CN107561871B - Proximity type exposure and photo-alignment integrated device, photo-alignment method and exposure method - Google Patents
Proximity type exposure and photo-alignment integrated device, photo-alignment method and exposure method Download PDFInfo
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- CN107561871B CN107561871B CN201610512887.1A CN201610512887A CN107561871B CN 107561871 B CN107561871 B CN 107561871B CN 201610512887 A CN201610512887 A CN 201610512887A CN 107561871 B CN107561871 B CN 107561871B
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- 238000000034 method Methods 0.000 title claims abstract description 29
- 230000010287 polarization Effects 0.000 claims abstract description 53
- 238000001914 filtration Methods 0.000 claims abstract description 3
- 238000001514 detection method Methods 0.000 claims description 11
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 11
- 229910052753 mercury Inorganic materials 0.000 claims description 11
- 238000001816 cooling Methods 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 238000005086 pumping Methods 0.000 claims description 4
- 230000000750 progressive effect Effects 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000008033 biological extinction Effects 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
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Abstract
The invention relates to a proximity type exposure and photo-alignment integrated device, a photo-alignment method and an exposure method. The utility model provides an integrative device is joined in marriage to proximity formula exposure and light, includes the light source, arranges in proper order in the light source light path direction: the device comprises a light reflection filtering mechanism, a fly-eye lens group, a spherical reflector, a mask table and a workpiece table with an energy sensor; a polarizing module is also arranged between the fly-eye lens group and the mask table, and comprises a light-transmitting hole station, a polarizing station provided with a rotating mechanism and a moving mechanism used for switching the polarizing station and the light-transmitting hole station to be arranged in the center of a light path of the light source; during exposure operation, the light hole station is arranged at the center of a light path of the light source, during light alignment operation, the polarization station is arranged at the center of the light path of the light source, the energy sensor is moved to the center of the light path, and the rotating mechanism is rotationally adjusted. The invention can realize that the same proximity type exposure equipment has the exposure and alignment functions at the same time, thereby saving space and cost.
Description
Technical Field
The present disclosure relates to proximity exposure apparatuses, and particularly to a proximity exposure and photo-alignment integrated apparatus, a photo-alignment method and an exposure method.
Background
Proximity exposure equipment in the flat panel industry is one of important equipment, is widely applied to a Color Filter (CF) photoetching process in a TFT-LCD (thin film transistor liquid crystal display) and an LTPS-OLED (low temperature poly-organic light emitting diode), and has the line width resolution generally above 10 um. The demands for resolution increase are not very strong at present, and since projection exposure apparatuses are expensive, proximity exposure apparatuses will still have a large market share in meeting the application demands.
The photo-alignment device is also one of the key devices in the LCD manufacturing process in the flat panel display field, and as the size of the panel is continuously increased, the size of the manufacturing equipment is also continuously increased, which directly increases the factory floor area and the plant service cost. If the proximity exposure equipment and the optical alignment equipment can be combined into one, the equipment investment and the operation cost can be obviously reduced. Meanwhile, some scientific research institutions or laboratories have limited expenses, narrow space and low requirements on productivity.
Disclosure of Invention
In view of the above-mentioned drawbacks, an object of the present invention is to provide a proximity exposure and photo-alignment integrated apparatus, a photo-alignment method and a photo-alignment method, so that the apparatus has both exposure and alignment functions, thereby saving space and cost.
To achieve the object, in a first aspect, the present invention provides a proximity exposure and photo-alignment integrated apparatus, comprising: including the light source, arrange in light source light path direction in proper order: the device comprises a light reflection filtering mechanism, a fly-eye lens group, a spherical reflector, a mask table and a workpiece table with an energy sensor; a polarizing module is also arranged between the fly-eye lens group and the mask table, and the polarizing module comprises a light-transmitting hole station, a polarizing station provided with a rotating mechanism and a moving mechanism used for switching the polarizing station and the light-transmitting hole station to be arranged in the center of a light path of the light source; during exposure operation, the light hole station is arranged at the center of a light path of the light source, during light alignment operation, the polarization station is arranged at the center of the light path of the light source, the energy sensor is moved to the center of the light path, and the rotating mechanism is rotationally adjusted.
Preferably, the polarizing module is arranged at the light emergent part of the fly-eye lens group.
Preferably, the light source is a mercury lamp light source, and a water cooling device is arranged in the light source.
Preferably, the incident angle of the incident light which is output by the light reflection filter mechanism and the fly-eye lens group and enters the polarizing module is less than 15 °.
Preferably, the workpiece table comprises a horizontal movement mechanism and/or a vertical movement mechanism.
Preferably, the rotating mechanism is connected in sequence: the gear clamping mechanism, the gear mechanism and the motor are arranged outside the polarizing station, and the moving mechanism is a progressive motor.
In a second aspect, the present invention further includes a proximity exposure photo-alignment method, applied to the proximity exposure and photo-alignment integrated apparatus of the first aspect, including the following steps:
the polarization station is arranged at the center of a light path of a light source through the moving mechanism;
uploading an analyzer grating, moving the energy sensor to the center of a light path to measure the transmitted light intensity, and rotating a polarizer of a polarization station within the range of 0-360 degrees through a rotating mechanism;
recording the light intensity obtained by the energy sensor at each polarizing angle, and completing calibration and storage;
and downloading the polarization detection grating and setting an alignment angle.
Preferably, the polarization station of the polarization module is disposed in front of the center of the light path of the light source, and further comprises: the pumping flow is increased or the heat of the light source is dissipated by a water cooling mode.
Preferably, the analyzer grating is sized to correspond to a standard mask and has alignment marks, and the grating pattern in the analyzer grating is positioned to correspond to a mask pattern area in the standard mask.
In a third aspect, a proximity exposure method is applied to the proximity exposure and photoalignment integrated device of the first aspect, and includes the following steps:
the light hole station is arranged in the center of the light path of the light source through the moving mechanism;
and uploading the mask plate to perform exposure operation.
By adopting the technical scheme, compared with the prior art, the invention has the following beneficial effects:
the invention adds the polarizing module with the polarizing station and the light hole station on the proximity exposure machine, when in exposure operation, the light hole station is arranged at the center of the light path of the light source, when in alignment angle calibration operation, the polarizing station is arranged at the center of the light path of the light source to provide polarized light illumination, the energy sensor is moved to the center of the light path, and the rotating mechanism is rotationally adjusted, thereby realizing that the device has the functions of exposure and alignment by modifying configuration parameters, obviously reducing the equipment investment of a client, and saving the space of a client factory building or a laboratory.
Drawings
FIG. 1 is a schematic structural diagram of a proximity exposure and photo-alignment integrated device provided by an alternative embodiment of the present invention.
FIG. 2 is a side view of a polarizing module of an alternative integrated proximity exposure and photo-alignment apparatus of the present invention.
FIG. 3 is a schematic structural diagram of a polarizer and a gear clamping mechanism of an integrated proximity exposure and photoalignment device according to an alternative embodiment of the present invention.
FIG. 4 is a top view of the polarizer in the proximity exposure and photo-alignment integrated apparatus according to an alternative embodiment of the present invention.
FIG. 5 is a top view of a polarizer in a proximity exposure and photo-alignment integrated apparatus according to an alternative embodiment of the present invention.
FIG. 6 is a flow chart of the operation of a proximity exposure and photo-alignment integrated apparatus according to an alternative embodiment of the present invention.
FIG. 7 is a schematic diagram of an analyzer grating of an alternative integrated proximity exposure and photo-alignment apparatus according to the present invention.
FIG. 8 is a schematic diagram of a proximity exposure and photo-alignment integrated apparatus for photo-alignment operation according to an alternative embodiment of the present invention.
FIG. 9 is a method flow diagram of a proximity-based exposure photo-alignment method provided by an alternative embodiment of the present invention.
Fig. 10 is a method flowchart of a proximity exposure method according to an alternative embodiment of the present invention.
Detailed Description
The proximity exposure and photoalignment integrated apparatus, the photoalignment method, and the exposure method provided by the present invention will be described in detail with reference to fig. 1 to 10, which are alternative embodiments of the present invention, and it is considered that those skilled in the art can modify and decorate the same without departing from the spirit and scope of the present invention.
As shown in the attached figure 1, the invention provides a proximity type exposure and light alignment integrated device, which comprises a mercury lamp light source 10 and a light source light path, wherein the mercury lamp light source 10 is arranged in the light source light path direction in sequence: a light reflection filter mechanism 20, a fly-eye lens group 30, a spherical mirror 40, a mirror 50, a mask stage 60, and a workpiece stage 70 with an energy sensor 71. The light reflection filter mechanism 20 in this embodiment includes a cold mirror 21, a shutter 22, and a filter 23 in this order. Light emitted by a mercury lamp light source is reflected by a cold mirror 21, filtered by a filter 23, homogenized by a fly-eye lens group 30, amplified by a spherical reflector 40, reflected by a reflector 50 to form parallel light, irradiated on a mask plate on a mask table 60, and finally imaged on a substrate 80. In the present invention, a polarization module 90 is further disposed in the light source optical path between the fly-eye lens set 30 and the mask stage 60, as shown in fig. 2, the polarization module 90 includes a light hole station 91, a polarization station 92 with a rotation mechanism 921, and a moving mechanism 93 for switching the polarization station 92 and the light hole station 91 to the center of the light source optical path. Wherein, be provided with the polarizer 922 in the start inclined to one side station 92, rotary mechanism 921 drives the polarizer rotatory, and polarizer 922 can be wire grating, and rotary mechanism 921 drives wire grating at 0 ~ 360 within range adjustment, and light trap station 91 is then a round hole that does not have the sheltering from, and the light beam can pass through completely. As shown in fig. 3, the rotating mechanism 921 in this embodiment is connected in sequence: the gear clamping mechanism 9211, the gear mechanism 9212 and the motor 9213 that are arranged outside the polarizing station 92, as shown in fig. 4 and fig. 5, the moving mechanism 93 is a progressive motor, and drives the polarizing station 92 and the light hole station 91 to move in the limiting mechanism 94 to switch each other. When exposure operation is performed, the light hole station 91 is placed at the center of the light path of the light source, and when alignment angle calibration operation is performed, the polarization station 92 is placed at the center of the light path of the light source, the energy sensor 71 is moved to the center of the light path, and the rotation adjusting mechanism 921 is rotated.
Because the light beam becomes larger after the spherical reflector, the size of the polarizer will also become larger, and the cost will be greatly increased, it is preferable that the polarizing module 90 is placed at the light exit of the fly-eye lens group 30, and the positional relationship between the polarizing module 90 and the light path is ensured by mechanical installation.
After the metal wire grid is added, nearly half of the light will be reflected back to the mercury lamp light source 10, so the heat dissipation performance of the mercury lamp must be enhanced, for example, the pumping flow is increased, and the air cooling is changed into the water cooling, and preferably, a water cooling device is installed in the mercury lamp light source 10.
Preferably, the incident angle of the incident light that the light reflection filter mechanism 20 and the fly-eye lens group 30 output to the polarizing module is less than 15 °, because: the extinction ratio formula of the metal wire grid is as follows: and E is equal to Ip/Ie is equal to Tp/Te, wherein Ip and Ie represent the intensities of the P light and the E light under the metal wire grid, and Tp and Te represent the transmittances of the metal wire grid to the P light and the E light in the incident light. Namely, the extinction ratio depends on the transmittance of the metal wire grid to P light and E light in incident light, and the incident angle is smaller than 15 degrees after the mercury lamp illuminating system is homogenized, and at the moment, the calculation and analysis result shows that the extinction ratio is higher and is larger than 50:1, so that the light alignment requirement is met.
Moreover, when exposing a large generation of flat panel display panels, the proximity exposure machine can adopt a workpiece stage with horizontal and vertical movement functions or even a double-stage movement stepping exposure due to the limitation of the size of the exposure field and the transmission speed, so that the workpiece stage 70 of the present invention is also applicable when including a horizontal movement mechanism and/or a vertical movement mechanism.
The invention provides a working principle of a proximity type exposure and photo-alignment integrated device, which comprises the following steps:
when the polarization module 90 is used for exposure operation, the polarization module moves to the light hole station 91 through the stepping motor, the light hole station 91 is arranged at the center of the light path of the light source, as shown in fig. 4, light beams completely pass through, and the exposure operation can be normally carried out by uploading the mask 61; when the polarization module 90 is used for optical alignment operation, the polarization module moves to the polarization station 92 through the stepping motor, the polarization station 92 is placed in the center of the light path of the light source, as shown in fig. 8, the polarization detection grating 62 is uploaded, the energy sensor 71 is moved to the center of the light path, the metal wire grid is rotated through the rotating mechanism 921, the light intensity is received through the energy sensor 71 to calibrate the alignment angle, the polarization detection grating 2 is downloaded after calibration is completed, and the alignment angle is set according to the process requirements, so that the optical alignment operation can be performed. The device operation flow is shown in fig. 6.
As shown in FIG. 7, the analyzer grating 62 of the present invention uses a customized analyzer, the external shape is designed according to the standard mask size, the alignment mark 621 of the mask is reserved, the mask pattern area is replaced by the grating pattern area 622, i.e. the analyzer grating 62 is the same as the standard mask size and has the alignment mark 621, and the grating pattern area 622 in the analyzer grating is the same as the mask pattern area in the standard mask. As shown in fig. 7. Uploading the analyzer grating 62, driving the gear mechanism 9212 to rotate the polarizer to move within the range of 0-360 degrees by the motor 9213, irradiating the analyzer grating 62 with polarized light polarized by the metal wire grid, allowing only part of the light to pass through, and moving the energy sensor 71 on the workpiece stage to the center of the light path to measure the transmitted light intensity, as shown in fig. 8. The polarizer is continuously rotated through the rotating mechanism 921 and the measured light intensity is tracked, the light intensity corresponding to each grating position is recorded, the polarization direction and the polarization detection direction are consistent when the measured light intensity of the energy sensor 71 is the maximum, the polarization direction and the polarization detection direction are perpendicular when the measured light intensity is the minimum, the light intensity corresponding to different polarization angles is recorded, a curve is fitted, and calibration and storage are completed.
Example two
As shown in fig. 9, the present invention provides a proximity exposure photo-alignment method, which is applied to a proximity exposure and photo-alignment integrated apparatus of the first embodiment, and includes the following steps:
s11: the polarization station is arranged at the center of the light path of the light source through the moving mechanism.
Specifically, the polarization station is moved to the center of the light path of the light source by a moving mechanism of the polarization module.
S12: uploading an analyzer grating, moving an energy sensor to the center of a light path to measure the transmitted light intensity, and rotating a polarizer of a polarization station within the range of 0-360 degrees through a rotating mechanism.
The analyzer grating is in accordance with the standard mask size and has alignment marks, and the grating pattern in the analyzer grating is in accordance with the mask pattern area in the standard mask.
Specifically, the polarization detection grating is uploaded on a mask table, the energy sensor is moved to the center of a light path to measure the transmitted light intensity through alignment of an alignment mark, and the metal wire grating of the polarization station is rotated within the range of 0-360 degrees through a rotating mechanism.
S13: and recording the light intensity obtained by the energy sensor at each polarization angle, and completing calibration and storing.
Specifically, the method comprises the following steps: the light intensity corresponding to each polarization angle (grating position) is recorded, the polarization direction and the polarization detection direction are consistent when the energy sensor measures the light intensity to be the maximum, the polarization direction and the polarization detection direction are perpendicular when the measured light intensity is the minimum, the light intensities corresponding to different polarization angles are recorded, a curve is fitted, and calibration and storage are completed.
S14: and downloading the polarization detection grating and setting an alignment angle.
Specifically, the optical alignment operation can be performed by downloading the analyzer grating and setting the alignment angle.
Since nearly half of the light is reflected back to the mercury lamp after adding the metal wire grid, the heat dissipation performance of the mercury lamp must be enhanced, and preferably, before S11, the method further includes: s10: the pumping flow is increased or the heat of the light source is dissipated by a water cooling mode.
EXAMPLE III
As shown in fig. 10, the present invention provides a proximity exposure method, which is applied to a proximity exposure and photo-alignment integrated apparatus in the first embodiment, and comprises the following steps:
s21: the light hole station is arranged in the center of the light path of the light source through the moving mechanism.
Specifically, the light hole station is moved to the center of the light path of the light source through the moving mechanism of the polarization module, and the light beam completely passes through the light hole station.
S22: and uploading the mask plate to perform exposure operation.
Specifically, the reticle is loaded on a mask stage and exposure work is performed.
And arranging a polarization station in the center of a light path of the light source, uploading a polarization detection grating, moving an energy sensor on a workpiece table to the center of the light path to measure the transmitted light intensity, and adjusting the angle of the polarization station through a rotating mechanism.
In summary, the proximity type exposure and photo-alignment integrated device, the photo-alignment method and the exposure method provided by the invention are characterized in that the proximity type exposure machine is additionally provided with the polarization module with the polarization station and the light hole station, the light hole station is arranged in the center of the light path of the light source during exposure operation, the polarization station is arranged in the center of the light path of the light source during alignment angle calibration operation, the polarization station is arranged in the center of the light path of the light source to provide polarized light for illumination, the energy sensor is moved to the center of the light path, and the rotating mechanism is rotationally adjusted, so that the device has the exposure and alignment functions at the same time by modifying configuration parameters, the equipment investment of a client can be obviously reduced, and the space of a factory building or a laboratory of the.
In summary, the invention adopting the above technical scheme has the following beneficial effects compared with the prior art:
the invention adds the polarizing module with the polarizing station and the light hole station on the proximity exposure machine, when in exposure operation, the light hole station is arranged at the center of the light path of the light source, when in alignment angle calibration operation, the polarizing station is arranged at the center of the light path of the light source to provide polarized light illumination, the energy sensor is moved to the center of the light path, and the rotating mechanism is rotationally adjusted, thereby realizing that the device has the functions of exposure and alignment by modifying configuration parameters, obviously reducing the equipment investment of a client, and saving the space of a client factory building or a laboratory.
Claims (10)
1. The utility model provides an integrative device is joined in marriage to proximity formula exposure and light, its characterized in that includes the light source, arranges in proper order in the light source light path direction: the device comprises a light reflection filtering mechanism, a fly-eye lens group, a spherical reflector, a mask table and a workpiece table with an energy sensor; a polarizing module is also arranged between the fly-eye lens group and the mask table, and the polarizing module comprises a light-transmitting hole station, a polarizing station provided with a rotating mechanism and a moving mechanism used for switching the polarizing station and the light-transmitting hole station to be arranged in the center of a light path of the light source; during exposure operation, the light hole station is arranged at the center of a light path of the light source, during light alignment operation, the polarization station is arranged at the center of the light path of the light source, the energy sensor is moved to the center of the light path, and the rotating mechanism is rotationally adjusted.
2. A proximity exposure and photoalignment integrated device according to claim 1, wherein the polarizer is disposed at the exit of the fly-eye lens set.
3. A proximity exposure and photoalignment integrated apparatus according to claim 1, wherein the light source is a mercury lamp light source, and a water cooling device is provided therein.
4. A proximity exposure and photoalignment integrated apparatus according to claim 1, wherein the light reflection filter and the fly's eye lens set output incident light to the polarizer at an angle of less than 15 °.
5. A proximity exposure and photoalignment integrated apparatus according to claim 1, wherein the stage comprises a horizontal motion mechanism and/or a vertical motion mechanism.
6. A proximity exposure and photoalignment integrated apparatus according to claim 1, wherein the rotation mechanism is sequentially connected: the gear clamping mechanism, the gear mechanism and the motor are arranged outside the polarizing station, and the moving mechanism is a progressive motor.
7. A proximity exposure photo-alignment method applied to the proximity exposure and photo-alignment integrated device of any one of claims 1 to 6, comprising the following steps:
the polarization station is arranged at the center of a light path of a light source through the moving mechanism;
uploading an analyzer grating, moving the energy sensor to the center of a light path to measure the transmitted light intensity, and rotating a polarizer of a polarization station within the range of 0-360 degrees through a rotating mechanism;
recording the light intensity obtained by the energy sensor at each polarizing angle, and completing calibration and storage;
and downloading the polarization detection grating and setting an alignment angle.
8. The method of claim 7, wherein the polarization station of the polarization module is located before the center of the light path of the light source, and further comprising: the pumping flow is increased or the heat of the light source is dissipated by a water cooling mode.
9. The integrated proximity exposure and photoalignment device of claim 7, wherein the analyzer grating is sized to the standard mask and has alignment marks, and the grating pattern of the analyzer grating is positioned to coincide with the mask pattern area of the standard mask.
10. A proximity exposure method applied to the proximity exposure and photoalignment integrated device as claimed in any one of claims 1 to 6, comprising the following steps:
the light hole station is arranged in the center of the light path of the light source through the moving mechanism;
and uploading the mask plate to perform exposure operation.
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| CN201610512887.1A CN107561871B (en) | 2016-07-01 | 2016-07-01 | Proximity type exposure and photo-alignment integrated device, photo-alignment method and exposure method |
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| CN201610512887.1A CN107561871B (en) | 2016-07-01 | 2016-07-01 | Proximity type exposure and photo-alignment integrated device, photo-alignment method and exposure method |
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| CN110262194A (en) * | 2019-05-31 | 2019-09-20 | 深圳市华星光电技术有限公司 | The optical system of exposure sources |
| CN113741100A (en) * | 2021-08-05 | 2021-12-03 | 信利（惠州）智能显示有限公司 | Photo-alignment device and photo-alignment method |
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| US5864388A (en) * | 1995-07-11 | 1999-01-26 | Ushiodenki Kabushiki Kaisha | Surface activating process, and device and lamp for performing said process |
| EP0994378A2 (en) * | 1998-10-12 | 2000-04-19 | Ushiodenki Kabushiki Kaisha | Proximity exposure method by oblique irradiation with light |
| CN1456904A (en) * | 2002-05-06 | 2003-11-19 | 伊斯曼柯达公司 | Exposuring device for illuminating sensitive substrate |
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| CN103135284A (en) * | 2011-11-23 | 2013-06-05 | 群康科技(深圳)有限公司 | Forming method of alignment film |
| CN105511166A (en) * | 2016-01-27 | 2016-04-20 | 京东方科技集团股份有限公司 | Orientation equipment, orientation film preparation method and display substrate |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP3791673B2 (en) * | 2001-06-21 | 2006-06-28 | 富士写真フイルム株式会社 | Near-field light exposure system |
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- 2016-07-01 CN CN201610512887.1A patent/CN107561871B/en active Active
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| US5864388A (en) * | 1995-07-11 | 1999-01-26 | Ushiodenki Kabushiki Kaisha | Surface activating process, and device and lamp for performing said process |
| JPH10154658A (en) * | 1996-09-27 | 1998-06-09 | Ushio Inc | Proximity exposure system with variable irradiation angle |
| EP0994378A2 (en) * | 1998-10-12 | 2000-04-19 | Ushiodenki Kabushiki Kaisha | Proximity exposure method by oblique irradiation with light |
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| CN102540575A (en) * | 2010-12-08 | 2012-07-04 | 株式会社日立高科技 | Exposing device and exposing method |
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