CN107520744A - The erratic star wheel of uniform grinding - Google Patents
The erratic star wheel of uniform grinding Download PDFInfo
- Publication number
- CN107520744A CN107520744A CN201710923869.7A CN201710923869A CN107520744A CN 107520744 A CN107520744 A CN 107520744A CN 201710923869 A CN201710923869 A CN 201710923869A CN 107520744 A CN107520744 A CN 107520744A
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- CN
- China
- Prior art keywords
- star wheel
- planetary wheel
- processing chamber
- erratic star
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000000034 method Methods 0.000 claims abstract description 9
- 230000001050 lubricating effect Effects 0.000 claims description 5
- 238000005498 polishing Methods 0.000 abstract description 6
- 238000005299 abrasion Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 8
- 238000003754 machining Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
Description
技术领域technical field
本发明涉及一种打磨工件,特别是一种均匀打磨的游星轮。The invention relates to a grinding workpiece, in particular to a uniform grinding planetary wheel.
背景技术Background technique
在光学器件抛光的过程中,将光学器件打磨的均匀度和平整性是影响成品质量至关重要的参数,现有的游星轮在抛光机中抛光时,由于光学器件会随游星轮一同转动,因此光学器件处于外周的角会经过更长的研磨路径,从而会出现同一光学器件在研磨后平整度不一的情况即塌边,在这种情况下产品的均匀度也无法保证。In the process of polishing optical devices, the uniformity and flatness of optical devices are the most important parameters that affect the quality of finished products. Therefore, the corner of the optical device at the outer periphery will go through a longer grinding path, so that the flatness of the same optical device after grinding will be different, that is, the edge collapse. In this case, the uniformity of the product cannot be guaranteed.
发明内容Contents of the invention
本发明所要解决的技术问题是提供一种可将光学器件均匀打磨的游星轮,使打磨过程中光学器件各部分所经过的研磨路径基本相同,且通过合理的连接结构减少该种游星轮的加工难度。The technical problem to be solved by the present invention is to provide a planetary wheel that can evenly polish the optical device, so that the grinding path of each part of the optical device is basically the same during the grinding process, and the number of such planetary wheel can be reduced through a reasonable connection structure. processing difficulty.
本发明解决上述技术问题所采用的技术方案是:The technical solution adopted by the present invention to solve the problems of the technologies described above is:
一种均匀打磨的游星轮,所述游星轮内部开设有圆形打磨孔,所述打磨孔在打磨过程中绕游星轮中心旋转,所述打磨孔中设置有加工腔,所述加工腔可转动连接游星轮,所述加工腔与游星轮间的摩擦系数小于加工腔与待加工件间的摩擦系数。A uniformly polished star wheel, the star wheel is provided with a circular grinding hole inside, the grinding hole rotates around the center of the star wheel during the grinding process, a processing cavity is arranged in the grinding hole, and the processing The cavity is rotatably connected to the planetary wheel, and the friction coefficient between the processing cavity and the planetary wheel is smaller than that between the processing cavity and the workpiece to be processed.
进一步地,所述游星轮中开设有圆环形滚道,所述滚道中设有滚珠,所述加工腔连接滚珠且不与游星轮接触。Further, an annular raceway is opened in the planetary wheel, and balls are arranged in the raceway, and the machining chamber is connected to the balls and does not contact the planetary wheel.
更进一步,所述加工腔与滚珠间通过弹性件连接。Furthermore, the processing chamber is connected with the ball through an elastic member.
再进一步,所述加工腔与滚珠间的距离等于弹性件的自然长度。Still further, the distance between the processing cavity and the ball is equal to the natural length of the elastic member.
作为优选,所述滚珠的数量为三个或四个并等间距设置。Preferably, the number of the balls is three or four and arranged at equal intervals.
作为优选,所述游星轮与加工腔接触连接,两者间设置有润滑层。Preferably, the planetary wheel is in contact with the processing chamber, and a lubricating layer is arranged between them.
本发明同现有技术相比具有以下优点及效果:由于在游星轮内部设置可转动的加工腔,光学器件相对于游星轮的自转速度产生变化,从而光学器件相对于磨盘的行进路径一直在改变,消除了塌边的现象。通过滚珠的连接设计降低了加工腔与游星轮的配合要求,弹性件的加入进一步减小配合难度,并且使加工腔可以设计成非圆形利于加工腔的加工,同时通过选择合适的弹性件和滚珠数量,保证了滚珠和游星轮之间较小的摩擦系数,并且在加工时稳定性好不会使某弹性件受力过大从而加大滚珠和游星轮之间的摩擦力。另外也可以通过设置润滑层的方式来减小加工腔与游星轮的配合难度。Compared with the prior art, the present invention has the following advantages and effects: due to the rotatable processing cavity arranged inside the star wheel, the rotation speed of the optical device relative to the star wheel changes, so that the travel path of the optical device relative to the grinding disc is always In the change, the phenomenon of edge collapse is eliminated. The connection design of the ball reduces the matching requirements between the processing chamber and the planetary wheel, and the addition of elastic parts further reduces the difficulty of matching, and makes the processing chamber design non-circular to facilitate the processing of the processing chamber. At the same time, by selecting the appropriate elastic parts And the number of balls ensures a small friction coefficient between the balls and the planetary wheel, and good stability during processing will not cause an elastic part to be overstressed, thereby increasing the friction between the balls and the planetary wheel. In addition, it is also possible to reduce the difficulty of cooperation between the machining chamber and the planetary wheel by setting a lubricating layer.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention. For those skilled in the art, other drawings can also be obtained according to these drawings without any creative effort.
图1为本发明的结构示意图。Fig. 1 is a structural schematic diagram of the present invention.
图2为实施例1加工腔部分的放大图。Fig. 2 is an enlarged view of the processing chamber part of Embodiment 1.
图3为实施例2加工腔部分的放大图。Fig. 3 is an enlarged view of the processing cavity part in embodiment 2.
标号说明Label description
游星轮1 打磨孔11 加工腔2Planetary wheel 1 Grinding hole 11 Machining cavity 2
滚珠3 弹性件31 工位4Ball 3 Elastic part 31 Station 4
具体实施方式detailed description
下面结合实施例对本发明做进一步的详细说明,以下实施例是对本发明的解释而本发明并不局限于以下实施例。The present invention will be further described in detail below in conjunction with the examples, the following examples are explanations of the present invention and the present invention is not limited to the following examples.
实施例1:Example 1:
如图1所示,本实施例由游星轮1和加工腔2组成,游星轮1上开设有打磨孔11,打磨孔11在打磨过程中绕游星轮1中心旋转。图2为游星轮1和加工腔2的配合示意图,其中游星轮1上开设有与滚珠3配合的圆环形滚道,滚珠3另一端设置在加工腔2开设的槽口中(同样也可以设置成圆环形滚道),并且游星轮1与加工腔2间并不接触,加工腔2中开设有矩形工位4,当代加工件放入工位抛光时,游星轮1随抛光机的主动齿轮转动,由于代加工件与磨盘间存在阻止代加工件向游星轮1转动方向旋转的摩擦力,且加工腔2与游星轮1间的摩擦力又小于上述摩擦力,进而代加工件相对于游星轮1的自转速度更慢,使各部位的研磨路径发生变化。As shown in FIG. 1 , this embodiment is composed of a planetary wheel 1 and a processing chamber 2 . A grinding hole 11 is opened on the planetary wheel 1 , and the grinding hole 11 rotates around the center of the planetary wheel 1 during the grinding process. Figure 2 is a schematic diagram of the cooperation between the planetary wheel 1 and the processing chamber 2, wherein the planetary wheel 1 is provided with an annular raceway that cooperates with the ball 3, and the other end of the ball 3 is arranged in the notch provided by the processing chamber 2 (also It can be set as a circular raceway), and the planetary wheel 1 is not in contact with the processing chamber 2. There is a rectangular station 4 in the processing chamber 2. When the contemporary workpiece is put into the station for polishing, the planetary wheel 1 follows The driving gear of the polishing machine rotates, because there is a friction force between the processing part and the grinding disc that prevents the processing part from rotating in the direction of the planet wheel 1, and the friction force between the processing chamber 2 and the planet wheel 1 is smaller than the above friction force. Furthermore, the rotation speed of the OEM workpiece relative to the planetary wheel 1 is slower, which changes the grinding path of each part.
实施例2:Example 2:
如图3所述,本实施例与实施例1基本相同,区别在于加工腔2与滚珠3间通过弹性件31连接,其中弹性件31的自然长度等于加工腔2与滚珠3间的间隔,从而降低了加工腔2与滚珠3间的配合要求。As shown in Figure 3, this embodiment is basically the same as Embodiment 1, the difference is that the processing chamber 2 and the ball 3 are connected by an elastic member 31, wherein the natural length of the elastic member 31 is equal to the interval between the processing chamber 2 and the ball 3, so that The matching requirements between the processing chamber 2 and the ball 3 are reduced.
实施例3:Example 3:
如图1所示,游星轮1与加工腔2直接接触,两者间设置有润滑层,润滑层可以为醇酸树脂、环氧树脂或丙烯酸树脂,也可以在以上材料中加入少许5%以下的金属氧化物以增加耐磨性。As shown in Figure 1, the planetary wheel 1 is in direct contact with the processing chamber 2, and there is a lubricating layer between them. The lubricating layer can be alkyd resin, epoxy resin or acrylic resin, or a little 5% of the above materials can be added. The following metal oxides to increase wear resistance.
此外,需要说明的是,本说明书中所描述的具体实施例,其零、部件的形状、所取名称等可以不同。凡依本发明专利构思所述的构造、特征及原理所做的等效或简单变化,均包括于本发明专利的保护范围内。本发明所属技术领域的技术人员可以对所描述的具体实施例做各种各样的修改或补充或采用类似的方式替代,只要不偏离本发明的结构或者超越本权利要求书所定义的范围,均应属于本发明的保护范围。In addition, it should be noted that the specific embodiments described in this specification may be different in terms of parts, shapes and names of components. All equivalent or simple changes made according to the structure, features and principles described in the patent concept of the present invention are included in the protection scope of the patent of the present invention. Those skilled in the art to which the present invention belongs can make various modifications or supplements to the described specific embodiments or adopt similar methods to replace them, as long as they do not deviate from the structure of the present invention or exceed the scope defined in the claims. All should belong to the protection scope of the present invention.
Claims (6)
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CN201710923869.7A CN107520744A (en) | 2017-09-30 | 2017-09-30 | The erratic star wheel of uniform grinding |
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CN201710923869.7A CN107520744A (en) | 2017-09-30 | 2017-09-30 | The erratic star wheel of uniform grinding |
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CN201710923869.7A Pending CN107520744A (en) | 2017-09-30 | 2017-09-30 | The erratic star wheel of uniform grinding |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107457687A (en) * | 2017-09-30 | 2017-12-12 | 德清晶生光电科技有限公司 | The erratic star wheel of uniform grinding |
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FR2261097A1 (en) * | 1974-01-25 | 1975-09-12 | Mo | Lapping machine for precision surfaces - has cages moved variably independent of movement of main wheel |
JPH09253987A (en) * | 1996-03-15 | 1997-09-30 | Nippon Dempa Kogyo Co Ltd | Carrier and abrasive device |
JPH1199471A (en) * | 1997-09-26 | 1999-04-13 | Canon Inc | Polishing jig and polishing device mounting it |
US6152807A (en) * | 1998-07-07 | 2000-11-28 | International Business Machines Corporation | Lapping and polishing fixture having flexible sides |
TW431434U (en) * | 1999-10-22 | 2001-04-21 | Ind Tech Res Inst | Carrier for carrying non-circular workpiece |
CN102975114A (en) * | 2012-12-06 | 2013-03-20 | 江苏吉星新材料有限公司 | Wandering star wheel |
CN106826465A (en) * | 2017-03-31 | 2017-06-13 | 德清阳瑞光学科技有限公司 | It is exclusively used in the Twp-sided polishing machine erratic star wheel of glass cylinder mirror processing |
JP2017144531A (en) * | 2016-02-19 | 2017-08-24 | 株式会社島津製作所 | Carrier plate and single-side polishing apparatus using the same |
CN107457687A (en) * | 2017-09-30 | 2017-12-12 | 德清晶生光电科技有限公司 | The erratic star wheel of uniform grinding |
CN207642896U (en) * | 2017-09-30 | 2018-07-24 | 德清晶生光电科技有限公司 | A kind of erratic star wheel of uniform grinding |
-
2017
- 2017-09-30 CN CN201710923869.7A patent/CN107520744A/en active Pending
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
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US3111791A (en) * | 1962-07-27 | 1963-11-26 | Harry J Harris | Automatic lapping machines |
FR2261097A1 (en) * | 1974-01-25 | 1975-09-12 | Mo | Lapping machine for precision surfaces - has cages moved variably independent of movement of main wheel |
JPH09253987A (en) * | 1996-03-15 | 1997-09-30 | Nippon Dempa Kogyo Co Ltd | Carrier and abrasive device |
JPH1199471A (en) * | 1997-09-26 | 1999-04-13 | Canon Inc | Polishing jig and polishing device mounting it |
US6152807A (en) * | 1998-07-07 | 2000-11-28 | International Business Machines Corporation | Lapping and polishing fixture having flexible sides |
TW431434U (en) * | 1999-10-22 | 2001-04-21 | Ind Tech Res Inst | Carrier for carrying non-circular workpiece |
CN102975114A (en) * | 2012-12-06 | 2013-03-20 | 江苏吉星新材料有限公司 | Wandering star wheel |
JP2017144531A (en) * | 2016-02-19 | 2017-08-24 | 株式会社島津製作所 | Carrier plate and single-side polishing apparatus using the same |
CN106826465A (en) * | 2017-03-31 | 2017-06-13 | 德清阳瑞光学科技有限公司 | It is exclusively used in the Twp-sided polishing machine erratic star wheel of glass cylinder mirror processing |
CN107457687A (en) * | 2017-09-30 | 2017-12-12 | 德清晶生光电科技有限公司 | The erratic star wheel of uniform grinding |
CN207642896U (en) * | 2017-09-30 | 2018-07-24 | 德清晶生光电科技有限公司 | A kind of erratic star wheel of uniform grinding |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN107457687A (en) * | 2017-09-30 | 2017-12-12 | 德清晶生光电科技有限公司 | The erratic star wheel of uniform grinding |
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