CN107632449A - A kind of quantum dot liquid crystal display panel and preparation method thereof - Google Patents
A kind of quantum dot liquid crystal display panel and preparation method thereof Download PDFInfo
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- CN107632449A CN107632449A CN201710933361.5A CN201710933361A CN107632449A CN 107632449 A CN107632449 A CN 107632449A CN 201710933361 A CN201710933361 A CN 201710933361A CN 107632449 A CN107632449 A CN 107632449A
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- 239000002096 quantum dot Substances 0.000 title claims abstract description 56
- 238000002360 preparation method Methods 0.000 title claims abstract description 27
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- 239000012528 membrane Substances 0.000 claims abstract description 87
- 239000010410 layer Substances 0.000 claims description 72
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- 229910052751 metal Inorganic materials 0.000 claims description 31
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
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Abstract
The present invention discloses a kind of quantum dot liquid crystal display panel and preparation method thereof, is related to technical field of liquid crystal display.To solve the problems, such as that existing quantum dot liquid crystal display panel requires higher invention to backlight collimation.Quantum dot liquid crystal display panel of the present invention includes the color membrane substrates with wire grid polarizer, array base palte and liquid crystal layer, the color membrane substrates are stacked with the array base palte, the liquid crystal layer is arranged between the color membrane substrates and the array base palte, and the color membrane substrates include color membrane substrates main body and wire grid polarizer, the wire grid polarizer is arranged at the color membrane substrates main body on a side surface of the array base palte.Quantum dot liquid crystal display panel of the present invention is used to electric signal being changed into visible light.
Description
Technical field
The present invention relates to technical field of liquid crystal display, more particularly to a kind of quantum dot liquid crystal display panel and its making side
Method.
Background technology
At present, quantum dot liquid crystal display panel is as a kind of panel display apparatus, because it has color purity height, color also
Proper energy power is strong, stability is good, the excellent feature of energy saving, and is applied to more and more among high-performance display field.
Existing quantum dot liquid crystal display panel includes color membrane substrates, array base palte and positioned at color membrane substrates and array base
Liquid crystal layer between plate, color membrane substrates are provided with the first polarizer, and array base palte is provided with the second polarizer, for traditional liquid
LCD panel, the first polarizer and the second polarizer are respectively arranged at the outer surface of color membrane substrates and array base palte, and pin
It is produced because the quanta point material in color membrane substrates by polarized blue light when being excited to quantum dot liquid crystal display panel
Fluorescence be non-polarized light, therefore in order that the first polarizer can with the second polarizer coordinate regulation backlight brightness, first
Polarizer should be arranged at the inner surface of color membrane substrates, to ensure that the light into the first polarizer adjusts as by the second polarizer
Polarised light afterwards, so that the first polarizer can coordinate the brightness of regulation backlight with the second polarizer.
But when the first polarizer is arranged at the inner surface of color membrane substrates, due to what is commonly used on liquid crystal display panel
Polarizer thickness is larger, and which increases the distance between color membrane substrates and array base palte, substantially increase quantum dot liquid crystal
Requirement of the display panel to backlight collimation.
The content of the invention
The present invention provides a kind of quantum dot liquid crystal display panel and preparation method thereof, can reduce quantum dot LCD
The distance between color membrane substrates and array base palte in plate, so as to reduce quantum dot liquid crystal display panel to backlight collimation
It is required that.
To reach above-mentioned purpose, the present invention adopts the following technical scheme that：
On the one hand, the invention provides a kind of quantum dot liquid crystal display panel, including the color membrane substrates with wire grid polarizer,
Array base palte and liquid crystal layer, the color membrane substrates are stacked with the array base palte, and the liquid crystal layer is arranged at the color film
Between substrate and the array base palte, and the color membrane substrates include color membrane substrates main body and wire grid polarizer, and the wiregrating is inclined
The piece that shakes is arranged at the color membrane substrates main body on a side surface of the array base palte.
On the other hand, the invention provides a kind of preparation method of quantum dot liquid crystal display panel, including：
Wire grid polarizer is set in the inner surface of color membrane substrates main body, to form the color membrane substrates with wire grid polarizer；
The color membrane substrates and array base palte are set into liquid to box, and between the color membrane substrates and the array base palte
Crystal layer.
A kind of quantum dot liquid crystal display panel provided by the invention and preparation method thereof, the polarization included due to color membrane substrates
Piece is wire grid polarizer, and compared to common polarizer, the thickness of wire grid polarizer is smaller, and wire grid polarizer is carried when using this
Color membrane substrates and array base palte to box and after forming quantum dot liquid crystal display panel, between color membrane substrates and array base palte away from
From smaller, requirement of the quantum dot liquid crystal display panel to backlight collimation is relatively low.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, on the premise of not paying creative work, can be with
Other accompanying drawings are obtained according to these accompanying drawings.
Fig. 1 is the structural representation of quantum dot liquid crystal display panel of the embodiment of the present invention；
Fig. 2 is the structural representation of the color membrane substrates with wire grid polarizer in quantum dot liquid crystal display panel of the embodiment of the present invention
Figure；
Fig. 3 is one of flow chart of preparation method of quantum dot liquid crystal display panel of the embodiment of the present invention；
Fig. 4 is the two of the flow chart of the preparation method of quantum dot liquid crystal display panel of the embodiment of the present invention；
Fig. 5 be quantum dot liquid crystal display panel of the embodiment of the present invention preparation method in by protective layer transfer to the amount of being provided with
Structural representation when on the second underlay substrate of sub- stippling film layer；
Fig. 6 is that wire grid polarizer is transferred into color film in the preparation method of quantum dot liquid crystal display panel of the embodiment of the present invention
The structural representation during inner surface of substrate；
Fig. 7 is to be formed to turn on the first underlay substrate in the preparation method of quantum dot liquid crystal display panel of the embodiment of the present invention
Print the structural representation after layer；
Fig. 8 be quantum dot liquid crystal display panel of the embodiment of the present invention preparation method on transfer printing layer formed metal level it
Structural representation afterwards；
Fig. 9 is to form photoresist layer on the metal layer in the preparation method of quantum dot liquid crystal display panel of the embodiment of the present invention
Structural representation afterwards；
Figure 10 is that making ide is stamped into photoresist in the preparation method of quantum dot liquid crystal display panel of the embodiment of the present invention
Structural representation during layer；
Figure 11 be quantum dot liquid crystal display panel of the embodiment of the present invention preparation method in by making ide and photoresist and
Structural representation after metal level separation；
Figure 12 is photoresist to be removed in the preparation method of quantum dot liquid crystal display panel of the embodiment of the present invention and not by light
The structural representation of the wiregrating formed after the metal level of photoresist covering.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation describes, it is clear that described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other under the premise of creative work is not made
Embodiment, belong to the scope of protection of the invention.
In the description of the invention, it is to be understood that term " " center ", " on ", " under ", "front", "rear", " left side ",
The orientation or position relationship of the instruction such as " right side ", " vertical ", " level ", " top ", " bottom ", " interior ", " outer " are based on shown in the drawings
Orientation or position relationship, be for only for ease of the description present invention and simplify description, rather than instruction or imply signified device or
Element must have specific orientation, with specific azimuth configuration and operation, therefore be not considered as limiting the invention.
In description of the invention, unless otherwise indicated, " multiple " are meant that two or more.
Reference picture 1, Fig. 1 be quantum dot liquid crystal display panel of the embodiment of the present invention a specific embodiment, the present embodiment
Quantum dot liquid crystal display panel include the color membrane substrates 1 with wire grid polarizer, array base palte 3 and liquid crystal layer 2, the color film base
Plate 1 is stacked with the array base palte 3, and the liquid crystal layer 2 is arranged between the color membrane substrates 1 and the array base palte 3,
As shown in Fig. 2 the color membrane substrates 1 include color membrane substrates main body 11 and wire grid polarizer 12 (that is to say upper polarizer), it is described
Wire grid polarizer 12 is arranged at the color membrane substrates main body 11 on a side surface of the array base palte 3.
A kind of quantum dot liquid crystal display panel provided by the invention, because the polarizer that color membrane substrates 1 include is inclined for wiregrating
Shake piece 12, and compared to common polarizer, the thickness of wire grid polarizer 12 is smaller, when the color film that wire grid polarizer is carried using this
Substrate 1 and array base palte 3 are to box and after forming quantum dot liquid crystal display panel, the distance between color membrane substrates 1 and array base palte 3
Smaller, requirement of the quantum dot liquid crystal display panel to backlight collimation is relatively low.
In the above-described embodiments, as shown in figure 1, quantum dot liquid crystal display panel is except including color membrane substrates 1, liquid crystal layer 2
Outside array base palte 3, in addition to lower polarizer 4, lower polarizer 4 are arranged at surface of the array base palte 3 away from color membrane substrates 1.
Specifically, color membrane substrates main body 11 can be made as structure shown in Fig. 2, i.e. color membrane substrates main body 11 includes stacking
Underlay substrate 111, quantum stippling film layer 112 and the protective layer 113 of setting, quantum stippling film layer 112 are located at underlay substrate 111 and leaned on
The side of nearly array base palte 3, protective layer 113 are located at quantum stippling film layer 112 close to the side of array base palte 3, so, can passed through
Protective layer 113 protects quantum stippling film layer 112, prevent carry shift color membrane substrates main body 11 when external environment in dust and
Moisture enters in quantum stippling film layer 112.
Wherein, as shown in Fig. 2 the material of underlay substrate 111 can be glass, quartz etc., specific limit is not done herein
It is fixed.
In addition, the material of protective layer 113 can be OC glue, or other insulation transparent materials, not do herein specific
Limit.
In the prior art, ensuring that wire grid polarizer can be on the premise of normal use, the wiregrating cycle of wire grid polarizer
It is the smaller the better.And the wiregrating cycle of wire grid polarizer is smaller, making required precision is higher, and difficulty of processing is bigger.Therefore synthesis is examined
Consider technology difficulty coefficient and polarization effect, it is preferred that as shown in figure 12, the wiregrating cycle T of wire grid polarizer 12 for 100~
150nm。
In the embodiment shown in Figure 2, it is preferred that as shown in figure 12, the wiregrating width W of wire grid polarizer 12 for 50~
80nm, to cause the polarization effect of wire grid polarizer 12 preferable, while requirement of the wire grid polarizer 12 to machining accuracy is reduced,
When the wiregrating width W of wire grid polarizer 12 is less than 50nm, wiregrating width is narrow, and requirement on machining accuracy is higher, difficulty of processing compared with
Greatly；And when the wiregrating width W of wire grid polarizer 12 is more than 80nm, in equal area, the wiregrating negligible amounts that can be formed,
The polarization effect of wire grid polarizer 12 is bad.
In the embodiment shown in Figure 2, in order that wire grid polarizer 12 can be effectively polarized to incident light, it is simultaneously
Avoid because the thickness of wire grid polarizer 12 is excessive cause display panel slimming design it is limited, it is preferred that such as Figure 12 institutes
Showing, the wiregrating thickness H of wire grid polarizer 12 is 100~300nm, when the wiregrating thickness H of wire grid polarizer 12 is less than 100nm,
Wiregrating thickness H is too small so that wire grid polarizer 12 can not be effectively polarized to incident light；When the wiregrating of wire grid polarizer 12 is thick
When degree H is more than 300nm, wiregrating thickness is excessive, is unfavorable for the slimming design of display panel.
In the embodiment shown in Figure 2, color membrane substrates 1 are in addition to including color membrane substrates main body 11, wire grid polarizer 12,
Also include transparency conducting layer 13, transparency conducting layer 13 is arranged at wire grid polarizer 12 close to the side of array base palte 3, and and liquid crystal
Layer 2 contacts, for the external signal of quantum dot liquid crystal display panel to be introduced in liquid crystal layer 2.
In the above-described embodiments, the material of transparency conducting layer 13 can be tin indium oxide (Indium tin oxide,
ITO), it can also be other transparent conductive materials, be not specifically limited herein.
Referring to Fig. 3, Fig. 3 is a kind of preparation method of quantum dot liquid crystal display panel provided in an embodiment of the present invention, including：
S1, the inner surface setting wire grid polarizer in color membrane substrates main body, to form the color film base with wire grid polarizer
Plate；
S2, the color membrane substrates and array base palte are set to box, and between the color membrane substrates and the array base palte
Put liquid crystal layer.
A kind of preparation method of quantum dot liquid crystal display panel provided by the invention, the polarizer included due to color membrane substrates
For wire grid polarizer, compared to common polarizer, the thickness of wire grid polarizer is smaller, and wire grid polarizer is carried when using this
Color membrane substrates and array base palte are to box and after forming quantum dot liquid crystal display panel, the distance between color membrane substrates and array base palte
Smaller, requirement of the quantum dot liquid crystal display panel to backlight collimation is relatively low.
, wherein it is desired to explanation, the inner surface of color membrane substrates main body refer to color membrane substrates main body in the amount of being assembled to form
Close to a side surface of array base palte during son point liquid crystal display panel.
In addition, as shown in Fig. 2 color membrane substrates main body 11 includes underlay substrate 111 and is arranged on underlay substrate 111
Quantum stippling film layer 112, the inner surface of color membrane substrates main body 11 are located at quantum stippling film layer 112 away from underlay substrate 111
Side.
Furthermore in step S2, between color membrane substrates and array base palte set liquid crystal layer can be by color membrane substrates with
Before array base palte is to box, the inner surface setting liquid crystal of one in color membrane substrates and array base palte, then again by color film base
Another in plate and array base palte is fastened on liquid crystal or after color membrane substrates and array base palte are to box, to color film
Liquid crystal is injected in gap between substrate and array base palte, to form liquid crystal layer, is not specifically limited herein.
Specifically, step S1 can include following two optional embodiments：
The first optional embodiment, step S1 are specifically included：
S11 ', quantum stippling film layer is made on underlay substrate, to form color membrane substrates main body；
S12 ', using color membrane substrates main body as underlay substrate, and color membrane substrates main body inner surface make wire grid polarization
Piece, to form the color membrane substrates with wire grid polarizer.
The method process is simple, still, as shown in Fig. 2 because quantum stippling film layer 112 specifically includes red quantum dot
1121st, green quantum dot 1122, blue quantum dot 1123 and black matrix 1124, red quantum dot 1121, green quantum dot 1122,
Blue quantum dot 1123 and black matrix 1124 are respectively formed on underlay substrate 111 typically by multiple working procedure, so, just
It is difficult to ensure that the surface smoothness of quantum stippling film layer 112, it is also difficult to ensure the smooth of the inner surface of color membrane substrates main body 11
Degree, therefore, if directly being added using mask manufacture craft or nano-imprint process on the inner surface of color membrane substrates main body 11
Work is molded wire grid polarizer, then the possibility of adhesion between two neighboring wiregrating easily occurs.
Second of optional embodiment, as shown in figure 4, step S1 includes：
S11, transfer printing layer 200 is formed on the first underlay substrate 100, as shown in Figure 7；
S12, wire grid polarizer 12 is made on the transfer printing layer 200；
S13, as shown in fig. 6, the wire grid polarizer 12 to be transferred to the inner surface of color membrane substrates main body 11.
So, because wire grid polarizer 12 is arranged at the inner surface of color membrane substrates main body 11 by way of transfer, and
Before wire grid polarizer 12 is transferred, wire grid polarizer 12 is taken shape on the transfer printing layer 200 on the first underlay substrate 100, is compared
In the inner surface of color membrane substrates main body 11, the surface smoothness of the first underlay substrate 100 is content with very little requirement, therefore can reduce
There is the possibility of adhesion between two neighboring wiregrating during making wire grid polarizer 12, so as to advantageously ensure that wiregrating
The Forming Quality of polarizer 12, improve the shaping yield of quantum dot liquid crystal display panel.
Wherein, the material of the first underlay substrate 100 can be glass, quartz, metal etc., not do specific limit herein
It is fixed.
Specifically, in above-mentioned second of optional embodiment, step S13 includes：
S131, transparent adhesive tape (not shown) is set on the inner surface of color membrane substrates main body 11；
S132, the wire grid polarizer 12 is adhered on the inner surface of the color membrane substrates main body 11；
S133, the separation underlay substrate 100 of wire grid polarizer 12 and first.
Wherein, transparent adhesive tape can be shadowless glue, pressure sensitive adhesive etc., be not specifically limited herein.When transparent adhesive tape is shadowless glue
When, also include before step S133：By ultraviolet light irradiation transparent adhesive tape, to solidify transparent adhesive tape.When transparent adhesive tape is pressure sensitive adhesive
When, the step S132 is specifically included：Wire grid polarizer 12 is adhered on substratum transparent, and applies one to wire grid polarizer 12
Quantitative extruding force is so that sub- quick adhesive curing.
In addition, in above-mentioned steps S133, when separating wire grid polarizer 12 and the first underlay substrate 100, transfer printing layer 200 can
, can also be inclined with the first underlay substrate 100 and wiregrating to be separated with wire grid polarizer 12 with the first underlay substrate 100
The piece 12 that shakes separates, and is not specifically limited herein.
In order to make color membrane substrates main body 11, optionally, before step S13, in addition to：
S13A, protective layer 113 is formed on the 3rd underlay substrate 300；
S13B, as shown in figure 5, protective layer 113 to be transferred to the second underlay substrate for being provided with quantum stippling film layer 112
On 111, so that the protective layer 113 covers the quantum stippling film layer 112, and the color membrane substrates main body with protective layer is formed
11。
So, during color membrane substrates main body 11 is made, protective layer 113 is formed at quantum dot by way of transfer
In color film layer 112, it is possible to increase the surface smoothness of protective layer 113, so as to improve the inner side table of color membrane substrates main body 11
The flatness in face, in favor of ensure wire grid polarizer 12 in multiple wiregratings transfer when can simultaneously with color membrane substrates main body 11
Inner surface bonding, so as to ensure transfer quality.
Wherein, step S13B is specifically included：On the second underlay substrate 111 of quantum stippling film layer 112 is provided with or
Transparent adhesive tape is set on the protective layer 113；Protective layer 113 is adhered to the second substrate base for being provided with quantum stippling film layer 112
On plate 111, and protective layer 113 is set to cover quantum stippling film layer 112；Separate the underlay substrate 300 of protective layer 113 and the 3rd.
In addition, in order to ensure the transfer quality of diaphragm, it is preferred that before step S13A, in addition to：The described 3rd
Oil film is set on underlay substrate 300；Accordingly, the protective layer 113 is formed on the 3rd underlay substrate 300 specifically to wrap
Include：It is provided with the 3rd underlay substrate 300 on the surface of oil film and forms the protective layer 113.Thus, avoided by oil film
Protective layer 113 in transfer producing adhesion between the 3rd underlay substrate 300, so as to ensure that transfer quality.
Furthermore the material of the 3rd underlay substrate 300 can be glass, quartz, metal etc., be not specifically limited herein.
But compared to glass and quartz, the toughness of metal material is preferable, can produce a certain degree of flexural deformation, is easy to
Lock out operation between three underlay substrates 300 and diaphragm 113, therefore, in order to reduce the underlay substrate of diaphragm 113 and the 3rd
300 separating difficulty, the preferably material of the 3rd underlay substrate 300 are metal.
In the embodiment shown in fig. 4, specifically, step 12 can include following two embodiments：
Embodiment one：
Metal level 400 is formed on S121, transfer printing layer 200 in the figure 7, forms structure shown in Fig. 8；
Photoresist layer 500 is formed on S122, metal level 400 in fig. 8, forms structure shown in Fig. 9；
S123, as shown in Figure 10, making ide 600 is stamped into the photoresist layer 500, and make the making ide 600
Contacted with the metal level 400；
S124, curing process is carried out to the photoresist in the making ide 600；
S125, the making ide 600 separated with the photoresist 500 and the metal level 400, remove making ide
Structure after 600 is as shown in figure 11；
S126, the photoresist 500 and the metal level 400 not covered by the photoresist 500 are removed, with institute
The surface for stating transfer printing layer 200 forms wire grid pattern shown in Figure 12.
Thus, the making of wire grid pattern is realized by stamping technique.
Embodiment two：
S121 ', form metal level on the transfer printing layer；
S122 ', form photoresist layer on the metal level；
S123 ', the surface that mask plate is arranged to the photoresist layer；
The part of the mask plate transmission region is corresponded to described in S124 ', exposure-processed on photoresist layer；
S125 ', separation mask plate and photoresist layer；
S126 ', the part that the mask plate lightproof area is corresponded on the photoresist layer is removed, to manifest metal level；
S127 ', the photoresist and the metal level not covered by the photoresist are removed, with the transfer printing layer
Surface formed wire grid pattern.
Thus, the making of wire grid pattern is realized by photolithographic masking technique.
In above-described embodiment one and embodiment two, metal level 400 can include in aluminum particulate, copper particle, iron particle
It is at least one.Because the electric conductivity of metallic aluminium is stronger, therefore the free electron contained in metallic aluminium is more.And in the present invention
Wire grid polarizer 12 is exactly to realize to be polarized incident light using the oscillating characteristic of free electron in metal.Therefore, the present invention is real
Preferable metal level 400 in example is applied to be made up of aluminum particulate or aluminium alloy particle.
In above-described embodiment one, curing process can refer to using heating, pressurization, curing agent or action of ultraviolet light
Under so that photoresist chemically reacts, and produces chemical bond between the molecule of its line style, linear molecule is connected with each other shape
Structure is reticulated, final crosslinking curing turns into insoluble material.Following examples in the present invention are with curing process using purple
Illustrated exemplified by outer light irradiation technique.
,, will be two neighboring due to during impressing in above-described embodiment one compared to above-described embodiment two
Photoresist extrusion between photoresist wiregrating.Therefore without removing the step S126 ' of uncured photoresist in above-described embodiment two,
So as to simplify the making step of wire grid polarizer 12, while it can avoid when removing uncured photoresist 500, because removing
The part of photoresist 500 remains caused by the defects of technique, therefore preferably makes wiregrating using scheme shown in above-described embodiment one
Pattern.
In the step S126 of above-described embodiment one, remove photoresist 500 and remove the metal for not being photo-etched the covering of glue 500
Layer 400 can be carried out simultaneously, can also first remove the metal level 400 for not being photo-etched the covering of glue 500, then remove photoresist 500,
This is not specifically limited.But in order to further simplify the making step of wire grid polarizer 12, it is preferred that remove photoresist 500
The metal level 400 of the covering of glue 500 is not photo-etched with removal while is carried out, and can so reduce the making step of wire grid polarizer 12
Suddenly, processed complex degree is reduced.Specifically, step S126 includes：Light is removed using sense coupling technology simultaneously
Photoresist 500 and the metal level 400 for not being photo-etched the covering of glue 500.So, by sense coupling technology simultaneously
Realize photoresist 500 and be not photo-etched the removal of the metal level 400 of the covering of glue 500, and sense coupling skill
The control accuracy of art is high, large area etching homogeneity is good, etching perpendicularity is good, pollutes less with etching surface flat smooth, can
Improve the formed precision of wire grid polarizer 12.
In above-described embodiment one, making ide 600 can be made by light transmissive material or light-proof material, do not do have herein
Body limits.But when this making ide 600 is made using light-proof material, the ultraviolet needed for curing process can not enter
To be exposed to photoresist in making ide 600, it is therefore preferable that above-mentioned making ide 600 is made of light transmissive material, it is so, purple
Outside line can pass through making ide 600 and be irradiated on photoresist, in order to realize the solidification of photoresist.
The foregoing is only a specific embodiment of the invention, but protection scope of the present invention is not limited thereto, any
Those familiar with the art the invention discloses technical scope in, change or replacement can be readily occurred in, should all be contained
Cover within protection scope of the present invention.Therefore, protection scope of the present invention should be based on the protection scope of the described claims.
Claims (13)
- A kind of 1. quantum dot liquid crystal display panel, it is characterised in that including the color membrane substrates with wire grid polarizer, array base palte and Liquid crystal layer, the color membrane substrates are stacked with the array base palte, the liquid crystal layer be arranged at the color membrane substrates with it is described Between array base palte, and the color membrane substrates include color membrane substrates main body and wire grid polarizer, and the wire grid polarizer is arranged at The color membrane substrates main body is on a side surface of the array base palte.
- 2. quantum dot liquid crystal display panel according to claim 1, it is characterised in that the color membrane substrates main body includes layer Folded underlay substrate, quantum stippling film layer and the protective layer set, the quantum stippling film layer are located at the underlay substrate close to institute The side of array base palte is stated, the protective layer is located at the quantum stippling film layer close to the side of the array base palte.
- 3. quantum dot liquid crystal display panel according to claim 1, it is characterised in that the wiregrating week of the wire grid polarizer Phase T is 100~150nm.
- 4. quantum dot liquid crystal display panel according to claim 1, it is characterised in that the wiregrating of the wire grid polarizer is wide Degree W is 50~80nm.
- 5. quantum dot liquid crystal display panel according to claim 1, it is characterised in that the wiregrating of the wire grid polarizer is thick Degree H is 100~300nm.
- A kind of 6. preparation method of quantum dot liquid crystal display panel, it is characterised in that including：Wire grid polarizer is set in the inner surface of color membrane substrates main body, to form the color membrane substrates with wire grid polarizer；The color membrane substrates and array base palte are set into liquid crystal to box, and between the color membrane substrates and the array base palte Layer.
- 7. preparation method according to claim 6, it is characterised in that the color membrane substrates main body includes the second underlay substrate And the quantum stippling film layer on second underlay substrate is arranged at, the inner surface in color membrane substrates main body sets line Grid polarizer specifically includes：Transfer printing layer is formed on the first underlay substrate；Wire grid polarizer is made on the transfer printing layer；The wire grid polarizer is transferred to the inner surface of color membrane substrates main body.
- 8. preparation method according to claim 7, it is characterised in that described that the wire grid polarizer is transferred to color film base Before the inner surface of plate main body, in addition to：Protective layer is formed on the 3rd underlay substrate；By the protective layer transfer to being provided with second underlay substrate of the quantum stippling film layer, so that the protection Layer covers the quantum stippling film layer, and forms the color membrane substrates main body with protective layer.
- 9. preparation method according to claim 8, it is characterised in that form the protection on the 3rd underlay substrate Before layer, in addition to：Oil film is set on the 3rd underlay substrate；The protective layer is formed on the 3rd underlay substrate to specifically include：3rd underlay substrate is provided with oil film The protective layer is formed on surface.
- 10. preparation method according to claim 8 or claim 9, it is characterised in that the 3rd underlay substrate is by metal material system Make.
- 11. preparation method according to claim 7, it is characterised in that described that the wiregrating is made on the transfer printing layer Polarizer specifically includes：Metal level is formed on the transfer printing layer；Photoresist layer is formed on the metal level；Making ide is stamped into the photoresist layer, and the making ide is contacted with the metal level；Curing process is carried out to the photoresist in the making ide；The making ide is separated with the photoresist and the metal level；The photoresist and the metal level not covered by the photoresist are removed, to be formed on the surface of the transfer printing layer Wire grid pattern.
- 12. preparation method according to claim 11, it is characterised in that the photoresist and not described of removing The metal level of photoresist covering specifically includes：The institute for removing the photoresist simultaneously using sense coupling technology and not covered by the photoresist State metal level.
- 13. preparation method according to claim 11, it is characterised in that the making ide is made by light transmissive material.
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