CN107630184A - A kind of method for preparing niobium silicide coating in niobium or niobium alloy surface - Google Patents
A kind of method for preparing niobium silicide coating in niobium or niobium alloy surface Download PDFInfo
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Abstract
本发明涉及一种在铌或铌合金表面制备硅化铌涂层的方法,以硅粉为原料,采用等离子体喷涂技术在铌或铌合金基体表面制备硅涂层,然后置于惰性气氛中在1000~1500℃下热处理1~10小时,从而在基体表面形成硅化铌涂层。本发明所述制备方法具有工艺简单、成本低、效率高、可重复性好、适合规模化生产等优点,具有广阔的应用前景。
The invention relates to a method for preparing niobium silicide coating on the surface of niobium or niobium alloy. Using silicon powder as raw material, a silicon coating is prepared on the surface of niobium or niobium alloy substrate by using plasma spraying technology, and then placed in an inert atmosphere at 1000 Heat treatment at ~1500°C for 1-10 hours to form a niobium silicide coating on the surface of the substrate. The preparation method of the invention has the advantages of simple process, low cost, high efficiency, good repeatability, suitable for large-scale production, etc., and has broad application prospects.
Description
技术领域technical field
本发明涉及一种硅化物涂层的制备方法,特别涉及一种在铌或铌合金表面制备具梯度结构的硅化铌涂层的方法,属于高温涂层技术领域。The invention relates to a method for preparing a silicide coating, in particular to a method for preparing a niobium silicide coating with a gradient structure on the surface of niobium or a niobium alloy, and belongs to the technical field of high-temperature coatings.
背景技术Background technique
铌(Nb)是一种高熔点(2468℃)的难熔金属,密度适中,耐腐蚀,抗辐射,同时高温强度大,具有良好的高温机械性能。铌与铌合金的优良特性使其成为航空、航天与核工业中高温结构件的重要候选材料之一,可用来制造火箭发动机、核反应堆等关键部件。然而,其氧化性能较差,纯铌在600℃就发生“pest”氧化现象,且随着温度的升高,氧化程度加剧,最终导致其高温性能的失效,这一缺点严重制约了铌与铌合金的应用。为了改善其高温抗氧化性能,表面涂层保护是兼顾铌与铌合金高温力学性能与抗氧化性能切实有效的途径。Niobium (Nb) is a refractory metal with a high melting point (2468°C), moderate density, corrosion resistance, radiation resistance, high temperature strength and good high temperature mechanical properties. The excellent properties of niobium and niobium alloys make it one of the important candidate materials for high-temperature structural parts in the aviation, aerospace and nuclear industries, and can be used to manufacture key components such as rocket engines and nuclear reactors. However, its oxidation performance is poor. Pure niobium has a "pest" oxidation phenomenon at 600 °C, and as the temperature increases, the degree of oxidation intensifies, which eventually leads to the failure of its high-temperature performance. This shortcoming seriously restricts niobium and niobium. alloy application. In order to improve its high-temperature oxidation resistance, surface coating protection is an effective way to balance the high-temperature mechanical properties and oxidation resistance of niobium and niobium alloys.
二硅化铌(NbSi2)氧化时表面能够形成SiO2氧化膜,该氧化膜致密且具备自愈合能力,具有良好的高温抗氧化能力,从而使得NbSi2成为铌与铌合金高温防护涂层的主要选择。Suzuki等人采用熔盐法在铌基体表面沉积一层NbSi2涂层【1.R.Suzuki,M.Ishikawa,K.Ono,NbSi2coating on niobium using molten salt,Journal of Alloys andCompounds 336(2002)280–285】,将熔盐混合物36.58NaCl-36.58KCl-21.95NaF-4.89Na2SiF6(mol%)和硅粉放入Al2O3坩埚中,在900K的高温下,Nb基体表面形成硅化铌涂层,具有外层为NbSi2,过渡层为三硅化五铌(Nb5Si3)的结构特征。但是熔盐体系复杂,且涂层结构受熔盐成分影响较大,形成的涂层厚度不均匀,一定程度上影响涂层的抗氧化能力。Wang等人采用包埋法将铌合金包裹在16Si-8Ge-5NaF-71Al2O3(wt.%)混合粉末中制备了Ge改性的NbSi2涂层【2.W.Wang,Formation and oxidation resistance of germaniummodified silicide coating on Nb based in situ composites,Corrosion Science 80(2014)164–168】,但是包埋法中粉末混合物导热性较差,同时该方法受重力影响,会导致涂层厚度和结构不均匀。NbSi2涂层的制备方法需要进一步改善。When niobium disilicide (NbSi 2 ) is oxidized, a SiO 2 oxide film can be formed on the surface. The oxide film is dense and self-healing, and has good high-temperature oxidation resistance, making NbSi 2 the best choice for high-temperature protective coatings of niobium and niobium alloys. main choice. Suzuki et al. used molten salt method to deposit a layer of NbSi 2 coating on the surface of niobium substrate【1.R.Suzuki, M.Ishikawa, K.Ono, NbSi 2 coating on niobium using molten salt, Journal of Alloys and Compounds 336(2002) 280–285], put the molten salt mixture 36.58NaCl-36.58KCl-21.95NaF-4.89Na 2 SiF 6 (mol%) and silicon powder into the Al 2 O 3 crucible, and at a high temperature of 900K, the surface of the Nb substrate formed silicide The niobium coating has the structural characteristics that the outer layer is NbSi 2 , and the transition layer is pentaniobium trisilicide (Nb 5 Si 3 ). However, the molten salt system is complex, and the coating structure is greatly affected by the molten salt composition, and the thickness of the formed coating is uneven, which affects the oxidation resistance of the coating to a certain extent. Wang et al prepared a Ge-modified NbSi 2 coating by wrapping niobium alloy in 16Si-8Ge-5NaF-71Al 2 O 3 (wt.%) mixed powder by embedding method [2.W.Wang, Formation and oxidation resistance of germanium modified silicide coating on Nb based in situ composites, Corrosion Science 80(2014) 164–168], but the thermal conductivity of the powder mixture in the embedding method is poor, and this method is affected by gravity, which will cause the coating thickness and structure to vary. uniform. The preparation method of NbSi2 coating needs to be further improved.
发明内容Contents of the invention
针对上述问题,本发明的目的在于提供一种在铌或铌合金表面制备硅化铌涂层的方法,以硅粉为原料,采用等离子喷涂技术在铌或铌合金基体表面制备硅涂层,然后置于惰性气氛中在1000~1500℃下热处理1~10小时,从而在基体表面形成硅化铌涂层。At the problems referred to above, the object of the present invention is to provide a method for preparing niobium silicide coating on the surface of niobium or niobium alloy, using silicon powder as raw material, adopting plasma spraying technology to prepare silicon coating on the surface of niobium or niobium alloy substrate, and then placing Heat treatment at 1000-1500° C. for 1-10 hours in an inert atmosphere to form a niobium silicide coating on the surface of the substrate.
本发明采用等离子体喷涂和热处理相结合的方法制备硅化铌涂层。具体来说,以金属铌或铌合金为基体,硅粉为喷涂原料,采用等离子体喷涂技术制备一定厚度的硅涂层,然后经过惰性气氛保护热处理(在1000~1500℃下热处理1~10小时,即元素扩散反应),使得基体中Nb元素与硅涂层中Si元素发生互扩散形成硅化铌涂层,该涂层具有NbSi2外层和Nb5Si3过渡层的梯度结构。该制备方法获得的硅化铌涂层结构致密且厚度均匀,同时与基体间形成牢固的化学冶金结合。此外,等离子体喷涂技术是制备涂层常用的方法,具有沉积效率高、涂层成分和厚度可控、快捷修复失效涂层、易于实现工业化生产等特点,使其在涂层制备中更具商业潜力。本发明同时具有工艺简单、成本低、效率高、可重复性好、涂层厚度可控、适合规模化生产等优点。The invention adopts the method of combining plasma spraying and heat treatment to prepare the niobium silicide coating. Specifically, using metal niobium or niobium alloy as the substrate and silicon powder as the raw material for spraying, a silicon coating with a certain thickness is prepared by plasma spraying technology, and then undergoes heat treatment in an inert atmosphere (heat treatment at 1000-1500°C for 1-10 hours) , that is, element diffusion reaction), so that the Nb element in the substrate and the Si element in the silicon coating undergo interdiffusion to form a niobium silicide coating, which has a gradient structure of NbSi 2 outer layer and Nb 5 Si 3 transition layer. The niobium silicide coating obtained by the preparation method has a compact structure and uniform thickness, and at the same time forms a firm chemical metallurgical bond with the substrate. In addition, plasma spraying technology is a commonly used method for preparing coatings. It has the characteristics of high deposition efficiency, controllable coating composition and thickness, quick repair of failed coatings, and easy realization of industrial production, making it more commercial in coating preparation. potential. The invention also has the advantages of simple process, low cost, high efficiency, good repeatability, controllable coating thickness, suitable for large-scale production and the like.
较佳地,所述硅粉的粒径为10~120μm,纯度大于98wt.%。Preferably, the silicon powder has a particle size of 10-120 μm and a purity greater than 98wt.%.
较佳地,所述铌或铌合金基体经过表面喷砂预处理,所述喷砂预处理的压强为0.1~0.5MPa。Preferably, the surface of the niobium or niobium alloy substrate is pre-treated by sand blasting, and the pressure of the sand blast pre-treatment is 0.1-0.5 MPa.
较佳地,所述等离子体喷涂技术的工艺参数包括:等离子体气体Ar:30~50slpm;等离子体气体H2:6~15slpm;粉末载气Ar:2~7slpm;喷涂距离:100~200mm;喷涂功率:30~50kW;送粉速率:10~30rpm。Preferably, the process parameters of the plasma spraying technology include: plasma gas Ar: 30-50 slpm; plasma gas H 2 : 6-15 slpm; powder carrier gas Ar: 2-7 slpm; spraying distance: 100-200 mm; Spraying power: 30~50kW; powder feeding rate: 10~30rpm.
较佳地,所述硅涂层的厚度为30~300μm。Preferably, the silicon coating has a thickness of 30-300 μm.
较佳地,所述惰性气氛为氩气。Preferably, the inert atmosphere is argon.
另一方面,本发明提供了一种根据上述方法在基体表面制备的硅化铌涂层,包括NbSi2外层、以及位于所述基体和NbSi2外层之间的Nb5Si3过渡层。较佳地,所述Nb5Si3过渡层的厚度为5~30μm。较佳地,所述NbSi2外层的厚度为20~100μm。In another aspect, the present invention provides a niobium silicide coating prepared on the surface of a substrate according to the above method, comprising an outer layer of NbSi 2 and a transition layer of Nb 5 Si 3 between the substrate and the outer layer of NbSi 2 . Preferably, the thickness of the Nb 5 Si 3 transition layer is 5-30 μm. Preferably, the thickness of the outer layer of NbSi 2 is 20-100 μm.
本发明的有益效果:Beneficial effects of the present invention:
(1)该发明获得的硅化铌涂层具有NbSi2外层和Nb5Si3过渡层的梯度结构,与基体之间形成牢固的化学冶金结合,降低了表面涂层与Nb基体材料的热膨胀系数失配问题;(1) The niobium silicide coating obtained in this invention has a gradient structure of NbSi 2 outer layer and Nb 5 Si 3 transition layer, forming a firm chemical metallurgical bond with the substrate, reducing the thermal expansion coefficient of the surface coating and the Nb substrate mismatch problem;
(2)由于硅涂层的厚度可精确控制,即可以精确控制硅源的量,从而较容易实现硅化铌涂层厚度的控制,不存在残余硅、表面难以清理等问题,同时可以实现部件表面局部区域硅化铌涂层的制备;(2) Since the thickness of the silicon coating can be precisely controlled, that is, the amount of the silicon source can be precisely controlled, so it is easier to control the thickness of the niobium silicide coating, there is no residual silicon, the surface is difficult to clean, etc., and the surface of the component can be realized Preparation of niobium silicide coatings in localized areas;
(3)该制备方法具有工艺简单、成本低、效率高、可重复性好、适合规模化生产等优点,具有广阔的应用前景。(3) The preparation method has the advantages of simple process, low cost, high efficiency, good repeatability, suitable for large-scale production, etc., and has broad application prospects.
附图说明Description of drawings
图1为实施例1中等离子体喷涂硅涂层的XRD图谱,表明等离子体喷涂硅涂层主要由立方相的Si组成;Fig. 1 is the XRD spectrum of plasma sprayed silicon coating in embodiment 1, shows that plasma sprayed silicon coating is mainly made up of Si of cubic phase;
图2为实施例1中Nb基体表面硅涂层经氩气保护热处理后的XRD图谱,热处理温度为1300℃,时间为3小时,表明硅涂层与Nb基体发生扩散反应形成了六方相NbSi2和六方相Nb5Si3,其中以NbSi2为主;Figure 2 is the XRD spectrum of the silicon coating on the surface of the Nb substrate in Example 1 after argon-protected heat treatment, the heat treatment temperature is 1300 ° C, and the time is 3 hours, indicating that the silicon coating and the Nb substrate have a diffusion reaction to form a hexagonal phase NbSi 2 and hexagonal phase Nb 5 Si 3 , in which NbSi 2 is the main one;
图3为实施例1中Nb基体表面硅涂层经氩气保护热处理后的截面形貌及元素面扫描图谱,热处理温度为1300℃,时间为3小时;图3表明热处理过程中Si元素与Nb元素发生互扩散反应,形成硅化铌涂层,外层为NbSi2,过渡层为Nb5Si3,涂层结构致密,与基体形成良好的冶金结合。Fig. 3 is the cross-sectional morphology and element surface scanning pattern of the silicon coating on the surface of the Nb substrate in Example 1 after argon protection heat treatment. The heat treatment temperature is 1300 ° C and the time is 3 hours; Elements undergo interdiffusion reaction to form niobium silicide coating. The outer layer is NbSi 2 , and the transition layer is Nb 5 Si 3 . The coating has a dense structure and forms a good metallurgical bond with the substrate.
具体实施方式detailed description
以下通过下述实施方式进一步说明本发明,应理解,下述实施方式仅用于说明本发明,而非限制本发明。The present invention will be further described below through the following embodiments. It should be understood that the following embodiments are only used to illustrate the present invention, not to limit the present invention.
本发明采用等离子体喷涂技术和热处理相结合的方法在铌或铌合金表面制备硅化铌涂层,从而改善铌或铌合金的高温抗氧化性能。所述硅化铌涂层,包括NbSi2外层、以及位于所述基体和NbSi2外层之间的Nb5Si3过渡层。所述Nb5Si3过渡层的厚度可为5~30μm。所述NbSi2外层的厚度可为20~100μm。本发明具有工艺简单、成本低、效率高、可重复性好、涂层厚度可控、适合规模化生产等优点。The invention adopts the method of combining plasma spraying technology and heat treatment to prepare niobium silicide coating on the surface of niobium or niobium alloy, thereby improving the high-temperature oxidation resistance of niobium or niobium alloy. The niobium silicide coating includes an outer layer of NbSi 2 and a transition layer of Nb 5 Si 3 between the substrate and the outer layer of NbSi 2 . The thickness of the Nb 5 Si 3 transition layer may be 5-30 μm. The thickness of the NbSi 2 outer layer may be 20-100 μm. The invention has the advantages of simple process, low cost, high efficiency, good repeatability, controllable coating thickness, suitable for large-scale production and the like.
本发明选择一定粒径分布和纯度的硅粉,采用等离子体喷涂技术在金属铌或铌合金表面制备一定厚度的硅涂层,然后将加有硅涂层的样品放入高温气氛炉中进行热处理,获得与基体冶金结合的硅化铌涂层。以下示例性地说明本发明提供的在铌或铌合金表面制备硅化铌涂层的方法。The present invention selects silicon powder with a certain particle size distribution and purity, uses plasma spraying technology to prepare a certain thickness of silicon coating on the surface of metal niobium or niobium alloy, and then puts the sample with silicon coating into a high-temperature atmosphere furnace for heat treatment , to obtain a niobium silicide coating that is metallurgically bonded to the substrate. The method for preparing a niobium silicide coating on the surface of niobium or niobium alloy provided by the present invention is exemplarily described below.
基体的喷砂预处理。所述基体可为金属铌或铌合金,并经过表面喷砂等预处理。作为一个示例,将金属铌或铌合金经过喷砂(喷砂压强为0.1~0.5MPa)处理后,在酒精溶液中超声1~2次,每次3~5分钟,在100~120℃烘干1~2小时,备用。Grit blasting pretreatment of the substrate. The substrate can be metal niobium or niobium alloy, and has been pretreated by surface sandblasting and the like. As an example, after blasting metal niobium or niobium alloy (blasting pressure is 0.1-0.5MPa), ultrasonically 1-2 times in alcohol solution, 3-5 minutes each time, and dry at 100-120°C 1 to 2 hours, set aside.
硅涂层的制备。具体来说,选用具有一定粒径分布的硅粉,采用等离子体喷涂技术将硅粉喷涂到喷砂处理的铌或铌合金表面形成硅涂层。选用的喷涂粉体是粒径为10~120μm的硅粉,粉体纯度大于98wt.%。在100~120℃烘干1~3小时,备用。其中等离子体喷涂技术的工艺参数可包括:等离子体气体Ar:30~50slpm;等离子体气体H2:6~15slpm;粉末载气Ar:2~7slpm;喷涂距离:100~200mm;喷涂功率:30~50kW;送粉速率:10~30rpm。本发明通过控制等离子体喷涂技术的工艺参数,将硅粉喷涂在铌或铌合金基体表面形成厚度为30~300μm硅涂层。Preparation of silicon coating. Specifically, silicon powder with a certain particle size distribution is selected, and the silicon powder is sprayed onto the surface of sandblasted niobium or niobium alloy by plasma spraying technology to form a silicon coating. The selected powder for spraying is silicon powder with a particle size of 10-120 μm, and the purity of the powder is greater than 98wt.%. Dry at 100-120°C for 1-3 hours and set aside. Among them, the process parameters of plasma spraying technology can include: plasma gas Ar: 30~50slpm; plasma gas H2 : 6~15slpm; powder carrier gas Ar: 2~7slpm; spraying distance: 100~200mm; spraying power: 30 ~50kW; powder feeding rate: 10~30rpm. In the invention, by controlling the process parameters of the plasma spraying technology, the silicon powder is sprayed on the surface of the niobium or niobium alloy substrate to form a silicon coating with a thickness of 30-300 μm.
将喷涂有硅涂层的基体放置于惰性保护气氛炉中进行热处理,形成与基体冶金结合的硅化铌涂层。其中,热处理温度可为1000~1500℃,热处理时间可为1~10小时。所述惰性气氛可为氩气。The substrate sprayed with the silicon coating is placed in an inert protective atmosphere furnace for heat treatment to form a niobium silicide coating metallurgically combined with the substrate. Wherein, the heat treatment temperature may be 1000-1500° C., and the heat treatment time may be 1-10 hours. The inert atmosphere may be argon.
作为一个在铌或铌合金表面制备硅化铌涂层的方法的示例,其具体工艺如下:1)基体是铌或铌合金,将基体表面经过喷砂(喷砂压强为0.1~0.5MPa)处理后,在酒精溶液中超声1~2次,每次3~5分钟,在100~120℃烘干1~2小时,备用。2)选用的粉体是粒径为10~120μm的硅粉,粉体纯度大于98wt.%。在100~120℃烘干1~3小时,备用。3)采用等离子体喷涂技术将硅粉喷涂在铌或铌合金表面制备硅涂层,硅涂层的厚度为30~300μm。喷涂工艺参数见表1。4)将喷涂的硅涂层放置于氩气保护气氛炉中进行热处理,热处理温度为1000~1500℃,热处理时间为1~10小时;As an example of a method for preparing a niobium silicide coating on the surface of niobium or niobium alloy, the specific process is as follows: 1) The substrate is niobium or niobium alloy, and the surface of the substrate is treated by sandblasting (sandblasting pressure is 0.1-0.5MPa) , Ultrasound 1-2 times in alcohol solution, 3-5 minutes each time, dry at 100-120°C for 1-2 hours, and set aside. 2) The selected powder is silicon powder with a particle size of 10-120 μm, and the purity of the powder is greater than 98wt.%. Dry at 100-120°C for 1-3 hours and set aside. 3) Spraying silicon powder on the surface of niobium or niobium alloy by plasma spraying technology to prepare a silicon coating, the thickness of the silicon coating is 30-300 μm. The spraying process parameters are shown in Table 1. 4) Place the sprayed silicon coating in an argon protective atmosphere furnace for heat treatment. The heat treatment temperature is 1000-1500 °C, and the heat treatment time is 1-10 hours;
表1为真空等离子体喷涂Si涂层工艺参数:Table 1 is the vacuum plasma spraying Si coating process parameters:
*slpm:标准升/分钟;rpm:转/分钟。*slpm: standard liter/minute; rpm: revolution/minute.
本发明提供的硅化铌涂层具有外层为NbSi2和过渡层为Nb5Si3的结构特征,与基体形成牢固的化学冶金结合。The niobium silicide coating provided by the invention has the structural feature that the outer layer is NbSi 2 and the transition layer is Nb 5 Si 3 , and forms a strong chemical metallurgical bond with the substrate.
下面进一步例举实施例以详细说明本发明。同样应理解,以下实施例只用于对本发明进行进一步说明,不能理解为对本发明保护范围的限制,本领域的技术人员根据本发明的上述内容作出的一些非本质的改进和调整均属于本发明的保护范围。下述示例具体的工艺参数等也仅是合适范围中的一个示例,即本领域技术人员可以通过本文的说明做合适的范围内选择,而并非要限定于下文示例的具体数值。Examples are given below to describe the present invention in detail. It should also be understood that the following examples are only used to further illustrate the present invention, and should not be construed as limiting the protection scope of the present invention. Some non-essential improvements and adjustments made by those skilled in the art according to the above contents of the present invention all belong to the present invention scope of protection. The specific process parameters and the like in the following examples are only examples of suitable ranges, that is, those skilled in the art can make a selection within a suitable range through the description herein, and are not limited to the specific values exemplified below.
实施例1:Example 1:
一种铌金属表面的硅化铌涂层,该涂层制备包括如下步骤:A niobium silicide coating on a niobium metal surface, the preparation of which comprises the steps of:
1)将Nb基体表面进行喷砂处理,喷砂压强为0.4MPa,在无水乙醇溶液中超声2次,每次5分钟,在100℃烘干2小时,备用;1) Sandblasting the surface of the Nb substrate with a sandblasting pressure of 0.4 MPa, ultrasonicating twice in absolute ethanol solution for 5 minutes each time, drying at 100°C for 2 hours, and set aside;
2)选用中位粒径约为30μm、纯度大于98wt.%的硅粉为喷涂原料,在100℃烘干3小时,备用;2) Use silicon powder with a median particle size of about 30 μm and a purity greater than 98wt.% as the raw material for spraying, dry at 100°C for 3 hours, and set aside;
3)采用等离子体喷涂系统(A-2000,Sulzer Metco AG,Switzerland),选用表2的工艺参数,将硅粉喷涂到Nb基体表面形成硅涂层,硅涂层厚度约为110μm,图1的XRD结果显示硅涂层为立方相;3) Using a plasma spraying system (A-2000, Sulzer Metco AG, Switzerland), select the process parameters in Table 2, spray silicon powder onto the surface of the Nb substrate to form a silicon coating, the thickness of the silicon coating is about 110 μm, as shown in Figure 1 XRD results show that the silicon coating is a cubic phase;
表2为等离子体喷涂Si涂层工艺参数:Table 2 is the plasma spraying Si coating process parameters:
4)采用氩气保护的真空-气氛烧结炉(ZT-50-22,上海晨华电炉有限公司),通过热处理使得硅涂层与Nb基体之间发生扩散反应形成硅化铌涂层,热处理温度为1300℃,热处理时间为3h。4) Vacuum-atmosphere sintering furnace (ZT-50-22, Shanghai Chenhua Electric Furnace Co., Ltd.) protected by argon gas, through heat treatment, the diffusion reaction between the silicon coating and the Nb substrate forms a niobium silicide coating, and the heat treatment temperature is 1300°C, heat treatment time is 3h.
经过氩气保护热处理后,硅涂层与Nb基体之间形成了具有一定梯度的涂层体系,由外到内依次为NbSi2(厚度约为50μm),Nb5Si3(厚度约为5μm)以及Nb基体。涂层与基体之间由于扩散作用形成良好的冶金结合,无裂纹和气孔,如图2的XRD图谱和图3的截面形貌及元素面扫描图谱(图3中a为截面图中方框所示放大图、b为Nb元素的面扫描图谱、c为Si元素的面扫描图谱)所示。After argon protection heat treatment, a coating system with a certain gradient is formed between the silicon coating and the Nb substrate, from outside to inside, NbSi 2 (thickness is about 50 μm), Nb 5 Si 3 (thickness is about 5 μm) and Nb matrix. A good metallurgical bond is formed between the coating and the substrate due to diffusion, without cracks and pores, as shown in the XRD spectrum of Figure 2 and the cross-sectional morphology and element surface scanning spectrum of Figure 3 (a in Figure 3 is shown in the box in the cross-sectional view Enlarged view, b is the surface scan spectrum of Nb element, c is the surface scan spectrum of Si element).
Claims (9)
- A kind of 1. method for preparing niobium silicide coating in niobium or niobium alloy surface, it is characterised in that using silica flour as raw material, using etc. Ionomer spray technology prepares silicon coating in niobium or niobium alloy matrix surface, is subsequently placed in inert atmosphere at 1000~1500 DEG C Lower heat treatment 1~10 hour, so as to form niobium silicide coating in matrix surface.
- 2. according to the method for claim 1, it is characterised in that the particle diameter of the silica flour is 10~120 μm, and purity is more than 98 wt.%。
- 3. method according to claim 1 or 2, it is characterised in that described matrix pre-processes by surface sand-blasting, the spray The pressure of sand pretreatment is 0.1~0.5 MPa.
- 4. according to the method any one of claim 1-3, it is characterised in that the technique of the plasma spray technology Parameter includes:Plasma gas Ar:30~50 slpm;Plasma gas H2:6~15 slpm;Powder carrier gas Ar:2~7 slpm;Spray distance:100~200 mm;Spray power:30~50 kW;Powder feeding rate:10~30 rpm.
- 5. according to the method any one of claim 1-4, it is characterised in that the thickness of the silicon coating is 30~300 μm。
- 6. according to the method any one of claim 1-5, it is characterised in that the inert atmosphere is argon gas.
- 7. the niobium silicide coating that a kind of method according to any one of claim 1-6 is prepared in matrix surface, including NbSi2 Outer layer and positioned at described matrix and NbSi2Nb between outer layer5Si3Transition zone.
- 8. niobium silicide coating according to claim 7, it is characterised in that the Nb5Si3The thickness of transition zone is 5~30 μ m。
- 9. the niobium silicide coating according to claim 7 or 8, it is characterised in that the NbSi2The thickness of outer layer is 20~100 μm。
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