[Description of drawing number comparison]
10 载板10 carrier board
20 封装结构20 package structure
200 黏胶层200 layers of adhesive
202 内埋元件202 Embedded components
204 导柱204 guide post
2042 第一端面2042 First end face
2044 第二端面2044 Second end face
206 第一导线层206 First conductor layer
208 第一介电层208 first dielectric layer
209 图案化第一介电层209 Patterning the first dielectric layer
210 第二导线层210 Second conductor layer
212 第二导线层212 Second conductor layer
214 第二介电层214 Second dielectric layer
216 第三导线层216 Third wiring layer
218 第三介电层218 third dielectric layer
220 外接模块220 add-on modules
222 焊接点222 welding points
224 金属球224 metal ball
226 散热层226 heat dissipation layer
228 内埋元件228 Embedded components
30 封装结构30 package structure
300 线路基板300 circuit substrate
302 中介层302 Interposer
304 焊接点304 welding points
306 外接模块306 add-on modules
具体实施方式Detailed ways
为了使本发明的结构特征及所达成的功效有更进一步的了解与认识,特用较佳的实施例及配合详细的说明,说明如下:In order to make the structural features of the present invention and the achieved effects have a further understanding and recognition, preferred embodiments and detailed descriptions are specially used, which are described as follows:
本实施案例提供一种封装方法,为用于内埋式线路的封装,因应终端电子产品日益轻薄短小,遂以减少电子元件体积、达到高效能及多功能为目的,发展出系统级封装技术,其包含内埋式线路封装及PoP封装等技术,为能使封装成品更符合下游产品需求,并降低制程成本,优化封装方法或结合不同封装技术也因应而生。本发明内埋式线路封装的方法,利用电镀接合取代焊接,大幅降低整个芯片模块的电阻值,藉此提高产品效能及稳定性,此外,该方法的封装结构应用于PoP封装技术时,无需设置中介层即可直接进行外接模块的封装,除可减少电阻值外,亦简化封装流程,降低制程成本。This implementation case provides a packaging method for the packaging of embedded circuits. In response to the increasingly thinner and smaller terminal electronic products, the system-level packaging technology has been developed for the purpose of reducing the volume of electronic components and achieving high performance and multi-function. It includes technologies such as embedded circuit packaging and PoP packaging. In order to make the packaged product more in line with the needs of downstream products and reduce process costs, optimization of packaging methods or the combination of different packaging technologies have also emerged accordingly. The method of embedded circuit packaging of the present invention uses electroplating bonding instead of soldering to greatly reduce the resistance value of the entire chip module, thereby improving product performance and stability. In addition, when the packaging structure of this method is applied to PoP packaging technology, no need to set The interposer can directly package the external modules. In addition to reducing the resistance value, it also simplifies the packaging process and reduces the manufacturing cost.
请参阅图1,其为本发明的第一施例的结构示意图,如图所示,一封装结构20包含一内埋元件202,内埋元件202的一表面上设置有一黏胶层200,此黏胶层200是封装过程中用以将内埋元件202贴合于一载板10(请参阅图3A)上,如后续制程步骤所述;数个导柱204,为设置于该内埋元件202的两侧;一第一导线层206,电镀于内埋元件200的另一侧面上并与内埋元件202电性连接;一图案化第一介电层209,其包覆该些导柱204、该内埋元件202,并显露出部分该第一导线层206与该些导柱204的上下端面(也就是后续所说的一第一端面2042与一第二端面2044);一第二导线层210电镀于自上述的该图案化第一介电层209所显露出的该第一导线层206上并与该第一导线层206电性连接,且一第二导线层212电镀于自该图案化第一介电层209所显露出的该些导柱204的一端面(该第一端面2042)上并与该些导柱204电性连接;一第二介电层214位于该图案化第一介电层209上并且包覆该第二导线层210、212,并显露出部分该第二导线层210、212的一端面;一第三导线层216,形成于自该第二介电层214所显露出的该第二导线层210、212端面上并与该第二导线层210、212电性连接;以及一第三介电层218,位于第二介电层214上并且包覆该第三导线层216,并显露出部分该第三导线层216的一端面。Please refer to FIG. 1 , which is a schematic structural diagram of a first embodiment of the present invention. As shown in the figure, a packaging structure 20 includes an embedded component 202, and an adhesive layer 200 is arranged on a surface of the embedded component 202. The adhesive layer 200 is used to bond the embedded component 202 on a carrier 10 (see FIG. 3A ) during the packaging process, as described in the subsequent process steps; several guide posts 204 are arranged on the embedded component 202 on both sides; a first wire layer 206, electroplated on the other side of the embedded element 200 and electrically connected with the embedded element 202; a patterned first dielectric layer 209, which covers the guide pillars 204, the embedded component 202, and part of the first wire layer 206 and the upper and lower end surfaces of the guide pillars 204 are exposed (that is, a first end surface 2042 and a second end surface 2044 mentioned later); a second The wire layer 210 is electroplated on the first wire layer 206 exposed from the above-mentioned patterned first dielectric layer 209 and is electrically connected with the first wire layer 206, and a second wire layer 212 is electroplated on the first wire layer 206. One end surface (the first end surface 2042) of the guide pillars 204 exposed by the patterned first dielectric layer 209 is electrically connected with the guide pillars 204; a second dielectric layer 214 is located in the pattern on the first dielectric layer 209 and cover the second wire layer 210, 212, and expose part of an end surface of the second wire layer 210, 212; a third wire layer 216 is formed on the second wire layer 216 from the second wire layer The end faces of the second wire layers 210, 212 exposed by the electrical layer 214 are electrically connected to the second wire layers 210, 212; and a third dielectric layer 218 is located on the second dielectric layer 214 and covers Covers the third wire layer 216 and exposes part of an end surface of the third wire layer 216 .
其中,该封装装置20可进一步将复数个金属球224焊接于自第三介电层218所显露出的该第三导线层216的端面上;以及将一外接模块220电性连接于自该图案化第一介电层209所显露出的该些导柱204的另一端面(该第二端面2044)上。Wherein, the packaging device 20 can further solder a plurality of metal balls 224 on the end surface of the third wire layer 216 exposed from the third dielectric layer 218; On the other end surface (the second end surface 2044 ) of the guide pillars 204 exposed by the first dielectric layer 209 .
请参阅图2及第3图,其为本发明的第一实施例的方法流程图及本发明的第一实施例的封装方法示意图,该封装装置20的封装方法步骤包括:Please refer to FIG. 2 and FIG. 3, which are the method flow chart of the first embodiment of the present invention and the schematic diagram of the packaging method of the first embodiment of the present invention. The steps of the packaging method of the packaging device 20 include:
步骤S200:如图3A所示,提供一载板10;Step S200: As shown in FIG. 3A, provide a carrier board 10;
步骤S202:如图3B所示,设置一内埋元件202于该载板10上;该内埋元件202透过一黏胶层200贴合于该载板10上;其中,该内埋元件202可以是一主动元件、一被动元件、一半导体芯片或一电路板等功能性元件,但并不因此局限本发明所使用的该内埋元件202仅能上述的形态,再者,上述的该黏胶层200可选自于接合胶或接合膜;Step S202: As shown in FIG. 3B, set an embedded component 202 on the carrier 10; the embedded component 202 is pasted on the carrier 10 through an adhesive layer 200; wherein, the embedded component 202 It can be an active element, a passive element, a semiconductor chip or a functional element such as a circuit board, but this does not limit the embedded element 202 used in the present invention to the above-mentioned form. Furthermore, the above-mentioned adhesive The glue layer 200 can be selected from joint glue or joint film;
步骤S204:如图3C所示,形成数个导柱204于该内埋元件202的至少一侧,其中,该些导柱204的材质可包含铜;Step S204: As shown in FIG. 3C , forming a plurality of guide pillars 204 on at least one side of the embedded component 202, wherein the material of the guide pillars 204 may include copper;
步骤S206:如图3D所示,形成一第一导线层206于该内埋元件202上,其中,该第一导线层206包含电阻值较低的铜等金属,但并不在此限。该第一导线层206可以电镀法形成于该内埋元件202上,习知以焊接方式连接元件及导线层,由于焊接材料与电镀材料纯度的差异,使焊接相较于电镀有较高电阻值,于此,本发明的封装方法以电镀取代焊接,降低电阻值并提升效能;Step S206 : As shown in FIG. 3D , form a first wiring layer 206 on the embedded device 202 , wherein the first wiring layer 206 includes metals such as copper with low resistance, but not limited thereto. The first wire layer 206 can be formed on the embedded component 202 by electroplating. It is known to connect the component and the wire layer by soldering. Due to the difference in purity between the soldering material and the plating material, soldering has a higher resistance value than electroplating. , here, the packaging method of the present invention replaces soldering with electroplating to reduce resistance and improve performance;
步骤S208:如图3E所示,形成一第一介电层208包覆该些导柱204、该内埋元件202及该第一导线层206,且该第一介电层208的高度本质上与该些导柱204相同,以显露出导柱204的一第一端面2042,接着,以雷射对该第一介电层208进行钻孔,以形成一图案化第一介电层209,而露出部分该第一导线层206(如图3F所示)。但形成图案化第一介电层209的处理方法并不局限于仅能使用雷射进行钻孔;Step S208: As shown in FIG. 3E, a first dielectric layer 208 is formed to cover the guide pillars 204, the embedded element 202 and the first wiring layer 206, and the height of the first dielectric layer 208 is essentially Same as the guide pillars 204, to expose a first end surface 2042 of the guide pillar 204, and then drill the first dielectric layer 208 with a laser to form a patterned first dielectric layer 209, A part of the first wire layer 206 is exposed (as shown in FIG. 3F ). However, the processing method for forming the patterned first dielectric layer 209 is not limited to only using laser for drilling;
步骤S210:如图3G所示,形成一第二导线层210、212于自该图案化第一介电层209所显露出的第一导线层206及该些导柱204的第一端面2042,并与自该图案化第一介电层209所显露出的第一导线层206及该些导柱204电性连接,其中,该第二导线层210、212包含电阻值较低的铜等金属而不在此限,为能使整个模块效能提升,该步骤S210同样以电镀取代焊接,以排除因焊接所造成的电阻;Step S210: As shown in FIG. 3G , forming a second wire layer 210, 212 on the first wire layer 206 exposed from the patterned first dielectric layer 209 and the first end surfaces 2042 of the guide pillars 204, And electrically connected with the first wiring layer 206 exposed from the patterned first dielectric layer 209 and the guide pillars 204, wherein the second wiring layers 210, 212 include metals such as copper with low resistance Not limited to this, in order to improve the performance of the entire module, the step S210 also replaces welding with electroplating, so as to eliminate the resistance caused by welding;
步骤S212:如图3H所示,形成一位于该图案化第一介电层209上且包覆该第二导线层210、212的第二介电层214,该第二介电层212的高度本质上与该第二导线层210、212最高者相同,以显露出后续欲进行电线连接的该第二导线层210、212的端面;Step S212: As shown in FIG. 3H , forming a second dielectric layer 214 located on the patterned first dielectric layer 209 and covering the second wire layers 210, 212, the height of the second dielectric layer 212 is It is essentially the same as the highest one of the second wire layers 210, 212, so as to expose the end faces of the second wire layers 210, 212 to be connected with wires;
步骤S214:如图3I所示,形成一第三导线层216于自该第二介电层214显露出的该第二导线层210、212上,以及部分该第二介电层214上,并与自该第二介电层214显露出的该第二导线层210、212电性连接,且该第三导线层216以电镀方式沉积形成;其中,该第三导线层216包含电阻值较低的铜等金属,但不在此限;Step S214: As shown in FIG. 3I, form a third wiring layer 216 on the second wiring layers 210, 212 exposed from the second dielectric layer 214, and part of the second dielectric layer 214, and It is electrically connected with the second wiring layer 210, 212 exposed from the second dielectric layer 214, and the third wiring layer 216 is deposited and formed by electroplating; wherein, the third wiring layer 216 includes a low resistance copper and other metals, but not limited thereto;
步骤S216:如图3J所示,形成一位于第二介电层214上且包覆该第三导线层216的一第三介电层218,该第三介电层218的高度本质上与该第三导线层216的最高者相同,以显露出欲进行电性连接的该第三导线层216的端面;以及Step S216: As shown in FIG. 3J , forming a third dielectric layer 218 on the second dielectric layer 214 and covering the third wiring layer 216, the height of the third dielectric layer 218 is essentially the same as the The highest ones of the third wire layer 216 are the same, so as to expose the end surface of the third wire layer 216 to be electrically connected; and
步骤S218:如图3K所示,移除该载板10而露出该些导柱204一第二端面2044。Step S218 : as shown in FIG. 3K , remove the carrier board 10 to expose a second end surface 2044 of the guide posts 204 .
上述的该第一介电层208该第二介电层214或该第三介电层218是利用模铸方法所形成,模铸介电层的材质可选用芯片封装用的模铸化合物(Molding Compound),其例如但不限于具有酚醛基树脂(Novolac-Based Resin)、环氧基树脂(Epoxy-Based Resin)、硅基树脂(Silicone-Based Resin)或其他适当的模铸化合物,且模铸化合物亦可包含适当的填充剂,例如是粉状二氧化硅。更者,因为是采模铸方法,所以介电层将包覆原先存在的元件,举例来说,如图1所示,该第一介电层208将包覆位于载板10上的黏胶层200、内埋元件202、第一导线层206与该些导柱204,再藉由控制第一介电层208的高度或者图案化来使后续欲进行电性连接的导体部分显露出来,例如该些导柱204的该些端面。The above-mentioned first dielectric layer 208, the second dielectric layer 214 or the third dielectric layer 218 is formed by a molding method, and the material of the molded dielectric layer can be molded compound (Molding compound) for chip packaging. Compound) such as but not limited to having Novolac-Based Resin, Epoxy-Based Resin, Silicone-Based Resin or other suitable molding compound, and molding The compounds may also contain suitable fillers, such as powdered silicon dioxide. What's more, because of the die-casting method, the dielectric layer will cover the existing components. For example, as shown in FIG. 1, the first dielectric layer 208 will cover the adhesive on the carrier 10 layer 200, the embedded element 202, the first wire layer 206, and the guide pillars 204, and then by controlling the height of the first dielectric layer 208 or patterning, the conductor part to be electrically connected in the future is exposed, for example The end surfaces of the guide pillars 204 .
请复参阅图1及图6,其为本发明的第一施例的结构示意图及习知Package onPackage(PoP)封装结构示意图,如图1所示,本发明经由上述方法流程所获得的封装装置,可进一步应用于PoP封装技术。如图六的习知PoP封装结构可以发现,其需焊接一中介层302以保留打线空间并保护一线路基板300,再将一外接模块306焊接于该中介层302上,然而,本发明的封装装置20,可直接设置一外接模块220于该些导柱204上,而毋需设置该中介层302,如此,不仅减少焊接所造成的电阻值,更可简化制程步骤,降低成本。Please refer to FIG. 1 and FIG. 6 again, which are schematic structural diagrams of the first embodiment of the present invention and conventional Package on Package (PoP) packaging structures. As shown in FIG. , which can be further applied to PoP encapsulation technology. As can be seen in the conventional PoP packaging structure shown in Figure 6, it needs to weld an interposer 302 to reserve the wiring space and protect a circuit substrate 300, and then solder an external module 306 on the interposer 302, however, the present invention The packaging device 20 can directly arrange an external module 220 on the guide pillars 204 without disposing the intermediary layer 302. In this way, not only the resistance value caused by soldering is reduced, but also the manufacturing process steps can be simplified and the cost can be reduced.
请参阅图4,其为本发明的第二实施例的结构示意图,上述方法流程中,于执行该步骤S202前,亦可设置一散热层226于该载板10上,再形成该黏胶层200于该散热层226上,以优化该内埋元件202的散热效果,该散热层226可以电镀方法设置于该载板10,但不在此限。Please refer to FIG. 4, which is a schematic structural diagram of the second embodiment of the present invention. In the above method flow, before performing the step S202, a heat dissipation layer 226 may also be provided on the carrier board 10, and then the adhesive layer may be formed. 200 is on the heat dissipation layer 226 to optimize the heat dissipation effect of the embedded element 202. The heat dissipation layer 226 can be disposed on the carrier 10 by electroplating, but not limited thereto.
请参阅图5,其为本发明的第三实施例的结构示意图,上述方法流程中,执行该步骤S212前,可依据模块的功能需求,进一步设置一内埋元件228于该第二介电层210上,其设置方法可为表面黏合技术(SMT),但不在此限,其中该内埋元件228为一主动元件、一被动元件、一半导体芯片或一电路板等功能性元件,然不在此限。Please refer to FIG. 5 , which is a schematic structural diagram of a third embodiment of the present invention. In the above method flow, before performing step S212, an embedded element 228 may be further arranged on the second dielectric layer according to the functional requirements of the module. 210, the installation method can be surface bonding technology (SMT), but not limited thereto, wherein the embedded component 228 is a functional component such as an active component, a passive component, a semiconductor chip or a circuit board, but not here limit.
综合上述内容,本发明的内埋线路封装的方法,以电镀方式形成连接该内埋元件与导柱的第一导线层、第二导线层与第三导线层,习知内埋式技术以焊接连接元件及导线层,然而,焊接材料的纯度较电镀材料为低,造成其电阻值相对提高,本发明以电镀取代焊接,使整个模块的电阻值大幅降低,藉此提高电性、效能及稳定性。此外,本发明的封装装置可进一步应用于PoP封装技术,且可省略设置该中介层,简化制程步骤并降低成本。Based on the above, the embedded circuit packaging method of the present invention uses electroplating to form the first wire layer, the second wire layer, and the third wire layer connecting the embedded component and the guide post. The conventional embedded technology is connected by soldering. Components and wire layers, however, the purity of soldering materials is lower than that of electroplating materials, resulting in relatively higher resistance values. The present invention replaces soldering with electroplating, which greatly reduces the resistance value of the entire module, thereby improving electrical properties, performance and stability. . In addition, the packaging device of the present invention can be further applied to PoP packaging technology, and the interposer layer can be omitted, which simplifies the process steps and reduces the cost.
上文仅为本发明的较佳实施例而已,并非用来限定本发明实施的范围,凡依本发明权利要求范围所述的形状、构造、特征及精神所为的均等变化与修饰,均应包括于本发明的权利要求范围内。The above is only a preferred embodiment of the present invention, and is not intended to limit the implementation scope of the present invention. All equivalent changes and modifications made in accordance with the shape, structure, characteristics and spirit described in the scope of the claims of the present invention shall be included in the scope of the claims of the present invention.
Claims (10)
- A kind of 1. method of embedded line encapsulation, it is characterised in that its step includes:One support plate is provided;One embedded element is set on the support plate;Several guide pillars are formed at least side of the embedded element;A conductor layer No.1 is formed on the embedded element;First dielectric layer of patterning is formed, it coats those guide pillars and the embedded element, and manifests part first wire One first end face of layer and the guide pillar;Form the conductor layer No.1 and those guide pillars that one second conductor layer is manifested from the dielectric layer of patterning first in this The first end face on;One second dielectric layer is formed, it coats second conductor layer, and manifests the end face of part second conductor layer;A privates layer is formed on the end face of second conductor layer manifested from second dielectric layer;One the 3rd dielectric layer is formed, it coats the privates layer;AndRemove the support plate and expose a second end face of those guide pillars.
- 2. the method for embedded line encapsulation as claimed in claim 1, it is characterised in that wherein remove the support plate in completion After step, further comprise:One external connection module is provided and is electrically connected in the second end face of those guide pillars;And/or3rd dielectric layer manifests the privates layer end face, and forms a plurality of metal balls in from the 3rd dielectric layer On the end face of the privates layer manifested.
- 3. the method for embedded line as claimed in claim 1 encapsulation, it is characterised in that wherein in setting the embedded element Before step, further comprising one heat dissipating layer of setting on the support plate.
- 4. the method for embedded line as claimed in claim 1 encapsulation, it is characterised in that wherein in setting the embedded element In step, the embedded element is attached on the support plate through a mucigel.
- 5. the method for embedded line encapsulation as claimed in claim 4, it is characterised in that wherein the mucigel engages glue or connect Close film.
- 6. the method for embedded line encapsulation as claimed in claim 1, it is characterised in that the material of wherein those guide pillars includes Copper.
- 7. the method for embedded line encapsulation as claimed in claim 1, it is characterised in that the wherein dielectric layer of patterning first The conductor layer No.1 is manifested with Laser drill.
- 8. the method for embedded line encapsulation as claimed in claim 1, it is characterised in that wherein the embedded element is an active Element, a passive device, semiconductor chip or a circuit board.
- 9. the method for embedded line as claimed in claim 1 encapsulation, it is characterised in that wherein the conductor layer No.1, this Two conductor layers are formed with any of the privates layer by plating mode.
- 10. the encapsulating structure obtained by a kind of method of the embedded line encapsulation described in usage right requirement 1, its feature exist In it includes:One embedded element;Several guide pillars, it is arranged at least side of the embedded element;One conductor layer No.1, it is arranged on the embedded element;One the first dielectric layer of patterning, coats the embedded element, the conductor layer No.1 and those guide pillars, and manifest this and first lead The subregion of line layer and the end face of those guide pillars;One second conductor layer, be arranged at the conductor layer No.1 manifested from the dielectric layer of the patterning first subregion and On the end face of those guide pillars;One second dielectric layer, it is arranged on the dielectric layer of patterning first and coats second conductor layer, and exposed portion should The end face of second conductor layer;One privates layer, it is arranged on the end face of second conductor layer manifested from second dielectric layer;AndOne the 3rd dielectric layer, coat the privates layer.
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