CN107522409A - Transparent panel and its manufacture method and application - Google Patents
Transparent panel and its manufacture method and application Download PDFInfo
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- CN107522409A CN107522409A CN201710543549.9A CN201710543549A CN107522409A CN 107522409 A CN107522409 A CN 107522409A CN 201710543549 A CN201710543549 A CN 201710543549A CN 107522409 A CN107522409 A CN 107522409A
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- layer
- nitride
- transparent panel
- stiffening layer
- antireflection layer
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- 238000000034 method Methods 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 150000004767 nitrides Chemical class 0.000 claims description 74
- 239000000463 material Substances 0.000 claims description 64
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 14
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 14
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 12
- 238000003475 lamination Methods 0.000 claims description 12
- 239000004411 aluminium Substances 0.000 claims description 11
- 238000007747 plating Methods 0.000 claims description 11
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910017083 AlN Inorganic materials 0.000 claims description 8
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 8
- KMWBBMXGHHLDKL-UHFFFAOYSA-N [AlH3].[Si] Chemical compound [AlH3].[Si] KMWBBMXGHHLDKL-UHFFFAOYSA-N 0.000 claims description 8
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 230000003667 anti-reflective effect Effects 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 238000010521 absorption reaction Methods 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- -1 chromium-silicon-aluminium Chemical compound 0.000 claims description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 6
- 238000010276 construction Methods 0.000 claims description 5
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 229910052582 BN Inorganic materials 0.000 claims description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910010037 TiAlN Inorganic materials 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 claims description 3
- UGACIEPFGXRWCH-UHFFFAOYSA-N [Si].[Ti] Chemical compound [Si].[Ti] UGACIEPFGXRWCH-UHFFFAOYSA-N 0.000 claims description 3
- IVHJCRXBQPGLOV-UHFFFAOYSA-N azanylidynetungsten Chemical compound [W]#N IVHJCRXBQPGLOV-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 claims description 2
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 claims description 2
- 229910003470 tongbaite Inorganic materials 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- 238000003763 carbonization Methods 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 description 278
- 239000000758 substrate Substances 0.000 description 26
- 239000011521 glass Substances 0.000 description 23
- 230000008859 change Effects 0.000 description 16
- 239000012528 membrane Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000003666 anti-fingerprint Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- PBZHKWVYRQRZQC-UHFFFAOYSA-N [Si+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O Chemical compound [Si+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PBZHKWVYRQRZQC-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 230000002633 protecting effect Effects 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 2
- 229910026551 ZrC Inorganic materials 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 238000002604 ultrasonography Methods 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052774 Proactinium Inorganic materials 0.000 description 1
- 229910003978 SiClx Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- CKUAXEQHGKSLHN-UHFFFAOYSA-N [C].[N] Chemical compound [C].[N] CKUAXEQHGKSLHN-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000006116 anti-fingerprint coating Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- UMUXBDSQTCDPJZ-UHFFFAOYSA-N chromium titanium Chemical compound [Ti].[Cr] UMUXBDSQTCDPJZ-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The embodiment of the invention discloses a kind of transparent panel and its manufacture method, the transparent panel, which includes panel body and the pellicular cascade structure being formed on the surface of panel body, the pellicular cascade structure, includes at least one antireflection layer and at least one stiffening layer.By the above-mentioned means, the hardness and wearability of transparent panel while the translucency of transparent panel is improved, can be improved by antireflection layer and stiffening layer.The embodiment of the present invention is further disclosed using the display screen of the transparent panel, terminal, windshield and mobile traffic.
Description
Technical field
, should more particularly to a kind of transparent panel and its manufacture method and application the present embodiments relate to Material Field
Display screen, terminal, windshield and the mobile traffic of transparent panel.
Background technology
Often have higher requirement to its hardness for the face glass used in the fields such as automobile or mobile phone, at present on
Hardening mode generally comprises two kinds used by stating face glass：
One kind is chemicosolidifying method, and glass surface is immersed in into high temeperature chemistry reagent solution particular by chemical method
In, the sodium ion of surface layer of glass can be replaced by the ion in solvent, form ion exchange.Exchange obtained ion ratio sodium ion
Diameter it is big so that the area of surface layer of glass increase, but actual upper volume does not change, therefore " compression " can be produced.So as to
Face glass is set to obtain stiffened reinforcing.But by above-mentioned chemicosolidifying handle after face glass with other elements (example
Such as, touch-screen) it is bonded in process, compatibility is poor always, can not be solved.
Another kind is physical hardening method, is cooled down rapidly after face glass specifically is heated into 600-700 DEG C, makes glass
Surface is drastically shunk, and forms compression, and glass middle level is shunk slower, and forms tensile stress, so make face glass obtain compared with
High intensity.But the face glass after being handled by above-mentioned physical hardening can be present that reflective is strong, glass fragility is larger, holds
The shortcomings of easy fragmentation.
Further, to obtain more preferable translucent effect, often plated on face glass and set anti-reflection film, and existing anti-reflection film
The hardness of opposite glass sheet does not improve.
The content of the invention
The embodiment of the present invention provides a kind of transparent panel and manufacture method, to improve the same of the translucency of transparent panel
When, improve the hardness and wearability of transparent panel.Further, the embodiments of the invention provide a kind of the aobvious of application transparent panel
Display screen, terminal, windshield and mobile traffic.
In order to solve the above technical problems, the technical scheme that the embodiment of the present invention uses is：A kind of transparent panel is provided,
The transparent panel includes panel body and the pellicular cascade structure being formed on the surface of panel body, pellicular cascade structure bag
Include the antireflection layer being cascading laterally from the surface of panel body and stiffening layer.
Wherein, the refractive index of antireflection layer is less than stiffening layer, and the hardness of stiffening layer is higher than antireflection layer.
Wherein, refractive index of the antireflection layer in 380nm-780nm wave-length coverages is 1.48-1.44, and stiffening layer is in 380nm-
Refractive index in 780nm wave-length coverages is 2.04-2.01.
Wherein, the Mohs' hardness of antireflection layer is 6-7, and the Mohs' hardness of stiffening layer is 9-9.5.
Wherein, the absorption coefficient in 380nm-780nm wave-length coverages of antireflection layer is that stiffening layer exists less than 0.001
Absorption coefficient in 380nm-780nm wave-length coverages is 0.0068-0.0066.
Wherein, the material of antireflection layer is oxide, the material of stiffening layer in nitride and diamond-like-carbon at least
A kind of or combination.
Wherein, the material of antireflection layer is at least one of silica, aluminum oxide, oxidation sial or combined, stiffening layer
Material is silicon nitride, aluminium nitride, titanium nitride, chromium nitride, tantalum nitride, zirconium nitride, aluminium silicon nitride, TiAlN, chromium nitride aluminum, nitrogen
Change chromium titanium aluminium, nitridation chromium-silicon-aluminium, titanium silicon nitride aluminium, boron nitride, nitrogen titanium boride, nitrogen chromium boride, nitrogen titanium boride aluminium, nitrogen titanium boride
At least one of silicon, nitrogen silicon boride titanium aluminium, TiCN, nitrogen chromium carbide, nitrogen zirconium carbide, nitrogen tungsten carbide or combination.
Wherein, the material of antireflection layer is oxide, and its thickness range is 8nm-150nm, and the material of stiffening layer is nitride,
Thickness range is 8nm-500nm.
Wherein, the thickness range of stiffening layer is 8nm-150nm.
Wherein, the thickness range of antireflection layer is 8-90nm, and the thickness range of stiffening layer is 8nm-35nm or 100nm-
150nm。
Wherein, antireflection layer and stiffening layer are stacked gradually on the surface of panel body, and the outermost layer of pellicular cascade structure
For stiffening layer.
Wherein, a lamination cycle is formed by the antireflection layer to contact with each other and a stiffening layer, pellicular cascade structure includes
The one or more lamination cycle.
Wherein, pellicular cascade structure setting is into causing pellicular cascade structure flat in 380nm-780nm visible-ranges
Equal transmitance is not less than 85%.
Wherein, pellicular cascade structure setting is into make it that the transmitted light through panel is in the CIE LAB colour spaces under natural environment
In coordinate value be：39≤L≤53, -2.5≤A≤- 0.5, and -2.0≤B≤- 3.0, or 35≤L≤45,4.5≤A≤
7.0, and -2.5≤B≤- 4.5.
In order to solve the above technical problems, the technical scheme that the embodiment of the present invention uses is：A kind of display screen is provided, should
Display screen includes above-mentioned transparent panel, and transparent panel is arranged at the outermost of display screen.
In order to solve the above technical problems, the technical scheme that the embodiment of the present invention uses is：A kind of terminal is provided, the end
End includes above-mentioned display screen.
In order to solve the above technical problems, the technical scheme that the embodiment of the present invention uses is：A kind of windshield is provided,
The windshield includes above-mentioned transparent panel.
In order to solve the above technical problems, the technical scheme that the embodiment of the present invention uses is：A kind of mobile traffic is provided
Instrument, the mobile traffic include above-mentioned windshield.
In order to solve the above technical problems, the technical scheme that the embodiment of the present invention uses is：A kind of transparent panel is provided
Manufacture method, including：One panel body is provided；Using antireflective material by vacuum splashing and plating mode on the surface of panel body
Form antireflection layer；Stiffening layer on the surface of antireflection layer is formed by vacuum splashing and plating mode using stiffened material.
Wherein, using antireflective material by vacuum splashing and plating mode on the surface of panel body formed antireflection layer the step of it
Before, further comprise：Substrate layer on the surface of panel body is formed by vacuum splashing and plating mode using backing material, wherein increasing
Permeable layers are formed on the surface of substrate layer.
Wherein, backing material is identical with stiffened material, and the sputtering process parameter of stiffening layer and the sputtering process of substrate layer
Parameter is identical.
The beneficial effect of the embodiment of the present invention is：The printing opacity of transparent panel can improved by antireflection layer and stiffening layer
While property, the hardness and wearability of transparent panel are improved.
Brief description of the drawings
Fig. 1 is the structural representation of transparent panel according to a first embodiment of the present invention；
Fig. 2 is the structural representation of transparent panel according to a second embodiment of the present invention；
Fig. 3 is the structural representation of transparent panel according to a third embodiment of the present invention；
Fig. 4 is the structural representation of transparent panel according to a fourth embodiment of the present invention；
Fig. 5 is the structural representation of the transparent panel and terminal using the embodiment of the present invention；
Fig. 6 is the structural representation of the windshield and automobile using the embodiment of the present invention；
Fig. 7 is bent with the change of thicknesses of layers using the case hardness of the panel body of the nitride stiffening layer of different materials
Line；
Fig. 8 is the mean transmissivity of the nitride stiffening layer of different materials with the change curve of thicknesses of layers；
Fig. 9 is the transmitance of the nitride stiffening layer of different thicknesses of layers with the change curve of wavelength；
Figure 10-15 is the mean transmissivity of the double membrane structure for the antireflection layer and stiffening layer for including different materials with stiffening layer
Thicknesses of layers change curve.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation describes, it is clear that described embodiment is only the part of the embodiment of the present invention, rather than whole embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other under the premise of creative work is not made
Embodiment, belong to the scope of protection of the invention.
Shown in reference picture 1, Fig. 1 is the structural representation of transparent panel according to a first embodiment of the present invention.The present embodiment
Transparent panel include panel body 10 and the pellicular cascade structure 11 that is formed on the surface of panel body 10.Panel body
10 material can be any appropriate transparent material such as glass, polystyrene, polymethyl methacrylate.
In the present embodiment, pellicular cascade structure 11 includes antireflection layer 111 and stiffening layer 112.Wherein, antireflection layer 111
It is formed on the surface of panel body 10, stiffening layer 112 is formed on the surface of antireflection layer 111, to cause antireflection layer 111 and add
Hard formation 112 is stacked gradually in contacting on the surface of panel body 10 and each other.
Transparent area can be improved while the translucency of transparent panel is improved by antireflection layer 111 and stiffening layer 112
The hardness and wearability of plate.
Further, consider from the physical characteristic of antireflection layer 111 and stiffening layer 112, it is general next in order to obtain the effect above
Say that the refractive index for requiring antireflection layer 111 is less than stiffening layer 112, and the hardness of stiffening layer 112 is higher than antireflection layer 111.
In concrete application example, refractive index of the antireflection layer 111 in 380nm-780nm wave-length coverages is 1.48-1.44, and
Refractive index of the stiffening layer 112 in 380nm-780nm wave-length coverages is 2.04-2.01.It is further alternative, antireflection layer 111
Mohs' hardness is 6-7, and the Mohs' hardness of stiffening layer 112 is 9-9.5.
In addition, in order to obtain more preferable translucent effect, absorption system of the antireflection layer 111 in 380nm-780nm wave-length coverages
Number is formed as less than 0.001, and absorption coefficient of the stiffening layer 112 in 380nm-780nm wave-length coverages is 0.0068-0.0066.
Consider from the material property of antireflection layer 111 and stiffening layer 112, the material of antireflection layer 111 can use oxide, example
Material such as antireflection layer 111 can be at least one of silica, aluminum oxide and oxidation sial or combination.
The material of stiffening layer 112 can be at least one of nitride and diamond-like-carbon or combination.The nitride
It can also be nitrogen boride or nitrogen carbide.For example, the material of stiffening layer 112 can be silicon nitride, aluminium nitride, titanium nitride, nitrogen
Change chromium, tantalum nitride, zirconium nitride, aluminium silicon nitride, TiAlN, chromium nitride aluminum, chromium nitride titanium aluminum, nitridation chromium-silicon-aluminium, titanium silicon nitride
Aluminium, boron nitride, nitrogen titanium boride, nitrogen chromium boride, nitrogen titanium boride aluminium, nitrogen titanium boride silicon, nitrogen silicon boride titanium aluminium, TiCN, nitrogen carbon
Change at least one of chromium, nitrogen zirconium carbide, nitrogen tungsten carbide or combination.
Consider that the thickness range of antireflection layer 111 can be 50nm- from antireflection layer 111 and the thicknesses of layers of stiffening layer 112
100nm, the thickness range of stiffening layer 112 can be 5nm-20nm.It is highly preferred that the thickness range of antireflection layer 111 can be
80nm-90nm, the thickness range of stiffening layer 112 can be 10nm-15nm.Need it is worth noting that, above-mentioned number range is real
Include the numerical value of two end points on border.
Shown in reference picture 2, Fig. 2 is the structural representation of transparent panel according to a second embodiment of the present invention.The present embodiment
Transparent panel include panel body 20 and the pellicular cascade structure 21 that is formed on the surface of panel body 20.Pellicular cascade
Structure 21 includes antireflection layer 211 and stiffening layer 212.The difference of transparent panel shown in the transparent panel and Fig. 1 of the present embodiment
Part is that the transparency carrier of the present embodiment is further formed between panel body 20 and the antireflection layer 211 being disposed adjacent
Substrate layer 22.The purpose of setting of substrate layer 22 is to increase the adhesive force between antireflection layer 211 and panel body 20.Substrate layer
22 may be selected any appropriate material, while the thickness of substrate layer 22 can carry out any setting according to actual conditions.Such as at this
In embodiment, the material of substrate layer 22 is identical with stiffening layer 212, and the thickness of substrate layer 22 is 5nm-20nm, and preferably with adding
The thickness of hard formation 212 is identical, thus can simplify coating process.Further, further formed in the outside of pellicular cascade structure 21
Anti-fingerprint layer 23, anti-fingerprint layer 23 can use the plating of polymer coating or suitable material with hydrophobicity and oleophobic property
Film.
Shown in reference picture 3, Fig. 3 is the structural representation of transparent panel according to a third embodiment of the present invention.The present embodiment
Transparent panel include panel body 30 and the pellicular cascade structure 31 that is formed on the surface of panel body 30.The present embodiment
Transparent panel and Fig. 1 shown in the difference of transparent panel be that the pellicular cascade structure 31 of the present embodiment is included successively
It is stacked in the antireflection layer 311 on the surface of panel body 30, stiffening layer 312, antireflection layer 313 and stiffening layer 314.
In the present embodiment, can be using antireflection layer 311 and stiffening layer 312 as a lamination cycle, and by antireflection layer 313
A lamination cycle is used as with stiffening layer 314.That is, in the embodiment shown in fig. 1, pellicular cascade structure 11 only includes
The lamination cycle formed by the antireflection layer 111 and stiffening layer 112 that contact with each other.And in the embodiment shown in fig. 3, film
Laminated construction 31 is included respectively by the antireflection layer 311 and stiffening layer 312 that contact with each other and the He of antireflection layer 311 by contacting with each other
Two lamination cycles that stiffening layer 312 is formed.In other embodiments, pellicular cascade structure can also include two or more by
The lamination cycle that the antireflection layer and stiffening layer to contact with each other is formed.Wherein, within each lamination cycle, stiffening layer is arranged at increasing
The side of the remote panel body of permeable layers.And the outermost layer of pellicular cascade structure is stiffening layer.
Further, between the panel body 30 of the present embodiment and pellicular cascade structure 31 and pellicular cascade structure 31 most
Outside can also be according to the substrate layer and anti-fingerprint layer being actually needed in increase embodiment illustrated in fig. 2.
Shown in reference picture 4, Fig. 4 is the flow chart of the manufacture method of transparent panel according to the fourth embodiment of the invention.
The manufacture method of the present embodiment mainly includes the following steps that：
Step 41, counter plate body carries out surface clean and drying；
In this step, because the surface smoothness of panel body is very big to coating influence, therefore ultrasound is preferably passed through
Ripple cleaning way counter plate body carries out surface clean.
In a concrete application example, ultrasonic cleaning agent is added in the first ultrasonic cleaner, is heated to 70 DEG C,
Panel body is placed wherein again, starts ultrasonic wave cleaning, terminates after 5 minutes；
City's water is added in ultrasonic cleaner in second and the 3rd, and panel body is sequentially placed into second and the 3rd ultrasound
In ripple rinse bath, ultrasonic rinsing is carried out, per 5 minutes groove duration；
Ultrasonic cleaning agent is added in the 4th ultrasonic cleaner, and carries out ultrasonic wave under normal temperature condition and cleans 5 points
Clock；
Pure water, the wherein resistivity of pure water >=10-15M Ω/CM are added in the 5th to the 7th ultrasonic cleaner3, will
Panel body is put into wherein, carries out ultrasonic rinsing successively, is 5 minutes per the groove duration；
Panel body is placed in the 8th ultrasonic cleaner and carries out primary dewatering, then panel body the 9th and 10 are surpassed
Hot drying and dewatering twice is carried out in sound wave rinse bath；
Finally, the glass panel after the completion of being cleaned through ultrasonic wave is placed in pallet, is ready for vacuum sputtering coating processing.
Step 42, substrate layer is formed on the surface of panel body by vacuum splashing and plating mode using backing material；
Step 43, antireflection layer is formed on the surface of substrate layer by vacuum splashing and plating mode using antireflective material；
Step 44, stiffening layer is formed on the surface of antireflection layer by vacuum splashing and plating mode using stiffened material.
In above-mentioned steps 42-44, vacuum splashing and plating can be used in medium frequency reactive sputtering, radio-frequency sputtering, high energy pulse sputtering
One kind or combination.Backing material, antireflective material and stiffened material can use above-described various materials, and backing material and
Stiffened material can use identical material.Further, the physical characteristic of substrate layer, antireflection layer and stiffening layer and thicknesses of layers can be set
Above-described various number ranges are set to, and the physical characteristic and thicknesses of layers of substrate layer and stiffening layer can be with identical.
Further, described above, those skilled in the art can omit step 42 according to being actually needed, Huo Zhechong
Multiple step 43-44, so the pellicular cascade structure for ultimately form include more than one by the antireflection layer that contacts with each other and plus
The lamination cycle that hard formation is formed.Wherein, stiffening layer is preferably placed at the outermost layer of pellicular cascade structure.
Further, anti-fingerprint film can also further be formed in the outside of pellicular cascade structure.
Below using substrate of glass as panel body, with silica (SiO2) antireflective material is used as, with silicon nitride (Si3N4)
As describing a concrete application example exemplified by backing material and stiffened material.
In concrete application example, after carrying out ultrasonic surface cleaning, dehydration, drying to substrate of glass first, it is placed on true
On the work rest of null device.Vacuum equipment is opened, substrate of glass is entered continuously by transmission mechanism with the speed of 2.5cm/ seconds
Sputter coating vacuum equipment, the base vacuum of vacuum equipment is 3.0 × 10-3Pa, and nitrogen is coated with successively on the surface of panel body
Silicon substrate layer, silica antireflection layer and silicon nitride stiffening layer trilamellar membrane Rotating fields.
Wherein, during being coated with of silicon nitrate substrate layer, Si targets configuration 40KW intermediate frequency reaction power supplys, to vacuum equipment
300sccm argon gas is inside filled with as protective gas, while the nitrogen for being filled with 120sccm thereto again makes as reacting gas
Working vacuum degree is 0.5-0.8Pa, and the deposit thickness for ensureing silicon nitrate substrate layer is 10-20 nanometers；
During being coated with of silica antireflection layer, the base vacuum for keeping vacuum equipment is 3.0 × 10-3Pa, Si target
40KW intermediate frequencies reaction power supply is configured, 350sccm argon gas and 80-120sccm oxygen is filled with, working vacuum degree 0.5Pa, protects
The deposit thickness for demonstrate,proving silica antireflection layer is 80-100 nanometers.
Silicon nitride stiffening layer is identical with the sputtering process parameter of silicon nitrate substrate layer, and deposit thickness is 10-20 nanometers.
After tested, 4% is improved using the substrate of glass transmitance of above-mentioned pellicular cascade structure, and hardness can reach lead
The 9H of hardness, has the advantages that hardness height, abrasion-resistant, scratch-resistant, service life are long.
As indicated above, included extremely by being set on the surface of panel body in the transparent panel of various embodiments of the present invention
The pellicular cascade structure of a few antireflection layer and stiffening layer can improve transparent panel while the translucency of transparent panel is improved
Hardness and wearability, and can be widely applied to multiple fields.
Shown in reference picture 5, Fig. 5 is the display screen of transparent panel and the structural representation of terminal using the embodiment of the present invention
Figure.
In the present embodiment, terminal device 50 display screen 51 outermost set the various embodiments described above transparent panel
52, and the outermost stiffening layer of transparent panel 52 is arranged towards to the outside of display screen 51.
Shown in reference picture 6, Fig. 6 is the structural representation using the windshield and automobile of the transparent panel of the embodiment of the present invention
Figure.
In the present embodiment, the windshield 61 of automobile 60, will be transparent using the transparent panel of the various embodiments described above
The outermost stiffening layer of panel is arranged towards the outside of automobile 60, or equal in the both sides of transparent panel according to being actually needed
Above-mentioned pellicular cascade structure is set, to cause outermost stiffening layer to be respectively facing the inside and outside of automobile.Such as art technology
The above-mentioned windshield that personnel are understood can also be applied on other mobile traffics.
Through the present inventor further study show that, on the basis of above-mentioned film layer structure, it is also contemplated that following modification：
First, in the case where not considering antireflective effect, can also be set only on the surface of panel body and class above
As nitride stiffening layer, and then counter plate body surface carry out stiffened effect, now panel body can also be
Non-transparent material.As shown in fig. 7, the thicknesses of layers change of the nitride stiffening layer of different materials is respectively illustrated in Fig. 7 and is led
The change curve of the case hardness of the panel body of cause.Wherein shown by taking silicon nitride, aluminium nitride and aluminium silicon nitride as an example, but
As understood by those skilled in the art, nitride stiffening layer can also use other nitride materials being mentioned above, and
With similar characteristic.Because the thickness of nitride stiffening layer directly affects the case hardness of panel body, therefore in the present invention
The thickness selection of middle nitride stiffening layer is most important.From Fig. 7 and to the test results of other nitride materials it can be found that working as
When the thicknesses of layers of nitride stiffening layer reaches 8nm, the Mohs' hardness on the surface of panel body has met or exceeded current city
The Mohs' hardness for the simple glass panel sold, and reach or close to 6.0.Therefore, in the present invention, the thickness of nitride stiffening layer
It is preferably provided to be not less than 8nm.Further, it is to obtain more preferable protecting effect, can be by setting the film layer of nitride stiffening layer
Thickness so that the case hardness of panel body is not less than 6.0, even more high, such as 7.0,8.0,9.0 etc., with specific reference to panel
Actual use scene depending on.In the alternative embodiment of the present invention, by the thickness face for setting nitride stiffening layer
The Mohs' hardness on the surface of plate body is between 6.0-8.5.
Further, can be found that from Fig. 7 and to the test results of other nitride materials the case hardness of panel body with
Nonlinear change is presented in the thicknesses of layers of nitride stiffening layer.After the thickness of nitride stiffening layer reaches certain thickness, panel
The case hardness of body no longer substantially increases.For example, when the thickness of nitride stiffening layer reaches 500nm, the table of panel body
Surface hardness has reached or (silicon nitride stiffening layer and aluminium silicon nitride stiffening layer reach close to the ultimate hardness determined in itself by material
To Mohs' hardness 9.0, and aluminium nitride stiffening layer reaches Mohs' hardness 8.5), and no longer increase substantially with thicknesses of layers and increase.
Therefore, in the present invention, the thickness of nitride stiffening layer can be selected in the range of 8nm-500nm.
Further, from Fig. 7 and the test results of other nitride materials is can be found that changed in thicknesses of layers from 8nm
During 500nm, the case hardness of panel body rapidly increases with the increased of thicknesses of layers first, and certain increasing to
Slowly increase with the increase of thicknesses of layers after degree.For example, when the thickness of nitride stiffening layer reaches 150nm, panel sheet
The increase trend of the case hardness of body tends to slow down with the increase of the thickness of nitride stiffening layer.Therefore, enter in the present invention
One step integrates stiffening effect and the dual of financial cost is considered, and the thickness of nitride stiffening layer can be in 8nm-150nm scope
Inside carry out selecting appropriate selection.In the alternative embodiment of the present invention, made by setting the thickness of silicon nitride stiffening layer
The case hardness of panel body is obtained between 6.5-8.5, or passes through aluminium nitride stiffening layer or the thickness of aluminium silicon nitride stiffening layer
Spend and cause the case hardness of panel body between 6.5-8.0.
Further, as shown in figure 8, under the thicknesses of layers of nitride stiffening layer of different materials is respectively illustrated in Fig. 8
The change curve of mean transmissivity.From Fig. 8 and to the test results of other nitride materials it can be found that nitride stiffening layer
Considerable influence be present to the mean transmissivity of nitride stiffening layer in thicknesses of layers.Therefore, when panel is as protecting LCD screen cover plate
Or, it is necessary to which the mean transmissivity for being based further on nitride stiffening layer nitrogenizes to set in the case that other need to consider transmission intensity
The thicknesses of layers of thing stiffening layer.For example, the thicknesses of layers of nitride stiffening layer can be arranged on 8nm-35nm or 100-150nm
To obtain of a relatively high mean transmissivity, while ensure relatively low financial cost.Further, an optional implementation of the invention
In example, for the further following preferred thicknesses of layers of specific materials variances, the thickness of silicon nitride layer is 12nm-35nm or 100nm-
135nm；The thickness of aln layer is 16nm-35nm or 115nm-150nm；The thickness of silicon nitride aluminium lamination be 14nm-35nm or
110nm-140nm.In an alternate embodiment of the present invention, the thickness of nitride stiffening layer is arranged so that nitride stiffening layer exists
Mean transmissivity in 380nm-780nm visible-ranges is not less than 82%, more preferably no less than 85%.
Certainly, can be thick by the film layer of nitride stiffening layer in the case where not considering financial cost and transmitance effect
Degree sets other scopes, such as in the case that panel requires more high rigidity and wearability as mobile phone or computer rear cover plate,
The thicknesses of layers of nitride stiffening layer can be set 150-500nm or other scopes.
Further, become as shown in figure 9, respectively illustrating the nitride stiffening layer under different thicknesses of layers in Fig. 9 with wavelength
The transmittance curve of change.From Fig. 9 and to the test results of other nitride materials it can be found that under certain thicknesses of layers, nitrogen
Compound stiffening layer can produce difference to the transmissivity of different wave length light, therefore can produce certain colour cast, influence color rendition
Degree.Therefore, when panel as protecting LCD screen cover plate or other need to consider color rendition degree in the case of, it is necessary to be based further on
The chromaticity coordinates of the transmitted light of nitride stiffening layer sets the thicknesses of layers of nitride stiffening layer.In the present invention, setting is passed through
The thicknesses of layers of nitride stiffening layer so that coordinate of the transmitted light through panel in the CIE LAB colour spaces under natural environment
It is worth and is：39≤L≤53, -2.5≤A≤- 0.5, and -2.0≤B≤- 3.0, or 35≤L≤45,4.5≤A≤7.0, and -2.5
≤ B≤- 4.5, it may thereby be ensured that panel has preferable color rendition degree.
The case hardness and abrasion resistance of panel body can be effectively improved by above-mentioned nitride stiffening layer.It is specifically chosen not
Nitride material together simultaneously selects different thicknesses of layers in 8nm-500nm, carries out frictional experiment and water droplet angular measurement.It is specific to survey
Strip part is：1kg counterweights are as bearing a heavy burden, and 10 × 10mm of size steel wool is as bistrique, stroke 40mm, and speed 50 times is (past
It is multiple)/point, after the completion of friction, carry out water droplet angular measurement, measurement water droplet and substrate surface angle.Judgment criteria：At water droplet angle>
On the premise of 100 °, Rubbing number shows that wearability is more excellent.Simple glass panel is after anti-fingerprint coating film treatment, friction
Test 3000 times, water droplet angle<100 °, panel of the invention is by 4000 frictions, water droplet angle>100°.As can be seen here, using
After the nitride stiffening layer of suitable thickness, the hardness and wearability on panel body surface are obviously improved.
Further, study and find through the present inventor, in above-disclosed antireflection layer and stiffening layer or substrate layer, antireflection layer
And the thickness of above-mentioned each film layer can be enlarged according to being actually needed in the laminated construction of stiffening layer.
Using nitride it is being stiffening layer and using oxide as in the double membrane structure of antireflection layer shown in Fig. 1, in Figure 10-15
Respectively illustrate and be antireflection layer using silica and be antireflection layer and using silicon nitride as stiffened using silicon nitride as stiffening layer, using aluminum oxide
Layer, take silica as antireflection layer and using aluminium nitride as stiffening layer, using aluminum oxide be antireflection layer and using aluminium nitride as stiffening layer, with oxygen
SiClx be antireflection layer and using aluminium silicon nitride be stiffening layer and using aluminum oxide be antireflection layer and using aluminium silicon nitride as stiffening layer six
The mean transmissivity change curve of the double membrane structure of kind different materials.
Specifically, six curves are respectively illustrated in above-mentioned every width schematic diagram, this six curves represent to increase respectively
When the thickness of permeable layers is arranged to 8nm, 20nm, 30nm, 50nm, 100nm and 150nm, become with the thicknesses of layers of stiffening layer from 12nm
Change the mean transmissivity of above-mentioned double membrane structure during to 150nm.
As shown in fig. 10-15, although the mean transmissivity of each double membrane structure with the change of material and thicknesses of layers and
It is varied from, but substantially remains between 92%-80%.Therefore, can enter in the thickness of antireflection layer between 8nm-150nm
Row selection, and consider further to be selected between 8nm-90nm from financial cost.
Meanwhile find after further study, the case hardness for being provided with the panel body of above-mentioned double membrane structure mainly takes
Certainly in nitride stiffening layer, therefore the thicknesses of layers selection standard of the nitride stiffening layer in above-mentioned double membrane structure with it is upper
Single layer nitride stiffening layer described by text is similar, and its optional scope is 8nm-500nm, and further optional scope is 8nm-
150nm, further optional scope are 8nm-35nm, or 100nm-150nm, and can be described above according to material difference
Optimization.
Further, it is possible to the thicknesses of layers of antireflection layer and stiffening layer is set based on the mean transmissivity of double membrane structure,
To cause mean transmissivity of the double membrane structure in 380nm-780nm visible-ranges to be not less than 82%, preferentially it is not less than
85%, more preferably no less than 90%.For example, nitride stiffening layer can be selected in the range of 8nm-35nm or 100-150nm
Thicknesses of layers set and the thicknesses of layers of selective oxidation thing antireflection layer is of a relatively high to obtain in the range of 8nm-90nm
Mean transmissivity, while ensure relatively low financial cost.It is pointed out that due to the presence of antireflection layer, can be by setting
Put the thickness of appropriate antireflection layer so that in the case of stiffening layer thickness identical, the mean transmissivity of above-mentioned double membrane structure
At least increase by 4% compared to the mean transmissivity only with single layer nitride stiffening layer.
Further, it is also possible to the chromaticity coordinates of the transmitted light based on double membrane structure sets the nitride stiffening layer and oxide to add
The thicknesses of layers of hard formation.In the present invention, by setting the thicknesses of layers of the two so that the transmission through panel under natural environment
Coordinate value of the light in the CIE LAB colour spaces be：39≤L≤53, -2.5≤A≤- 0.5, and -2.0≤B≤- 3.0, or 35
≤ L≤45,4.5≤A≤7.0, and -2.5≤B≤- 4.5, it may thereby be ensured that panel has preferable color rendition degree.
Further, using nitride it is being stiffening layer and substrate layer and trilamellar membrane using oxide as antireflection layer shown in Fig. 2
In structure, the thickness of nitride layer can be selected in the range of 8nm-500nm, and further alternative in 8nm-
Being selected in the range of 35nm, the thickness of oxide antireflection layer can be selected in the range of 8nm-150nm, and further
Optionally selected in the range of 30nm-90nm, and the thickness of nitride stiffening layer can enter in the range of 8nm-500nm
Row selection, and it is further alternative selected in the range of 8nm-35nm, and can be described above according to material difference
Optimization.
Further, it is being stiffening layer using nitride shown in Fig. 3 and four laminated construction using oxide as antireflection layer are gone forward side by side
One step is set in five film structures of nitride layer, and the thickness of nitride layer can enter in the range of 8nm-500nm
Row selection, and it is further alternative selected in the range of 8nm-35nm, close to panel body the first oxide it is anti-reflection
The thickness of layer can be selected in the range of 8nm-150nm, and further alternative be selected in the range of 22nm-38nm
To select, the thickness close to the first nitride stiffening layer of panel body can be selected in the range of 8nm-500nm, and further
Optionally selected in the range of 50nm-70nm, the thickness of the second oxide antireflection layer away from panel body can be
Selected in the range of 8nm-150nm, and it is further alternative selected in the range of 10nm-70nm, away from panel
The thickness of second nitride stiffening layer of body can be selected in the range of 8nm-500nm, and it is further alternative
Selected in the range of 10nm-55nm.Wherein, nitride layer can also be cancelled according to being actually needed.
It should be noted that in order to simplify processing procedure and be in cost consideration, the material of nitride layer may be selected to
The material of nitride stiffening layer is identical, and its thickness may be selected to the thickness equal to or less than nitride stiffening layer.For example, five
In film structure, the material of nitride layer may be selected and the first nitride stiffening layer and/or the second nitride stiffening layer phase
Together, and the thickness of nitride layer is identical or small with the thickness of the first nitride stiffening layer and/or the second nitride stiffening layer
In the thickness of the first nitride stiffening layer and/or the second nitride stiffening layer.Meanwhile by setting appropriate thicknesses of layers
The mean transmissivity and chromaticity coordinates of monolithic film membrane laminated construction including substrate layer meet above-described mean transmissivity
With chromaticity coordinates standard.
Embodiments of the present invention are the foregoing is only, are not intended to limit the scope of the invention, it is every to utilize this
The equivalent structure or equivalent flow conversion that description of the invention and accompanying drawing content are made, or directly or indirectly it is used in other correlations
Technical field, it is included within the scope of the present invention.
Claims (19)
1. a kind of transparent panel, it is characterised in that the transparent panel includes panel body and is formed at the panel body
Surface on pellicular cascade structure, the pellicular cascade structure include stacked gradually laterally from the surface of the panel body
The antireflection layer and stiffening layer of setting.
2. transparent panel according to claim 1, it is characterised in that the refractive index of the antireflection layer is less than the stiffened
Layer, and the hardness of the stiffening layer is higher than the antireflection layer.
3. transparent panel according to claim 1, it is characterised in that the antireflection layer is in 380nm-780nm wave-length coverages
Interior refractive index is 1.48-1.44, and refractive index of the stiffening layer in 380nm-780nm wave-length coverages is 2.04-2.01.
4. transparent panel according to claim 1, it is characterised in that the Mohs' hardness of the antireflection layer is 6-7, described to add
The Mohs' hardness of hard formation is 9-9.5.
5. transparent panel according to claim 1, it is characterised in that the antireflection layer in 380nm-780nm wavelength models
Absorption coefficient in enclosing is that absorption coefficient of the stiffening layer in 380nm-780nm wave-length coverages is less than 0.001
0.0068-0.0066。
6. transparent panel according to claim 1, it is characterised in that the material of the antireflection layer is oxide, described to add
The material of hard formation is at least one of nitride and diamond-like-carbon or combination.
7. transparent panel according to claim 6, it is characterised in that the material of the antireflection layer be silica, aluminum oxide,
At least one of sial or combination are aoxidized, the material of the stiffening layer is silicon nitride, aluminium nitride, titanium nitride, chromium nitride, nitridation
Tantalum, zirconium nitride, aluminium silicon nitride, TiAlN, chromium nitride aluminum, chromium nitride titanium aluminum, nitridation chromium-silicon-aluminium, titanium silicon nitride aluminium, boron nitride,
Nitrogen titanium boride, nitrogen chromium boride, nitrogen titanium boride aluminium, nitrogen titanium boride silicon, nitrogen silicon boride titanium aluminium, TiCN, nitrogen chromium carbide, nitrogen carbonization
At least one of zirconium, nitrogen tungsten carbide or combination.
8. transparent panel according to claim 1, it is characterised in that the material of the antireflection layer is oxide, its thickness
Scope is 8nm-150nm, and the material of the stiffening layer is nitride, thickness range 8nm-500nm.
9. transparent panel according to claim 8, it is characterised in that the thickness range of the stiffening layer is 8nm-150nm.
10. transparent panel according to claim 8, it is characterised in that the thickness range of the antireflection layer is 8nm-90nm,
The thickness range of the stiffening layer is 8nm-35nm or 100nm-150nm.
11. transparent panel according to claim 1, it is characterised in that the antireflection layer and the stiffening layer stack gradually
In on the surface of the panel body, and the outermost layer of the pellicular cascade structure is the stiffening layer.
12. transparent panel according to claim 1, it is characterised in that by contact with each other one antireflection layer and an institute
State stiffening layer and form a lamination cycle, the pellicular cascade structure includes the one or more lamination cycle.
13. panel according to claim 1, it is characterised in that the pellicular cascade structure setting is into causing the film
Mean transmissivity of the laminated construction in 380nm-780nm visible-ranges is not less than 85%.
14. panel according to claim 1, it is characterised in that the pellicular cascade structure setting is into causing in natural ring
Coordinate value of the transmitted light in the CIE LAB colour spaces through the panel under border be：39≤L≤53, -2.5≤A≤- 0.5, and -
2.0≤B≤- 3.0, or 35≤L≤45,4.5≤A≤7.0, and -2.5≤B≤- 4.5.
15. a kind of display screen, it is characterised in that the display screen includes the transparent area described in claim 1-14 any one
Plate, the transparent panel are arranged at the outermost of display screen.
16. a kind of terminal, it is characterised in that the terminal includes the display screen described in claim 15.
17. a kind of windshield, it is characterised in that the windshield includes transparent described in claim 1-14 any one
Panel.
18. a kind of mobile traffic, it is characterised in that including the windshield described in claim 17.
19. a kind of manufacture method of transparent panel, it is characterised in that the manufacture method includes：
One panel body is provided；
Antireflection layer on the surface of the panel body is formed by vacuum splashing and plating mode using antireflective material；
Stiffening layer on the surface of the antireflection layer is formed by vacuum splashing and plating mode using stiffened material.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611260052 | 2016-12-30 | ||
| CN2016112600528 | 2016-12-30 |
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| CN107522409A true CN107522409A (en) | 2017-12-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710543549.9A Pending CN107522409A (en) | 2016-12-30 | 2017-07-05 | Transparent panel and its manufacture method and application |
| CN201720808091.0U Active CN207581671U (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201720809583.1U Active CN207347401U (en) | 2016-12-30 | 2017-07-05 | A kind of panel |
| CN201720808097.8U Active CN207671933U (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201710543972.9A Pending CN107382090A (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201710543548.4A Pending CN107445490A (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201710543551.6A Pending CN107417133A (en) | 2016-12-30 | 2017-07-05 | A kind of panel |
| CN201720809527.8U Active CN207669894U (en) | 2016-12-30 | 2017-07-05 | Transparent panel and its application |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720808091.0U Active CN207581671U (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201720809583.1U Active CN207347401U (en) | 2016-12-30 | 2017-07-05 | A kind of panel |
| CN201720808097.8U Active CN207671933U (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201710543972.9A Pending CN107382090A (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201710543548.4A Pending CN107445490A (en) | 2016-12-30 | 2017-07-05 | Transparent panel |
| CN201710543551.6A Pending CN107417133A (en) | 2016-12-30 | 2017-07-05 | A kind of panel |
| CN201720809527.8U Active CN207669894U (en) | 2016-12-30 | 2017-07-05 | Transparent panel and its application |
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| CN108191260A (en) * | 2018-02-13 | 2018-06-22 | 江苏奥蓝工程玻璃有限公司 | A kind of high temperature resistant low radiation coated glass |
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| CN107522409A (en) * | 2016-12-30 | 2017-12-29 | 深圳市晟砡科技有限公司 | Transparent panel and its manufacture method and application |
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| CN109270622B (en) * | 2018-10-22 | 2020-12-11 | 东莞市银泰丰光学科技有限公司 | A processing method for changing the surface tension and water drop angle of a glass light guide plate |
| CN109639860B (en) * | 2018-12-17 | 2024-08-20 | 佛山佛塑科技集团股份有限公司 | Cover plate |
| CN109650740A (en) * | 2018-12-17 | 2019-04-19 | 佛山市易晟达科技有限公司 | A kind of cover board |
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Also Published As
| Publication number | Publication date |
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| CN207581671U (en) | 2018-07-06 |
| CN207347401U (en) | 2018-05-11 |
| CN207669894U (en) | 2018-07-31 |
| CN107417133A (en) | 2017-12-01 |
| CN107382090A (en) | 2017-11-24 |
| CN107445490A (en) | 2017-12-08 |
| CN207671933U (en) | 2018-07-31 |
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